TW202341112A - Light-emitting device array substrate and method for fabricating the same - Google Patents
Light-emitting device array substrate and method for fabricating the same Download PDFInfo
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Abstract
Description
本發明是有關於一種發光元件陣列基板及其製造方法。The invention relates to a light-emitting element array substrate and a manufacturing method thereof.
由於微型發光二極體的尺寸極小,目前製作微型發光二極體發光元件陣列基板的方法是採用多次的巨量轉移(Mass Transfer)技術,以逐步將微型發光二極體晶粒轉移到具有畫素電路的驅動基板上,其中微型發光二極體晶粒藉由黏著材暫時固定於不同的轉移載板上,以實現各次轉移所期望的結果。Due to the extremely small size of micro-LEDs, the current method of manufacturing micro-LED light-emitting element array substrates is to use multiple mass transfer (Mass Transfer) technology to gradually transfer micro-LED grains to On the driving substrate of the pixel circuit, the micro light-emitting diode chips are temporarily fixed on different transfer carriers through adhesive materials to achieve the desired results for each transfer.
在多次的巨量轉移過程中,微型發光二極體晶粒的接墊會被黏著材覆蓋,因此,在後段的轉移過程中,必須移除覆蓋接墊的黏著材,以使微型發光二極體晶粒能夠與外部元件進行連接。然而,在移除覆蓋接墊的黏著材的過程中,將微型發光二極體晶粒固定於轉移載板的黏著材也會被移除,導致微型發光二極體晶粒於轉移載板上的位置產生偏移,因而影響微型發光二極體晶粒的對位精準度以及於後續轉移步驟的轉移精準度。During multiple large-volume transfer processes, the pads of the micro-LED dies will be covered by the adhesive material. Therefore, during the subsequent transfer process, the adhesive material covering the pads must be removed to allow the micro-LED dies to be released. Polar body dies enable connections to external components. However, during the process of removing the adhesive material covering the pads, the adhesive material fixing the micro-LED die to the transfer carrier will also be removed, resulting in the micro-LED die being attached to the transfer carrier. The position is shifted, thus affecting the alignment accuracy of the micro-LED die and the transfer accuracy in subsequent transfer steps.
本發明提供一種發光元件陣列基板,具有良好的對位精準度。The invention provides a light-emitting element array substrate with good alignment accuracy.
本發明提供一種發光元件陣列基板的製造方法,具有良好的轉移精準度。The invention provides a method for manufacturing a light-emitting element array substrate, which has good transfer accuracy.
本發明的一個實施例提出一種發光元件陣列基板,包括:載板;多個發光元件組,設置於載板之上,且多個發光元件組分別包括多個發光元件;以及黏著結構,位於多個發光元件組與載板之間,且具有多個封閉開口,其中多個封閉開口的外輪廓分別包圍多個發光元件組,多個封閉開口分別具有第一內側壁,且第一內側壁與多個發光元件組之間的最小間距大於或等於多個發光元件之間的最小間距。One embodiment of the present invention proposes a light-emitting element array substrate, including: a carrier; a plurality of light-emitting element groups disposed on the carrier, and the plurality of light-emitting element groups respectively include a plurality of light-emitting elements; and an adhesive structure located on the plurality of light-emitting element arrays. Between a light-emitting element group and the carrier board, there are a plurality of closed openings, wherein the outer contours of the plurality of closed openings respectively surround the plurality of light-emitting element groups, the plurality of closed openings respectively have a first inner wall, and the first inner wall and The minimum spacing between multiple light-emitting element groups is greater than or equal to the minimum spacing between multiple light-emitting elements.
本發明的一個實施例提出一種發光元件陣列基板的製造方法,包括:提供第一載板,第一載板上配置有多個發光元件組,且多個發光元件組分別包括多個發光元件;提供第二載板,且第二載板上配置有黏著結構;於黏著結構中形成多個封閉開口;以及將多個發光元件組從第一載板轉移至第二載板,且使多個發光元件組分別固定於多個封閉開口的外輪廓分別包圍的黏著結構。One embodiment of the present invention provides a method for manufacturing a light-emitting element array substrate, including: providing a first carrier board on which a plurality of light-emitting element groups are configured, and the plurality of light-emitting element groups each include a plurality of light-emitting elements; A second carrier is provided, and an adhesive structure is disposed on the second carrier; a plurality of closed openings are formed in the adhesive structure; and a plurality of light-emitting element groups are transferred from the first carrier to the second carrier, and a plurality of The light-emitting element groups are respectively fixed on adhesive structures respectively surrounded by outer contours of multiple closed openings.
為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。In order to make the above-mentioned features and advantages of the present invention more obvious and easy to understand, embodiments are given below and described in detail with reference to the accompanying drawings.
在附圖中,為了清楚起見,放大了層、膜、面板、區域等的厚度。在整個說明書中,相同的附圖標記表示相同的元件。應當理解,當諸如層、膜、區域或基板的元件被稱為在另一元件「上」或「連接到」另一元件時,其可以直接在另一元件上或與另一元件連接,或者中間元件可以也存在。相反地,當元件被稱為「直接在另一元件上」或「直接連接到」另一元件時,不存在中間元件。如本文所使用的,「連接」可以指物理及/或電性連接。再者,「電性連接」或「耦接」可為二元件間存在其它元件。In the drawings, the thickness of layers, films, panels, regions, etc., are exaggerated for clarity. Throughout this specification, the same reference numbers refer to the same elements. It will be understood that when an element such as a layer, film, region or substrate is referred to as being "on" or "connected to" another element, it can be directly on or connected to the other element, or Intermediate elements may also be present. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements present. As used herein, "connected" may refer to physical and/or electrical connections. Furthermore, "electrical connection" or "coupling" can mean the presence of other components between two components.
應當理解,儘管術語「第一」、「第二」、「第三」等在本文中可以用於描述各種元件、部件、區域、層及/或部分,但是這些元件、部件、區域、層及/或部分不應受這些術語的限制。這些術語僅用於將一個元件、部件、區域、層或部分與另一個元件、部件、區域、層或部分區分開。因此,下面討論的第一「元件」、「部件」、「區域」、「層」或「部分」可以被稱為第二元件、部件、區域、層或部分而不脫離本文的教導。It will be understood that, although the terms "first," "second," "third," etc. may be used herein to describe various elements, components, regions, layers and/or sections, these elements, components, regions, layers and/or sections /or parts shall not be limited by these terms. These terms are only used to distinguish one element, component, region, layer or section from another element, component, region, layer or section. Thus, a first "element", "component", "region", "layer" or "section" discussed below could be termed a second element, component, region, layer or section without departing from the teachings herein.
此外,諸如「下」或「底部」和「上」或「頂部」的相對術語可在本文中用於描述一個元件與另一元件的關係,如圖所示。應當理解,相對術語旨在包括除了圖中所示的方位之外的裝置的不同方位。例如,如果一個附圖中的裝置翻轉,則被描述為在其他元件的「下」側的元件將被定向在其他元件的「上」側。因此,示例性術語「下」可以包括「下」和「上」的取向,取決於附圖的特定取向。類似地,如果一個附圖中的裝置翻轉,則被描述為在其它元件「下」或「下方」的元件將被定向為在其它元件「上方」。因此,示例性術語「下」或「下方」可以包括上方和下方的取向。Additionally, relative terms, such as "lower" or "bottom" and "upper" or "top," may be used herein to describe one element's relationship to another element as illustrated in the Figures. It will be understood that relative terms are intended to encompass different orientations of the device in addition to the orientation illustrated in the figures. For example, if the device in one of the figures is turned over, elements described as "below" other elements would then be oriented "above" the other elements. Thus, the exemplary term "lower" may include both "lower" and "upper" orientations, depending on the particular orientation of the drawing. Similarly, if the device in one of the figures is turned over, elements described as "below" or "beneath" other elements would then be oriented "above" the other elements. Thus, the exemplary terms "lower" or "lower" may include both upper and lower orientations.
