TW201351060A - Exposure apparatus, flat-panel display manufacturing method, and device manufacturing method - Google Patents

Abstract

In a substrate stage device (PST), an X movable element (56), which faces an X stator (82) provided on an X beam (25) and in which a magnetic attractive force is generated with respect to a weight canceling device (50), is fixed at the tip of an arm (54) of the weight canceling device (50). The weight canceling device (50) transfers its own weight and part of the weight of a micro-movement stage (30) that the weight canceling device (50) supports to a floor (11) via a base frame (14) by means of the magnetic attractive force. Therefore, the biased load applied to a vibration prevention device (34) is reduced.

Description

Exposure device, method for manufacturing flat display, and device manufacturing method

The present invention relates to an exposure apparatus, a method of manufacturing a flat panel display, and a device manufacturing method, and more particularly to an exposure apparatus used in a lithography process for manufacturing a semiconductor element, a liquid crystal display element, or the like, and a flat panel display using the same A manufacturing method and a component manufacturing method using the above exposure apparatus.

In the lithography process for manufacturing electronic components (microcomponents) such as a liquid crystal display device or a semiconductor device (integrated circuit), a photomask or a reticle (hereinafter collectively referred to as a "mask") is used. Stepping scan with a glass plate or wafer (hereinafter collectively referred to as "substrate") moving in synchronization with a predetermined scanning direction (scan direction) while transferring the pattern formed on the reticle to the substrate using an energy beam (step & scan The exposure device of the mode (so-called scanning stepper (also called scanner)).

As such an exposure apparatus, there is an X coarse motion stage which is movable in a scanning direction for a long stroke, and is mounted with a Y-movement which is movable in a cross-scanning direction (a direction orthogonal to the scanning direction). The superimposing type (gantry type) stage device of the stage is known as such a stage device, for example, moving along a horizontal surface on a surface plate formed of stone (for example, refer to Patent Document 1) ).

In the exposure apparatus of the above Patent Document 1, since the weight canceling means is in the corresponding step The large-scale movement of the scanning is performed, so that the flatness of the upper surface of the platform (the moving guiding surface of the weight canceling device) must be made high. In addition, in recent years, the substrate to be exposed by the exposure apparatus has become larger and larger, and the platform has become larger and larger. Therefore, in addition to the increase in cost, the conveyance of the exposure apparatus and the workability during installation are affected. care. To this end, it is expected that there will be a new technology that will make the platform smaller.

Advanced technical literature

[Patent Document 1] US Patent Application Publication No. 2010/0018950

In order to reduce the size of the platform, the inventors of the present invention have proposed an exposure apparatus having a platform for supporting a weight canceling device that moves in a scanning cross direction, which is called a stepping platform (U.S. Patent Application No. 13/221,568). An exposure apparatus having the stepping platform for guiding a stepping platform for supporting the movement of the substrate holding member holding the exposure target substrate from the lower side in the scanning direction is supported while being movable in the scanning intersecting direction On the stand of the anti-vibration device. Since the stepping platform having the stepping platform is driven in the scanning intersecting direction while the substrate holding member and the weight canceling device are supported, the center of gravity of the entire exposure device is moved before and after the driving. Big. Therefore, it has recently been found that the use of the exposure apparatus of the stepping platform imposes a large eccentric load on the anti-vibration device, in particular, the substrate holding member that holds the large substrate becomes heavy, so that the weight canceling device that transmits the support member through the substrate acts on the stepping The platform and the eccentric load acting on the gantry further through the stepping platform are large, so that the exposure device is slightly tilted due to the eccentric load applied to the gantry supported by the anti-vibration device during the exposure operation, and the exposure accuracy is lowered.

According to a first aspect of the present invention, there is provided a first scanning type exposure apparatus that moves an exposure target object in a first direction parallel to a horizontal plane by a predetermined first stroke during an exposure process, and includes: moving The body can move at least in the first direction by the predetermined first stroke, and can move in the second direction in the second direction orthogonal to the first direction in the horizontal plane; the object holding member can hold the object, Moving together with the moving body at least in a direction parallel to the horizontal plane; the weight canceling device supports the object holding member from below to offset the weight of the object holding member; the supporting member extends in the first direction to support the weight from below The canceling device is movable in the second direction by the second stroke while supporting the weight canceling device from below; the support frame supports the support member; and the load reducing device for reducing the acting on the support frame Load load in the direction of gravity.

According to the invention, in the exposure processing of the object, the load direction of the gravity direction (vertical direction downward) due to the weight of the object holding member, the weight canceling device, and the support member itself acts on the support frame, but the load is due to the load. Reduce the device and reduce it. Therefore, it is possible to reduce the eccentric load acting on the support gantry by the movement of the center of gravity including the object holding member, the weight canceling device, the supporting member, and the support gantry, thereby maintaining sufficiently high exposure accuracy.

According to a second aspect of the present invention, in a second scanning type exposure apparatus, the object to be exposed is moved by a predetermined first stroke in a first direction parallel to a horizontal plane with respect to an exposure energy beam during exposure processing, and includes: The moving member is movable at least in the predetermined first stroke in the first direction, and the second moving member guides the movement of the first moving member in the first direction and is positive in the horizontal direction in the first direction The second direction intersects with the first moving member to move along the second stroke; the object holding member holds the object and can move at least in a direction parallel to the horizontal plane together with the first moving member; the weight canceling device is from below Support the object to keep The member is configured to cancel the weight of the object holding member; the support frame includes a platform for supporting the weight canceling device from below; and the linear motor includes a magnet disposed on the second moving member and a coil disposed on the first moving member, The first moving member is driven in the first direction by the first stroke; and the load reducing device reduces the load acting on the gravity direction of the support frame by a force acting between the magnet and a part of the weight canceling device. load.

According to the invention, in the exposure processing of the object, the first moving member that can move in the direction parallel to the horizontal plane together with the object holding member that holds the object is driven by the linear motor in the first direction. At this time, the load in the gravity direction due to the weight of the object holding member and the weight canceling device itself acts on the support frame, but the load load can be utilized by the load reducing device to utilize a part of the weight canceling device. The power of each can be reduced. Therefore, the eccentric load acting on the support gantry can be reduced by the movement of the center of gravity including the object holding member, the weight canceling device, and the support stand, whereby the sufficiently high exposure accuracy can be maintained.

A third aspect of the present invention provides a method of manufacturing a flat panel display, comprising: an operation of exposing a substrate using any one of the first and second exposure apparatuses; and an operation of developing the substrate after exposure.

According to a fourth aspect of the present invention, there is provided a device manufacturing method comprising: an operation of exposing an object using any one of the first and second exposure apparatuses; and an operation of developing the object after exposure.

10‧‧‧Exposure device

11‧‧‧ Ground

12‧‧‧Lighting

14, 414‧‧‧ pedestal

14a, 414a‧‧‧ body part of the base

14b‧‧‧foot of the base

14c‧‧‧ adjuster

15‧‧‧Auxiliary pedestal

15a‧‧‧The main body of the auxiliary pedestal

15b‧‧‧Auxiliary pedestal adjuster

16‧‧‧Y linear guide

16a‧‧‧Y linear guide

16b‧‧‧Sliding parts

17a‧‧‧X linear guide

17b‧‧‧Sliding parts

18x‧‧‧X voice coil motor

18y‧‧‧Y voice coil motor

21, 28‧‧ ‧ mirror base

22x‧‧‧X moving mirror

22y‧‧‧Y moving mirror

23‧‧‧ coarse moving stage

23x, 123x, 223x‧‧‧X coarse moving stage

23y‧‧‧Y coarse moving stage

25, 125, 325, 325b‧‧‧X beam

26‧‧‧Sensor

27‧‧‧ Subject matter

30‧‧‧Micro-motion stage

31‧‧‧Substrate holder

33‧‧‧Substrate mounting platform

34‧‧‧Anti-vibration device

35‧‧‧Y linear guide

35a‧‧‧Y linear guide

35b‧‧‧Sliding parts

40, 140, 240, 340, 340b, 440‧‧‧X brackets

41, 341‧‧‧ link board

42‧‧‧Gap section

43, 45‧‧‧Flexing device (linking device)

46, 446, 478‧‧‧ fixed components

50, 250, 350, 350a, 450‧‧‧ weight offset devices

51, 351‧‧‧ housing

52‧‧‧Air spring

53‧‧‧Z slider

54‧‧‧arms

55‧‧‧ base pad (air bearing)

56‧‧‧X movable

57‧‧‧Sealing pad (air bearing)

59, 61‧‧‧ flat member

58, 62, 66, 68‧‧‧ side wall members

63‧‧‧ top

64‧‧‧ Side wall

65‧‧‧Table components

70‧‧‧ Leveling device

72, 472‧‧‧Y movable

73‧‧‧Y fixed

75, 475, 475a‧‧‧Y bracket

76‧‧‧ plates

77‧‧‧Support members

78‧‧‧Auxiliary bracket

81‧‧‧X movable

82‧‧‧X fixed

90, 490, 490a‧‧‧Y stepping platform

94‧‧‧Y movable

96, 353‧‧‧ magnetic body

97, 343, 343a, 343b, 346‧‧‧ permanent magnet

124‧‧‧Installation components

254‧‧‧X arm

255‧‧‧Y arm

342‧‧‧ openings

352‧‧‧锷

F ₁ ~F ₄ ‧‧‧

Fb, Ff, Fg, Fh‧‧ magnetic attraction

Fd‧‧‧Magnetic reaction force

IL‧‧‧Lights

IOP‧‧‧Lighting Department

M‧‧‧Photo Mask

MST‧‧‧Photomask stage

P‧‧‧Substrate

PL‧‧‧Projection Optics

PST, PSTa, PST1~PST4, PST3a, PST3b, PST4a‧‧‧ substrate stage device

Fig. 1 is a view schematically showing the configuration of an exposure apparatus according to a first embodiment.

2 is a view showing the substrate stage of the exposure apparatus of FIG. 1 removed from the micro-motion stage The top view of the show.

Fig. 3 is a view of the substrate stage of the exposure apparatus of Fig. 1 as seen from the +X direction.

Fig. 4 is a view schematically showing the flow of force generated by the weight of the substrate stage device itself.

Figure 5 is a diagram for explaining the magnetic attraction force acting on the weight canceling device.

Fig. 6(A) is a view schematically showing the movement of the center of gravity of the substrate stage device in which the magnetic attraction generating means acting on the weight canceling means is not provided, and Fig. 6(B) showing the effect of the weight canceling means in a schematic manner. A diagram showing the movement of the center of gravity of the substrate stage device in the vertical direction of the magnetic attraction.

Fig. 7 is a view of the substrate stage device of the second embodiment as seen from the +X direction.

Fig. 8 is a plan view showing a substrate stage device according to a third embodiment.

Fig. 9 is a partial cross-sectional view of the substrate stage device of the third embodiment as seen from the +X direction.

Fig. 10 is a partial cross-sectional view of the substrate stage device of the fourth embodiment as seen from the +X direction.

Fig. 11 is a plan view showing a substrate stage device according to a fourth embodiment.

Fig. 12(A) is a view showing an example in which a permanent magnet that generates magnetic attraction is combined with a magnetic body, and Fig. 12(B) is a view showing an example in which a permanent magnet that generates magnetic attraction is combined with a permanent magnet.

Fig. 13 is a partial cross-sectional view of the substrate stage device according to the first modification of the fourth embodiment as seen from the +X direction.

Fig. 14 is a partial cross-sectional view of the substrate stage device according to a second modification of the fourth embodiment as seen from the +X direction.

Fig. 15 is a partial cross-sectional view of the substrate stage device included in the exposure apparatus of the fifth embodiment as seen from the -Y direction.

Fig. 16 is a view showing a partial cross section of the substrate stage device of Fig. 15 as seen from the +X direction.

