TW202302528A - 化合物、酸產生劑、組合物、硬化物、硬化物之製造方法、圖案及圖案之製造方法 - Google Patents

化合物、酸產生劑、組合物、硬化物、硬化物之製造方法、圖案及圖案之製造方法 Download PDF

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Publication number
TW202302528A
TW202302528A TW111113806A TW111113806A TW202302528A TW 202302528 A TW202302528 A TW 202302528A TW 111113806 A TW111113806 A TW 111113806A TW 111113806 A TW111113806 A TW 111113806A TW 202302528 A TW202302528 A TW 202302528A
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TW
Taiwan
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group
mentioned
carbon atoms
substituted
unsubstituted
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TW111113806A
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English (en)
Chinese (zh)
Inventor
松井依純
有吉智幸
中屋敷哲千
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日商艾迪科股份有限公司
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Publication of TW202302528A publication Critical patent/TW202302528A/zh

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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/64—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
    • C07C309/65—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/82—Carbazoles; Hydrogenated carbazoles
    • C07D209/86—Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Indole Compounds (AREA)
  • Liquid Crystal (AREA)
  • Materials For Photolithography (AREA)
TW111113806A 2021-04-22 2022-04-12 化合物、酸產生劑、組合物、硬化物、硬化物之製造方法、圖案及圖案之製造方法 TW202302528A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021072876 2021-04-22
JP2021-072876 2021-04-22

Publications (1)

Publication Number Publication Date
TW202302528A true TW202302528A (zh) 2023-01-16

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TW111113806A TW202302528A (zh) 2021-04-22 2022-04-12 化合物、酸產生劑、組合物、硬化物、硬化物之製造方法、圖案及圖案之製造方法

Country Status (3)

Country Link
JP (1) JP7824280B2 (https=)
TW (1) TW202302528A (https=)
WO (1) WO2022224835A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20250162509A (ko) * 2023-03-23 2025-11-18 가부시키가이샤 아데카 화합물, 조성물, 경화물 및 패턴

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103389621B (zh) * 2013-07-26 2016-03-16 常州强力先端电子材料有限公司 一种磺酸肟酯类光产酸剂
KR101491973B1 (ko) * 2014-03-12 2015-02-11 (주)휴넷플러스 화학 증폭형 포지티브형 포토레지스트 조성물 및 이를 이용한 tft 레지스트 패턴 형성방법
KR101491975B1 (ko) * 2014-03-14 2015-02-11 (주)휴넷플러스 화학 증폭형 포지티브 감광성 경화 수지 조성물, 이를 이용한 경화막의 제조 방법 및 경화막을 포함하는 전자소자
JP7594534B2 (ja) * 2019-09-10 2024-12-04 株式会社Adeka 化合物、酸発生剤、組成物、硬化物及びパターン、並びに硬化物及びパターンの製造方法
KR102873892B1 (ko) * 2019-09-10 2025-10-17 가부시키가이샤 아데카 화합물, 산 발생제, 조성물, 경화물 및 패턴, 그리고 경화물 및 패턴의 제조 방법
JPWO2021125132A1 (https=) * 2019-12-20 2021-06-24

Also Published As

Publication number Publication date
JPWO2022224835A1 (https=) 2022-10-27
JP7824280B2 (ja) 2026-03-04
WO2022224835A1 (ja) 2022-10-27

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