考慮到所討論的測量和與測量相關的誤差的特定數量(即,測量系統的限制),本文使用的「約」、「近似」、或「實質上」包括所述值和在本領域普通技術人員確定的特定值的可接受的偏差範圍內的平均值。例如,「約」可以表示在所述值的一個或多個標準偏差內,或±30%、±20%、±10%、±5%內。再者,本文使用的「約」、「近似」、或「實質上」可依光學性質、蝕刻性質或其它性質,來選擇較可接受的偏差範圍或標準偏差,而可不用一個標準偏差適用全部性質。As used herein, "about," "approximately," or "substantially" includes the stated value and those within ordinary skill in the art, given the specific amount of error associated with the measurement in question (i.e., the limitations of the measurement system). An average within a range of acceptable deviations for a specific value determined by a person. For example, "about" may mean within one or more standard deviations of the stated value, or within ±30%, ±20%, ±10%, ±5%. Furthermore, the terms "approximately", "approximately", or "substantially" used in this article can be used to select a more acceptable deviation range or standard deviation based on optical properties, etching properties, or other properties, and one standard deviation does not apply to all. nature.
除非另有定義,本文使用的所有術語(包括技術和科學術語)具有與本發明所屬領域的普通技術人員通常理解的相同的含義。將進一步理解的是,諸如在通常使用的字典中定義的那些術語應當被解釋為具有與它們在相關技術和本發明的上下文中的含義一致的含義,並且將不被解釋為理想化的或過度正式的意義,除非本文中明確地這樣定義。Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. It will be further understood that terms such as those defined in commonly used dictionaries should be construed to have meanings consistent with their meanings in the context of the relevant technology and the present invention, and are not to be construed as idealistic or excessive Formal meaning, unless expressly defined as such herein.
本文參考作為理想化實施例的示意圖的截面圖來描述示例性實施例。因此,可以預期到作為例如製造技術及/或公差的結果的圖示的形狀變化。因此,本文所述的實施例不應被解釋為限於如本文所示的區域的特定形狀,而是包括例如由製造導致的形狀偏差。例如,示出或描述為平坦的區域通常可以具有粗糙及/或非線性特徵。此外,所示的銳角可以是圓的。因此,圖中所示的區域本質上是示意性的,並且它們的形狀不是旨在示出區域的精確形狀,並且不是旨在限制權利要求的範圍。Example embodiments are described herein with reference to cross-sectional illustrations that are schematic illustrations of idealized embodiments. Accordingly, variations in the shape of the illustrations, for example as a result of manufacturing techniques and/or tolerances, are to be expected. Thus, embodiments described herein should not be construed as limited to the particular shapes of regions illustrated herein but are to include deviations in shapes that result, for example, from manufacturing. For example, regions shown or described as flat may typically have rough and/or non-linear characteristics. Additionally, the acute angles shown may be rounded. Accordingly, the regions shown in the figures are schematic in nature and their shapes are not intended to show the precise shapes of the regions and are not intended to limit the scope of the claims.
圖1A至圖4D是依照本發明一實施例的發光元件陣列基板10的製造方法的步驟流程的局部上視示意圖及剖面示意圖。以下,配合圖1A至圖4D說明發光元件陣列基板10的製造方法。1A to 4D are partial top schematic views and cross-sectional schematic views of the step flow of a method for manufacturing a light-emitting
請參照圖1A至圖1B,將發光元件LD從生長基板GS轉移至第一載板C1上的黏著材AM上,使得發光元件LD藉由黏著材AM固定於第一載板C1,以提供其上配置有多個發光元件LD的第一載板C1。1A to 1B, the light-emitting element LD is transferred from the growth substrate GS to the adhesive material AM on the first carrier C1, so that the light-emitting element LD is fixed on the first carrier C1 through the adhesive material AM to provide its A first carrier C1 on which a plurality of light emitting elements LD is disposed.
在一些實施例中,可以先將發光元件LD貼附於黏著材AM,以使發光元件LD位於生長基板GS與第一載板C1之間。接著,移除生長基板GS而露出發光元件LD的半導體疊層ES。移除生長基板GS的方式可以採用例如雷射剝離(Laser Lift Off)製程,但本發明不以此為限。如圖1B所示,在發光元件LD轉移至第一載板C1之後,發光元件LD的第一接墊PD1以及第二接墊PD2可黏附於黏著材AM,且第一接墊PD1以及第二接墊PD2可位於半導體疊層ES與黏著材AM之間。In some embodiments, the light-emitting element LD can be attached to the adhesive material AM first, so that the light-emitting element LD is located between the growth substrate GS and the first carrier C1. Next, the growth substrate GS is removed to expose the semiconductor stack ES of the light emitting element LD. The growth substrate GS can be removed by, for example, a laser lift off process, but the present invention is not limited thereto. As shown in FIG. 1B , after the light-emitting element LD is transferred to the first carrier C1 , the first pad PD1 and the second pad PD2 of the light-emitting element LD can be adhered to the adhesive material AM, and the first pad PD1 and the second pad PD2 of the light-emitting element LD can be adhered to the adhesive material AM. The pad PD2 may be located between the semiconductor stack ES and the adhesive material AM.
詳細而言,發光元件LD可以形成於生長基板GS上。生長基板GS例如藍寶石基板,但本發明不限於此。在一些實施例中,形成發光元件LD的方法可以包括使用適當的反應物進行磊晶製程,以沉積所需薄膜,隨後藉由微影製程以及蝕刻製程對前述薄膜進行圖案化,以形成發光元件LD的各個子層。在某些實施例中,還可以選擇性地對發光元件LD的部分子層進行摻雜製程。In detail, the light emitting element LD may be formed on the growth substrate GS. The growth substrate GS is, for example, a sapphire substrate, but the present invention is not limited thereto. In some embodiments, the method of forming the light-emitting element LD may include performing an epitaxial process using appropriate reactants to deposit a required thin film, and then patterning the film through a photolithography process and an etching process to form the light-emitting element. Each sub-layer of LD. In some embodiments, a doping process can also be selectively performed on some sub-layers of the light-emitting element LD.
舉例而言,在一些實施例中,發光元件LD可以包括半導體疊層ES、第一接墊PD1、第二接墊PD2以及絕緣層EU,其中第一接墊PD1以及第二接墊PD2分別電性連接至半導體疊層ES中的不同子層,且絕緣層EU可以位於第一接墊PD1的一部分與半導體疊層ES之間以及第二接墊PD2的一部分與半導體疊層ES之間,但不影響第一接墊PD1以及第二接墊PD2與半導體疊層ES的不同子層的電性連接。在本實施例中,發光元件LD的第一接墊PD1以及第二接墊PD2位於半導體疊層ES的同一側,但本發明不以此為限。在一些實施例中,第一接墊PD1以及第二接墊PD2可以位於半導體疊層ES的不同側。For example, in some embodiments, the light emitting element LD may include a semiconductor stack ES, a first pad PD1, a second pad PD2, and an insulating layer EU, where the first pad PD1 and the second pad PD2 are electrically connected respectively. are electrically connected to different sub-layers in the semiconductor stack ES, and the insulating layer EU may be located between a portion of the first pad PD1 and the semiconductor stack ES and between a portion of the second pad PD2 and the semiconductor stack ES, but The electrical connection between the first pad PD1 and the second pad PD2 and different sub-layers of the semiconductor stack ES is not affected. In this embodiment, the first pad PD1 and the second pad PD2 of the light-emitting element LD are located on the same side of the semiconductor stack ES, but the invention is not limited thereto. In some embodiments, the first pad PD1 and the second pad PD2 may be located on different sides of the semiconductor stack ES.