Fig. 17 is a view showing the substrate stage device according to a modification of the fifth embodiment as seen from the -Y direction; Figure.

"First Embodiment"

Hereinafter, the first embodiment will be described with reference to Figs. 1 to 6(B). The configuration of the exposure apparatus 10 of the first embodiment is schematically shown in Fig. 1 . The exposure apparatus 10 is a step-and-scan type projection exposure apparatus (also referred to as a scanner) in which a rectangular (square) glass substrate P (hereinafter, simply referred to as a substrate P) for a liquid crystal display device (planar display) is an exposure target. ).

The exposure apparatus 10 includes a lighting system IOP, a mask stage MST holding the mask M, a projection optical system PL, a pair of substrate stage stages 33, a substrate stage device PST including a substrate holder 31 holding the substrate P, and Such control systems, etc. Hereinafter, the direction in which the exposure mask M and the substrate P are scanned with respect to the projection optical system 16 is defined as the X-axis direction, the direction orthogonal to the X-axis in the horizontal plane is the Y-axis direction, and the direction orthogonal to the X-axis and the Y-axis. The directions in the Z-axis direction and the directions of rotation around the X-axis, the Y-axis, and the Z-axis are θx, θy, and θz directions, respectively. In addition, the positions of the X-axis, the Y-axis, and the Z-axis direction are assumed to be the X position, the Y position, and the Z position, respectively. Further, a photoresist (inductive agent) is applied to the surface of the substrate P (the surface on the +Z side).

The illumination system IOP is configured in the same manner as the illumination system disclosed in, for example, the specification of U.S. Patent No. 6,552,775. That is, the illumination system IOP has a plurality of, for example, five illumination systems that respectively illuminate a plurality of, for example, five illumination regions arranged in a zigzag shape on the mask M, and each illumination system uses a light source (for example, a mercury lamp). The emitted light is irradiated to the mask M as exposure illumination light (illumination light) IL via a mirror, a dichroic mirror, a blind, a wavelength selective filter, various lenses, and the like (not shown). For the illumination light IL, for example, an i-line (wavelength: 365 nm), a g-line (wavelength: 436 nm), an h-line (wavelength: 405 nm), or the like (or the above-described i-line, g-line, and h-line combined light) is used. Again, according to The wavelength of the bright light IL can be switched by a wavelength selective filter, for example, depending on the required resolution.

In the mask stage MST, for example, a mask M having a circuit pattern or the like formed on the pattern surface (below the FIG. 1) is fixed by vacuum suction. The mask stage MST is mounted on a guide (not shown) in a non-contact state, and is driven by a mask stage drive system (not shown) including a linear motor for a predetermined stroke, and is appropriately micro-driven. Y-axis direction and θz direction. The position information of the mask stage MST in the XY plane (including the rotation information in the θz direction) is obtained by including a laser beam that irradiates the laser beam (measuring the long beam) to the reflecting surface fixed (or formed) on the mask M. The interferometer is measured for the illustrated mask interferometer system. This measurement result is supplied to a main control unit not shown. The main control unit drives (position control) the mask stage MST through the mask stage drive system (not shown) based on the measurement results measured by the mask interferometer system. Alternatively, an encoder (or an encoder system composed of a plurality of encoders) may be used in place of or in conjunction with the reticle interferometer system.

The projection optical system PL is disposed below the reticle stage MST in FIG. The projection optical system PL has the same configuration as the projection optical system disclosed in the specification of U.S. Patent No. 6,552,775. In other words, the projection optical system PL corresponds to the plurality of illumination regions, and the projection regions including the pattern image of the mask M are arranged in a zigzag pattern, for example, five projection optical systems (multi-lens projection optical systems), and have Y A projection optical system in which a rectangular single image field having an axial direction of a long side direction has an equal function. In the present embodiment, each of the plurality of projection optical systems is formed by using, for example, a double-centered telecentric system on both sides to form an erect positive image.

Therefore, when the illumination area on the reticle M is illuminated by the illumination light IL from the illumination system IOP, that is, by the reticle M which is arranged to be substantially coincident with the pattern surface by the first surface (object surface) of the projection optical system PL Illumination light IL, through the projection optics PL, the photomask M in the illumination area The projection image (partial erect image) of the road pattern is formed on the irradiation portion (exposure region) of the illumination light IL that is conjugate with the illumination region disposed on the second surface (image surface) side of the projection optical system PL and on the substrate P. . By the synchronous movement of the mask stage MST and the micro-motion stage 30 which is a part of the substrate stage device PST described later, the mask M is moved in the scanning direction (X-axis direction) with respect to the illumination area (illumination light IL) and is relatively The exposure area (illumination light IL) moves the substrate P in the scanning direction (X-axis direction), thereby performing scanning exposure of one irradiation area (division area) on the substrate P, and transferring the pattern of the mask M (light) in the irradiation area Cover pattern). That is, in the present embodiment, the illumination system IOP and the projection optical system PL are used to form the pattern of the mask M on the substrate P, and the exposure layer (photoresist layer) on the substrate P using the illumination light IL is exposed. This pattern is formed on the substrate P.

Each of the pair of substrate stages 33 is formed of a member extending in the Y-axis direction (see FIG. 3, and the vibration-proof devices 34 provided at both ends in the longitudinal direction on the floor 11 are supported from below. A pair of substrate-mounted stages 33 are arranged in parallel at a predetermined interval in the X-axis direction. On the respective upper surfaces of the pair of substrate stages 33, as shown in FIG. 2, the mechanical Y linear guide extending in the Y-axis direction is fixed in parallel with each other in the X-axis direction. A plurality of elements (for example, three for each substrate stage gantry 33) of the indexing device (single-axis guiding device) are Y linear guides 35a.

The pair of substrate stage stages 33 constitute a device body (body) of the exposure apparatus 10, and the projection optical system PL and the mask stage MST are mounted on the apparatus body.

As shown in FIG. 1, the substrate stage device PST includes a pair of base frames 14, an auxiliary pedestal 15, a coarse movement stage 23, a fine movement stage 30, a weight canceling device 50, and a weight offset from below. The Y stepping platform 90 of the device 50 and the like.

One of the pair of pedestals 14 is disposed on the +X side of the substrate stage gantry 33 on the +X side as shown in Figs. 1 and 2, and the other is placed on the substrate stage gantry table 33 on the -X side. X side . Since the pair of base frames 14 have the same configuration, only the base frame 14 on the +X side will be described below. As shown in FIG. 1, the base frame 14 includes a main body portion 14a composed of a plate-like member having one surface parallel to the YZ plane and the other surface extending in the Y-axis direction, and a plurality of leg portions 14b supporting the main body portion 14a from below. . The leg portion 14b is provided at a predetermined interval in the Y-axis direction, for example, three. A plurality of adjusters 14c are provided at the lower end portions of the respective leg portions 14b, and the Z position of the main body portion 14a can be adjusted.

The Y stator 73 of the element of the linear motor is fixed to both side surfaces of the main body portion 14a in the X-axis direction (that is, the one surface and the other surface). The Y stator 73 has a magnet unit including a plurality of permanent magnets arranged at predetermined intervals in the Y-axis direction. Further, a Y linear guide 16a which is an element of a mechanical Y linear guide (single-axis guide) extending in the Y-axis direction is fixed to the upper surface of the main body portion 14a.

The auxiliary pedestal 15 is disposed between the pair of substrate stages pedestal 33. The auxiliary pedestal 15 has a different size, but the portion other than the main body portion 14a of the pedestal 14 is constructed in the same manner. That is, the auxiliary base frame 15 includes the main body portion 15a formed of a plate-like member extending in the Y-axis direction, and the adjuster 15b capable of adjusting the Z position of the main body portion 14a by supporting the main body portion 15a from below. On the upper surface 15a of the auxiliary base frame 15, a Y linear guide 16a extending in the Y-axis direction is fixed in the same manner as the base frame 14. The Z position of the upper end of the auxiliary base frame 15 is set to be slightly lower (or substantially the same) as the upper surface of the pair of substrate stage platforms 33.

The coarse movement stage 23 includes a Y coarse movement stage 23y and an X coarse motion stage 23x mounted on the Y coarse motion stage 23y.

The Y coarse movement stage 23y is mounted on the pair of base frames 14 and the auxiliary base frame 15. The Y coarse movement stage 23y, as shown in Fig. 2, has a pair of X-beams 25. Each of the pair of X-beams 25 is formed of a member extending in the X-axis direction, and is disposed in parallel with each other at a predetermined interval in the Y-axis direction. A pair of X beams 25, as shown in Figure 3. As shown, the shape of the YZ section is an inverted isosceles trapezoid having an upper side that is longer than the bottom side. The trapezoid has an inclination of one side with respect to the Z axis at an angle θ (θ is smaller than 45 degrees, for example, 10 degrees) in the YZ plane, and is inclined at an angle −θ with respect to the Z axis in the YZ plane. the other side.

A member called a Y bracket 75 is fixed to the lower side of both end portions in the longitudinal direction of each of the pair of X-beams 25 as shown in FIG. 2 . That is, for example, a total of four Y brackets 75 are attached to the lower side of the Y coarse movement stage 23y. The two Y brackets 75 disposed on the +X side are coupled to each other through the sheets 76 fixed to the respective upper sides. Similarly, the two Y brackets 75 disposed on the -X side are also coupled to each other through the plate 76. For example, each of the four Y brackets 75 has the same configuration. Hereinafter, only one Y bracket 75 corresponding to the +X side base frame 14 will be described.

As shown in Fig. 1, the Y bracket 75 is formed by a U-shaped U-shaped cross section, and the main body portion 14a of the base frame 14 is inserted between a pair of opposing surfaces. A pair of Y movable members 72 that are transmitted through a predetermined gap (clearance/gap) and a pair of Y stators 73 are fixed to each of the pair of opposing faces of the Y bracket 75. Each of the Y movable members 72 includes a coil unit (not shown), and constitutes an electromagnetic force (Lorentz force) driving method for driving the Y coarse moving stage 23y in the Y-axis direction by a predetermined stroke together with the opposing Y stator 73. Dynamic coil type Y linear motor. Further, the Y position information of the Y coarse movement stage 23y is obtained by a linear encoder system (not shown).

On the top surface of the Y bracket 75, a plurality of (for example, two (refer to FIG. 2)), including rolling elements (for example, a plurality of balls, etc.) are fixed to the Y brackets 75, and are slidably engaged with the Y linear. The slider 16b of the guide 16a. The Y coarse movement stage 23y is comprised of a plurality of Y linear guides including a Y linear guide 16a and a slider 16b, and is guided in the Y-axis direction.

Further, a plurality of (for example, two) auxiliary brackets 78 are fixed to the lower surface of the center portion of the pair of X-beams 25 in the longitudinal direction by the support member 77. The auxiliary bracket 78 is formed of a rectangular parallelepiped member, below it, with the Y bracket 75 Similarly, the slider 16b that is slidably engaged with the Y linear guide 16a is fixed. Accordingly, the Y coarse movement stage 23y is separated from the substrate stage stage 33 by vibration. In addition, in FIG. 1, although the paper surface is overlapped and hidden in the depth direction of the paper, the slider 16b is attached to the auxiliary paper 78 in the depth direction (Y-axis direction) of the paper at a predetermined interval, for example, two. As described above, the Y coarse movement stage 23y has its central portion in the longitudinal direction transmitted through the auxiliary bracket 78 from the lower side by the auxiliary base frame 15, and the deflection caused by its own weight is suppressed.

As shown in FIG. 2 and FIG. 3, the upper surface of each of the pair of X-beams 25 is fixed in parallel with each other at a predetermined interval in the Y-axis direction (in the present embodiment, for example, two X-beams 25 are two). The X linear guide 17a extends over the elements of the mechanical uniaxial guiding device in the X-axis direction. Further, two oblique sides (inclined faces) of the YZ sections of the pair of X beams 25 are fixed from the vicinity of the -X side end of the X beam 25 to the vicinity of the +X side end as shown in Figs. 1 and 2 . Extended X anchors 82. The X stator 82 has a magnet unit including a plurality of permanent magnets arranged at predetermined intervals in the X-axis direction.

