TW202212985A - Drawing system - Google Patents

Abstract

A first mark drawing unit draws a first alignment mark on a lower main surface of a substrate 9 held by a first stage 21a. A second mark drawing unit draws the second alignment mark on a lower main surface of a substrate 9 held by a second stage 21b. The appearance of the second alignment mark is different from that of the first alignment mark. Therefore, a transport mechanism used when drawing a pattern on one main surface of the substrate 9 can be easily identified by observing the alignment mark drawn on the other main surface of the substrate 9. As a result, a pattern can be drawn on the other main surface of the substrate 9 after adjusting the drawing position in consideration of the front-back positional relationship unique to the transport mechanism used at the time of pattern drawing. As a result, the relative positional accuracy of the patterns drawn on the main surfaces on both sides of the substrate 9 can be improved.

Description

delineation system

The present invention relates to a drawing system for drawing a substrate. [Reference to related applications] This application claims the right of priority based on Japanese Patent Application JP2020-158775 filed on September 23, 2020, and the entire disclosure of Japanese Patent Application JP2020-158775 is incorporated herein by reference.

Conventionally, patterning (hereinafter referred to as "substrate") is performed by irradiating light to a photosensitive material formed on a semiconductor substrate, a printed substrate, an organic EL (electroluminescence) display device, or a glass substrate for a liquid crystal display device (hereinafter referred to as "substrate"). pattern) description. In addition, there are cases where the pattern is drawn on both sides of the substrate. In this case, in order to align the pattern drawing positions on both sides of the substrate, an alignment mark is formed on the back surface of the substrate when the pattern is drawn on the front surface of the substrate.

In the drawing apparatus of Japanese Patent Laid-Open No. 2016-48273 (Document 1), an alignment mark forming light source is built in a drawing table on which a substrate is placed, and the alignment mark forming light source is provided on the upper surface of the drawing table from the alignment mark forming light source. Alignment marks are formed by irradiating light to the back surface of the substrate through the through holes. Then, when the substrate is turned over and a pattern is drawn on the back surface of the substrate, an alignment process is performed using the alignment marks, whereby the positional alignment of the pattern drawing positions on both sides of the substrate is performed.

In recent years, a technique has been proposed: in order to increase the throughput of the drawing device, two stages are installed in one drawing device, and when drawing the substrate on one stage, the other stage is drawn. Alignment processing, etc. on the substrate. In the case of drawing patterns on both sides of the substrate in such a twin stage type drawing device, the pattern drawing toward the substrate surface and the pattern drawing toward the backside of the substrate are performed on the same stage. In other cases, there will also be situations where it will be performed on a different stage.

On the other hand, the relationship between the position of the alignment mark formed on the back surface of the substrate and the position of the pattern drawn on the substrate surface differs for each stage (and the stage moving mechanism). Therefore, in the case where the pattern drawing on the substrate surface and the substrate back surface is performed on different stages, when performing the same alignment process as in the case where the pattern drawing on the substrate surface and the substrate back surface is performed on the same stage, there will be The relative position between the pattern drawn on the substrate surface and the pattern drawn on the backside of the substrate may be shifted.

The present invention focuses on a drawing system for drawing a board, and aims to improve the relative positional accuracy of the pattern drawn on the main surfaces on both sides of the board.

A drawing system according to a preferred aspect of the present invention includes: a pattern drawing unit that irradiates light on the main surface of the upper side of the substrate that is horizontally moving downward to draw a pattern; and a first conveying mechanism that includes a first substrate holding unit and a first moving mechanism, wherein the first moving mechanism horizontally moves the first substrate holding portion below the pattern drawing portion; The main surface of the device is irradiated with light, and a first alignment mark assigned to the first conveying mechanism is drawn; the second conveying mechanism is provided with a second substrate holder and a second moving mechanism, and the second moving mechanism is connected to the The second substrate holding part is horizontally moved below the pattern drawing part; and the second mark drawing part irradiates light to the main surface of the lower side of the substrate held by the second substrate holding part, and draws the appearance and the first The alignment marks are different and assigned second alignment marks associated with the aforementioned second handling mechanism.

According to the above-described drawing system, the relative positional accuracy of the patterns drawn on the main surfaces on both sides of the substrate can be improved.

Preferably, the drawing system further includes: a memory unit that stores first positional relationship information and second positional relationship information in advance, and the first positional relationship information is displayed by the pattern drawing unit until it is drawn by the first conveyance. The relativity between the pattern on the main surface of the upper side of the substrate conveyed by the mechanism and the first alignment mark drawn by the first mark drawing portion to the main surface of the lower side of the substrate conveyed by the first conveying mechanism The positional relationship, and the second positional relationship information indicates that the pattern drawn by the pattern drawing unit to the main surface of the upper side of the substrate conveyed by the second conveyance mechanism and the pattern drawn by the second mark drawing unit to the second The relative positional relationship between the second alignment marks on the lower main surface of the substrate conveyed by the conveyance mechanism; and a drawing control unit that controls the pattern drawing unit. The drawing control unit adjusts the drawing position based on the first positional relationship information when the pattern drawing unit draws a pattern on the main surface on which the first alignment mark is drawn; the drawing control unit is connected to the pattern drawing unit When the pattern is drawn on the main surface on which the second alignment mark is drawn, the drawing position is adjusted based on the second positional relationship information.

Preferably, the first mark drawing portion includes a first mask portion that allows a part of light from the light source to pass therethrough, and the second mark drawing portion includes a second mask portion that has a The different openings of the first shield portion are used to allow a part of the light from the light source to pass through.

Preferably, the first alignment mark and the second alignment mark have non-similar shapes.

Preferably, the first alignment mark is a bar-code used to display information related to the first transport mechanism; the second alignment mark is used to display information related to the second transport mechanism the barcode.

Preferably, the pattern drawing unit includes: a drawing head that irradiates light downward; and a drawing head moving mechanism that moves the drawing head to a first drawing position above the first conveying mechanism and the second conveying mechanism to move between the second drawing positions above.

The above object and other objects, features, aspects, and advantages will become more apparent from the following detailed description of the present invention with reference to the accompanying drawings.

FIG. 1 is a perspective view showing a drawing apparatus 1 according to one embodiment of the present invention. The drawing apparatus 1 is a two-stage direct drawing system that irradiates spatially modulated beam-shaped light rays to the photosensitive material on the substrate 9, and scans the irradiated area of the light rays on the substrate 9, thereby performing Depiction of the pattern. In FIG. 1 , three directions orthogonal to each other are shown by arrows as the X direction, the Y direction, and the Z direction. In the example shown in FIG. 1 , the X direction and the Y direction are horizontal directions perpendicular to each other, and the Z direction is the vertical direction. The same applies to other drawings. In addition, the Z direction system may be consistent with the direction of gravity, or may not be consistent with the direction of gravity.

The substrate 9 is, for example, a plate-like member having a substantially rectangular shape in plan view. The substrate 9 is, for example, a printed circuit board. On the main surfaces on the (+Z) side and the (−Z) side of the substrate 9 , a resist film formed of a photosensitive material is provided on the copper layer. In the drawing apparatus 1 , a circuit pattern is drawn (that is, formed) on the resist film of the substrate 9 . In the following description, one main surface of the substrate 9 is also referred to as a "first main surface 91", and the other main surface of the substrate 9 is referred to as a "second main surface 92". In addition, the type, shape, and the like of the substrate 9 may be changed to various types, shapes, and the like.

The drawing device 1 includes a first conveyance mechanism 2 a , a second conveyance mechanism 2 b , an imaging unit 3 , a pattern drawing unit 4 , a frame 7 , and a control unit 10 . The control unit 10 controls the first conveyance mechanism 2 a , the second conveyance mechanism 2 b , the imaging unit 3 , and the pattern drawing unit 4 .

The frame 7 is a main body base portion on which the respective components of the drawing apparatus 1 are attached. The frame 7 includes: a substantially cube-shaped base 71 ; The second elevated portion 73 is closely arranged on the (+Y) side of the first elevated portion 72 . In the following description, the first elevated portion 72 and the second elevated portion 73 are also collectively referred to as the “overhead portion 74 ”. The first conveyance mechanism 2a and the second conveyance mechanism 2b are attached to the base 71 . The first elevated portion 72 supports the imaging unit 3 . The second elevated portion 73 supports the pattern drawing portion 4 . The frame 7 is placed on a stand (not shown).

The first conveyance mechanism 2a and the second conveyance mechanism 2b are mechanisms for holding and moving the substrate 9 below the imaging unit 3 and the pattern drawing unit 4 (that is, on the (-Z) side), respectively. The 2nd conveyance mechanism 2b is arrange|positioned adjacent to the (+X) side of the 1st conveyance mechanism 2a. The first conveyance mechanism 2a and the second conveyance mechanism 2b have substantially the same structure. In the example shown in FIG. 1, the board|substrate 9 is hold|maintained by the 1st conveyance mechanism 2a and the 2nd conveyance mechanism 2b with the 1st main surface 91 facing the upper side (that is, (+Z) side).

The first conveyance mechanism 2a includes a first stage 21a and a first moving mechanism 22a. The first stage 21a is a substantially flat-shaped first board holding portion for holding the board 9 in a substantially horizontal state from below. The first stage 21 a is, for example, a vacuum chuck, and is used for sucking and holding the lower surface of the substrate 9 . The first stage 21a may have a structure other than a vacuum jig. The upper main surface (ie, the first main surface 91 ) of the substrate 9 placed on the first stage 21 a is slightly perpendicular to the Z direction (ie, the up-down direction), and is slightly parallel to the X and Y directions.

