TW202301531A - Substrate transfer device, coating processing device, substrate transfer method, and substrate transfer program - Google Patents

Abstract

A substrate transfer device according to an embodiment of the present invention comprises a pair of guide rails, a first moving unit, a second moving unit, a plurality of holding parts, a space measuring unit, and a control unit. The pair of guide rails are aligned in a first direction and extend in a second direction that is orthogonal to the first direction. The plurality of holding parts are each provided on the first moving unit and second moving unit and hold a substrate, from the bottom thereof, by suction. The space measuring unit measures the distance between holding parts which are, from among the plurality of holding parts, adjacent to one another. The control unit controls the first moving unit, the second moving unit, and the plurality of holding parts. The plurality of holding parts comprise a suction unit for holding the substrate by suction and an adjustment unit for adjusting the position of the suction unit. The control unit transfers the substrate while controlling the adjustment unit to adjust the position of the suction unit such that measurement results by the space measuring unit remain constant as the first moving unit and second moving unit are moving along the pair of guide rails.

Description

Substrate transfer device, coating processing device, substrate transfer method, and substrate transfer program

The disclosure relates to a substrate transfer device, a coating processing device, a substrate transfer method, and a substrate transfer program.

Patent Document 1 discloses that a substrate is conveyed along two guide rails extending in a substrate conveyance direction, and droplets of a functional liquid are discharged onto the substrate. [Prior Art Literature] [Patent Document]

[Patent Document 1] Japanese Patent Laid-Open No. 2018-126718

[Problems to be Solved by the Invention]

The present disclosure provides a technique for reducing errors in substrate transfer. [Means to solve the problem]

A substrate transfer device according to an aspect of the present disclosure includes: a pair of guide rails; a first moving part; a second moving part; a plurality of holding parts; a distance measuring part; and a control part. The pair of guide rails are arranged in a first direction and extend along a second direction perpendicular to the first direction. The first moving part moves along one of the pair of guide rails. The second moving part moves along the other guide rail of the pair of guide rails. The plurality of holding parts are respectively provided on the first moving part and the second moving part, and suck and hold the substrate from below the substrate. The distance measuring unit measures the distance between adjacent holding parts among the plurality of holding parts. The control unit controls the first moving unit, the second moving unit and the plurality of holding units. The plurality of holding parts are provided with: a suction part for holding the substrate by suction; and an adjustment part for adjusting the position of the suction part. The control part controls the adjusting part to adjust the position of the suction part while the first moving part and the second moving part move along the pair of guide rails so that the measurement result of the distance measuring part becomes fixed. Transport the substrate. [Effect of Invention]

According to the present disclosure, errors in substrate transfer can be reduced.

Hereinafter, with reference to the attached drawings, embodiments of the substrate conveying device, the coating processing device, the substrate conveying method, and the substrate conveying program disclosed in this application will be described in detail. In addition, the disclosed substrate transfer device, coating processing device, substrate transfer method, and substrate transfer program are not limited by the embodiments described below.

In each of the drawings referred to below, for the sake of easy understanding of the description, the orthogonality of "regulating the mutually orthogonal X-axis direction, Y-axis direction, and Z-axis direction, and setting the positive direction of the Z-axis as the vertical upward direction" is shown. coordinate system.

Here, the front-rear direction is defined and the left-right direction is defined. In the front-rear direction, the positive direction of the Y-axis is defined as the front, and the negative direction of the Y-axis is defined as the rear. In the left-right direction, the positive direction of the X-axis is defined as the right. Set the negative direction of the X axis to the left. In addition, the up-down direction is defined, and in the up-down direction, the positive direction of the Z-axis is defined as upward, and the negative direction of the Z-axis is defined as downward. The substrate processing apparatus 1 processes the substrate S while transporting the substrate S in the front-rear direction from the rear to the front. That is, the substrate processing apparatus 1 processes the substrate S while conveying the substrate S along the conveyance direction (Y-axis direction).

＜Overall composition＞ Referring to FIG. 1, the overall configuration of a substrate processing apparatus 1 according to the embodiment will be described. FIG. 1 is a schematic plan view showing part of a substrate processing apparatus 1 according to an embodiment. The substrate processing apparatus 1 draws on the substrate S by an inkjet method while conveying the substrate S which is a workpiece in the horizontal direction. The substrate S is, for example, a substrate used for a flat panel display.

The substrate processing apparatus 1 includes: a floating platform 2 (an example of a platform part); a first guide rail 3_1; and a second guide rail 3_2. Moreover, the substrate processing apparatus 1 includes: a first moving part 4_1; a second moving part 4_2; a first holding part 5_1; a second holding part 5_2; a third holding part 5_3; In addition, the substrate processing apparatus 1 includes: a plurality of coating units 6 ; a maintenance unit 7 ; and a control device 8 .

In addition, below, the 1st guide rail 3_1 and the 2nd guide rail 3_2 may be collectively described as "the guide rail 3." Moreover, the 1st moving part 4_1 and the 2nd moving part 4_2 may be collectively described as "moving part 4." In addition, the first holding part 5_1 to the fourth holding part 5_4 may be collectively referred to as "holding part 5" in some cases.

The floating platform 2 has a plurality of ejection ports (not shown). The floating platform 2 blows compressed gas (such as air) toward the lower surface of the substrate S from the ejection port, and applies a force (hereinafter referred to as "uplifting force") acting upward to the substrate S. The floating platform 2 adjusts the floating height of the substrate S held by the suction part 55 (see FIG. 2 ) of the holding part 5 so as to impart a buoyant force. That is, the floating platform 2 blows gas from below to the substrate S held by the adsorption unit 55 of the holding unit 5 to adjust the floating height of the substrate S.

The floating platform 2 includes a loading platform for loading the substrate S and an unloading platform for unloading the substrate S. The carry-in platform is provided on the rear side (Y-axis negative direction side) of the substrate processing apparatus 1 . The carry-out platform is provided on the front side (Y-axis positive direction side) of the substrate processing apparatus 1 .

In addition, a plurality of floating platforms 2 may be installed along the conveyance direction (Y-axis direction). The range of the floating height of the substrate S on the floating platform 2 below the coating part 6 is narrower than the range of the floating height of the substrates S on the other floating platforms 2 . For example, the range of the floating height of the substrate S on the floating platform 2 below the coating part 6 is 30-60 μm. The range of the floating height of the substrate S on the other floating platform 2 is 200-2000 μm.

For example, in the floating platform 2 located below the coating part 6, it can also be adjusted by "spitting compressed air toward the bottom of the substrate S, and sucking the air between the substrate S and the floating platform 2". The floating height of the substrate S.

The 1st guide rail 3_1 and the 2nd guide rail 3_2 are arranged in the left-right direction (X-axis direction), and extend along a conveyance direction (Y-axis direction).

The 1st guide rail 3_1 and the 2nd guide rail 3_2 are arrange|positioned so that the floating platform 2 may be sandwiched in the left-right direction (X-axis direction). The first guide rail 3_1 is arranged on the X-axis positive direction side of the floating platform 2 , and the second guide rail 3_2 is arranged on the X-axis negative direction side of the floating platform 2 . The 1st guide rail 3_1 and the 2nd guide rail 3_2 are comprised by granite, for example. The cross section of the guide rail 3 perpendicular to the conveying direction (Y-axis direction) is, for example, rectangular.

The 1st moving part 4_1 is installed on the 1st guide rail 3_1, and moves along the 1st guide rail 3_1. The 2nd moving part 4_2 is installed on the 2nd guide rail 3_2, and moves along the 2nd guide rail 3_2. In addition, the 1st moving part 4_1 and the 2nd moving part 4_2 each have a drive part, such as a motor, and can move independently.

The plurality of holding parts 5 are provided on the first moving part 4_1 and the second moving part 4_2 respectively, and hold the substrate S by suction from below the substrate S. As shown in FIG.

Specifically, among the plurality of holding parts 5, the first holding part 5_1 and the second holding part 5_2 are arranged on the first moving part 4_1, and the third holding part 5_3 and the fourth holding part 5_4 are arranged on the On the second moving part 4_2. The first holding part 5_1 and the second holding part 5_2 are arranged in the order of the first holding part 5_1 and the second holding part 5_2 along the conveyance direction (Y-axis direction) on the first moving part 4_1. Moreover, the 3rd holding part 5_3 and the 4th holding part 5_4 are arranged in order of the 3rd holding part 5_3 and the 4th holding part 5_4 along the conveyance direction (Y-axis direction) on the 2nd moving part 4_2. In addition, the number of holding parts 5 is not limited to four.

In the embodiment, a plurality of (here, four) holding parts 5 suck and hold the four corners of the substrate S from below the substrate S. FIG. The substrate S is in a state where the four corners are held by a plurality of holding parts 5 and is floated by the floating platform 2, and is moved along the conveying direction (Y-axis positive direction) by the first moving part 4_1 and the second moving part 4_2 transport.

The coating unit 6 is for coating the functional liquid on the substrate S being transported along the transport direction (Y-axis positive direction). Functional fluid, ink. The coating unit 6 applies the functional liquid to the substrate S whose floating height is adjusted by the floating platform 2 (an example of the platform unit). Specifically, the application unit 6 applies the functional liquid to the substrate S by discharging the functional liquid onto the substrate S. A plurality of application parts 6 are arranged along the left-right direction (X-axis direction). In the example shown in FIG. 1 , although seven application parts 6 are arranged along the left-right direction (X-axis direction), the number of application parts 6 is not limited to this. The application unit 6 has a plurality of heads for discharging the functional liquid, and discharges the functional liquid onto the substrate S from each head.