The X coarse movement stage 23x includes a pair of coupling plates 41 that connect a pair of X brackets 40 and a pair of X brackets 40 as shown in FIG. 2 . Moreover, since the pair of X brackets 40 have the same structure, only the X bracket 40 on the Y side will be described below.

As shown in FIG. 2 and FIG. 3, the X bracket 40 has a rectangular plate member 61 having a rectangular shape in the longitudinal direction of the X-axis direction, and a Y-axis direction at one end portion and the other end portion in the longitudinal direction of the flat plate member 61. Each of the pair of end faces is fixed in a state in which the upper end faces are substantially flush with the upper surface of the plate member 61, and a total of four side wall members 62 are provided. The X bracket 40 has an inverted U-shape as viewed in the +X direction, and the X-beams 25 are inserted between the +Y side and the -Y side wall member 62 which are paired with each other. Both ends of the plate member 61 in the X-axis direction are slightly protruded outward from the X-axis direction with respect to each of the +X side and the -X side wall member 62 (see FIG. 2). Paired with each other on the +Y side and the -Y side The wall member 62 has a first portion parallel to the XZ plane from the upper end (+Z side end) to the center portion, and a tilt from the center portion to the lower end (-Z side end) to the -Y side or the +Y side. And the second part facing the two oblique faces of the X beam 25 described above. In the vicinity of the center portion in the longitudinal direction (X-axis direction) of the X-bracket 40, a portion in which the side wall member 62 is not present in a range of 1/3 of the length of the X-bracket 40 in the X-axis direction is provided (hereinafter, referred to as a notch) Part 42 (see Fig. 2).

On the lower surface (the surface on the -Z side) of the plate member 61 of the X bracket 40, as shown in FIG. 3, a plurality of (for example, four (refer to FIG. 2)) rolling bodies are fixed to the respective X linear guides 17a. The slider 17b of the Y linear guide 17a is slidably engaged. In the present embodiment, for example, a total of 16 sliders 17b are fixed to the lower surface of the X coarse movement stage 23x. The X coarse movement stage 23x is comprised of a plurality of X linear guides including a Y linear guide 17a and a slider 17b, and is guided in the X-axis direction.

The X movable member 81 that is opposed to each of the pair of X stators 82 through a predetermined clearance/gap is fixed to the inner surface of each of the four side wall members 62 of the X bracket 40. Each of the X movable members 81 includes a coil unit (not shown), and constitutes an electromagnetic force (Lorentz force) driving method for driving the X coarse motion stage 23x in the X-axis direction by a predetermined stroke together with the opposing X stator 82. Dynamic type X linear motor. Further, each of the X movable members 81 includes a core (not shown), and generates a magnetic attraction force between the opposing X stators 82. That is, each movable member 81 constitutes a core coil unit. The X position information of the X coarse motion stage 23x is obtained by a linear encoder system (not shown).

Each of the pair of coupling plates 41 is constituted by a flat plate member extending in the Y-axis direction as shown in Fig. 2 . One of the connecting plates 41 is fixed slightly from the center of the Y-axis direction of the X-bracket 40 disposed on the +Y side to the center of the Y-axis direction of the X-bracket 40 disposed on the -Y side. On the +Y side, the +X ends of the pair of X brackets 40 are coupled to each other. The other connecting plate 41 is fixed to the X disposed on the -Y side from the center in the Y-axis direction of the X bracket 40 disposed on the +Y side. The center of the bracket 40 in the Y-axis direction is slightly closer to the +Y side, and the -X end portions of the pair of X brackets 40 are coupled to each other. That is, the X coarse movement stage 23x having the pair of X brackets 40 and the pair of coupling plates 41 has a substantially rectangular shape having a central opening in plan view.

Further, although not shown, a blocking member that mechanically restricts the movable amount of the fine movement stage 30 to the X coarse movement stage 23x, or the X-axis, and Y, is mechanically limited to the X coarse movement stage 23x. The axial direction is a gap sensor for measuring the amount of movement of the fine movement stage 30 with respect to the X coarse movement stage 23x.

As shown in FIGS. 1 and 3, the fine movement stage 30 is formed of a plate-like member (or a box-shaped (hollow rectangular parallelepiped) member) having a substantially square shape in plan view, and is passed through the substrate holder 31 to, for example, vacuum adsorption (or electrostatic adsorption). The method of adsorbing and holding the substrate P.

The fine movement stage 30 is provided with a fine movement stage drive system including a plurality of voice coil motors (or linear motors) each of which is fixed to the fixed portion of the X coarse movement stage 23x and the movable body fixed to the fine movement stage 30. The X coarse motion stage 23x is micro-driven in the three-degree-of-freedom direction (the X-axis, the Y-axis, and the θz direction) in the XY plane. A plurality of voice coil motors, as shown in FIG. 1, an X-coil motor 18x that micro-drives the micro-motion stage 30 in the X-axis direction is provided in a pair in the Y-axis direction (the X-sound motor 18x is not deep in the paper surface) As shown in FIG. 3, the Y-coil motor 18y that micro-drives the fine movement stage 30 in the Y-axis direction is provided with a pair in the X-axis direction separation (the Y-coil motor 18y in the depth of the paper surface is not shown). Show). The fine movement stage 30 is driven synchronously with the X coarse motion stage 23x by using the X voice coil motor 18x and/or the Y voice coil motor 18y (driven in the same direction and at the same speed as the X coarse motion stage 23x), and is rotated with X. The stage 23x moves together in the X-axis direction and/or the Y-axis direction with a predetermined stroke. Therefore, the fine movement stage 30 can move with a long stroke (coarse motion) in the XY2 axis direction with respect to the projection optical system PL (refer to FIG. 1), and can move slightly in the three degrees of freedom in the X, Y, and θz directions (micromotion). ).

Further, the fine movement stage drive system has a plurality of Z voice coil motors (not shown) for slightly driving the fine movement stage 30 in the three degrees of freedom directions of θx, θy, and Z-axis directions. A configuration of a micro-motion stage drive system including a plurality of voice coil motors is disclosed in, for example, U.S. Patent Application Publication No. 2010/0018950.

On the side of the -X side of the fine movement stage 30, as shown in Fig. 1, an X-moving mirror (rod mirror) 22x having a reflecting surface orthogonal to the X-axis is fixed to the mirror holder 21. Further, on the side of the -Y side of the fine movement stage 30, as shown in FIG. 3, the Y moving mirror 22y having the reflecting surface orthogonal to the Y-axis is fixed to the mirror holder 28. The positional information in the XY plane of the fine movement stage 30 is a laser interferometer system including a plurality of laser interferometers that respectively irradiate the X-ray moving mirror 22x and the Y moving mirror 22y with the length measuring beam (interferometer beam). Hereinafter, the substrate interferometer system is called, and it is detected at any time. Further, in practice, the substrate interferometer system includes a plurality of X laser interferometers corresponding to the X moving mirror 22x and a Y laser interferometer corresponding to the Y moving mirror 22y, but only a representative display in FIG. 1 is from X Ray. The long beam of the interferometer. A plurality of laser interferometers are respectively fixed to the apparatus body. Further, the positional information of the fine movement stage 30 in the θx, θy, and Z-axis directions is fixed to the sensor 26 (under FIG. 3) under the fine movement stage 30, and is fixed to the target of the weight canceling device 50, for example, which will be described later. The object 27 is obtained. The configuration of the position measuring system of the above-described fine movement stage 30 is disclosed in, for example, U.S. Patent Application Publication No. 2010/0018950.

As shown in FIG. 3, the weight canceling device 50 is composed of a columnar member extending in the Z-axis direction, and is also referred to as a stem. The weight canceling device 50 is inserted into the opening of the X coarse movement stage 23x, and is mounted on a Y stepping stage 90 which will be described later. The weight canceling device 50 supports the fine movement stage 30 from below via a leveling device 70 which will be described later.

The weight canceling device 50 has a housing 51, an air spring 52, and a Z slider 53, a pair The arm portion 54 and the like.

The casing 51 is formed of a member having a rectangular shape in plan view, and a circular opening portion having a surface opening on the +Z side is formed at the center portion (see FIG. 2). A plurality of air bearings (hereinafter referred to as base pads) 55 having bearing surfaces facing the -Z side are attached to the lower surface of the casing 51.

The air spring 52 is housed in the opening of the casing 51. The air spring 52 supplies the pressurized gas from the outside.

The Z slider 53 is formed of a cylindrical member extending in the Z-axis direction, and is inserted into the opening of the casing 51 and mounted on the air spring 52.

Each of the pair of arm portions 54 is formed of a rod-shaped member that extends in the Y-axis direction. The arm portion 54 disposed on the +Y side of the pair of arm portions 54 is fixed to the +Y side surface of the casing 51 at one end, and inserted into the notch portion 42 of the X bracket 40 at the other end. Similarly, the arm portion 54 disposed on the -Y side has one end fixed to the -Y side surface of the casing 51 and the other end inserted into the notch portion 42 of the X bracket 40. The other end of each of the pair of arm portions 54 has a slope which is parallel to the inclined surface formed on the inner side in the Y-axis direction among the inclined surfaces of the pair of X-beams 25, respectively. Further, in the inclined surface of the other end of each of the pair of arm portions 54, the X-fixer 82 which is disposed in the pair of X-beams 25 and has an X-axis direction on the inner side in the Y-axis direction is fixed to a predetermined gap ( Clearance/gap) The opposite X mover 56. Each of the X movable members 56 includes a coil unit (not shown), and constitutes an X linear motor that drives the weight canceling device 50 in a predetermined stroke in the X-axis direction together with the opposing X stator 82. Further, each of the X movable members 56 includes a core (not shown), and generates a magnetic attraction force between the opposing X stators 82.

A leveling device 70 is mounted above the weight canceling device 50. The leveling device 70 is attached to the +Z side end portion of the Z slider 53 and the air bearing (hereinafter referred to as a gasket) 57 whose bearing surface faces the +Z side is supported in a non-contact manner from below. The leveling device 70 supports the fine movement stage 30 A device that is tiltable (freely swingable in the θx and θy directions with respect to the XY plane). The weight canceling device 50, by the force of the vertical direction generated by the air spring 52, passes through the Z slider 53 and the leveling device 70 to cancel the weight of the system including the micro-motion stage 30 (force in the direction of gravity), thereby reducing the above plural The load of a Z voice coil motor.

As shown in FIG. 2, the weight canceling device 50 is mechanically connected to the X coarse dynamic load by a plurality of (for example, four) flexure device strip connecting devices 45 (hereinafter, appropriately referred to as the flexing device 45). Table 23x (X bracket 40). The flexure device 45 includes, for example, a strip-shaped steel sheet (or a steel cord, a synthetic resin rope, a chain, etc.) having a thin thickness arranged in parallel with the XY plane, and a hinge device (for example, a ball joint or a hinge) provided at both ends of the steel sheet. In the training device, the steel plate is placed between the weight canceling device 50 and the X bracket 40 through the hinge device. The Z position of the plurality of flexing devices 45 substantially coincides with the position of the center of gravity of the weight canceling device 50 in the Z-axis direction. The flexure device 45 has one end fixed to a corner portion of the casing 51 (the apex of the casing 51 in plan view), and the other end fixed to the side wall member 62 of the X bracket 40. That is, the weight canceling device 50 is moved by the X coarse movement stage 23x by any one of the plurality of bending apparatuses 45, and moves integrally with the X coarse movement stage 23x in the X-axis direction or the Y-axis. direction. At this time, in the weight canceling device 50, there is a pulling force in a plane including the center of gravity in the Z-axis direction parallel to the XY plane, and therefore the moment (pitching moment) about the axis orthogonal to the moving direction does not effect. Further, the leveling device 70 and the flexing device 45 are included, and the detailed configuration of the weight canceling device 50 of the present embodiment is disclosed in, for example, the specification of U.S. Patent Application Publication No. 2010/0018950.

