TW442435B - Device for conveying substrates through a substrate processing plant - Google Patents
Device for conveying substrates through a substrate processing plant Download PDFInfo
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- TW442435B TW442435B TW087105544A TW87105544A TW442435B TW 442435 B TW442435 B TW 442435B TW 087105544 A TW087105544 A TW 087105544A TW 87105544 A TW87105544 A TW 87105544A TW 442435 B TW442435 B TW 442435B
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- 239000000758 substrate Substances 0.000 title claims abstract description 56
- 230000018044 dehydration Effects 0.000 claims description 6
- 238000006297 dehydration reaction Methods 0.000 claims description 6
- 239000004809 Teflon Substances 0.000 claims description 2
- 229920006362 Teflon® Polymers 0.000 claims description 2
- 238000004898 kneading Methods 0.000 claims 1
- 238000010276 construction Methods 0.000 abstract 1
- 230000002079 cooperative effect Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000001360 synchronised effect Effects 0.000 description 3
- 238000007664 blowing Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 241000239226 Scorpiones Species 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000000875 corresponding effect Effects 0.000 description 1
- 230000003670 easy-to-clean Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B23/00—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67712—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Structure Of Belt Conveyors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Threshing Machine Elements (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Delivering By Means Of Belts And Rollers (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Attitude Control For Articles On Conveyors (AREA)
- Drying Of Solid Materials (AREA)
- Removal Of Insulation Or Armoring From Wires Or Cables (AREA)
- Supply And Installment Of Electrical Components (AREA)
Description
442435 五、發明説明(1.) 本發明係關於一種藉一基板處理設備以驅動基板之裝 置》 此類驅動基板,特別是CD,藉由冷卻設備及脫乾設備 之裝置早為習知。驅動時,基板位於一在環形軌道上運動 之籃内,或是在相應之環形裝置内設計之開口中^此類旋 轉輸送裝置有極大之尺寸,需要很大的驅動裝置,因而此 類習知之裝置價格極為昂贵。除此之外,運送或收回此類 具基板之旋轉輸送裝置極為困難且需極高昂之設計費用。
,1T 針對上述種類之裝置,也有人使用蝸桿軸,在軸轉動 時,位在蝸桿螺紋内之基板同時被推向前運動。不過此方 法之缺點為,在蝎桿軸及基板間有相對運動,因而會出現 磨擦,造成磨損,並導致污染。 本發明之任務係製作一種藉一基板處理設備用以驅動 基板之裝置’其避免基板在環形軌道上之旋轉運動或基板 磨損,並且設計簡單、省空間及容易操作。 經濟部中央怵率局®:工消費合作社印製 依本發明所提出之任務,乃藉一基本輸送帶,及二側 輸送帶加以解決’在側輸送帶上設有凹槽,用以垂直承載 基板。根據本發明特徵,使用三個輸送帶,則產生基板之 線性運動,且優點為,此裝置極為簡單、省空間且無磨損 。除此之外’可極易依實際需要’例如依基板大小,加以 調整。 在一依本發明所作之、特別有利之實施形式中,用以 垂直承載基板之凹槽是被設計成齒形皮帶之輸送帶之歯間 空間。此類之齒形皮帶可以極低之成本製造出。 尽紙诋尺展遘用肀冢標率(CNS > A4说格{ 2丨0X297公# > -4-