舉例而言,半導體疊層ES可以包括P型摻雜半導體層、多層量子井結構(Multiple Quantum Well, MQW)以及N型摻雜半導體層的疊層,其中多層量子井結構可以位於P型摻雜半導體層與N型摻雜半導體層之間。P型摻雜半導體層的材料例如是P型Ⅱ-Ⅵ族材料(例如:鋅化硒(ZnSe))、P型Ⅲ-Ⅴ族氮化物材料(例如:氮化鎵(GaN)、氮化鋁(AlN)、氮化銦(InN)、氮化銦鎵(InGaN)、氮化鋁鎵(AlGaN)或氮化鋁銦鎵(AlInGaN))或其疊層。N型摻雜半導體層的材料例如是N型Ⅱ-Ⅵ族材料、N型Ⅲ-Ⅴ族氮化物材料或其疊層。多重量子井結構可以包括交替堆疊的多層Ⅱ-Ⅵ族材料以及多層Ⅲ-Ⅴ族氮化物材料,但本發明不以此為限。第一接墊PD1以及第二接墊PD2的材質例如可以包括金屬(例如錫)、合金、金屬材料的氮化物、金屬材料的氧化物、金屬材料的氮氧化物、石墨稀、金屬材料的堆疊層或是其它導電材料的堆疊層。For example, the semiconductor stack ES may include a stack of P-type doped semiconductor layers, multiple quantum well structures (Multiple Quantum Well, MQW), and N-type doped semiconductor layers, where the multi-layer quantum well structures may be located at the P-type doped semiconductor layer. between the semiconductor layer and the N-type doped semiconductor layer. The materials of the P-type doped semiconductor layer are, for example, P-type II-VI materials (such as zinc selenide (ZnSe)), P-type III-V nitride materials (such as gallium nitride (GaN), aluminum nitride (AlN), indium nitride (InN), indium gallium nitride (InGaN), aluminum gallium nitride (AlGaN) or aluminum indium gallium nitride (AlInGaN)) or stacks thereof. The material of the N-type doped semiconductor layer is, for example, an N-type II-VI group material, an N-type III-V group nitride material, or a stack thereof. The multiple quantum well structure may include alternately stacked multiple layers of group II-VI materials and multiple layers of group III-V nitride materials, but the invention is not limited thereto. The materials of the first pad PD1 and the second pad PD2 may include, for example, metal (such as tin), alloy, nitride of metal material, oxide of metal material, oxynitride of metal material, graphene, and a stack of metal materials. layers or stacks of other conductive materials.
請參照圖1A,第一載板C1上可以形成有一層黏著材AM。第一載板C1可以是剛性基板,例如玻璃基板、石英基板或陶瓷基板,但本發明不限於此。黏著材AM可以藉由塗布的方式形成於第一載板C1上,但本發明不以此為限。黏著材AM可以包括例如壓克力系樹脂等具有黏著性的材料。Referring to FIG. 1A , a layer of adhesive material AM may be formed on the first carrier C1. The first carrier C1 may be a rigid substrate, such as a glass substrate, a quartz substrate or a ceramic substrate, but the invention is not limited thereto. The adhesive material AM can be formed on the first carrier C1 by coating, but the invention is not limited thereto. The adhesive material AM may include an adhesive material such as acrylic resin.
請參照圖2,提供第二載板C2,且第二載板C2上形成有黏著層AL。第二載板C2可以是玻璃基板、石英基板或陶瓷基板,但本發明不限於此。在本實施例中,黏著層AL可以藉由塗布的方式形成於第二載板C2上,且黏著層AL可以包括例如壓克力系樹脂等具有黏著性的材料,但本發明不限於此。Referring to FIG. 2, a second carrier C2 is provided, and an adhesive layer AL is formed on the second carrier C2. The second carrier C2 may be a glass substrate, quartz substrate or ceramic substrate, but the invention is not limited thereto. In this embodiment, the adhesive layer AL can be formed on the second carrier C2 by coating, and the adhesive layer AL can include adhesive materials such as acrylic resin, but the invention is not limited thereto.
請參照圖3A,利用遮罩MK以及雷射光BS對黏著層AL進行圖案化,以於黏著層AL中形成多個封閉開口O1,如圖3B及圖3C所示,其中圖3C為沿圖3B的剖面線A-A’所作的剖面示意圖。舉例而言,遮罩MK可以具有開口OP1,黏著層AL中對應開口OP1的部分曝露於雷射光BS之後可以產生硬化,之後可以藉由顯影製程移除黏著層AL的硬化部分,即可於黏著層AL中形成封閉開口O1。在本實施例中,黏著結構AS可以包括具有封閉開口O1的黏著層AL。在一些實施例中,可以藉由雷射切割的方式形成封閉開口O1。封閉開口O1可以具有環狀多邊形的輪廓,例如,如圖3B所示,封閉開口O1可具有環狀四邊形的輪廓。Referring to Figure 3A, the mask MK and the laser light BS are used to pattern the adhesive layer AL to form a plurality of closed openings O1 in the adhesive layer AL, as shown in Figures 3B and 3C, where Figure 3C is along the edge of Figure 3B A schematic cross-sectional view of the section line A-A'. For example, the mask MK may have an opening OP1. The part of the adhesive layer AL corresponding to the opening OP1 may be hardened after being exposed to the laser light BS. After that, the hardened part of the adhesive layer AL can be removed through a development process, that is, it can be adhered. A closed opening O1 is formed in layer AL. In this embodiment, the adhesive structure AS may include an adhesive layer AL having a closed opening O1. In some embodiments, the closing opening O1 may be formed by laser cutting. The closed opening O1 may have an annular polygonal outline. For example, as shown in FIG. 3B , the closed opening O1 may have an annular quadrilateral outline.
請參照圖4A,將多個發光元件LD從第一載板C1轉移至第二載板C2,而使多個發光元件LD固定於黏著層AL上,如圖4B所示。舉例而言,可以採用雷射剝離(Laser Lift Off)製程來使發光元件LD脫離第一載板C1,進而使發光元件LD轉移至封閉開口O1環繞的部分黏著層AL上,使得多個發光元件LD可以位於封閉開口O1環繞的部分黏著層AL上。在本實施例中,可以將各封閉開口O1環繞的多個發光元件LD稱為一個發光元件組LS。在一些實施例中,附著於發光元件LD的黏著材AM可能隨著發光元件LD一起脫離第一載板C1,因此,自第一載板C1脫離的發光元件LD上可覆蓋有黏著材AM。Referring to FIG. 4A , a plurality of light-emitting elements LD are transferred from the first carrier C1 to the second carrier C2 , and the plurality of light-emitting elements LD are fixed on the adhesive layer AL, as shown in FIG. 4B . For example, a laser lift-off process can be used to separate the light-emitting element LD from the first carrier C1, and then transfer the light-emitting element LD to the part of the adhesive layer AL surrounded by the closed opening O1, so that multiple light-emitting elements LD may be located on a portion of the adhesive layer AL surrounded by the closed opening O1. In this embodiment, the plurality of light-emitting elements LD surrounded by each closed opening O1 can be called a light-emitting element group LS. In some embodiments, the adhesive material AM attached to the light-emitting element LD may be detached from the first carrier C1 together with the light-emitting element LD. Therefore, the light-emitting element LD detached from the first carrier C1 may be covered with the adhesive material AM.