The Y stepping platform 90, as shown in FIG. 1 to FIG. 3, is composed of a member having a rectangular YZ section extending in the X-axis direction, and is placed at a predetermined distance from each of the pair of X-beams 25 in a plan view (non-contact state). ) is disposed between a pair of X beams 25. The longitudinal direction dimension of the Y stepping stage 90 is set to be slightly longer than the movement stroke of the fine movement stage 30 in the X-axis direction. Also, the width of the Y stepping platform 90 The dimension (Y-axis direction) dimension is set to support the width of the base pad 55 of the weight canceling device 50. The material of the Y stepping platform 90 is cast iron or dense stone (gabbro), ceramic, CFRP material, etc., and the flatness of the upper surface is processed to be very high.

Below the Y stepping platform 90, a plurality of (for example, two (refer to FIG. 2)), including rolling elements (for example, a plurality of balls, etc.) are fixed to each of the Y linear guides 35a, and are slidably engaged with each other. A plurality of sliders 35b of the Y linear guide 35a. The Y stepping stage 90 is a plurality of Y linear guides 35 including Y linear guides 35a and Y sliders 35b, and is guided in the Y-axis direction by a predetermined stroke on a pair of substrate stages 33.

As shown in FIG. 2, the Y stepping platform 90 is mechanically coupled to each pair of Y brackets 75 by a pair of flexure means 43 connected to the fixing members 46 fixed to the +X side and the -X side end surface. . The flexure device 43 has substantially the same configuration as the above-described flexure device 45. As described above, when the Y bracket 75 on one side or the other side in the Y-axis direction is driven in the Y-axis direction, the Y stepping platform 90 is pulled by the Y bracket 75 and integrally moved in the Y-axis direction. The flexibility of the deflection device 43 in the longitudinal direction (here, the Y-axis direction) is lower than that in the other five degrees of freedom directions (here, X, Z, θx, θy, and θz directions) in the above-described five-degree-of-freedom direction. The Y stepping platform 90 and the Y coarse moving stage 23y are separated by vibration.

The exposure apparatus 10 configured as described above performs loading of the mask M onto the mask stage MST by a mask transport apparatus (mask loader) (not shown) under the management of a main control unit (not shown). The substrate P is carried in (loaded) onto the substrate stage device PST by a substrate loading device (not shown). Thereafter, the main control device performs alignment measurement using an alignment detection system (not shown), and after the alignment measurement is completed, a step-scan (step & scan) exposure operation is performed. Since this exposure operation is the same as the exposure operation of the conventional step-and-scan method, detailed description thereof will be omitted.

Here, the exposure operation of the step-and-scan method described above is set on the substrate P. A plurality of irradiation areas are sequentially subjected to exposure processing. The substrate P is driven at a constant speed in a predetermined stroke in the X-axis direction during the scanning operation (hereinafter referred to as an X-scan operation), and is appropriately driven in the X-axis direction during the stepping operation (when moving between the irradiation regions). And/or the Y-axis direction (hereinafter, referred to as X step operation and Y step operation, respectively).

When the substrate P is moved in the X-axis direction during the X-scan operation and during the X-step operation, the substrate carrier device PST is configured to increase the X coarse motion on the Y coarse movement stage 23y based on the measured value of the encoder system. The stage 23x is driven in the X-axis direction, and the fine movement stage 30 and the X coarse movement stage 23x are synchronously driven by a plurality of X voice coil motors 18x according to the measured values of the substrate interferometer system. When the X coarse movement stage 23x is moved in the X-axis direction, the weight canceling device 50 is moved in the X-axis direction together with the X coarse movement stage 23x by being pulled by the X coarse movement stage 23x. At this time, the weight canceling device 50 is driven by the main control device through a linear motor including the X movable member 56 and the X fixed member 82, and is driven in the X-axis direction in synchronization with the X coarse motion stage 23x. At this time, the weight canceling device 50 moves on the Y stepping platform 90. Further, in the X-scan operation and the X-step operation, the fine movement stage 30 is slightly driven in the Y-axis direction and/or the θz direction with respect to the X coarse motion stage 23x, but the weight canceling device 50 The Y position does not change, so the weight canceling device 50 always moves only on the Y stepping platform 90.

On the other hand, in the above-described Y step operation, the Y-stacking stage 23 is driven by the substrate stage device PST and the Y-stacking stage 23y on the pair of pedestals 14 in the Y-axis direction with a predetermined stroke, and is integrated with the Y-stacking stage 23y. The X coarse motion stage 23x moves in the Y-axis direction with a predetermined stroke. Further, the weight canceling device 50 is moved in the Y-axis direction by a predetermined stroke integrally with the X coarse movement stage 23x. At this time, the Y stepping stage 90 that supports the weight canceling device 50 from below is driven in synchronization with the Y coarse moving stage 23y. Therefore, the weight canceling device 50 is constantly supported by the Y stepping platform 90 from below.

Next, the assembly procedure of the substrate stage device PST will be described. The first embodiment In the substrate stage device PST, first, a pair of substrate stage stages 33, a pair of base frames 14, and an auxiliary base frame 15 are respectively disposed on the floor 11 of the clean room in the arrangement shown in FIG. Thereafter, the Y bracket 75 is mounted on the pair of base frames 14 by the Y linear guide device 16, and the auxiliary bracket 78 is mounted on the auxiliary base frame 15, and a plurality of Y linearities are transmitted through the pair of substrate stage mounts 33. The guiding device 35 is equipped with a Y stepping platform 90. Further, the Y bracket 75 may be assembled to the pair of base frames 14 in other places, and the auxiliary bracket 78 may be assembled to the auxiliary base frame 15.

Next, the weight canceling device 50 is mounted on the Y stepping platform 90, and a pair of X-beams 25 are mounted on the Y bracket 75 and the auxiliary bracket 78. Thereafter, the X bracket 40 is mounted so that the X stator 82 is opposed to the X movable member 56 fixed to the arm portion 54 of the weight canceling device 50. Further, the X bracket 40 may be attached to each of the pair of X beams in advance at other places. Thereafter, the position of the pair of X-beams 25 (the Y-axis direction interval) is adjusted so that the X-fixer 82 is opposed to the X-movable member 56 fixed to the arm portion 54 of the weight canceling device 50 at a predetermined interval, or by The pair of webs 76 and 77 are fixed in position.

Thereafter, the fine movement stage 30 (including the leveling device 70) is loaded on the weight canceling device 50, and the stators of the plurality of voice coil motors are combined with the movable member. Next, the air spring 52 of the weight canceling device 50, the base pad 55 and the gasket 57, and the air bearing (not shown) of the leveling device 70 are supplied with pressurized gas, and the fine movement stage 30 is the weight canceling device 50. Supported in a non-contact manner.

Next, the flow of the force applied to the substrate stage device PST will be described. Further, the force applied to the substrate stage device PST described below is generated regardless of whether the fine movement stage 30 is stationary or in operation.

When the substrate stage device PST is assembled, the substrate P, the substrate holder 31, the fine movement stage 30 (including the leveling device 70), and the like (hereinafter referred to as the fine movement stage 30, etc.) are Z-axis due to their own weight. The downward force, as shown in Fig. 4, is transmitted to the ground 11 in the following flow direction. Further, although the substrate stage device PST in FIG. 4 is schematically shown and slightly different from the shapes shown in FIGS. 1 to 3, the components corresponding to the components shown in FIGS. 1 to 3 are Use the same symbol.

As shown in FIG. 4, the weight of the fine movement stage 30 or the like is supported by the Y stepping stage 90 through the weight canceling device 50. Here, as shown in FIG. 5, in the arm portion 54 of the weight canceling device 50, the arm portion 54 attached to the +Y side acts on the X movable member including the core fixed to the other end of the arm portion 54. The magnetic force F between the sub-56 and the X stator 82 mounted on the slope of the X-beam 25 is inclined in the θ direction with respect to the Y-axis in the YZ plane. Similarly, the arm portion 54 mounted on the -Y side acts on the magnetic attraction force F of the YZ plane inclined in the -θ direction with respect to the Y axis. Each of the magnetic attractive force F, divided into a vertical direction (Z axis direction) of the component force F _1, the horizontal direction (Y axis direction) of the component force F _2. Here, since the component F _{2 in the} horizontal direction acts in a direction canceling each other, the weight canceling device 50 only acts to apply the force of the vertical component force F ₁ (that is, 2F ₁ ). Therefore, as shown in FIG. 4, the weight of the fine movement stage 30 or the like is partially offset by the component force F ₁ (2F ₁ ) in the vertical direction, and the remaining force is transmitted to the Y stepping stage 90. The force transmitted to the Y stepping platform 90 is transmitted to the floor 11 via the substrate stage stand 33 and the anti-vibration device 34. On the other hand, in the X-beam 25, the reaction force of the component force F ₁ in the vertical direction is applied, and the reaction force of the weight of the vertical component F ₁ is transmitted through the base frame 14 and the auxiliary base frame 15 (refer to FIG. 1). To the ground 11.

As described above, according to the exposure apparatus 10 of the present embodiment, as shown in FIGS. 6(A) and 6(B), the substrate stage device does not generate a magnetic attraction force between the weight canceling device 50 and the X-beam 25. PSTa (Fig. 6(A)), in comparison with the substrate stage device PST (Fig. 6(B)) of the present embodiment, the fine movement stage 30 and the weight canceling device 50 can be regarded as, for example, a hollow member due to the action of magnetic attraction. Since the lightweight object is used, the center of gravity moving distance L when the substrate stage device PST is driven in the scanning intersecting direction can be shortened. That is, the substrate stage device PST can be reduced in vibration resistance when it is driven in the scanning cross direction. The change in the load carried by the 34 is reduced, so that the deformation of the exposure device 10 can be reduced and the exposure accuracy can be improved.

Further, since a portion of the vertical downward force generated by the weight of the fine movement stage 30 and the weight canceling device 50 itself is transmitted to the X-beam 25, the Y stepping platform 90 can reduce the vertical direction acting on itself. Power. Therefore, the base pad 55 supporting the weight canceling device 50 can be used with a small base pad having a small load capacity. That is, the Y stepping stage 90 can reduce the guide surface (the Y-axis direction dimension) of the support base pad 55.

Moreover, the Y stepping platform 90 can reduce the rigidity of the Y stepping platform 90 because it can reduce its own load. Thereby, the Y stepping stage 90 can be further miniaturized by reducing the thickness and the like.

Further, since the substrate stage device PST can be miniaturized by the Y stepping stage 90, the driving force for stepwise movement of the Y stepping stage 90 in the Y-axis direction can be reduced.

Next, another embodiment of the exposure apparatus will be described. In each of the following embodiments of the second embodiment, the portion other than the substrate stage device is the same as that of the exposure device 10 of the first embodiment. Therefore, only the substrate stage device will be described below.

"Second Embodiment"

Next, a second embodiment will be described based on Fig. 7 . Here, the same or equivalent components as those of the above-described first embodiment are denoted by the same or similar reference numerals, and the description thereof will be simplified or omitted.

The substrate stage device PST1 of the second embodiment has the same overall configuration as the substrate stage device PST, but the X-beam 125 is provided instead of the X-beam 25, and the shape of the X-bracket 140 and the X-bracket 40 are the same. The shape is partially different, and the partial configuration is different from the substrate stage device PST. Hereinafter, the description will be given focusing on the difference between the two.

