TW406292B - Motion damper with electrical amplifier, and lithographic device with such a motion damper - Google Patents
Motion damper with electrical amplifier, and lithographic device with such a motion damper Download PDFInfo
- Publication number
- TW406292B TW406292B TW086117495A TW86117495A TW406292B TW 406292 B TW406292 B TW 406292B TW 086117495 A TW086117495 A TW 086117495A TW 86117495 A TW86117495 A TW 86117495A TW 406292 B TW406292 B TW 406292B
- Authority
- TW
- Taiwan
- Prior art keywords
- coil
- motion damper
- parallel
- damping
- driver
- Prior art date
Links
- 230000033001 locomotion Effects 0.000 title claims abstract description 84
- 238000013016 damping Methods 0.000 claims abstract description 68
- 239000000758 substrate Substances 0.000 claims abstract description 30
- 238000005259 measurement Methods 0.000 claims description 55
- 230000003321 amplification Effects 0.000 claims description 16
- 238000003199 nucleic acid amplification method Methods 0.000 claims description 16
- 239000004020 conductor Substances 0.000 claims description 14
- 238000006073 displacement reaction Methods 0.000 claims description 9
- 238000001459 lithography Methods 0.000 claims description 7
- 230000002079 cooperative effect Effects 0.000 claims description 5
- 239000004065 semiconductor Substances 0.000 abstract description 30
- 230000009021 linear effect Effects 0.000 abstract description 8
- 230000003993 interaction Effects 0.000 abstract description 5
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 238000000034 method Methods 0.000 description 10
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 8
- 230000003287 optical effect Effects 0.000 description 5
- 230000004888 barrier function Effects 0.000 description 4
- 230000005672 electromagnetic field Effects 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000009434 installation Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000010276 construction Methods 0.000 description 2
- 210000002445 nipple Anatomy 0.000 description 2
- 230000009022 nonlinear effect Effects 0.000 description 2
- 235000015170 shellfish Nutrition 0.000 description 2
- 239000002023 wood Substances 0.000 description 2
- 206010028980 Neoplasm Diseases 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 201000011510 cancer Diseases 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
- F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
- F16F15/03—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using magnetic or electromagnetic means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Aviation & Aerospace Engineering (AREA)
- Acoustics & Sound (AREA)
- Mechanical Engineering (AREA)
- Health & Medical Sciences (AREA)
- Electromagnetism (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Vibration Prevention Devices (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Linear Motors (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP97201661 | 1997-06-03 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW406292B true TW406292B (en) | 2000-09-21 |
Family
ID=8228394
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW086117495A TW406292B (en) | 1997-06-03 | 1997-11-22 | Motion damper with electrical amplifier, and lithographic device with such a motion damper |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6008881A (enExample) |
| EP (1) | EP0916038B1 (enExample) |
| JP (1) | JP2000516332A (enExample) |
| DE (1) | DE69816941T2 (enExample) |
| TW (1) | TW406292B (enExample) |
| WO (1) | WO1998055779A1 (enExample) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6959484B1 (en) * | 1994-01-27 | 2005-11-01 | Cymer, Inc. | System for vibration control |
| US6791098B2 (en) | 1994-01-27 | 2004-09-14 | Cymer, Inc. | Multi-input, multi-output motion control for lithography system |
| DE102008011024B4 (de) | 2008-02-25 | 2010-01-28 | Gottfried Wilhelm Leibniz Universität Hannover | Schneidverfahren zum Vermindern eines Schnittschlags und Schneidmaschine mit einem Kurbelantrieb zur Durchführung dieses Verfahrens |
| WO2011023172A1 (de) | 2009-08-25 | 2011-03-03 | Gottfried Wilhelm Leibniz Universität Hannover | Schneidverfahren zum vermindern eines schnittschlags |
