JP2000516332A - 電気的増幅器を備えた動きダンパ及びこのような動きダンパを備えたリソグラフィック装置 - Google Patents

電気的増幅器を備えた動きダンパ及びこのような動きダンパを備えたリソグラフィック装置

Info

Publication number
JP2000516332A
JP2000516332A JP10529393A JP52939398A JP2000516332A JP 2000516332 A JP2000516332 A JP 2000516332A JP 10529393 A JP10529393 A JP 10529393A JP 52939398 A JP52939398 A JP 52939398A JP 2000516332 A JP2000516332 A JP 2000516332A
Authority
JP
Japan
Prior art keywords
coil
motion damper
parallel
current
measuring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
JP10529393A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000516332A5 (enExample
Inventor
トーマス ペトラス ヘンドリカス ワルメルダム
ヨハン コーネリス コンプター
フランシスカス マルティヌス ロエス
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Electronics NV filed Critical Philips Electronics NV
Publication of JP2000516332A publication Critical patent/JP2000516332A/ja
Publication of JP2000516332A5 publication Critical patent/JP2000516332A5/ja
Ceased legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • F16F15/03—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using magnetic or electromagnetic means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Aviation & Aerospace Engineering (AREA)
  • Acoustics & Sound (AREA)
  • Mechanical Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Electromagnetism (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Vibration Prevention Devices (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Linear Motors (AREA)
JP10529393A 1997-06-03 1998-04-09 電気的増幅器を備えた動きダンパ及びこのような動きダンパを備えたリソグラフィック装置 Ceased JP2000516332A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP97201661.2 1997-06-03
EP97201661 1997-06-03
PCT/IB1998/000533 WO1998055779A1 (en) 1997-06-03 1998-04-09 Motion damper with electrical amplifier, and lithographic device with such a motion damper

Publications (2)

Publication Number Publication Date
JP2000516332A true JP2000516332A (ja) 2000-12-05
JP2000516332A5 JP2000516332A5 (enExample) 2005-11-24

Family

ID=8228394

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10529393A Ceased JP2000516332A (ja) 1997-06-03 1998-04-09 電気的増幅器を備えた動きダンパ及びこのような動きダンパを備えたリソグラフィック装置

Country Status (6)

