TW364153B - Structure of jointing metal element and ceramic element and method thereof - Google Patents
Structure of jointing metal element and ceramic element and method thereofInfo
- Publication number
- TW364153B TW364153B TW087101133A TW87101133A TW364153B TW 364153 B TW364153 B TW 364153B TW 087101133 A TW087101133 A TW 087101133A TW 87101133 A TW87101133 A TW 87101133A TW 364153 B TW364153 B TW 364153B
- Authority
- TW
- Taiwan
- Prior art keywords
- metal element
- jointing metal
- ceramic
- ceramic element
- jointing
- Prior art date
Links
- 239000002184 metal Substances 0.000 title abstract 5
- 239000000919 ceramic Substances 0.000 title abstract 2
- 239000010409 thin film Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/52—Mounting semiconductor bodies in containers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
- H01L21/6833—Details of electrostatic chucks
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B37/00—Joining burned ceramic articles with other burned ceramic articles or other articles by heating
- C04B37/02—Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T279/00—Chucks or sockets
- Y10T279/23—Chucks or sockets with magnetic or electrostatic means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49147—Assembling terminal to base
- Y10T29/49149—Assembling terminal to base by metal fusion bonding
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Organic Chemistry (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Ceramic Products (AREA)
- Resistance Heating (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1538497 | 1997-01-29 | ||
JP32257097A JP3954177B2 (ja) | 1997-01-29 | 1997-11-25 | 金属部材とセラミックス部材との接合構造およびその製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW364153B true TW364153B (en) | 1999-07-11 |
Family
ID=26351515
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW087101133A TW364153B (en) | 1997-01-29 | 1998-01-26 | Structure of jointing metal element and ceramic element and method thereof |
Country Status (6)
Country | Link |
---|---|
US (1) | US6057513A (zh) |
EP (1) | EP0856881B1 (zh) |
JP (1) | JP3954177B2 (zh) |
KR (2) | KR100333785B1 (zh) |
DE (1) | DE69834002T2 (zh) |
TW (1) | TW364153B (zh) |
Families Citing this family (53)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3746594B2 (ja) * | 1997-06-20 | 2006-02-15 | 日本碍子株式会社 | セラミックスの接合構造およびその製造方法 |
JP3792440B2 (ja) * | 1999-06-25 | 2006-07-05 | 日本碍子株式会社 | 異種部材の接合方法、および同接合方法により接合された複合部材 |
US6744618B2 (en) | 1999-12-09 | 2004-06-01 | Saint-Gobain Ceramics & Plastics, Inc. | Electrostatic chucks with flat film electrode |
US6603650B1 (en) * | 1999-12-09 | 2003-08-05 | Saint-Gobain Ceramics And Plastics, Inc. | Electrostatic chuck susceptor and method for fabrication |
US6723274B1 (en) | 1999-12-09 | 2004-04-20 | Saint-Gobain Ceramics & Plastics, Inc. | High-purity low-resistivity electrostatic chucks |
AU2001261365A1 (en) | 2000-05-08 | 2001-11-20 | Brigham Young University | Friction stir weldin of metal matrix composites, ferrous alloys, non-ferrous alloys, and superalloys using superabrasive tool |
US6838758B1 (en) * | 2000-05-10 | 2005-01-04 | Advanced Micro Devices, Inc. | Package and method for making an underfilled integrated circuit |
US6759596B1 (en) * | 2000-05-12 | 2004-07-06 | Shipley Company | Sequential build circuit board |
JP4311600B2 (ja) * | 2001-01-30 | 2009-08-12 | 日本碍子株式会社 | 静電チャック用接合構造体及びその製造方法 |
KR100422444B1 (ko) * | 2001-05-29 | 2004-03-12 | 삼성전자주식회사 | 정전 척에 설치되는 웨이퍼 공간 지지장치 및 그 제조방법 |
JP2003040686A (ja) * | 2001-07-27 | 2003-02-13 | Taiheiyo Cement Corp | セラミック部品 |