As shown in FIG. 7, the substrate stage device PST1 includes one pair of X-beams 125, each having a shape in which the four vertices of a rectangle (including a rhombus and a square) are cut off (de-angular) in the YZ cross-section, respectively. That is, it has an octagonal shape. The X beam 125 of one (+Y side) is fixed to the upper surface of one Y bracket 75 through the mounting member 124 in a state where the θx direction is inclined by φ (for example, 45 degrees) with respect to the Y axis. The other side (-Y side) of the X-beam 125 is bilaterally symmetrical with respect to one of the X-beams 125, that is, in a state of being inclined by an angle θ with respect to the Y-axis in the θx direction, and is fixed to the other Y-bracket 75 through the mounting member 124. Above. The pair of X beams 125 respectively have four slopes (faces inclined with respect to the XY plane).

Among the four inclined faces of one of the X-beams 125, the pair of inclined faces of the mounting member 124 are not fixed to each other, that is, the first inclined surface on the +Y side and the +Z side, and the -Y side and the -Z side. In the second inclined surface, each of the pair of X stators 82 is extended over substantially the entire length in the longitudinal direction (X-axis direction). Further, the fourth inclined surface of the one X beam 125 and the fourth inclined surface (that is, the -Y side and the +Z side inclined surface) fixed to the opposite side of the third inclined surface of the mounting member 124 is at a predetermined interval in a direction parallel to the inclined surface. A plurality of (for example, two) X linear guides 17a extending in the X-axis direction are fixed in parallel with each other.

The other X beam 125 is disposed symmetrically with the X beam of the above one, and is provided with a pair of X stators 82 and a plurality of X linear guides 17a.

Each of the pair of X brackets 140 is formed of a member having a U-shaped cross section having a top portion and two pairs of side wall portions respectively provided at both end portions in the top longitudinal direction. The X bracket 140 of one side (+Y side) is placed sideways (viewed from the +X direction) in a state where the θx direction is inclined by φ with respect to the Y axis, and the first, second, and fourth oblique faces of the X beam 125 are arranged facing each other. . Further, the X bracket 140 of the one side is formed in the same manner as the X bracket 40 in the vicinity of the central portion in the X-axis direction of the side wall portion (the portion facing the first and second inclined surfaces of the X-beam 125). The notch portion 42 (see FIG. 2) is inserted into the notch portion 42 of the one of the arm portions 54.

One of the X brackets 140 is fixed to the inner surface of the side wall portion so as to be opposed to the X stator 82 by a predetermined clearance (gearance/gap) and one of the first and second slopes fixed to the X beam 125. A pair of X movable members 81. Also, on the inner surface of the top of the X bracket 140, opposite to each X-ray The sexual guide 17a is fixed with a plurality of (for example, four) sliders 17b including rolling elements that are slidably engaged with the Y linear guides 17a.

The X bracket 140 on the other side (-Y side) is symmetrical with respect to one of the X brackets 140, and has the same configuration. Similarly, a pair of X movable members 81 and a plurality of sliders 17b are provided.

Each of the X stator 82 and the X movable member 81 opposed to each other constitutes a moving coil type X linear motor of an electromagnetic force (Lorentz force) driving method. The X coarse motion stage 123x is driven by the X linear motor in the X-axis direction, and at this time, a plurality of X linear guides including the X linear guide 17a and the slider 17b are guided in the X-axis direction.

In the present embodiment, the X beam 125 on one (+Y side), that is, the X bracket 140 that is engaged therewith, is fixed to the X beam regardless of whether the X coarse movement stage 123x is being driven or stopped. The X-fixer 82 of the first inclined surface of 125 generates a magnetic attraction force Fb between the opposite X movable member 81, and the X-fixed member 82 fixed to the second inclined surface of the X-beam 125 is movable toward the X opposite thereto. A magnetic attraction force Fb is also generated between the sub-81s. Two magnetic forces Fb, which are equal in size and facing in the right direction. Of course, the two magnetic attraction forces Fb are also equal to each of the vertical component F ₃ and the horizontal component F ₄ . Therefore, as a whole, between the X beam 125 on one side (+Y side) and the X bracket 140, the force of the X bracket 140 being driven in the Z-axis and Y-axis directions is not generated with respect to the X-beam 125. Similarly, between the X beam 125 on the other side (-Y side) and the X bracket 140, as a whole, the X bracket 140 is not driven relative to the X beam 125 in the Z-axis and the Y-axis direction. force. That is, it is possible to maintain the predetermined relationship between the X movable member 56 (the cored coil unit (refer to FIG. 5)) and the X stator 82 (the magnet unit) which are mounted obliquely upward toward the front end of the arm portion 54 of the weight canceling device 50. Clearance (gap).

As described above, according to the substrate stage device PST1 of the second embodiment, the same effects as those of the substrate stage device PST of the first embodiment can be obtained. In addition to this, according to the base The plate stage device PST1 can prevent the magnetic attraction force Fb acting between the pair of X-beams 125 and the pair of X brackets 140 from being canceled, thereby preventing vertical application of a pair of X brackets 140 (X sliders 17b) Power. Therefore, by setting the inclination angle φ(-φ) of the pair of X-beams 125 to the inclination angle φ of the arm portion 54 opposed to the X-beam 125 to a predetermined angle, it is possible to prevent the pair of X brackets 140 from being prevented. In the floating state, any setting acts on the downward direction of the base pad 55 and the Y stepping platform 90. In this way, the base pad 55 can be further miniaturized, and the Y stepping platform 90 can be further miniaturized.

"Third Embodiment"

Next, the third embodiment will be described with reference to Figs. 8 and 9 . Here, the same or equivalent components as those of the above-described second embodiment are denoted by the same or similar reference numerals, and the description thereof will be simplified or omitted.

The substrate stage device PST2 of the third embodiment has the same overall configuration as the substrate stage device PST1 of the second embodiment, but the X bracket 240 and the weight offset are provided instead of the X bracket 140 and the weight canceling device 50. The configuration of the device 250 or the like is partially different from that of the substrate stage device PST1. Hereinafter, the description will be given focusing on the difference point.

Each of the pair of X brackets 240, as shown in FIG. 8, has a flat top portion 63 extending in the X-axis direction and a pair of side wall portions 64 disposed at the intermediate portion in the longitudinal direction of the top portion 63, side view (from + Observed in the X direction) The shape of the inverted U shape (see Fig. 9). Further, in Fig. 8, a pair of X brackets 240 are shown in a simplified manner. Further, as shown in FIG. 9, one (+Y side) X bracket 240 is in a side view (viewed from the +X direction) in a state where the θx direction is inclined by φ with respect to the Y axis, and the first and the first of the X beam 125. 2 and 4th oblique facing configuration. As can be seen from a comparison between FIG. 2 and FIG. 8, the X bracket 240 of the one side has a smaller dimension in the X-axis direction than the X brackets 40 and 140, and no gap is formed in the vicinity of the center portion in the X-axis direction.

As shown in FIG. 9, one of the X brackets 240 of one side faces the inner side of the side wall portion 64, respectively A pair of X movable members 81 that are opposed to the X stator 82 by one of the first and second inclined surfaces fixed to the X beam 125 through a predetermined clearance (clearance/gap) are fixed. Further, on the inner surface of the top portion 63 of the X bracket 240, a plurality of (for example, four) sliders 17b including rolling elements and slidably engaged with the Y linear guides 17a are fixed to the respective X linear guides 17a. .

The X bracket 240 on the other side (-Y side) is symmetrical with respect to one of the X brackets 240, and has the same configuration. Similarly, a pair of X movable members 81 and a plurality of sliders 17b are provided.

Each of the X stator 82 and the X movable member 81 opposed to each other constitutes a moving coil type X linear motor of an electromagnetic force (Lorentz force) driving method. The X coarse motion stage 223x is driven by the X linear motor in the X-axis direction, and at this time, a plurality of X linear guides including the X linear guide 17a and the slider 17b are guided in the X-axis direction.

Referring back to Fig. 8, the weight canceling device 250 has a pair of X arm portions 254 fixed to both side surfaces of the casing 51 in the Y-axis direction. Each of the pair of X-arm portions 254 is formed of a rod-shaped member extending in the X-axis direction, and the length in the X-axis direction is slightly longer than the length in the X-axis direction of the inverted U-shaped portion of the X bracket 240. Each of the pair of X arm portions 254 is connected to the side wall portion 64 of the X bracket 240 through the flexure means 45 at a central position in the X-axis direction of the outer surface in the Y-axis direction. The height of the flexure device 45 substantially coincides with the position of the center of gravity of the weight canceling device 250 in the Z-axis direction. Each of the pair of X arm portions 254 is coupled to the pair of Y arm portions 255 at both end portions in the longitudinal direction. Each of the pair of Y arm portions 255 is formed of a rod-shaped member extending in the Y-axis direction, and the length in the Y-axis direction and the interval between the pair of X brackets 240 are substantially the same length. Further, each of the pair of Y arm portions 255 is connected to the coupling plate 41 through the bending device 45 at a central position in the Y-axis direction of the outer surface in the X-axis direction. In the longitudinal direction end faces of the pair of Y arm portions 255, a fixed gap (clearance/gap) and a pair of X beams 125 are respectively fixed, and each of the X stators 82 is disposed in the Y-axis direction. Sub 82 is opposite to X mover 56. Each X mover 56 includes a not shown The core coil unit constitutes a moving coil type linear motor that drives the weight canceling device 250 in the X-axis direction together with the opposing X stator 82 (magnet unit).

As described above, according to the substrate stage device PST2 of the third embodiment, the same effects as those of the substrate stage device PST1 of the second embodiment can be obtained. In addition, according to the substrate stage device PST2, since the magnetic attraction force acts on both ends of the pair of Y arm portions 255, the force acting on the vertical direction of the weight canceling device 250 can be increased. Further, since the weight canceling device 250 is supported (fixed) by the X arm portion 254 at two places near the center in the longitudinal direction of the Y arm portion 255 by the magnetic attraction force, it is possible to prevent the magnetic attraction force from acting on the Y arm portion 255. The deflection of the Y-arm 255 at the end causes the weight canceling device 250 to generate a certain magnetic attraction.

"Fourth Embodiment"

Next, the fourth embodiment will be described with reference to Figs. 10 to 12 . Here, the same or equivalent components as those of the above-described first embodiment are denoted by the same or similar reference numerals, and the description thereof will be simplified or omitted.

The substrate stage device PST3 of the fourth embodiment has the same overall configuration as the substrate stage device PST, but the X beam 325, the X bracket 340, and the weight canceling device 350 have the same shape as the X beam 25 and the X bracket. The difference between the frame 40 and the weight canceling device 50 is different from that of the substrate stage device PST. Hereinafter, the description will be given focusing on the difference point.

As shown in FIGS. 10 and 11, the pair of X-beams 325 are formed of a rod-shaped member extending in the X-axis direction. Each of the pair of X-beams 325 has a different YZ cross-sectional shape than the X-beam 25. That is, each of the pair of X-beams 325 has a rectangular shape outside the YZ cross section, and has a hollow portion which is divided into two parts in the center of the Y-axis direction and extends in the X-axis direction and has a rib portion parallel to the XZ plane. member. Each of the pair of X beams 325 has an X stator 82 extending in the X-axis direction on both sides in the Y-axis direction. A plurality of (for example, two) X linear guides 17a extending in the X-axis direction at a predetermined interval in the Y-axis direction are fixed.

As shown in FIG. 11, each of the pair of X brackets 340 has a flat plate member 65 extending in the X-axis direction and two side faces in the Y-axis direction at the intermediate portion in the longitudinal direction of the plate member 65. The side wall member 66 parallel to the pair of Z-axis is fixed to the upper surface of the plate member 65 substantially in the same plane. In other words, each of the pair of X brackets 340 has a shape in which the central portion in the X-axis direction has a U-shaped cross section in the YZ cross section, and is disposed so as to straddle each of the pair of X beams 325 (see FIG. 10).

