TW202340324A - 硬化性樹脂組成物、硬化膜、積層體、攝像裝置、半導體裝置、積層體之製造方法、及具有接合電極之元件之製造方法 - Google Patents
硬化性樹脂組成物、硬化膜、積層體、攝像裝置、半導體裝置、積層體之製造方法、及具有接合電極之元件之製造方法 Download PDFInfo
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- H10W72/012—Manufacture or treatment of bump connectors, dummy bumps or thermal bumps
- H10W72/01231—Manufacture or treatment of bump connectors, dummy bumps or thermal bumps using blanket deposition
- H10W72/01233—Manufacture or treatment of bump connectors, dummy bumps or thermal bumps using blanket deposition in liquid form, e.g. spin coating, spray coating or immersion coating
- H10W72/01235—Manufacture or treatment of bump connectors, dummy bumps or thermal bumps using blanket deposition in liquid form, e.g. spin coating, spray coating or immersion coating by plating, e.g. electroless plating or electroplating
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- H—ELECTRICITY
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- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/013—Manufacture or treatment of die-attach connectors
- H10W72/01331—Manufacture or treatment of die-attach connectors using blanket deposition
- H10W72/01333—Manufacture or treatment of die-attach connectors using blanket deposition in liquid form, e.g. spin coating, spray coating or immersion coating
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/013—Manufacture or treatment of die-attach connectors
- H10W72/01361—Chemical or physical modification, e.g. by sintering or anodisation
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/072—Connecting or disconnecting of bump connectors
- H10W72/07231—Techniques
- H10W72/07236—Soldering or alloying
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- H—ELECTRICITY
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- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
- H10W72/221—Structures or relative sizes
- H10W72/224—Bumps having multiple side-by-side cores
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- H—ELECTRICITY
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- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
- H10W72/241—Dispositions, e.g. layouts
- H10W72/244—Dispositions, e.g. layouts relative to underlying supporting features, e.g. bond pads, RDLs or vias
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/30—Die-attach connectors
- H10W72/351—Materials of die-attach connectors
- H10W72/353—Materials of die-attach connectors not comprising solid metals or solid metalloids, e.g. ceramics
- H10W72/354—Materials of die-attach connectors not comprising solid metals or solid metalloids, e.g. ceramics comprising polymers
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- H—ELECTRICITY
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- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
- H10W74/15—Encapsulations, e.g. protective coatings characterised by their shape or disposition on active surfaces of flip-chip devices, e.g. underfills
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- H—ELECTRICITY
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- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W80/00—Direct bonding of chips, wafers or substrates
- H10W80/301—Bonding techniques, e.g. hybrid bonding
- H10W80/312—Bonding techniques, e.g. hybrid bonding characterised by the direct bonding of electrically conductive pads
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- H—ELECTRICITY
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- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W80/00—Direct bonding of chips, wafers or substrates
- H10W80/301—Bonding techniques, e.g. hybrid bonding
- H10W80/327—Bonding techniques, e.g. hybrid bonding characterised by the direct bonding of insulating parts, e.g. of silicon oxide layers