經满部中灰梂咪鈞貝-1消#合作社印W ^ 442435 五、發明説明(2·) 為使本發明之輸送裝置有調節特性,侧輸送帶至基本 輸送帶間之距離可加以變化》藉調節側輸送帶至基本輸送 帶間之距離,此裝置可應用於不同尺寸之基板。 另一較佳發明實施形式為,二側輸送帶之輸送平面與 基本輸送帶之輸送平面間之角度可加以變化。如此,在輸 送帶内用來輸送基板之支持位置可作最佳之調整。除此之 外’此裝置亦可以一些簡單之措施而適應不同之基板形狀 ’或基板尺寸,不論其為圓形或方形。在基板為方形時, 側輸送帶之輸送平面與基本輸送帶之輸送平面間之角度最 好為90° 〇 若基板為圓形時,例如CD或DVD,二側輸送帶之輸 送平面與基本輸送帶之輸送平面間之角度最好大於90。, 如此’可輕易地將基板從本發明之輸送裝置中取出或置入 ,而基板在輪送裝置内之存放仍極為安全及可靠。 輸送帶最好是藉回轉輪及驅動輪加以導引,若各輸送 帶或至少一個輸送帶,在輸送平面相對之侧,也就是在驅 動側,被設計成齒形皮帶時,此回轉輪及驅動輪最好是齒 輪。因此,將輸送帶兩面均設計為齒形皮帶是極有利的。 在一極有利之發明實施形式中,三個輸送帶中的每一 個都是在自身之輸送帶裝置中被導引,並以自身之驅動器 加以驅動。如此,各個輸送帶單元都是獨立的單元,因而 各輸送帶可對不同的基板做不同之設置,調節及定向。 在一極有利之實施形式中,各輸送帶之驅動器是相互 同步加以驅動,如此三個驅動帶不僅有相同之驅動速度, 本紙浪尺度適用中®困家橾準(CNS > A4规格< 2丨0X297公釐) (J,n 間漬斤而之t項.^:JAV':>4 打)
經洧部中央櫺率扃努工消f合作社印掣 >442 4 3 5 五、發明説明(3·) 也有一致的凹槽方向,以承載基板β除此同步控制外,三 輸送裝置或三輸送帶之驅動亦可以一共同之齒輪箱,最好 是無齒隙之齒輪箱取代,以使三驅動帶有同步之運動且使 凹槽可安全地承載基板。此截輪箱可由一與三輸送帶共同 之驅動器加以驅動。 輸送帶,或至少輸送帶與基板接觸之部分,最好是由 特殊材料組成,以防止污染,特別是由鐵弗龍或對污染不 敏感之材料,或易於清洗之材料所组成。 將基板裝入本發明裝置或三輸送帶中,或從其中取出 ,最好是以真空吸盤及/或内吸盤,其作用在例如CD之内 孔周邊。此類之吸盤非常簡單,而且可防止處理過程後基 板之污染。 本發明之輸送裝置應用在基板脫乾機或基板冷卻機特 別有利’這些機器特別是應用於CD之製造" 此處所謂之基板,是指所有圓盤狀之處理物體,也就 是說’不僅包括CD,例如影音CD,ROM-CD,可錄CD (CDR) ’數位影音光碟(DVD),也包括用於製造半導體元件、顯示 器之光軍等β 以下藉一實施例,以圖說明本發明,各圖顯示之内容 如下: _一 脫乾設備用於本發明輸送裝置之側視圖,脫乾 設備用以將CD脫乾, 明二 圈一裝置之俯視圖, 圈三 沿圖一中截面線III-III之放大截面圖, 紙適用中國明家揉準(_規格(脈.2^ {邛"閱硪疗而之·;ί·4^.,αήίΑ(:,,)本 Κ ) .-1·
*1T Γ 442435 Μ滴部中央梂準局:β:工消费合作社印掣 Λ7 H7 五、發明説明(4·) 圖四 沿圖一中截面線IV-IV之放大截面囷。 如圖所示,本發明裝置有一具基本輸送帶2之第一輸 送帶裝置1、一具側輸送帶4之第二輸送帶裝置3,及一具 另一側輸送帶6之第三輸送裝置5。輸送帶2、4、6為承載 基板7’在所有輸送帶上設計有凹槽或齒形皮帶之齒間空間 。特別是從圖一及四可明顯看出,輸送帶2、4、6之驅動 是藉一共同之驅動裝置8,其經一驅動帶9驅動齒輪箱1〇 ,然後又使三輸送帶2'4'6同步運動。 在所顯示之用於基板脫乾之本發明運動裝置實施形式 中’有一吹氣裝置11設置在運動裝置整個長度大部分範圍 内,藉此,被吹氣裝置加熱之、或從外輸入加熱之空氣吹 在位於輸送帶2、4、6上之、以連續或步進方式輸送之基 板7上’以將之脫乾。使用過之脫乾空氣被引出脫乾區域 ,並導入出口開口 11、12内。 以上藉一較佳實施例說明了本發明。專業人士可作出 各種變化及設計’但均不背離本發明構想。例如,輸送帶 單元1、3、5可各自獨立加以設計,使之相互間可改變位 置,以使同一輸送裝置應用於不同之基板7上。在所示之 實施例中,基板7是圓形的,且側輸送帶4、6與基本輸送 帶2之輸送平面間有一大於90°之角度,以使基板7固持 在基板圓盤下半部之三個支持位置上。對較大之圓形基板7 ,只需將側輸送帶單元3、5向外偏置,必要時改變側輸送 帶單元對基本輸送帶2之角度,以獲得最佳之基板支撐。 若基板為長方形或正方形時,則將側輸送帶裝置如此設置 < 閱;*斤而之大)
本紙张疋度適用中國國家榡準(CNS > Λ4現格(2I0X29T公《 ) 颇漪部中夫標率局貝工消貧合作社印¾ Γ 442435_____ 五、發明説明(5.) 或旋轉,以使側輸送帶4、6與基本輸送帶2之輸送平面呈 垂直。 本紙张尺度通用中®國家標牟(CMS ) M«L格(2ΪΟΧ297公> --------------------ή------tH t^lly^开而之;i-vvfJn4JA.;;i·本 π }
Claims (1)
- ^42435a| C8 _ D8 六、申請專利範圍 利案申諸鼻利簌岡倏ΐί太 1. —種藉一基板處理設備(11)以驅動基板(7)之裝置 ’有一基本輸送帶(2)及二側輸送帶(4、6),各輸 送帶上均有與運輸方向垂直之凹槽,以垂直承載基板( 7) ’其特徵為’侧輸送帶(4、6)間之距離及/或至基 本輸送帶(2)間之距離可加以變化,及至少一個側輸 送帶(4、6)之輸送平面與基本輸送帶(2)之輸送平 面間之角度可加以變化。 2. 根據申請專利範圍第丨項所述之裝置,其特徵為,凹槽 是設計成齒形皮帶輸送帶(2、4、6)之齒間空間。 3·根據申請專利範圍第1項所述之裝置,其特徵為,二侧 輸送帶(4、6)之輸送平面與基本輸送帶(2)之輸送 平面間之角度大於9〇。。 4_根據申請專利範圍第1項所述之裝置,其特徵為,各輸 送帶是由回轉輪及驅動輪,或回轉及驅動輥加以導引。 5. 根據申請專利範圍第1項所述之裝置,其特徵為,各輸 送帶(2、4、6)在自身之輸送帶單元(1、3、5)内被 導引’而且以自身之驅動器加以驅動。 6. 根據申請專利範圍第5項所述之裝置,其特徵為,三輸 送帶單元(2、4、6)之驅動乃相互同步控制。 7. 根據申請專利範圍第5項所述之裝置,其特徵為,三輸 送帶單元(1 ' 3、5)之驅動器是經一共同之齒輪箱( 1〇)而相互聯接。 根據申請專利範園第1項所述之裝置’其特徵為,輸送 (請先《讀背面之注意事項再填寫本頁) ---— — — —^7-------1藝妙 經濟部智慧財產局負工消费合作社印製4 4 2 4 3 5 &8 ____ gg___— 、申請專利範圍 帶(2、4、6)至少在與基板(7)相接觸之部分是由鐵 弗龍組成。 9.根據申請專利範圍第I項所述之裝置,其特徵為,至少 設有一真空吸盤,以進行基板(7)之裝入及/或取出。 10,根據申請專利範圍第丨項所述之裝置,其特徵為,至少 設有_内吸盤,以進行基板(7)之襞入及/或取出。 n.根據申請專利範圍第1項至第10項中任-項所述之裝 置,其特徵為,此基板處理設備是—基板脫乾機或一基 板冷卻機(11、12、13)。 I I I J--Ί^ΙΊ —--訂1!_線〆 (請先閲讀背面之注意事項再填窝本頁) 經濟部智慧財產局貝工消费合作社印製 適 度 尺 張 紙 本 NS) (C 揉 家 10 (2 #( 规 公