The applicator 6 is movable along a pair of rails 9 arranged in the Y-axis direction and extending in the X-axis direction. The pair of rails 9 is, for example, provided to extend rightward with respect to the floating platform 2 . Between a pair of rails 9 on the right side of the floating platform 2, a maintenance unit 7 is arranged. The application unit 6 is movable between a position above the maintenance unit 7 and a position where the functional liquid is discharged onto the substrate S. As shown in FIG. The application part 6 is moved in the left-right direction along a pair of rails 9 by a driving device such as a linear motor. The plurality of application parts 6 can also independently move in the left-right direction, and can also move in the left-right direction integrally.

The maintenance unit 7 performs maintenance of the head of the coating unit 6 to eliminate or prevent discharge failure of the head of the coating unit 6 . In addition, the maintenance part 7 can also be arranged above the floating platform 2 .

The control device 8 is, for example, a computer, and includes a control unit 81 and a memory unit 82 . The memory unit 82 stores programs for controlling various processes executed in the substrate processing apparatus 1 . The control unit 81 controls the operation of the substrate processing apparatus 1 by reading and executing a program (an example of a substrate transfer program) stored in the memory unit 82 .

In addition, the program is recorded on a storage medium that can be read by a computer, and may be installed in the memory unit 82 of the control device 8 from the storage medium. Examples of computer-readable storage media include hard disks (HD), floppy disks (FD), optical disks (CD), magneto-optical disks (MO), and memory cards.

＜Maintenance Department＞ Next, referring to FIG. 2 and FIG. 3 , the configuration of the holding portion 5 will be described. Fig. 2 is a schematic plan view of the holding portion 5 of the embodiment. 3 is a schematic side view of the holding portion 5 of the embodiment. In addition, in FIG. 2 and FIG. 3, although the 1st holding part 5_1 is shown as an example, the structure of the 2nd holding part 5_2 - the 4th holding part 5_4 is also the same as the 1st holding part 5_1.

As shown in FIGS. 2 and 3 , the holding portion 5 includes: a base portion 50 ; a first adjustment portion 51 ; a second adjustment portion 52 ; a rotation portion 53 ; an arm portion 54 ;

The adsorption unit 55 is for adsorbing and holding the substrate S. As shown in FIG. Specifically, the adsorption unit 55 is provided with a plurality of adsorption disks 551 . The plurality of suction pads 551 are arranged in a row in the horizontal direction (here, the Y-axis direction). In addition, although the example in which the adsorption|suction part 55 is equipped with the three suction pads 551 is shown here, the number of suction pads 551 is not limited to three. The suction unit 55 sucks the lower surface of the substrate S and holds the substrate S by a plurality of suction pads 551 .

The base part 50 , the first adjustment part 51 , the second adjustment part 52 , the rotation part 53 and the arm part 54 are examples of adjustment parts that adjust the relative position of the suction part 55 with respect to the moving part 4 .

The base part 50 is fixed on the moving part 4 . The first adjustment part 51 is provided on the base part 50 and is movable in the left-right direction (X-axis direction) on the base part 50 . The second adjustment part 52 is provided on the first adjustment part 51 and is movable in the front-rear direction (Y-axis direction) on the first adjustment part 51 . The rotating part 53 is provided on the second adjusting part 52 and is rotatable around a vertical axis (Z axis). The arm portion 54 is a member extending in the horizontal direction, is supported by the rotation portion 53 at the base end portion, and supports the suction portion 55 at the front end portion.

In this way, the adjustment unit moves the first adjustment unit 51 in the left-right direction (X-axis direction), thereby moving the suction unit 55 in the left-right direction (X-axis direction). That is, the first adjustment unit 51 can adjust the position of the adsorption unit 55 relative to the moving unit 4 along the left-right direction (X-axis direction).

In addition, the adjustment unit moves the second adjustment unit 52 in the front-rear direction (Y-axis direction), thereby moving the suction unit 55 in the front-back direction (Y-axis direction). That is, the second adjustment unit 52 can adjust the position of the adsorption unit 55 relative to the moving unit 4 along the front-rear direction (Y-axis direction).

In addition, the adjusting part can rotate the suction part 55 supported by the rotating part 53 via the arm part 54 around the vertical axis (Z axis) by rotating the rotating part 53 around the vertical axis (Z axis). That is, the rotating part 53 can adjust the position of the adsorption part 55 relative to the moving part 4 in the circumferential direction centered on the vertical axis (Z-axis direction).

Moreover, the 1st adjustment part 51 and the 2nd adjustment part 52 each have a drive part, such as a motor, and can move independently. On the other hand, the rotating part 53 is, for example, a bearing without a driving part, and rotates the adsorption part 55 so as to follow the operation of the first adjusting part 51 and the second adjusting part 52 . In addition, it is not limited to this, and a drive unit may be provided on the rotation unit 53 .

However, the pair of guide rails 3 extends along the front-back direction (Y-axis direction) which is the conveyance direction of the substrate S. As shown in FIG. As an example, the length of the pair of guide rails 3 in the front-back direction (Y-axis direction) is about 3 to 7 m. In this way, since the pair of guide rails 3 are long, it may be difficult to form them completely straight, and there may be a possibility of deformation of, for example, about several μm in the left-right direction (X-axis direction). Similarly, the pair of guide rails 3 may be deformed by several μm in the vertical direction (Z-axis direction). Also, even if it is assumed that the pair of guide rails 3 can be formed straight, there is a possibility of subsequent deformation due to environmental changes (for example, temperature changes).

In this way, when there is deformation in the pair of guide rails 3 , there is a possibility that the relative positions of the plurality (here, four) of the holding parts 5 will be shifted. This point will be described with reference to FIGS. 4 and 5 . FIG. 4 is a schematic view showing a situation in which "when the guide rail 3 of the embodiment is deformed in the left-right direction, the relative positions of the plurality of holding parts 5 are shifted". FIG. 5 is a schematic diagram showing a situation in which "when the guide rail 3 of the embodiment is deformed in the vertical direction, the relative positions of the plurality of holding parts 5 are shifted".

In addition, in FIG. 4 and FIG. 5 , the guide rail 3 and the holding portion 5 when no deformation occurs in the pair of guide rails 3 are shown by dot chain lines. As indicated by the solid lines in FIGS. 4 and 5 , in FIGS. 4 and 5 , the deformation caused by the pair of guide rails 3 is exaggerated for easy understanding.

Also, hereinafter, the distance between the first holding part 5_1 and the second holding part 5_2 is described as "the first gap G1", and the distance between the third holding part 5_3 and the fourth holding part 5_4 is described as "the second gap G1". Interval G2". In addition, the distance between the first holding part 5_1 and the third holding part 5_3 is described as "the third gap G3", and the distance between the second holding part 5_2 and the fourth holding part 5_4 is described as "the fourth gap G4". .

As shown in FIG. 4, when the first guide rail 3_1 is deformed in the left-right direction (X-axis direction), the distance between the first holding part 5_1 and the second holding part 5_2, that is, the first gap G1, The system changes from the first gap G1 when the first guide rail 3_1 is not deformed. Specifically, the first interval G1 when the first guide rail 3_1 is deformed is shorter than the first interval G1 when the first guide rail 3_1 is not deformed. The same applies to the second gap G2 which is the distance between the third holding portion 5_3 and the fourth holding portion 5_4.

Also, when the first guide rail 3_1 is deformed in the left-right direction (X-axis direction), the holding part 5 provided on the first guide rail 3_1 side and the holding part 5 provided on the second guide rail 3_2 side The distance between parts 5 also changes. For example, in the example shown in FIG. 4 , because of the deformation of the pair of guide rails 3, the distance between the second holding portion 5_2 and the fourth holding portion 5_4, that is, the fourth gap G4, is greater than that of the pair of guide rails 3 without. The fourth gap G4 at the time of deformation is long. In addition, although the example in which the fourth interval G4 becomes longer is shown here, the third interval G3 and the fourth interval G4 when the guide rail 3 is deformed are sometimes larger than those when the guide rail 3 is not deformed. The third gap G3 and the fourth gap G4 are short. Moreover, the change of the 3rd gap G3 and the 4th gap G4 may occur also when only one of a pair of guide rail 3 is deformed.

Also, as shown in FIG. 5, when the deformation in the vertical direction (Z-axis direction) occurs in the first guide rail 3_1, the first gap G1 also changes from that when the first guide rail 3_1 does not deform. The first interval G1 changes. Specifically, the first interval G1 when the first guide rail 3_1 is deformed is shorter than the first interval G1 when the first guide rail 3_1 is not deformed. The same applies to the second gap G2 which is the distance between the third holding portion 5_3 and the fourth holding portion 5_4.

In this way, when the guide rail 3 is deformed, the first gap G1 to the fourth gap G4 change. That is, the relative positions of the plurality of holding parts 5 change. In other words, the relative positions of the plurality of adsorption parts 55 change. When the relative positions of the plurality of suction parts 55 change, the positional relationship between the suction parts 55 and the substrate S changes. Thereby, since the adsorption part 55 deviates with respect to the board|substrate S, it becomes difficult to convey the board|substrate S with high precision. In particular, as in the substrate processing apparatus 1 of the embodiment, when the first moving part 4_1 and the second moving part 4_2 are not integrated but independent, the relative positions of the plurality of holding parts 5 are likely to be deformed by the guide rail 3 And offset.

