TW369622B - Middle-adjustment phase shift optical mask substrate, middle-adjustment phase shift optical mask substrate and method of forming fine patterns - Google Patents

Middle-adjustment phase shift optical mask substrate, middle-adjustment phase shift optical mask substrate and method of forming fine patterns

Info

Publication number
TW369622B
TW369622B TW087121761A TW87121761A TW369622B TW 369622 B TW369622 B TW 369622B TW 087121761 A TW087121761 A TW 087121761A TW 87121761 A TW87121761 A TW 87121761A TW 369622 B TW369622 B TW 369622B
Authority
TW
Taiwan
Prior art keywords
phase shift
optical mask
shift optical
mask substrate
adjustment phase
Prior art date
Application number
TW087121761A
Other languages
English (en)
Chinese (zh)
Inventor
Masaru Mitsui
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=15921103&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=TW369622(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Hoya Corp filed Critical Hoya Corp
Application granted granted Critical
Publication of TW369622B publication Critical patent/TW369622B/zh

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW087121761A 1997-06-27 1998-12-24 Middle-adjustment phase shift optical mask substrate, middle-adjustment phase shift optical mask substrate and method of forming fine patterns TW369622B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17132297A JP3250973B2 (ja) 1997-06-27 1997-06-27 ハーフトーン型位相シフトマスクブランク及びハーフトーン型位相シフトマスク

Publications (1)

Publication Number Publication Date
TW369622B true TW369622B (en) 1999-09-11

Family

ID=15921103

Family Applications (1)

Application Number Title Priority Date Filing Date
TW087121761A TW369622B (en) 1997-06-27 1998-12-24 Middle-adjustment phase shift optical mask substrate, middle-adjustment phase shift optical mask substrate and method of forming fine patterns

Country Status (2)

Country Link
JP (1) JP3250973B2 (ja)
TW (1) TW369622B (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002196473A (ja) * 2000-12-22 2002-07-12 Dainippon Printing Co Ltd フォトマスク
JP2002244274A (ja) * 2001-02-13 2002-08-30 Shin Etsu Chem Co Ltd フォトマスクブランク、フォトマスク及びこれらの製造方法
TW200712756A (en) * 2005-07-15 2007-04-01 Ulvac Coating Corp Blanks for gray tone mask, gray tone mask using said blanks, and process for producing said blanks
WO2007010866A1 (ja) * 2005-07-15 2007-01-25 Ulvac Coating Corporation グレートーンマスク用ブランクス、及びそれを用いたグレートーンマスク及びその製造方法
JP5219200B2 (ja) * 2008-07-31 2013-06-26 Ｈｏｙａ株式会社 フォトマスク、フォトマスク用ブランク、フォトマスクの製造方法、及びパターン転写方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3194410B2 (ja) * 1994-08-05 2001-07-30 凸版印刷株式会社 ハーフトーン型位相シフトマスクの製造方法
JP3166812B2 (ja) * 1994-09-09 2001-05-14 凸版印刷株式会社 ハーフトーン型位相シフトマスク
JPH08272071A (ja) * 1995-03-30 1996-10-18 Toppan Printing Co Ltd 位相シフトマスクとその製造方法、ならびにマスクブランク

Also Published As

Publication number Publication date
JPH1115135A (ja) 1999-01-22
JP3250973B2 (ja) 2002-01-28

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