The X bracket 340 of one side (+Y side), as shown in FIG. 10, is fixed to a plurality of (for example, four) slidable cards with respect to the respective X linear guides 17a on the lower surface (top surface) of the plate member 65. The sliding member 17b of the X linear guide 17a is coupled to the inner surface of each of the pair of side wall members 66, and is fixed to each of the opposing sides (clearance/gap) and the pair of X stators 82. Sub 81. The X bracket 340 of the other side (-Y side) is configured similarly to one of the X brackets 340.

As shown in FIG. 11, the pair of X brackets 340 are connected to each other by a connecting plate 341 having a pair of side wall members 66 disposed on the inner side in the Y-axis direction. The connecting plate 341 is formed of a flat plate member having a circular opening portion 342 formed in the center in plan view, and has a predetermined length in the X-axis direction (for example, substantially the same length as the side wall member 66). On the lower surface of the connecting plate 341, a permanent magnet 343 (see FIG. 10) is fixed at a plurality of places around the opening 342 (for example, four at intervals of 90 degrees). The material of the permanent magnet 343 is not particularly limited, and is formed using, for example, a ferrite magnet, a neodymium magnet, and an alnico magnet.

Referring back to FIG. 10, the weight canceling device 350 is inserted into the opening 342 from below and supported by the Y stepping platform 90 through the base pad 55. The weight canceling device 350 is different from the weight canceling device 50 in the shape of the casing 351 and the connection position of the bending device 45.

The casing 351 is composed of a bottomed cylindrical member having an open top. The casing 351 has an annular crotch portion 352 around the bottom surface. The crotch portion 352 is disposed on the upper surface of the outer peripheral portion so as to face the permanent magnet 343 fixed to the coupling plate 341 at a predetermined interval (a predetermined angular interval). When the transmission base pad 55 is mounted on the Y stepping stage 90 in a non-contact state, the weight canceling device 350 is disposed such that the permanent magnet 343 and the magnetic body 353 are opposed to each other by a predetermined clearance (gaceance/gap). The magnetic body 353 is composed of a block member having a certain thickness, and the material is not particularly limited, and is formed using, for example, iron oxide, chromium oxide, cobalt, or ferrite.

The flexure device 45 has a plurality of ends (for example, four) fixed to the outer peripheral surface of the casing 351 at a predetermined interval (a predetermined angular interval), and the other end is fixed to the inner peripheral surface of the opening formed in the connecting plate 341 (refer to FIG. 11). ).

As the permanent magnet 343 fixed to a plurality of places below the connecting plate 341, a single permanent magnet may be used, but it is not limited thereto, and a plurality of magnets may be combined and used.

For example, as shown in FIG. 12(A), one of the permanent magnets 343a and 343b having a different polarity may be fixed at a predetermined interval below the yoke 344 buried under the connecting plate 341, thereby constituting A permanent magnet 343. In the example of Fig. 12(A), the permanent magnet 343a disposed on the -Y side has an S-side on the +Z side and an N-pole on the -Z side, and a permanent magnet 343b on the +Y side on the other hand. The Z side is the N pole and the -Z side is the S pole. A magnetic attraction force Fc is generated between the pair of permanent magnets 343a and 343b and the magnetic body 353. Further, as shown in FIG. 12(B), the permanent magnet 345 may be disposed to face the permanent magnet 343 instead of the magnetic body 353. At this time, the permanent magnet 345 is disposed such that its one side opposite to the permanent magnet 343a is the S pole and the other side opposite to the permanent magnet 343b is the N pole.

As described above, according to the substrate stage device PST3 of the fourth embodiment, the same effects as those of the substrate stage device PST of the first embodiment can be obtained. In addition to this, according to the base Since the plate stage device PST3 does not generate a force for floating the X bracket 340, the floating of the X bracket 340 can be prevented. According to this, in the substrate stage device PST3, the magnetic attraction force Fc generated between the permanent magnet 343 and the magnetic body 353 can be adjusted to an arbitrary size, and as a result, the Y stepping platform 90 and the vibration isolating device can be freely reduced. 34 load.

"First Modification of Fourth Embodiment"

Next, a first modification of the fourth embodiment will be described with reference to Fig. 13 . Here, the same or equivalent components as those of the above-described fourth embodiment are denoted by the same or similar reference numerals, and the description thereof will be simplified or omitted.

In the substrate stage device PST3a of this modification, the position of the flange portion 352 of the weight canceling device 350 in the substrate stage device PST3 is interchanged with the position of the connecting plate 341, and the bending portion 45 is used to bend the flange portion 352. The point at which the X bracket 340 is coupled and the portion of the weight of the fine movement stage 30 acting on the Y stepping platform 90 are alleviated by the magnetic reaction force Fd between the permanent magnet 343 and the permanent magnet 346, The substrate stage device PST3 is different.

As shown in Fig. 13, the weight canceling device 350a of this modification is provided at a position intermediate the Z-axis direction of the casing 351a, specifically, at a height position substantially coincident with the position of the center of gravity of the weight canceling device 350a. . A permanent magnet 343 is fixed to the outer peripheral portion of the lower portion of the crotch portion 352. Further, on the outer peripheral surface of the crotch portion 352, one end of a plurality of (for example, four) flexure means 45 is connected at a predetermined interval (a predetermined angular interval). The other end of the bending device 45 is connected to the side wall member 66 of the X bracket 340 and disposed on the inner side in the Y-axis direction.

The connecting plate 341 that connects the pair of X brackets 340 is fixed to the lower end portions of the side wall members 66 on the inner side in the Y-axis direction in the side wall members 66 of the pair of X brackets 340. Further, around the opening portion on the upper surface of the connecting plate 341, the position opposite to each of the permanent magnets 343 is fixed to the permanent The long magnet 343 produces a permanent magnet 346 that reacts to the magnetic force.

As described above, the substrate stage device PST3a according to the first modification can obtain the same effect as the substrate stage device PST3 of the fourth embodiment, and the crotch portion 352 to which the permanent magnet 343 is fixed is fixed. In the vicinity of the intermediate position in the Z-axis direction of the weight canceling device 350a, the connecting plate 341 to which the permanent magnet 346 is fixed is fixed to the lower end portion of the X bracket 340, so that the Z position of the X beam 325 is disposed at the Z position of the weight canceling device 350a. A few below. According to this, the substrate stage device PST3a can improve the stability when moving in the scanning direction and the scanning intersecting direction.

<<Second Modification of Fourth Embodiment>>

Next, a second modification of the fourth embodiment will be described with reference to Fig. 14 . Here, the same or equivalent components as those of the above-described fourth embodiment are denoted by the same or similar reference numerals, and the description thereof will be simplified or omitted.

In the substrate stage device PST3b of this modification, the shape of the X beam 325b and the shape of the X bracket 340b are different from the shape of the X beam 325 of the substrate stage device PST3 and the shape of the X bracket 340.

Each of the pair of X-beams 325b is formed of a rod-shaped member extending in the X-axis direction, and the shape of the YZ cross section is a substantially isosceles trapezoid having an inverted upper side and a lower side. That is, a pair of X-beams have an upper surface and a lower surface parallel to the XY plane, and a pair of inclined surfaces (both sides in the Y-axis direction) inclined at a predetermined angle θ and -θ in the θx direction with respect to the XZ plane. Similarly to the X beam 325, the X linear guide 17a and the X stator 82 are fixed to the upper surface of the X beam 325b and a pair of inclined surfaces (both sides in the Y-axis direction).

A pair of X brackets 340b, each having a shape of one of the pair of side wall members 68, is different from a pair of side wall members 66 of the X bracket 340. That is, the +Y side and the -Y side are paired with each other. The side wall member 68 has a first portion parallel to the XZ plane from the upper end (+Z side end) to the vicinity of the center portion, and is inclined to the -Y side or the +Y side from the vicinity of the center portion to the lower end (-Z side end). The second portion facing the two oblique faces of the X beam 325b. A sliding member 17b slidably engaged with the X linear guide 17a is fixed to a top surface of the pair of X brackets 340b (under the plate member 65), and a second portion of the inner wall surface of the side wall member 68 is fixed. The X movable member 81 which is opposed to the X stator 82 by a predetermined clearance (clearance/gap) and generates a magnetic attraction Fe is fixed. The magnetic attraction force Fe acting between one of the X-beams 325b and the X-bracket 340b is offset by the horizontal force. Similarly, the magnetic attraction force Fe between the other X-beam 325b and the X-bracket 340b is horizontal. The direction of the force is also offset. That is, the magnetic attraction force Fe acting on the X bracket 340b applies only a component in the vertical direction upward to the X bracket 340b.

As described above, the substrate stage device PST3b according to the present modification can obtain the same effect as the substrate stage device PST3 of the fourth embodiment, and can be obtained by the downward force applied to the X bracket 340b. Since the substrate stage device PST3b is driven in the X-axis direction, the driving resistance generated between the X slider 17b and the X linear guide 17a can be alleviated. Further, since the X movable member 81 and the X fixed member 82 for reducing the magnetic attraction force Fe acting on the downward direction of the X bracket 340b are additionally provided, the generation is made to reduce the effect on the substrate. The weight of the gantry table 33 cancels the permanent magnet 343 and the magnetic body 353 of the magnetic attraction force Fc of one part of the weight of the device 350, and so on, so that it can be set to generate a predetermined magnetic attraction force.

"Fifth Embodiment"

Next, the fifth embodiment will be described with reference to Figs. 15 and 16 . Here, the same or equivalent components as those of the above-described first embodiment are denoted by the same or similar reference numerals, and the description thereof will be simplified or omitted.

The substrate stage device PST4 of the fifth embodiment has an overall configuration and a substrate The stage device PST is the same, but the shape of the X-beam 325, the shape of the X-bracket 440 is different from the shape of the X-beam 25, the shape of the X-bracket 40, and the method of reducing the load on the vibration-damping device 34, and the like. The configuration is different from the substrate stage device PST. Hereinafter, the description will be given focusing on the difference point.

As shown in Fig. 15 and Fig. 16, in the first embodiment, the X-beam 325 is composed of a member having the same shape as the X-beam 325, which is used in the fourth embodiment, and a plurality of X-linear guide members. 17a, a pair of X stators 82 are fixed to the upper surface and a pair of sides.

As shown in FIG. 15 and FIG. 16, the pair of X brackets 440 have a rectangular plate member 59 having a rectangular shape in the longitudinal direction of the X-axis direction, and a state in which the upper end surface and the upper surface of the flat plate member 59 are substantially flush with each other. One side of the one end portion in the longitudinal direction of the plate member 59 and one end surface of the other end portion in the Y-axis direction are fixed, and a total of four side wall members 58 parallel to the Z-axis are provided. The X bracket 440 has an inverted U shape as viewed in the +X direction, and is inserted into the X beam 325 between the +Y side and the -Y side side wall member 58 which are paired with each other. A notch portion 42 is provided near the center portion in the longitudinal direction (X-axis direction) of the X bracket 440 (see FIG. 15).

A pair of X brackets 440 are respectively fixed to the X-shaped linear guides 17a with a plurality of (for example, four) sliders slidably engaged with the X linear guides 17a on the top surface (below the flat member 59). Further, on the inner wall surface of the side wall member 58, an X movable member 81 that transmits a predetermined gap (clearance/gap) and a pair of X stators 82 is fixed.

In the first embodiment, the X movable member 56 is fixed to the front end of the arm portion 54 fixed to one of the weight canceling devices 50, and the load acting on the gravity direction of the vibration isolating device 34 is reduced. As shown in the figure, the weight canceling device 450 of the present embodiment is not provided with the arm portion 54 and the X movable member 56. That is, the weight canceling device 450 is constituted by the casing 51, the air spring 52, the Z slider 53, the base pad 55, and the like. The weight canceling device 450 transmits a plurality of strips connected to the housing 51 (for example, 4) The flexure device 45 is coupled to a pair of X brackets 440. Each of the flexing means 45 is formed at substantially the same height as the center of gravity of the weight canceling means 450.