Therefore, in the substrate processing apparatus 1 of the embodiment, each holding unit 5 is controlled so that the first gap G1 to the fourth gap G4 are fixed while the first moving part 4_1 and the second moving part 4_2 are moving. The first adjustment part 51 and the second adjustment part 52 adjust the position of the adsorption part 55 relative to the moving part 4 .

＜Measuring system＞ This point will be specifically described. First, referring to FIG. 6 , the configuration of the measurement system included in the substrate processing apparatus 1 will be described. Fig. 6 is a schematic diagram showing the configuration of the measurement system of the embodiment.

As shown in FIG. 6 , the substrate processing apparatus 1 includes a measurement system 100 . The measurement system 100 is an example of an interval measuring unit that measures the distance between adjacent holding units 5 among a plurality of holding units 5 . In addition, the measurement system 100 is also an example of a movement distance measuring unit that measures movement distances along the front-rear direction (Y-axis direction) of the first movement unit 4 and the second movement unit 4 respectively.

The measurement system 100 measures the distance from the measurement site using laser interferometry. The measurement system 100 is provided with: a light projecting part 110, which projects laser light; a light receiving part 120, which receives the laser light projected from the light projecting part 110; The light path of the laser light.

The light projecting unit 110 includes: a light source 111 ; a plurality of beam splitters 112 - 115 ; and a plurality of beam benders 116 - 118 . The light source 111 generates laser light. A plurality of beam splitters 112-115 split the incident laser light into two laser lights at a predetermined split ratio. A plurality of beam benders 116-118 change the traveling direction of the incident laser light.

The beam splitter 112 splits the laser light incident from the light source 111 and projects the light toward the beam splitter 113 and an interferometer 134 d described later. The beam splitter 113 splits the laser light incident from the beam splitter 112 and projects the light toward the beam splitter 114 and the beam bender 116 . The beam splitter 114 splits the laser light incident from the beam splitter 113 and projects the light toward a beam bender 118 and an interferometer 134 b described later. The beam splitter 115 splits the laser light incident from the beam bender 116 described later and projects the light toward the beam bender 117 and the beam splitter 132 described later.

The beam bender 116 changes the traveling direction of the incident laser light from the beam splitter 113 by 90 degrees and projects the light toward the beam splitter 115 . The beam bender 117 changes the advancing direction of the incident laser light from the beam splitter 115 by 90 degrees, and projects light toward an interferometer 134 c described later. The beam bender 118 changes the advancing direction of the incident laser light from the beam splitter 114 by 90 degrees, and projects light toward an interferometer 134 a described later.

The light receiving unit 120 includes a plurality of light receivers 121 to 126 . The light receiver 121 is to receive the laser light reflected at the measurement site 131a described later, the light receiver 122 is to receive the laser light reflected at the measurement site 131b described later, and the light receiver 123 is to receive the laser light reflected at the measurement site 131c described later . The light receiver 124 is to receive the laser light reflected at the measurement site 131d described later, the light receiver 125 is to receive the laser light reflected at the measurement site 131e described later, and the light receiver 126 is to receive the laser light reflected at the measurement site 131f described later. .

In addition, the light projecting unit 110, the light receiving unit 120, and the optical system 130 are arranged along the front-back direction (Y-axis direction). Moreover, the light receivers 121 to 125 among the plurality of light receivers 121 to 126 are located on the positive side of the Y axis of the light projecting part 110 and on the negative side of the Y axis of the optical system 130, and the light receiver 126 is located on the side of the optical system 130. The positive side of the Y axis.

The optical system 130 is provided with: a plurality of measurement locations 131a to 131f; a beam splitter 132; a beam bender 133; and a plurality of interferometers 134a to 134f.

The plurality of measurement sites 131a to 131f are sites where laser light is irradiated. The plurality of measurement locations 131a to 131f have reflective surfaces perpendicular to the incident laser light.

The measurement site 131a is provided, for example, on the first moving part 4_1, and the measurement site 131b is provided, for example, on the second moving part 4_2. Also, the measurement site 131c is, for example, set on the second holding part 5_2, the measurement site 131d is, for example, set on the fourth holding part 5_4, the measurement site 131e, for example, is set on the third holding part 5_3, and the measurement site 131f is, for example, set on the fourth holding part 5_4. , is provided, for example, in the fourth holding portion 5_4. The plurality of measurement sites 131a to 131f reflect the incident laser light in a direction opposite to the incident direction. In addition, the laser light that goes straight along the Y-axis positive direction is incident on the measurement sites 131a to 131d, and the laser light that goes straight along the X-axis negative direction is incident on the measurement sites 131e and 131d.

The beam splitter 132 is provided on the first holding part 5_1. The beam splitter 132 splits the laser light incident from the beam splitter 115 and projects the light toward the interferometer 134 e and the beam bender 133 . The beam bender 133 is provided on the second adjustment unit 52 . The beam bender 133 changes the traveling direction of the laser light incident from the beam splitter 132 by 90 degrees and projects the light toward the interferometer 134f.

The plurality of interferometers 134a to 134f split the incident laser light into two laser lights, for example, using a beam splitter provided inside. Also, the plurality of interferometers 134a to 134f reflect one of the divided laser beams by means of mirrors provided inside. The laser light (reference path) reflected by the mirrors in the interferometers 134a-134f and the laser light (measurement path) reflected by the measurement parts 131a-131f are beam splitters in the interferometers 134a-134f Recombine and enter the photoreceptors 121-126.

The measurement system 100 measures the distance from the measurement sites 131a to 131f based on the phase difference between two laser beams obtained by "optical signal processing of the laser beams received by the light receivers 121 to 126".

Specifically, the interferometer 134a is arranged at a position "separated from the first moving part 4_1 between the photoreceiver 121 and the measurement site 131a". The interferometer 134a divides the laser light projected from the beam bender 118 into two. One of the two laser beams divided by the interferometer 134a is projected toward the reflection mirror in the interferometer 134a, and the other is projected toward the measurement site 131a. Moreover, the laser light recombined in the interferometer 134 a is received by the light receiver 121 . The measuring system 100 can obtain the distance from the interferometer 134a to the measuring site 131a based on the laser light received by the light receiver 121, that is, the moving distance of the first moving part 4_1, that is, the first moving distance D1.

The interferometer 134b is arranged at a position "separated from the second moving part 4_2 between the photoreceptor 122 and the measurement site 131b". The interferometer 134b splits the laser light projected from the beam splitter 114 into two. One of the two laser beams divided by the interferometer 134b is projected toward the mirror in the interferometer 134b, and the other is projected toward the measurement site 131b. Moreover, the laser light recombined in the interferometer 134 b is received by the light receiver 122 . The measuring system 100 can obtain the distance from the interferometer 134b to the measuring site 131b based on the laser light received by the light receiver 122, that is, the moving distance of the second moving part 4_2, that is, the second moving distance D2.

The interferometer 134c is installed in the first holding part 5_1. The interferometer 134c divides the laser light projected from the beam bender 117 into two. One of the two laser beams divided by the interferometer 134c is projected toward the mirror in the interferometer 134c, and the other is projected toward the measurement site 131c. Moreover, the laser light recombined in the interferometer 134c is received by the light receiver 123 . The measurement system 100 can obtain the distance from the interferometer 134c to the measurement site 131b based on the laser light received by the light receiver 123, that is, the distance between the first holding part 5_1 and the second holding part 5_2, that is, the first Interval G1.

The interferometer 134d is installed in the third holding part 5_3. The interferometer 134d splits the laser light projected from the beam splitter 112 into two. One of the two laser beams divided by the interferometer 134d is projected toward the mirror in the interferometer 134d, and the other is projected toward the measurement site 131d. Moreover, the laser light recombined in the interferometer 134d is received by the light receiver 124 . The measurement system 100 can obtain the distance from the interferometer 134d to the measurement site 131d based on the laser light received by the light receiver 124, that is, the distance between the third holding part 5_3 and the fourth holding part 5_4, that is, the second Interval G2.

The interferometer 134e is installed in the first holding part 5_1. The laser light projected from the beam splitter 115 and split by the beam splitter 132 enters the interferometer 134e. The interferometer 134e splits the incident laser light from the beam splitter 132 into two. One of the two laser beams divided by the interferometer 134e is projected toward the reflection mirror in the interferometer 134e, and the other is projected toward the measurement site 131e. Moreover, the laser light recombined in the interferometer 134e is received by the light receiver 125 . The measurement system 100 can obtain the distance from the interferometer 134e to the measurement site 131e based on the laser light received by the light receiver 125, that is, the distance between the first holding part 5_1 and the third holding part 5_3, that is, the third Interval G3.

The interferometer 134f is installed in the second holding part 5_2. The laser light projected from the beam splitter 132 and whose path is changed by the beam splitter 133 enters the interferometer 134f. The interferometer 134f divides the incident laser light from the beam bender 133 into two. One of the two laser beams divided by the interferometer 134f is projected toward the mirror in the interferometer 134f, and the other is projected toward the measurement site 131f. Moreover, the laser light recombined in the interferometer 134f is received by the light receiver 126 . The measurement system 100 can obtain the distance from the interferometer 134f to the measurement site 131f based on the laser light received by the light receiver 126, that is, the distance between the second holding part 5_2 and the fourth holding part 5_4, that is, the fourth Interval G4.

