JP2024043357A - Drawing device and drawing method - Google Patents

Abstract

[Problem] To calibrate a drawing head while suppressing an increase in takt time. [Solution] A substrate holding part 25 for holding a substrate 9 is provided on a stage 21 of a drawing device 1. A drawing head 41 irradiates modulated light onto the substrate 9. A scale part 52 is provided on the stage 21 adjacent to the substrate holding part 25 in the main scanning direction. A calibration camera 53 captures an image of a predetermined calibration pattern irradiated onto the scale part 52 from the drawing head 41 in a state in which the scale part 52 is located at a calibration position below the drawing head 41. In the drawing device 1, the scale part 52 is located at the calibration position in a state in which the stage 21 is located at a transfer position where the substrate 9 is transferred into and out of the substrate holding part 25. This makes it possible to calibrate the drawing head 41 while suppressing an increase in takt time. [Selected Figure] FIG. 7A

Description

The present invention relates to a technique for drawing a pattern by irradiating a substrate with light.

Conventionally, in drawing patterns on printed circuit boards, semiconductor substrates, etc. (hereinafter referred to as "substrates"), modulated light is irradiated onto a photosensitive material formed on the substrate, and the irradiated area of the light is scanned. A drawing device that directly draws a pattern is used.

In such a drawing device, the irradiation position of the light from the drawing head on the substrate fluctuates due to the temperature rise of the drawing head and changes in the temperature around the device as time passes from the start of drawing, causing the drawing to occur on the substrate. Pattern misalignment may occur. Therefore, Patent Document 1 proposes a calibration method in which data on fluctuations in the irradiation position due to temperature changes is acquired in advance, and the irradiation position is corrected in accordance with the measured temperature. However, indirect calibration using temperature as an index may lack calibration accuracy.

On the other hand, unlike the method of calculating the fluctuation of the irradiation position indirectly from the temperature as in Patent Document 1, there is also a known calibration method that directly determines the fluctuation of the irradiation position by observing the light from the drawing head with a camera. There is. In this case, calibration is performed by moving the stage on which the substrate is placed and positioning the camera vertically below the drawing head. After calibration is complete, move the stage vertically below the drawing head and position the camera vertically below the drawing head to perform calibration. Drawing is performed for Therefore, a relatively long time is required for one calibration. Therefore, from the perspective of reducing takt time (i.e., the time required for drawing work on one board, also called cycle time), it is not recommended to perform calibration every time drawing on one board is completed. This is difficult, and calibration has to be performed every time a predetermined drawing time elapses or every time drawing is completed on a predetermined number of two or more substrates.

Japanese Patent Application Publication No. 2014-197136

However, in the above-mentioned drawing device, there is a demand for further improvement in drawing position accuracy, and while there is a need to increase the frequency of calibration, there is also a need to suppress a decrease in productivity. Therefore, there is a demand for calibrating the drawing head while suppressing an increase in takt time.

The present invention has been made in view of the above problems, and an object of the present invention is to calibrate a drawing head while suppressing an increase in takt time.

Aspect 1 of the present invention is a drawing device that draws a pattern by irradiating a substrate with light, the drawing device including a stage provided with a substrate holding section that holds a substrate, and a drawing device that irradiates the substrate with modulated light. a main scanning mechanism that moves the stage relative to the drawing head in a main scanning direction parallel to the upper surface of the substrate; a calibration camera that images a predetermined calibration pattern irradiated from the drawing head to the scale part in a state where the scale part is located at a calibration position below the drawing head; a correction information acquisition unit that obtains correction information used for correcting the irradiation position of light from the drawing head based on an inspection image including the scale portion and the calibration pattern obtained by the calibration camera; and drawing data. and controlling the drawing head and the main scanning mechanism based on the correction information to cause the drawing head to perform drawing on the substrate while moving the substrate relative to the drawing head in the main scanning direction. A drawing control section. The scale section is located at the calibration position while the stage is located at a loading/unloading position where a substrate is loaded into/out of the substrate holding section.

A second aspect of the present invention is the drawing device according to the first aspect, in which the drawing device includes an alignment camera that images an alignment mark on the substrate, and an image of the alignment mark acquired by the alignment camera. The image forming apparatus further includes an alignment information acquisition unit that obtains alignment information used for correcting the relative position of the substrate with respect to the drawing head. The alignment camera is located on the opposite side of the stage, with respect to the main scanning direction, from the substrate holding section of the stage located at the loading/unloading position, with the drawing head in between.

A third aspect of the present invention is the drawing apparatus according to the second aspect, wherein the drawing apparatus further includes a support section that supports the drawing head above the stage. The alignment camera is also supported by the support section.

Aspect 4 of the present invention is the drawing device of Aspect 1 (which may be any one of Aspects 1 to 3), in which the scale section is provided with a translucent surface disposed on the upper surface of the stage. It is a scale member. The calibration camera is attached to the stage below the translucent scale member, and images the calibration pattern transmitted through the translucent scale member. The upper end of the calibration camera is subjected to low reflection processing.

Aspect 5 of the present invention is the drawing device according to aspect 1 (which may be any one of aspects 1 to 4), in which the position of the calibration pattern on the scale in the main scanning direction can be changed by the drawing head while the stage is stationary.

Aspect 6 of the present invention is the drawing device according to Aspect 1 (which may be any one of Aspects 1 to 5), in which the drawing head includes a plurality of light sources that emit light of different wavelengths. Equipped with Two or more light sources among the plurality of light sources are used when drawing on the substrate. Only one light source among the plurality of light sources is used when irradiating the calibration pattern onto the scale portion.

Aspect 7 of the present invention is the drawing apparatus of Aspect 1 (or any one of Aspects 1 to 6), which includes the drawing head and each of which directs modulated light to the substrate. A plurality of drawing heads for irradiation are arranged in an arrangement direction parallel to the upper surface of the substrate and inclined with respect to the main scanning direction. The calibration camera sequentially images a plurality of calibration patterns irradiated from the plurality of drawing heads onto the scale part while moving in the arrangement direction, with the scale part located at the calibration position. do.

Aspect 8 of the present invention is the drawing apparatus according to any one of aspects 1 to 7, wherein the time required for acquiring the inspection image by the calibration camera is equal to the time required for taking out one substrate from the substrate holder and creating a new one. This is shorter than the time required to carry a substrate into the substrate holder.

