TW347369B - Organic substrate provided with a light absorptive antireflection film and process for production - Google Patents

Organic substrate provided with a light absorptive antireflection film and process for production

Info

Publication number
TW347369B
TW347369B TW086118625A TW86118625A TW347369B TW 347369 B TW347369 B TW 347369B TW 086118625 A TW086118625 A TW 086118625A TW 86118625 A TW86118625 A TW 86118625A TW 347369 B TW347369 B TW 347369B
Authority
TW
Taiwan
Prior art keywords
organic substrate
antireflection film
substrate provided
production
light absorptive
Prior art date
Application number
TW086118625A
Other languages
English (en)
Inventor
Takushi Oyama
Hitoshi Osaki
Tomohiro Yamada
Toshihiko Higuchi
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Application granted granted Critical
Publication of TW347369B publication Critical patent/TW347369B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0676—Oxynitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C23C14/0652—Silicon nitride
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y10T428/2495—Thickness [relative or absolute]
    • Y10T428/24967—Absolute thicknesses specified
    • Y10T428/24975—No layer or component greater than 5 mils thick

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)
TW086118625A 1996-12-17 1997-12-10 Organic substrate provided with a light absorptive antireflection film and process for production TW347369B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33726696 1996-12-17

Publications (1)

Publication Number Publication Date
TW347369B true TW347369B (en) 1998-12-11

Family

ID=18307003

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086118625A TW347369B (en) 1996-12-17 1997-12-10 Organic substrate provided with a light absorptive antireflection film and process for production

Country Status (5)

Country Link
US (1) US5976684A (zh)
EP (1) EP0854202B1 (zh)
KR (1) KR100345759B1 (zh)
DE (1) DE69720401T2 (zh)
TW (1) TW347369B (zh)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW415922B (en) * 1996-06-11 2000-12-21 Asahi Glass Co Ltd Light absorptive anti-reflector and method for manufacturing the same
US6495251B1 (en) 1997-06-20 2002-12-17 Ppg Industries Ohio, Inc. Silicon oxynitride protective coatings
KR100563419B1 (ko) 1998-02-24 2006-03-22 아사히 가라스 가부시키가이샤 광 흡수성 반사방지체 및 그 제조 방법
JP2000047007A (ja) * 1998-07-31 2000-02-18 Sony Corp 反射防止膜及び陰極線管
TW536638B (en) 1998-10-14 2003-06-11 Tomoegawa Paper Co Ltd Anti-reflection material and polarized film using the same
WO2000033110A1 (fr) 1998-11-30 2000-06-08 Asahi Glass Company Ltd. Film antireflet pour fenetre de materiel de transport, verre a film antireflet, verre feuillete et leur procede de production
KR100310946B1 (ko) * 1999-08-07 2001-10-18 구본준, 론 위라하디락사 액정표시장치 및 그 제조방법
US6441964B1 (en) * 2001-01-10 2002-08-27 Applied Vacuum Coating Technologies Co., Ltd. Anti-reflection high conductivity multi-layer coating for flat CRT products
US6478932B1 (en) 2001-06-21 2002-11-12 Applied Vacuum Coating Technologies Co., Ltd. Combination process of vacuum sputtering and wet coating for high conductivity and light attenuation anti-reflection coating on CRT surface
JP4736373B2 (ja) * 2004-08-03 2011-07-27 日油株式会社 近赤外線吸収材及びそれを用いた表示装置
JP5103184B2 (ja) * 2005-09-20 2012-12-19 三菱樹脂株式会社 ガスバリア性積層フィルム
JP2007326357A (ja) * 2006-05-10 2007-12-20 Fujifilm Corp 積層フィルム及び画像表示装置
JP5315681B2 (ja) * 2007-12-12 2013-10-16 Ｔｄｋ株式会社 ハードコート用組成物、ハードコート層を有する物体およびその製造方法
CN102016652B (zh) * 2008-04-24 2012-12-26 旭硝子株式会社 低反射玻璃及显示器用保护板
JP4682368B2 (ja) * 2009-08-11 2011-05-11 独立行政法人産業技術総合研究所 球状コアシェル型酸化セリウム／高分子ハイブリッドナノ粒子の集積体及びその製造方法
KR101677994B1 (ko) * 2010-06-23 2016-11-21 엘지디스플레이 주식회사 액정표시장치 및 그 제조방법
KR101230155B1 (ko) * 2012-09-12 2013-02-13 주식회사 에이팸 디스플레이용 보호 글라스 및 그 제조방법
CN103481565B (zh) * 2013-08-28 2016-08-10 杭州正奥科技有限公司 一种可静电粘附隔热膜及其制造方法
JP6931869B2 (ja) * 2016-10-21 2021-09-08 国立研究開発法人産業技術総合研究所 半導体装置
KR102465023B1 (ko) 2016-12-27 2022-11-08 리껭테크노스 가부시키가이샤 반사 방지 기능 및 적외선 차폐 기능을 갖는 적층 필름
CN111338118A (zh) * 2020-04-14 2020-06-26 Tcl华星光电技术有限公司 一种显示面板及其制备方法