The first moving mechanism 22a is a first table moving mechanism, and is used to face the first table 21a in a slightly horizontal direction (that is, a direction slightly parallel to the main surface of the upper side of the substrate 9) with respect to the imaging unit 3 and the pattern drawing unit 4 move sexually. The 1st moving mechanism 22a linearly moves the 1st stage 21a supported by the guide rail 221a below the imaging part 3 and the pattern drawing part 4 in the Y direction along the guide rail 221a. Thereby, the substrate 9 held by the first stage 21a is moved in the Y direction. In the following description, the Y direction is also referred to as the "substrate moving direction". The drive source of the first moving mechanism 22a is, for example, a linear servo motor or a drive source in which a motor is attached to a ball screw. The structure of the 1st moving mechanism 22a can also be changed into various structures.

The second conveyance mechanism 2b includes a second table 21b and a second moving mechanism 22b. The second stage 21b is a substantially flat second board holding portion for holding the board 9 in a substantially horizontal state from below. The second table 21b is arranged adjacent to the side (that is, (+X side)) of the first table 21a. The upper surface of the second stage 21b is located at the same height as the upper surface of the first stage 21a in the up-down direction (ie, the Z direction). The second stage 21 b is, for example, a vacuum jig for sucking and holding the lower surface of the substrate 9 . The second stage 21b may have a structure other than the vacuum jig. The main surface on the upper side of the substrate 9 placed on the second stage 21b (ie, the first main surface 91 ) is substantially perpendicular to the Z direction, and is substantially parallel to the X and Y directions. The main surface on the upper side of the substrate 9 held on the second stage 21b is located at approximately the same height in the vertical direction (that is, a little in the Z direction) as the main surface on the upper side of the substrate 9 held on the first table 21a. same location).

The second moving mechanism 22b is a second table moving mechanism for facing the second table 21b with respect to the imaging unit 3 and the pattern drawing unit 4 in a substantially horizontal direction (that is, a direction substantially parallel to the main surface of the upper side of the substrate 9). move sexually. The second moving mechanism 22b linearly moves the second stage 21b supported on the guide rail 221b in the Y direction (ie, the substrate moving direction) below the imaging unit 3 and the pattern drawing unit 4 along the guide rail 221b. Thereby, the board|substrate 9 hold|maintained by the 2nd stage 21b moves to a Y direction. The moving direction of the second table 21b by the second moving mechanism 22b is slightly parallel to the moving direction of the first table 21a by the first moving mechanism 22a. The drive source of the second moving mechanism 22b is, for example, a linear servo motor or a drive source in which a motor is attached to a ball screw. The structure of the 2nd moving mechanism 22b can also be changed into various structures.

The first moving mechanism 22a and the second moving mechanism 22b are arranged in a row in a direction intersecting with the substrate moving direction (that is, the Y direction). In the example shown in FIG. 1 , the first moving mechanism 22a and the second moving mechanism 22b are arranged side by side in the X direction, and the second moving mechanism 22b is adjacent to the (+X) side of the first moving mechanism 22a. . The first moving mechanism 22a and the second moving mechanism 22b are located at approximately the same height in the vertical direction.

The first moving mechanism 22a and the second moving mechanism 22b are supported from below by the base 71 of the frame 7 . The first moving mechanism 22 a and the second moving mechanism 22 b extend from the (+Y) side toward the (−Y) side from the second elevated portion 73 , and pass through the pattern drawing portion 4 supported by the second elevated portion 73 . The lower part and the lower part of the imaging unit 3 supported by the first elevated part 72 protrude toward the (-)Y side from the first elevated part 72 . The first elevated portion 72 is located in the Y direction at approximately the same position as the central portion of the first movement mechanism 22a and the second movement mechanism 22b in the Y direction. In other words, the elevated portion 74 extends in the (+Y) direction from above the central portion in the Y direction of the first moving mechanism 22a and the second moving mechanism 22b.

In the drawing apparatus 1, the board|substrate 9 is carried in and carried out to the 1st stage 21a in the state which located the 1st stage 21a on the (-Y) side rather than the 1st elevated part 72. As shown in FIG. In addition, the board|substrate 9 is carried in and carried out to the 2nd stage 21b in the state which located the 2nd stage 21b in the (-Y) side rather than the 1st elevated part 72.

As described above, the first elevated portion 72 and the second elevated portion 73 are provided over the first conveyance mechanism 2a and the second conveyance mechanism 2b. The first elevated portion 72 includes two strut portions extending in the Z direction on both sides of the first conveyance mechanism 2a and the second conveyance mechanism 2b in the X direction, and a beam portion connecting upper ends of the two strut portions. department. The beam portion extends in the X direction above the first conveyance mechanism 2a and the second conveyance mechanism 2b. The two strut portions of the first elevated portion 72 are connected to the base 71 at the ends on the (-Z) side. The second elevated portion 73 includes: two strut portions extending in the Z direction at both sides in the X direction of the first conveyance mechanism 2a and the second conveyance mechanism 2b; and a beam portion connecting the upper ends of the two strut portions department. The beam portion extends in the X direction above the first conveyance mechanism 2a and the second conveyance mechanism 2b. The two strut portions of the second elevated portion 73 are connected to the base 71 at the ends on the (-Z) side.

The imaging unit 3 includes an imaging head moving mechanism 32 and a plurality of (two in the example shown in FIG. 1 ) imaging heads 31 . The plurality of imaging heads 31 are arranged in the X direction and are movably attached to the beam portion of the first elevated portion 72 . The imaging head moving mechanism 32 is attached to the beam portion, and moves the plurality of imaging heads 31 in the X direction along the beam portion. The drive source of the imaging head moving mechanism 32 is, for example, a linear servo motor or a drive source in which a motor is attached to a ball screw. In the example shown in FIG. 1, the interval system in the X direction of the two imaging heads 31 can be changed. In addition, in the imaging unit 3, the number of the imaging heads 31 may be one, or three or more.

Each imaging head 31 is a camera, and includes an imaging sensor and an optical system not shown in the drawings. Each imaging head 31 is, for example, an area camera, and acquires, for example, two-dimensional images. The imaging sensor includes, for example, a plurality of CCDs (Charge Coupled Device; Charge Coupled Device) arranged in a matrix. In each imaging head 31 , the reflected light of the illumination light guided from the light source (not shown) to the main surface on the upper side of the substrate 9 is guided to the imaging sensor via the optical system. The imaging sensor receives reflected light from the main surface on the upper side of the substrate 9, and acquires an image of a substantially rectangular imaging area. As the above-mentioned light source, various light sources such as LED (Light Emitting Diode) can be used. In addition, each of the photographing heads 31 may also be other types of cameras, such as a line camera.

In the drawing apparatus 1, by the imaging head moving mechanism 32, the plurality of imaging heads 31 are moved between a first imaging position above the first conveyance mechanism 2a and a second imaging position above the second conveyance mechanism 2b. In FIG. 1 , the plurality of photographing heads 31 are located at the first photographing position. The plurality of imaging heads 31 are in the first imaging position to image the main surface of the upper side of the substrate 9 on the first stage 21a. In addition, the plurality of imaging heads 31 are in the second imaging position imaging the main surface of the upper side of the substrate 9 on the second stage 21b.

The pattern drawing unit 4 includes a drawing head moving mechanism 42 and a plurality of (six in the example shown in FIG. 1 ) drawing heads 41 . The plurality of drawing heads 41 are arranged in the X direction and are movably attached to the beam portion of the second elevated portion 73 . The drawing head moving mechanism 42 is attached to the beam portion, and integrally moves the plurality of imaging heads 41 in the X direction along the beam portion. The drive source of the imaging head moving mechanism 42 is, for example, a linear servo motor or a drive source in which a motor is attached to a ball screw. In addition, in the pattern drawing part 4, the number of the imaging heads 41 may be one, or may be plural.

Each of the drawing heads 41 includes a light source, an optical system, and a spatial light modulation element (not shown). As the spatial light modulation element, DMD (Digital Micro Mirror Device) or GLV (Grating Light Valve) can be used (Silicon Light Machines (Sunnyvale, California) ) registered trademark) and other components. As the light source, various light sources such as LD (Laser Diode) can be used. The plurality of drawing heads 41 have substantially the same structure.

In the drawing apparatus 1, the drawing head moving mechanism 42 moves a plurality of drawing heads 41 between a first drawing position above the first conveyance mechanism 2a and a second drawing position above the second conveyance mechanism 2b. In FIG. 1, the plurality of drawing heads 41 are located at the second drawing position. The plurality of drawing heads 41 draw patterns on the main surface of the upper side of the substrate 9 on the first stage 21a in the first drawing position. In addition, the plurality of drawing heads 41 draw patterns on the main surface of the upper side of the substrate 9 on the second stage 21b in the second drawing position.

The first drawing position and the second drawing position are located at approximately the same positions in the Y direction as the central portions of the first movement mechanism 22a and the second movement mechanism 22b in the Y direction. Moreover, the said 1st imaging position and the 2nd imaging position are also located in the Y direction at the substantially same position as the center part in the Y direction of the 1st moving mechanism 22a and the 2nd moving mechanism 22b. In other words, the plurality of drawing heads 41 of the pattern drawing unit 4 and the plurality of imaging heads 31 of the imaging unit 3 are located in the Y direction at approximately the same central portion in the Y direction of the first moving mechanism 22a and the second moving mechanism 22b. Location.