US20060157531A1 (en) * | 2004-12-17 | 2006-07-20 | Packer Scott M | Single body friction stir welding tool for high melting temperature materials |
CN101394963A (zh) * | 2006-01-31 | 2009-03-25 | Sii米加钻石公司 | 用于摩擦搅动的热增强工具 |
US20080103572A1 (en) | 2006-10-31 | 2008-05-01 | Medtronic, Inc. | Implantable medical lead with threaded fixation |
JP4858319B2 (ja) * | 2007-06-07 | 2012-01-18 | 住友電気工業株式会社 | ウェハ保持体の電極接続構造 |
KR100932233B1 (ko) * | 2007-11-06 | 2009-12-16 | 주식회사 메카로닉스 | 히터 제조방법 |
JP5104687B2 (ja) * | 2008-09-19 | 2012-12-19 | 日本電気株式会社 | 接合シート及び電子回路装置並びに製造方法 |
JP5960154B2 (ja) * | 2010-12-08 | 2016-08-02 | エーエスエムエル ホールディング エヌ.ブイ. | 静電クランプ、リソグラフィ装置、および静電クランプの製造方法 |
US10388493B2 (en) * | 2011-09-16 | 2019-08-20 | Lam Research Corporation | Component of a substrate support assembly producing localized magnetic fields |
JP5762265B2 (ja) * | 2011-11-30 | 2015-08-12 | 京セラ株式会社 | セラミック体と金属体との接合体 |
AU2013308541B2 (en) | 2012-08-31 | 2016-05-05 | Alfred E. Mann Foundation For Scientific Research | Feedback controlled coil driver for inductive power transfer |
CA2903860C (en) | 2013-03-15 | 2018-04-03 | Alfred E. Mann Foundation For Scientific Research | High voltage monitoring successive approximation analog to digital converter |
EP2974016B1 (en) | 2013-03-15 | 2019-03-06 | Alfred E. Mann Foundation for Scientific Research | Current sensing multiple output current stimulators with fast turn on time |
WO2014179816A2 (en) | 2013-05-03 | 2014-11-06 | Alfred E. Mann Foundation For Scientific Research | High reliability wire welding for implantable devices |
WO2014179811A1 (en) | 2013-05-03 | 2014-11-06 | Alfred E. Mann Foundation For Scientific Research | Multi-branch stimulation electrode for subcutaneous field stimulation |
WO2014179813A1 (en) | 2013-05-03 | 2014-11-06 | Alfred E. Mann Foundtion For Scientific Research | Implant recharger handshaking system and method |
US9780596B2 (en) | 2013-07-29 | 2017-10-03 | Alfred E. Mann Foundation For Scientific Research | Microprocessor controlled class E driver |
US20150028805A1 (en) | 2013-07-29 | 2015-01-29 | Alfred E. Mann Foundation For Scientific Research | Implant charging field control through radio link |
JP6503351B2 (ja) | 2013-07-29 | 2019-04-17 | アルフレッド イー. マン ファウンデーション フォー サイエンティフィック リサーチ | 埋め込み可能なデバイス用の高効率磁気リンク |
WO2015146563A1 (ja) * | 2014-03-27 | 2015-10-01 | 日本碍子株式会社 | セラミックスプレートと金属製の円筒部材との接合構造 |
US9855423B2 (en) | 2014-08-15 | 2018-01-02 | Axonics Modulation Technologies, Inc. | Systems and methods for neurostimulation electrode configurations based on neural localization |
US9555246B2 (en) | 2014-08-15 | 2017-01-31 | Axonics Modulation Technologies, Inc. | Electromyographic lead positioning and stimulation titration in a nerve stimulation system for treatment of overactive bladder |
CA2958210C (en) | 2014-08-15 | 2023-09-26 | Axonics Modulation Technologies, Inc. | Integrated electromyographic clinician programmer for use with an implantable neurostimulator |
CA2958197C (en) | 2014-08-15 | 2023-09-26 | Axonics Modulation Technologies, Inc. | External pulse generator device and associated methods for trial nerve stimulation |
CN106659882A (zh) | 2014-08-15 | 2017-05-10 | 艾克索尼克斯调制技术股份有限公司 | 用于进行神经刺激以减轻膀胱功能障碍和其他适应症的可植入引线附着结构 |
US10682521B2 (en) | 2014-08-15 | 2020-06-16 | Axonics Modulation Technologies, Inc. | Attachment devices and associated methods of use with a nerve stimulation charging device |
JP6356598B2 (ja) * | 2014-12-25 | 2018-07-11 | 京セラ株式会社 | 半導体製造装置用部品 |
EP3242721B1 (en) | 2015-01-09 | 2019-09-18 | Axonics Modulation Technologies, Inc. | Attachment devices and associated methods of use with a nerve stimulation charging device |