The measurement results of the measurement system 100 , that is, the first moving distance D1 , the second moving distance D2 , and the first to fourth intervals G1 to G4 are output to the control device 8 .

FIG. 7 is a schematic view illustrating the installation position of the optical system 130 of the embodiment. As shown in FIG. 7, the interferometers 134c, 134e and the beam splitter 132 are installed in the second adjustment part 52 in the first holding part 5_1.

In this way, in the measurement system 100 as the interval measurement unit, the interferometers 134c, 134e and the beam splitter 132 installed in the first holding unit 5_1 of the optical system 130 are installed in the first adjustment unit 51 and the first adjustment unit 51. The upper adjustment part of the second adjustment part 52 . With this configuration, since the height positions of the interferometers 134c and 134e and the beam splitter 132 can be brought closer to the height position of the substrate S, the first gap G1 and the third gap G3 can be measured more accurately.

Furthermore, interferometers 134c, 134e and beam splitter 132 are provided at places other than the rotating part 53, thereby suppressing a decrease in measurement accuracy of the first gap G1 and the third gap G3 due to the rotation of the rotating part 53.

In addition, in the embodiment, an example was shown in which the second adjustment part 52 is provided on the first adjustment part 51 , but the first adjustment part 51 may be provided on the second adjustment part 52 . In this case, the interferometers 134c and 134e and the beam splitter 132 may also be provided in the first adjustment unit 51 .

In addition, the interferometers 134c and 134e and the beam splitter 132 are fixed to the second adjustment unit 52 via the elevating mechanism 150 . The elevating mechanism 150 is fixed to the second adjustment unit 52 and moves the table 151 in the vertical direction (Z-axis direction). The interferometers 134c, 134e and the beam splitter 132 are arranged on the platform 151 .

In the case of measuring the first interval G1 and the third interval G3, the measurement system 100 uses the elevating mechanism 150 to raise the platform 151, whereby the interferometers 134c, 134e and the beam splitter 132 are positioned at the specific adsorption part. The top (that is, the adsorption surface) of 55 is more above. With this configuration, since the height positions of the interferometers 134c and 134e and the beam splitter 132 can be brought closer to the height position of the substrate S, the first gap G1 and the third gap G3 can be measured more accurately. In addition, the measurement system 100 lowers the interferometers 134 c , 134 e and the beam splitter 132 to be positioned below the upper surface of the adsorption unit 55 using the elevating mechanism 150 when the measurement is not performed. Thereby, it can suppress that the interferometers 134c, 134e and the beam splitter 132 interfere with the conveyance of the board|substrate S. As shown in FIG.

In addition, in FIG. 7, the arrangement|positioning of the interferometer 134c, 134e and the beam splitter 132 provided in the 1st holding part 5_1 is shown as an example. Similarly, a part of the optical system 130 (beam bender 133 and interferometer 134f) installed in the second holding part 5_2, and a part of the optical system 130 (interferometer 134d) installed in the third holding part 5_3 also pass through The lift mechanism 150 is provided on the second adjustment unit 52 .

In addition, the measurement site 131 a in the optical system 130 is arranged below the first adjustment unit 51 and the second adjustment unit 52 . For example, in the example shown in FIG. 7, the measurement site 131a is set at the rear end (that is, the end on the negative side of the Y axis) in the moving direction (positive direction of the Y axis) of the first moving part 4_1. .

In this way, in the measuring system 100 as the moving distance measuring part, the measuring part 131a of the optical system 130 which is set on the first holding part 5_1 can also be set at a position higher than that of the first adjusting part 51 and the second adjusting part. Section 52 is further below. With this configuration, for example, when the guide rail 3 is deformed in the vertical direction (Z-axis direction), compared with the case where the measurement site 131a is provided in the first adjustment part 51 or the second adjustment part 52, it is possible to The influence of the deformation is suppressed to be small. Therefore, the first moving distance D1 can be measured with high accuracy.

In addition, in FIG. 7, the example in which the measurement site 131a is set in the 1st moving part 4_1 is shown. It is not limited thereto, and the measurement site 131a may also be set "in a member other than the first moving part 4_1 that moves together with the first moving part 4_1 and is located below the first adjusting part 51 and the second adjusting part 52." place. For example, the measurement site 131 a may also be provided on the base part 50 .

In addition, in FIG. 7, the arrangement|positioning of the measurement site 131a provided in the 1st holding|maintenance part 5_1 is shown as an example. Similarly, the measurement site 131b provided in the third holding part 5_3 is also provided below the first adjustment part 51 and the second adjustment part 52 included in the third holding part 5_3.

The measurement site 131 a is not limited to the above example, and may be provided in the first adjustment part 51 or in the second adjustment part 52 , for example. By providing the measurement site 131a at a position close to the substrate S, the first moving distance D1 can be measured with high accuracy.

In addition, the light projecting unit 110, the light receivers 121, 122, the measurement locations 131a, 131b, and the interferometers 134a, 134b in the measurement system 100 are examples of the moving distance measurement unit. Specifically, the light projecting unit 110, the light receiver 121, the measurement site 131a, and the interferometer 134a are part of the first moving distance measuring unit that respectively measures the moving distance along the front-back direction (Y-axis direction) of the first moving unit 4_1. an example. In addition, the light projecting part 110, the light receiver 122, the measuring part 131b, and the interferometer 134b are examples of the second moving distance measuring part that respectively measure the moving distance along the front-back direction (Y-axis direction) of the second moving part 4_2.

In addition, the light projecting part 110, the light receivers 123-126, the measuring parts 131c-131f, the beam splitter 132, the beam bender 133, and the interferometers 134c-134f in the measuring system 100 measure the adjacent holding parts 5. An example of the interval measurement unit for the distance between them. Specifically, the light projecting unit 110, the light receiver 123, the measurement site 131c, and the interferometer 134c are examples of the first distance measurement unit that measures the first distance G1. In addition, the light projecting part 110, the light receiver 124, the measuring part 131d, and the interferometer 134d are examples of the second distance measuring part that measures the second distance G2. In addition, the light projecting unit 110, the light receiver 125, the measuring portion 131e, the beam splitter 132, and the interferometer 134e are examples of a third distance measuring unit that measures the third distance G3. In addition, the light projecting unit 110, the light receiver 126, the measuring portion 131f, the beam splitter 132, the beam bender 133, and the interferometer 134f are examples of the fourth distance measuring unit for measuring the fourth distance G4.

＜Control device＞ Next, referring to FIG. 8 , the configuration of the control device 8 will be described. Fig. 8 is a block diagram showing the configuration of the control device 8 of the embodiment. As shown in FIG. 8 , the control device 8 includes: a control unit 81 ; and a memory unit 82 .

The control unit 81 is a controller. The control unit 81 is realized, for example, by using a CPU (Central Processing Unit) or an MPU (Micro Processing Unit), etc., using RAM as a work area to execute various programs stored in a storage device inside the control device 8 . In addition, the control unit 81 is a controller, and is realized by an integrated circuit such as an ASIC (Application Specific Integrated Circuit) or an FPGA (Field Programmable Gate Array). As shown in FIG. 8 , the control unit 81 includes a measurement processing unit 811 , a change processing unit 812 , and a transfer processing unit 813 , and realizes or executes the functions or actions of the processing described below.

The memory unit 82 is realized by, for example, semiconductor memory elements such as RAM (Random Access Memory) and flash memory (Flash Memory), or memory devices such as hard disks and optical disks. As shown in FIG. 8, the memory unit 82 memorizes: transfer information 821; first moving unit adjustment information 822; and second moving unit adjustment information 823. Also, the memory unit 82 memorizes: first holding unit adjustment information 824 ; second holding unit adjustment information 825 ; third holding unit adjustment information 826 ; and fourth holding unit adjustment information 827 .

The conveyance information 821 is information indicating "the amount of movement instructed to the moving part 4 and the holding part 5 at each point on the pair of guide rails 3". Each point on the pair of guide rails 3 is, for example, the distance from the starting point in the conveyance path of the substrate S (the moving distance of the moving part 4 when the pair of guide rails 3 is not deformed, hereinafter described as "ideal Movement distance") to represent.

For example, a movement command with respect to the moving part 4 and the holding part 5 is output every ideal moving distance of 50 mm. In the conveyance information 821, the corresponding relationship of the movement amounts instructed to each of the first moving part 4_1 and the second moving part 4_2 is established for every ideal moving distance of 50 mm. For example, in the transfer information 821 , every ideal moving distance of 50 mm may be established as a corresponding relationship of 50 mm as the movement amounts respectively instructed to the first moving part 4_1 and the second moving part 4_2 . The 1st moving part 4_1 and the 2nd moving part 4_2 move 50 mm successively on the guide rail every time they receive a movement instruction.

In the conveyance information 821, for example, a correspondence relation of the movement amount considering the deformation of the pair of guide rails 3 obtained based on the previous measurement using a laser interferometer or the like may be established. For example, after outputting a movement command with a movement amount of 50 mm to the first moving part 4_1 at a point with an ideal moving distance of 100 mm, it is confirmed by prior measurement that the point actually reached is a point of 149 mm. In this case, in the transfer information 821, the movement amount of 51 mm may be associated with the ideal movement distance of 100 mm. This movement command is output to move the first moving part 4_1 and the second moving part 4_2 by 51 mm, whereby the first moving part 4_1 and the second moving part 4_2 can reach a point of 150 mm.

