TW417220B - Packaging structure and method of semiconductor chip - Google Patents
Packaging structure and method of semiconductor chip Download PDFInfo
- Publication number
- TW417220B TW417220B TW088112647A TW88112647A TW417220B TW 417220 B TW417220 B TW 417220B TW 088112647 A TW088112647 A TW 088112647A TW 88112647 A TW88112647 A TW 88112647A TW 417220 B TW417220 B TW 417220B
- Authority
- TW
- Taiwan
- Prior art keywords
- lead frame
- semiconductor chip
- republic
- china
- district
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 55
- 238000000034 method Methods 0.000 title claims description 13
- 238000004806 packaging method and process Methods 0.000 title abstract description 4
- 238000005538 encapsulation Methods 0.000 abstract 3
- 235000012431 wafers Nutrition 0.000 description 50
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 19
- 229960004643 cupric oxide Drugs 0.000 description 18
- 239000005751 Copper oxide Substances 0.000 description 17
- 229910000431 copper oxide Inorganic materials 0.000 description 17
- 238000007789 sealing Methods 0.000 description 16
- 150000001875 compounds Chemical class 0.000 description 10
- 239000002390 adhesive tape Substances 0.000 description 9
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 9
- 239000010410 layer Substances 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 229910000679 solder Inorganic materials 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 5
- 239000000084 colloidal system Substances 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 5
- 239000010931 gold Substances 0.000 description 5
- 229910052709 silver Inorganic materials 0.000 description 5
- 239000004332 silver Substances 0.000 description 5
- 239000013078 crystal Substances 0.000 description 4
- 230000017525 heat dissipation Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000000565 sealant Substances 0.000 description 4
- 239000012790 adhesive layer Substances 0.000 description 3
- 239000008393 encapsulating agent Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000003292 glue Substances 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- MROVZCRMXJZHCN-UHFFFAOYSA-N 3-[4-(aminomethyl)-6-(trifluoromethyl)pyridin-2-yl]oxy-N-(2-hydroxyethyl)benzamide Chemical compound NCC1=CC(=NC(=C1)C(F)(F)F)OC=1C=C(C(=O)NCCO)C=CC=1 MROVZCRMXJZHCN-UHFFFAOYSA-N 0.000 description 1