EP3242712B1 (en) | 2015-01-09 | 2019-04-10 | Axonics Modulation Technologies, Inc. | Patient remote and associated methods of use with a nerve stimulation system |
EP3242718B1 (en) | 2015-01-09 | 2019-05-08 | Axonics Modulation Technologies, Inc. | Improved antenna and methods of use for an implantable nerve stimulator |
WO2017011305A1 (en) | 2015-07-10 | 2017-01-19 | Axonics Modulation Technologies, Inc. | Implantable nerve stimulator having internal electronics without asic and methods of use |
JP6497248B2 (ja) | 2015-07-13 | 2019-04-10 | 住友電気工業株式会社 | ウェハ保持体 |
US10195423B2 (en) | 2016-01-19 | 2019-02-05 | Axonics Modulation Technologies, Inc. | Multichannel clip device and methods of use |
US9517338B1 (en) | 2016-01-19 | 2016-12-13 | Axonics Modulation Technologies, Inc. | Multichannel clip device and methods of use |
CA3012828C (en) | 2016-01-29 | 2024-04-30 | Axonics Modulation Technologies, Inc. | Methods and systems for frequency adjustment to optimize charging of implantable neurostimulator |
US10376704B2 (en) | 2016-02-12 | 2019-08-13 | Axonics Modulation Technologies, Inc. | External pulse generator device and associated methods for trial nerve stimulation |
KR101904275B1 (ko) * | 2016-06-09 | 2018-10-05 | (주)티티에스 | 기판지지장치의 처리방법 |
JP6693832B2 (ja) * | 2016-07-29 | 2020-05-13 | 日本特殊陶業株式会社 | セラミックス部材 |
KR102356748B1 (ko) * | 2017-10-30 | 2022-01-27 | 니뽄 도쿠슈 도교 가부시키가이샤 | 전극 매설 부재 |
JP2021513902A (ja) | 2018-02-22 | 2021-06-03 | アクソニクス モジュレーション テクノロジーズ インコーポレイテッド | 試験的神経刺激のための神経刺激リードおよび使用方法 |
WO2020185902A1 (en) | 2019-03-11 | 2020-09-17 | Axonics Modulation Technologies, Inc. | Charging device with off-center coil |
US11848090B2 (en) | 2019-05-24 | 2023-12-19 | Axonics, Inc. | Trainer for a neurostimulator programmer and associated methods of use with a neurostimulation system |
US11439829B2 (en) | 2019-05-24 | 2022-09-13 | Axonics, Inc. | Clinician programmer methods and systems for maintaining target operating temperatures |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6082267A (ja) * | 1983-10-06 | 1985-05-10 | Nissan Motor Co Ltd | セラミツクス軸と金属軸との接合構造 |
US5051811A (en) * | 1987-08-31 | 1991-09-24 | Texas Instruments Incorporated | Solder or brazing barrier |
JPH0267508A (ja) * | 1988-09-02 | 1990-03-07 | Nippon Telegr & Teleph Corp <Ntt> | 光ファイバ固定法 |
DE3838085A1 (de) * | 1988-11-10 | 1990-05-17 | Rheinmetall Gmbh | Beschleunigungsfeste verpackung fuer integrierte schaltungen und verfahren zu ihrer herstellung |
JPH02188475A (ja) * | 1989-01-13 | 1990-07-24 | Hitachi Ltd | セラミツクスと金属部材との直接接合方法 |
US5077115A (en) * | 1990-05-08 | 1991-12-31 | Rogers Corporation | Thermoplastic composite material |
EP0569799B1 (en) * | 1992-05-14 | 2000-09-06 | Matsushita Electric Industrial Co., Ltd. | Method for making via conductors in multilayer ceramic substrates |
US5352629A (en) * | 1993-01-19 | 1994-10-04 | General Electric Company | Process for self-alignment and planarization of semiconductor chips attached by solder die adhesive to multi-chip modules |
DE4310930A1 (de) * | 1993-04-02 | 1994-10-06 | Siemens Ag | Leiterplattenanordnung und Verfahren zur Herstellung einer bestückten Leiterplatte |
US5668524A (en) * | 1994-02-09 | 1997-09-16 | Kyocera Corporation | Ceramic resistor and electrostatic chuck having an aluminum nitride crystal phase |
US5541368A (en) * | 1994-07-15 | 1996-07-30 | Dell Usa, L.P. | Laminated multi chip module interconnect apparatus |
JP3082624B2 (ja) * | 1994-12-28 | 2000-08-28 | 住友金属工業株式会社 | 静電チャックの使用方法 |
JP3866320B2 (ja) * | 1995-02-09 | 2007-01-10 | 日本碍子株式会社 | 接合体、および接合体の製造方法 |
JP3813654B2 (ja) * | 1995-02-09 | 2006-08-23 | 日本碍子株式会社 | セラミックスの接合構造およびその製造方法 |
