TW202401048A - 彩色濾光片之製造方法及圖像顯示裝置之製造方法 - Google Patents

彩色濾光片之製造方法及圖像顯示裝置之製造方法 Download PDF

Info

Publication number
TW202401048A
TW202401048A TW112109518A TW112109518A TW202401048A TW 202401048 A TW202401048 A TW 202401048A TW 112109518 A TW112109518 A TW 112109518A TW 112109518 A TW112109518 A TW 112109518A TW 202401048 A TW202401048 A TW 202401048A
Authority
TW
Taiwan
Prior art keywords
group
mass
less
formula
resin composition
Prior art date
Application number
TW112109518A
Other languages
English (en)
Chinese (zh)
Inventor
平岡紫陽
石井宏明
福岡幸治
Original Assignee
日商三菱化學股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商三菱化學股份有限公司 filed Critical 日商三菱化學股份有限公司
Publication of TW202401048A publication Critical patent/TW202401048A/zh

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • G03F7/168Finishing the coated layer, e.g. drying, baking, soaking
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/38Treatment before imagewise removal, e.g. prebaking
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Optical Filters (AREA)
TW112109518A 2022-03-16 2023-03-15 彩色濾光片之製造方法及圖像顯示裝置之製造方法 TW202401048A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022-040963 2022-03-16
JP2022040963 2022-03-16

Publications (1)

Publication Number Publication Date
TW202401048A true TW202401048A (zh) 2024-01-01

Family

ID=88023919

Family Applications (1)

Application Number Title Priority Date Filing Date
TW112109518A TW202401048A (zh) 2022-03-16 2023-03-15 彩色濾光片之製造方法及圖像顯示裝置之製造方法

Country Status (5)

Country Link
JP (1) JPWO2023176888A1 (https=)
KR (1) KR20240164887A (https=)
CN (1) CN118843811A (https=)
TW (1) TW202401048A (https=)
WO (1) WO2023176888A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI908433B (zh) * 2024-04-02 2025-12-11 南韓商三星Sdi股份有限公司 含有增效劑的感光性樹脂組成物、使用該組成物製造的感光性樹脂膜和彩色濾光片

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5836326B2 (ja) * 2012-07-30 2015-12-24 富士フイルム株式会社 着色硬化性組成物およびカラーフィルタ
JP7003637B2 (ja) 2017-12-25 2022-01-20 三菱ケミカル株式会社 着色樹脂組成物、カラーフィルタ、及び画像表示装置
JP7283300B2 (ja) 2018-09-14 2023-05-30 Jsr株式会社 感光性着色組成物、カラーフィルタ及び表示素子
CN113272346B (zh) 2019-02-21 2025-04-15 三菱化学株式会社 着色树脂组合物、滤色片、以及图像显示装置
TWI839519B (zh) * 2019-05-24 2024-04-21 日商富士軟片股份有限公司 感光性樹脂組成物、硬化膜、濾色器、固體攝像元件及圖像顯示裝置
JP7371422B2 (ja) * 2019-09-30 2023-10-31 東洋インキScホールディングス株式会社 フタロシアニン顔料、着色組成物、感光性着色組成物、及びカラーフィルタ
JP2021191846A (ja) * 2020-06-04 2021-12-16 山陽色素株式会社 着色組成物及び該着色組成物を含む塗膜形成用組成物
CN115956223A (zh) * 2020-08-20 2023-04-11 三菱化学株式会社 着色树脂组合物、滤色器及图像显示装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI908433B (zh) * 2024-04-02 2025-12-11 南韓商三星Sdi股份有限公司 含有增效劑的感光性樹脂組成物、使用該組成物製造的感光性樹脂膜和彩色濾光片

Also Published As

Publication number Publication date
WO2023176888A1 (ja) 2023-09-21
KR20240164887A (ko) 2024-11-21
JPWO2023176888A1 (https=) 2023-09-21
CN118843811A (zh) 2024-10-25

Similar Documents

Publication Publication Date Title
JP2011070172A (ja) カラーフィルタ用着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機elディスプレイ
JP2019144543A (ja) 着色樹脂組成物、カラーフィルタ、及び画像表示装置
JP2019113732A (ja) 着色樹脂組成物、カラーフィルタ、及び画像表示装置
TWI812845B (zh) 著色樹脂組合物、彩色濾光片及圖像顯示裝置
JP7207173B2 (ja) 着色樹脂組成物、カラーフィルタ、及び画像表示装置
JP2025137571A (ja) 着色樹脂組成物、カラーフィルタ、画像表示装置、及び着色剤分散液
JP7779261B2 (ja) 着色樹脂組成物、カラーフィルタ、及び画像表示装置
JP7848683B2 (ja) 着色樹脂組成物、カラーフィルタ、及び画像表示装置
TW202401048A (zh) 彩色濾光片之製造方法及圖像顯示裝置之製造方法
JP7180545B2 (ja) カラーフィルタ用着色組成物、及び感光性着色樹脂組成物
JP7124406B2 (ja) 着色樹脂組成物、カラーフィルタ、及び画像表示装置
JP2024040909A (ja) 着色樹脂組成物、カラーフィルタ、及び画像表示装置
JP7447397B2 (ja) 感光性着色樹脂組成物、カラーフィルタ、及び画像表示装置
WO2023095828A1 (ja) 着色樹脂組成物、着色樹脂組成物セット、及びカラーフィルタ
TW202402820A (zh) 著色樹脂組合物、硬化物、彩色濾光片及圖像顯示裝置
JP7159948B2 (ja) 着色樹脂組成物、カラーフィルタ、及び画像表示装置
TW202334326A (zh) 著色樹脂組合物、彩色濾光片及圖像顯示裝置
WO2024075837A1 (ja) 着色剤含有液、着色樹脂組成物、カラーフィルタ、画像表示装置、及び着色樹脂組成物の製造方法