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- H—ELECTRICITY
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- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/721—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
- H10W90/722—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between stacked chips
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/731—Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors
- H10W90/732—Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors between stacked chips
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- Engineering & Computer Science (AREA)
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- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Manufacturing & Machinery (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Laminated Bodies (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Silicon Polymers (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Formation Of Insulating Films (AREA)
- Geometry (AREA)
- Physics & Mathematics (AREA)
- Adhesives Or Adhesive Processes (AREA)
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- Wire Bonding (AREA)
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Applications Claiming Priority (4)
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| JP2021209413 | 2021-12-23 | ||
| JP2021-209413 | 2021-12-23 | ||
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| JP2021-209414 | 2021-12-23 |
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| TW111149517A TW202340324A (zh) | 2021-12-23 | 2022-12-22 | 硬化性樹脂組成物、硬化膜、積層體、攝像裝置、半導體裝置、積層體之製造方法、及具有接合電極之元件之製造方法 |
| TW111149518A TW202336161A (zh) | 2021-12-23 | 2022-12-22 | 硬化性樹脂組成物、硬化膜、積層體、攝像裝置、半導體裝置、積層體之製造方法、及具有接合電極之元件之製造方法 |
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| CN120380085A (zh) * | 2023-01-23 | 2025-07-25 | 积水化学工业株式会社 | 树脂组合物、固化膜、层叠体、拍摄装置、半导体装置、层叠体的制造方法和具有接合电极的元件的制造方法 |
| JPWO2025009514A1 (https=) * | 2023-07-03 | 2025-01-09 | ||
| CN116693850A (zh) * | 2023-07-14 | 2023-09-05 | 韩山师范学院 | 一种高频低介损热固性聚酰亚胺薄膜的制备方法 |
| WO2025063069A1 (ja) * | 2023-09-21 | 2025-03-27 | 積水化学工業株式会社 | 硬化性樹脂組成物、硬化膜、積層体及び半導体装置 |
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| JP3954330B2 (ja) * | 2001-06-18 | 2007-08-08 | 信越化学工業株式会社 | 液状樹脂組成物及びこれを硬化してなる半導体装置保護用材料 |
| JP4281444B2 (ja) * | 2003-08-12 | 2009-06-17 | チッソ株式会社 | 液晶配向膜形成用ワニス、液晶配向膜および液晶表示素子 |
| JP2005105011A (ja) * | 2003-09-26 | 2005-04-21 | Asahi Kasei Electronics Co Ltd | ポリアミド酸エステル組成物 |
| KR100610481B1 (ko) | 2004-12-30 | 2006-08-08 | 매그나칩 반도체 유한회사 | 수광영역을 넓힌 이미지센서 및 그 제조 방법 |
| JP5369629B2 (ja) * | 2008-11-12 | 2013-12-18 | Jnc株式会社 | 架橋性ケイ素化合物、その製造方法、架橋性組成物、シロキサンポリマー、シリコーン膜、該架橋性ケイ素化合物の原料となるケイ素化合物、及びその製造方法 |
| JP5610379B2 (ja) | 2008-11-12 | 2014-10-22 | Jnc株式会社 | シロキサンポリマー、シロキサン系の架橋性組成物及びシリコーン膜 |
| JP5803398B2 (ja) * | 2011-08-04 | 2015-11-04 | ソニー株式会社 | 半導体装置、半導体装置の製造方法、及び、電子機器 |
| JP5791983B2 (ja) * | 2011-07-07 | 2015-10-07 | 三井化学株式会社 | 樹脂組成物、これを用いたポリイミド金属積層体、及び電子回路用基板 |
| JP2020033540A (ja) * | 2018-08-28 | 2020-03-05 | 日立化成株式会社 | シルセスキオキサン含有ポリイミド |
| WO2021261403A1 (ja) * | 2020-06-22 | 2021-12-30 | 積水化学工業株式会社 | 積層体、硬化性樹脂組成物、積層体の製造方法、接合電極を有する基板の製造方法、半導体装置及び撮像装置 |
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2022
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| EP4455224A1 (en) | 2024-10-30 |
| JP2024042696A (ja) | 2024-03-28 |
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| JP7522910B2 (ja) | 2024-07-25 |
| EP4455223A4 (en) | 2025-12-10 |
| TW202336161A (zh) | 2023-09-16 |
| KR20240121703A (ko) | 2024-08-09 |
| EP4455224A4 (en) | 2025-12-10 |
| US20250054895A1 (en) | 2025-02-13 |
| WO2023120625A1 (ja) | 2023-06-29 |
| EP4455223A1 (en) | 2024-10-30 |
| JPWO2023120627A1 (https=) | 2023-06-29 |
| KR20240127946A (ko) | 2024-08-23 |
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