In addition, here, although the information associated with the movement amount in the transfer information 821 is the ideal travel distance, the information associated with the movement amount in the transfer information 821 may also be the information corresponding to the moving part 4 and the holding distance. The output times of the movement command of part 5. That is, the transfer information 821 may be information in which "the movement amount contained in the movement command is associated with the output frequency of the movement command to the movement unit 4 and the holding unit 5".

Moreover, in the conveyance information 821, for example, the corresponding relationship of the amount of movement instructed to each of the first holding part 5_1 to the fourth holding part 5_4 is established for every ideal moving distance of 50 mm. The transport information 821 of each holding unit 5 refers to the movement amount of the first adjustment unit 51 (hereinafter, described as “X movement amount”), the movement amount of the second adjustment unit 52 (hereinafter, described as “Y movement amount”) ”) and the ideal moving distance (or the output times of moving commands) are information corresponding to each other. Here, as for the conveyance information 821 of each holding part 5, deformation|transformation of the guide rail 3 based on the previous measurement is considered, for example. However, it is not limited to this, and the conveyance information 821 of each holding part 5 may not consider the deformation|transformation of a pair of guide rail 3. In this case, the transfer information 821 on each holding unit 5 is associated with "0" as both the X movement amount and the Y movement amount with respect to the ideal movement distance (or the output frequency of movement commands).

Each of the adjustment information 822 to 827 represented by the first movement unit adjustment information 822 is information for adjusting the amount of movement associated with the transfer information 821 .

The 1st moving part adjustment information 822 is the information which shows the adjustment value for "adjusting the movement amount contained in the movement command output to the 1st moving part 4_1 at each point on the 1st guide rail 3_1." Moreover, the 2nd moving part adjustment information 823 is information which shows the adjustment value for "adjusting the movement amount contained in the movement command output to the 2nd moving part 4_2 at each point on the 2nd guide rail 3_2."

As an example, referring to FIG. 9 , the content of the first moving unit adjustment information 822 will be described. FIG. 9 is a diagram showing an example of the first moving unit adjustment information 822 according to the embodiment. As shown in FIG. 9 , the first movement unit adjustment information 822 is information in which the item "number of times of output of movement command", the item "ideal moving distance" and the item "adjustment value" are associated with each other. In the "number of times of output of movement command" item, the number of times of output of movement commands to the first moving unit 4_1 is stored. In the "ideal moving distance" item, the first moving part after outputting the moving command for the number of times stored in the corresponding "number of times of output of the moving command" assuming that the pair of guide rails 3 are not deformed is stored. 4_1 ideal moving distance. In the "adjustment value" item, the adjustment value of the movement amount stored in the transport information 821 of the first movement unit 4_1 is stored.

For example, in the example shown in FIG. 9 , the ideal moving distance "50 (mm)" and the adjustment value "-1 (μm)" are associated with the output times of the moving command "one (time)". This means that the ideal moving distance of the first moving part 4_1 when the first moving command is output to the first moving part 4_1 is "50 (mm)". In addition, it indicates that the movement amount associated with the first movement command with respect to the first movement unit 4_1 in the transportation information 821 is adjusted by "-1 (μm)". In addition, regarding the sign of "adjustment value (μm)" shown in FIG. 9, the case of adjusting to the positive side of the Y-axis is set to "+", and the case of adjustment to the negative side of the Y-axis is set to "+". -".

The first holding unit adjustment information 824 is information indicating an adjustment value for “adjusting the amount of movement included in the movement command output to the first holding unit 5_1 at each point on the first guide rail 3_1 ”. Also, the second holding unit adjustment information 825 is information indicating an adjustment value for “adjusting the amount of movement included in the movement command output to the second holding unit 5_2 at each point on the first guide rail 3_1 ”. Also, the third holding unit adjustment information 826 is information indicating an adjustment value for “adjusting the amount of movement included in the movement command output to the third holding unit 5_3 at each point on the second guide rail 3_2”. Also, the fourth holding unit adjustment information 827 is information indicating an adjustment value for “adjusting the amount of movement included in the movement command output to the fourth holding unit 5_4 at each point on the second guide rail 3_2”.

As an example, referring to FIG. 10 , the contents of the first holding unit adjustment information 824 will be described. FIG. 10 is a diagram showing an example of the first holding unit adjustment information 824 according to the embodiment. As shown in FIG. 10, the first holding unit adjustment information 824 refers to the correspondence between the item "number of times of output of movement command", the item "ideal moving distance", the item "X adjustment value" and the item "Y adjustment value". relationship information.

In the item "number of times of output of the movement command", the number of times of output of the movement command with respect to the 1st adjustment part 51 and the 2nd adjustment part 52 with which the 1st holding part 5_1 is equipped is stored. In the "ideal moving distance" item, the first moving part after outputting the moving command for the number of times stored in the corresponding "number of times of output of the moving command" assuming that the pair of guide rails 3 are not deformed is stored. 4_1 ideal moving distance. In the "X adjustment value" item, a value for adjusting the X movement amount stored in the transfer information 821 about the first holding unit 5_1 is stored. In the "Y adjustment value" item, a value for adjusting the Y movement amount stored in the transport information 821 about the first holding unit 5_1 is stored.

For example, in the example shown in Figure 10, the ideal moving distance "50 (mm)", the X adjustment value "0 (μm)" and the Y adjustment value "3 (μm)" and the output times of the movement command "1 (times)" to establish a corresponding relationship. This means that the ideal moving distance of the first moving part 4_1 when the first moving command is output to the first holding part 5_1 is "50 (mm)". In addition, it indicates that the X movement amount corresponding to the first movement command with respect to the first holding unit 5_1 in the transfer information 821 is adjusted to "0 (μm)", and the Y movement amount is adjusted to "3 (μm) )".

In addition, regarding the sign of "X adjustment value (μm)" shown in FIG. 10, the case of adjusting to the positive side of the X-axis is set to "+", and the case of adjusting to the negative side of the Y-axis is set to "+". "-". In addition, regarding the sign of "Y adjustment value (μm)" shown in FIG. 10, the case of adjusting to the positive side of the Y-axis is set to "+", and the case of adjusting to the negative side of the Y-axis is set to "-".

The control unit 81 controls the adjustment unit of each holding unit 5 so that the measurement result of the measurement system 100 becomes constant while the first moving unit 4_1 and the second moving unit 4_2 move along the pair of guide rails 3 , to adjust the position of the suction part 55 relative to the moving part 4 . The control unit 81 includes: a measurement processing unit 811 ; a change processing unit 812 ; and a transport processing unit 813 .

The measurement processing unit 811 executes the measurement by the measurement system 100 while moving the first moving unit 4_1 and the second moving unit 4_2 along the pair of guide rails 3 . Thereby, the information of the first moving distance D1, the first interval G1, the third interval G3, and the fourth interval G4 of each point on the first guide rail 3_1 and the information of each point on the second guide rail 3_2 can be obtained. Information on the second moving distance D2 and the second interval G2. The measurement processing performed by the measurement processing unit 811 is performed in a state where the substrate S is not held by the plurality of holding units 5 .

The change processing unit 812 changes the first moving distance D1 stored in the memory unit 82 based on the measurement result of the first moving distance D1 “measured by the measurement system 100 in the measurement process performed by the measurement processing unit 811 ”. Mobile Department Adjustment Information 822. Similarly, the change processing unit 812 is based on the measurement result of the second moving distance D2 “measured by the measurement system 100 in the measurement process performed by the measurement processing unit 811”, and changes are stored in the memory unit 82. Adjustment information 823 of the second mobile unit.

For example, the change processing unit 812 is for each movement command relative to the first movement unit 4_1 (every time the first movement unit 4_1 moves according to the movement command), it is determined that the first movement unit 4_1 moves according to the movement command. Whether the first moving distance D1 deviates from the ideal moving distance. Furthermore, the change processing unit 812 changes the first moving unit adjustment information 822 so that the first moving distance D1 matches the ideal moving distance when it is determined that the first moving distance D1 deviates from the ideal moving distance. The adjustment value that establishes a corresponding relationship with its movement instruction. For example, the first moving distance D1 after the first moving unit 4_1 moves according to the third moving command deviates from the ideal moving distance by −1 μm. In this case, the change processing unit 812 adds 1 μm to the adjustment value of “the third movement command is associated with the first movement unit adjustment information 822 ”.

Furthermore, the change processing unit 812 is based on the measurement results of the first interval G1 to the fourth interval G4 “measured by the measurement system 100 in the measurement processing performed by the measurement processing unit 811”, and changes are stored in the The first holding unit adjustment information 824 to the fourth holding unit adjustment information 827 of the memory unit 82 .

Specifically, the change processing unit 812 determines whether or not the first interval G1 has changed from the first predetermined value for each point on the first guide rail 3_1 . In addition, "each point on the first guide rail 3_1" can be referred to as "every movement command relative to the first moving part 4_1" or "every time the first moving part 4_1 moves according to the movement command". In addition, the so-called first predetermined value refers to the ideal value of the first gap G1 when assuming that the suction part 55 of the first holding part 5_1 and the suction part 55 of the second holding part 5_2 are respectively holding the substrate S by suction and holding the substrate S at predetermined positions. value. Assuming that the pair of guide rails 3_1 are straight without deformation, the first gap G1 is maintained at the first predetermined value from the start point to the end point in the conveyance path of the substrate S.

