TW512399B - Coating apparatus - Google Patents

Abstract

A resist liquid is sprayed from a nozzle of a coating head on a monitoring portion in a standby position on each of pressure sensors. When a pressure value detected at any one of the pressure sensors is abnormal, it is determined that an abnormal condition such as blockage has occurred at spray orifices of the nozzle, and washing of the nozzle is proceeded in a washing portion.

Description

A7 A7

V. Description of the invention (^ [Background of the invention] The present invention belongs to the technical field of processing glass substrates by using photolithography technology. The glass substrate is used in, for example, semiconductor wafers or liquid crystal display devices. The present invention particularly relates to A coating device that applies a coating liquid such as a liquid barrier to a semiconductor wafer or a glass substrate. In the manufacture of liquid crystal display devices, in order to form an ITO film or an electrode pattern on a glass substrate, for example, it is used in semiconductor manufacturing processes. The same technique used in photolithography uses a series of processes to reduce exposure by transferring circuit patterns, etc., transfer to a photoresist, and develop the process. A series of processes like this are performed by a coating display processing system. The structure of the coating display processing system is equipped with a conveying device, a cleaning device, an adhesion processing device, a cooling processing device, a photoresist coating device, a heat treatment device, and a developing device. Among them, a conveying device for conveying, for example, a glass substrate It is set so that β can be moved along the person's conveying path. Then, in this coating development processing system, After the glass substrate is cleaned by the cleaning device, the glass substrate is subjected to hydrophobic treatment with an adhesive treatment device, and after cooling with the cooling treatment device, the photoresist film is coated with a photoresist liquid coating device. After that, the photoresist film is heated by the heat treatment device. After performing pre-baking treatment, and then cooling, the predetermined pattern is exposed by an exposure device connected to the system. The exposed glass substrate is coated with a developing solution by a developing device to develop the image, and then the developing solution is rinsed with a washing solution. After the post-baking process, a series of procedures are ended. In the above-mentioned photoresist coating device, a spin coating method is used, that is, for example, a glass substrate placed on a spin chuck is rotated, and a photoresist liquid is supplied to its rotation center, but The photoresist is applied by the relevant spin coating method, and is supplied to this paper. Applicable to China National Standard (CNS) A4 (210 X 297 mm) ------- I ----- Aw -------- I ^ «— — — — — 1 — (Please read the notes on the back before filling out this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 4 * Consumption of Employees by the Intellectual Property Bureau of the Ministry of Economic Affairs Cooperative printed A7 V. Description of the invention (The photoresist liquid on the soil plate, due to the centrifugal force, a considerable amount of photoresist liquid radiates to the outside of the substrate, and there is a problem of futility. Therefore, the inventors of this case proposed scanning The nozzle that sprays the photoresist liquid on the surface, as far as possible, applies the photoresist liquid only to the necessary range without waste of the photoresist liquid technology. However, in the nozzle of the related structure, When the supply of the liquid is stopped, the photoresist is prevented from dripping from the nozzle ejection hole, so that the diameter of the ejection hole cannot be made large. Therefore, there is a problem that the ejection hole of the nozzle is easy to be blocked. Or it can be found that the coating film on the substrate is disconnected, and the clogging of the ejection holes of this nozzle can be known. However, before this problem is known, poor coating has occurred, resulting in a reduction in production rate. In the case of this clogging, a large amount of poor coating may be caused. [Summary of the Invention] The present invention has been made in view of these problems, and an object of the present invention is to provide a coating device capable of quickly detecting clogging of a discharge hole of a nozzle for coating a liquid. In order to achieve the above object, a main aspect of the present invention is to provide a coating device including a holding portion for holding a substrate, and a spray hole for spraying a coating liquid on the surface of the substrate to be held. The nozzle is a monitoring member for monitoring the state of the coating liquid ejected from the ejection hole. According to the present invention, since the state of the coating liquid ejected from the ejection holes of the nozzles is provided, clogging of the ejection holes of the nozzles can be quickly detected by the related monitoring member. This paper size applies to China National Standard (CNS) A4 specification (210 X 297 mm) -------- 0 · — articles! — I (Please read the phonetic on the back? Matters before filling out this page} 512399 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs

Fig. 1 is an external view of a coating development processing system according to a first embodiment of the present invention. Fig. 2 is an external view showing the structure of a coating device in the coating and solidifying four-door development processing system shown in Fig. 1. Fig. 3 is an external view showing the structure of a coating head in the coating apparatus shown in Fig. 2. Fig. 4 is a schematic front view of the condition of the coating head shown in Fig. 2 in the standby position. Fig. 5 is a side view of the coating head shown in Fig. 4. Fig. 6 is a side view of the coating head shown in Fig. 4. FIG. 7 is an operation flowchart of the coating apparatus shown in FIG. 2. Fig. 8 is a side view of the coating head of the second embodiment. Fig. 9 is a side view of the coating head according to the third embodiment. Fig. 10 is a front view of a coating head according to a fourth embodiment. Fig. 11 is an external view of a coating head according to a fifth embodiment. Fig. 12 is a partial cross-sectional view of the coating head shown in Fig. 11. Fig. 13 is an external view of a coating head according to a sixth embodiment. Fig. 14 is a side view of a coating head according to a seventh embodiment. Fig. 15 is a side view of the coating head according to the eighth embodiment. Fig. 16 is a front view of a coating head according to a ninth embodiment. [Embodiments of the present invention] Embodiments of the present invention will be described below with reference to the drawings. In the following examples, the paper size applicable to the coating development processing system applies the Chinese National Standard (CNS) A4 specification (210 X 297 public love). 6 • ---- Γ! ------- Order --------- (Please read the precautions on the back before filling out this page) A7 A7 、 Printing of garments by employees' consumer cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs

V. Description of the Invention The invention will be described on the occasion of J. The coating development processing system is used to develop an exposed glass substrate, wherein a photoresist film is formed on the glass substrate. First, a first embodiment will be described. Fig. 1 is an external view showing the structure of a coating development processing system according to the first embodiment. The coating development processing system 1 shown in the same figure mainly includes a glass substrate G for carrying in and taking out ( Hereinafter, the loading section of the substrate ⑺, the first processing section 3 of the substrate G, and the second processing section 5 provided in connection with the first processing section 3 through the relay section 4. Further, it is used to make a predetermined photoresist film. The exposure device 6 for fine pattern exposure can be connected to the second processing section 5 through a transfer section 7. The loading section 2 is provided with a cassette station 10, and an S-body 11 for accommodating the unprocessed substrate G. 'And the K-shaped body I holding the processed substrate 0] are placed in plural freely. In order to carry in and out the substrate G between the cassettes 忉 and ^, the horizontal (χ, γ) direction and vertical Boards that move in the (Z) direction and can be red-turned in the (0) direction The pin set 13 is structured. The first processing unit 3 is provided with a main substrate transfer device 15 that can move in the X, γ, and ζ directions and rotate in the 0 direction, and the main substrate transfer device 15 can be set on the transfer path 16 The brush cleaning device 17 and the developing device 18 for brushing and cleaning the substrate Q are arranged side by side on one side of the conveying path, and the surface of the substrate G is subjected to thinning treatment on the other side of the conveying path 11 The adhesive treatment device 19, the heat treatment device 20 for heating and baking after the development processing, and the cooling treatment device 21 for cooling the substrate G to a predetermined temperature are in a multi-stage configuration. This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) ------- II --- · ----- II--IIIIIII 1 ^ (Please read the notes on the back before filling this page) A7 B7 V. Description of the invention () (Please Read the note on the back? Matters before filling out this page) In the second processing section 5, the same as the first processing section 3, is equipped with a main body that can move in the X, Y, and Z directions and can rotate in the 0 direction Substrate transfer device 22 'The main substrate transfer device 22 is set so that The conveying path 23 is moved, and a coating device 24 is arranged on one side of the conveying path 23. On the other side of the conveying path 23, a heat treatment device 20 and a cooling treatment device for post-baking the substrate after heating the photoresist liquid are applied. The 21 is a multi-stage arrangement. The transfer unit 7 is provided with a cassette 25 for temporarily waiting for the substrate G, a transfer pin group 26 for transferring substrates G to and from the cassette 25, and a transfer platform 27 for the substrate. 2nd The figure is an external view showing the structure of the coating device 4. The coating device 24 is roughly provided with a holding plate 31 at the center as a holding member for holding the substrate G. The holding plate 31 is provided with the holding plate 31 and can be A plurality of retaining pins protruding from the surface (not shown). Then, in a state where the holding pins protrude from the surface of the holding plate 31, the holding pins are transferred through the opening portion 32 of the coating device 24 between the main substrate transfer device 2 and the holding pins are hidden from the surface of the holding plate 31 and the substrate G is loaded. In a state of being placed on the holding plate 31, a coating process can be performed. The consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs prints on both sides along the X direction of the coating device, for example, an X-direction conveying member 33 made of an endless belt, and the Y-direction conveying member 34 straddles these X-direction conveying members 33. While configuring. A driving portion 35 is provided at one end of the X-direction conveying member 33 on one side to drive the X-direction conveying member 33 formed of, for example, an endless belt, and convey the Y-direction conveying member 34 in the X direction. In addition, a conveying section 37 is movably arranged on the Y-direction conveying member 34 to convey the coating head 36 in the Y-direction along the Y-direction conveying member 34, and at the same time, the paper size in the Z direction is adapted to the Chinese National Standard (CNS) A4 size (210 X 297 mm) -8-512399 A7 The invention description printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economy (Drop Drive. In addition, a standby position 41 is provided on the side adjacent to the holding plate 31 for use in When the photoresist is not applied to the substrate G, the coating head 36 is placed on standby. Then, the coating head 36 is conveyed between the holding plate 31 and the standby position 41 by the above-mentioned conveying system. The external view of the structure of the coating head 36. Also, FIG. 4 is a schematic front view showing the state of the coating head 36 in the standby position 41, and FIGS. 5 and 6 are side views of FIG. 4. The body of the coating head 36 A nozzle 40 is provided at the lower part of the 38, and the nozzle is arranged with a plurality of (for example, five) ejection holes 39 for passing through the pump 42 toward the surface of the substrate G held by the holding plate 31 from the photoresist liquid storage. The photoresist in the tank 43 is supplied to the nozzle 40. The other side A monitoring unit 44 and a cleaning unit 45 are arranged adjacent to each other at the standby position 41. The monitoring unit 44 is provided with a monitoring