Aspect 9 of the present invention is a drawing device according to any one of aspects 1 to 7 (or any one of aspects 1 to 8), in which the inspection image is acquired by the calibration camera each time a substrate is loaded into the substrate holder.

Aspect 10 of the present invention is a drawing method for drawing a pattern by irradiating light onto a substrate, comprising the steps of: a) imaging a predetermined calibration pattern irradiated from the drawing head onto the scale located at a calibration position below the drawing head while a stage having a substrate holding section for holding a substrate and a scale section adjacent to the substrate holding section in a main scanning direction parallel to the top surface of the substrate is positioned at an insertion/removal position where the substrate is inserted into and removed from the substrate holding section; b) determining correction information used to correct the irradiation position of light from the drawing head based on an inspection image including the scale section and the calibration pattern acquired in step a); and c) irradiating the substrate, which moves relative to the drawing head in the main scanning direction, with light modulated from the drawing head based on drawing data and the correction information, to draw on the substrate.

The present invention makes it possible to calibrate the drawing head while suppressing increases in takt time.

FIG. 1 is a perspective view showing a drawing device according to one embodiment. FIG. 4 is an enlarged plan view showing the vicinity of a calibration unit. FIG. 3 is a diagram showing the internal configuration of a calibration section and a drawing head. FIG. 2 is a diagram showing the configuration of a computer. FIG. 4 is a block diagram showing the functions of a control unit. FIG. 3 is a diagram showing the flow of pattern drawing. FIG. 2 is a front view showing a schematic configuration of the imaging device. FIG. 2 is a front view showing a schematic configuration of the imaging device. FIG. 2 is a front view schematically showing the main configuration of the drawing device. FIG. 2 is a front view schematically showing the main configuration of the drawing device. FIG. 2 is a front view schematically showing the main configuration of the drawing device.

Figure 1 is a perspective view showing a drawing device 1 according to one embodiment of the present invention. The drawing device 1 is a direct drawing device that draws a pattern by irradiating a photosensitive material on a substrate 9 with spatially modulated, approximately beam-like light and scanning the irradiated area of the light on the substrate 9. In Figure 1, three mutually orthogonal directions are indicated by arrows as the X direction, the Y direction, and the Z direction. In the example shown in Figure 1, the X direction and the Y direction are horizontal directions perpendicular to each other, and the Z direction is the vertical direction (i.e., the up-down direction). The same applies to other figures.

The substrate 9 is, for example, a substantially rectangular flat printed circuit board. On the main surface (hereinafter also referred to as "upper surface 91") on the (+Z) side of the substrate 9, a resist film made of a photosensitive material is provided on the copper layer. In the drawing device 1 , a circuit pattern is drawn (that is, formed) on the resist film of the substrate 9 . Note that the type, shape, etc. of the substrate 9 may be variously changed.

As shown in FIG. 1, the drawing device 1 includes a stage 21, a stage movement mechanism 22, an alignment unit 3, a drawing unit 4, a calibration unit 5, and a control unit 10. The control unit 10 controls the stage movement mechanism 22, the alignment unit 3, the drawing unit 4, the calibration unit 5, etc.

The stage 21 is a substantially rectangular flat member disposed below the alignment section 3 and the drawing section 4 (ie, on the (-Z) side). The stage 21 includes a substrate holder 25 that holds the horizontal substrate 9 from below. The substrate holding unit 25 is, for example, a vacuum chuck that sucks and holds the lower surface of the substrate 9. The substrate holder 25 may have a structure other than a vacuum chuck, and may be a mechanical chuck, for example. The upper surface 91 of the substrate 9 placed on the substrate holder 25 is substantially perpendicular to the Z direction and substantially parallel to the X and Y directions.

The stage moving mechanism 22 is a moving mechanism that moves the stage 21 relative to the alignment section 3 and the drawing section 4 in a horizontal direction (that is, a direction substantially parallel to the upper surface 91 of the substrate 9). The stage moving mechanism 22 includes a first moving mechanism 23 and a second moving mechanism 24. The second moving mechanism 24 linearly moves the stage 21 in the X direction along the guide rail. The first moving mechanism 23 linearly moves the stage 21 together with the second moving mechanism 24 in the Y direction along the guide rail. The driving source for the first moving mechanism 23 and the second moving mechanism 24 is, for example, a linear servo motor or a motor attached to a ball screw. The structures of the first moving mechanism 23 and the second moving mechanism 24 may be modified in various ways.

The drawing apparatus 1 may be provided with a stage rotation mechanism that rotates the stage 21 around a rotation axis extending in the Z direction. Furthermore, the drawing apparatus 1 may be provided with a stage elevating mechanism that moves the stage 21 in the Z direction. For example, a servo motor can be used as the stage rotation mechanism. For example, a linear servo motor can be used as the stage elevating mechanism. The structures of the stage rotation mechanism and the stage elevating mechanism may be modified in various ways.

The alignment unit 3 includes a plurality of (two in the example shown in FIG. 1) alignment cameras 31 arranged in the X direction. Each alignment camera 31 is supported above the stage 21 and the stage moving mechanism 22 by a support section 40 provided across the stage 21 and the stage moving mechanism 22. The support portion 40 is a single member provided at one position in the Y direction. In the example shown in FIG. 1, the support section 40 is a gate-shaped member (so-called gantry) that straddles the stage 21 and the stage moving mechanism 22.

In the example shown in FIG. 1, the two alignment cameras 31 are attached to the (+Y) side surface of the support section 40. Among the two alignment cameras 31, for example, one alignment camera 31 is fixed to the support part 40, and the other alignment camera 31 is movable in the X direction on the support part 40. Thereby, the distance between the two alignment cameras 31 in the X direction can be changed. Note that the number of alignment cameras 31 in the alignment section 3 may be one, or may be three or more.

Each alignment camera 31 is equipped with an imaging element and an optical system (not shown). Each alignment camera 31 is, for example, an area camera that captures a two-dimensional image. In each alignment camera 31, the reflected light of illumination light guided from an illumination light source (not shown) to the upper surface 91 of the substrate 9 is guided to the imaging element via the optical system. The imaging element receives the reflected light from the upper surface 91 of the substrate 9 and captures an image of a substantially rectangular imaging area. The alignment camera 31 captures an alignment mark (not shown) that is provided in advance on the upper surface 91 of the substrate 9. As the illumination light source, various light sources such as LEDs (Light Emitting Diodes) can be used. The alignment camera 31 may be another type of camera, such as a line camera.

