TW442435B - Device for conveying substrates through a substrate processing plant - Google Patents

Device for conveying substrates through a substrate processing plant Download PDF

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Publication number
TW442435B
TW442435B TW087105544A TW87105544A TW442435B TW 442435 B TW442435 B TW 442435B TW 087105544 A TW087105544 A TW 087105544A TW 87105544 A TW87105544 A TW 87105544A TW 442435 B TW442435 B TW 442435B
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substrate
conveyor belt
scope
patent application
item
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TW087105544A
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Klaus Weber
Bernd Mahner
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Steag Hamatech Gmbh Machines
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67706Mechanical details, e.g. roller, belt
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B23/00Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67712Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26Apparatus or processes specially adapted for the manufacture of record carriers

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Structure Of Belt Conveyors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Threshing Machine Elements (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Delivering By Means Of Belts And Rollers (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Attitude Control For Articles On Conveyors (AREA)
  • Drying Of Solid Materials (AREA)
  • Removal Of Insulation Or Armoring From Wires Or Cables (AREA)
  • Supply And Installment Of Electrical Components (AREA)

Description

442435 五、發明説明(1.) 本發明係關於一種藉一基板處理設備以驅動基板之裝 置》 此類驅動基板,特別是CD,藉由冷卻設備及脫乾設備 之裝置早為習知。驅動時,基板位於一在環形軌道上運動 之籃内,或是在相應之環形裝置内設計之開口中^此類旋 轉輸送裝置有極大之尺寸,需要很大的驅動裝置,因而此 類習知之裝置價格極為昂贵。除此之外,運送或收回此類 具基板之旋轉輸送裝置極為困難且需極高昂之設計費用。
,1T 針對上述種類之裝置,也有人使用蝸桿軸,在軸轉動 時,位在蝸桿螺紋内之基板同時被推向前運動。不過此方 法之缺點為,在蝎桿軸及基板間有相對運動,因而會出現 磨擦,造成磨損,並導致污染。 本發明之任務係製作一種藉一基板處理設備用以驅動 基板之裝置’其避免基板在環形軌道上之旋轉運動或基板 磨損,並且設計簡單、省空間及容易操作。 經濟部中央怵率局®:工消費合作社印製 依本發明所提出之任務,乃藉一基本輸送帶,及二側 輸送帶加以解決’在側輸送帶上設有凹槽,用以垂直承載 基板。根據本發明特徵,使用三個輸送帶,則產生基板之 線性運動,且優點為,此裝置極為簡單、省空間且無磨損 。除此之外’可極易依實際需要’例如依基板大小,加以 調整。 在一依本發明所作之、特別有利之實施形式中,用以 垂直承載基板之凹槽是被設計成齒形皮帶之輸送帶之歯間 空間。此類之齒形皮帶可以極低之成本製造出。 尽紙诋尺展遘用肀冢標率(CNS > A4说格{ 2丨0X297公# > -4-
