KR0119369B1 - Thickness measuring method for thin oxidation - Google Patents

Thickness measuring method for thin oxidation

Info

Publication number
KR0119369B1
KR0119369B1 KR94024222A KR19940024222A KR0119369B1 KR 0119369 B1 KR0119369 B1 KR 0119369B1 KR 94024222 A KR94024222 A KR 94024222A KR 19940024222 A KR19940024222 A KR 19940024222A KR 0119369 B1 KR0119369 B1 KR 0119369B1
Authority
KR
South Korea
Prior art keywords
oxide film
calculating
intensity
measuring method
thickness measuring
Prior art date
Application number
KR94024222A
Other languages
Korean (ko)
Other versions
KR960011385A (en
Inventor
Ki-Ho Baek
Original Assignee
Hyundai Electronics Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hyundai Electronics Ind filed Critical Hyundai Electronics Ind
Priority to KR94024222A priority Critical patent/KR0119369B1/en
Publication of KR960011385A publication Critical patent/KR960011385A/en
Application granted granted Critical
Publication of KR0119369B1 publication Critical patent/KR0119369B1/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

The method is for measuring the thickness of a thin oxide film using X-ray photoelectron spectroscopy. The method comprises the steps of: obtaining distribution curves of SiO2, SiO, SiC by radiating X-ray onto the surface of an oxide film using X-ray photoelectron spectroscopy and by measuring the photoelectron emitting from the surface of the oxide film; calculating the intensity of the oxide film by integrating the distribution curves of SiO2 and SiO, and calculating the intensity of a sililated photoresist film on the bottom of the oxide film by integrating the distribution curve of SiC; and calculating the thickness of the oxide film using lnR/K+1 = d/( Osin ) where R is the ratio of the intensity of the oxide film and that of the photoresist film and O= 2.7 nm, K = 2.7.
KR94024222A 1994-09-26 1994-09-26 Thickness measuring method for thin oxidation KR0119369B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR94024222A KR0119369B1 (en) 1994-09-26 1994-09-26 Thickness measuring method for thin oxidation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR94024222A KR0119369B1 (en) 1994-09-26 1994-09-26 Thickness measuring method for thin oxidation

Publications (2)

Publication Number Publication Date
KR960011385A KR960011385A (en) 1996-04-20
KR0119369B1 true KR0119369B1 (en) 1997-09-30

Family

ID=19393511

Family Applications (1)

Application Number Title Priority Date Filing Date
KR94024222A KR0119369B1 (en) 1994-09-26 1994-09-26 Thickness measuring method for thin oxidation

Country Status (1)

Country Link
KR (1) KR0119369B1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113514021B (en) * 2021-06-10 2023-08-11 中国空气动力研究与发展中心计算空气动力研究所 Method for evaluating quality loss and oxide layer thickness of composite material

Also Published As

Publication number Publication date
KR960011385A (en) 1996-04-20

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