JPH09172055A (ja) * | 1995-12-19 | 1997-06-30 | Fujitsu Ltd | 静電チャック及びウエハの吸着方法 |
US5812361A (en) * | 1996-03-29 | 1998-09-22 | Lam Research Corporation | Dynamic feedback electrostatic wafer chuck |
-
1997
- 1997-11-25 JP JP32257097A patent/JP3954177B2/ja not_active Expired - Lifetime
-
1998
- 1998-01-26 US US09/013,199 patent/US6057513A/en not_active Expired - Lifetime
- 1998-01-26 TW TW087101133A patent/TW364153B/zh not_active IP Right Cessation
- 1998-01-28 EP EP98300592A patent/EP0856881B1/en not_active Expired - Lifetime
- 1998-01-28 DE DE69834002T patent/DE69834002T2/de not_active Expired - Lifetime
- 1998-01-30 KR KR1019980002550A patent/KR100333785B1/ko not_active IP Right Cessation
-
2001
- 2001-02-14 KR KR1020010007204A patent/KR20060086492A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
KR19980070933A (ko) | 1998-10-26 |
KR100333785B1 (ko) | 2002-06-20 |
EP0856881A3 (en) | 1999-10-27 |
EP0856881B1 (en) | 2006-03-29 |
DE69834002D1 (de) | 2006-05-18 |
KR20060086492A (ko) | 2006-08-01 |
JPH10273371A (ja) | 1998-10-13 |
EP0856881A2 (en) | 1998-08-05 |
JP3954177B2 (ja) | 2007-08-08 |
US6057513A (en) | 2000-05-02 |
DE69834002T2 (de) | 2006-11-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW364153B (en) | Structure of jointing metal element and ceramic element and method thereof | |
TW335540B (en) | Ball grid array electronic package standoff design | |
WO2004055916A3 (en) | Phase change memory and manufacturing method therefor | |
AU4290396A (en) | A method of depositing tungsten nitride using a source gas comprising silicon | |
EP0724285A3 (en) | Electrostatic chuck and method of making | |
IT1279179B1 (it) | Formazione di un rivestimento di argento su un substrato vetroso. | |
ES8609406A1 (es) | Un procedimiento para producir una estructura de pelicula de polipropileno, de capas multiples y orientada. | |
EP1016544A3 (en) | Recording medium, production process of the recording medium, and image forming process using the recording medium | |
ES552092A0 (es) | Un procedimiento para revestir un sustrato con una composicion de revestimiento a base de una resina olquidica modificada con uretano. | |
DK0919644T3 (da) | Fremgangsmåde til fremstilling af et metallisk kompositbånd | |
TW345742B (en) | Method for producing integrated circuit capacitor | |
TW368685B (en) | Method of fabricating bump electrode | |
CA2187458A1 (en) | Method for facing a substrate | |
GB2198151B (en) | Metallic coating on an inorganic substrate | |
EP1065735A3 (de) | Piezoaktor mit einer elektrisch leitenden Mehrschichtfolie und Verfahren zur Herstellung der Mehrschichtfolie | |
AU1497295A (en) | Method of depositing solid substance on a substrate | |
EP0390465A3 (en) | Method of forming a film pattern on a substrate | |
NZ500877A (en) | Manufacturing catalysed hardware comprising adhering a porous structure, a ceramic carrier material and catalytic active material to a metallic surface | |
AU6665398A (en) | Improved method for manufacturing a circuit on a circuit substrate | |
GB2192197B (en) | Method of forming a metal film on the surface of a substrate metal | |
IT8521441A0 (it) | Procedimento per rivestire un substrato con un composto metallico. | |
CA2179311A1 (en) | Electrochemical gas sensor assembly | |
TW337610B (en) | Structure with reduced stress between a spin-on-glass layer and a metal layer and process for producing the same | |
AU6207998A (en) | Tyre comprising an airtight layer with a ductile metal layer | |
GB2298959B (en) | Method of fabricating metallized substrates using an organic etch block layer |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK4A | Expiration of patent term of an invention patent |