member according to the present invention, and the cleaning unit is provided with the cleaning member according to the present invention. In 44, five pressure sensors 46 are provided in a row corresponding to each ejection hole 39, and are used to detect when the coating head 36 is transported to the upper part of the monitoring unit 44 as shown in FIG. The discharge pressure of the photoresist liquid ejected from each of the ejection holes 39 of 40. In addition, the photoresist liquid ejected from each ejection hole 39 toward the pressure sensor 46 is discharged through the ejection holes 47 to the outside. A container 48 is disposed in the cleaning unit 45, and the container material stores, for example, acetone as a cleaning liquid. As shown in FIG. 6, when the cleaning nozzle 40 is cleaned, the coating head is moved to the top of the container 48 redundantly. From this position, descend in the container until the nozzle 40 is immersed in the cleaning solution. -------------- Install i — (Please read the precautions on the back before filling in this (Page) Order ·-Line · This paper size is applicable to China National Standard (CNS) A4 (210 X 297 public love) 9 Intellectual Property Bureau of the Ministry of Economic Affairs A7 ~ ^ -----— _B7________ printed by the agency V. Description of the invention (7) As shown in Fig. 4, the result detected by the pressure sensor 46 is sent to the control section 49, and the control section 49 is based on the detected As a result, the conveyance system and the like of Kuriura 42 and the cloth head 36 are controlled. Next, the operation of the coating development processing system 丨 configured as described above will be described. The unprocessed substrate G inside is transferred to the main substrate transfer device 15 of the first processing unit 3 and then transferred to the brush cleaning device 17. The substrate G that has been cleaned by the brush in the brush cleaning device 17 is subjected to a hydrophobization treatment by the adhesion processing device 19 and cooled by the cooling processing device 21, and is then placed on the relay unit 4. The main substrate transfer device 22 of the second processing unit 5 receives this substrate G and transfers it to the coating device 24. In the coating device 24, a holding pin (not shown) receives the substrate G from the main substrate transfer device 22 in a state protruding from the surface of the holding plate 31, and then the substrate g is placed on the surface of the holding plate 31 by being hidden. On the holding plate 31. At that time, the application head 36 is attached to the monitoring unit 44 in the standby position 41 shown in FIG. 5. Here, FIG. 7 is a flowchart showing the operation when the coating head 36 is in the standby position 41. The nozzle 40 of the coating head 36 on the monitoring unit 44 in the standby position 41 emits light toward each pressure sensor 46. Liquid blocking (step 701). Then, when the normal pressure is detected by each of the pressure sensors 46 (step 702), the count value of the counter in the control unit 49 described below is reset to zero (step 703), and the coating operation is started. On the other hand, when any pressure sensor 46 detects that the pressure value is abnormal (including zero), more specifically, for example, the Chinese paper standard (CNS) A4 (210 X 297 mm) 10 — IIIIIII * I! IIIII · 11111111 (Please read the precautions on the back before filling out this page) 399 2399 Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 5. Description of the invention () When the value is low, that is, it is determined that the nozzle 40 has an abnormality such as clogging of the discharge hole 39, and the cleaning process of the nozzle 40 is performed in the cleaning unit 45 (step 704). Then, when the washing process is completed, the count value of the counter in the control unit 49 is incremented by one (in this case, the count value is one) (step 705), and the operations of steps 701 and 702 are performed again. The washing process of step 704 is repeated until no pressure abnormality is detected, but in the case where the counter of the control unit 49 counts to 5 'and the pressure abnormality is still detected after five repeated clogging and washing processes ( Step 706), that is, it is judged that the clogging of the nozzle 40 and the like cannot be cleared by the cleaning process, and an alarm is issued from a display portion or a speaker which is omitted in the figure (step 707). Sending such an alarm prevents futile ineffective cleaning. Furthermore, in the above-mentioned example, although the alarm was issued at a count value of 5, this value is merely an example, and it is needless to say that the value is equal to or lower than this value. With the above operations, the nozzle 40 starts the application of the photoresist under normal conditions and when the clogging is cleared. That is, by scanning with a scanning mechanism constituted by the X-direction conveying member 33, the γ-direction conveying member 34, the driving section 35, and the conveying section 37, each of the ejection holes 39 of the nozzle 40 is scanned while scanning the coating head 36 '. A photoresist is supplied to the surface of the substrate 0. As an example of scanning, the arrangement direction of the ejection holes 39 of the adjustment nozzle 40 is parallel to the X direction, and the coating head 36 is conveyed by the scanning mechanism from the X direction side end of the substrate G to the γ direction. Next, with the scanning mechanism, the coating head 36 moves in the X direction only by the coating pitch of the entire nozzle 40, and the scanning head transports the coating head 36 in the γ direction. Hereinafter, scanning is repeated in this way, thereby scanning the coating head 36 over the entire range of the substrate G, and coating the photoresist liquid over the entire range of the substrate G. This paper size applies to China National Standard (CNS) A4 specification (210 X 297). 11 I 1 ^ ------- (Please read the precautions on the back before filling this page)

