TW202428734A - 多孔質之低介電性聚合物膜 - Google Patents
多孔質之低介電性聚合物膜 Download PDFInfo
- Publication number
- TW202428734A TW202428734A TW112135690A TW112135690A TW202428734A TW 202428734 A TW202428734 A TW 202428734A TW 112135690 A TW112135690 A TW 112135690A TW 112135690 A TW112135690 A TW 112135690A TW 202428734 A TW202428734 A TW 202428734A
- Authority
- TW
- Taiwan
- Prior art keywords
- liquid crystal
- low dielectric
- formula
- porous
- crystal polymer
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
- C08J9/26—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof by elimination of a solid phase from a macromolecular composition or article, e.g. leaching out
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2367/00—Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022-186432 | 2022-11-22 | ||
| JP2022186432 | 2022-11-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW202428734A true TW202428734A (zh) | 2024-07-16 |
Family
ID=91195391
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW112135690A TW202428734A (zh) | 2022-11-22 | 2023-09-19 | 多孔質之低介電性聚合物膜 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPWO2024111229A1 (https=) |
| KR (1) | KR20250114006A (https=) |
| CN (1) | CN120187783A (https=) |
| TW (1) | TW202428734A (https=) |
| WO (1) | WO2024111229A1 (https=) |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4159199B2 (ja) | 1999-09-16 | 2008-10-01 | 日東電工株式会社 | 多孔質体及び多孔質体の製造方法 |
| JP4557409B2 (ja) | 2000-11-13 | 2010-10-06 | 日東電工株式会社 | 多孔質ポリイミドの製造方法及び多孔質ポリイミド |
| JP4836920B2 (ja) | 2007-10-18 | 2011-12-14 | セコム株式会社 | ネットワーク監視システム及び端末装置 |
| JP5734623B2 (ja) | 2010-11-10 | 2015-06-17 | ユニチカ株式会社 | 積層体の製造方法 |
| JP2012136626A (ja) * | 2010-12-27 | 2012-07-19 | Sumitomo Chemical Co Ltd | 液晶ポリエステル多孔質膜 |
| JP2014231533A (ja) * | 2011-02-03 | 2014-12-11 | 日東電工株式会社 | 多孔質樹脂成型体、多孔体基板およびその製造方法 |
| CN109496223B (zh) * | 2016-07-25 | 2022-05-24 | 日东电工株式会社 | 多孔的低介电性聚合物膜及毫米波天线用膜 |
| CN110475814B (zh) * | 2017-04-06 | 2022-09-13 | 日东电工株式会社 | 毫米波天线用膜 |
| WO2022114159A1 (ja) * | 2020-11-27 | 2022-06-02 | 富士フイルム株式会社 | 液晶ポリマーフィルム及びその製造方法、並びに、積層体 |
| CN116669950A (zh) * | 2021-02-18 | 2023-08-29 | 富士胶片株式会社 | 液晶聚合物膜、聚合物膜及层叠体 |
| JP2022127829A (ja) * | 2021-02-22 | 2022-09-01 | 富士フイルム株式会社 | 多孔質膜の製造方法、及び、多孔質膜 |
-
2023
- 2023-09-14 JP JP2024559978A patent/JPWO2024111229A1/ja active Pending
- 2023-09-14 CN CN202380079600.9A patent/CN120187783A/zh active Pending
- 2023-09-14 KR KR1020257016082A patent/KR20250114006A/ko active Pending
- 2023-09-14 WO PCT/JP2023/033625 patent/WO2024111229A1/ja not_active Ceased
- 2023-09-19 TW TW112135690A patent/TW202428734A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| CN120187783A (zh) | 2025-06-20 |
| WO2024111229A1 (ja) | 2024-05-30 |
| JPWO2024111229A1 (https=) | 2024-05-30 |
| KR20250114006A (ko) | 2025-07-28 |
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