Here, it is assumed that at a certain point on the first guide rail 3_1, in other words, when the number of times the movement command is output to the first moving unit 4_1 reaches a certain number of times, the first interval G1 changes from the first predetermined value. . In this case, the change processing unit 812 changes the first holding unit adjustment information 824 or the second holding unit adjustment information so that the first distance G1 at the point coincides with the first predetermined value in the next transfer process, for example. 825.

As an example, the change processing unit 812 changes the first holding unit adjustment information 824 . Specifically, the change processing unit 812 changes the Y adjustment value corresponding to the point where the first interval G1 has changed (the number of times the movement command is output) in the first holding unit adjustment information 824 . For example, after the first moving part 4_1 moves according to the second movement command, the first gap G1 changes by "-1 μm" from the first predetermined value. In this case, the change processing unit 812 changes by subtracting 1 μm from the Y adjustment value “4 (μm)” associated with the output count “2” of the movement command in the first storage unit adjustment information 824 . into "3 (μm)". Thereby, when the second movement command is output to the first movement unit 4_1 in the next transfer process, the movement amount contained in the movement command output to the first adjustment unit 51 of the first holding unit 5_1 is changed (by 1 μm or less). ). As a result, the first gap G1 after the first moving unit 4_1 moves according to the second movement command is maintained at the first predetermined value. In addition, the change processing unit 812 may change the Y adjustment value of the second holding unit adjustment information 825 .

In this way, the change processing unit 812, in the measurement process, in the case of "the first distance G1 has changed from the first predetermined value at a point of the first guide rail 3_1", so that in the measurement process In the subsequent conveying process, the movement of the first adjusting part 51 of one of the first holding part 5_1 and the second holding part 5_2 is adjusted so that the first distance G1 of the one point coincides with the first predetermined value. quantity. Thereby, the first interval G1 at the above-mentioned one point can be kept at the first preset value. That is, the relative positions of the first holding part 5_1 and the second holding part 5_2 at the above-mentioned one point can be held.

Also, the change processing unit 812 determines whether or not the second gap G2 has changed from the second predetermined value for each point on the second guide rail 3_2. Also, the so-called second predetermined value refers to the ideal value of the second gap G2 when assuming that the suction part 55 of the third holding part 5_3 and the suction part 55 of the fourth holding part 5_4 are correctly holding the substrate S at predetermined positions. value.

Here, it is assumed that the second gap G2 has changed from the second predetermined value at a certain point on the second guide rail 3_2. In this case, the change processing unit 812 changes the third holding unit adjustment information 826 or the fourth holding unit adjustment information so that the second distance G2 at the point coincides with the second predetermined value in the next transfer process, for example. 827. As an example, the change processing unit 812 changes the third holding unit adjustment information 826 . Specifically, the change processing unit 812 changes the Y adjustment value corresponding to the point where the second interval G2 has changed (the number of times the movement command is output) in the third holding unit adjustment information 826 . In addition, the change processing unit 812 can also change the Y adjustment value of the fourth holding unit adjustment information 827 .

Also, the change processing unit 812 determines whether or not the third distance G3 has changed from the third predetermined value for each point on the first guide rail 3_1. In addition, the so-called third predetermined value refers to the ideal value of the third gap G3 when the suction part 55 of the first holding part 5_1 and the suction part 55 of the third holding part 5_3 respectively suck and hold the substrate S at predetermined positions. value.

Here, it is assumed that the third gap G3 has changed from the third predetermined value at a certain point on the first guide rail 3_1. In this case, the change processing unit 812 changes the first holding unit adjustment information 824 or the third holding unit adjustment information so that the third distance G3 at the point coincides with the third predetermined value in the next transfer process, for example. 826. As an example, the change processing unit 812 changes the first holding unit adjustment information 824 . Specifically, the change processing unit 812 changes the X adjustment value corresponding to the point where the third interval G3 has changed (the number of times the movement command is output) in the first holding unit adjustment information 824 . In addition, the change processing unit 812 can also change the X adjustment value of the third holding unit adjustment information 826 .

For example, after the first moving part 4_1 and the second moving part 4_2 move according to the second moving command, the third gap G3 changes by "-1 μm" from the third predetermined value. In this case, the change processing unit 812 adds the X adjustment value “5 (μm)” corresponding to the output count “2” of the movement command to 1 μm in the first holding unit adjustment information 824 . Changed to "6(μm)". Thereby, when the second movement command is output to the first moving unit 4_1 and the second moving unit 4_2 in the next transfer process, the content of the movement command output to the second adjustment unit 52 of the first holding unit 5_1 is adjusted. amount of movement. As a result, the third gap G3 after the first moving unit 4_1 moves according to the second movement command is held at the third predetermined value. In addition, the change processing unit 812 can also change the X adjustment value of the third holding unit adjustment information 826 .

In this way, the change processing unit 812, in the measurement process, in the case of "the third gap G3 has changed from the third predetermined value at a point of the first guide rail 3_1", so that in the measurement process In the subsequent conveying process, the movement of the second adjusting part 52 of one of the first holding part 5_1 and the third holding part 5_3 is adjusted so that the third distance G3 of the above-mentioned one point coincides with the third predetermined value. quantity. Thereby, the third interval G3 at the above-mentioned one point can be kept at the third preset value. That is, the relative positions of the first holding portion 5_1 and the third holding portion 5_3 at the above-mentioned one point can be held.

Also, the change processing unit 812 determines whether or not the fourth gap G4 has changed from the fourth predetermined value for each point on the first guide rail 3_1. Also, the so-called fourth predetermined value refers to the ideal value of the fourth gap G4 when assuming that the suction portion 55 of the second holding portion 5_2 and the suction portion 55 of the fourth holding portion 5_4 are correctly holding the substrate S at predetermined positions. value.

Here, it is assumed that the fourth gap G4 has changed from the fourth predetermined value at a certain point on the first guide rail 3_1. In this case, the change processing unit 812 changes the second holding unit adjustment information 825 or the fourth holding unit adjustment information so that the fourth distance G4 at the point coincides with the fourth predetermined value in the next transfer process, for example. 827. As an example, the change processing unit 812 changes the second holding unit adjustment information 825 . Specifically, the change processing unit 812 changes the X adjustment value corresponding to the point where the fourth interval G4 has changed (the number of times the movement command is output) in the second holding unit adjustment information 825 . In addition, the change processing unit 812 can also change the X adjustment value of the fourth holding unit adjustment information 827 .

The transfer processing unit 813 controls the first moving unit 4 and the plurality of holding units 5 to transfer the substrate S. Specifically, the transport processing unit 813 moves the first moving unit 4 along the guide rail 3 by outputting a movement command to the first moving unit 4 . Furthermore, the transport processing unit 813 moves the first adjustment unit 51 in the left-right direction (X-axis direction) by outputting movement commands to the first adjustment unit 51 and the second adjustment unit 52 of the holding unit 5, and The second adjustment part 52 is moved in the front-rear direction (Y-axis direction). Furthermore, the conveyance processing unit 813 controls the coating unit 6 to apply the functional liquid to the conveyed substrate S.

The transport processing unit 813 uses the transport information 821 and the first moving unit adjustment information 822 to control the first moving unit 4_1, thereby adjusting the movement amount of the first moving unit 4_1 at each point on the first guide rail 3_1. Specifically, the transport processing unit 813 adjusts the movement amount of the first moving unit 4_1 stored in the transport information 821 using the adjustment value stored in the first moving unit adjustment information 822 . Furthermore, the transport processing unit 813 outputs a movement command including the adjusted movement amount to the first movement unit 4_1.

Moreover, the transport processing unit 813 uses the transport information 821 and the second moving unit adjustment information 823 to control the second moving unit 4_2, thereby adjusting the movement of the second moving unit 4_2 at each point on the second guide rail 3_2 quantity. Specifically, the transport processing unit 813 adjusts the movement amount of the second moving unit 4_2 stored in the transport information 821 using the adjustment value stored in the second moving unit adjustment information 823 . Furthermore, the transport processing unit 813 outputs a movement command including the adjusted movement amount to the second movement unit 4_2.

Moreover, the transport processing unit 813 uses the transport information 821 and the first holding unit adjustment information 824 to control the first adjustment unit 51 of the first holding unit 5_1, thereby adjusting the first position of each point on the first guide rail 3_1. 1 Adjust the movement amount of the part 51. Specifically, the transport processing unit 813 adjusts the movement amount of the first adjustment unit 51 stored in the transport information 821 using the adjustment value stored in the first holding unit adjustment information 824 . Furthermore, the transport processing unit 813 outputs a movement command including the adjusted movement amount to the first adjustment unit 51 of the first holding unit 5_1 . Similarly, the transport processing unit 813 uses the transport information 821 and the first holding unit adjustment information 824 to control the second adjustment unit 52 of the first holding unit 5_1, thereby adjusting the position of each position on the first guide rail 3_1. The amount of movement of the second adjustment unit 52 . Specifically, the transport processing unit 813 adjusts the movement amount of the second adjustment unit 52 stored in the transport information 821 using the adjustment value stored in the first holding unit adjustment information 824 . Furthermore, the transport processing unit 813 outputs a movement command including the adjusted movement amount to the second adjustment unit 52 of the first holding unit 5_1 .