V. Description of the invention (9) Next, the substrate G coated with the photoresist liquid is heated by the heat treatment device 20 and subjected to a baking treatment to cool the treatment device 2 and then the exposure device 6 is used to make a predetermined pattern. exposure. Then, the exposed substrate 0 is transferred to the developing device 18, and after developing with the developing solution, the developing solution is rinsed with a washing solution to complete the developing process. After that, it is heated in a heat treatment apparatus 20 to perform a firing process and cooled in a cooling treatment apparatus 21, and the processed substrate ^ is stored in the case 12 of the loading section 2 to end a series of processes. With the coating device 24 in the coating development processing system 1 of this embodiment, the nozzles 40 of the coating head 36 on the monitoring unit 44 in the standby position 41 are ejected toward the pressure sensors 46. The photoresist liquid, when any pressure sensor 46 detects an abnormal pressure value, that is, it is judged that the nozzle 40 has an abnormality such as a blockage of the discharge hole 39, and the cleaning process of the nozzle is performed in the cleaning unit 45. No human intervention is required, and the photoresist liquid is not coated properly due to blockage of the ejection hole 39 of the nozzle 40. In addition, by ejecting the photoresist liquid from the nozzle 40 before the application, it is possible to simultaneously perform the discharging operation of the old photoresist liquid remaining on the tip of the nozzle 40 before the application. Furthermore, in the above-mentioned embodiment, the nozzle 40 is cleaned with a cleaning solution. As a second embodiment, for example, an ultrasonic vibration element is provided around each of the ejection holes 39 of the nozzle 40 shown in FIG. 8. 81. The high frequency is supplied from a predetermined high frequency source, and the nozzle 40 can also be cleaned. Thus, it is not necessary to provide the washing unit 45 in the standby position 41. In this way, when the photoresist liquid is supplied to the nozzle 40, the photoresist liquid which is excited by the ultrasonic vibration can pass through the nozzle 40, which can prevent the screen mesh of the nozzle from being blocked, and replace the photoresist with a cleaning solution. The structure that the liquid is ejected from the ejection hole through the nozzle 40 can improve the washing paper size of the nozzle 40 and apply the Chinese National Standard (CNS) A4 specification (210 X 297 mm)-I IAW ^ illlll — ^ «— — — 1 — (Please read the precautions on the back before filling out this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 12 • Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 5. Description of the invention (3 Net capacity. In the above-mentioned embodiment, clogging of the nozzle 40 can be detected by the pressure sensor 46 disposed in the monitoring unit 44, but as a third embodiment, as shown in FIG. 9, the tip of the nozzle 40 is integrally formed. An optical sensor 91 is provided to irradiate light toward the photoresist liquid ejected from each of the ejection holes 39 of the nozzle 40, and the clogging of the ejection hole 29 is detected based on the reflected light. The structure without a monitoring age member may also ... and as an optical type For example, if the sensor is provided with a pair of light-emitting elements and light-receiving elements inserted into the ejection holes 39, it is also possible to detect clogging of the ejection holes by transmitting light. Thus, it is not necessary to provide a monitoring unit 44 in the standby position 41. Furthermore, As another example of the monitoring member in the fourth embodiment, as shown in FIG. 10, the pressure sensor 102 for detecting the supply pressure of the photoresist liquid in the supply line 10m may not be provided, and the supply line The 1001 system pressure-feeds the photoresist liquid to the nozzle 40. As a fifth embodiment, as shown in Figs. 11 and 12, the nozzle 140 has a two-layer structure adjacent to the base portion 137 and the tip portion 138. The tip end portion 138 of the nozzle 140 can also be designed to slide along the base portion 137. In this case, the ejection hole 139 is provided at the tip portion 138, and the photoresist passes through the hollow portion provided at the base portion 137 and the tip portion 138. The ejection hole 139 is provided for ejection. In this embodiment, since the tip end portion 138 of the nozzle 140 is made slidable, when the tip end portion 138 is cleaned, the surface on the base portion 137 side of the ejection hole 139 and Both surfaces of the base 137 can be immersed in the cleaning solution Therefore, the washing residue easily flows out, and the surface of the base portion 137 side of the ejection hole 139 can be sufficiently washed. It is better that the tip portion 138 is made removable, and the paper size applies the Chinese national standard. (CNS) A4 specification (210 X 297 mm) 13 -------------- ^ --- I --- I --1! $ (Please read the precautions on the back before (Fill in this page) 512399

