TW512399B - Coating apparatus - Google Patents

Coating apparatus Download PDF

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Publication number
TW512399B
TW512399B TW089119068A TW89119068A TW512399B TW 512399 B TW512399 B TW 512399B TW 089119068 A TW089119068 A TW 089119068A TW 89119068 A TW89119068 A TW 89119068A TW 512399 B TW512399 B TW 512399B
Authority
TW
Taiwan
Prior art keywords
nozzle
coating
patent application
coating device
scope
Prior art date
Application number
TW089119068A
Other languages
English (en)
Chinese (zh)
Inventor
Kimio Motoda
Yuji Shimomura
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Application granted granted Critical
Publication of TW512399B publication Critical patent/TW512399B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor

Landscapes

  • Coating Apparatus (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
TW089119068A 1999-09-21 2000-09-16 Coating apparatus TW512399B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26676699 1999-09-21

Publications (1)

Publication Number Publication Date
TW512399B true TW512399B (en) 2002-12-01

Family

ID=27677718

Family Applications (1)

Application Number Title Priority Date Filing Date
TW089119068A TW512399B (en) 1999-09-21 2000-09-16 Coating apparatus

Country Status (2)

Country Link
KR (1) KR100665406B1 (ko)
TW (1) TW512399B (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100689703B1 (ko) * 2001-04-19 2007-03-08 삼성전자주식회사 반도체 제조설비의 웨이퍼 포토레지스트 도포유량 감지장치
KR100942588B1 (ko) * 2008-04-18 2010-02-16 주식회사 에이앤디코퍼레이션 기판에 작용하는 충격을 감지하기 위한 기판처리장치와 기판처리방법
JP6018528B2 (ja) * 2013-03-13 2016-11-02 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
KR102410735B1 (ko) * 2021-04-20 2022-06-22 주식회사 에이피솔루션 노즐 압력 측정 시스템

Also Published As

Publication number Publication date
KR20010039897A (ko) 2001-05-15
KR100665406B1 (ko) 2007-01-04

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