TW224537B - Fused quartz diffusion tubes for semiconductor manufacture - Google Patents

Fused quartz diffusion tubes for semiconductor manufacture

Info

Publication number
TW224537B
TW224537B TW082109848A TW82109848A TW224537B TW 224537 B TW224537 B TW 224537B TW 082109848 A TW082109848 A TW 082109848A TW 82109848 A TW82109848 A TW 82109848A TW 224537 B TW224537 B TW 224537B
Authority
TW
Taiwan
Prior art keywords
fused quartz
metal
interior
exterior surface
diffusion tubes
Prior art date
Application number
TW082109848A
Other languages
English (en)
Inventor
Ernest Dogunke Gordon
Eoward Scott Curtis
Original Assignee
Gen Electric
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gen Electric filed Critical Gen Electric
Application granted granted Critical
Publication of TW224537B publication Critical patent/TW224537B/zh

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02Epitaxial-layer growth
    • C30B25/08Reaction chambers; Selection of materials therefor
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/10Reaction chambers; Selection of materials therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Silicon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Glass Melting And Manufacturing (AREA)
TW082109848A 1992-12-21 1993-11-23 Fused quartz diffusion tubes for semiconductor manufacture TW224537B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US99401792A 1992-12-21 1992-12-21

Publications (1)

Publication Number Publication Date
TW224537B true TW224537B (en) 1994-06-01

Family

ID=25540206

Family Applications (1)

Application Number Title Priority Date Filing Date
TW082109848A TW224537B (en) 1992-12-21 1993-11-23 Fused quartz diffusion tubes for semiconductor manufacture

Country Status (6)

Country Link
EP (1) EP0604096B1 (zh)
JP (1) JPH06260439A (zh)
KR (1) KR940016469A (zh)
CA (1) CA2110009A1 (zh)
DE (1) DE69302166T2 (zh)
TW (1) TW224537B (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7329467B2 (en) 2003-08-22 2008-02-12 Saint-Gobain Ceramics & Plastics, Inc. Ceramic article having corrosion-resistant layer, semiconductor processing apparatus incorporating same, and method for forming same
CN101018885B (zh) 2004-08-24 2010-07-14 圣戈本陶瓷及塑料股份有限公司 半导体加工部件及用该部件进行的半导体加工
US20070026205A1 (en) 2005-08-01 2007-02-01 Vapor Technologies Inc. Article having patterned decorative coating

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1293554A (fr) * 1961-03-29 1962-05-18 Thomson Houston Comp Francaise Procédé de fabrication de produits semi-conducteurs bruts ou finis
FR1431666A (fr) * 1963-03-29 1966-03-18 Siemens Ag Procédé pour le traitement thermique de corps semiconducteurs monocristallins
US4102666A (en) * 1968-02-22 1978-07-25 Heraeus-Schott Quarzschmelze Gmbh Method of surface crystallizing quartz
DE3544812A1 (de) * 1985-12-18 1987-06-25 Heraeus Schott Quarzschmelze Doppelwand-quarzglasrohr fuer die durchfuehrung halbleitertechnologischer prozesse

Also Published As

Publication number Publication date
CA2110009A1 (en) 1994-06-22
DE69302166T2 (de) 1996-11-21
EP0604096A1 (en) 1994-06-29
DE69302166D1 (de) 1996-05-15
EP0604096B1 (en) 1996-04-10
KR940016469A (ko) 1994-07-23
JPH06260439A (ja) 1994-09-16

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