V. Description of the Invention (11) Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. Although the second embodiment is provided with an ultrasonic vibration element 81 around the ejection hole 39, in the sixth embodiment, as in the i 3 As shown in the figure, an ultrasonic vibration device composed of a vibrating body 110 and an ultrasonic vibration element lu. The eight body is pressed against the nozzle 40 perpendicularly to the scanning direction of the nozzle 40, and it is also preferable to eject the medical liquid supplied from the medical liquid supply pipe 109 while the ultrasonic wave is emitted by the ultrasonic oscillator 112. . In the case of using a photoresist liquid as a medicinal solution, the photoresist liquid which is excited by an ultrasonic wave can pass through a nozzle to prevent clogging of a screen. In addition, when a cleaning solution such as acetone is used as a chemical solution, compared with the case where only the cleaning solution is used, ultrasonic vibration can improve the cleaning effect. Also, although the ultrasonic vibration element 81 is provided around the ejection hole 39 in the second embodiment, in the seventh embodiment, as shown in FIG. 14, an ultrasonic vibration element may be provided in the container 48. 181, and the ultrasonic nozzle 40 was cleaned. In the eighth embodiment, as shown in FIG. 5, the photoresist liquid supply pipe 117 and the photoresist liquid or the cleaning liquid nitrogen supply tube 116 may be provided to supply the cleaning liquid into the nozzle. 40 structure. The photoresist liquid supply pipe 117, the cleaning pipe and the nitrogen supply pipe 116 are connected to the switching valve 119. By switching the switching valve 119, 'the photoresist liquid is supplied into the nozzle 々q, or the cleaning liquid or nitrogen is It is supplied into the nozzle 40. Nitrogen is supplied to the washing liquid-nitrogen supply pipe 116 through the washing liquid supply pipe 120 and the washing liquid or nitrogen supply pipe 121. The cleaning liquid supply pipe 120 and the nitrogen supply pipe 121 are connected to the switching valve 118, and thereby the switching valve π 8 can be switched, and it is possible to select whether the cleaning liquid or nitrogen is supplied to the cleaning liquid-nitrogen supply pipe 116. In addition, there is a paper size applicable to the Chinese National Standard (CNS) A4 (210 X 297 mm) 14 ί ^ --- — — — — — ^^ !! (Please read the precautions on the back before filling in this Page) 512399 M Printed by the Consumers ’Cooperative of the Ministry of Economic Affairs, Ministry of Economic Affairs, A7, B7 V. Description of the Invention (3 Exhaust pipe 123 that exhausts the gas in the nozzle 40, and the exhaust of the gas in the nozzle 40 is adjusted by opening and closing the valve 122. In the case where the photoresist liquid is ejected in the eighth embodiment, the valve 122 is closed. In order to supply the photoresist liquid from the photoresist liquid supply pipe 117 to the nozzle 40, the switching valve 119 is switched. Then, the nozzle is switched. When the screen 40 is blocked, the switching valve 119 is switched, and the cleaning liquid is supplied into the nozzle 40 through the cleaning liquid and nitrogen supply pipe 116. In this way, the screen is blocked and solidified. The photoresist liquid is dissolved and removed by the washing liquid. Then, the switching valve 118 is switched and nitrogen is supplied to the washing liquid and nitrogen supply pipe 116. This nitrogen gas is supplied into the nozzle 40 through the switching valve 119 The cleaning liquid in the nozzle is dried by nitrogen. Nitrogen is supplied to The valve 122 is opened, and the gas in the nozzle 40 is drawn out through the exhaust pipe 123. Although the pressure sensor is provided in each of the ejection holes in the first embodiment, as shown in FIG. 16, in the ninth implementation, In the example, the nozzle can also be divided into three regions, each region is provided with three ejection holes 39, and each region I is provided with a pressure sensor 146. In this case, each ejection pressure in the region is 'Uniformity' enables uniform application of a photoresist liquid on the surface of the substrate. A CCD camera can also be installed as a monitoring member. In this case, the CCD camera can be used to obtain the liquid ejected from each of the ejection holes of the nozzle. Image information of the photoresist solution, and then, for example, input two image information into an image processing device, perform binary processing on the difference image that has been subtracted, and perform a pattern matching method to check the difference between the two image information. Compare the spraying state of the photoresist liquid of each ejection hole, and can detect the clogging of the ejection hole. Or, if the ejection hole is not blocked, apply the Chinese National Standard (CNS) A4 to the image paper size regulation Grid (210 X 297 mm) 15 i ----------- install --------- order-I ϋ n ϋ · 1 ϋ I line (Please read the precautions on the back first (Fill in this page again) 512399 A7