Similarly, the transport processing unit 813 controls the first adjustment unit 51 and the second adjustment unit 52 of the second holding unit 5_2 using the transport information 821 and the second holding unit adjustment information 825 . Furthermore, the transport processing unit 813 controls the first adjustment unit 51 and the second adjustment unit 52 of the third holding unit 5_3 using the transport information 821 and the third holding unit adjustment information 826 . Furthermore, the transport processing unit 813 controls the first adjustment unit 51 and the second adjustment unit 52 of the fourth holding unit 5_4 using the transport information 821 and the fourth holding unit adjustment information 827 .

In this way, the transport processing unit 813 controls the first moving unit 4_1 and the second moving unit 4_2 based on the measurement results measured by the measurement processing while moving the first moving unit 4_1 and the second moving unit 4_2 along the pair of guide rails 3 . The adjustment part 51 and the second adjustment part 52 adjust the position of the adsorption part 55 at each point of a pair of guide rails by this.

<Processing flow of substrate processing equipment> Next, referring to FIG. 11 , procedures of measurement processing and change processing among the processing performed by the substrate processing apparatus 1 according to the embodiment will be described. Fig. 11 is a flowchart showing the procedures of measurement processing and change processing among the processing executed by the substrate processing apparatus 1 according to the embodiment. Each processing shown in FIG. 11 is executed under the control of the control device 8 .

First, in the substrate processing apparatus 1, measurement processing is performed. Specifically, the control unit 81 executes the measurement by the measurement system 100 while moving the moving unit 4 and the holding unit 5 (step S101 ). At this time, the control unit 81 controls the first moving unit 4_1 by using the transfer information 821 and the first moving unit adjustment information 822, thereby moving the first moving unit 4_1. Moreover, the control part 81 controls the 2nd moving part 4_2 using the transfer information 821 and the 2nd moving part adjustment information 823, and moves the 2nd moving part 4_2 by this. Also, the control unit 81 moves the first holding unit 5_1 using the transport information 821 and the first holding unit adjustment information 824 , and moves the second holding unit 5_2 using the transport information 821 and the second holding unit adjustment information 825 . Also, the control unit 81 moves the third holding unit 5_3 using the transport information 821 and the third holding unit adjustment information 826 , and moves the fourth holding unit 5_4 using the transport information 821 and the fourth holding unit adjustment information 827 .

Moreover, the control unit 81 uses the measuring system 100 to measure the first moving distance D1, the second moving distance D2, and the first moving distance D1 every time the moving unit 4 is moved, that is, every time a moving command is output to the moving unit 4. Interval G1 to fourth interval G4.

Next, in the substrate processing apparatus 1, change processing is performed. Specifically, the control unit 81 determines whether the first moving distance D1 or the second moving distance D2 has changed from the ideal moving distance (step S102 ).

In step S102, when it is determined that the first moving distance D1 or the second moving distance D2 has changed from the ideal moving distance (step S102; Yes), the control unit 81 makes the first moving distance D1 or the second moving distance 2. Change the adjustment value of the first moving part 4_1 or the second moving part 4_2 so that the moving distance D2 matches the ideal moving distance (step S103).

In step S102, when the first moving distance D1 or the second moving distance D2 has not changed from the ideal moving distance (step S102; No), the control unit 81 determines whether the first interval G1 or the second interval G2 Whether or not there is a change from the predetermined value (step S104).

In step S104, when it is determined that the first interval G1 or the second interval G2 has changed from the predetermined value (step S104; Yes), the control unit 81 makes the first interval G1 or the second interval G2 and If the predetermined value matches, the Y adjustment value of the first holding unit 5_1 or the Y adjustment value of the third holding unit 5_3 is changed (step S105).

In step S104, when the first interval G1 or the second interval G2 has not changed from the specified value (step S104; No), the control unit 81 determines whether the third interval G3 or the fourth interval G4 has changed from the specified value. The value is changed (step S106).

In step S106, when it is determined that the third interval G3 or the fourth interval G4 has changed from the predetermined value (step S106; Yes), the control unit 81 makes the third interval G3 or the fourth interval G4 and If the predetermined value matches, the X adjustment value of the first holding unit 5_1 or the X adjustment value of the second holding unit 5_2 is changed (step S107).

When the processing of steps S103, S105, and S107 ends, the control unit 81 ends the measurement processing and the change processing.

As mentioned above, the substrate transfer device of the embodiment (as an example, the substrate processing device 1) is equipped with: a pair of guide rails (as an example, the first guide rail 3_1 and the second guide rail 3_2); The moving part (as an example, the first moving part 4_1); the second moving part (as an example, the second moving part 4_2); a plurality of holding parts (as an example, the first holding part 5_1 to the fourth holding part 5_4); a measurement unit (as an example, the measurement system 100); and a control unit (as an example, the control unit 81). The pair of guide rails are arranged in a first direction (for example, X-axis direction) and extend along a second direction (for example, Y-axis direction) perpendicular to the first direction. The first moving part moves along one of the pair of guide rails. The second moving part moves along the other guide rail of the pair of guide rails. A plurality of holding parts are respectively provided on the first moving part and the second moving part, and suck and hold the substrate (as an example, the substrate S) from below the substrate. The distance measuring unit measures the distance between adjacent holding units among the plurality of holding units. The control unit controls the first moving unit, the second moving unit and the plurality of holding units. A plurality of holding parts are provided with: an adsorption part (as an example, the adsorption part 55), which absorbs and holds the substrate; and an adjustment part (as an example, the first adjustment part 51 and the second adjustment part 52), which adjusts the position of the adsorption part. The control part controls the adjusting part to adjust the position of the suction part while the first moving part and the second moving part move along the pair of guide rails so that the measurement result of the distance measuring part becomes fixed. Transport the substrate.

Thereby, even if the pair of guide rails is assumed to be deformed or the degree of deformation of the pair of guide rails changes due to environmental changes, the relative positions of the plurality of holding parts can be kept fixed. Therefore, according to the substrate transfer device of the embodiment, errors in substrate transfer can be reduced.

The control unit can also perform measurement processing and transfer processing. In the measurement process, the measurement by the distance measuring unit is performed while moving the first moving unit and the second moving unit along the pair of guide rails. The conveying process is to control the adjustment unit based on the measurement results measured by the measurement process while the first moving part and the second moving part are moving along the pair of guide rails, thereby adjusting the pair of guide rails. The position of the suction part at each point of the guide rail is carried out while transferring the substrate. Thereby, the relative positions of the plurality of holding parts can be kept fixed.

The adjustment unit may also include: a first adjustment unit (as an example, the first adjustment unit 51), which adjusts the position of the adsorption unit along the first direction; and a second adjustment unit (as an example, the second adjustment unit 52) , adjust the position of the suction part along the second direction. Thereby, the position of the adsorption|suction part 55 can be adjusted along a 1st direction and a 2nd direction.

A plurality of holding parts can also include: the first holding part (as an example, the first holding part 5_1) and the second holding part (as an example, the second holding part 5_2), along the first moving part 2 directions; and the 3rd holding part (as an example, the 3rd holding part 5_3) and the 4th holding part (as an example, the 4th holding part 5_4), are arranged along the 2nd direction on the 2nd moving part. In this case, the control unit may also determine the distance between the first holding unit and the second holding unit at a point on the guide rail during the measurement process, that is, the first interval (for example, the first interval G1 ) has changed from the specified value (as an example, the first specified value)", adjust the first holding unit so that the first interval between one point coincides with the specified value in the transport process after the measurement process and the movement amount of one point of the first adjustment part of one of the second holding parts. Thereby, the distance between the first holding portion and the second holding portion, that is, the first interval can be maintained at a predetermined value while the substrate is being conveyed.

The plurality of holding parts may also include: a first holding part and a second holding part arranged along the second direction on the first moving part; and a third holding part and a fourth holding part arranged on the second moving part Arranged along the second direction. In this case, the control unit may also change the distance between the first holding unit and the third holding unit, that is, the third distance from a predetermined value (as an example, the third interval at a point on the guide rail) during the measurement process. 3 predetermined value) has changed", adjust the first holding unit so that the third interval at one point coincides with the predetermined value (as an example, the third predetermined value) in the transport process after the measurement process And the movement amount of one point of the second adjustment part of one of the third holding parts. Thereby, the distance between the first holding portion and the third holding portion, that is, the third interval can be maintained at a predetermined value while the substrate is being conveyed.

One of the first adjustment part and the second adjustment part may be provided on the other of the first adjustment part and the second adjustment part. Again, the distance measurement unit can also be equipped with: a light projecting unit (as an example, the light projecting unit 110), which projects laser light; a light receiving unit (as an example, the light receiving unit 120), which receives the laser light; and an optical system (as an example) , the optical system 130) is arranged on the optical path of the laser light from the light projecting part to the light receiving part. In this case, the optical system may be provided in one of the first adjustment unit and the second adjustment unit. Thereby, since the height position of an optical system can be brought closer to the height position of a board|substrate, the distance between adjacent holding parts can be measured more accurately.

The interval measuring unit may also include a lift mechanism (as an example, lift mechanism 150 ) for lifting the optical system up and down. Thereby, since the height position of an optical system can be brought closer to the height position of a board|substrate, the distance between adjacent holding parts can be measured more accurately.