經满部中灰梂咪鈞貝-1消#合作社印W ^ 442435 五、發明説明(2·) 為使本發明之輸送裝置有調節特性,侧輸送帶至基本 輸送帶間之距離可加以變化》藉調節側輸送帶至基本輸送 帶間之距離,此裝置可應用於不同尺寸之基板。 另一較佳發明實施形式為,二側輸送帶之輸送平面與 基本輸送帶之輸送平面間之角度可加以變化。如此,在輸 送帶内用來輸送基板之支持位置可作最佳之調整。除此之 外’此裝置亦可以一些簡單之措施而適應不同之基板形狀 ’或基板尺寸,不論其為圓形或方形。在基板為方形時, 側輸送帶之輸送平面與基本輸送帶之輸送平面間之角度最 好為90° 〇 若基板為圓形時,例如CD或DVD,二側輸送帶之輸 送平面與基本輸送帶之輸送平面間之角度最好大於90。, 如此’可輕易地將基板從本發明之輸送裝置中取出或置入 ,而基板在輪送裝置内之存放仍極為安全及可靠。 輸送帶最好是藉回轉輪及驅動輪加以導引,若各輸送 帶或至少一個輸送帶,在輸送平面相對之侧,也就是在驅 動側,被設計成齒形皮帶時,此回轉輪及驅動輪最好是齒 輪。因此,將輸送帶兩面均設計為齒形皮帶是極有利的。 在一極有利之發明實施形式中,三個輸送帶中的每一 個都是在自身之輸送帶裝置中被導引,並以自身之驅動器 加以驅動。如此,各個輸送帶單元都是獨立的單元,因而 各輸送帶可對不同的基板做不同之設置,調節及定向。 在一極有利之實施形式中,各輸送帶之驅動器是相互 同步加以驅動,如此三個驅動帶不僅有相同之驅動速度, 本紙浪尺度適用中®困家橾準(CNS > A4规格< 2丨0X297公釐) (J,n 間漬斤而之t項.^:JAV':>4 打)
經洧部中央櫺率扃努工消f合作社印掣 >442 4 3 5 五、發明説明(3·) 也有一致的凹槽方向,以承載基板β除此同步控制外,三 輸送裝置或三輸送帶之驅動亦可以一共同之齒輪箱,最好 是無齒隙之齒輪箱取代,以使三驅動帶有同步之運動且使 凹槽可安全地承載基板。此截輪箱可由一與三輸送帶共同 之驅動器加以驅動。 輸送帶,或至少輸送帶與基板接觸之部分,最好是由 特殊材料組成,以防止污染,特別是由鐵弗龍或對污染不 敏感之材料,或易於清洗之材料所组成。 將基板裝入本發明裝置或三輸送帶中,或從其中取出 ,最好是以真空吸盤及/或内吸盤,其作用在例如CD之内 孔周邊。此類之吸盤非常簡單,而且可防止處理過程後基 板之污染。 本發明之輸送裝置應用在基板脫乾機或基板冷卻機特 別有利’這些機器特別是應用於CD之製造" 此處所謂之基板,是指所有圓盤狀之處理物體,也就 是說’不僅包括CD,例如影音CD,ROM-CD,可錄CD (CDR) ’數位影音光碟(DVD),也包括用於製造半導體元件、顯示 器之光軍等β 以下藉一實施例,以圖說明本發明,各圖顯示之内容 如下: _一 脫乾設備用於本發明輸送裝置之側視圖,脫乾 設備用以將CD脫乾, 明二 圈一裝置之俯視圖, 圈三 沿圖一中截面線III-III之放大截面圖, 紙適用中國明家揉準(_規格(脈.2^ {邛"閱硪疗而之·;ί·4^.,αήίΑ(:,,)本 Κ ) .-1·
*1T Γ 442435 Μ滴部中央梂準局:β:工消费合作社印掣 Λ7 H7 五、發明説明(4·) 圖四 沿圖一中截面線IV-IV之放大截面囷。 如圖所示,本發明裝置有一具基本輸送帶2之第一輸 送帶裝置1、一具側輸送帶4之第二輸送帶裝置3,及一具 另一側輸送帶6之第三輸送裝置5。輸送帶2、4、6為承載 基板7’在所有輸送帶上設計有凹槽或齒形皮帶之齒間空間 。特別是從圖一及四可明顯看出,輸送帶2、4、6之驅動 是藉一共同之驅動裝置8,其經一驅動帶9驅動齒輪箱1〇 ,然後又使三輸送帶2'4'6同步運動。 在所顯示之用於基板脫乾之本發明運動裝置實施形式 中’有一吹氣裝置11設置在運動裝置整個長度大部分範圍 内,藉此,被吹氣裝置加熱之、或從外輸入加熱之空氣吹 在位於輸送帶2、4、6上之、以連續或步進方式輸送之基 板7上’以將之脫乾。使用過之脫乾空氣被引出脫乾區域 ,並導入出口開口 11、12内。 以上藉一較佳實施例說明了本發明。專業人士可作出 各種變化及設計’但均不背離本發明構想。例如,輸送帶 單元1、3、5可各自獨立加以設計,使之相互間可改變位 置,以使同一輸送裝置應用於不同之基板7上。在所示之 實施例中,基板7是圓形的,且側輸送帶4、6與基本輸送 帶2之輸送平面間有一大於90°之角度,以使基板7固持 在基板圓盤下半部之三個支持位置上。對較大之圓形基板7 ,只需將側輸送帶單元3、5向外偏置,必要時改變側輸送 帶單元對基本輸送帶2之角度,以獲得最佳之基板支撐。 若基板為長方形或正方形時,則將側輸送帶裝置如此設置 < 閱;*斤而之大)
本紙张疋度適用中國國家榡準(CNS > Λ4現格(2I0X29T公《 ) 颇漪部中夫標率局貝工消貧合作社印¾ Γ 442435_____ 五、發明説明(5.) 或旋轉,以使側輸送帶4、6與基本輸送帶2之輸送平面呈 垂直。 本紙张尺度通用中®國家標牟(CMS ) M«L格(2ΪΟΧ297公> --------------------ή------tH t^lly^开而之;i-vvfJn4JA.;;i·本 π }

Claims (1)

