JPWO2022224835A1 - - Google Patents
Info
- Publication number
- JPWO2022224835A1 JPWO2022224835A1 JP2023516436A JP2023516436A JPWO2022224835A1 JP WO2022224835 A1 JPWO2022224835 A1 JP WO2022224835A1 JP 2023516436 A JP2023516436 A JP 2023516436A JP 2023516436 A JP2023516436 A JP 2023516436A JP WO2022224835 A1 JPWO2022224835 A1 JP WO2022224835A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
- C07C309/63—Esters of sulfonic acids
- C07C309/64—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
- C07C309/65—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/80—[b, c]- or [b, d]-condensed
- C07D209/82—Carbazoles; Hydrogenated carbazoles
- C07D209/86—Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Indole Compounds (AREA)
- Liquid Crystal (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021072876 | 2021-04-22 | ||
| JP2021072876 | 2021-04-22 | ||
| PCT/JP2022/017251 WO2022224835A1 (ja) | 2021-04-22 | 2022-04-07 | 化合物、酸発生剤、組成物、硬化物、硬化物の製造方法、パターン及びパターンの製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2022224835A1 true JPWO2022224835A1 (https=) | 2022-10-27 |
| JPWO2022224835A5 JPWO2022224835A5 (https=) | 2025-04-04 |
| JP7824280B2 JP7824280B2 (ja) | 2026-03-04 |
Family
ID=83722924
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023516436A Active JP7824280B2 (ja) | 2021-04-22 | 2022-04-07 | 化合物、酸発生剤、組成物、硬化物、硬化物の製造方法、パターン及びパターンの製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP7824280B2 (https=) |
| TW (1) | TW202302528A (https=) |
| WO (1) | WO2022224835A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20250162509A (ko) * | 2023-03-23 | 2025-11-18 | 가부시키가이샤 아데카 | 화합물, 조성물, 경화물 및 패턴 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103389621A (zh) * | 2013-07-26 | 2013-11-13 | 常州强力先端电子材料有限公司 | 一种磺酸肟酯类光产酸剂 |
| KR101491975B1 (ko) * | 2014-03-14 | 2015-02-11 | (주)휴넷플러스 | 화학 증폭형 포지티브 감광성 경화 수지 조성물, 이를 이용한 경화막의 제조 방법 및 경화막을 포함하는 전자소자 |
| KR101491973B1 (ko) * | 2014-03-12 | 2015-02-11 | (주)휴넷플러스 | 화학 증폭형 포지티브형 포토레지스트 조성물 및 이를 이용한 tft 레지스트 패턴 형성방법 |
| WO2021049489A1 (ja) * | 2019-09-10 | 2021-03-18 | 株式会社Adeka | 化合物、酸発生剤、組成物、硬化物及びパターン、並びに硬化物及びパターンの製造方法 |
| WO2021049470A1 (ja) * | 2019-09-10 | 2021-03-18 | 株式会社Adeka | 化合物、酸発生剤、組成物、硬化物及びパターン、並びに硬化物及びパターンの製造方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2021125132A1 (https=) * | 2019-12-20 | 2021-06-24 |
-
2022
- 2022-04-07 JP JP2023516436A patent/JP7824280B2/ja active Active
- 2022-04-07 WO PCT/JP2022/017251 patent/WO2022224835A1/ja not_active Ceased
- 2022-04-12 TW TW111113806A patent/TW202302528A/zh unknown
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103389621A (zh) * | 2013-07-26 | 2013-11-13 | 常州强力先端电子材料有限公司 | 一种磺酸肟酯类光产酸剂 |
| KR101491973B1 (ko) * | 2014-03-12 | 2015-02-11 | (주)휴넷플러스 | 화학 증폭형 포지티브형 포토레지스트 조성물 및 이를 이용한 tft 레지스트 패턴 형성방법 |
| KR101491975B1 (ko) * | 2014-03-14 | 2015-02-11 | (주)휴넷플러스 | 화학 증폭형 포지티브 감광성 경화 수지 조성물, 이를 이용한 경화막의 제조 방법 및 경화막을 포함하는 전자소자 |
| WO2021049489A1 (ja) * | 2019-09-10 | 2021-03-18 | 株式会社Adeka | 化合物、酸発生剤、組成物、硬化物及びパターン、並びに硬化物及びパターンの製造方法 |
| WO2021049470A1 (ja) * | 2019-09-10 | 2021-03-18 | 株式会社Adeka | 化合物、酸発生剤、組成物、硬化物及びパターン、並びに硬化物及びパターンの製造方法 |
Non-Patent Citations (1)
| Title |
|---|
| DAVID L. LADD ET AL.: "Synthesis and tubulin binding of 4'-(1-azi-2,2,2-trifluoroethyl)oncodazole, a photolabile analogue o", THE JOURNAL OF ORGANIC CHEMISTRY, vol. 53, no. 2, JPN6025026248, January 1988 (1988-01-01), pages 417 - 420, ISSN: 0005631621 * |
Also Published As
| Publication number | Publication date |
|---|---|
| JP7824280B2 (ja) | 2026-03-04 |
| TW202302528A (zh) | 2023-01-16 |
| WO2022224835A1 (ja) | 2022-10-27 |
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