Returning to Fig. 15, a pair of base frames 414 are respectively formed of rod-like members extending in the Y-axis direction. The pair of base frames 414 respectively include an upper surface and a lower surface parallel to the XY plane, and have one side inclined (slanted surface) slightly inclined in the θx direction with respect to the YZ plane and the other side inclined at the same angle in the opposite direction (−θx direction) The body portion 414a of the hollow member (beveled) and the plurality of leg portions 14b supporting the body portion 414a from below. A plurality of adjusters 14c are provided at the lower end portions of the respective leg portions 14b, and the Z position of the body portion 414a can be adjusted.

A Y stator 73 extending in the Y-axis direction as an element of the linear motor is fixed to both side surfaces (one pair of inclined surfaces) of the main body portion 414a in the X-axis direction. Further, on the upper surface of the main body portion 414a, a plurality of (for example, two) mechanical Y linear guides (single-axis guide devices) extending in the Y-axis direction are fixed in parallel with each other in the Y-axis direction. Y linear guide 16a.

The main body portion 414a is disposed (inserted) between one of the opposing faces (between the side wall members) of the Y bracket 475 formed of a member having an inverted U-shape in the XZ cross section. In the Y bracket 475, a plurality (for example, two) are disposed between the one base frame 414 in the Y-axis direction, and the Y brackets 475 are coupled to each other by the plate 76 fixed to the upper surface. One pair of opposite faces of the Y bracket 475 has a first portion parallel to the YZ plane from the respective upper ends (+Z side ends) to the vicinity of the center portion, and is inclined from the vicinity of the center portion to the lower end (-Z side end) a second portion facing the two sides of the body portion 414a of the base frame 414 on the -X side or the +X side. The Y bracket 475 is set such that the two inclined surfaces of the main body portion 414a are parallel to the second portion of the opposite pair of Y brackets 475 which are opposite to each other in the state of being mounted on the base frame 414. . A pair of Y movable members 472 that are transparent to a predetermined gap (clearance/gap) and a pair of Y stators 73 are fixed to the second portion of the pair of Y brackets 475. Each Y mover 472 includes a not shown The core coil unit, together with the opposing Y stator 73, constitutes a Y linear motor that drives the X beam 325 in a Y-axis direction with a predetermined stroke. Further, a magnetic attraction force Ff is generated between each of the Y movable members 472 and the opposing Y stator 73. Further, on the top surface of the Y bracket 475, a plurality of (for example, two) sliders 16b slidably engaged with the Y linear guide 16a are fixed to the Y brackets 475.

The Y stepping stage 490 is composed of a rod-shaped member extending in the X-axis direction, and is mounted on the substrate stage stand 33. At both ends in the longitudinal direction of the Y stepping stage 490, a Y movable member 94 that is opposed to the Y stator 73 through a predetermined clearance (gearance/gap) is fixed through the fixing member 446. Each of the Y movable members 94 includes a core coil unit (not shown), and constitutes an X linear motor that drives the Y stepping stage 490 in a predetermined stroke in the X-axis direction together with the opposing Y stator 73. Further, a magnetic attraction force Fg is generated between each of the Y movable members 94 and the opposing Y stator 73.

The magnetic attraction force Fg is applied in the +X direction and the +Z direction between the Y movable member 94 fixed to the +X side fixing member 446 of the Y stepping stage 490 and the Y fixed holder 73 opposed thereto, and is fixed to Y in the +X direction and the +Z direction. The magnetic attraction force Fg acts in the -X direction and the +Z direction between the Y movable member 94 of the -X side fixing member 446 of the stepping stage 490 and the Y stator 73 opposed thereto. In this case, since the horizontal force components of the two magnetic attraction forces Fg are equal in magnitude and opposite in direction (positive), they cancel each other. That is, the above two magnetic attraction forces Fg apply a vertical upward force to the Y stepping stage 490, and the reaction force is transmitted to the ground 11 through the base frame 414.

As described above, the substrate stage device PST4 of the fifth embodiment can obtain the same effect as the substrate stage device PST of the first embodiment. Further, in the substrate stage device PST4, since the load applied to the vibration isolating device 34 is reduced, the eccentric load acting on the vibration isolating device 34 when the substrate stage device PST4 is driven can be reduced.

"Modification of the fifth embodiment"

Next, a modification of the fifth embodiment will be described with reference to Fig. 17 . Here, the same or equivalent components as those in the fifth embodiment are denoted by the same or similar reference numerals, and the description thereof will be simplified or omitted.

In the substrate stage device PST4a of the modification, the magnetic member 96 is fixed to the fixing member 446 provided at both end portions in the longitudinal direction of the Y stepping stage 490a, and the magnetic member 96 is fixed to the upper surface of the fixing member 446. Above the magnetic body 96, a predetermined clearance (gearance/gap) is applied to the X bracket 475a at a point where the permanent magnet 97 is provided, which is different from the substrate stage device PST4.

The permanent magnet 97 is actually fixed under the fixing member 478. On the +X side of the Y stepping stage 490a, the fixing member 478 is fixed to each Y bracket 475a in such a manner that a plurality of (for example, two) Y brackets 475a arranged at predetermined intervals in the Y-axis direction are coupled to each other. The upper end of the X side. The permanent magnet 97 is fixed under the fixing member 478 in such a manner as to pass through the predetermined gap and the magnetic body 96. That is, in the Y stepping stage 490a of the present modification, the magnetic attraction generated between the Y stator 73 fixed to the body portion 414a of the base frame 414 and the Y movable member 472 fixed to the Y bracket 475a is applied. The Ff is independently independent of the force generated by the magnetic attraction force Fh generated between the magnetic body 96 and the permanent magnet 97 in the vertical direction. Further, the other portion of the Y bracket 475a has the same configuration as the above-described Y bracket 475.

As described above, the substrate stage device PST4a according to the modification of the fifth embodiment can obtain the same effects as those of the fifth embodiment. In addition, according to the substrate stage device PST4a, since the magnetic attraction force Fh acting in the vertical direction of the Y stepping stage 490a and the magnetic attraction force Ff acting on the Y bracket 475a are generated by the independent magnetic gas generating means, The magnetic attraction force Fh acting on the Y stepping stage 490a and the magnetic attraction force Ff acting on the Y bracket 475a can be set to a predetermined force, respectively. That is, the load (the partial load) acting on the vibration isolating device 34, and the Y linear guide 16a and The driving resistance of the plurality of Y linear guides of the slider 16b is reduced to a predetermined value.

Further, the device configurations described in the first to fifth embodiments and the modifications (hereinafter, referred to as the respective embodiments) are merely examples, and various modifications are of course possible. For example, in the above-described embodiments and the like, the magnetic load or the magnetic repulsion is used to reduce the load acting on the Y stepping platforms 90, 490, and 490a and the gravity of the substrate stage 33 and the vibration isolating device 34. The case of the load is described, but it is not limited thereto, and the electromagnetic force in the direction of the vertical direction component is generated by the linear motor for driving the X coarse motion stage or the linear motor for driving the Y coarse motion stage. In this case, the direct force component of the lead using the electromagnetic force can be used to reduce the load mitigation device acting on the Y stepping platforms 90, 490, and 490a and the gravity-loading load supporting the substrate stage platform 33 and the vibration-proof device 34. It is equipped in the substrate stage devices PST, PST1, PST2, PST3, PST3a, PST3b, PST4, and PST4a.

Further, in place of the combination of the stator (magnet unit) and the movable member (core coil unit) in each of the above embodiments, the load reduction can be configured by a combination of a stator (magnet unit) and a magnetic member. Device. Alternatively, the electromagnet may be used instead of the permanent magnet constituting at least a part of the load mitigation device.

Further, in each of the above embodiments, the substrate stage devices PST, PST1, PST2, PST3, and PST3a including the weight canceling devices 50, 250, 350, 350a, and 450 that move on the Y stepping platforms 90, 490, and 490a are provided. And PST3b, PST4, and PST4a are described, but are not limited thereto, and may be disclosed in a scanning type exposure apparatus including a substrate stage device equipped with a weight canceling device, as disclosed in, for example, the specification of the US Patent Application Publication No. 2010/0018950. a stator (magnet) provided on the Y coarse movement stage and a movable element (coil) provided on the X coarse movement stage are provided to drive the X coarse movement stage in the X-axis direction (scanning direction) by a predetermined stroke. X linear motor, and the use of the role in the composition The force between the coil of the movable member and a portion of the weight canceling device cancels the load reducing device acting on the gravity direction load of the support frame including the platform supporting the weight canceling device from below. In this case, during the exposure processing of the substrate (object), the X coarse movement stage that can move in the direction parallel to the horizontal plane together with the substrate holder (object holding member) holding the substrate is driven by the linear motor in the X-axis direction. . At this time, although the support frame acts on the weight direction load formed by the weight of the substrate holder and the weight canceling device itself, the load can be utilized by the load reducing device to exert a force between a part of the weight canceling device and the weight. The counteracting device reduces the force by moving a portion of the force to the X coarse motion stage. Therefore, it is possible to reduce the eccentric load acting on the support gantry formed by the movement of the center of gravity including the substrate holder, the weight canceling device, and the support stand, thereby maintaining sufficient exposure accuracy.

Further, the modifications of the first to fourth embodiments described above may be used in combination with the fifth embodiment and its modifications. That is, a means for generating a force in the vertical direction upward for the weight canceling devices 50, 250, 350, 350a, 450, and a device for generating a vertical upward force to the Y stepping platforms 90, 490, 490a may be used in combination.

Further, in each of the above embodiments, the pair of X brackets 40, 140, 240, 340, 340b, and 440 are coupled by the connecting plates 41 and 341, but a pair of X brackets may be used instead of the connecting plates 41 and 341. The frame is driven synchronously in the X-axis direction by the main control unit. Similarly, the plurality of Y brackets 75, 475, and 475a mounted on one of the base frames 14, 414 are respectively connected by the plate pieces 76, but a plurality of Y brackets 75 and 475 may be replaced by the plate pieces 76. The 475a is driven synchronously in the Y-axis direction by the main control unit.

Further, in each of the above embodiments, the Y stepping platforms 90, 490, and 490a are solid members, but the present invention is not limited thereto, and may be a hollow member or a shape in which a rib is provided inside the hollow member. For example, a Y stepping platform composed of a hollow member can be manufactured by casting or the like.

Further, in the first embodiment, the bending device 45 that connects the weight canceling device 50 and the X bracket 40 may be arranged such that only the weight canceling device 50 can be pulled in the Y-axis direction. Further, if the weight canceling device 50 is driven together with the X bracket 40 in the X-axis direction and the Y-axis direction by the flexing device 45, the X movable member fixed to the front end of the arm portion 54 of the weight canceling device 50 may be replaced. 56, while fixing the magnetic body.

Further, in the modification of the fourth embodiment and the fourth embodiment, the pair of X brackets 340 and 340b are coupled to the coupling plate 341 having the opening, but the present invention is not limited thereto, and a pair of X brackets may be used. The frames 340 and 340b are connected by a plurality of connecting plates that are disposed apart in the X-axis direction. Further, the crotch portion 352 fixed to the weight canceling devices 350, 350a does not need to be provided over the entire circumference of the weight canceling devices 350, 350a, and may be a rod-like member that protrudes in the outer circumferential direction.

Further, in the modification of the fifth embodiment, the magnetic body 96 is disposed at both end portions in the longitudinal direction of the Y stepping stage 490a. However, the present invention is not limited thereto, and the vertical direction can be applied to the Y stepping platform 490a. The upward force may be sufficient. Therefore, for example, the magnetic body 96 may be disposed through the fixing member at the intermediate portion in the longitudinal direction of the Y stepping platform 490a, and fixed to the lower surface of the X beam 325 by disposing the permanent magnet 97 on the opposite surface thereof. Permanent magnet 97.