When a pattern is drawn in the first drawing position, modulated (ie, spatially modulated) light is irradiated from the plurality of drawing heads 41 of the pattern drawing unit 4 toward the substrate 9 on the first stage 21 a below. Then, in parallel with the irradiation of the light, the substrate 9 is horizontally moved in the Y direction (ie, the substrate moving direction) by the first moving mechanism 22a. Thereby, the irradiation area of the light rays from the plurality of drawing heads 41 is scanned in the Y direction on the substrate 9 , and a pattern (for example, a circuit pattern) is drawn on the substrate 9 . The first moving mechanism 22 a is a scanning mechanism, and moves the irradiation area of the light beam from each scanning head 41 on the substrate 9 in the Y direction.

In the example shown in FIG. 1, the drawing with respect to the substrate 9 is performed in a single pass (one pass). Specifically, the first stage 21a is relatively moved in the Y direction with respect to the plurality of drawing heads 41 by the first moving mechanism 22a, and the irradiation area of the light rays from the plurality of drawing heads 41 is on the upper main surface of the substrate 9 Scan only once in the Y direction. Thereby, scanning of the substrate 9 is completed. In addition, in the drawing apparatus 1, a multi-pass method of repeatedly performing the movement of the first stage 21a in the Y direction and the step shift of the first stage 21a in the X direction may be used for the substrates. 9 to draw. The drawing of the pattern in the second drawing position is the same as the drawing of the pattern in the first drawing position, except that the first table 21a and the first moving mechanism 22a are changed to the second table 21b and the second moving mechanism 22b. .

FIG. 2 is an enlarged plan view showing the ends on the (-Y) side of the first stage 21a and the second stage 21b. In FIG. 2, the board|substrate 9 on the 1st stage 21a and the 2nd stage 21b is drawn by the two-dot chain line. As shown in FIG. 2 , the drawing device 1 further includes a first marker drawing unit 51 and a second marker drawing unit 52 . The 1st mark drawing part 51 is arrange|positioned inside the 1st stage 21a (namely, between the upper surface and the lower surface of the 1st stage 21a). The first mark drawing unit 51 irradiates light to the main surface on the lower side of the substrate 9 held on the first stage 21 a so as to cover the upper side of the first mark drawing unit 51 , and draws the light to be associated with the first conveyance mechanism 2 a of the first alignment mark.

The first marker drawing unit 51 includes a plurality of first markers 511 . The plurality of first marks 511 are arranged in the X direction in the vicinity of the end edge on the (-Y) side of the first stage 21a. In the example shown in FIG. 2 , by the first mark 511 closest to the (-X) side and the first mark 511 closest to the (+X) side among the plurality of first marks 511, under the substrate 9 On the main surface of the side, the first alignment marks are drawn on the corners of the (-X) side and the (-Y) side and the corners of the (+X) side and the (-Y) side. In addition, for the substrate 9 whose size in the X direction is smaller than that in the example shown in FIG. The first marks 511 below the corners of the sides have two first alignment marks drawn on the main surface of the lower side of the substrate 9 .

FIG. 3 is a longitudinal cross-sectional view showing a first marker 511 and the vicinity of the first marker 511 . The above-mentioned plural first marks 511 have substantially the same structure. The first marker 511 is accommodated in a substantially cylindrical recessed portion 211a provided on the upper surface of the first table 21a. The upper end opening of the concave portion 211a may be closed by a substantially flat cover member having translucency.

As shown in FIG. 3 , the first marker 511 includes a first light source 512 , a first optical system 513 , and a first aperture 514 . The first light source 512 is disposed at the bottom of the concave portion 211a and emits light in the (+Z) direction. As the first light source 512, for example, an LED or the like for emitting ultraviolet light is used. The first optical system 513 is disposed on the (+Z) side of the first light source 512 , and guides the light from the first light source 512 toward the main surface of the lower side of the substrate 9 . The first optical system 513 includes a plurality of lenses (not shown) arranged in the Z direction. The first aperture 514 is disposed between the plurality of lenses of the first optical system 513 , and is a first shield portion for allowing only a part of the light from the first light source 512 to pass therethrough. The first aperture 514 is a substantially flat member, and is provided with an opening corresponding to the above-mentioned first alignment mark. The first aperture 514 is formed of metal such as stainless steel.

The 2nd mark drawing part 52 shown in FIG. 2 is arrange|positioned inside the 2nd stage 21b (namely, between the upper surface and the lower surface of the 2nd stage 21b). The second mark drawing unit 52 irradiates light to the main surface of the lower side of the substrate 9 held on the second table 21b so as to cover the upper side of the second mark drawing unit 52, and the drawing is assigned to the second conveyance mechanism 2b. of the second alignment mark. As will be described later, the appearance of the second alignment mark is different from that of the first alignment mark.

Like the first marker drawing unit 51 , the second marker drawing unit 52 includes a plurality of second markers 521 . The plurality of second markers 521 are arranged in the X direction in the vicinity of the end edge on the (-Y) side of the second stage 21b. In the example shown in FIG. 2 , by the second mark 521 closest to the (-X) side and the second mark 521 closest to the (+X) side among the plurality of second marks 521, under the substrate 9 On the main surface of the side, second alignment marks are drawn on the corners of the (-X) side and the (-Y) side and the corners of the (+X) side and the (-Y) side. In addition, for the substrate 9 whose size in the X direction is smaller than that of the example shown in FIG. The second marks 521 below the corners of the sides have two second alignment marks drawn on the main surface of the lower side of the substrate 9 .

FIG. 4 is a longitudinal cross-sectional view showing a second marker 521 and the vicinity of the second marker 521 . The above-mentioned plurality of second marks 521 have substantially the same structure. The second marker 521 is accommodated in a substantially cylindrical recess 211b provided on the upper surface of the second table 21b. The upper end opening of the concave portion 211b may be closed by a substantially flat cover member having translucency.

As shown in FIG. 4 , the second marker 521 has substantially the same structure as the first marker 511 . The second marker 521 includes a second light source 522 , a second optical system 523 and a second aperture 524 . The second light source 522 is disposed at the bottom of the concave portion 211b and emits light in the (+Z) direction. As the second light source 522, for example, an LED or the like for emitting ultraviolet light is used. The second optical system 523 is disposed on the (+Z) side of the second light source 522 , and guides the light from the second light source 522 toward the main surface of the lower side of the substrate 9 . The second optical system 523 includes a plurality of lenses (not shown) arranged in the Z direction. The second aperture 524 is disposed between the plurality of lenses of the second optical system 523 , and is a second shield portion for allowing only a part of the light from the second light source 522 to pass therethrough. The second aperture 524 is a substantially plate-shaped member, and is provided with an opening corresponding to the above-described second alignment mark. The second aperture 524 is formed of metal such as stainless steel. As mentioned above, the appearance of the second alignment mark is different from the appearance of the first alignment mark. Therefore, the second aperture 524 has a different opening than the first aperture 514 . In other words, the second aperture 524 is different from the first aperture 514 in at least one or more of the number, shape, size, arrangement, and direction of the openings.

FIG. 5 is a bottom view showing the first alignment mark 93 depicted on the main surface of the lower side of the substrate 9 by the first mark 511 . FIG. 6 is a bottom view showing that the second alignment mark 94 is depicted on the main surface of the lower side of the substrate 9 by the second mark 521 . As described above, the appearance of the first alignment mark 93 is different from that of the second alignment mark 94 .

In the example shown in FIG. 5 , the first alignment mark 93 includes four first mark elements 931 , and the four first mark elements 931 are circular shapes of the same size. The four first marker elements 931 are located at the four vertices of an imaginary square. In other words, the four first marker elements 931 are arranged in the X direction and the Y direction in a lattice shape. In other words, in the first alignment mark 93, the other two first mark elements 931 are arranged on the (+Y) side of the two first mark elements 931 arranged in the X direction, and the other two first mark elements 931 is located at approximately the same position in the X direction as the two first marker elements 931 . The distance between each two first marker elements 931 adjacent to the X direction is substantially the same as the distance between each two first marker elements 931 adjacent to the Y direction.

In the example of FIG. 6 , the second alignment mark 94 has four second mark elements 941, and the four second mark elements 941 are circular shapes of the same size. The shape and size of each second marker element 941 are the same as those of the first marker element 931 described above. The second alignment mark 94 has the following appearance: the first alignment mark 93 is rotated about 45° with the rotation axis facing the Z direction as the center. Specifically, in the second alignment mark 94, one second marker element 941 is arranged on the closest (-X) side, and another second marker element 941 is arranged on the closest (+X) side. The two second marker elements 941 are arranged at substantially the same position in the Y direction. Further, between the two second marker elements 941 in the X direction, two other second marker elements 941 are arranged in the Y direction. The other two second marker elements 941 are arranged on the (+Y) side and the (-Y) side, respectively, than the two second marker elements 941 closest to the (+X) side and the two second marker elements 941 closest to the (-X) side, respectively. .

As described above, the first alignment mark 93 and the second alignment mark 94 are only different in the direction on the substrate 9, and have the same shape and size. Therefore, as the second aperture 524 (see FIG. 4 ) of the second marker 521 , a member having the same shape as the first aperture 514 (refer to FIG. 3 ) of the first marker 511 can be used only by changing the mounting direction (that is, the opening number, shape, size and configuration of the same components). Therefore, the manufacture of the drawing apparatus 1 can be simplified, and the manufacturing cost of the drawing apparatus 1 can be reduced.