  1. ^42435a| C8 _ D8 六、申請專利範圍 利案申諸鼻利簌岡倏ΐί太 1. —種藉一基板處理設備(11)以驅動基板(7)之裝置 ’有一基本輸送帶(2)及二側輸送帶(4、6),各輸 送帶上均有與運輸方向垂直之凹槽,以垂直承載基板( 7) ’其特徵為’侧輸送帶(4、6)間之距離及/或至基 本輸送帶(2)間之距離可加以變化,及至少一個側輸 送帶(4、6)之輸送平面與基本輸送帶(2)之輸送平 面間之角度可加以變化。 2. 根據申請專利範圍第丨項所述之裝置,其特徵為,凹槽 是設計成齒形皮帶輸送帶(2、4、6)之齒間空間。 3·根據申請專利範圍第1項所述之裝置,其特徵為,二侧 輸送帶(4、6)之輸送平面與基本輸送帶(2)之輸送 平面間之角度大於9〇。。 4_根據申請專利範圍第1項所述之裝置,其特徵為,各輸 送帶是由回轉輪及驅動輪,或回轉及驅動輥加以導引。 5. 根據申請專利範圍第1項所述之裝置,其特徵為,各輸 送帶(2、4、6)在自身之輸送帶單元(1、3、5)内被 導引’而且以自身之驅動器加以驅動。 6. 根據申請專利範圍第5項所述之裝置,其特徵為,三輸 送帶單元(2、4、6)之驅動乃相互同步控制。 7. 根據申請專利範圍第5項所述之裝置,其特徵為,三輸 送帶單元(1 ' 3、5)之驅動器是經一共同之齒輪箱( 1〇)而相互聯接。 根據申請專利範園第1項所述之裝置’其特徵為,輸送 (請先《讀背面之注意事項再填寫本頁) ---— — — —^7-------1藝妙 經濟部智慧財產局負工消费合作社印製
    4 4 2 4 3 5 &8 ____ gg___— 、申請專利範圍 帶(2、4、6)至少在與基板(7)相接觸之部分是由鐵 弗龍組成。 9.根據申請專利範圍第I項所述之裝置,其特徵為,至少 設有一真空吸盤,以進行基板(7)之裝入及/或取出。 10,根據申請專利範圍第丨項所述之裝置,其特徵為,至少 設有_内吸盤,以進行基板(7)之襞入及/或取出。 n.根據申請專利範圍第1項至第10項中任-項所述之裝 置,其特徵為,此基板處理設備是—基板脫乾機或一基 板冷卻機(11、12、13)。 I I I J--Ί^ΙΊ —--訂1!_線〆 (請先閲讀背面之注意事項再填窝本頁) 經濟部智慧財產局貝工消费合作社印製 適 度 尺 張 紙 本 NS) (C 揉 家 10 (2 #( 规 公
TW087105544A 1997-04-17 1998-04-13 Device for conveying substrates through a substrate processing plant TW442435B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19716123A DE19716123C2 (de) 1997-04-17 1997-04-17 Vorrichtung zum Bewegen von Substraten durch eine Substrat-Behandlungseinrichtung

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TW442435B true TW442435B (en) 2001-06-23

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US (1) US6241079B1 (zh)
EP (1) EP0976146B1 (zh)
JP (1) JP3155015B2 (zh)
KR (1) KR100347199B1 (zh)
CN (1) CN1111898C (zh)
AT (1) ATE220476T1 (zh)
CA (1) CA2285393C (zh)
DE (2) DE19716123C2 (zh)
DK (1) DK0976146T3 (zh)
ES (1) ES2180168T3 (zh)
HK (1) HK1027671A1 (zh)
IL (1) IL131893A0 (zh)
TW (1) TW442435B (zh)
WO (1) WO1998048450A1 (zh)

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DE19530858C1 (de) * 1995-08-22 1997-01-23 Siemens Ag Ansaugplatte für Wafer

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ATE220476T1 (de) 2002-07-15
ES2180168T3 (es) 2003-02-01
DE59804726D1 (de) 2002-08-14
WO1998048450A1 (de) 1998-10-29
HK1027671A1 (en) 2001-01-19
CN1252892A (zh) 2000-05-10
JP2000510654A (ja) 2000-08-15
JP3155015B2 (ja) 2001-04-09
US6241079B1 (en) 2001-06-05
EP0976146A1 (de) 2000-02-02
EP0976146B1 (de) 2002-07-10
CA2285393A1 (en) 1998-10-29
DE19716123A1 (de) 1998-10-22
KR100347199B1 (ko) 2002-08-03
CA2285393C (en) 2003-06-17
KR20010005923A (ko) 2001-01-15
DE19716123C2 (de) 2000-01-27
DK0976146T3 (da) 2002-11-04
IL131893A0 (en) 2001-03-19
CN1111898C (zh) 2003-06-18

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