The image including the alignment mark acquired by the alignment camera 31 (hereinafter also referred to as "alignment image") is sent to the control unit 10 shown in FIG. 1. The control unit 10 performs alignment of the substrate 9 (that is, correction of the relative position of the substrate 9 with respect to the drawing head 41 described later) based on the alignment image.

The drawing unit 4 includes a plurality of (six in the example shown in FIG. 1) drawing heads 41 arranged in the X direction. The plurality of drawing heads 41 have substantially the same structure. Each drawing head 41 includes a spatial light modulator that emits modulated (that is, spatially modulated) light downward. Each drawing head 41 is supported above the stage 21 and the stage moving mechanism 22 by the above-described support section 40. In the example shown in FIG. 1, six drawing heads 41 are attached to the (-Y) side surface of the support section 40. In other words, the six drawing heads 41 are arranged on the opposite side of the two alignment cameras 31 with the support section 40 in between in the Y direction. In other words, the two alignment cameras 31 are located on the opposite side of the substrate holder 25 of the stage 21 located at the loading/unloading position, which will be described later, with the six drawing heads 41 in between in the Y direction.

In the example shown in FIG. 1, the six drawing heads 41 are arranged in a substantially straight line substantially parallel to the X direction. Furthermore, the distances in the Z direction between the six drawing heads 41 and the upper surface 91 of the substrate 9 on the stage 21 are approximately the same. In other words, the arrangement direction of the six drawing heads 41 is approximately parallel to the upper surface 91 of the substrate 9 and approximately perpendicular to the Y direction. In other words, the positions of the six drawing heads 41 in the Y direction and the Z direction are substantially the same.

Note that the arrangement direction of the above-mentioned drawing heads 41 may be a direction inclined with respect to the Y direction, and does not necessarily need to be parallel to the X direction. In the drawing unit 4, the plurality of drawing heads 41 do not necessarily need to be arranged in a straight line, and may be arranged in a staggered manner, for example. Further, in the drawing section 4, the number of drawing heads 41 may be one, or may be two or more.

In the drawing device 1, pattern drawing on the substrate 9 is performed by a so-called multi-pass method. Specifically, while modulated light from the multiple drawing heads 41 of the drawing unit 4 is irradiated onto the upper surface 91 of the substrate 9, the first moving mechanism 23 of the stage moving mechanism 22 moves the substrate 9 in the Y direction to pass under the drawing heads 41. As a result, the irradiation area of the light from the multiple drawing heads 41 is scanned in the Y direction on the substrate 9, and drawing on the substrate 9 is performed. Next, the second moving mechanism 24 moves the substrate 9 in steps in the X direction by a predetermined distance. Then, the first moving mechanism 23 moves the substrate 9 in the Y direction, and the drawing heads 41 irradiate the substrate 9 with light in parallel with the movement again, and drawing on the substrate 9 is performed. In the drawing device 1, the irradiation of light on the substrate 9 moving in the Y direction and the step movement of the substrate 9 in the X direction are alternately performed, thereby drawing a pattern on the substrate 9.

In the following description, the Y direction will also be referred to as the "main scanning direction" and the X direction will also be referred to as the "sub scanning direction." The main scanning direction and the sub-scanning direction are directions substantially parallel to the upper surface 91 of the substrate 9. In the stage moving mechanism 22, the first moving mechanism 23 is a main scanning mechanism that moves the stage 21 relative to the drawing head 41 in the main scanning direction. Further, the second moving mechanism 24 is a sub-scanning mechanism that moves the stage 21 relative to the drawing head 41 in the sub-scanning direction. Note that the drawing apparatus 1 uses a single-pass method (also called a one-pass method) in which drawing of a pattern on the substrate 9 is completed by moving the substrate 9 relative to the drawing head 41 only once in the Y direction. Drawing may also be performed on the substrate 9. In this case, when drawing a pattern, sub-scanning (that is, step movement in the X direction) of the substrate 9 by the second moving mechanism 24 is not performed.

The calibration section 5 is provided on the (+Y) side of the substrate holding section 25 on the stage 21 . The calibration unit 5 is used to calibrate the drawing head 41 (that is, measure and correct the irradiation position of light from the drawing head 41).

FIG. 2 is an enlarged plan view showing the vicinity of the calibration section 5 of the drawing device 1. FIG. 3 is a front view showing the configuration of the calibration section 5 and the drawing head 41. FIG. 3 shows a state in which the drawing head 41 is positioned vertically above the calibration section 5. FIG. 3 illustrates the internal configuration of the stage 21 and the internal configuration of one drawing head 41. The structure of the other drawing heads 41 is substantially the same as the structure of the one drawing head 41.

As shown in FIG. 3, the drawing head 41 includes a light source section 42, an illumination optical system 43, a spatial light modulator 44 (hereinafter also simply referred to as "light modulator 44"), and a projection optical system 45. Be prepared. The light emitted from the light source section 42 is guided by the illumination optical system 43 to the light modulator 44, and after being modulated by the light modulator 44, the light is directed below the drawing head 41 by the projection optical system 45 (that is, (- (Z) direction).

The light source section 42 includes a plurality of light sources that emit light of different wavelengths. In the example shown in FIG. 3, the light source section 42 includes three light sources 421 to 423. As the light sources 421 to 423, various light sources such as LD (Laser Diode) can be used. When drawing a pattern on the substrate 9, for example, two or more of the light sources 421 to 423 are used depending on the type of photosensitive material on the substrate 9. Note that the number of light sources provided in the light source section 42 may be one or two, or may be four or more. The light source provided in the light source section 42 is not limited to an LD, and various types can be used.

The illumination optical system 43 and the projection optical system 45 each include optical elements such as a plurality of lenses (not shown). The light modulator 44 may be a variety of light modulators such as a DMD (Digital Micro Mirror Device) or a GLV (Grating Light Valve) (registered trademark of Silicon Light Machines, Sunnyvale, California). is available. The optical modulator 44 is not limited to the above example, and various types can be used.