In addition, the shape of the first marker element 931 is not limited to a circle, and may be changed to various shapes such as a triangle, a rectangle, a polygon other than a pentagon, an ellipse, or a cross. The arrangement of the first marker elements 931 is not limited to the lattice shape, and may be changed to various shapes. The number of the first marker elements 931 can also be changed to various numbers, and it may be one or two or more. The second marker element 941 is also the same as the first marker element 931 .

In addition, the shape, arrangement, and number of the first marker elements 931 may be the same as or different from the shape, arrangement, and number of the second marker elements 941, respectively. For example, the first alignment mark 93 may include the above-mentioned four first mark elements 931, the second alignment mark 94 may include three second mark elements 941, and the three second mark elements 941 may be omitted. One second marker element 941 among the four second marker elements 941 . In this case, the first alignment mark 93 and the second alignment mark 94 are not similar in shape.

FIG. 7 is a diagram showing the configuration of the computer 100 included in the control unit 10 . The computer 100 is a general computer including a processor 101 , a memory 102 , an input/output unit 103 , and a bus 104 . The bus bar 104 is a signal circuit for connecting the processor 101 , the memory 102 and the input/output part 103 . The memory 102 stores programs and various kinds of information. The processor 101 executes various processing (for example, numerical calculation, image processing) while using the memory 102 and the like in accordance with a program or the like stored in the memory 102 . The input/output unit 103 includes a keyboard 105 and a mouse 106 for receiving input from the operator, and a display 107 for displaying output from the processor 101 and the like. In addition, the control unit 10 may be a programmable logic controller (PLC; Programmable Logic Controller), a circuit board, or the like, and may be a combination of these components and one or more computers.

FIG. 8 is a block diagram showing the functions of the control unit 10 realized by the computer 100 . In FIG. 8 , configurations other than the control unit 10 are also shown together. The control unit 10 includes a memory unit 111 , an imaging control unit 112 , a detection unit 113 , and a drawing control unit 114 . The memory unit 111 is mainly realized by the memory 102, and stores in advance data of a predetermined pattern drawn on the substrate 9 (that is, data for drawing), and the first positional relationship information and the second positional relationship information described below. various information.

The first positional relationship information is information showing that the upper side of the substrate 9 conveyed by the first conveying mechanism 2a (that is, the first stage 21a and the first moving mechanism 22a) shown in FIG. 1 is drawn by the pattern drawing unit 4 The pattern on the main surface of , and the pattern on the main surface of the substrate 9 drawn by the first mark drawing section 51 (refer to FIG. 2 ) to the first conveying mechanism 2 a (ie, the first stage 21 a and the first moving mechanism 22 a ) shown in FIG. 1 are conveyed Relative positional relationship between the first alignment marks 93 (refer to FIG. 5 ) on the lower main surface in a plan view. The second positional relationship information is information showing the pattern drawn by the pattern drawing unit 4 to the main surface on the upper side of the substrate 9 conveyed by the second conveying mechanism 2a (ie, the second stage 21a and the second moving mechanism 22a). The second alignment with the main surface of the lower side of the substrate 9 that is drawn by the second mark drawing portion 52 (see FIG. 2 ) to the second conveying mechanism 2 a (ie, the second stage 21 a and the second moving mechanism 22 a ) The relative positional relationship between the marks 94 (see FIG. 6 ) in plan view.

The first positional relationship information is obtained in advance by: in the first conveyance mechanism 2a of the drawing device 1, drawing the progressive pattern on the main surface of the upper side of the test substrate and performing the drawing on the main surface of the lower side of the test substrate. The first alignment mark 93 is drawn, and the relative position between the pattern and the first alignment mark 93 is measured. The second positional relationship information is acquired in advance by, in the second conveyance mechanism 2b of the drawing device 1, drawing the progressive pattern on the main surface on the upper side of the test substrate and performing the drawing on the main surface on the lower side of the test substrate. The second alignment mark 94 is drawn, and the relative position between the pattern and the second alignment mark 94 is determined.

The imaging control unit 112 , the detection unit 113 , and the rendering control unit 114 shown in FIG. 8 are mainly realized by the processor 101 (see FIG. 7 ). The imaging control unit 112 controls the imaging unit 3, the first moving mechanism 22a, and the second moving mechanism 22b, whereby the imaging unit 3 images the main surface of the upper side of the substrate 9 on the first stage 21a and the second stage 21b and acquires an image . The image is transmitted and stored in the memory unit 111 . The detection unit 113 detects the position of the substrate 9 using the image. In addition, the detection unit 113 discriminates the type of the alignment mark in the video. Specifically, it is determined which of the first alignment mark 93 , the second alignment mark 94 , and the other alignment marks the alignment mark is.

The drawing control unit 114 controls the pattern drawing unit 4 , the first movement mechanism 22 a , and the second movement based on the position of the substrate 9 detected by the detection unit 113 , the type of alignment mark, the drawing data previously stored in the memory unit 111 , and the like. The mechanism 22b allows the pattern drawing unit 4 to perform drawing on the substrates 9 on the first stage 21a and the second stage 21b.

Next, the flow of the drawing of the pattern on the substrate 9 by the drawing apparatus 1 shown in FIG. 1 will be described. In the drawing apparatus 1, while the substrate 9 held on one of the first table 21a and the second table 21b is being drawn, the substrate 9 is carried into the other table and an alignment process is performed. Wait. Then, when the drawing of the substrate 9 held on the one table is completed, the drawing of the substrate 9 held on the other table is started. In addition, while the substrate 9 on the other table is being drawn, the drawn substrate 9 is carried out from the one table, and a new substrate 9 is carried on the one table to perform alignment processing and the like. In the following description, it will be described that the pattern drawing unit 4 draws a pattern on the first main surface 91 of the substrate 9 .

9A and 9B are diagrams showing an example of the flow of rendering processing in the rendering apparatus 1 . Steps S11 to S19 on the left side in FIGS. 9A and 9B show the flow of the drawing process toward the substrate 9 on the first stage 21 a, and steps S21 to S29 on the right side in FIGS. 9A and 9B show the flow of drawing processing toward the second stage 21 a The flow of the drawing process of the substrate 9 on the stage 21b. In addition, the steps located at the same position in the vertical direction in FIGS. 9A and 9B are performed substantially in parallel. Specifically, step S11 is performed substantially in parallel with steps S21 to S26. In addition, step S28 is performed substantially in parallel with steps S13 to S18.

In FIGS. 9A and 9B , the description will be started from a state in which a pattern is drawn on the substrate 9 on the first stage 21a of the first conveyance mechanism 2a. 10 to 15 are conceptual diagrams showing schematic positions in the Y direction of the first table 21a and the second table 21b in the drawing apparatus 1 in the drawing process. In FIGS. 10 to 15 , the first stage 21a, the first moving mechanism 22a, the second stage 21b, and the second moving mechanism 22b are drawn by solid lines, and the imaging head 31 and the drawing head 41 are drawn by broken lines.

In the following description, the position of the first stage 21a in the Y direction will be referred to as the "processing position" at the position overlapping the imaging head 31 and/or the drawing head 41 in the vertical direction, and the position of the first table 21a in the vertical direction will be referred to as the "processing position". The position where the end on the (-Y) side of the mechanism 22a overlaps is referred to as the "carrying-out position", and the position overlapping the end on the (+Y) side of the first moving mechanism 22a in the vertical direction is referred to as the "standby position" . In addition, regarding the position of the second stage 21b in the Y direction, the position overlapping the imaging head 31 and/or the drawing head 41 in the up-down direction is referred to as a "processing position", and the position in the up-down direction with the second moving mechanism 22b (( The position where the end on the (+Y) side of the second moving mechanism 22b overlaps is referred to as the "carrying-out position", and the position overlapping the end on the (+Y) side of the second moving mechanism 22b in the vertical direction is referred to as the "standby position". In addition, the above-mentioned processing position does not refer to the concept of a point in the Y direction, but refers to a predetermined range (that is, a processing area) in the Y direction for the imaging of the substrate 9 by the imaging unit 3 and the scanning of the pattern by the pattern drawing unit 4. .

As shown in FIG. 10 , in the drawing apparatus 1, in a state where the first stage 21a is located at the processing position and the drawing head 41 is located at the first drawing position, the pattern drawing unit 4 draws the image on the upper side of the substrate 9 on the first stage 21a. The main surface (ie, the first main surface 91 ) performs the drawing of the pattern. Further, the first mark drawing unit 51 (see FIG. 2 ) draws the first alignment marks 93 on the main surface (ie, the second main surface 92 ) on the lower side of the substrate 9 on the first stage 21 a (step S11 ). ). In step S11 , the pattern drawing unit 4 and the first moving mechanism 22 a are controlled by the drawing control unit 114 (see FIG. 8 ), whereby the main surface on the upper side of the substrate 9 moving in the (−Y) direction in the processing position is controlled. Draw the pattern. The drawing of the first alignment marks 93 on the main surface of the lower side of the substrate 9 may be performed in parallel with the drawing of the pattern on the main surface of the upper side of the substrate 9, or may be performed before or after the drawing of the pattern.