Country Link
US (1) US6008881A (enExample)
EP (1) EP0916038B1 (enExample)
JP (1) JP2000516332A (enExample)
DE (1) DE69816941T2 (enExample)
TW (1) TW406292B (enExample)
WO (1) WO1998055779A1 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6791098B2 (en) 1994-01-27 2004-09-14 Cymer, Inc. Multi-input, multi-output motion control for lithography system
US6959484B1 (en) 1994-01-27 2005-11-01 Cymer, Inc. System for vibration control
DE102008011024B4 (de) * 2008-02-25 2010-01-28 Gottfried Wilhelm Leibniz Universität Hannover Schneidverfahren zum Vermindern eines Schnittschlags und Schneidmaschine mit einem Kurbelantrieb zur Durchführung dieses Verfahrens
WO2011023172A1 (de) 2009-08-25 2011-03-03 Gottfried Wilhelm Leibniz Universität Hannover Schneidverfahren zum vermindern eines schnittschlags
US8327983B1 (en) 2009-09-14 2012-12-11 Exelis, Inc. Enhanced damping using motion amplification
US20110127128A1 (en) * 2009-11-30 2011-06-02 Itt Manufacturing Enterprises, Inc. Frequency tunable magnetic damping apparatus
US20110147146A1 (en) 2009-12-17 2011-06-23 Itt Manufacturing Enterprises, Inc. Enhanced damping using cryogenic cooling
US20110148236A1 (en) * 2009-12-22 2011-06-23 Itt Manufacturing Enterprises, Inc. Temperature compensation tunable magnetic damping
DE102010004642B4 (de) * 2010-01-13 2012-09-27 Integrated Dynamics Engineering Gmbh Magnetaktor sowie Verfahren zu dessen Montage
CN102720786B (zh) * 2012-07-09 2014-06-25 哈尔滨工业大学 多自由度电磁阻尼器
JP2014143253A (ja) * 2013-01-22 2014-08-07 Canon Inc 検出装置、計測装置、リソグラフィ装置、および物品の製造方法
DE102015201249A1 (de) 2015-01-26 2016-07-28 Carl Zeiss Smt Gmbh Beweglich gelagertes Bauteil einer Projektionsbelichtungsanlage sowie Vorrichtung und Verfahren zur Bewegungsbegrenzung hierfür
EP3093965B1 (de) 2015-05-12 2017-11-22 Etel S. A.. Kurzhubiger linearmotor
CN106292193B (zh) * 2015-05-24 2019-01-29 上海微电子装备（集团）股份有限公司 吸振装置及吸振方法、光刻机系统
DE102016214785A1 (de) * 2016-08-09 2018-02-15 Carl Zeiss Smt Gmbh Optisches Modul mit einer Antikollisionseinrichtung für Modulkomponenten
DE102017200300B4 (de) * 2017-01-10 2019-06-19 Audi Ag Aktive Dämpfungsvorrichtung zum Verringern einer Körperschwingung eines Bauteils sowie Kraftfahrzeug
US11073758B2 (en) * 2018-10-31 2021-07-27 Canon Kabushiki Kaisha Imprint apparatus control, control method and manufacturing method
DE102023114575A1 (de) * 2023-06-02 2024-12-05 seismion GmbH Schwingungsdämpfungselement
DE102023208718A1 (de) * 2023-09-08 2025-03-13 Carl Zeiss Smt Gmbh Vibrationskorrektureinheit, Verfahren zum Betreiben einer Vibrationskorrektureinheit, Sensor und Lithographieanlage mit einem Sensor

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4731579A (en) * 1982-10-12 1988-03-15 Polaroid Corporation Magnetic position indicator and actuator using same
NL8601547A (nl) * 1986-06-16 1988-01-18 Philips Nv Optisch litografische inrichting met verplaatsbaar lenzenstelsel en werkwijze voor het regelen van de afbeeldingseigenschappen van een lenzenstelsel in een dergelijke inrichting.
DE3738455A1 (de) * 1986-11-25 1988-06-01 Landis & Gyr Ag Anordnung zum messen eines flussarmen magnetfeldes
US4841184A (en) * 1987-06-23 1989-06-20 Mechanical Technology Incorporated Velocity and imbalance observer control circuit for active magnetic bearing or damper
US5133527A (en) * 1989-08-10 1992-07-28 Mechanical Technology Incorporated Active mounts
JPH07111215B2 (ja) * 1992-08-26 1995-11-29 鹿島建設株式会社 除振装置
DE69405266T2 (de) * 1993-02-18 1998-04-09 Toshiba Kawasaki Kk Dynamischer Schwingungsdämpfer
US5493216A (en) * 1993-09-08 1996-02-20 Asa Electronic Industry Co., Ltd. Magnetic position detector
DE19506104A1 (de) * 1994-03-25 1995-09-28 Heidenhain Gmbh Dr Johannes Magnetisches Meßsystem
US5508518A (en) * 1995-05-03 1996-04-16 International Business Machines Corporation Lithography tool with vibration isolation
US5812420A (en) * 1995-09-05 1998-09-22 Nikon Corporation Vibration-preventive apparatus and exposure apparatus

Also Published As

Publication number Publication date
TW406292B (en) 2000-09-21
WO1998055779A1 (en) 1998-12-10
DE69816941D1 (de) 2003-09-11
EP0916038B1 (en) 2003-08-06
EP0916038A1 (en) 1999-05-19
DE69816941T2 (de) 2004-06-03
US6008881A (en) 1999-12-28

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