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4055442A (en) * 1976-01-19 1977-10-25 Optical Coating Laboratory, Inc. Silicon solar cell construction having two layer anti-reflection coating
US4320155A (en) * 1978-01-03 1982-03-16 Ppg Industries, Inc. Method for coating an article to alternately reflect and absorb solar energy
JPS56106202A (en) * 1980-01-29 1981-08-24 Tokyo Optical Co Ltd Infrared reflection preventing film
US4430404A (en) * 1981-04-30 1984-02-07 Hitachi, Ltd. Electrophotographic photosensitive material having thin amorphous silicon protective layer
JPS58199301A (ja) * 1982-05-17 1983-11-19 Matsushima Kogyo Co Ltd 合成樹脂製レンズの反射防止膜
US4590117A (en) * 1983-03-10 1986-05-20 Toray Industries, Inc. Transparent material having antireflective coating
US4535026A (en) * 1983-06-29 1985-08-13 The United States Of America As Represented By The United States Department Of Energy Antireflective graded index silica coating, method for making
US4445997A (en) * 1983-08-17 1984-05-01 Shatterproof Glass Corporation Rotatable sputtering apparatus
JPS6046501A (ja) * 1983-08-25 1985-03-13 Seiko Epson Corp プラスチツクレンズ
US4466874A (en) * 1983-09-29 1984-08-21 General Electric Company Method of electroding a poly(vinylidene fluoride) solid
EP0145201A1 (en) * 1983-11-10 1985-06-19 Optical Coating Laboratory, Inc. Antireflection optical coating with antistatic properties
JPH0685002B2 (ja) * 1986-02-18 1994-10-26 ミノルタ株式会社 プラスチツク光学部品の反射防止膜
US4696834A (en) * 1986-02-28 1987-09-29 Dow Corning Corporation Silicon-containing coatings and a method for their preparation
US4851095A (en) * 1988-02-08 1989-07-25 Optical Coating Laboratory, Inc. Magnetron sputtering apparatus and process
US5047131A (en) * 1989-11-08 1991-09-10 The Boc Group, Inc. Method for coating substrates with silicon based compounds
JPH0637283B2 (ja) * 1989-12-20 1994-05-18 セントラル硝子株式会社 酸化物薄膜の成膜方法
US5091244A (en) * 1990-08-10 1992-02-25 Viratec Thin Films, Inc. Electrically-conductive, light-attenuating antireflection coating
US5407733A (en) * 1990-08-10 1995-04-18 Viratec Thin Films, Inc. Electrically-conductive, light-attenuating antireflection coating
JPH0756001A (ja) * 1993-08-09 1995-03-03 Shincron:Kk 反射防止ハードコート層およびその製造方法
EP0647089B1 (de) * 1993-09-30 1998-03-25 Siemens Aktiengesellschaft Verfahren zur Herstellung von dreidimensionalen Kunststoffteilen mit integrierten Leiterzügen
JPH07105740A (ja) * 1993-10-08 1995-04-21 Mitsui Toatsu Chem Inc 透明導電性フィルム
US5691044A (en) * 1994-12-13 1997-11-25 Asahi Glass Company, Ltd. Light absorptive antireflector
JP3520627B2 (ja) * 1995-09-14 2004-04-19 ソニー株式会社 光反射防止部材及びその作製方法、並びに陰極線管
DE19541014B4 (de) * 1995-11-03 2011-06-01 Applied Materials Gmbh & Co. Kg Antireflexschichtsystem und Verfahren zur Herstellung eines Antireflexschichtsystems

Also Published As

Publication number Publication date
EP0854202B1 (en) 2003-04-02
EP0854202A2 (en) 1998-07-22
EP0854202A3 (en) 1999-12-01
KR100345759B1 (ko) 2003-03-06
KR19980064202A (ko) 1998-10-07
US5976684A (en) 1999-11-02
DE69720401T2 (de) 2004-01-08
DE69720401D1 (de) 2003-05-08

Similar Documents

Publication Publication Date Title
TW347369B (en) Organic substrate provided with a light absorptive antireflection film and process for production
EP1052525A4 (en) ANTIREFLECTIVE FILM FOR A WINDOW OF TRANSPORTATION EQUIPMENT, ANTIREFLECTIVE FILM GLASS, LAMINATED GLASS AND THE PRODUCTION METHOD THEREOF
EP0991129A4 (en) SOLAR BATTERY MODULE AND METHOD FOR MANUFACTURING THE SAME
ATE169288T1 (de) Transparenter gegenstand mit siliciumnitrid- schutzschicht
EP1837684A3 (en) Optical functional materials and process for producing the same
TW267216B (zh)
EP0997360A3 (en) Rain sensor operation on solar reflective glass
EP1184685B8 (en) Optical element having anti-reflection film
AU3365699A (en) Integrated micro-optical systems
EP1249717A3 (en) Antireflection coating and optical element using the same
EP1174734A3 (en) Optical element and eyeglass lens
EP1074859A3 (en) Anti-reflective material
WO1997028480A3 (en) Athermal optical device
DE69840026D1 (de) Anti-reflexionsfilm
CA2193655A1 (fr) Lentille ophtalmique en verre organique a intercouche anti-chocs et son procede de fabrication
GB2335509A (en) Matrix shaped opaque low reflecting coating on glass
CA2219316A1 (en) Flexible plastic substrate with anti-reflection coating having low reflective color and method
CA2025056A1 (en) Nonlinear optical device
CA2157070A1 (en) Optical lens of transparent plastic
ATE85787T1 (de) Monolitische sonnenschutzglasscheibe.
AU4593499A (en) A thin-film opto-electronic device and a method of making it
WO1998000894A3 (de) Optisches halbleiterbauelement mit tiefem rippenwellenleiter
WO1995006887A3 (en) Improvements in or relating to microlens screens and the like
EP0373923A3 (en) High light-transmissive dust-proof body and method of preparing same
JPS57139701A (en) Reflection preventing film of plastic optical member

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees