TW502247B - Touch panel to form the conductive film by using plating - Google Patents

Touch panel to form the conductive film by using plating Download PDF

Info

Publication number
TW502247B
TW502247B TW089123212A TW89123212A TW502247B TW 502247 B TW502247 B TW 502247B TW 089123212 A TW089123212 A TW 089123212A TW 89123212 A TW89123212 A TW 89123212A TW 502247 B TW502247 B TW 502247B
Authority
TW
Taiwan
Prior art keywords
plating
mask
touch panel
patent application
touch
Prior art date
Application number
TW089123212A
Other languages
English (en)
Chinese (zh)
Inventor
Deuk-Soo Pyun
Original Assignee
Hantouch Com
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hantouch Com filed Critical Hantouch Com
Application granted granted Critical
Publication of TW502247B publication Critical patent/TW502247B/zh

Links

Classifications

    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/1851Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Theoretical Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Human Computer Interaction (AREA)
  • Position Input By Displaying (AREA)
TW089123212A 2000-08-04 2000-11-03 Touch panel to form the conductive film by using plating TW502247B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020000045181A KR20020011716A (ko) 2000-08-04 2000-08-04 도금방식에 의한 도체박막을 사용하는 터치판넬

Publications (1)

Publication Number Publication Date
TW502247B true TW502247B (en) 2002-09-11

Family

ID=19681699

Family Applications (1)

Application Number Title Priority Date Filing Date
TW089123212A TW502247B (en) 2000-08-04 2000-11-03 Touch panel to form the conductive film by using plating

Country Status (2)

Country Link
KR (1) KR20020011716A (ko)
TW (1) TW502247B (ko)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100898221B1 (ko) 2007-04-30 2009-05-18 안영수 정전용량방식 터치스크린 및 그 제조방법
US9069418B2 (en) 2008-06-06 2015-06-30 Apple Inc. High resistivity metal fan out
AU2013273801B2 (en) * 2008-06-06 2015-08-27 Apple Inc. High resistivity metal fan out
KR100908101B1 (ko) * 2008-10-01 2009-07-16 신와전공 주식회사 터치패널의 제조방법 및 이에 의해 제조되는 터치패널
KR101052768B1 (ko) * 2009-12-31 2011-08-01 한국과학기술원 도체 박막 필기 입력 장치와 이의 제조 방법
KR20120032734A (ko) 2010-09-29 2012-04-06 삼성모바일디스플레이주식회사 터치스크린패널 및 그 제조방법
US9491852B2 (en) 2010-10-15 2016-11-08 Apple Inc. Trace border routing
KR101155462B1 (ko) * 2010-10-26 2012-06-15 엘지이노텍 주식회사 터치 스크린 제조방법
KR101655485B1 (ko) * 2010-12-23 2016-09-07 엘지이노텍 주식회사 터치 패널 및 이의 제조 방법
KR101368994B1 (ko) * 2011-08-03 2014-02-28 박준영 터치 패널용 패드의 제조 방법
KR101405697B1 (ko) * 2014-01-17 2014-06-10 엘지이노텍 주식회사 터치 패널 및 이의 제조 방법
KR102650309B1 (ko) * 2018-09-19 2024-03-22 삼성디스플레이 주식회사 터치 감지 유닛 및 이를 포함하는 표시장치

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0161462B1 (ko) * 1995-11-23 1999-01-15 김광호 액정 디스플레이에서의 게이트 패드 형성방법
KR19990034633A (ko) * 1997-10-30 1999-05-15 전주범 박막형 광로 조절 장치의 제조 방법
KR100385644B1 (ko) * 2000-02-17 2003-05-28 아이티엠 주식회사 마스크를 이용한 배선전극용 박막형성 공정 및 레이저가공 공정을 갖는 터치패널 제조방법
KR100378792B1 (ko) * 2000-02-29 2003-04-07 엘지전자 주식회사 디스플레이 패널의 전극 및 그 제조방법

Also Published As

Publication number Publication date
KR20020011716A (ko) 2002-02-09

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MM4A Annulment or lapse of patent due to non-payment of fees