In the drawing apparatus 1, in parallel with step S11, the drawn substrate 9 is unloaded from the second stage 21b located at the unloading and carrying position, and the new board 9 is carried in and held on the second stage 21b (steps S21, S22). . Next, the second table 21b is moved in the (+Y) direction by the second moving mechanism 22b to be positioned at the processing position shown in FIG. 11 (step S23). In the state shown in FIG. 11, the pattern drawing of the board|substrate 9 on the 1st stage 21a is performed in the state in which the 1st stage 21a is located in a processing position. In addition, the photographing head 31 is located at the second photographing position.

When the second table 21b is located at the processing position, the imaging control unit 112 (see FIG. 8 ) controls the imaging unit 3 and the second moving mechanism 22b, thereby performing the main operation on the upper side of the substrate 9 provided on the second table 21b. The alignment mark (not shown) on the surface (that is, the first main surface 91 ) is photographed, and the acquired image is sent to the detection unit 113 (see FIG. 8 ). This alignment mark is provided in advance on the board|substrate 9 carried in to the 2nd stage 21b in step S22, and has a different external appearance from the 1st alignment mark 93 and the 2nd alignment mark 94, for example.

The detection unit 113 performs pattern matching on the video using the reference video. This pattern matching is performed, for example, by a known pattern matching method (eg, geometric shape pattern matching, normalized correlation search, etc.). Thereby, the position of the alignment mark in this image|video is calculated|required, and the position of the board|substrate 9 on the 2nd stage 21b is detected (step S24).

The position of the substrate 9 detected by the detection unit 113 includes the coordinates in the X direction and the Y direction of the substrate 9 on the second stage 21b, the direction of the substrate 9, and information for displaying the deformation caused by the bending of the substrate 9, etc. . In addition, the information on the deformation of the display substrate 9 is information such as the shape of the deformed substrate 9 and the position of the drawing area on the substrate 9 . In the detection part 113, based on the detected position of the board|substrate 9, adjustment (namely, alignment process) of the drawing data for the board|substrate 9 on the 2nd stage 21b is performed.

When the imaging of the substrate 9 on the second stage 21b is completed, the second stage 21b is moved in the (+Y) direction by the second moving mechanism 22b and placed at the standby position shown in FIG. 12 (step S25). In the state shown in FIG. 12, the pattern drawing of the board|substrate 9 on the 1st stage 21a is performed in the state in which the 1st stage 21a is located in a processing position. The second stage 21b waits at the standby position until the drawing of the pattern on the substrate 9 on the first stage 21a is completed (step S26).

When the drawing of the pattern of the substrate 9 and the first alignment marks 93 on the first stage 21a is completed (step S11), the first stage 21a is moved in the (-Y) direction by the first moving mechanism 22a and positioned in the figure The carry-in position shown in 13 is carried out (step S12). Further, in parallel with step S12, the second table 21b is moved in the (-Y) direction by the second moving mechanism 22b and positioned at the processing position (step S27). In addition, the photographing head 31 is moved from the second photographing position to the first photographing position. The drawing head 41 is moved from the first drawing position to the second drawing position.

Then, based on the above-described alignment-processed drawing data and the like, the pattern drawing unit 4 and the second moving mechanism 22b are controlled by the drawing control unit 114, whereby the drawing control unit 114 controls the second table 21b that moves in the (-Y) direction in the processing position. The main surface (ie, the first main surface 91 ) on the upper side of the substrate 9 is drawn with a pattern. In addition, the second alignment mark 94 is drawn on the main surface (ie, the second main surface 92 ) on the lower side of the substrate 9 on the second stage 21 b by the second mark drawing unit 52 (see FIG. 2 ) (step S28). The drawing of the second alignment marks 94 on the main surface of the lower side of the substrate 9 may be performed in parallel with the drawing of the pattern on the main surface of the upper side of the substrate 9, or may be performed before or after the drawing of the pattern.

In the drawing apparatus 1, in parallel with the drawing of the pattern on the substrate 9 on the second table 21b, the drawn substrate 9 is carried out from the first table 21a located at the carry-out and carry-in position, and a new board 9 is carried in and held in on the first unit 21a (steps S13, S14). Next, the first stage 21a is moved in the (+Y) direction by the first moving mechanism 22a and positioned at the processing position shown in FIG. 14 (step S15). In the state shown in FIG. 14, the pattern drawing of the board|substrate 9 on the 2nd stage 21b is performed in the state in which the 2nd stage 21b is located in a processing position.

When the first stage 21a is located at the processing position, the imaging control unit 112 controls the imaging unit 3 and the first moving mechanism 22a, whereby the main surface of the upper side of the substrate 9 provided on the first stage 21a is captured by the imaging head 31 (that is, the first main surface 91 ) of the alignment mark (not shown), and the acquired image is sent to the detection unit 113 . This alignment mark is provided in advance on the board|substrate 9 carried into the 1st stage 21a in step S14, and has a different external appearance from the 1st alignment mark 93 and the 2nd alignment mark 94, for example.

Similar to step S24, the detection unit 113 performs pattern matching on the image to detect the position of the substrate 9 on the first stage 21a (step S16). In the detection part 113, based on the detected position of the board|substrate 9, the adjustment (namely, alignment process) of the predetermined pattern data drawn to the board|substrate 9 on the 1st stage 21a is performed.

When the imaging of the substrate 9 on the first stage 21a is completed, the first stage 21a is moved in the (+Y) direction by the first moving mechanism 22a and placed at the standby position shown in FIG. 15 (step S17). In the state shown in FIG. 15, the pattern drawing of the board|substrate 9 on the 2nd stage 21b is performed in the state where the 2nd stage 21b is located in a processing position. The first table 21a waits at the standby position until the drawing of the pattern on the substrate 9 on the second table 21b is completed (step S18).

When the drawing of the pattern of the substrate 9 and the second alignment mark 94 on the second stage 21b is completed (step S28), the second stage 21b is moved in the (-Y) direction by the second moving mechanism 22b and positioned in the 10 is carried out to the carry-in position (step S29). Moreover, in parallel with step S29, the 1st table 21a is moved to a (-Y) direction by the 1st moving mechanism 22a, and is located in a processing position (step S19). In addition, the photographing head 31 is moved from the first photographing position to the second photographing position. The drawing head 41 is moved from the second drawing position to the first drawing position.

Next, returning from step S19 to step S11, based on the above-described alignment-processed drawing data and the like, the pattern drawing unit 4 and the first movement mechanism 22a are controlled by the drawing control unit 114, whereby the center of the processing position (-Y) is adjusted. A pattern is drawn on the main surface (ie, the first main surface 91 ) on the upper side of the substrate 9 on the first stage 21 a that has moved in the direction. Further, the first alignment mark 93 is drawn on the main surface (ie, the second main surface 92 ) on the lower side of the substrate 9 on the first stage 21 a by the first mark drawing unit 51 (step S11 ). Then, returning from step S29 to step S21, the drawn substrate 9 is unloaded from the second stage 21b located at the unloading and loading position, and a new board 9 is carried in and held on the second stage 21b (steps S21, S22). In the drawing apparatus 1, steps S11 to S19 and steps S21 to S29 are repeated, and the plurality of substrates 9 are drawn in sequence.

Next, the operation of the drawing device 1 when the pattern drawing unit 4 draws the pattern on the second main surface 92 of the substrate 9 on which the above-described pattern has been drawn on the first main surface 91 will be described. Hereinafter, a case where a pattern is drawn on the second main surface 92 of the substrate 9 held by the second stage 21b will be described with reference to FIGS. 9A and 9B . In addition, the drawing of the pattern toward the substrate 9 on the first table 21a is generally performed in parallel with the drawing of the pattern toward the substrate 9 on the second table 21b in the same manner as described above. Description of the processing of the substrate 9 on the first stage 21a.

In the drawing apparatus 1, first, in a similar manner to step S22, the substrate 9 with the second main surface 92 facing upward is carried in and held on the second stage 21b (step S22). The above-mentioned pattern is drawn in advance on the first main surface 91 (that is, the main surface of the lower side) of the substrate 9 in the drawing device 1 . When the pattern is drawn on the first main surface 91 in the first conveyance mechanism 2a, the first alignment mark 93 is drawn on the second main surface 92 of the substrate 9 (see FIG. 5 ). In addition, when the pattern is drawn on the first main surface 91 in the second conveyance mechanism 2b, the second alignment mark 94 is drawn on the second main surface 92 of the substrate 9 (see FIG. 6 ).

Next, the second table 21b is moved in the (+Y) direction from the carry-out and carry-in position by the second moving mechanism 22b and positioned at the processing position (step S23). Then, the imaging control unit 112 (refer to FIG. 8 ) controls the imaging unit 3 and the second movement mechanism 22b, whereby the main surface (ie, the second main surface 92) on the upper side of the substrate 9 provided on the second stage 21b is performed. ) of the alignment mark (that is, the first alignment mark 93 or the second alignment mark 94 ) is captured, and the acquired image is sent to the detection unit 113 (see FIG. 8 ).

The detection unit 113 performs pattern matching on the image in the same manner as described above, and discriminates the type of the alignment mark in the image. Specifically, it is determined which of the first alignment mark 93 and the second alignment mark 94 the alignment mark is. Further, in the detection unit 113, the position of the alignment mark in the image is obtained by the above-described pattern matching, and the position of the substrate 9 on the second stage 21b is detected (step S24). In the detection part 113, based on the detected position of the board|substrate 9, adjustment (namely, alignment process) of the drawing data for the board|substrate 9 on the 2nd stage 21b is performed.