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- ABRVLXLNVJHDRQ-UHFFFAOYSA-N [2-pyridin-3-yl-6-(trifluoromethyl)pyridin-4-yl]methanamine Chemical compound FC(C1=CC(=CC(=N1)C=1C=NC=CC=1)CN)(F)F ABRVLXLNVJHDRQ-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000010062 adhesion mechanism Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- UDRRLPGVCZOTQW-UHFFFAOYSA-N bismuth lead Chemical compound [Pb].[Bi] UDRRLPGVCZOTQW-UHFFFAOYSA-N 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000002309 gasification Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000012085 test solution Substances 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000012815 thermoplastic material Substances 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
- H01L21/568—Temporary substrate used as encapsulation process aid
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/45099—Material
- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/45138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/45144—Gold (Au) as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L24/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01077—Iridium [Ir]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
- H01L2924/1815—Shape
- H01L2924/1816—Exposing the passive side of the semiconductor or solid-state body
- H01L2924/18165—Exposing the passive side of the semiconductor or solid-state body of a wire bonded chip
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Lead Frames For Integrated Circuits (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Wire Bonding (AREA)
Description
417220
__案號 8811^^ 五、發明說明(l ) 發明領域: 年月 A_修正 本發明係有關於_種電子裝置,特別有關於一種半導體 晶片封裝構造以及其襲造方法,其中該半導體晶片係為一 封膠體包覆並且該半導體晶片之下表面係裸露於該封膠 先前技術: 苐圖係為I用半導體晶片封裝構造,其包含一導線 架(1 e a d f r a in e)用以承載一晶片1 〇 〇。該導線架包含複數 條導線具有外腳部(〇uter leads p〇rti〇n)1〇6以及内腳部 107^該晶片1〇〇係藉銀膠114黏著固定於一晶片承座!"— 其係以數個支撐肋條(未示於圖十)連接於該導線架。該 導線架之外腳部1 〇6係用以電性連接至—外部電路。該晶 片1 0 0具有複數個晶片銲墊i! 7利用複數條連接線(b〇nd丨ng w 1 re ) 1 1 5電性連接該導線架之内腳部〗〇 7。該晶片丨〇 〇、晶 片承座111、導線架之内腳部丨07、以及複數條連接線丨1^:- 係包覆於一封膠體1 1 6。該封膠體1〗β係以絕緣材料例如 氧樹脂(epoxy )製成。 由於該封膠體1 16係完全環繞該晶片i〇〇,所以該晶片 1 00正常運作所產生的熱必須完全經由該封膠體丨丨6傳出, 而由於該封膠體U 6的絕緣特性’使得該晶片丨〇 〇的散熱會 文到阻礙,因此,在某些狀況下,其將在該習用半導體晶 片封裝構造内產生高溫而可能損傷或損壞該晶片丨〇()。 發明概要: 本發明之主要目的係提供一種半導體晶片封裝構造,其
P99-014. ptc 第4頁 _茶號 五、發明說明(2) 主要包含一導線如 包含-窗形墊(Wi:及一晶片 導線架之下表面:。W㈣用 增加散熱效率Q及該晶片之 本發明之次要B + — a 要目的係提供一 ^要包含—導線架以及一晶片 線杂之表面特定P '吐域係設有一 層用以增加該導績A乐 士 寻線架與封膠體 根據本發明一鉍 包含-導線架' 含複數條導線以及+ !體:片 導:架連接。該複數條導線之 形塾係位於該中央區域並且具 設於該窗形墊之開口,並且其 該複數條導線之内端係以複數 晶片之複數個晶片銲墊。該封 體晶片以及複數條連接線,其 半‘體晶片之背面係裸露於該 由於該導線架之下表面以及 於違封膠體’因此該半導體晶 接經由該半導體晶片之背面傳 構造之散熱效率。 在根據本發明另一較佳實施 中’該導線架表面之特定區域 年 月 a 修正 包覆於一封膠體’該導線架 以提供接地之功能,其中該 下表面係裸露於該封膠體以 種半導體晶片封 包覆於一封膠體 氧化銅 間之附 半導體 以及 (cupric 著力。 晶片封裝 封膠體。 該窗形墊以數個 内端定義一中央 有一開口。該半 有複數個 線分別連 包覆該導 線架之下 正面具 條連接 膠體係 令該導 封膠體 該半導 片正常 出,因 裝構造 ’其中 oxide) 構造主 該導線 連接條 區域, 導體晶 晶片鲜 接該半 線架、 表面以 ,其 該導 覆蓋 要係 架包 與該 該窗 片係 塾。 