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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DE19716123A DE19716123C2 (de) | 1997-04-17 | 1997-04-17 | Vorrichtung zum Bewegen von Substraten durch eine Substrat-Behandlungseinrichtung |
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TW442435B true TW442435B (en) | 2001-06-23 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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TW087105544A TW442435B (en) | 1997-04-17 | 1998-04-13 | Device for conveying substrates through a substrate processing plant |
Country Status (14)
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US (1) | US6241079B1 (zh) |
EP (1) | EP0976146B1 (zh) |
JP (1) | JP3155015B2 (zh) |
KR (1) | KR100347199B1 (zh) |
CN (1) | CN1111898C (zh) |
AT (1) | ATE220476T1 (zh) |
CA (1) | CA2285393C (zh) |
DE (2) | DE19716123C2 (zh) |
DK (1) | DK0976146T3 (zh) |
ES (1) | ES2180168T3 (zh) |
HK (1) | HK1027671A1 (zh) |
IL (1) | IL131893A0 (zh) |
TW (1) | TW442435B (zh) |
WO (1) | WO1998048450A1 (zh) |
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DE10028399A1 (de) * | 2000-06-13 | 2001-12-20 | Krauss Maffei Kunststofftech | Kühlstation |
US6913136B2 (en) * | 2002-08-22 | 2005-07-05 | Townend Engineering Company | Apparatus and method for positioning separately supplied elongate meat products |
DE102006035647A1 (de) * | 2006-07-31 | 2008-02-07 | Kaindl Flooring Gmbh | Vorrichtung zum Herstellen oder/und Bearbeiten von Paneelen |
ATE449021T1 (de) | 2007-05-04 | 2009-12-15 | Rena Sondermaschinen Gmbh | Vorrichtung und verfahren zur vereinzelung |
DE102008060014A1 (de) * | 2008-11-24 | 2010-05-27 | Gebr. Schmid Gmbh & Co. | Verfahren und Vorrichtung zur Handhabung eines zersägten Waferblocks |
DE102009027280A1 (de) * | 2009-06-29 | 2011-03-03 | Robert Bosch Gmbh | Vorrichtung zum Transportieren von Behältern |
DE102009042912B4 (de) * | 2009-09-24 | 2016-03-17 | Solarworld Industries Sachsen Gmbh | Transportvorrichtung |
CN106076893B (zh) * | 2016-07-29 | 2018-06-19 | 芜湖市振华戎科智能科技有限公司 | 一种加密光盘生产线的印刷输送装置 |
CN214298240U (zh) * | 2020-11-30 | 2021-09-28 | 京东方科技集团股份有限公司 | 基板传送装置 |
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---|---|---|---|---|
US4217977A (en) * | 1978-09-15 | 1980-08-19 | The Silicon Valley Group, Inc. | Conveyor system |