In the pattern matching in step S24, in order to correspond to the inclination of the substrate 9 on the second stage 21b (that is, the deviation from the predetermined direction), the expansion and contraction of the substrate 9, etc., the first alignment mark 93 and the second pair of Rotation, expansion and contraction of the template of the quasi-mark 94. However, since the above-mentioned inclination, expansion and contraction of the base plate 9 are slightly, the rotation, expansion and contraction allowed by the template are also slightly. For example, the allowable rotation angle is 10° or less, and the allowable expansion-contraction ratio is 30% or less.

Therefore, as illustrated in FIGS. 5 and 6 , in the case where the second alignment mark 94 has an appearance in which the first alignment mark 93 has been rotated by a large angle (for example, 45°), in the above-described pattern matching The first alignment mark 93 and the second alignment mark 94 are not misidentified. From the viewpoint of preventing this misunderstanding, in the case where the first alignment mark 93 and the second alignment mark 94 are similar in shape, it is preferable that the second alignment mark 94 has at least the ability to rotate the first alignment mark 93 Appearance that exceeds 10° or expands and contracts the first alignment mark 93 by more than 30%. In addition, from the viewpoint of preventing misidentification, as described above, it is also preferable that the first alignment mark 93 and the second alignment mark 94 have non-similar shapes.

When the imaging of the substrate 9 on the second stage 21b is completed, the second stage 21b is moved from the processing position to the standby position by the second moving mechanism 22b and waits at the standby position (steps S25, S26). When the standby of the second table 21b is completed, the second table 21b is moved from the standby position to the processing position by the second moving mechanism 22b (step S27).

Then, the pattern drawing unit 4 and the second movement mechanism 22b are controlled by the drawing control unit 114 (see FIG. 8 ) based on the drawing data that has been aligned and the type of the alignment mark detected by the detection unit 113, and the like. Patterning the second main surface 92 of the substrate 9 (ie, the main surface on which the first alignment mark 93 or the second alignment mark 94 is drawn) on the second stage 21b moving in the (-Y) direction in the processing position drawing (step S28). In addition, when drawing a pattern toward the second main surface 92, it is not necessary to draw an alignment mark on the first main surface 91 (that is, the main surface on the lower side).

In step S28, when the first alignment marks 93 are drawn on the second main surface 92 of the substrate 9, the drawing control unit 114 determines that the first main operation on the substrate 9 has been performed on the first conveyance mechanism 2a. The pattern on the surface 91 is drawn, and the first positional relationship information is read from the memory unit 111 . As described above, the first positional relationship information is information showing the pattern drawn on the first main surface 91 of the substrate 9 and the first alignment mark drawn on the second main surface 92 on the first conveyance mechanism 2a The relative positional relationship between 93. In the drawing device 1, based on the first positional relationship information and the drawing data processed by the alignment marks, etc., the pattern drawing unit 4 and the second moving mechanism 22b are controlled by the drawing control unit 114 to adjust the pattern relative to the second moving mechanism 22b. The drawing position of the second main surface 92 of the substrate 9 on the stage 21 b is drawn, and the pattern is drawn on the second main surface 92 . Thereby, the relative position of the pattern drawn on the first main surface 91 of the substrate 9 and the pattern drawn on the second main surface 92 can be set to be approximately the same as desired relative positions.

On the other hand, when the second alignment mark 94 is drawn on the second main surface 92 of the substrate 9, the drawing control unit 114 determines that the first main surface of the substrate 9 has been performed on the second conveyance mechanism 2b. The pattern on the surface 91 is drawn, and the second positional relationship information is read from the memory unit 111 . As described above, the second positional relationship information is information showing the pattern drawn on the first main surface 91 of the substrate 9 and the second alignment mark drawn on the second main surface 92 on the second conveyance mechanism 2b The relative positional relationship between 94. In the drawing device 1, the pattern drawing unit 4 and the second moving mechanism 22b are controlled by the drawing control unit 114 based on the second positional relationship information and the drawing data processed by the above-mentioned alignment marks, thereby adjusting the pattern relative to the second moving mechanism 22b. The drawing position of the second main surface 92 of the substrate 9 on the stage 21 b is drawn, and the pattern is drawn on the second main surface 92 . Thereby, the relative position of the pattern drawn on the first main surface 91 of the substrate 9 and the pattern drawn on the second main surface 92 can be set to be approximately the same as desired relative positions.

As described above, the drawing system for drawing the substrate 9 (the drawing device 1 in the above example) includes the pattern drawing unit 4, the first conveyance mechanism 2a, the first mark drawing unit 51, and the second conveyance mechanism 2b and the second marker drawing unit 52 . The pattern drawing unit 4 draws a pattern by irradiating light to the main surface of the upper side of the substrate 9 that is horizontally moving downward. The 1st conveyance mechanism 2a is provided with the 1st board|substrate holding part (namely, the 1st stage 21a) and the 1st moving mechanism 22a, and the 1st moving mechanism 22a horizontally moves the 1st stage 21a below the pattern drawing part 4. The 1st mark drawing part 51 irradiates light to the main surface of the lower side of the board|substrate 9 hold|maintained by the 1st stage 21a, and draws the 1st alignment mark 93 related to the 1st conveyance mechanism 2a. The second conveyance mechanism 2b includes a second substrate holding portion (ie, the second stage 21b) and a second moving mechanism 22b that horizontally moves the second stage 21b below the pattern drawing portion 4 . The 2nd mark drawing part 52 irradiates light to the main surface of the lower side of the board|substrate 9 hold|maintained by the 2nd stage 21b, and draws the 2nd alignment mark 94 related to the 2nd conveyance mechanism 2b. The appearance of the second alignment mark 94 is different from that of the first alignment mark 93 .

Therefore, by observing the alignment marks drawn on the other main surface of the substrate 9, it is possible to easily discriminate that the pattern drawing unit 4 has drawn a pattern on the one main surface of the substrate 9 in a process subsequent to the pattern drawing. Which of the first conveyance mechanism 2a and the second conveyance mechanism 2b is used. Thereby, it is possible to draw in consideration of the unique front-back positional relationship (that is, the relative positional relationship between the pattern on the upper surface and the alignment mark on the lower surface) for the conveying mechanism used when the pattern is drawn on the one main surface. After the adjustment of the position, a pattern is drawn on the other main surface of the substrate 9 . As a result, the relative positional accuracy of the pattern drawn to the main surfaces on both sides of the substrate 9 can be improved.

As described above, it is preferable that the drawing device 1 further includes: the memory unit 111 that stores the first positional relationship information and the second positional relationship information in advance; and the photographing control unit 112 that controls the pattern drawing unit 4 . The first positional relationship information shows the pattern drawn by the pattern drawing unit 4 to the main surface of the upper side of the substrate 9 conveyed by the first conveyance mechanism 2a and the pattern drawn by the first mark drawing unit 51 to the first conveyance mechanism 2a conveyed by the first conveyance mechanism 2a. The relative positional relationship between the first alignment marks 93 on the main surface of the lower side of the substrate 9 . The second positional relationship information indicates that the pattern drawn by the pattern drawing unit 4 to the main surface of the upper side of the substrate 9 conveyed by the second conveyance mechanism 2b and the pattern drawn by the second mark drawing unit 52 to the main surface of the upper side of the substrate 9 conveyed by the second conveyance mechanism 2b and the pattern drawn by the second mark drawing unit 52 to be conveyed by the second conveyance mechanism 2b The relative positional relationship between the second alignment marks 94 on the main surface of the lower side of the substrate 9 . Preferably, the photographing control unit 112 adjusts the drawing position based on the first positional relationship information when the pattern drawing unit 4 draws a pattern on the main surface on which the first alignment marks 93 are drawn; When the part 4 draws a pattern on the main surface on which the second alignment mark 94 is drawn, the drawing position is adjusted based on the second positional relationship information. Thereby, the board|substrate 9 with high relative positional accuracy of the pattern drawn on the main surface of both sides can be provided.

As described above, it is preferable that the first marker drawing portion 51 includes: a first shield portion (the first aperture 514 in the above example) that allows a part of the light from the first light source 512 to pass therethrough; and the second marker drawing portion The portion 52 includes a second shield portion (the second aperture 524 in the above example) having an opening different from the first shield portion for allowing a part of the light from the second light source 522 to pass therethrough. Accordingly, the appearance of the first alignment mark 93 can be improved without significantly changing the structure of the first mark drawing portion 51 and the second mark drawing portion 52 (that is, only changing the first mark portion and the second mark portion). The appearance is different from that of the second alignment mark 94 . Therefore, the complexity of the structure of the drawing apparatus 1 can be suppressed, and the relative positional accuracy of the pattern drawn on the main surfaces on both sides of the board|substrate 9 can be improved.

As mentioned above, it is preferred that the first alignment mark 93 and the second alignment mark 94 have non-similar shapes. Thereby, in the above-mentioned pattern matching, even when the template is rotated, expanded and contracted, misrecognition of the first alignment mark 93 and the second alignment mark 94 can be suppressed, and the alignment mark can be accurately discriminated. type.