體晶片之背面係 運作所產生的熱 而可增進本發明 #導 及讀 裸露 可直 封裝 例之半導體晶片封裝構造 係設有一氧化銅(c u p r i c Ρ99-014.ptc 第5頁 4172, ' _案號88112647_年月日_<±±_ 五、發明說明(3) ο X i d e )覆蓋廣。由於該氧化銅覆蓋層之表面係呈現粗链 狀,所以在氧化銅覆蓋層/封膠體介面之粘著機構除了化 學鍵結外尚有機械互鎖機構,所以可以增加導線架與封膠 體間之附著力藉以降低剝離之機率並且防止週遭的水分直 接經由導線架與封膠體之接合線(b ο n d 1 i n e )滲透積聚至 半導體晶片封裝構造中。 本發明另提供一種製造半導體晶片封裝構造之方法,其 包含下列步驟:(A)將一膠帶固定於一導線架之表面,使 得該導線架之窗形墊之開口係完全為該膠帶覆蓋,(B)將 一半導體晶片固定於該窗形墊開口内之膠帶上,(C)電性 連接該半導體晶片以及導線架,(D )將該導線架、半導體 晶片以及複數條連接線包覆於一封膠體,(E)移除該膠帶 以露出該半導體晶片以及導線架之下表面° 圖示說明: 為了讓本發明之上述和其他目的、特徵、和優點能/:吏發 顯特徵,下文特舉本發明較佳實施例,並配合所附圖示, 作詳細說明如下。 第1圖:習用半導體晶片封裝構造之剖面圖; 第2圖:本發明第一較佳實施例之剖面圖; 第3圖:本發明第一較佳實施例之下視圖; 第4圖:根據本發明第一較佳實施例之一導線架之上視 圖; 第5圖:沿第4圖5 — 5線之刮面圖;。 第6圖至第10圖:其揭示一種製造根據本發明之半導
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41 7 2 2 D _案號88112647_年月日 修正_ 五、發明說明(4) 體晶片封裝構造之方法, 第1 1圖:根據本發明第一較佳實施例之一導線架安裝 於一膠帶上之上視圖;及 第1 2圖:本發明第二較佳.實施例之剖面圖。 圖號說明: 100 晶片1 0 6 外腳部1 0 7 内腳部 111 晶片承座11 4 銀膠11 5 連接線 116 封膠體1 1 7 晶片銲墊 200 半導體晶片封裝構造 210 半導體晶片2 2 0 導線架220a氧化銅覆蓋層 2 2 2 導線224 窗形墊222a内端 223 中央區域226 開口228 連接條 212 晶片銲墊224a預先設定區域 230 金線232 金線240 封膠體 2 5 0 膠帶2 5 2 槽缝 3 0 0半導體晶片封裝構造 文 發明說明: 第二圖以及第三圖係為根據本發明第一較佳實施例之半 導體晶片封裝構造2 0 0,其主要包含一半導體晶片2 1 0、一 導線架2 2 0以及一封膠體240。 第四圖係為使用於該半導體晶片封裝構造2 0 0之導線架 2 2 0,其包含複數條導線222以及一窗形墊224。該複數條 導線222之内端222a定義一中央區域2 2 3,該窗形墊224係 位於該中央區域223並且具有一開口 226用以容置該半導體
P99-014.ptc 第7頁 417220 案说 88112647 年月曰 修正 五、發明說明(5) 晶片2 1 0。該窗形墊2 2 4的四個角落分別以一連接條2 2 8與 該導線架220連接。 請再參照第二圖、第三圖以及第四圖,該半導體晶片 210之正面具有複數個晶片銲墊212。該每一條導線222之 内端2 2 2 a係以一連接線例如金線2 3 0分別連接於該半導體 晶片2 1 0之晶片銲墊2 1 2。該複數條導線2 2 2之内端2 2 2 a較 佳鍍有一層與習用連接線(bond i ng w i re )材料結合力佳的 金屬例如金或銀(未示於圖中)。該窗形墊224上表面之 預先設定區域2 2 4 a係以連接線例如金線2 3 2連接至該半導 體晶片21 0之晶片銲墊21 2,用以提供電源以及接地。較佳 地’該窗形墊2 24上表面之預先設定區域2 2 4a可鍍有一層 與習用連接線材料結合力佳的金屬例如金或銀(未示於圖 中)°该封勝體2 4 0係包覆該半導體晶片2 1 0、導線架2 2 0 以及複數條金線2 3 0、2 3 2,其中該導線架2 2 0之下表面 (亦即指該複數條導線222、窗形墊224以及四個連接… 228之下表面)以及該半導體晶片2丨〇之背面係裸露於|封 膠體240 (參照第四圖)。 請參照第五圖’該導線架220係由一薄金屬條,經由蝕 刻或衝壓而形成一類似於第四圖所示之圖案(pattern)。 σ玄V線架2 2 〇較佳係由銅或其合金製成。此外該導線架2 2 〇 亦可由鐵、鎳或其合金製成,然後鍍上一層銅。 第/、圖至第十圖揭示一種製造根據本發明之半導體晶片封 裝構造之方法。 請參照第六圖’該導線架22 0係安裝於一膠帶(adhesive
P99-014.ptc 第8頁 __案號,88112647_年月日 修正__ 五、發明說明(6) tape) 250例如具有一勝層之聚酿亞胺(polyimide)。該膠 帶2 5 0係用以在製程中支撐該晶片2 1 0,並且將其保持在一 適當位置(相對於該導線架220 )。此外,在打線(Wire bonding)製程中,該膠帶2 5 0亦可穩定該複數條導線222之 内端222a °該膠層較佳係以熱固性(thermosetting)材質 製成例如環氧樹脂(epox i es)、矽樹脂(s i 1 i cones)或聚醯 胺〔polyamides) ° 因為熱塑性(thermoplastic)# 質一般 係在100 °C融化,而打線製程卻需加熱至250 °C,因此膠層 若以熱塑性材質製成,則其常常會進行在打線製程時融 化,因而無法將該晶片2 1 0保持在該適當位置而導致打線 問題(bonding problem)。此外,該膠帶250較佳具有槽縫 (s 1 〇 t) 2 5 2 (請參照第Ί 圖),用以允許該膠帶2 5 0在加 熱或冷卻時膨脹或收縮,卻不致影響該晶月2 1 0之位置。 請參照第七圖,該半導體晶片2 1 0係被安裝於該窗形墊2 2 4 開口内的膠帶2 5 0上。該晶片2 1 0之背面係經由該熱固性材 質製成之膠層(未示於圖中)而固定於該膠帶250上Γ — 請參照第八圖,該金線230、232係利用習知的線銲(Wire bondi ng)技術分別連接該導線222之内端222a以及該窗形 墊2 2 4上表面之預先設定區域2 24a至相對應之晶片銲塾 212 ° 請參照第九圖,該封勝體2 4 0係利用習知的封膠技術例 如傳遞模塑法(transfer molding)形成在該晶片21〇以及 導線架220上。 最後,如第十圖所示,該膠帶250被移除以露出該半導
