TW429458B - An electron gun used in an electron beam exposure, apparatus - Google Patents

An electron gun used in an electron beam exposure, apparatus

Info

Publication number
TW429458B
TW429458B TW088108845A TW88108845A TW429458B TW 429458 B TW429458 B TW 429458B TW 088108845 A TW088108845 A TW 088108845A TW 88108845 A TW88108845 A TW 88108845A TW 429458 B TW429458 B TW 429458B
Authority
TW
Taiwan
Prior art keywords
grid
electron beam
high voltage
cathode
electron
Prior art date
Application number
TW088108845A
Other languages
English (en)
Inventor
Yoshihisa Ooae
Takamasa Satoh
Akio Yamada
Hiroshi Yasuda
Original Assignee
Advantest Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advantest Corp filed Critical Advantest Corp
Application granted granted Critical
Publication of TW429458B publication Critical patent/TW429458B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/48—Electron guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/24—Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for
    • H01J37/241—High voltage power supply or regulation circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
TW088108845A 1998-06-18 1999-05-28 An electron gun used in an electron beam exposure, apparatus TW429458B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17177098A JP4052731B2 (ja) 1998-06-18 1998-06-18 電子銃

Publications (1)

Publication Number Publication Date
TW429458B true TW429458B (en) 2001-04-11

Family

ID=15929364

Family Applications (1)

Application Number Title Priority Date Filing Date
TW088108845A TW429458B (en) 1998-06-18 1999-05-28 An electron gun used in an electron beam exposure, apparatus

Country Status (6)

Country Link
US (1) US6252344B1 (zh)
JP (1) JP4052731B2 (zh)
KR (1) KR100313845B1 (zh)
DE (1) DE19927036C2 (zh)
GB (1) GB2338589B (zh)
TW (1) TW429458B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI405235B (zh) * 2007-12-21 2013-08-11 Applied Materials Inc 充電腹鈑或箔之方法

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4214616B2 (ja) * 1999-05-18 2009-01-28 株式会社ニコン 電子銃、電子線露光転写装置及び半導体デバイスの製造方法
US6472673B1 (en) * 1999-07-29 2002-10-29 Ims Ionen-Mikrofabrikations Systeme Gmbh Lithographic method for producing an exposure pattern on a substrate
US6590216B1 (en) * 2000-01-27 2003-07-08 Nikon Corporation Servo control for high emittance electron source
EP1760762B1 (en) * 2005-09-06 2012-02-01 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Device and method for selecting an emission area of an emission pattern
EP1947674B1 (en) * 2005-11-08 2015-06-17 Advantest Corporation Electron gun, electron beam exposure system and exposure method
US8401151B2 (en) * 2009-12-16 2013-03-19 General Electric Company X-ray tube for microsecond X-ray intensity switching
US8487534B2 (en) * 2010-03-31 2013-07-16 General Electric Company Pierce gun and method of controlling thereof
US20110294071A1 (en) * 2010-05-28 2011-12-01 Canon Kabushiki Kaisha Electron gun, lithography apparatus, method of manufacturing article, and electron beam apparatus
JP6437316B2 (ja) * 2014-02-14 2018-12-12 日本電子株式会社 電子銃、三次元積層造形装置及び電子銃制御方法
CN104319217B (zh) * 2014-10-20 2017-11-17 大连交通大学 低能量电子枪
WO2016110996A1 (ja) * 2015-01-09 2016-07-14 技術研究組合次世代３Ｄ積層造形技術総合開発機構 電子銃、電子銃の制御方法および制御プログラム並びに３次元造形装置
CN113438995A (zh) * 2019-01-29 2021-09-24 弗里曼特有限公司 具有束流收集器的增材制造方法和设备
JP7411521B2 (ja) 2020-09-03 2024-01-11 株式会社ニューフレアテクノロジー 荷電粒子ビーム調整方法、荷電粒子ビーム描画方法、および荷電粒子ビーム照射装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB480948A (en) * 1936-07-25 1938-02-25 Frederick Hermes Nicoll Improvements in or relating to cathode ray tubes
DE1032419B (de) * 1938-04-05 1958-06-19 Loewe Opta Ag Braunsche Roehre
NL278366A (zh) * 1961-05-27
US3374379A (en) * 1964-03-02 1968-03-19 Nippon Columbia Low second grid voltage electron gun
GB1207118A (en) * 1968-07-12 1970-09-30 Jeol Ltd An electric gun
US4200555A (en) 1978-07-27 1980-04-29 Bell Telephone Laboratories, Incorporated Low work function hexaboride electron source
JPS57128433A (en) * 1980-12-27 1982-08-10 Denki Kagaku Kogyo Kk High luminance electron gun
US4528474A (en) * 1982-03-05 1985-07-09 Kim Jason J Method and apparatus for producing an electron beam from a thermionic cathode
US4588928A (en) * 1983-06-15 1986-05-13 At&T Bell Laboratories Electron emission system
US5155412A (en) 1991-05-28 1992-10-13 International Business Machines Corporation Method for selectively scaling a field emission electron gun and device formed thereby
US5449968A (en) 1992-06-24 1995-09-12 Denki Kagaku Kogyo Kabushiki Kaisha Thermal field emission cathode
US5633507A (en) * 1995-09-19 1997-05-27 International Business Machines Corporation Electron beam lithography system with low brightness
US5854490A (en) * 1995-10-03 1998-12-29 Fujitsu Limited Charged-particle-beam exposure device and charged-particle-beam exposure method
JPH09260237A (ja) * 1996-03-19 1997-10-03 Fujitsu Ltd 電子銃、電子ビーム装置及び電子ビーム照射方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI405235B (zh) * 2007-12-21 2013-08-11 Applied Materials Inc 充電腹鈑或箔之方法

Also Published As

Publication number Publication date
DE19927036C2 (de) 2003-05-15
GB2338589B (en) 2001-02-21
JP4052731B2 (ja) 2008-02-27
GB9913068D0 (en) 1999-08-04
US6252344B1 (en) 2001-06-26
KR20000005866A (ko) 2000-01-25
DE19927036A1 (de) 1999-12-30
GB2338589A (en) 1999-12-22
KR100313845B1 (ko) 2001-11-15
JP2000011932A (ja) 2000-01-14

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Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent
MM4A Annulment or lapse of patent due to non-payment of fees