V. Description of the invention (13) The information is recorded in the image processing device. As a pre-comparison pattern, it is determined whether the image processed by the image information obtained by the CCD camera after image processing is consistent with the pre-recorded pattern. Ejection holes are blocked. In addition, in the present invention, for example, the substrate is not limited to a glass substrate 'semiconductor wafer or the like. The coating liquid is not limited to a photoresist liquid, and a coating liquid for an insulating film is also preferable. From the above description, according to the present invention, clogging and the like of the ejection holes of the nozzles for applying the coating liquid can be quickly detected. Moreover, such flaws can be removed without human intervention. Comparison of component numbers 矣 Please read the note before reading

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Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 1 ·· Coating development processing system 3 ·· 1st processing unit 5 ··· 2nd processing unit 7 ··· Transferring unit 11… Box 13… 16 ... Transportation path 18 ... Development device 20 ... Heat treatment device 22 ... Main substrate transfer device 24 ... Coating device 2 6 ... Pin set 31 ... Holding section 2 ... Loading section 4 ··· Relay 6. ···································································· 23 ... transport path 25 .. box 27 .. transfer station 32 .. opening I order

This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)

Description of the invention ("Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 33 " · X-direction conveying member 35 ··. Driving section 3 8 ... Body 40 ... Nozzle 42 ... Pump 44 ... · Monitoring section 34 ... Transfer in Υ direction Member 36 ... Coating head 39 ... Ejection hole 41 ... Standby position 43 ... Photoresist liquid storage tank 45 ... Washing section 46 ... Pressure sensor 48 ... Container 81 ... Ultrasonic vibration element 101 ... Supply line 91 ... Optical sensor 102 ... Pressure sensor 109 ... Medicine liquid supply tube 110 ... Vibration, a eight body 111 ... Ultrasonic vibration element 112 ... Ultrasonic vibrator 116 ... Washing liquid • Nitrogen supply pipe 117 ... Photoresist liquid supply pipe 118 ... Switching valve 119 ... Switching valve 120 ... Washing liquid supply pipe 121 ... Nitrogen supply pipe 122 ... Switching valve 123 ... Exhaust pipe 137 ... base 138 ... tip 139 ... ejection hole 140 ... nozzle 146 ... pressure sensor G ... glass substrate 181 ... ultrasonic vibration element This paper applies Chinese National Standard (CNS) A4 Specifications (210 x 297 mm) 17 -------------- i II --- I ^ im! ^ Γ4 Read the precautions on the back before filling Write this page}

Claims (1)