P99 014. ptc 第9頁 4172 年 月 曰 修正 案號 88112647 五、發明說明(7) 體晶片2 1 0之背面以及該導線架2 2 0之下表面。然後該複數 條導線222可以沿該封膠體之邊緣修剪(trimming),使得 其與該該封膠體之邊緣切齊,如此即可製得如第二圖所示 之半導體晶片封裝構造2 0 0。可以理解的是,該複數條導 線222亦可修剪得使其有部分仍延伸於該封膠體240外,然 後再形成標準的導線外腳構造例如海鶴翼(g u 1 1 - w i n g )、J 型腳(J Mead)或其相似之形狀。 第十二圖係為根據本發明第二較佳實施例之半導體晶片 封裝構造300,除了該導線架220之上表面設有一氧化銅覆 蓋層220a外,該封裝構造300係與第二圖之封裝構造2 0 0相 同。該氧化銅覆蓋層220a較佳以陽極氧化(anodic ο X i d a t i ο η )法塗佈:(A)先將該導線架表面去油脂 (degrease)、清潔、拋光(polish) ;(B)將該導線架表面 不要有氧化銅覆蓋層之區域(例如該導線架之下表面以及 該複數條導線之内端)以膠帶黏貼保護;(C)將已貼上保 護躍帶之導線架作為陽極,在一驗性溶液(例如氫i氧/化鈉 電解液)中加以電解,藉此形成一氧化銅覆蓋層於1:該…導線 架沒有膠帶保護之表面。該氧化銅覆蓋層的主要結晶構造 為高密度群集之黑色針狀結晶。因此,該氧化銅覆蓋層之 表面係呈現黑色粗糙狀。該氧化銅覆蓋層22 0a亦可以化學 氧化(chemical oxidation)法塗佈:步驟(A)以及(B)同 前;(C’)將已貼上保護膠帶之導線架浸於一化學氧化液 (例如3 %氣化納+1 %氫氧化納+ 1 %磷酸納)中,加熱至8 5 〇C。
國 P99-014.ptc 第10頁
根據本發明之導線架,其複數條導線之内端以及該窗型 墊用以接地之預先設定區域可先以習用之方法鍍上一層與 習用連接線(bonding wire)材料結合力佳的金屬(例如金 或銀),然後再貼上保護膠帶進行氧化銅覆蓋層之塗佈。 可以理解的疋,根據本發明較佳實施例之導線架亦可進行 步驟(A )以及(C )後,再將氧化銅覆蓋層以習知的機械研磨 法(mechanical abrasion)或化學蝕刻法(chemicai etch) 由該導線架表面不要有氧化鋼覆蓋層之區域(例如該導線 架之下表面以及該複數條導線之内端)移除。 根據本發明第一較佳實施例之半導體晶片封裝構造 200 ’其係可以類似於其他無外引腳裝置ueadiess device)之方式安裝於一基板,例如一印刷電路板。該印 刷電路板可先以錫膏網版印刷(screerl print)成對應於該 半V體as片封裝構造2 0 0底部之導線圖案(p a t t e r n )。然後 將該封裝構造2 0 0對正置於該印刷電路板上加以回銲即 可。可以理解的是,該封裝構造2〇〇底部所暴露之導線222 亦可先印上錫膏(solder paste),再安裝至基板。 一般而s ’無外引腳裝置與基板接合後,其四個角落是 因為溫度變化所產生應力最大的地方。然而,根據本發明 只化例之半導體晶片封裝構造,由於用以連接窗型墊至導 線架之連接條係裸露於該封裝構造2 〇〇底部四個角落,因 此》亥連接條228可藉由印上錫膏(s〇ider paste)並且回薛 固定於該基板’而來強化並且穩定該封裝構造2 〇 〇與基板 之結合,藉此可增加該封裝構造2 〇 〇與基板間之銲料連接
P99-014,ptc 第11頁
417220 - 案號 88112647 _年月曰 修正 五、發明說明(9) 可靠性(solder joint reliability)。 根據本發明之半導體晶片封裝構造,由於其複數條導線 之内端係用以連接至半導體晶片之輸入或輸出塾 (receiving or transmitting pacis),而該窗形墊上表面 之預先設定區域則是用以提供電壓源(source vo丨tage)以 及接地電位(ground potential)。因此,在根據本發明之 半導體晶片封裝構造中’由於電壓源以及接地電位可以經 由該窗形墊而在任何位置提供,所以可以縮短電壓源以及 接地電位之供應路線’因而壓制電源噪音並且提高晶片之 運作速度。 根據本發明之半導體晶片封裝構造’由於由於該導線架之 了表面以及該半導體晶片之背面係裸露於該封膠體,因此 4半=體晶片正常運作所產生的熱可直接經由該半導體晶 片之为面傳出’藉此可促進熱快速由該晶片散出,因而增 進本發明封裝構造之散熱效率。 ^卜 及導線木之表面係設有一氧化銅(c u p r i c ο X i d e) 層。、由於該氧化銅復蓋層係由高密度群集之黑―色淨t狀 二=^成,所以當該封裝構造進行封膠製程時,該黑色針 、'二印之間的縫隙係可供塑料填入,藉此當塑料固化後可 风械互鎖之功能而增加在氧化銅覆蓋層/封膠體介 面的附者力α藉沐—^ 精此可降低導線架與対膠體間剝離之機率並 A ,週遭的水分直接經由導線架與封膠體之接合線 (b ο n d 1 i η ρ η赉公 ^ ,,, ~边積聚至本發明之封裝構造中’所以在高 lODlL之&程如红外雄 " 硬輻射迴銲製程中,可避免因溫度快速增
P99-014- ptc 第12頁 _案號88112647_年月曰 修正_ 五、發明說明(10) 加導致殼體龜裂之問題。此外,該氧化銅覆蓋層亦可增進 導線架與導電膠之間的附著力而防止其剝離。 雖然本發明已以前述較佳實施例揭示,然其並非用以限 定本發明,任何熟習此技藝者,在不脫離本發明之精神和 範圍内,當可作各種之更動與修改,因此本發明之保護範 圍當視後附之申請專利範圍所界定者為準。
P99-014.ptc 第13頁
Claims (1)