The substrate transfer device of the embodiment may also include a moving distance measuring unit (measurement system 100 as an example) for measuring the moving distances along the second direction of the first moving unit and the second moving unit, respectively. Thereby, the actual moving distances of the first moving part and the second moving part can be grasped.

The moving distance measuring part can also be "received laser light reflected from the first moving part or a member that moves together with the first moving part that is located below the first adjusting part and the second adjusting part" , to measure the moving distance of the first moving part. In addition, the moving distance measuring part can also be obtained by "receiving laser light reflected from the second moving part or a member that moves together with the second moving part, which is located below the first adjusting part and the second adjusting part." In this way, the moving distance of the second moving part is measured. Thereby, for example, when the guide rail is deformed in the vertical direction (Z-axis direction), the influence of the deformation on the measurement accuracy can be suppressed to be small.

In the above-mentioned embodiment, although the example in which the substrate processing apparatus 1 is provided with the coating section 6 and the coating section 6 draws the substrate S by inkjet method is described, the processing of the substrate S is not limited to this. . For example, this disclosure can also be applied in the case of performing various processing such as "modifying the surface of the substrate S or removing a film on the surface by performing a treatment of irradiating the substrate S with light or a treatment of discharging a removal solution". Technology.

In addition, it should be considered that the embodiment disclosed this time is an illustration and not a limitation in any respect. In fact, the above-mentioned embodiments can be realized in various forms. In addition, the above-mentioned embodiments can also be omitted, substituted, and changed in various forms without departing from the scope of the appended claims and their meaning.

1: Substrate processing device 2: Floating platform 3_1: The first guide rail 3_2: The second guide rail 4_1: The first mobile department 4_2: The second mobile department 5_1: The first holding part 5_2: The second holding part 5_3: The third holding part 5_4: The 4th holding part 6: Coating department 8: Control device 50: Basal part 51: The first adjustment department 52: The 2nd adjustment department 53: Rotating part 54: arm 55: Adsorption part 81: Control Department 82: memory department 100: Determination system 110: Projector 120: Light receiving part 130: Optical system

[FIG. 1] FIG. 1 is a schematic plan view showing part of a substrate processing apparatus according to an embodiment. [ Fig. 2 ] Fig. 2 is a schematic plan view of a holding portion of the embodiment. [ Fig. 3 ] Fig. 3 is a schematic side view of a holding portion of the embodiment. [FIG. 4] FIG. 4 is a schematic diagram showing a situation in which "when the guide rail of the embodiment is deformed in the left-right direction, the relative positions of the plurality of holding parts are shifted". [ Fig. 5 ] Fig. 5 is a schematic diagram showing a state of "when the guide rail of the embodiment is deformed in the vertical direction, the relative positions of the plurality of holding parts are shifted". [ Fig. 6] Fig. 6 is a schematic diagram showing the configuration of a measurement system according to an embodiment. [FIG. 7] FIG. 7 is a schematic diagram for explaining the installation position of the optical system of the embodiment. [Fig. 8] Fig. 8 is a block diagram showing the configuration of the control device according to the embodiment. [FIG. 9] FIG. 9 is a diagram showing an example of the first moving part adjustment information according to the embodiment. [FIG. 10] FIG. 10 is a diagram showing an example of adjustment information of the first holding part according to the embodiment. [FIG. 11] FIG. 11 is a flowchart showing the procedures of measurement processing and change processing among the processing performed by the substrate processing apparatus according to the embodiment.

1: Substrate processing device

2: Floating platform

3_1(3): The first guide rail

3_2(3): The second guide rail

4_1(4): 1st Mobile Division

4_2(4): The second mobile unit

5_1(5): the first holding part

5_2(5): the second holding part

5_3(5): the third holding part

5_4(5): The 4th holding part

6: Coating Department

7:Maintenance department

8: Control device

9: track

81: Control Department

82: memory department

Claims (12)

A substrate conveying device is characterized in that it has: a pair of guide rails arranged in a first direction and extending along a second direction perpendicular to the first direction; The first moving part moves along the guide rail of one of the pair of guide rails; The second moving part moves along the other guide rail of the pair of guide rails; A plurality of holding parts are respectively arranged on the first moving part and the second moving part, and absorb and hold the substrate from below the substrate; an interval measuring unit for measuring the distance between adjacent ones of the plurality of holding units; and a control unit that controls the first moving unit, the second moving unit, and the plurality of holding units, The above-mentioned plurality of holding parts are equipped with: an adsorption unit for adsorbing and holding the aforementioned substrate; and The adjustment part adjusts the position of the aforementioned adsorption part, The control unit controls the adjustment unit while the first moving unit and the second moving unit move along the pair of guide rails so that the measurement result of the distance measuring unit becomes constant. The position of the above-mentioned suction part is while conveying the above-mentioned substrate. The substrate transfer device according to claim 1, wherein, The aforementioned control department is responsible for: a measurement process of performing measurement by the interval measuring unit while moving the first moving unit and the second moving unit along the pair of guide rails; and In the conveyance process, while the first moving part and the second moving part are moving along the pair of guide rails, the adjustment part is controlled based on the measurement result measured by the measurement process, whereby, The conveyance of the substrate is performed while adjusting the position of the suction portion at each point of the pair of guide rails. The substrate transfer device according to claim 2, wherein, The aforementioned adjustment department is equipped with: a first adjustment part that adjusts the position of the adsorption part along the first direction; and The second adjustment unit adjusts the position of the adsorption unit along the second direction. The substrate transfer device according to claim 3, wherein, The above-mentioned plurality of holding parts include: the first holding portion and the second holding portion are arranged along the second direction on the first moving portion; and The third holding part and the fourth holding part are arranged along the second direction on the second moving part, In the above-mentioned measurement process, the control unit is in the case where “at one point of the guide rail, the distance between the first holding unit and the second holding unit, that is, the first interval, has changed from a predetermined value”. The first adjustment of one of the first holding part and the second holding part is adjusted in such a manner that the first interval at the one point coincides with the predetermined value in the transfer process after the measurement process. The amount of movement of the aforementioned location. The substrate transfer device according to claim 3, wherein, The above-mentioned plurality of holding parts include: the first holding portion and the second holding portion are arranged along the second direction on the first moving portion; and The third holding part and the fourth holding part are arranged along the second direction on the second moving part, The control unit is in the case of “the distance between the first holding unit and the third holding unit, that is, the third interval, changes from a predetermined value at one point of the guide rail” during the measurement process. The second adjustment of one of the first holding part and the third holding part is adjusted so that the third interval at the one point coincides with the predetermined value in the transfer process after the measurement process. The amount of movement of the aforementioned location. The substrate transfer device according to any one of claims 3 to 5, wherein, One of the first adjustment part and the second adjustment part is provided on the other of the first adjustment part and the second adjustment part, The above-mentioned interval measurement department is equipped with: The light projecting part projects laser light; a light receiving unit for receiving the aforementioned laser light; and an optical system arranged on an optical path of the laser light from the light projecting part to the light receiving part, The said optical system is provided in the said one of the said 1st adjustment part and the said 2nd adjustment part. The substrate transfer device according to claim 6, wherein, The above-mentioned interval measurement department is equipped with: The lifting mechanism makes the aforementioned optical system go up and down. The substrate transfer device according to any one of Claims 3 to 6, wherein: The moving distance measuring unit measures moving distances along the second direction of the first moving unit and the second moving unit, respectively. The substrate transfer device according to claim 8, wherein, The aforementioned moving distance measuring unit is configured by “receiving laser light reflected from a position lower than the aforementioned first adjusting unit and the aforementioned second adjusting unit among the aforementioned first moving unit or members that move together with the aforementioned first moving unit. ", measuring the moving distance of the first moving part, and by "receiving the moving distance from the second moving part or a member that moves together with the second moving part that is located at a distance greater than that of the first adjusting part and the second adjusting part." Measure the moving distance of the second moving part by means of the laser light reflected from the lower part. A coating processing device is characterized in that it has: The substrate transfer device according to any one of claims 1 to 9; and The coating unit applies a functional liquid to the substrate conveyed by the substrate conveying device. A substrate conveying method, which is a substrate conveying method in a substrate conveying device, the substrate conveying device is provided with: a pair of guide rails arranged in a first direction and along a second direction perpendicular to the first direction Extension; the first moving part moves along the aforementioned guide rail of one of the aforementioned pair of guiding rails; the second moving part moves along the aforementioned guiding rail of the other side of the aforementioned pair of guiding rails; plural a holding part, which is respectively provided on the first moving part and the second moving part, and absorbs and holds the substrate from below the substrate; The aforementioned plurality of holding parts are equipped with: an adsorption part for adsorbing and holding the aforementioned substrate; and an adjustment part for adjusting the position of the aforementioned adsorption part. The method for transferring the substrate is characterized in that it includes: The process of "executing the measurement by the distance measuring unit while moving the first moving part and the second moving part along the pair of guide rails"; and "While the first moving part and the second moving part are moving along the pair of guide rails, the adjustment part is controlled based on the measurement results obtained through the process of performing the measurement, thereby, while The process of "transporting the substrate" is carried out while adjusting the position of the aforementioned suction portion at each point of the aforementioned pair of guide rails. A substrate transfer program, which is characterized in that it causes a computer to execute the substrate transfer method as in claim 11.

Images