The calibration section 5 includes an imaging section 51 and a scale section 52. The scale section 52 is a substantially flat member provided on the stage 21. The scale part 52 is arranged on the upper surface of the stage 21, and is adjacent to (that is, arranged close to) the (+Y) side of the substrate holding part 25. In the example shown in FIG. 2, the scale portion 52 is a substantially rectangular band-shaped member extending substantially parallel to the X direction, and has translucency. A large number of scales are provided on the (+Z) side main surface of the scale portion 52 to indicate positions in the X direction on the main surface. In other words, the scale portion 52 is a translucent scale member, for example, a substantially transparent glass scale. The scale of the scale section 52 is, for example, a cross pattern or other shaped pattern. Note that the scale portion 52 may be a semitransparent member.

The imaging section 51 is attached inside the stage 21 below the scale section 52. The imaging unit 51 includes a calibration camera 53 and a camera movement mechanism 54. The calibration camera 53 is arranged vertically below the scale section 52 and faces upward. The calibration camera 53 is, for example, a digital camera having a CCD (Charged Coupled Device) or a CMOS (Complementary Metal Oxide Semiconductor) as an image sensor. Note that the type and performance of the calibration camera 53 may be set as appropriate.

The upper end of the calibration camera 53 (i.e., the portion facing the drawing head 41 via the scale portion 52) is treated to reduce reflection. Specifically, for example, an anti-reflection film is attached to the frame of the objective lens of the calibration camera 53 to reduce reflectance. This makes it possible to prevent reflected light from the calibration camera 53 from being captured unintentionally when the alignment camera 31 captures an image. Note that the above-mentioned anti-reflection treatment may be performed using various structures and methods other than an anti-reflection film.

The camera moving mechanism 54 is a moving mechanism that linearly moves the calibration camera 53 in the X direction along the guide rail inside the stage 21 . The drive source of the camera moving mechanism 54 is, for example, a linear servo motor or a motor attached to a ball screw. The structure of the camera moving mechanism 54 may be modified in various ways.

In the drawing device 1, the calibration camera 53 is moved by the camera moving mechanism 54 while the plurality of drawing heads 41 are located vertically above the scale section 52 of the calibration section 5, and one drawing head that is the object of calibration is moved. It is arranged vertically below 41. A predetermined calibration pattern (that is, a pattern used for calibrating the drawing head 41 ) is emitted from the one drawing head 41 toward the scale section 52 . The calibration pattern is, for example, a cross-shaped pattern. The shape of the calibration pattern may be changed in various ways as long as it is a shape that allows calculation of the center of gravity position.

The calibration camera 53 illuminates the irradiation area of the light from the drawing head 41 on the scale section 52 (that is, the calibration pattern) from below through the scale section 52 together with the scales formed on the scale section 52 in advance. Take an image. In other words, the calibration camera 53 images the calibration pattern transmitted through the scale part 52 together with the scale. The image acquired by the calibration camera 53 (hereinafter also referred to as "inspection image") is sent to the control unit 10 shown in FIG. 1. In the control unit 10, the one drawing head 41 is calibrated based on the inspection image. When another drawing head 41 is calibrated, the camera moving mechanism 54 moves the calibration camera 53 in the X direction to position it vertically below the other drawing head 41, and then the same procedure is performed. Calibration is performed.

FIG. 4 is a diagram showing the configuration of the computer 100 that functions as the control unit 10. The computer 100 is a normal computer including a processor 101, a memory 102, an input/output unit 103, and a bus 104. Bus 104 is a signal circuit that connects processor 101, memory 102, and input/output section 103. Memory 102 stores programs and various information. The processor 101 executes various processes (for example, numerical calculations and image processing) using the memory 102 and the like according to programs stored in the memory 102 and the like. The input/output unit 103 includes a keyboard 105 and a mouse 106 that accept input from an operator, and a display 107 that displays output from the processor 101 and the like. Note that the control unit 10 may be a programmable logic controller (PLC), a circuit board, or the like, or may be a combination of these and one or more computers.

FIG. 5 is a block diagram showing the functions of the control unit 10 implemented by the computer 100. In FIG. 5, configurations other than the control unit 10 are also shown. The control unit 10 includes a storage unit 111 , an imaging control unit 112 , a position detection unit 113 , a correction information acquisition unit 114 , an alignment information acquisition unit 115 , and a drawing control unit 116 . The storage unit 111 is mainly realized by the memory 102 and stores in advance various information such as data of a pattern to be drawn on the substrate 9 (that is, drawing data). The imaging control section 112, the position detection section 113, the correction information acquisition section 114, the alignment information acquisition section 115, and the drawing control section 116 are mainly realized by the processor 101.

The imaging control section 112 controls the drawing head 41 and the imaging section 51 to cause the drawing head 41 to irradiate the calibration pattern stored in advance in the storage section 111 onto the scale section 52 (see FIGS. 2 and 3). , causes the imaging unit 51 to acquire the above-mentioned inspection image for calibration. The inspection image is sent from the imaging section 51 to the control section 10 and stored in the storage section 111.

The position detection section 113 determines the irradiation position of the light from the drawing head 41 on the scale section 52 (hereinafter also referred to as "measurement position") based on the inspection image including the image of the scale section 52 and the calibration pattern. demand. As described above, since the scale part 52 is fixed on the stage 21, the relative position of the scale part 52 with respect to the substrate holding part 25 is also fixed. Therefore, by detecting the irradiation position of the calibration pattern on the plurality of scales of the scale section 52, the relative position of the irradiation position of the light emitted from the drawing head 41 with respect to the substrate holding section 25 can be determined.

The correction information acquisition section 114 obtains correction information used to correct the irradiation position of the light from the drawing head 41 on the substrate 9 based on the measurement position obtained by the position detection section 113 . Specifically, the measurement position is compared with a designed irradiation position (hereinafter also referred to as "design position") on the scale part 52 of the calibration pattern irradiated from the drawing head 41, and the measurement position and The distance from the design position in the X and Y directions (that is, the amount of deviation from the design position) is determined. The correction information acquisition unit 114 obtains correction information for correcting the irradiation position of light from the drawing head 41 to match the designed position based on the amount of deviation. The correction information is, for example, information for correcting drawing data of a pattern drawn on the substrate 9 in accordance with the amount of deviation. Alternatively, the correction information may be information for correcting the movement of the substrate 9 by the stage movement mechanism 22 when drawing a pattern on the substrate 9.