- J 年月曰 修正 f iE* ,請日淨 1: ' 案號:88112647 即ί-ί 日 > 邡別.Μ L .j i // /U (以上各攔由本局填言主)_斗/) >、0 發明專利說明書 中文 半導體晶片封裝構造及方法 發明名稱 英文 姓名 (中文) 1. 李世文 2. 林俊宏 3. 趙興華 4. 陶恕 發明人 姓名 (英文) 1. LI Sai Man 2. LIN Chun Hung 3. CHAO Shin Hua 4. TAO Su rP\ m 相" 1.中華民國2.中華民國3.中華民國4.中華民國 住、居所 1. 台南市東區崇信街97號13樓之3 2. 高雄市鼓山區華豐街72號9樓 3. 南雄+左營區和光彳ί^56巷6^弄6魏 4. 高雄市左營區崇實新村72〜2號 姓名 (名稱) (中文) 1.曰月光半導體製造股份有限公司 姓名 (名稱) C英文) 1. Advanced Semiconductor Engineering, Inc. 國籍 1.中華民國 申請人 住、居所 (事務所) 1,高雄市楠梓加工出口區經三路26號 代表人 姓名 (中文) 1.張虔生 代表人 姓名 (英文) 1.P99-014,ptc 苐1頁
Priority Applications (2)
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TW088112647A TW417220B (en) | 1999-07-23 | 1999-07-23 | Packaging structure and method of semiconductor chip |
US09/390,695 US6348729B1 (en) | 1999-07-23 | 1999-09-07 | Semiconductor chip package and manufacturing method thereof |
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TW088112647A TW417220B (en) | 1999-07-23 | 1999-07-23 | Packaging structure and method of semiconductor chip |
US09/390,695 US6348729B1 (en) | 1999-07-23 | 1999-09-07 | Semiconductor chip package and manufacturing method thereof |
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TW417220B true TW417220B (en) | 2001-01-01 |
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TW088112647A TW417220B (en) | 1999-07-23 | 1999-07-23 | Packaging structure and method of semiconductor chip |
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US (1) | US6348729B1 (zh) |
TW (1) | TW417220B (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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US8072062B2 (en) | 2003-04-18 | 2011-12-06 | Freescale Semiconductor, Inc. | Circuit device with at least partial packaging and method for forming |
TWI400773B (zh) * | 2003-04-18 | 2013-07-01 | Freescale Semiconductor Inc | 具有至少部份封裝之電路裝置及其形成之方法 |
Families Citing this family (16)
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US5729049A (en) * | 1996-03-19 | 1998-03-17 | Micron Technology, Inc. | Tape under frame for conventional-type IC package assembly |
US6700185B1 (en) * | 1999-11-10 | 2004-03-02 | Hitachi Chemical Co., Ltd. | Adhesive film for semiconductor, lead frame and semiconductor device using the same, and method for manufacturing semiconductor device |
JP2002093831A (ja) * | 2000-09-14 | 2002-03-29 | Shinko Electric Ind Co Ltd | 半導体装置およびその製造方法 |
TW472951U (en) * | 2000-10-16 | 2002-01-11 | Siliconix Taiwan Ltd | Leadframe chip with trench |
JP2002184934A (ja) * | 2000-12-13 | 2002-06-28 | Shinko Electric Ind Co Ltd | 半導体装置及びその製造方法 |
JP2003303919A (ja) * | 2002-04-10 | 2003-10-24 | Hitachi Ltd | 半導体装置及びその製造方法 |
