TW363903B - Apparatus for use in automatically cleaning semiconductor wafers and methods for drying a semiconductor wafer in the automatic drying machine - Google Patents
Apparatus for use in automatically cleaning semiconductor wafers and methods for drying a semiconductor wafer in the automatic drying machineInfo
- Publication number
- TW363903B TW363903B TW086100290A TW86100290A TW363903B TW 363903 B TW363903 B TW 363903B TW 086100290 A TW086100290 A TW 086100290A TW 86100290 A TW86100290 A TW 86100290A TW 363903 B TW363903 B TW 363903B
- Authority
- TW
- Taiwan
- Prior art keywords
- wafers
- compartment
- drying
- wafer
- cassette
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S134/00—Cleaning and liquid contact with solids
- Y10S134/902—Semiconductor wafer
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US61330296A | 1996-03-11 | 1996-03-11 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW363903B true TW363903B (en) | 1999-07-11 |
Family
ID=24456739
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW086100290A TW363903B (en) | 1996-03-11 | 1997-01-13 | Apparatus for use in automatically cleaning semiconductor wafers and methods for drying a semiconductor wafer in the automatic drying machine |
Country Status (5)
Country | Link |
---|---|
US (1) | US5974680A (zh) |
EP (1) | EP0795892A1 (zh) |
JP (1) | JPH09330905A (zh) |
KR (1) | KR970067540A (zh) |
TW (1) | TW363903B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113345821A (zh) * | 2021-08-06 | 2021-09-03 | 杭州众硅电子科技有限公司 | 一种晶圆清洗干燥方法及机构 |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5899216A (en) * | 1996-07-08 | 1999-05-04 | Speedfam Corporation | Apparatus for rinsing wafers in the context of a combined cleaning rinsing and drying system |
US5950327A (en) * | 1996-07-08 | 1999-09-14 | Speedfam-Ipec Corporation | Methods and apparatus for cleaning and drying wafers |
US5974681A (en) * | 1997-09-10 | 1999-11-02 | Speedfam-Ipec Corp. | Apparatus for spin drying a workpiece |
US6213853B1 (en) | 1997-09-10 | 2001-04-10 | Speedfam-Ipec Corporation | Integral machine for polishing, cleaning, rinsing and drying workpieces |
KR100300030B1 (ko) * | 1997-12-30 | 2001-10-19 | 김영환 | 노광장비의레티클세정장치 |
US6516816B1 (en) | 1999-04-08 | 2003-02-11 | Applied Materials, Inc. | Spin-rinse-dryer |
US6482678B1 (en) * | 2000-03-31 | 2002-11-19 | Lam Research Corporation | Wafer preparation systems and methods for preparing wafers |
DE10020103A1 (de) * | 2000-04-22 | 2001-10-31 | Contrade Mikrostruktur Technol | Verfahren und Vorrichtung zum nasschemischen Entfernen von Schichten und zur Reinigung von scheibenförmigen Einzelsubstraten |
US6695572B2 (en) | 2001-09-28 | 2004-02-24 | Agere Systems Inc. | Method and apparatus for minimizing semiconductor wafer contamination |
AU2003254149A1 (en) * | 2002-07-26 | 2004-02-16 | Applied Materials, Inc. | Hydrophilic components for a spin-rinse-dryer |
US7056392B1 (en) * | 2003-04-16 | 2006-06-06 | Lsi Logic Corporation | Wafer chucking apparatus and method for spin processor |
US7409263B2 (en) | 2004-07-14 | 2008-08-05 | Applied Materials, Inc. | Methods and apparatus for repositioning support for a substrate carrier |
US7720558B2 (en) | 2004-09-04 | 2010-05-18 | Applied Materials, Inc. | Methods and apparatus for mapping carrier contents |
US7644512B1 (en) | 2006-01-18 | 2010-01-12 | Akrion, Inc. | Systems and methods for drying a rotating substrate |
US7470638B2 (en) * | 2006-02-22 | 2008-12-30 | Micron Technology, Inc. | Systems and methods for manipulating liquid films on semiconductor substrates |
US20110094546A1 (en) * | 2009-10-23 | 2011-04-28 | John Valcore | System and method for wafer carrier vibration reduction |
CN102768974B (zh) * | 2012-07-23 | 2014-11-26 | 清华大学 | 晶圆清洗设备 |
GB2516311B (en) * | 2013-07-19 | 2016-06-29 | Dyson Technology Ltd | Motor mount |