接著,可以移除發光元件LD上的黏著材AM,以形成如圖4C及圖4D所示的發光元件陣列基板10,其中圖4D為沿圖4C的剖面線B-B’所作的剖面示意圖。移除黏著材AM的方式可以採用電漿蝕刻製程,但本發明不限於此。由於黏著層AL的材質類似於黏著材AM,因此,在移除黏著材AM的過程中,可能會同時移除部分的黏著層AL,而於黏著層AL中形成裂痕CK。在本實施例中,藉由封閉開口O1來阻止裂痕CK延伸至發光元件組LS下方的黏著層AL,能夠防止發光元件組LS中的發光元件LD的位置產生偏移,藉以避免發光元件LD於後續轉移過程中產生更大的偏移而影響發光元件LD的轉移精準度。Next, the adhesive material AM on the light-emitting element LD can be removed to form the light-emitting
如圖4C及圖4D所示,發光元件陣列基板10包括:第二載板C2、多個發光元件組LS以及黏著結構AS。多個發光元件組LS設置於第二載板C2之上,且多個發光元件組LS可以分別包括多個發光元件LD。黏著結構AS位於多個發光元件組LS與第二載板C2之間,且黏著結構AS包括黏著層AL。黏著結構AS具有多個封閉開口O1,其中多個封閉開口O1的外輪廓PO分別包圍多個發光元件組LS,多個封閉開口O1分別具有內側壁W1,且內側壁W1與多個發光元件組LS之間的最小間距G1大於或等於發光元件LD之間的最小間距G2。As shown in FIG. 4C and FIG. 4D , the light-emitting
具體而言,發光元件LD之間的最小間距G2是基於發光元件LD的轉移誤差所決定的,因此,當內側壁W1與發光元件LD之間的最小間距G1小於發光元件LD之間的最小間距G2時,發光元件LD可能因為轉移誤差而偏移至部分懸空於封閉開口O1上,導致發光元件LD傾斜落於黏著結構AS上,而影響發光元件LD於後續轉移的精準度。藉由使內側壁W1與多個發光元件LD之間的最小間距G1大於或等於發光元件LD之間的最小間距G2,能夠避免發光元件LD的偏移超過容忍誤差,使得發光元件陣列基板10具有良好的對位精準度,且還能夠避免影響發光元件LD的後續轉移精準度。Specifically, the minimum distance G2 between the light-emitting elements LD is determined based on the transfer error of the light-emitting elements LD. Therefore, when the minimum distance G1 between the inner wall W1 and the light-emitting element LD is smaller than the minimum distance between the light-emitting elements LD At G2, the light-emitting element LD may be offset to partially hang over the closed opening O1 due to the transfer error, causing the light-emitting element LD to fall obliquely on the adhesive structure AS, thus affecting the accuracy of the subsequent transfer of the light-emitting element LD. By making the minimum distance G1 between the inner wall W1 and the plurality of light-emitting elements LD greater than or equal to the minimum distance G2 between the light-emitting elements LD, the deviation of the light-emitting elements LD can be prevented from exceeding the tolerance error, so that the light-emitting
在本實施例中,內側壁W1可以背向被包圍的發光元件組LS,但本發明不限於此。在本實施例中,各封閉開口O1還具有內側壁W2,內側壁W2面向被包圍的發光元件組LS,且內側壁W2與內側壁W1相對。In this embodiment, the inner wall W1 may face away from the surrounded light-emitting element group LS, but the invention is not limited thereto. In this embodiment, each closed opening O1 also has an inner wall W2, the inner wall W2 faces the surrounded light-emitting element group LS, and the inner wall W2 is opposite to the inner wall W1.
在一些實施例中,發光元件組LS之間的最小間距G3大於或等於發光元件LD之間的最小間距G2,以免發光元件LD的偏移造成發光元件組LS之間短路。In some embodiments, the minimum distance G3 between the light-emitting element groups LS is greater than or equal to the minimum distance G2 between the light-emitting elements LD, so as to prevent the offset of the light-emitting elements LD from causing a short circuit between the light-emitting element groups LS.
在一些實施例中,封閉開口O1之間的間距G4可以大於零,換句話說,封閉開口O1之間存在一部分的黏著結構AS,使得封閉開口O1之間不相連且彼此分離,而且封閉開口O1之間的間距G4小於發光元件組LS之間的最小間距G3。In some embodiments, the distance G4 between the closed openings O1 may be greater than zero. In other words, there is a part of the adhesive structure AS between the closed openings O1, so that the closed openings O1 are not connected and separated from each other, and the closed openings O1 The distance G4 between them is smaller than the minimum distance G3 between the light emitting element groups LS.
在本實施例中,各發光元件組LS可以包括三個發光元件LD,例如,各發光元件組LS包括一個紅色發光元件LR、一個綠色發光元件LG以及一個藍色發光元件LB,但本發明不限於此。舉例而言,紅色發光元件LR、綠色發光元件LG以及藍色發光元件LB可以分別構成一個子畫素SP,且紅色發光元件LR、綠色發光元件LG以及藍色發光元件LB可以一起構成一個畫素PX。換句話說,在本實施例中,發光元件組LS可以包括一個畫素PX,且封閉開口O1圍繞一個畫素PX。In this embodiment, each light-emitting element group LS may include three light-emitting elements LD. For example, each light-emitting element group LS includes a red light-emitting element LR, a green light-emitting element LG and a blue light-emitting element LB. However, the present invention does not Limited to this. For example, the red light-emitting element LR, the green light-emitting element LG and the blue light-emitting element LB can respectively form a sub-pixel SP, and the red light-emitting element LR, the green light-emitting element LG and the blue light-emitting element LB can together form a pixel PX. In other words, in this embodiment, the light-emitting element group LS may include one pixel PX, and the closing opening O1 surrounds one pixel PX.
封閉開口O1的寬度OW1至少大於裂痕CK的寬度。舉例而言,在一些實施例中,由於雷射切割程序的最小線寬約為3μm,因此,封閉開口O1的寬度OW1可為3μm至200μm。在一些實施例中,由於裂痕CK的深度約為1μm至2μm,且黏著結構AS的總厚度TA約為50μm,因此,封閉開口O1的深度DO1可為黏著結構AS的總厚度TA的5%至100%,以確保裂痕CK不會使發光元件LD產生位置偏移。The width OW1 of the closed opening O1 is at least greater than the width of the crack CK. For example, in some embodiments, since the minimum line width of the laser cutting process is about 3 μm, the width OW1 of the closed opening O1 may be 3 μm to 200 μm. In some embodiments, since the depth of the crack CK is about 1 μm to 2 μm, and the total thickness TA of the adhesive structure AS is about 50 μm, the depth DO1 of the closed opening O1 may be 5% to 5% of the total thickness TA of the adhesive structure AS. 100% to ensure that the crack CK will not cause the position of the light-emitting element LD to shift.
以下,使用圖5至圖11繼續說明本發明的其他實施例,並且,沿用圖1A至圖4D的實施例的元件標號與相關內容,其中,採用相同的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明,可參考圖1A至圖4D的實施例,在以下的說明中不再重述。Below, other embodiments of the present invention will be continued to be described using FIGS. 5 to 11 , and the component numbers and related content of the embodiments of FIGS. 1A to 4D will be used, where the same numbers are used to represent the same or similar elements, and Explanations of the same technical content are omitted. For descriptions of omitted parts, reference may be made to the embodiments of FIGS. 1A to 4D , which will not be repeated in the following description.
圖5是依照本發明一實施例的發光元件陣列基板20的局部上視示意圖。發光元件陣列基板20包括:第二載板C2、多個發光元件組LS以及黏著結構AS。多個發光元件組LS設置於第二載板C2之上,且多個發光元件組LS可以分別包括多個發光元件LD。黏著結構AS位於多個發光元件組LS與第二載板C2之間,且黏著結構AS具有多個封閉開口O1,其中多個封閉開口O1的外輪廓PO分別包圍多個發光元件組LS,多個封閉開口O1分別具有內側壁W1,且內側壁W1與多個發光元件組LS之間的最小間距G1大於或等於發光元件LD之間的最小間距G2。FIG. 5 is a partial top view of the light emitting
圖5所示的發光元件陣列基板20與如圖4C至圖4D所示的發光元件陣列基板10的主要差異在於:發光元件陣列基板20的發光元件組LS可以包括多個畫素PX,且封閉開口O1可以圍繞多個畫素PX。舉例而言,每一發光元件組LS可以包括兩個畫素PX、三個畫素PX、或更多個畫素PX。The main difference between the light-emitting
圖6A至圖7D是依照本發明一實施例的發光元件陣列基板30的製造方法的步驟流程的局部上視示意圖及剖面示意圖。應注意的是,圖6A至圖7D的步驟流程是接續於圖1A至圖2的步驟流程之後進行,關於圖1A至圖2的步驟流程可參考前述說明,於此不再重述。6A to 7D are partial top schematic views and cross-sectional schematic views of the step flow of the manufacturing method of the light-emitting
請參照圖6A,利用光阻PR作為幕罩來對黏著層AL進行蝕刻製程,接著再移除光阻PR,以形成具有多個封閉開口O2的黏著結構AS,如圖6B及圖6C所示,其中圖6C為沿圖6B的剖面線C-C’所作的剖面示意圖。Referring to Figure 6A, the photoresist PR is used as a mask to perform an etching process on the adhesive layer AL, and then the photoresist PR is removed to form an adhesive structure AS with multiple closed openings O2, as shown in Figures 6B and 6C. , where Figure 6C is a schematic cross-sectional view taken along the section line CC' of Figure 6B.