US6835592B2 (en) | 2002-05-24 | 2004-12-28 | Micron Technology, Inc. | Methods for molding a semiconductor die package with enhanced thermal conductivity |
US20040124508A1 (en) * | 2002-11-27 | 2004-07-01 | United Test And Assembly Test Center Ltd. | High performance chip scale leadframe package and method of manufacturing the package |
US20040108580A1 (en) * | 2002-12-09 | 2004-06-10 | Advanpack Solutions Pte. Ltd. | Leadless semiconductor packaging structure with inverted flip chip and methods of manufacture |
US7102159B2 (en) * | 2004-06-12 | 2006-09-05 | Macronix International Co., Ltd. | Ultra thin image sensor package structure and method for fabrication |
JP2007184414A (ja) * | 2006-01-06 | 2007-07-19 | Matsushita Electric Ind Co Ltd | 半導体素子実装用基板、半導体装置及び電子機器 |
US20070200210A1 (en) * | 2006-02-28 | 2007-08-30 | Broadcom Corporation | Methods and apparatus for improved thermal performance and electromagnetic interference (EMI) shielding in integrated circuit (IC) packages |
US7936055B2 (en) * | 2006-08-23 | 2011-05-03 | Stats Chippac Ltd. | Integrated circuit package system with interlock |
US8115305B2 (en) * | 2007-05-17 | 2012-02-14 | Stats Chippac Ltd. | Integrated circuit package system with thin profile |
US7998790B2 (en) * | 2008-05-30 | 2011-08-16 | Stats Chippac Ltd. | Integrated circuit packaging system with isolated pads and method of manufacture thereof |
US8587099B1 (en) * | 2012-05-02 | 2013-11-19 | Texas Instruments Incorporated | Leadframe having selective planishing |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04162556A (ja) * | 1990-10-25 | 1992-06-08 | Mitsubishi Electric Corp | リードフレーム及びその製造方法 |
US5604376A (en) * | 1994-06-30 | 1997-02-18 | Digital Equipment Corporation | Paddleless molded plastic semiconductor chip package |
JPH0955464A (ja) * | 1995-06-09 | 1997-02-25 | Mitsubishi Electric Corp | 表面実装型半導体装置、半導体実装部品、及びそれらの製造方法 |
US5894108A (en) | 1997-02-11 | 1999-04-13 | National Semiconductor Corporation | Plastic package with exposed die |
US6194250B1 (en) * | 1998-09-14 | 2001-02-27 | Motorola, Inc. | Low-profile microelectronic package |
-
1999
- 1999-07-23 TW TW088112647A patent/TW417220B/zh not_active IP Right Cessation
- 1999-09-07 US US09/390,695 patent/US6348729B1/en not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8072062B2 (en) | 2003-04-18 | 2011-12-06 | Freescale Semiconductor, Inc. | Circuit device with at least partial packaging and method for forming |
TWI400773B (zh) * | 2003-04-18 | 2013-07-01 | Freescale Semiconductor Inc | 具有至少部份封裝之電路裝置及其形成之方法 |
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US6348729B1 (en) | 2002-02-19 |
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