Further, the illumination light may be ultraviolet light such as ArF excimer laser light (wavelength 193 nm), KrF excimer laser light (wavelength 248 nm), or vacuum ultraviolet light such as F ₂ laser light (wavelength 157 nm). Further, as the illumination light, for example, a single-wavelength laser light of an infrared band or a visible light band emitted from a DFB semiconductor laser or a fiber laser may be used, for example, an optical fiber amplifier doped with germanium (or both germanium and germanium). The amplitude is converted to the harmonics of ultraviolet light using nonlinear optical crystallization. Further, a solid laser (wavelength: 355 nm, 266 nm) or the like can also be used.

Further, in the above embodiments and the like, the projection optical system PL is provided. The case of the multi-lens projection optical system in which only a plurality of projection optical units are provided has been described, but the number of projection optical units is not limited thereto, and may be one or more. Further, the projection optical system of the multi-lens type is not limited, and a projection optical system using, for example, an OFNER type large-sized mirror may be used. Further, in the above-described embodiment, the case where the projection magnification is equal to the projection optical system PL is described. However, the present invention is not limited thereto, and the projection optical system may be either a reduction system or a large system.

Further, in each of the above-described embodiments, a light-transmitting type reticle having a predetermined light-shielding pattern (or a phase pattern and a light-reducing pattern) formed on the light-transmitting mask substrate is used, but for example, US Pat. No. 6,778,257 As disclosed in the publication, an electronic mask (variable shaping mask) for forming a transmission pattern or a reflection pattern or an illumination pattern according to an electronic material of a pattern to be exposed can be used, for example, a non-light-emitting type image display element (also referred to as A variable-mold mask of a DMD (Digital Micro-mirror Device) of one type of a spatial light modulator.

Further, the exposure apparatus is particularly suitable for exposure of a substrate having a size (including at least one of an outer diameter, a diagonal length, and one side) of 500 mm or more, for example, a large substrate for a flat panel display such as a liquid crystal display element. It is especially effective when it is installed.

Further, the exposure apparatus can also be applied to an exposure apparatus of a step & repeat method and an exposure apparatus of a step & stitch type. In addition, the object to be held by the moving body of the mobile device is not limited to the substrate to be exposed, and the like, and may be a pattern holder (original plate) such as a photomask.

Further, the use of the exposure apparatus is not limited to a liquid crystal exposure apparatus for transferring a liquid crystal display element pattern to a square glass plate, and can be widely applied to, for example, an exposure apparatus for semiconductor manufacturing, a thin film magnetic head, a micromachine, and An exposure device such as a DNA wafer. In addition, not only It is a micro component such as a semiconductor component, and the present invention can also be applied to transfer a circuit pattern for manufacturing a photomask or a reticle for a photoexposure device, an EUV exposure device, an X-ray exposure device, and an electron beam exposure device. Exposure device to a glass substrate or a germanium wafer. Further, the device including the object holding device for holding the object is not limited to the exposure device, and may be another substrate processing device such as a glass substrate (or wafer) inspection device. Further, the object to be exposed is not limited to a glass plate, and may be another object such as a wafer, a ceramic substrate, a film member, or a mask blank. In the case where the object to be exposed is a substrate for a flat panel display, the thickness of the substrate is not particularly limited, and for example, a film-like member having a flexible sheet member is also included.

An electronic component such as a liquid crystal display element (or a semiconductor element) is a step of fabricating a photomask (or a reticle) according to the design of the functional performance of the component, and a step of fabricating a glass substrate (or wafer) In the exposure apparatus and the exposure method thereof according to the above embodiments, the photomask (reticle) pattern is transferred to the lithography step of the glass substrate, the development step of developing the exposed glass substrate, and the remaining resist portion The exposed portions of the other portions are etched by etching, the resist removal step of removing the etching is completed, the resist removal step of the resist, the component assembly step, the inspection step, and the like are performed. In this case, since the exposure method is carried out by using the exposure apparatus of the above-described embodiment in the lithography step, the element pattern is formed on the glass substrate, so that a high-complexity element can be manufactured with good productivity.

In addition, the disclosures of all publications, the International Publications, the U.S. Patent Application Publications, and the U.S. Patent Application Serial No.

Industrial availability

As explained above, the exposure apparatus of the present invention is adapted to expose an object on a board. Further, the method of manufacturing a flat panel display of the present invention is very suitable for developing an object after exposure. Further, the component manufacturing method of the present invention is very suitable for manufacturing microcomponents.

11‧‧‧ Ground

14‧‧‧ pedestal

16a‧‧‧Y linear guide

17a‧‧‧X linear guide

17b‧‧‧Sliding parts

18y‧‧‧Y voice coil motor

22y‧‧‧Y moving mirror

25‧‧‧X beam

26‧‧‧Sensor

27‧‧‧ Subject matter

28‧‧‧Mirror base

30‧‧‧Micro-motion stage

31‧‧‧Substrate holder

33‧‧‧Substrate mounting platform

34‧‧‧Anti-vibration device

35a‧‧‧Y linear guide

35b‧‧‧Sliding parts

40‧‧‧X bracket

41‧‧‧Link board

50‧‧‧Weight offset device

51‧‧‧Shell

52‧‧‧Air spring

53‧‧‧Z slider

54‧‧‧arms

55‧‧‧ base pad (air bearing)

56‧‧‧X movable

57‧‧‧Sealing pad (air bearing)

61‧‧‧Table components

62‧‧‧ sidewall components

70‧‧‧ Leveling device

73‧‧‧Y fixed

75‧‧‧Y bracket

76‧‧‧ plates

81‧‧‧X movable

82‧‧‧X fixed

90‧‧‧Y stepping platform

PST‧‧‧Substrate stage device

Claims (29)

A scanning type exposure apparatus that moves an exposure target object in a first direction parallel to a horizontal plane by a predetermined first stroke during exposure processing, and includes a moving body that can be at least in the first direction The predetermined first stroke moves and can move in the second direction in the second direction orthogonal to the first direction in the horizontal plane; the object holding member can hold the object together with the moving body at least with the horizontal plane Moving in parallel; a weight canceling device supporting the object holding member from below to offset the weight of the object holding member; the support member extending in the first direction, supporting the weight canceling device from below and capable of supporting the weight from below In the state of the canceling device, the second stroke is moved in the second direction; the support frame supports the support member; and the load reducing device reduces the load acting on the support frame in the direction of gravity. The exposure apparatus of claim 1, wherein the load reducing device relieves the load by releasing a portion of the force acting on the weight canceling device to the outside of the support frame. The exposure apparatus of claim 1 or 2, wherein the load reducing means uses a force acting between a portion of the moving body and a portion of the weight canceling means to reduce the load. The exposure apparatus according to any one of claims 1 to 3, wherein the moving body includes a first moving member that is movable at least in the first first stroke in the first direction, and guides the first moving member Moving in the first direction and being in the second direction in the second direction The first moving member moves together with the second moving member in the second stroke. The exposure apparatus of claim 4, wherein the first moving member includes a magnet provided in the second moving member and a linear motor provided in a coil of the first moving member, and the first stroke is used Driving in the first direction; the load reducing device uses a force acting between one portion of the magnet and the weight canceling device or a portion of the supporting member to reduce the load acting on the supporting member in the direction of gravity. The exposure apparatus of claim 5, wherein the weight canceling device is provided with a core coil; the weight canceling device is an electromagnetic force generated by electromagnetic interaction between the magnet and the cored coil, The support member is driven in the first direction; the load reducing device reduces the load by utilizing a magnetic force acting between the magnet and the cored coil. The exposure apparatus of claim 1, wherein the load reducing means reduces the load by using a force acting between a portion of the moving body and a portion of the supporting member. The exposure apparatus of claim 7, wherein the load reducing device relieves the load by releasing a portion of the force acting on the support member to the outside of the support frame. The exposure apparatus of claim 7 or 8, wherein the moving body includes a first moving member that can move at least in the first direction by the predetermined first stroke, and guides the first moving member to the first The direction of movement and the second movement and the first movement in the horizontal plane The second moving member that moves together in the second stroke. The exposure apparatus according to claim 9, wherein the load reducing device reduces the load by using a force acting between the second moving member and the supporting member. An exposure apparatus according to claim 9 or 10, further comprising: a support frame that supports the second moving member and is separated from the support frame by vibration; and the second moving member includes a magnet provided on the support frame And a linear motor provided with the core coil of the second moving member is driven in the second direction by the second stroke; the load reducing device further reduces the magnetic force acting between the magnet and the cored coil The load capacity. The exposure apparatus according to any one of claims 4 to 6, wherein the support member is mechanically coupled to the second moving member by a connecting device, and is transmitted while the second moving member moves. The connecting device is pulled by the second moving member and moved in the second direction. The exposure apparatus of claim 12, wherein the connection device has a lower rigidity in the other direction than the rigidity in the second direction. The exposure apparatus of claim 12, wherein the connection device is connected to the support member at an axis parallel to the second direction through a center of gravity of the support member. The exposure apparatus according to any one of claims 1 to 14, further comprising: a guide comprising an element of a uniaxial guide that mechanically guides movement of the support member in the second direction; The guide is separated from the moving body by vibration. The exposure apparatus of claim 15, wherein the single-axis guiding device is provided at a predetermined interval in the first direction. The exposure apparatus of claim 15 or 16, wherein the guides are disposed apart from each other in the second direction; the support member is mounted on the plurality of guides. The exposure apparatus according to any one of claims 1 to 17, wherein the support member is composed of a medium stone or a hollow cast. The exposure apparatus according to any one of claims 1 to 18, wherein the weight canceling device is mounted on the support member in a non-contact state. The exposure apparatus according to any one of claims 1 to 19, wherein the object holding member is at least in the first direction, the second direction, and an axis orthogonal to the horizontal plane with respect to the moving body Jog. The exposure apparatus of claim 20, wherein the object holding member is further movable relative to the moving body in a direction orthogonal to the horizontal plane and in an axis parallel to the horizontal plane. The exposure apparatus according to any one of claims 1 to 21, further comprising a swing support device that supports the object holding member so as to be swingable about an axis parallel to the horizontal plane. The exposure apparatus of claim 22, wherein the swing support device supports the object holding member in a non-contact manner. The exposure apparatus of claim 22 or 23, wherein the swing support device is supported by the weight canceling device from below; The weight canceling device is mounted on the support member in a non-contact state. The exposure apparatus according to any one of claims 22 to 24, wherein the weight canceling device is provided with a force generating device that generates a force in a vertical direction upward; the swing support device is configured to be orthogonal to the horizontal plane The direction moves, and the force generated by the force generating device is transmitted to the object holding member. A scanning type exposure apparatus that moves an object to be exposed in a first direction parallel to a horizontal plane by a predetermined first stroke during an exposure process, and includes: a first moving member capable of being in the first direction Moving at least in the predetermined first stroke; the second moving member guiding the movement of the first moving member in the first direction and the second direction orthogonal to the first direction in the horizontal plane and the first movement The member moves together in a second stroke; the object holding member holds the object, can move with the first moving member at least in a direction parallel to the horizontal plane; and the weight canceling device supports the object holding member from below to cancel the object holding a weight of the member; the support stand includes a platform for supporting the weight canceling device from below; and the linear motor includes a magnet provided on the second moving member and a coil provided in the first moving member, and the first moving member is used as the weight The first stroke is driven in the first direction; and the load reducing device uses a force acting between the magnet and a portion of the weight canceling device to reduce the action on the branch Truck load of the direction of gravity of the gantry. The exposure apparatus according to any one of claims 1 to 26, wherein the object system is used for a substrate for manufacturing a flat panel display. A method of manufacturing a flat panel display comprising: an operation of exposing the substrate using an exposure apparatus of claim 27; and an operation of developing the substrate after exposure. A method of manufacturing a component, comprising: an action of exposing an object using an exposure device according to any one of claims 1 to 26; and an action of developing the object after exposure.