舉例而言,光阻PR可以具有開口OP2,在蝕刻製程之後,黏著結構AS中對應開口OP2的部分可被移除,即可形成封閉開口O2。在一些實施例中,封閉開口O2可以具有多邊形的輪廓。例如,如圖6B所示,封閉開口O2可以具有四邊形的輪廓。For example, the photoresist PR may have an opening OP2. After the etching process, the portion of the adhesive structure AS corresponding to the opening OP2 may be removed to form a closed opening O2. In some embodiments, the closure opening O2 may have a polygonal outline. For example, as shown in FIG. 6B , the closing opening O2 may have a quadrangular outline.
請參照圖7A,將多個發光元件LD從第一載板C1轉移至第二載板C2,而使多個發光元件LD固定於黏著結構AS上,如圖7B所示。舉例而言,可以採用雷射剝離(Laser Lift Off)製程來使發光元件LD脫離第一載板C1,進而使發光元件LD轉移至封閉開口O2中的部分黏著結構AS上,使得多個發光元件LD所構成的多個發光元件組LS可以分別位於封閉開口O2中。在本實施例中,可以將各封閉開口O2中的多個發光元件LD稱為一個發光元件組LS。在一些實施例中,附著於發光元件LD的黏著材AM可能隨著發光元件LD一起脫離第一載板C1,因此,自第一載板C1脫離的發光元件LD上可覆蓋有黏著材AM。Referring to FIG. 7A , a plurality of light-emitting elements LD are transferred from the first carrier C1 to the second carrier C2 , and the plurality of light-emitting elements LD are fixed on the adhesive structure AS, as shown in FIG. 7B . For example, a laser lift-off process can be used to separate the light-emitting element LD from the first carrier C1, and then the light-emitting element LD is transferred to the partial adhesive structure AS in the closed opening O2, so that multiple light-emitting elements The plurality of light-emitting element groups LS composed of LD may be respectively located in the closed opening O2. In this embodiment, the plurality of light-emitting elements LD in each closed opening O2 may be called a light-emitting element group LS. In some embodiments, the adhesive material AM attached to the light-emitting element LD may be detached from the first carrier C1 together with the light-emitting element LD. Therefore, the light-emitting element LD detached from the first carrier C1 may be covered with the adhesive material AM.
接著,可以移除發光元件LD上的黏著材AM,以形成如圖7C及圖7D所示的發光元件陣列基板30,其中圖7D為沿圖7C的剖面線D-D’所作的剖面示意圖。移除黏著材AM的方式可以採用電漿蝕刻製程,但本發明不限於此。由於黏著結構AS的材質類似於黏著材AM,因此,在移除黏著材AM的過程中,可能會同時移除部分的黏著結構AS,而於黏著結構AS中形成裂痕CK。在本實施例中,藉由封閉開口O2來阻止裂痕CK延伸至發光元件組LS下方的黏著結構AS,能夠防止發光元件組LS中的發光元件LD的位置產生偏移,藉以避免發光元件LD於後續轉移過程中產生更大的偏移而影響發光元件LD的轉移精準度。Next, the adhesive material AM on the light-emitting element LD can be removed to form the light-emitting
如圖7C及圖7D所示,發光元件陣列基板30包括:第二載板C2、多個發光元件組LS以及黏著結構AS。多個發光元件組LS設置於第二載板C2之上,且多個發光元件組LS可以分別包括多個發光元件LD。黏著結構AS位於多個發光元件組LS與第二載板C2之間,且黏著結構AS具有多個封閉開口O2,其中多個封閉開口O2的外輪廓PO分別包圍多個發光元件組LS,多個封閉開口O2分別具有面向所包圍的發光元件組LS的內側壁W3,且內側壁W3與多個發光元件組LS之間的最小間距G1大於或等於發光元件LD之間的最小間距G2。As shown in FIG. 7C and FIG. 7D , the light-emitting
由於發光元件LD之間的最小間距G2是基於發光元件LD的轉移誤差所決定的,因此,當內側壁W3與發光元件LD之間的最小間距G1小於發光元件LD之間的最小間距G2時,發光元件LD可能因為轉移誤差而偏移至部分懸空於封閉開口O2上,導致發光元件LD傾斜落於封閉開口O2外側的黏著結構AS上,而影響後續轉移的精準度。藉由使內側壁W3與多個發光元件LD之間的最小間距G1大於或等於發光元件LD之間的最小間距G2,能夠避免發光元件LD的偏移超過容忍誤差,使得發光元件陣列基板30具有良好的對位精準度,且還能夠避免影響發光元件LD的後續轉移精準度。Since the minimum distance G2 between the light-emitting elements LD is determined based on the transfer error of the light-emitting elements LD, when the minimum distance G1 between the inner wall W3 and the light-emitting element LD is smaller than the minimum distance G2 between the light-emitting elements LD, The light-emitting element LD may be partially suspended on the closed opening O2 due to a transfer error, causing the light-emitting element LD to fall obliquely on the adhesive structure AS outside the closed opening O2, thus affecting the accuracy of subsequent transfer. By making the minimum distance G1 between the inner wall W3 and the plurality of light-emitting elements LD greater than or equal to the minimum distance G2 between the light-emitting elements LD, the deviation of the light-emitting elements LD can be prevented from exceeding the tolerance error, so that the light-emitting
在本實施例中,黏著結構AS可以包括第一部分P1及第二部分P2,其中第一部分P1位於被包圍的發光元件LD與第二載板C2之間,第二部分P2環繞封閉開口O2,且第一部分P1的材料與第二部分P2的材料相同。在一些實施例中,封閉開口O2之間的間距G4可以大於零,換句話說,封閉開口O2之間存在一部分的黏著結構AS,使得封閉開口O2之間不相連且彼此分離。In this embodiment, the adhesive structure AS may include a first part P1 and a second part P2, where the first part P1 is located between the surrounded light-emitting element LD and the second carrier C2, the second part P2 surrounds the closed opening O2, and The material of the first part P1 is the same as the material of the second part P2. In some embodiments, the distance G4 between the closed openings O2 may be greater than zero. In other words, there is a part of the adhesive structure AS between the closed openings O2, so that the closed openings O2 are not connected and separated from each other.
在本實施例中,各發光元件組LS可以包括一個畫素PX,且封閉開口O2可以圍繞一個畫素PX。在一些實施例中,封閉開口O2的寬度OW2可約為200μm至650μm。在一些實施例中,封閉開口O2中的黏著結構AS的厚度T1至少為黏著結構AS的總厚度TA的10%,以確保發光元件LD能夠藉由黏著結構AS固定於第二載板C2。在某些實施例中,封閉開口O2的深度DO2可為黏著結構AS的總厚度TA的5%至90%。在一些實施例中,絕緣層EU的遠離第二載板C2的表面與第二載板C2之間的間距HU不小於黏著結構AS的總厚度TA,以確保第一接墊PD1以及第二接墊PD2凸出於黏著結構AS的上表面,而不影響第一接墊PD1以及第二接墊PD2於後續製程中與外部元件進行連接。In this embodiment, each light-emitting element group LS may include one pixel PX, and the closing opening O2 may surround one pixel PX. In some embodiments, the width OW2 of the closing opening O2 may be approximately 200 μm to 650 μm. In some embodiments, the thickness T1 of the adhesive structure AS in the closed opening O2 is at least 10% of the total thickness TA of the adhesive structure AS to ensure that the light emitting element LD can be fixed to the second carrier C2 through the adhesive structure AS. In some embodiments, the depth DO2 of the closed opening O2 may be 5% to 90% of the total thickness TA of the adhesive structure AS. In some embodiments, the distance HU between the surface of the insulating layer EU away from the second carrier board C2 and the second carrier board C2 is not less than the total thickness TA of the adhesive structure AS to ensure that the first pad PD1 and the second pad The pad PD2 protrudes from the upper surface of the adhesive structure AS without affecting the connection between the first pad PD1 and the second pad PD2 with external components in subsequent processes.
