TW363903B - Apparatus for use in automatically cleaning semiconductor wafers and methods for drying a semiconductor wafer in the automatic drying machine - Google Patents

Apparatus for use in automatically cleaning semiconductor wafers and methods for drying a semiconductor wafer in the automatic drying machine

Info

Publication number
TW363903B
TW363903B TW086100290A TW86100290A TW363903B TW 363903 B TW363903 B TW 363903B TW 086100290 A TW086100290 A TW 086100290A TW 86100290 A TW86100290 A TW 86100290A TW 363903 B TW363903 B TW 363903B
Authority
TW
Taiwan
Prior art keywords
wafers
compartment
drying
wafer
cassette
Prior art date
Application number
TW086100290A
Other languages
English (en)
Inventor
Gary L Andeson
Keith Wilson
Original Assignee
Memc Electronic Materials Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Memc Electronic Materials Spa filed Critical Memc Electronic Materials Spa
Application granted granted Critical
Publication of TW363903B publication Critical patent/TW363903B/zh

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00Cleaning and liquid contact with solids
    • Y10S134/902Semiconductor wafer

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
TW086100290A 1996-03-11 1997-01-13 Apparatus for use in automatically cleaning semiconductor wafers and methods for drying a semiconductor wafer in the automatic drying machine TW363903B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US61330296A 1996-03-11 1996-03-11

Publications (1)

Publication Number Publication Date
TW363903B true TW363903B (en) 1999-07-11

Family

ID=24456739

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086100290A TW363903B (en) 1996-03-11 1997-01-13 Apparatus for use in automatically cleaning semiconductor wafers and methods for drying a semiconductor wafer in the automatic drying machine

Country Status (5)

Country Link
US (1) US5974680A (zh)
EP (1) EP0795892A1 (zh)
JP (1) JPH09330905A (zh)
KR (1) KR970067540A (zh)
TW (1) TW363903B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113345821A (zh) * 2021-08-06 2021-09-03 杭州众硅电子科技有限公司 一种晶圆清洗干燥方法及机构

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US6516816B1 (en) 1999-04-08 2003-02-11 Applied Materials, Inc. Spin-rinse-dryer
US6482678B1 (en) * 2000-03-31 2002-11-19 Lam Research Corporation Wafer preparation systems and methods for preparing wafers
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US6695572B2 (en) 2001-09-28 2004-02-24 Agere Systems Inc. Method and apparatus for minimizing semiconductor wafer contamination
AU2003254149A1 (en) * 2002-07-26 2004-02-16 Applied Materials, Inc. Hydrophilic components for a spin-rinse-dryer
US7056392B1 (en) * 2003-04-16 2006-06-06 Lsi Logic Corporation Wafer chucking apparatus and method for spin processor
US7409263B2 (en) 2004-07-14 2008-08-05 Applied Materials, Inc. Methods and apparatus for repositioning support for a substrate carrier
US7720558B2 (en) 2004-09-04 2010-05-18 Applied Materials, Inc. Methods and apparatus for mapping carrier contents
US7644512B1 (en) 2006-01-18 2010-01-12 Akrion, Inc. Systems and methods for drying a rotating substrate
US7470638B2 (en) * 2006-02-22 2008-12-30 Micron Technology, Inc. Systems and methods for manipulating liquid films on semiconductor substrates
US20110094546A1 (en) * 2009-10-23 2011-04-28 John Valcore System and method for wafer carrier vibration reduction
CN102768974B (zh) * 2012-07-23 2014-11-26 清华大学 晶圆清洗设备
GB2516311B (en) * 2013-07-19 2016-06-29 Dyson Technology Ltd Motor mount
AT515531B1 (de) * 2014-09-19 2015-10-15 Siconnex Customized Solutions Gmbh Halterungssystem und Beschickungsverfahren für scheibenförmige Objekte
GB2534176B (en) 2015-01-15 2018-08-08 Dyson Technology Ltd Motor mount
GB2543751B (en) 2015-10-21 2019-04-24 Dyson Technology Ltd Motor mount

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113345821A (zh) * 2021-08-06 2021-09-03 杭州众硅电子科技有限公司 一种晶圆清洗干燥方法及机构

Also Published As

Publication number Publication date
EP0795892A1 (en) 1997-09-17
KR970067540A (ko) 1997-10-13
US5974680A (en) 1999-11-02
JPH09330905A (ja) 1997-12-22

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