As described above, the pattern drawing unit 4 includes: the drawing head 41 for irradiating light downward; and the drawing head moving mechanism 42 for moving the drawing head 41 to the first drawing position and the second conveyance above the first conveyance mechanism 2a It moves between the second drawing positions above the mechanism 2b. In this way, the drawing on the substrate 9 on the first stage 21a and the drawing on the substrate 9 on the second stage 21b are performed by the common drawing head 41, whereby the structure of the drawing apparatus 1 can be simplified and the drawing apparatus 1 can be simplified. miniaturization. In addition, as described above, in the drawing device 1, it can be easily discriminated, in a step subsequent to the pattern drawing, whether the first conveyance mechanism 2a and the which of the second conveyance mechanisms 2b. Therefore, the structure of the drawing apparatus 1 is particularly suitable for the drawing apparatus 1 that can draw patterns on the main surfaces on both sides of the substrate 9 by either the first conveyance mechanism 2a or the second conveyance mechanism 2b.

In the examples shown in FIGS. 5 and 6 , the first alignment mark 93 and the second alignment mark 94 are simple figures in which circular mark elements are arranged, respectively, but the present invention is not limited to this. For example, the first alignment mark 93 may also be a barcode for displaying information related to the first conveying mechanism 2a, and the second alignment mark 94 may also be a barcode for displaying information related to the second conveying mechanism 2b. In this case, by imaging the first alignment marks 93 by the imaging unit 3, the type of the conveying mechanism (that is, the first conveying mechanism 2a or the second conveying mechanism 2b) used for pattern drawing of the substrate 9 can also be compared. The determination of , is performed in parallel with the acquisition of information related to the conveying mechanism.

In the case where the first alignment mark 93 is a barcode, the information displayed on the barcode includes, for example, the identification number and/or the first positional relationship information for displaying the first conveying mechanism 2a. In the case where the second alignment mark 94 is a barcode, the information displayed on the barcode includes, for example, the identification number and/or the first positional relationship information for displaying the second conveying mechanism 2b. As the first alignment mark 93 and the second alignment mark 94, a one-dimensional barcode or a two-dimensional barcode may be used.

In addition, the first alignment mark 93 and the second alignment mark 94 may be marks other than barcodes including the above-mentioned information. For example, the first alignment mark 93 may also be a mark for displaying the first transport mechanism 2a, and the second alignment mark 94 may also be a mark for displaying the second transport mechanism 2b.

Various changes can be made in the above-described drawing device 1 .

In the above example, although two identical first alignment marks 93 are drawn on the main surface of the lower side of the substrate 9 by the first mark drawing portion 51 , the lower side of the substrate 9 is drawn by the second drawing portion 52 . The main surface is depicted with two identical second alignment marks 94, but is not so limited. For example, the shapes, sizes or directions of the two first alignment marks 93 may also be different from each other. Likewise, the shapes, sizes or orientations of the two second alignment marks 94 may also be different from each other. In addition, in the case where the appearance of the first alignment mark 93 of one of the two first alignment marks 93 and the appearance of the second alignment mark 94 of one of the two second alignment marks 94 are different, the other One of the first alignment marks 93 and the other of the second alignment marks 94 may have the same appearance.

Two first alignment marks 93 drawn on the main surface of the lower side of the substrate 9 by the first mark drawing portion 51 and two first alignment marks 93 drawn on the main surface of the lower side of the substrate 9 by the second mark drawing portion 52 . The two alignment marks 94 may also have different configurations on the substrate 9 (ie, the relative positions of the two alignment marks). For example, the two first alignment marks 93 may be arranged in the X direction at the end of the main surface of the lower side of the substrate 9 on the (−Y) side, and the two second alignment marks 94 may be arranged on the side of the substrate 9 . The end on the (-Y) side and the end on the (+Y) side of the main surface on the lower side. Even in this case, since the appearance of the case of observing the two first alignment marks 93 together and the appearance of the case of observing the two second alignment marks 94 together are different from each other, as described above, it is easy to It is determined which one of the first conveyance mechanism 2a and the second conveyance mechanism 2b is used to draw a pattern on the main surface on the upper side of the substrate 9 . In addition, in the case where the arrangement is different as described above, each of the first alignment marks 93 and each of the second alignment marks 94 may have the same shape.

In the drawing apparatus 1, the number of the first alignment marks 93 drawn on the main surface of the lower side of the substrate 9 by the first mark drawing unit 51 may be three or more. In addition, the number of the second alignment marks 94 drawn on the main surface of the lower side of the substrate 9 by the second mark drawing section 52 may be three or more.

In the first mark 511 , for example, instead of the first aperture 514 , a glass mask on which a pattern corresponding to the first alignment mark 93 is drawn can also be disposed on the first light source 512 and the optical system 513 as the first mask portion. (+Z) side of . Similarly, in the second mark 521 , instead of the second aperture 524 , a glass mask on which a pattern corresponding to the second alignment mark 94 is drawn can also be disposed on the second light source 522 and the optical device as a second mask portion. (+Z) side of system 523.

The first marker 511 of the first marker drawing unit 51 does not necessarily need to be arranged inside the first stage 21a. For example, the first marker 511 may be arranged vertically below the moving path of the first stage 21a in the above-mentioned processing position, and the first stage 21a may be located above the first marker 511 via the The through hole irradiates the main surface of the lower side of the substrate 9 with light, and the first alignment mark 93 is drawn. The same applies to the second mark 521 of the second mark drawing unit 52 .

In the first marker drawing unit 51, the light sources of the plurality of first markers 511 may be shared. For example, the light from the common light source can also be guided toward the optical systems 513 of the plurality of first markers 511 through a plurality of optical fibers, respectively. The same applies to the second marker drawing unit 52 .

In the drawing device 1, marks (such as barcodes, numbers) including information given to the first conveyance mechanism 2a including the first positional relationship information and the like may be drawn by the first marks independently of the first alignment marks 93. The portion 51 is drawn to the main surface of the lower side of the substrate 9 . In addition, marks (such as barcodes, numbers), etc. including the information given to the second conveyance mechanism 2 b including the second positional relationship information and the like may be drawn to the second alignment mark 94 by the second mark drawing unit 52 independently of the second alignment mark 94 . The main surface of the lower side of the substrate 9 .

In the drawing apparatus 1, the first conveyance mechanism 2a may further include one or more of the following members: a moving mechanism for moving the first stage 21a in the X direction; and a rotation mechanism for a rotation axis extending in the Z direction as a center The first table 21a is rotated; and the lift mechanism is used to move the first table 21a in the Z direction. As the moving mechanism and the elevating mechanism, for example, a linear servo motor can be used. In addition, as this rotation mechanism, a servomotor can be used. Various modifications can be made to the moving mechanism, the rotating mechanism, and the elevating mechanism. The second conveyance mechanism 2b is also the same as the first conveyance mechanism 2a.

The pattern drawing unit 4 may be provided with a drawing head 41 for irradiating light on the substrate 9 on the first stage 21a in the first drawing position and a drawing head 41 for irradiating light on the second table 21b in the second drawing position, respectively. The substrate 9 irradiates the drawing head 41 with light. In this case, the drawing head moving mechanism 42 may also be omitted. Furthermore, the imaging unit 3 may be provided with an imaging head 31 for imaging the substrate 9 on the first stage 21a in the first imaging position, and an imaging head 31 for imaging the substrate 9 on the second stage 21b in the second imaging position, respectively. The camera head 31 of the substrate 9 . In this case, the photographing head moving mechanism 32 may also be omitted. In addition, in the drawing device 1, the first unit and the second unit may be provided separately; the first unit is provided with: a first conveying mechanism 2a; a first mark drawing part 51; In the imaging position, the substrate 9 on the first stage 21a is photographed; and the drawing head 41 is used to irradiate the substrate 9 on the first stage 21a with light; the second unit is provided with: a second conveying mechanism 2b; a second mark drawing part 52; the photographing head 31 is used to photograph the substrate 9 on the second stage 21b in the second photographing position; and the drawing head 41 is used to irradiate the substrate 9 on the second stage 21b with light.

In the drawing device 1, in addition to the first conveyance mechanism 2a and the second conveyance mechanism 2b, a third table and a third moving mechanism for moving the third table in the Y direction may be further provided, and the parallel The substrates 9 on the first stage 21a, the second stage 21b, and the third stage are subjected to various processes (alignment processing, drawing processing, and carrying out and carrying in the substrates 9).

Fig. 16 is a side view of another preferred drawing device 1a of the present invention viewed from the (-Y) side. In FIG. 16, illustration of the imaging head 31, the 1st overhead part 72, etc. is abbreviate|omitted. In the drawing apparatus 1a, the 1st stage 21a and the 2nd stage 21b are arrange|positioned adjacent to the up-down direction. In the example shown in FIG. 16, the 2nd stage 21b is arrange|positioned at the lower side of the 1st stage 21a so that it may be spaced apart. The first moving mechanism 22a supports the first stage 21a from the side (that is, the (-X) side). The second moving mechanism 22b supports the second table 21b from the side (that is, the (+X) side).

The 1st conveyance mechanism 2a is provided with the 1st lift mechanism which abbreviate|omitted illustration for moving the 1st stage 21a in the up-down direction. The 2nd conveyance mechanism 2b is provided with the 2nd lift mechanism which abbreviate|omitted illustration for moving the 2nd table 21b in the up-down direction. After the pattern is drawn on the main surface on the upper side of the substrate 9 on the first stage 21a by the plurality of drawing heads 41 supported by the second elevated portion 73, the main surface on the upper side of the substrate 9 on the second stage 21b is drawn. When drawing a pattern, the first stage 21a is lowered from the state shown in FIG. 16 to the position of the second stage 21b in the figure, and the second stage 21b is raised to the position of the first stage 21a in the figure. The other configurations of the rendering device 1 a are substantially the same as those of the rendering device 1 .