圖8是依照本發明一實施例的發光元件陣列基板40的局部上視示意圖。發光元件陣列基板40包括:第二載板C2、多個發光元件組LS以及黏著結構AS。多個發光元件組LS設置於第二載板C2之上,且多個發光元件組LS可以分別包括多個發光元件LD。黏著結構AS位於多個發光元件組LS與第二載板C2之間,且黏著結構AS具有多個封閉開口O2,其中多個封閉開口O2的外輪廓PO分別包圍多個發光元件組LS。FIG. 8 is a partial top view of the light emitting
圖8所示的發光元件陣列基板40與如圖7C至圖7D所示的發光元件陣列基板30的主要差異在於:發光元件陣列基板40的發光元件組LS的發光元件數量不完全相同。舉例而言,在本實施例中,發光元件組LS可以包括發光元件組LS1及發光元件組LS2,且發光元件組LS1的發光元件數量與發光元件組LS2的發光元件數量不同。例如,發光元件組LS1可以包括一個畫素PX,發光元件組LS2可以包括兩個畫素PX,且每個畫素PX可以包括三個發光元件LD。The main difference between the light-emitting
在一些實施例中,由於位於第二載板C2的周邊區AP的裂痕CK的數量大於位於中央區AC的裂痕CK的數量,可設計使發光元件組LS2位於第二載板C2的中央區AC,且使發光元件組LS1位於第二載板C2的周邊區AP。換句話說,位於第二載板C2的中央區AC的封閉開口O2的外輪廓PO包圍的發光元件數量可以大於位於第二載板C2的周邊區AP的封閉開口O2的外輪廓PO包圍的發光元件數量,以節省雷射切割的時間。In some embodiments, since the number of cracks CK located in the peripheral area AP of the second carrier board C2 is greater than the number of cracks CK located in the central area AC, the light emitting element group LS2 can be designed to be located in the central area AC of the second carrier board C2 , and the light-emitting element group LS1 is located in the peripheral area AP of the second carrier C2. In other words, the number of light-emitting elements surrounded by the outer contour PO of the closed opening O2 located in the central area AC of the second carrier plate C2 may be greater than the number of light-emitting elements surrounded by the outer contour PO of the closed opening O2 located in the peripheral area AP of the second carrier plate C2 number of components to save time in laser cutting.
圖9A至圖10D是依照本發明一實施例的發光元件陣列基板50的製造方法的步驟流程的局部上視示意圖及剖面示意圖。應注意的是,圖9A至圖10D的步驟流程是接續於圖1A至圖2的步驟流程之後進行,關於圖1A至圖2的步驟流程可參考前述說明,於此不再重述。9A to 10D are partial top schematic views and cross-sectional schematic views of the step flow of the manufacturing method of the light-emitting
請參照圖9A,於黏著層AL上形成保護層PL。接著,請參照圖9B,利用光阻PR作為幕罩來對保護層PL進行蝕刻製程,接著移除光阻PR,以形成於具有多個封閉開口O3的保護層PL,如圖9C及圖9D所示,其中圖9D為沿圖9C的剖面線E-E’所作的剖面示意圖。舉例而言,光阻PR可以具有開口OP3,在進行蝕刻製程之後,保護層PL中對應開口OP3的部分可被移除,即可形成封閉開口O3,且封閉開口O3可露出部分的黏著層AL。在本實施例中,可以將黏著層AL以及具有封閉開口O3的保護層PL視為黏著結構AS,也就是說,黏著結構AS可以包括黏著層AL以及具有封閉開口O3的保護層PL,保護層PL可用來防護黏著層AL。Referring to FIG. 9A , a protective layer PL is formed on the adhesive layer AL. Next, referring to FIG. 9B , the photoresist PR is used as a mask to perform an etching process on the protective layer PL, and then the photoresist PR is removed to form the protective layer PL with a plurality of closed openings O3 , as shown in FIGS. 9C and 9D 9D is a schematic cross-sectional view taken along the sectional line EE' of FIG. 9C. For example, the photoresist PR can have an opening OP3. After the etching process, the portion of the protective layer PL corresponding to the opening OP3 can be removed to form a closed opening O3, and the closed opening O3 can expose a portion of the adhesive layer AL. . In this embodiment, the adhesive layer AL and the protective layer PL with the closed opening O3 can be regarded as the adhesive structure AS. That is to say, the adhesive structure AS can include the adhesive layer AL and the protective layer PL with the closed opening O3. The protective layer PL can be used to protect the adhesive layer AL.
請參照圖10A,將發光元件LD從第一載板C1轉移至第二載板C2,而使發光元件LD固定於封閉開口O3露出的部分黏著層AL上,如圖10B所示。在本實施例中,可以將各封閉開口O3中的多個發光元件LD稱為一個發光元件組LS,且各發光元件組LS可位於一個封閉開口O3中。在一些實施例中,附著於發光元件LD的黏著材AM可隨著發光元件LD一起脫離第一載板C1,因此,自第一載板C1脫離的發光元件LD上可覆蓋有黏著材AM。Referring to FIG. 10A , the light-emitting element LD is transferred from the first carrier C1 to the second carrier C2 , and the light-emitting element LD is fixed on the portion of the adhesive layer AL exposed by the closed opening O3 , as shown in FIG. 10B . In this embodiment, the plurality of light-emitting elements LD in each closed opening O3 can be called a light-emitting element group LS, and each light-emitting element group LS can be located in one closed opening O3. In some embodiments, the adhesive material AM attached to the light-emitting element LD can be detached from the first carrier C1 together with the light-emitting element LD. Therefore, the light-emitting element LD detached from the first carrier C1 can be covered with the adhesive material AM.
接著,可以移除發光元件LD上的黏著材AM,以形成如圖10C及圖10D所示的發光元件陣列基板50,其中圖10D為沿圖10C的剖面線F-F’所作的剖面示意圖。移除黏著材AM的方式可以採用電漿蝕刻製程,但本發明不限於此。在本實施例中,由於保護層PL覆蓋黏著層AL,因此,在移除黏著材AM的過程中,保護層PL可以保護黏著層AL,以避免黏著層AL中產生裂痕,進而防止發光元件組LS中的發光元件LD的位置產生偏移。Next, the adhesive material AM on the light-emitting element LD can be removed to form the light-emitting
如圖10C及圖10D所示,發光元件陣列基板50包括:第二載板C2、多個發光元件組LS以及黏著結構AS。多個發光元件組LS設置於第二載板C2之上,且多個發光元件組LS可以分別包括多個發光元件LD。黏著結構AS位於多個發光元件組LS與第二載板C2之間,且黏著結構AS具有多個封閉開口O3,其中多個封閉開口O3的外輪廓PO分別包圍多個發光元件組LS,多個封閉開口O3分別具有內側壁W4,且內側壁W4與多個發光元件組LS之間的最小間距G1大於或等於發光元件LD之間的最小間距G2。As shown in FIG. 10C and FIG. 10D , the light-emitting
由於發光元件LD之間的最小間距G2是基於發光元件LD的轉移誤差所決定的,因此,當內側壁W4與發光元件LD之間的最小間距G1小於發光元件LD之間的最小間距G2時,發光元件LD可能因為轉移誤差而偏移至部分懸空於封閉開口O3上,導致發光元件LD傾斜落於封閉開口O3外側的保護層PL上,而影響後續轉移的精準度。藉由使內側壁W4與多個發光元件LD之間的最小間距G1大於或等於發光元件LD之間的最小間距G2,能夠避免發光元件LD的偏移超過容忍誤差,使得發光元件陣列基板50具有良好的對位精準度,且還能夠避免影響發光元件LD的後續轉移精準度。Since the minimum distance G2 between the light-emitting elements LD is determined based on the transfer error of the light-emitting elements LD, when the minimum distance G1 between the inner wall W4 and the light-emitting element LD is smaller than the minimum distance G2 between the light-emitting elements LD, The light-emitting element LD may be partially suspended on the closed opening O3 due to a transfer error, causing the light-emitting element LD to tilt and fall on the protective layer PL outside the closed opening O3, thus affecting the accuracy of subsequent transfer. By making the minimum distance G1 between the inner wall W4 and the plurality of light-emitting elements LD greater than or equal to the minimum distance G2 between the light-emitting elements LD, the deviation of the light-emitting elements LD can be prevented from exceeding the tolerance error, so that the light-emitting
在本實施例中,內側壁W4可以面向被包圍的多個發光元件LD。黏著結構AS可以包括黏著層AL以及保護層PL,其中黏著層AL位於被包圍的發光元件組LS與第二載板C2之間,保護層PL環繞封閉開口O3,且黏著層AL的材料與保護層PL的材料不同。在一些實施例中,黏著層AL可以包括有機材料,例如壓克力系樹脂,保護層PL可以包括無機材料,例如金屬、二氧化矽等。In this embodiment, the inner side wall W4 may face the surrounded plurality of light emitting elements LD. The adhesive structure AS may include an adhesive layer AL and a protective layer PL, where the adhesive layer AL is located between the surrounded light-emitting element group LS and the second carrier C2, the protective layer PL surrounds the closed opening O3, and the material and protection layer of the adhesive layer AL The materials of layer PL are different. In some embodiments, the adhesive layer AL may include organic materials, such as acrylic resin, and the protective layer PL may include inorganic materials, such as metal, silicon dioxide, etc.