The alignment information acquisition unit 115 acquires alignment information used for aligning the substrate 9 (i.e., correcting the relative position of the substrate 9 with respect to the drawing head 41) based on the image of the above-mentioned alignment mark (hereinafter also referred to as the "alignment image") acquired by the alignment camera 31 of the alignment unit 3. Specifically, the position of the substrate 9 on the substrate holding unit 25 is obtained based on the position of the alignment mark in the alignment image, and the amount of deviation of the substrate 9 from the design position on the substrate holding unit 25 is obtained. In other words, the amount of deviation of the relative position of the substrate 9 with respect to the drawing head 41 from the design position is obtained. The alignment information acquisition unit 115 obtains alignment information for correcting the relative position of the substrate 9 with respect to the drawing head 41 so that it coincides with the design position based on the amount of deviation. The alignment information is, for example, information for correcting the movement of the substrate 9 by the stage movement mechanism 22 when drawing a pattern on the substrate 9. Alternatively, the alignment information may be information for correcting the drawing data of the pattern drawn on the substrate 9 in accordance with the amount of deviation.

The drawing control unit 116 controls the drawing head 41 based on the drawing data stored in the storage unit 111, the correction information obtained by the correction information acquisition unit 114, the alignment information obtained by the alignment information acquisition unit 115, etc. By controlling the stage moving mechanism 22, the drawing head 41 is caused to perform drawing on the substrate 9 while moving the substrate 9 relative to the drawing head 41.

Next, drawing of a pattern by the drawing device 1 will be described with reference to FIG. 6 and FIG. 7A to FIG. 7E. FIG. 6 is a diagram showing an example of the flow of drawing a pattern on a substrate 9. FIG. 7A to FIG. 7E are front views showing a schematic of the main components of the drawing device 1 to explain the operation of the drawing device 1. In FIG. 7A to FIG. 7E, the internal configuration of the stage 21 is also shown by solid lines.

When drawing on the substrate 9, the stage 21 is first positioned at the position shown in FIG. 7A. In the following description, the position of the stage 21 in the Y direction shown in FIG. 7A will also be referred to as the "carry-in/out position." In the drawing apparatus 1, with the stage 21 located at the loading/unloading position, the substrate 9 on which drawing has already been completed in the drawing apparatus 1 is transferred from the stage 21 to the outside of the drawing apparatus 1, as shown by the two-dot chain line. It will be carried out. Further, a new substrate 9 (that is, the substrate 9 on which drawing is to be performed by the drawing apparatus 1) is carried into the drawing apparatus 1 and held on the stage 21 of the substrate holding section 25 (step S11). That is, in step S11, the substrate 9 is carried in and out of the substrate holder 25 while the stage 21 is located at the carry-in/out position. The board 9 may be carried in and out, for example, by a carrying-in/out device (not shown), or may be carried out manually by an operator. When the stage 21 is located at the loading/unloading position, the substrate holding section 25 is positioned at a position (- Located on the Y) side.

In the state shown in FIG. 7A, the scale section 52 of the calibration section 5 is located vertically below the drawing head 41. In the following description, the position of the scale portion 52 in the Y direction shown in FIG. 7A is also referred to as a "calibration position." In the drawing apparatus 1, the plurality of drawing heads 41 are calibrated in parallel with the loading/unloading of the substrate 9 in step S11, with the stage 21 being located at the loading/unloading position and the scale section 52 being located at the calibration position. It will be done.

Specifically, the calibration camera 53 is moved by the camera moving mechanism 54 (see FIGS. 2 and 3) and is placed vertically below one drawing head 41 that is the object of calibration. Then, by controlling the light source section 42 and the light modulator 44 (see FIG. 3) of the drawing head 41 by the control section 10, the above-mentioned calibration pattern is irradiated from the drawing head 41 onto the scale section 52. . In the light source unit 42, only one predetermined light source among the light sources 421 to 423 (see FIG. 3) described above is used when irradiating the calibration pattern. Thereby, the calibration pattern on the scale section 52 is formed by light of a single wavelength.

The calibration camera 53 images the calibration pattern irradiated onto the scale section 52 located at the calibration position together with the scale of the scale section 52 to obtain an inspection image. The acquired inspection image is sent to the control unit 10 and stored in the storage unit 111 (see FIG. 5).

When acquiring an inspection image, there are cases where the calibration pattern is relatively largely shifted in the Y direction and is out of the field of view of the calibration camera 53. In this case, the inspection image is acquired after the position of the calibration pattern on the scale section 52 in the Y direction is corrected so that the calibration pattern falls within the field of view of the calibration camera 53. Correction of the position of the calibration pattern in the Y direction is performed by the drawing head 41 while the stage 21 is stationary (that is, without moving the stage 21 in the Y direction).

Specifically, for example, data of a plurality of calibration patterns having different positions in the Y direction is stored in advance in the storage unit 111, and the position of the calibration pattern on the scale unit 52 is shifted to the (+Y) side. In this case, data whose calibration pattern is located on the (-Y) side of the current data is exchanged with the current data. Then, by controlling the drawing head 41 based on the replaced data, the position of the calibration pattern on the scale section 52 is moved to the (-Y) side.

This allows suitable imaging of the calibration pattern without moving the stage 21 (that is, without moving the scale section 52), thereby reducing the time required to calibrate the drawing head 41. can. Furthermore, as described above, since the calibration of the drawing head 41 is performed in parallel with the loading and unloading of the substrate 9, the movement of the stage 21 may have an adverse effect on the loading and unloading of the substrate 9 (for example, during the movement of the stage 21, This prevents interruptions in loading and unloading operations. Note that the position change of the calibration pattern by the drawing head 41 is not limited to the above-mentioned method, and may be performed by other methods.

Subsequently, the calibration camera 53 is moved in the X direction by the camera moving mechanism 54 and placed vertically below the next drawing head 41 adjacent in the X direction to the drawing head 41 from which the inspection image has been acquired. Then, in the same manner as described above, the calibration pattern irradiated onto the scale section 52 from the next drawing head 41 is imaged, and an inspection image of the next drawing head 41 is obtained. In the drawing device 1, inspection images are sequentially acquired by the calibration camera 53 for all the drawing heads 41 of the drawing section 4 (step S12). In other words, the one calibration camera 53 moves the plurality of calibration patterns irradiated onto the scale section 52 from the plurality of drawing heads 41 in the X direction (that is, the arrangement direction of the plurality of drawing heads 41). images in sequence.