512399 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 6. Scope of patent application 1. A coating device includes: a solid # section for holding a substrate; a nozzle with a spray hole for holding the subject A coating liquid is sprayed from the surface of the substrate; and a monitoring member for monitoring the state of the coating liquid sprayed from the spray hole. 2. If the coating device of the first scope of the patent application, the coating device also has a transfer device, which can transfer the nozzle between a coating position and a standby position 'at the coating position' by the nozzle The substrate held by the holding element is coated with the coating liquid, and in this standby position, the nozzle is in a standby state without coating the coating liquid, and the monitoring member is a pressure sensor and is arranged in the standby position. For detecting the spraying pressure of the coating liquid sprayed from the nozzle. 3. The coating device according to item 2 of the patent application, wherein the nozzle is provided with a plurality of ejection holes. 4. The coating device according to item 3 of the patent application scope, wherein the pressure sensor is provided for each ejection hole. 5. The coating device according to item 2 of the scope of patent application, wherein the nozzle is divided into a plurality of areas, and a plurality of the aforementioned ejection holes are respectively provided, and each of the foregoing areas is provided with the aforementioned pressure sensing, respectively. Device. 6. The coating device according to item i of the patent application scope, wherein the monitoring member is an optical sensor and is integrated with the nozzle, and is used to irradiate the coating liquid sprayed by the nozzle with light. Or transmit light to monitor the state of the coating liquid sprayed from the spray holes. This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) -18- -------- ^ «— —— — — I — (Please read the notes on the back before filling in this Page) 512399 A8 B8 C8 D8, patent application scope printed by the Intellectual Property Bureau of the Ministry of Economic Affairs, employee consumer cooperatives. 7 If the patent application scope of the first coating device, the monitoring member has a CCD photography beech to capture the ejection hole Image information of the sprayed coating liquid. 8. If the coating device in the scope of patent application No. 7 is used for image processing. 9 · If the coating device in the scope of patent application No. 8 is binary processing of this image information. 10. If the coating device in the scope of patent application No. 8 is graphic matching the image information (11. If the coating device in the scope of patent application No. 1 is used to send coating hydraulic pressure to the supply line of the nozzle, The monitoring member is a pressure sensor, which is used to detect the supply pressure of the coating liquid in the supply pipeline. 12 · The coating device of item 6 of the patent application, wherein the nozzle is provided with a plurality of ejections 13. If the coating device according to item 1 of the scope of patent application has a judging member and a cleaning member, the judging device can judge whether the state of the ejection hole is deteriorating based on the monitoring result obtained by the monitoring member, The cleaning member is used to clean the nozzle when it is judged that the state of the ejection hole is deteriorating. 14. If the coating device of the scope of application for item 13 of the application, wherein the cleaning member is an ultrasonic vibration element, It is arranged near the ejection hole of the nozzle. 15. The coating device according to item 13 of the patent application scope of the application, wherein the washing device is a container for storing the washing liquid, and the nozzle is immersed in the container. The image information is its In the image processing, the coating device has a device in the image processing. ------------- * ----- II Orders !!! (Please read the back first Please fill in this page for jL matters) This paper size applies to China National Standard (CNS) A4 (210x 297 mm) -19- 512399 Scope of patent application In the washing liquid printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. 16. The coating device according to item 15 of the application, wherein the container has an ultrasonic vibration element. 17. The coating device according to item 15 of the patent application, wherein the nozzle includes a tip end portion having a spray hole and a base portion adjacent to the tip portion and having a hollow portion communicating with the spray hole, and the tip portion And can slide along the base. 18. The coating device according to item 15 of the scope of patent application, the nozzle includes a tip portion having a spray hole and a base portion adjacent to the tip portion and having a hollow portion communicating with the spray hole, and the tip portion is not Removable from this base. 19. The coating device according to item 13 of the application, wherein the cleaning member is a cleaning liquid supply pipe for supplying the cleaning liquid into the nozzle. 20. The coating device according to item 19 of the scope of application for a patent, comprising: a coating liquid supply pipe for supplying the coating liquid into the nozzle; and a switching member for switching the nozzle from the cleaning liquid supply pipe to the nozzle. Switching between supplying the cleaning liquid and spraying the coating liquid from the coating liquid supply pipe. 21 · If the coating device under the scope of application for patent No. 13 has a device that can issue a specific warning to monitor the state of the coating liquid sprayed from the spray hole of the nozzle after the cleaning member is cleaned, And when the state is not good, a specific alert is given. This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) -20------- J -------------_ Order ·! ----- (Please read the notes on the back before filling this page)