在本實施例中,各發光元件組LS可以包括一個畫素PX,且封閉開口O3可以圍繞一個畫素PX。在一些實施例中,封閉開口O3的寬度OW3可為200μm至650μm。在一些實施例中,絕緣層EU的遠離第二載板C2的表面與第二載板C2之間的間距HU不小於黏著結構AS的總厚度TA,以確保第一接墊PD1以及第二接墊PD2凸出於保護層AL的上表面,而能夠於後續製程中順利與外部元件進行連接。In this embodiment, each light-emitting element group LS may include one pixel PX, and the closing opening O3 may surround one pixel PX. In some embodiments, the width OW3 of the closing opening O3 may be 200 μm to 650 μm. In some embodiments, the distance HU between the surface of the insulating layer EU away from the second carrier board C2 and the second carrier board C2 is not less than the total thickness TA of the adhesive structure AS to ensure that the first pad PD1 and the second pad The pad PD2 protrudes from the upper surface of the protective layer AL and can be smoothly connected to external components in subsequent processes.
圖11是依照本發明一實施例的發光元件陣列基板60的局部上視示意圖。發光元件陣列基板60包括:第二載板C2、多個發光元件組LS以及黏著結構AS。多個發光元件組LS設置於第二載板C2之上,且多個發光元件組LS可以分別包括多個發光元件LD。黏著結構AS位於多個發光元件組LS與第二載板C2之間,且黏著結構AS具有多個封閉開口O4,其中多個封閉開口O4的外輪廓PO分別包圍多個發光元件組LS。FIG. 11 is a partial top view of a light emitting
圖11所示的發光元件陣列基板60與如圖10C至圖10D所示的發光元件陣列基板50的主要差異在於:封閉開口O4的形狀與封閉開口O3的形狀不同,且發光元件陣列基板60的發光元件組LS的發光元件數量不完全相同。The main difference between the light-emitting
舉例而言,在本實施例中,封閉開口O4可以具有L形的輪廓。另外,發光元件組LS例如可以包括發光元件組LS3及發光元件組LS4,且發光元件組LS3的發光元件數量與發光元件組LS4的發光元件數量不同。例如,發光元件組LS3可以包括一個畫素PX,發光元件組LS4可以包括三個畫素PX,且每個畫素PX可以包括三個發光元件LD。在一些實施例中,封閉開口O4內的各個畫素PX中的發光元件LD的排列方式可以不同於前述封閉開口O1、O2、O3內的各個畫素PX中的發光元件LD的排列方式。舉例而言,封閉開口O1內的畫素PX的發光元件LR、LG、LB可以沿同一方向排列,而封閉開口O4內的畫素PX的發光元件LR、LG可以沿第一方向D1排列,發光元件LG、LB可以沿第二方向D2排列,且第一方向D1可與第二方向D2相交,以使封閉開口O4內的畫素PX也具有L形的輪廓。For example, in this embodiment, the closing opening O4 may have an L-shaped profile. In addition, the light-emitting element group LS may include, for example, the light-emitting element group LS3 and the light-emitting element group LS4, and the number of light-emitting elements of the light-emitting element group LS3 is different from that of the light-emitting element group LS4. For example, the light-emitting element group LS3 may include one pixel PX, the light-emitting element group LS4 may include three pixels PX, and each pixel PX may include three light-emitting elements LD. In some embodiments, the arrangement of the light-emitting elements LD in each pixel PX in the closed opening O4 may be different from the arrangement of the light-emitting elements LD in each pixel PX in the closed openings O1, O2, and O3. For example, the light-emitting elements LR, LG, and LB of the pixel PX in the closed opening O1 can be arranged in the same direction, and the light-emitting elements LR and LG of the pixel PX in the closed opening O4 can be arranged along the first direction D1 to emit light. The elements LG and LB may be arranged along the second direction D2, and the first direction D1 may intersect the second direction D2, so that the pixel PX in the closed opening O4 also has an L-shaped outline.
在一些實施例中,可設計使發光元件組LS4位於第二載板C2的中央區AC,且使發光元件組LS3位於第二載板C2的周邊區AP,以使位於第二載板C2的中央區AC的封閉開口O4的外輪廓PO包圍的發光元件數量大於位於第二載板C2的周邊區AP的封閉開口O4的外輪廓PO包圍的發光元件數量。In some embodiments, it can be designed that the light-emitting element group LS4 is located in the central area AC of the second carrier board C2, and the light-emitting element group LS3 is located in the peripheral area AP of the second carrier board C2, so that the light-emitting element group LS3 located in the second carrier board C2 The number of light-emitting elements surrounded by the outer contour PO of the closed opening O4 in the central area AC is greater than the number of light-emitting elements surrounded by the outer contour PO of the closed opening O4 located in the peripheral area AP of the second carrier plate C2.
圖12A至圖12D是依照本發明一實施例的發光元件陣列基板70的製造方法的步驟流程的局部剖面示意圖。應注意的是,圖12A至圖12D的步驟流程是接續於圖1A至圖2的步驟流程之後進行,關於圖1A至圖2的步驟流程可參考前述說明,於此不再重述。12A to 12D are partial cross-sectional schematic diagrams of the steps of a manufacturing method of the light emitting
請參照圖12A至圖12B,將藉由黏著材AM固定於第一載板C1的多個發光元件LD轉移至第二載板C2上的黏著層AL上,而使多個發光元件LD藉由黏著層AL固定於第二載板C2,且發光元件LD上帶有黏著材AM。Referring to FIGS. 12A and 12B , the plurality of light-emitting elements LD fixed on the first carrier C1 by the adhesive AM are transferred to the adhesive layer AL on the second carrier C2, so that the plurality of light-emitting elements LD are The adhesive layer AL is fixed on the second carrier C2, and the light-emitting element LD has an adhesive material AM.
接著,請參照圖12C,於黏著層AL中形成多個封閉開口O5,且使封閉開口O5環繞由多個發光元件LD構成的發光元件組LS。在本實施例中,黏著結構AS可以包括具有封閉開口O5的黏著層AL。封閉開口O5的寬度OW5可約為30μm,且封閉開口O5的深度DO5可約為20μm。黏著結構AS的總厚度TA可約為70μm。Next, please refer to FIG. 12C , a plurality of closed openings O5 are formed in the adhesive layer AL, and the closed openings O5 surround the light-emitting element group LS composed of a plurality of light-emitting elements LD. In this embodiment, the adhesive structure AS may include an adhesive layer AL having a closed opening O5. The width OW5 of the closed opening O5 may be approximately 30 μm, and the depth DO5 of the closed opening O5 may be approximately 20 μm. The total thickness TA of the adhesive structure AS may be approximately 70 μm.