In the drawing apparatus 1, the time required for step S12 (that is, the time required for acquiring inspection images of all the plurality of drawing heads 41) is the time required for carrying out one substrate 9 from the substrate holder 25 and replacing a new substrate 9 in step S11. It is preferable that the time is shorter than the time required for loading the substrate into the substrate holding section 25. Further, in the drawing device 1, when acquiring an inspection image of one drawing head 41, the irradiation of the calibration pattern from the other drawing head 41 may be stopped, and the calibration pattern is not transmitted from the other drawing head 41 to the scale section 52. ion pattern may be irradiated.

In the drawing device 1, when an inspection image of one drawing head 41 is acquired, the position detection unit 113 (see FIG. 5) determines the irradiation position of light from the drawing head 41 on the scale unit 52 (i.e., the measurement position of the calibration pattern) based on the inspection image. Then, based on the measurement position of the calibration pattern, correction information related to the irradiation position of light from the one drawing head 41 is determined by the correction information acquisition unit 114 (see FIG. 5) (step S13). In this way, in the drawing device 1, it is preferable that the acquisition of inspection images of multiple drawing heads 41 and the acquisition of correction information based on the inspection image are performed in parallel.

When the loading and unloading of the substrate 9 (step S11) and the acquisition of inspection images for all the drawing heads 41 (step S12) are completed, the stage 21 is moved in the (+Y) direction by the first moving mechanism 23 of the stage moving mechanism 22. will be moved. The movement of the stage 21 in the (+Y) direction is started, for example, before the above correction information is acquired for all the drawing heads 41 (that is, before step S13 ends). In this case, step S13 is continuously performed even while the substrate 9 is being moved. Note that the movement of the stage 21 may be started after the end of step S13.

By moving in the (+Y) direction, the stage 21 passes below the alignment camera 31 as shown in FIG. 7B, moves to the standby position shown in FIG. 7C, and stops. As shown in FIG. 7B, when the stage 21 passes below the alignment camera 31, an alignment mark (not shown) provided in advance on the substrate 9 on the substrate holder 25 is imaged by the alignment camera 31. Ru. When capturing an image of the alignment mark, pulsed illumination light (that is, flash light) is irradiated from the illumination light source of the alignment section 3 onto the imaging region of the alignment camera 31 . Thereby, the alignment mark on the moving substrate 9 is imaged with high accuracy. As described above, in the calibration section 5 that passes below the alignment camera 31, the upper end of the calibration camera 53 is subjected to low reflection processing, so that the light reflected by the calibration camera 53 of the illumination light is reflected from the alignment camera 53. The incident on the camera 31 is suppressed or prevented.

The image including the alignment mark (that is, the alignment image) acquired by the alignment camera 31 is sent to the control unit 10 and stored in the storage unit 111 (see FIG. 5). The alignment information acquisition unit 115 obtains alignment information based on the alignment image. Then, based on the alignment information, the drawing control unit 116 performs alignment processing of the substrate 9 (step S14). In the alignment process, in order to match the position of the substrate 9 with a predetermined design position, for example, the stage 21 is shifted in the X direction and the Y direction (that is, moved by a small distance) or rotated, or the stage 21 is drawn on the substrate 9. The drawing data of the pattern to be drawn is corrected, etc.

When the above-mentioned alignment process is completed, the stage 21, which is located in the standby position, starts moving in the (-Y) direction. In the calibration unit 5, before the stage 21 starts moving in the (-Y) direction, the calibration camera 53 is moved in the X direction and retreats from vertically below the scale unit 52 to a retreat position on the (+X) or (-X) side. In other words, the retreat position is located on the (+X) or (-X) side of the position where the scale unit 52 is provided on the stage 21. This makes it possible to suppress or prevent the relatively high-intensity light used to draw the pattern from entering the calibration camera 53.

In the drawing apparatus 1, the substrate 9 held by the substrate holding part 25 passes below the drawing head 41, as shown in FIG. 7D. Then, the drawing control unit 116 (see FIG. 5) controls the drawing head 41 and the stage moving mechanism 22 based on the above-mentioned drawing data and correction information, so that the drawing head 41 is moved in the Y direction below the drawing head 41. The substrate 9 on the stage 21 is irradiated with modulated light from the drawing head 41 to draw a pattern (step S15).

In this embodiment, as described above, pattern drawing on the substrate 9 is performed using a multi-pass method. The pattern is drawn by irradiation with light. Further, when drawing a pattern on the substrate 9, it is preferable that two or more light sources out of the three light sources 421 to 423 (see FIG. 3) of the light source section 42 are used in each drawing head 41. Thereby, a suitable pattern can be drawn according to the type of photosensitive material on the substrate 9, etc.

When the drawing of the pattern on the substrate 9 is completed, the stage 21 is moved to the loading/unloading position shown in FIG. 7E (step S16). At this time, the calibration camera 53 is moved from the retracted position in the X direction and returned vertically below the scale section 52. This completes the pattern drawing on one substrate 9.

In the actual drawing apparatus 1, the process returns from step S16 to step S11, and steps S11 to S16 are repeated to sequentially draw patterns on a plurality of substrates 9. In the drawing apparatus 1, the calibration camera 53 acquires the inspection image (step S12) every time the substrate 9 is carried into the substrate holding section 25 (step S11), so that Even when pattern drawing is performed continuously, the accuracy of pattern drawing on the substrate 9 can be maintained at a high level.

In the drawing apparatus 1, the acquisition of correction information for all the drawing heads 41 (step S13) and the alignment process of the substrate 9 (step S14) need only be completed before drawing a pattern on the substrate 9 starts. Further, the end of step S13 may be before or after the end of step S14, or may be approximately the same time.