AT515531B1 (de) * | 2014-09-19 | 2015-10-15 | Siconnex Customized Solutions Gmbh | Halterungssystem und Beschickungsverfahren für scheibenförmige Objekte |
GB2534176B (en) | 2015-01-15 | 2018-08-08 | Dyson Technology Ltd | Motor mount |
GB2543751B (en) | 2015-10-21 | 2019-04-24 | Dyson Technology Ltd | Motor mount |
Family Cites Families (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3640645A1 (de) * | 1986-11-28 | 1988-06-09 | Wacker Chemitronic | Verfahren zum zersaegen von kristallstaeben oder -bloecken vermittels innenlochsaege in duenne scheiben |
US5022419A (en) * | 1987-04-27 | 1991-06-11 | Semitool, Inc. | Rinser dryer system |
DE3815018A1 (de) * | 1987-05-06 | 1988-12-01 | Dan Science Co | Traegerreinigungs- und -trocknungsvorrichtung |
US4902350A (en) * | 1987-09-09 | 1990-02-20 | Robert F. Orr | Method for rinsing, cleaning and drying silicon wafers |
JP2736662B2 (ja) * | 1988-11-04 | 1998-04-02 | 東芝セラミックス株式会社 | 半導体ウェーハの曇防止装置 |
US5129955A (en) * | 1989-01-11 | 1992-07-14 | Dainippon Screen Mfg. Co., Ltd. | Wafer cleaning method |
JP2683940B2 (ja) * | 1989-08-09 | 1997-12-03 | 信越半導体 株式会社 | ワークの自動洗浄装置 |
JPH03124030A (ja) * | 1989-10-09 | 1991-05-27 | Tokyo Electron Ltd | 洗浄・乾燥方法及び洗浄装置 |
US4989345A (en) * | 1989-12-18 | 1991-02-05 | Gill Jr Gerald L | Centrifugal spin dryer for semiconductor wafer |
JP2593237B2 (ja) * | 1990-07-31 | 1997-03-26 | 三菱電機株式会社 | 浸漬洗浄装置 |
US4997490A (en) * | 1990-08-02 | 1991-03-05 | Bold Plastics, Inc. | Method of cleaning and rinsing wafers |
JPH04151828A (ja) * | 1990-10-16 | 1992-05-25 | Nippon Steel Corp | 薬液雰囲気分離装置 |
US5227001A (en) * | 1990-10-19 | 1993-07-13 | Integrated Process Equipment Corporation | Integrated dry-wet semiconductor layer removal apparatus and method |
US5186192A (en) * | 1990-12-14 | 1993-02-16 | Shin-Etsu Handotai Co., Ltd. | Apparatus for cleaning silicon wafer |
US5232328A (en) * | 1991-03-05 | 1993-08-03 | Semitool, Inc. | Robot loadable centrifugal semiconductor processor with extendible rotor |
JP2901098B2 (ja) * | 1991-04-02 | 1999-06-02 | 東京エレクトロン株式会社 | 洗浄装置および洗浄方法 |
US5488964A (en) * | 1991-05-08 | 1996-02-06 | Tokyo Electron Limited | Washing apparatus, and washing method |
US5174045A (en) * | 1991-05-17 | 1992-12-29 | Semitool, Inc. | Semiconductor processor with extendible receiver for handling multiple discrete wafers without wafer carriers |
US5317778A (en) * | 1991-07-31 | 1994-06-07 | Shin-Etsu Handotai Co., Ltd. | Automatic cleaning apparatus for wafers |
JP2639771B2 (ja) * | 1991-11-14 | 1997-08-13 | 大日本スクリーン製造株式会社 | 基板の洗浄・乾燥処理方法並びにその処理装置 |
JP2571487B2 (ja) * | 1991-12-27 | 1997-01-16 | 信越半導体株式会社 | 薄円板状ワークのスクラバー洗浄装置 |
KR0163362B1 (ko) * | 1992-03-05 | 1999-02-01 | 이노우에 아키라 | 세정장치용 처리조 |
KR100248564B1 (ko) * | 1992-04-07 | 2000-03-15 | 다카시마 히로시 | 스핀 드라이어 |
KR0170421B1 (ko) * | 1992-04-16 | 1999-03-30 | 이노우에 아키라 | 스핀 드라이어 |
US5277715A (en) * | 1992-06-04 | 1994-01-11 | Micron Semiconductor, Inc. | Method of reducing particulate concentration in process fluids |
US5427644A (en) * | 1993-01-11 | 1995-06-27 | Tokyo Seimitsu Co., Ltd. | Method of manufacturing semiconductor wafer and system therefor |
US5468302A (en) * | 1994-07-13 | 1995-11-21 | Thietje; Jerry | Semiconductor wafer cleaning system |
-
1997
- 1997-01-13 TW TW086100290A patent/TW363903B/zh active
- 1997-03-07 EP EP97301529A patent/EP0795892A1/en not_active Withdrawn
- 1997-03-10 KR KR1019970007912A patent/KR970067540A/ko not_active Application Discontinuation
- 1997-03-11 JP JP9056152A patent/JPH09330905A/ja not_active Withdrawn
- 1997-08-22 US US08/917,206 patent/US5974680A/en not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113345821A (zh) * | 2021-08-06 | 2021-09-03 | 杭州众硅电子科技有限公司 | 一种晶圆清洗干燥方法及机构 |
Also Published As
Publication number | Publication date |
---|---|
EP0795892A1 (en) | 1997-09-17 |
KR970067540A (ko) | 1997-10-13 |
US5974680A (en) | 1999-11-02 |
JPH09330905A (ja) | 1997-12-22 |
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