Similar to the above-described drawing device 1, the first moving mechanism 22a and the second moving mechanism 22b are arranged in a row in a direction intersecting with the substrate moving direction (that is, the Y direction). In the example shown in FIG. 16 , the first moving mechanism 22a and the second moving mechanism 22b are arranged side by side in the X direction, and the second moving mechanism 22b is adjacent to the (+X) side of the first moving mechanism 22a. . The first moving mechanism 22a and the second moving mechanism 22b are located at approximately the same height in the vertical direction.

In the drawing apparatus 1a, like the drawing apparatus 1, first alignment marks 93 are drawn on the main surface of the lower side of the substrate 9 held on the first stage 21a, and on the substrate held on the second table 21b A second alignment mark 94 different in appearance from the first alignment mark 93 is drawn on the main surface of the lower side of 9 . Thereby, by observing the type of the alignment mark drawn on the other main surface of the substrate 9 , it is possible to easily discriminate the main alignment mark on the one side of the substrate 9 in the pattern drawing unit 4 in a process subsequent to the pattern drawing. Which of the first conveyance mechanism 2a and the second conveyance mechanism 2b is used when a pattern is drawn on the surface.

In the above-mentioned example, although the drawing system was demonstrated as one double-stage drawing apparatus 1, it is not limited to this. For example, the drawing system may include two drawing apparatuses of a dual type. In this case, one of the drawing devices includes the first conveyance mechanism 2a, the first mark drawing unit 51, and the first pattern drawing unit, and the first pattern drawing unit is directed to the upper side of the substrate 9 on the first stage 21a. The main surface depicts the pattern. Moreover, the other drawing apparatus is provided with the said 2nd conveyance mechanism 2b, the said 2nd mark drawing part 52, and the 2nd pattern drawing part, and the 2nd pattern drawing part is provided with respect to the main surface of the upper side of the board|substrate 9 on the 2nd stage 21b. Draw patterns. The first pattern drawing unit includes one or two or more of the above-described drawing heads 41 . Similarly, the second pattern drawing unit includes one or two or more of the above-described drawing heads 41 . In this drawing system, the first pattern drawing unit and the second pattern drawing unit are combined to form the pattern drawing unit 4, and the pattern drawing unit 4 draws a pattern by irradiating light to the main surface of the upper side of the substrate 9 that moves horizontally below.

In this drawing system, similarly to the above-described drawing apparatus 1, the first alignment mark 93 is drawn on the main surface of the lower side of the substrate 9 held on the first stage 21a, and the first alignment mark 93 is drawn on the main surface on the lower side of the substrate held on the second table 21b. A second alignment mark 94 different in appearance from the first alignment mark 93 is drawn on the main surface of the lower side of 9 . Thereby, by observing the type of the alignment mark drawn on the other main surface of the substrate 9 , it is possible to easily discriminate the main alignment mark on the one side of the substrate 9 in the pattern drawing unit 4 in a process subsequent to the pattern drawing. Which of the first conveyance mechanism 2a and the second conveyance mechanism 2b is used when a pattern is drawn on the surface.

The above-mentioned substrate 9 is not limited to a printed circuit board. In the drawing apparatuses 1 and 1a, for example, glass substrates for flat panel display devices such as semiconductor substrates, liquid crystal display devices, and organic EL display devices, glass substrates for photomasks, and solar cell panels can also be processed. Position detection of substrates, etc.

The configurations in the above-described embodiment and each modification example may be appropriately combined as long as they do not contradict each other.

While the invention has been depicted and described in detail, these descriptions are intended to be illustrative and not restrictive. Therefore, various changes and aspects can be considered as long as they do not deviate from the scope of the present invention.

1,1a: Drawing device 2a: The first conveying mechanism 2b: Second conveying mechanism 3: Filming Department 4: Pattern drawing department 7: Frame 9: Substrate 10: Control Department 21a: The first 21b: Second unit 22a: First moving mechanism 22b: Second moving mechanism 31: Shooting head 32: Shooting head moving mechanism 41: Depicting the Head 42: Depicting the Head Movement Mechanism 51: The first mark drawing part 52: The second mark drawing part 71: Abutment 72: First Elevated Department 73: Second Elevated Section 74: Elevated Department 91: First main surface 92: Second main surface 93: First alignment mark 94: Second alignment mark 100: Computer 101: Processor 102: Memory 103: Input and output section 104: Busbar 105: Keyboard 106: Mouse 107: Display 111: Memory Department 112: Shooting Control Department 113: Inspection Department 114: Drawing Control Department 211a, 211b: Recess 221a: Rails 511: First sign 512: The first light source 513: First Optical System 514: First aperture 521: Second sign 522: Second light source 523: Second Optical System 524: second aperture 931: First Mark Element 941: Second Marking Element

1 is a perspective view showing a drawing device according to one embodiment of the present invention. [Fig. 2] is a plan view showing a part of the first stage and the second stage. [ FIG. 3 ] A longitudinal cross-sectional view showing a first marker. [FIG. 4] A longitudinal sectional view showing the second mark. [Fig. 5] is a bottom view showing the first alignment mark. [Fig. 6] is a bottom view showing the second alignment mark. [Fig. 7] is a diagram showing the configuration of a computer. [Fig. 8] is a block diagram showing the function of the control unit. [ FIG. 9A ] A diagram showing the flow of the drawing process. [ FIG. 9B ] A diagram showing the flow of the drawing process. [Fig. 10] is a diagram showing the positions of the first stage and the second stage. [Fig. 11] is a diagram showing the positions of the first stage and the second stage. [Fig. 12] is a diagram showing the positions of the first stage and the second stage. [Fig. 13] is a diagram showing the positions of the first stage and the second stage. [Fig. 14] is a diagram showing the positions of the first stage and the second stage. [Fig. 15] is a diagram showing the positions of the first stage and the second stage. [ Fig. 16 ] It is a side view showing another example of the drawing device.

1: Drawing device

2a: The first conveying mechanism

2b: Second conveying mechanism

3: Filming Department

4: Pattern drawing department

7: Frame

9: Substrate

10: Control Department

21a: The first

21b: Second unit

22a: First moving mechanism

22b: Second moving mechanism

31: Shooting head

32: Shooting head moving mechanism

41: Depicting the Head

42: Depicting the Head Movement Mechanism

71: Abutment

72: First Elevated Department

73: Second Elevated Section

74: Elevated Department

91: First main surface

92: Second main surface

211b: Recess

221a: Rails

Claims (6)

A drawing system for drawing a substrate and having: The pattern drawing part irradiates light to the main surface of the upper side of the substrate that moves horizontally below and draws a pattern; a first conveying mechanism including a first substrate holding portion and a first moving mechanism, wherein the first moving mechanism horizontally moves the first substrate holding portion below the pattern drawing portion; a first mark drawing part for irradiating light to the main surface of the lower side of the substrate held by the first substrate holding part, and drawing a first alignment mark attached to the first conveying mechanism; a second conveying mechanism including a second substrate holding portion and a second moving mechanism, wherein the second moving mechanism horizontally moves the second substrate holding portion below the pattern drawing portion; and The second mark drawing portion irradiates light to the main surface of the lower side of the substrate held by the second substrate holding portion, and draws a different appearance from the first alignment mark and is assigned to the second conveyance mechanism. Second alignment mark. The rendering system as described in claim 1, further comprising: The memory part stores first positional relationship information and second positional relationship information in advance, and the first positional relationship information displays the pattern drawn by the pattern drawing part on the main surface of the upper side of the substrate conveyed by the first conveying mechanism The relative positional relationship with the first alignment marks drawn by the first mark drawing section to the main surface of the lower side of the substrate conveyed by the first conveyance mechanism, the second positional relationship information is displayed The pattern drawn by the pattern drawing unit on the main surface of the upper side of the substrate conveyed by the second conveying mechanism and the pattern drawn by the second mark drawing unit on the main surface of the lower side of the substrate conveyed by the second conveying mechanism the relative positional relationship between the aforementioned second alignment marks; and a drawing control unit that controls the pattern drawing unit; The drawing control unit adjusts the drawing position based on the first positional relationship information when the pattern drawing unit draws a pattern on the main surface on which the first alignment mark is drawn; The drawing control unit adjusts the drawing position based on the second positional relationship information when the pattern drawing unit draws a pattern on the main surface on which the second alignment mark is drawn. The drawing system according to claim 1, wherein the first mark drawing unit includes: a first shield unit that allows a part of the light from the light source to pass therethrough; The said second mark drawing part is equipped with the 2nd shield part which has the opening different from the said 1st shield part, and lets a part of the light rays from a light source pass through. The drawing system according to claim 1, wherein the first alignment mark and the second alignment mark are non-similar shapes. The drawing system according to claim 1, wherein the first alignment mark is a barcode for displaying information related to the first conveying mechanism; The second alignment mark is a bar code for displaying information related to the second conveying mechanism. The drawing system as described in any one of claims 1 to 5, wherein the pattern drawing unit includes: a delineation head, which shines light downward; and The drawing head moving mechanism moves the drawing head between a first drawing position above the first conveying mechanism and a second drawing position above the second conveying mechanism.

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