As described above, the drawing device 1 that draws a pattern by irradiating light onto the substrate 9 includes the stage 21, the drawing head 41, the main scanning mechanism (i.e., the first moving mechanism 23), and the scale section. 52, a calibration camera 53, a correction information acquisition section 114, and a drawing control section 116. The stage 21 is provided with a substrate holding section 25 that holds the substrate 9. The drawing head 41 irradiates the substrate 9 with modulated light. The first moving mechanism 23 moves the stage 21 relative to the drawing head 41 in the main scanning direction (Y direction in the above example) parallel to the upper surface 91 of the substrate 9 . The scale portion 52 is provided on the stage 21 adjacent to the substrate holding portion 25 in the main scanning direction. The calibration camera 53 images a predetermined calibration pattern irradiated from the drawing head 41 onto the scale part 52 in a state where the scale part 52 is located at a calibration position below the drawing head 41 . The correction information acquisition unit 114 obtains correction information used to correct the irradiation position of the light from the drawing head 41 based on the inspection image including the scale section 52 and the calibration pattern acquired by the calibration camera 53. The drawing control unit 116 controls the drawing head 41 and the first moving mechanism 23 based on the drawing data and correction information, thereby moving the substrate 9 relative to the drawing head 41 in the main scanning direction. Drawing on the substrate 9 is executed. In the drawing apparatus 1, the scale section 52 is located at the calibration position while the stage 21 is located at the loading/unloading position where the substrate 9 is loaded into/out of the substrate holding section 25. This makes it possible to calibrate the drawing head 41 in parallel with the loading and unloading of the substrate 9 into and out of the drawing apparatus 1. Therefore, the drawing head 41 can be calibrated while suppressing an increase in takt time.

As described above, it is preferable that the drawing device 1 further includes an alignment camera 31 and an alignment information acquisition section 115. The alignment camera 31 images the alignment mark on the substrate 9. The alignment information acquisition unit 115 obtains alignment information used for correcting the relative position of the substrate 9 with respect to the drawing head 41 based on the image of the alignment mark (that is, the alignment image) acquired by the alignment camera 31. In the main scanning direction, the alignment camera 31 is preferably located on the opposite side of the substrate holding section 25 of the stage 21 located at the loading/unloading position with the drawing head 41 in between. Thereby, the stage 21 can be made smaller in the main scanning direction compared to the case where the alignment camera 31 is located between the drawing head 41 and the substrate holder 25 of the stage 21 located at the loading/unloading position. As a result, the drawing device 1 can be downsized in the main scanning direction.

As described above, the drawing device 1 preferably further includes a support portion 40 that supports the drawing head 41 above the stage 21. The alignment camera 31 is also preferably supported by the support portion 40. This allows the structure of the drawing device 1 to be simplified and the drawing device 1 to be made smaller in size in the main scanning direction compared to when the support portion for the drawing head 41 and the support portion for the alignment camera 31 are provided separately. In addition, when the support portion for the drawing head 41 and the support portion for the alignment camera 31 are provided separately, the deviation in the relative positions of the drawing head 41 and the alignment camera 31 may become large due to differences in thermal deformation, etc., between the two support portions. However, as described above, by using the support portion 40, which is a single member, to support the drawing head 41 and the alignment camera 31 in common, the deviation in the relative positions of the drawing head 41 and the alignment camera 31 can be suppressed.

As described above, the scale section 52 is preferably a translucent scale member disposed on the upper surface of the stage 21. The calibration camera 53 is attached to the stage 21 below the translucent scale member, and images the calibration pattern transmitted through the translucent scale member. Preferably, the upper end of the calibration camera 53 is subjected to low reflection processing. This makes it possible to suppress reflected light from the calibration camera 53 (for example, reflected light from the frame of the objective lens) from entering the alignment camera 31 when the alignment camera 31 captures an image. Therefore, when the alignment camera 31 takes an image, there is no need to retreat the calibration camera 53 from below the scale section 52, so the takt time can be shortened.

As described above, preferably, the position of the calibration pattern on the scale section 52 in the main scanning direction can be changed by the drawing head 41 while the stage 21 is stationary. Thereby, even if the calibration pattern deviates relatively largely from a predetermined position on the scale section 52 in the main scanning direction, it is possible to image the calibration pattern without moving the stage 21. Therefore, it is possible to prevent an increase in takt time due to movement of the stage 21 during calibration.

As described above, the drawing head 41 preferably includes a plurality of light sources (light sources 421 to 423 in the above example) that emit light of different wavelengths. Furthermore, when drawing on the substrate 9, two or more of the plurality of light sources are used, and when irradiating the calibration pattern onto the scale section 52, only one of the plurality of light sources is used. preferable. Thereby, when drawing a pattern on the substrate 9, it is possible to select the light source to be used, the light amount ratio, etc. in accordance with the type of photosensitive material on the substrate 9, etc., and perform suitable pattern drawing. Furthermore, by setting the calibration camera 53 to match the wavelength of the light from the one light source, it is possible to accurately image the calibration pattern.

As described above, in the drawing apparatus 1, the plurality of drawing heads 41 are preferably arranged in an array direction parallel to the upper surface 91 of the substrate 9 and inclined with respect to the main scanning direction. The plurality of drawing heads 41 include the above-described drawing head 41, and each irradiates the substrate 9 with modulated light. Further, the calibration camera 53 moves the plurality of calibration patterns irradiated onto the scale part 52 from the plurality of drawing heads 41 in the above-mentioned arrangement direction while the scale part 52 is located at the calibration position. It is preferable to take images sequentially. Thereby, the structure of the drawing device 1 can be simplified and the manufacturing cost of the drawing device 1 can be reduced compared to the case where the calibration section 5 is provided with a plurality of calibration cameras.

As described above, the time required for acquiring the inspection image by the calibration camera 53 (step S12) is the time required for carrying out one substrate 9 from the substrate holding section 25 and carrying a new substrate 9 into the substrate holding section 25. Preferably, the time is shorter than necessary. Thereby, the movement of the stage 21 can be started immediately after the loading/unloading of the substrate 9 is completed. Therefore, increase in takt time due to calibration can be prevented.

As described above, it is preferable that the inspection image be acquired by the calibration camera 53 every time the substrate 9 is carried into the substrate holder 25. This makes it possible to achieve highly accurate drawing while suppressing an increase in takt time.

