TW352419B - Composition of X-ray mask - Google Patents
Composition of X-ray maskInfo
- Publication number
- TW352419B TW352419B TW087108817A TW87108817A TW352419B TW 352419 B TW352419 B TW 352419B TW 087108817 A TW087108817 A TW 087108817A TW 87108817 A TW87108817 A TW 87108817A TW 352419 B TW352419 B TW 352419B
- Authority
- TW
- Taiwan
- Prior art keywords
- composition
- silicon wafer
- ray mask
- absorbing layer
- patterns
- Prior art date
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 3
- 229910052710 silicon Inorganic materials 0.000 abstract 3
- 239000010703 silicon Substances 0.000 abstract 3
- 239000012528 membrane Substances 0.000 abstract 2
- 238000005530 etching Methods 0.000 abstract 1
- 230000000873 masking effect Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/10—Scattering devices; Absorbing devices; Ionising radiation filters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/045—Diaphragms
- H01J2237/0451—Diaphragms with fixed aperture
- H01J2237/0453—Diaphragms with fixed aperture multiple apertures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3175—Lithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW087108817A TW352419B (en) | 1998-06-04 | 1998-06-04 | Composition of X-ray mask |
US09/111,426 US6001514A (en) | 1998-06-04 | 1998-07-07 | Mask for an exposure process using X-ray |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW087108817A TW352419B (en) | 1998-06-04 | 1998-06-04 | Composition of X-ray mask |
Publications (1)
Publication Number | Publication Date |
---|---|
TW352419B true TW352419B (en) | 1999-02-11 |
Family
ID=21630276
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW087108817A TW352419B (en) | 1998-06-04 | 1998-06-04 | Composition of X-ray mask |
Country Status (2)
Country | Link |
---|---|
US (1) | US6001514A (zh) |
TW (1) | TW352419B (zh) |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4873162A (en) * | 1986-08-20 | 1989-10-10 | Mitsubishi Denki Kabushiki Kaisha | X-ray mask and a manufacture method therefor |
-
1998
- 1998-06-04 TW TW087108817A patent/TW352419B/zh active
- 1998-07-07 US US09/111,426 patent/US6001514A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US6001514A (en) | 1999-12-14 |
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