NL8400294A (nl) * | 1984-01-31 | 1985-08-16 | Thomassen & Drijver | Inrichting voor het transporteren van ronde, platte voorwerpen. |
US4795022A (en) * | 1985-01-29 | 1989-01-03 | Burtons Gold Metal Biscuits Limited | Biscuit conveyor |
CH674974A5 (zh) * | 1987-05-11 | 1990-08-15 | Praezisions Werkzeuge Ag | |
KR0133676B1 (ko) * | 1987-12-07 | 1998-04-23 | 후세 노보루 | 웨이퍼 이동 교체 장치 및 방법 |
DE4341634A1 (de) * | 1993-12-07 | 1995-06-08 | Leybold Ag | Vorrichtung für den Transport von scheibenförmigen Substraten in einer Vakuumbeschichtungsanlage |
DE19529945C2 (de) * | 1995-08-16 | 1997-12-11 | Leybold Ag | Vorrichtung zum Greifen und Halten eines flachen Substrats |
DE19530858C1 (de) * | 1995-08-22 | 1997-01-23 | Siemens Ag | Ansaugplatte für Wafer |
-
1997
- 1997-04-17 DE DE19716123A patent/DE19716123C2/de not_active Expired - Lifetime
-
1998
- 1998-04-09 DE DE59804726T patent/DE59804726D1/de not_active Expired - Lifetime
- 1998-04-09 IL IL13189398A patent/IL131893A0/xx not_active IP Right Cessation
- 1998-04-09 AT AT98921450T patent/ATE220476T1/de not_active IP Right Cessation
- 1998-04-09 CA CA002285393A patent/CA2285393C/en not_active Expired - Fee Related
- 1998-04-09 JP JP54493698A patent/JP3155015B2/ja not_active Expired - Fee Related
- 1998-04-09 WO PCT/EP1998/002083 patent/WO1998048450A1/de active IP Right Grant
- 1998-04-09 KR KR1019997009000A patent/KR100347199B1/ko not_active IP Right Cessation
- 1998-04-09 CN CN98804234A patent/CN1111898C/zh not_active Expired - Fee Related
- 1998-04-09 DK DK98921450T patent/DK0976146T3/da active
- 1998-04-09 ES ES98921450T patent/ES2180168T3/es not_active Expired - Lifetime
- 1998-04-09 EP EP98921450A patent/EP0976146B1/de not_active Expired - Lifetime
- 1998-04-09 US US09/403,330 patent/US6241079B1/en not_active Expired - Fee Related
- 1998-04-13 TW TW087105544A patent/TW442435B/zh active
-
2000
- 2000-10-23 HK HK00106720A patent/HK1027671A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
ATE220476T1 (de) | 2002-07-15 |
ES2180168T3 (es) | 2003-02-01 |
DE59804726D1 (de) | 2002-08-14 |
WO1998048450A1 (de) | 1998-10-29 |
HK1027671A1 (en) | 2001-01-19 |
CN1252892A (zh) | 2000-05-10 |
JP2000510654A (ja) | 2000-08-15 |
JP3155015B2 (ja) | 2001-04-09 |
US6241079B1 (en) | 2001-06-05 |
EP0976146A1 (de) | 2000-02-02 |
EP0976146B1 (de) | 2002-07-10 |
CA2285393A1 (en) | 1998-10-29 |
DE19716123A1 (de) | 1998-10-22 |
KR100347199B1 (ko) | 2002-08-03 |
CA2285393C (en) | 2003-06-17 |
KR20010005923A (ko) | 2001-01-15 |
DE19716123C2 (de) | 2000-01-27 |
DK0976146T3 (da) | 2002-11-04 |
IL131893A0 (en) | 2001-03-19 |
CN1111898C (zh) | 2003-06-18 |
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