| US8327983B1 (en) | 2009-09-14 | 2012-12-11 | Exelis, Inc. | Enhanced damping using motion amplification |
| US20110127128A1 (en) * | 2009-11-30 | 2011-06-02 | Itt Manufacturing Enterprises, Inc. | Frequency tunable magnetic damping apparatus |
| US20110147146A1 (en) | 2009-12-17 | 2011-06-23 | Itt Manufacturing Enterprises, Inc. | Enhanced damping using cryogenic cooling |
| US20110148236A1 (en) * | 2009-12-22 | 2011-06-23 | Itt Manufacturing Enterprises, Inc. | Temperature compensation tunable magnetic damping |
| DE102010004642B4 (de) * | 2010-01-13 | 2012-09-27 | Integrated Dynamics Engineering Gmbh | Magnetaktor sowie Verfahren zu dessen Montage |
| CN102720786B (zh) * | 2012-07-09 | 2014-06-25 | 哈尔滨工业大学 | 多自由度电磁阻尼器 |
| JP2014143253A (ja) * | 2013-01-22 | 2014-08-07 | Canon Inc | 検出装置、計測装置、リソグラフィ装置、および物品の製造方法 |
| DE102015201249A1 (de) * | 2015-01-26 | 2016-07-28 | Carl Zeiss Smt Gmbh | Beweglich gelagertes Bauteil einer Projektionsbelichtungsanlage sowie Vorrichtung und Verfahren zur Bewegungsbegrenzung hierfür |
| EP3093965B1 (de) | 2015-05-12 | 2017-11-22 | Etel S. A.. | Kurzhubiger linearmotor |
| CN106292193B (zh) * | 2015-05-24 | 2019-01-29 | 上海微电子装备（集团）股份有限公司 | 吸振装置及吸振方法、光刻机系统 |
| DE102016214785A1 (de) * | 2016-08-09 | 2018-02-15 | Carl Zeiss Smt Gmbh | Optisches Modul mit einer Antikollisionseinrichtung für Modulkomponenten |
| DE102017200300B4 (de) * | 2017-01-10 | 2019-06-19 | Audi Ag | Aktive Dämpfungsvorrichtung zum Verringern einer Körperschwingung eines Bauteils sowie Kraftfahrzeug |
| US11073758B2 (en) * | 2018-10-31 | 2021-07-27 | Canon Kabushiki Kaisha | Imprint apparatus control, control method and manufacturing method |
| DE102023114575A1 (de) * | 2023-06-02 | 2024-12-05 | seismion GmbH | Schwingungsdämpfungselement |
| DE102023208718A1 (de) * | 2023-09-08 | 2025-03-13 | Carl Zeiss Smt Gmbh | Vibrationskorrektureinheit, Verfahren zum Betreiben einer Vibrationskorrektureinheit, Sensor und Lithographieanlage mit einem Sensor |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4731579A (en) * | 1982-10-12 | 1988-03-15 | Polaroid Corporation | Magnetic position indicator and actuator using same |
| NL8601547A (nl) * | 1986-06-16 | 1988-01-18 | Philips Nv | Optisch litografische inrichting met verplaatsbaar lenzenstelsel en werkwijze voor het regelen van de afbeeldingseigenschappen van een lenzenstelsel in een dergelijke inrichting. |
| DE3738455A1 (de) * | 1986-11-25 | 1988-06-01 | Landis & Gyr Ag | Anordnung zum messen eines flussarmen magnetfeldes |
| US4841184A (en) * | 1987-06-23 | 1989-06-20 | Mechanical Technology Incorporated | Velocity and imbalance observer control circuit for active magnetic bearing or damper |
| US5133527A (en) * | 1989-08-10 | 1992-07-28 | Mechanical Technology Incorporated | Active mounts |
| JPH07111215B2 (ja) * | 1992-08-26 | 1995-11-29 | 鹿島建設株式会社 | 除振装置 |
| DE69405266T2 (de) * | 1993-02-18 | 1998-04-09 | Toshiba Kawasaki Kk | Dynamischer Schwingungsdämpfer |
| US5493216A (en) * | 1993-09-08 | 1996-02-20 | Asa Electronic Industry Co., Ltd. | Magnetic position detector |
| DE19506104A1 (de) * | 1994-03-25 | 1995-09-28 | Heidenhain Gmbh Dr Johannes | Magnetisches Meßsystem |
| US5508518A (en) * | 1995-05-03 | 1996-04-16 | International Business Machines Corporation | Lithography tool with vibration isolation |
| US5812420A (en) * | 1995-09-05 | 1998-09-22 | Nikon Corporation | Vibration-preventive apparatus and exposure apparatus |
-
1997
- 1997-11-22 TW TW086117495A patent/TW406292B/zh active
- 1997-11-24 US US08/976,644 patent/US6008881A/en not_active Expired - Fee Related
-
1998
- 1998-04-09 JP JP10529393A patent/JP2000516332A/ja not_active Ceased
- 1998-04-09 DE DE69816941T patent/DE69816941T2/de not_active Expired - Fee Related
- 1998-04-09 EP EP98910920A patent/EP0916038B1/en not_active Expired - Lifetime
- 1998-04-09 WO PCT/IB1998/000533 patent/WO1998055779A1/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| US6008881A (en) | 1999-12-28 |
| EP0916038B1 (en) | 2003-08-06 |
| DE69816941D1 (de) | 2003-09-11 |
| WO1998055779A1 (en) | 1998-12-10 |
| EP0916038A1 (en) | 1999-05-19 |
| JP2000516332A (ja) | 2000-12-05 |
| DE69816941T2 (de) | 2004-06-03 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GD4A | Issue of patent certificate for granted invention patent |