JP7824280B2 - 化合物、酸発生剤、組成物、硬化物、硬化物の製造方法、パターン及びパターンの製造方法 - Google Patents

化合物、酸発生剤、組成物、硬化物、硬化物の製造方法、パターン及びパターンの製造方法

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Publication number
JP7824280B2
JP7824280B2 JP2023516436A JP2023516436A JP7824280B2 JP 7824280 B2 JP7824280 B2 JP 7824280B2 JP 2023516436 A JP2023516436 A JP 2023516436A JP 2023516436 A JP2023516436 A JP 2023516436A JP 7824280 B2 JP7824280 B2 JP 7824280B2
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Japan
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group
carbon atoms
compound
acid
unsubstituted
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Japanese (ja)
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JPWO2022224835A1 (https=
JPWO2022224835A5 (https=
Inventor
依純 松井
智幸 有吉
哲千 中屋敷
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Adeka Corp
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Adeka Corp
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/64—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
    • C07C309/65—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/82—Carbazoles; Hydrogenated carbazoles
    • C07D209/86—Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Indole Compounds (AREA)
  • Liquid Crystal (AREA)
  • Materials For Photolithography (AREA)
JP2023516436A 2021-04-22 2022-04-07 化合物、酸発生剤、組成物、硬化物、硬化物の製造方法、パターン及びパターンの製造方法 Active JP7824280B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021072876 2021-04-22
JP2021072876 2021-04-22
PCT/JP2022/017251 WO2022224835A1 (ja) 2021-04-22 2022-04-07 化合物、酸発生剤、組成物、硬化物、硬化物の製造方法、パターン及びパターンの製造方法

Publications (3)

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JPWO2022224835A1 JPWO2022224835A1 (https=) 2022-10-27
JPWO2022224835A5 JPWO2022224835A5 (https=) 2025-04-04
JP7824280B2 true JP7824280B2 (ja) 2026-03-04

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JP2023516436A Active JP7824280B2 (ja) 2021-04-22 2022-04-07 化合物、酸発生剤、組成物、硬化物、硬化物の製造方法、パターン及びパターンの製造方法

Country Status (3)

Country Link
JP (1) JP7824280B2 (https=)
TW (1) TW202302528A (https=)
WO (1) WO2022224835A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20250162509A (ko) * 2023-03-23 2025-11-18 가부시키가이샤 아데카 화합물, 조성물, 경화물 및 패턴

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103389621A (zh) 2013-07-26 2013-11-13 常州强力先端电子材料有限公司 一种磺酸肟酯类光产酸剂
KR101491975B1 (ko) 2014-03-14 2015-02-11 (주)휴넷플러스 화학 증폭형 포지티브 감광성 경화 수지 조성물, 이를 이용한 경화막의 제조 방법 및 경화막을 포함하는 전자소자
KR101491973B1 (ko) 2014-03-12 2015-02-11 (주)휴넷플러스 화학 증폭형 포지티브형 포토레지스트 조성물 및 이를 이용한 tft 레지스트 패턴 형성방법
WO2021049489A1 (ja) 2019-09-10 2021-03-18 株式会社Adeka 化合物、酸発生剤、組成物、硬化物及びパターン、並びに硬化物及びパターンの製造方法
WO2021049470A1 (ja) 2019-09-10 2021-03-18 株式会社Adeka 化合物、酸発生剤、組成物、硬化物及びパターン、並びに硬化物及びパターンの製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2021125132A1 (https=) * 2019-12-20 2021-06-24

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103389621A (zh) 2013-07-26 2013-11-13 常州强力先端电子材料有限公司 一种磺酸肟酯类光产酸剂
KR101491973B1 (ko) 2014-03-12 2015-02-11 (주)휴넷플러스 화학 증폭형 포지티브형 포토레지스트 조성물 및 이를 이용한 tft 레지스트 패턴 형성방법
KR101491975B1 (ko) 2014-03-14 2015-02-11 (주)휴넷플러스 화학 증폭형 포지티브 감광성 경화 수지 조성물, 이를 이용한 경화막의 제조 방법 및 경화막을 포함하는 전자소자
WO2021049489A1 (ja) 2019-09-10 2021-03-18 株式会社Adeka 化合物、酸発生剤、組成物、硬化物及びパターン、並びに硬化物及びパターンの製造方法
WO2021049470A1 (ja) 2019-09-10 2021-03-18 株式会社Adeka 化合物、酸発生剤、組成物、硬化物及びパターン、並びに硬化物及びパターンの製造方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
David L. LADD et al.，Synthesis and tubulin binding of 4'-(1-azi-2,2,2-trifluoroethyl)oncodazole, a photolabile analogue of oncodazole，The Journal of Organic Chemistry，1988年01月，Vol. 53，No. 2，p.417-420，DOI: 10.1021/jo00237a035

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Publication number Publication date
JPWO2022224835A1 (https=) 2022-10-27
TW202302528A (zh) 2023-01-16
WO2022224835A1 (ja) 2022-10-27

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