接著,請參照圖12D,移除發光元件LD上的黏著材AM,以露出發光元件LD的第一接墊PD1以及第二接墊PD2。在移除黏著材AM的過程中,黏著結構AS中形成了裂痕CK,且封閉開口O5能夠阻止裂痕CK延伸至發光元件LD下方的黏著結構AS或黏著層AL,因此能夠防止發光元件LD的位置產生偏移,從而確保發光元件陣列基板70中的發光元件LD的對位精準度仍在可容許誤差範圍內。Next, please refer to FIG. 12D to remove the adhesive material AM on the light-emitting element LD to expose the first pad PD1 and the second pad PD2 of the light-emitting element LD. During the removal of the adhesive material AM, a crack CK is formed in the adhesive structure AS, and closing the opening O5 can prevent the crack CK from extending to the adhesive structure AS or the adhesive layer AL under the light-emitting element LD, thus preventing the position of the light-emitting element LD. An offset is generated to ensure that the alignment accuracy of the light-emitting elements LD in the light-emitting
綜上所述,本發明的發光元件陣列基板藉由設置封閉開口來防止電漿蝕刻製程於黏著結構中產生的裂痕延伸至發光元件下方,能夠防止發光元件的位置產生偏移,進而使發光元件陣列基板具有良好的對位精準度。另外,本發明的發光元件陣列基板的製造方法藉由於黏著結構中形成封閉開口,且使封閉開口的內側壁與發光元件之間的最小間距大於或等於發光元件之間的最小間距,能夠避免發光元件的偏移超過容忍誤差,進而避免影響發光元件的後續轉移精準度。To sum up, the light-emitting element array substrate of the present invention prevents cracks in the adhesive structure caused by the plasma etching process from extending below the light-emitting elements by providing closed openings, thereby preventing the position of the light-emitting elements from shifting, thereby making the light-emitting elements The array substrate has good alignment accuracy. In addition, the manufacturing method of the light-emitting element array substrate of the present invention can avoid light emission by forming a closed opening in the adhesive structure and making the minimum distance between the inner wall of the closed opening and the light-emitting elements greater than or equal to the minimum distance between the light-emitting elements. The deviation of the component exceeds the tolerance error, thereby avoiding affecting the subsequent transfer accuracy of the light-emitting component.
雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed above through embodiments, they are not intended to limit the present invention. Anyone with ordinary knowledge in the technical field may make some modifications and modifications without departing from the spirit and scope of the present invention. Therefore, The protection scope of the present invention shall be determined by the appended patent application scope.
10~70:發光元件陣列基板 A-A’, B-B’, C-C’, D-D’, E-E’, F-F’:剖面線 AC:中央區 AL:黏著層 AM:黏著材 AP:周邊區 AS:黏著結構 BS:雷射光 C1:第一載板 C2:第二載板 CK:裂痕 D1:第一方向 D2:第二方向 DO1, DO5:深度 ES:半導體疊層 EU:絕緣層 G1, G2, G3:最小間距 G4:間距 GS:生長基板 HU:間距 LB, LD, LG, LR:發光元件 LS, LS1, LS2, LS3, LS4:發光元件組 MK:遮罩 O1, O2, O3, O4, O5:封閉開口 OP1, OP2, OP3:開口 OW1, OW5:寬度 PD1:第一接墊 PD2:第二接墊 PL:保護層 PO:外輪廓 PR:光阻 PX:畫素 SP:子畫素 TA:總厚度 W1, W2, W3, W4:內側壁 10~70: Light emitting element array substrate A-A’, B-B’, C-C’, D-D’, E-E’, F-F’: hatching AC:Central District AL: adhesive layer AM: adhesive material AP:surrounding area AS: adhesive structure BS: laser light C1: First carrier board C2: Second carrier board CK:Crack D1: first direction D2: second direction DO1, DO5: Depth ES: semiconductor stack EU: insulation layer G1, G2, G3: minimum spacing G4: spacing GS: growth substrate HU: spacing LB, LD, LG, LR:Light-emitting components LS, LS1, LS2, LS3, LS4: Light emitting element set MK: mask O1, O2, O3, O4, O5: closed opening OP1, OP2, OP3: opening OW1, OW5: width PD1: first pad PD2: Second pad PL: protective layer PO:outline PR: Photoresist PX: pixel SP: sub-pixel TA: total thickness W1, W2, W3, W4: inner wall
圖1A至圖4D是依照本發明一實施例的發光元件陣列基板10的製造方法的步驟流程的局部上視示意圖及剖面示意圖。
圖5是依照本發明一實施例的發光元件陣列基板20的局部上視示意圖。
圖6A至圖7D是依照本發明一實施例的發光元件陣列基板30的製造方法的步驟流程的局部上視示意圖及剖面示意圖。
圖8是依照本發明一實施例的發光元件陣列基板40的局部上視示意圖。
圖9A至圖10D是依照本發明一實施例的發光元件陣列基板50的製造方法的步驟流程的局部上視示意圖及剖面示意圖。
圖11是依照本發明一實施例的發光元件陣列基板60的局部上視示意圖。
圖12A至圖12D是依照本發明一實施例的發光元件陣列基板70的製造方法的步驟流程的局部剖面示意圖。
1A to 4D are partial top schematic views and cross-sectional schematic views of the step flow of a method for manufacturing a light-emitting
10:發光元件陣列基板 10:Light-emitting element array substrate
AL:黏著層 AL: adhesive layer
AS:黏著結構 AS: adhesive structure
B-B’:剖面線 B-B’: hatch line
C2:第二載板 C2: Second carrier board
CK:裂痕 CK:Crack
G1,G2,G3:最小間距 G1, G2, G3: minimum spacing
G4:間距 G4: spacing
LB,LD,LG,LR:發光元件 LB, LD, LG, LR: light emitting components
LS:發光元件組 LS: Light emitting element group
O1:封閉開口 O1: Close the opening
PO:外輪廓 PO:outline
PX:畫素 PX: pixel
SP:子畫素 SP: sub-pixel
W1,W2:內側壁 W1, W2: inner wall
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KR20210140886A (en) * | 2020-05-14 | 2021-11-23 | 삼성전자주식회사 | Display module and mathod of manufaturing the same |
TWI736334B (en) * | 2020-06-23 | 2021-08-11 | 隆達電子股份有限公司 | Light emitting diode |
TWI737520B (en) * | 2020-08-14 | 2021-08-21 | 友達光電股份有限公司 | Display panel |
US11990499B2 (en) * | 2020-08-24 | 2024-05-21 | PlayNitride Display Co., Ltd. | Display apparatus and method of fabricating the same |
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2022
- 2022-06-09 TW TW111121512A patent/TWI814434B/en active
- 2022-06-20 TW TW111122930A patent/TWI800409B/en active
- 2022-06-21 TW TW111122967A patent/TWI815512B/en active
- 2022-07-05 TW TW111125175A patent/TWI817597B/en active
- 2022-07-05 TW TW111125211A patent/TWI820785B/en active
- 2022-07-05 TW TW111125232A patent/TWI804377B/en active
- 2022-07-22 TW TW111127574A patent/TWI816478B/en active
- 2022-07-27 TW TW111128220A patent/TWI817630B/en active
- 2022-07-29 TW TW111128633A patent/TWI807946B/en active
- 2022-07-29 TW TW111128632A patent/TWI817633B/en active
- 2022-08-05 TW TW111129479A patent/TWI812386B/en active
- 2022-08-24 TW TW111131950A patent/TWI806750B/en active
- 2022-10-11 TW TW111138374A patent/TWI827303B/en active
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TWI816478B (en) | 2023-09-21 |
TWI817597B (en) | 2023-10-01 |
TW202341110A (en) | 2023-10-16 |
TW202341411A (en) | 2023-10-16 |
TW202341332A (en) | 2023-10-16 |
TWI815512B (en) | 2023-09-11 |
TWI800409B (en) | 2023-04-21 |
TW202341329A (en) | 2023-10-16 |
TWI820785B (en) | 2023-11-01 |
TW202341412A (en) | 2023-10-16 |
TWI814434B (en) | 2023-09-01 |
TWI804377B (en) | 2023-06-01 |
TW202341461A (en) | 2023-10-16 |
TWI807946B (en) | 2023-07-01 |
TW202340822A (en) | 2023-10-16 |
TWI806750B (en) | 2023-06-21 |
TW202341109A (en) | 2023-10-16 |
TWI812386B (en) | 2023-08-11 |
TWI817633B (en) | 2023-10-01 |
TW202341333A (en) | 2023-10-16 |
TW202341515A (en) | 2023-10-16 |
TW202341460A (en) | 2023-10-16 |
TWI817630B (en) | 2023-10-01 |
TW202341540A (en) | 2023-10-16 |
TW202341122A (en) | 2023-10-16 |
TWI827303B (en) | 2023-12-21 |
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