In the above-described drawing method, the stage 21 is provided with a substrate holding section 25 that holds the substrate 9 and a scale section 52 adjacent to the substrate holding section 25 in the main scanning direction parallel to the upper surface 91 of the substrate 9. A predetermined calibration pattern irradiated from the drawing head 41 is displayed on the scale part 52 located at the calibration position below the drawing head 41 while the substrate 9 is being carried in and out of the holding part 25 . (step S12); and a step of obtaining correction information used to correct the irradiation position of light from the drawing head 41 based on the inspection image including the scale portion 52 and the calibration pattern acquired in step S12. (Step S13), and a step of performing drawing on the substrate 9 by irradiating light modulated from the drawing head 41 based on the drawing data and correction information onto the substrate 9, which moves relative to the drawing head 41 in the main scanning direction. (Step S15). Thereby, similarly to the above, it is possible to calibrate the drawing head 41 while suppressing an increase in takt time.

Various modifications can be made to the above-described drawing device 1 and drawing method.

For example, in the light source section 42 of the drawing head 41, light may be emitted from two or more light sources even when capturing an inspection image. Further, the light source section 42 does not necessarily need to include a plurality of light sources, and may include only one light source.

In the drawing apparatus 1, the position of the calibration pattern on the scale section 52 in the Y direction does not necessarily need to be changed by the drawing head 41, and may be changed by moving the stage 21 in the Y direction.

In the drawing apparatus 1, the time required for acquiring an inspection image by the calibration camera 53 (step S12) is the same as the time required for carrying out one substrate 9 from the substrate holding section 25 and carrying a new substrate 9 into the substrate holding section 25. The time may be longer than the required time or may be approximately the same. In either case, the takt time can be shortened by carrying out the loading and unloading of the substrate 9 and the calibration of the drawing head 41 in parallel.

In the drawing device 1, in the imaging unit 51 of the calibration unit 5, a plurality of calibration cameras 53 (that is, the same number as the drawing heads 41) respectively corresponding to the plurality of drawing heads 41 are arranged vertically below the scale part 52 in the X direction. The inspection images of a plurality of drawing heads 41 may be obtained substantially simultaneously.

In the drawing device 1, the upper end of the calibration camera 53 does not necessarily need to be subjected to low reflection processing. In this case, when the alignment camera 31 acquires the alignment image, the calibration camera 53 may be retracted from vertically below the scale section 52 to the retracted position on the (+X) side or the (-X) side, if necessary. good.

In the drawing device 1, the retraction position of the calibration camera 53 does not necessarily have to be on the (+X) or (-X) side of the scale section 52. For example, the retraction position may be set to be between two adjacent drawing heads 41 in the X direction. In this case, the amount of movement in the X direction when the calibration camera 53 is retracted can be reduced compared to when the retraction position is set on the (+X) or (-X) side of the scale section 52, and the takt time can be further shortened.

In the drawing device 1, the drawing head 41 and the alignment camera 31 are not necessarily supported by one support part 40, but are each supported by two support parts that are separate members arranged apart in the Y direction. may be done.

In the drawing apparatus 1, the alignment camera 31 may be provided between the drawing head 41 and the substrate holder 25 of the stage 21 located at the loading/unloading position.

In the drawing device 1, the scale portion 52 does not necessarily need to have translucency, and the calibration camera 53 does not necessarily need to be attached to the stage 21. For example, the scale portion 52 may be a reflecting plate that reflects the light emitted from the drawing head 41 in a predetermined direction. The calibration camera 53 is fixed, for example, to the frame of the drawing device 1 at a position apart from the stage 21, and receives the reflected light from the scale part 52 to detect the calibration pattern irradiated onto the scale part 52. In addition, an inspection image including the scale on the scale section 52 may be captured.

The stage 21 may be moved by the first moving mechanism 23 relative to the drawing head 41 in the main scanning direction. Therefore, for example, the stage 21 may be fixed, and the drawing head 41 may be moved in the main scanning direction by the first moving mechanism 23 above the stage 21. Similarly, the drawing head 41 may be moved in the sub-scanning direction by the second moving mechanism 24.

In the drawing apparatus 1, it is not necessarily necessary to calibrate the drawing head 41 every time a substrate 9 is carried in. For example, the drawing head 41 may be calibrated every time a pattern is drawn on a predetermined number of two or more substrates 9. May be done.

The above-mentioned board 9 is not necessarily limited to a printed circuit board. The drawing device 1 prints patterns on, for example, semiconductor substrates, substrates for semiconductor packages, glass substrates for flat panel display devices such as liquid crystal displays and plasma display devices, glass substrates for photomasks, substrates for solar cell panels, etc. Drawing may also be performed.

The configurations of the above embodiment and each modification may be combined as appropriate unless mutually contradictory.

1 Drawing device 9 Substrate 21 Stage 23 First moving mechanism 25 Substrate holding section 31 Alignment camera 40 Support section 41 Drawing head 51 Imaging section 52 Scale section 53 Calibration camera 91 Top surface (of substrate) 114 Correction information acquisition section 115 Alignment information acquisition Section 116 Drawing control section 421-423 Light source S11-S16 Step

Claims (10)

A drawing device that draws a pattern by irradiating a substrate with light,
a stage provided with a substrate holder that holds the substrate;
a drawing head that irradiates the substrate with modulated light;
a main scanning mechanism that moves the stage relative to the drawing head in a main scanning direction parallel to the upper surface of the substrate;
a scale section provided on the stage adjacent to the substrate holding section in the main scanning direction;
a calibration camera that images a predetermined calibration pattern irradiated from the drawing head to the scale part in a state where the scale part is located at a calibration position below the drawing head;
a correction information acquisition unit that obtains correction information used to correct the irradiation position of light from the drawing head based on an inspection image including the scale portion and the calibration pattern obtained by the calibration camera;
By controlling the drawing head and the main scanning mechanism based on the drawing data and the correction information, the drawing head performs drawing on the substrate while moving the substrate relative to the drawing head in the main scanning direction. A drawing control unit to execute,
Equipped with
The drawing apparatus is characterized in that the scale section is located at the calibration position while the stage is located at a loading/unloading position where a substrate is loaded into/out of the substrate holding section. The drawing device according to claim 1,
an alignment camera that images the alignment mark on the substrate;
an alignment information acquisition unit that obtains alignment information for use in correcting the relative position of the substrate with respect to the drawing head, based on an image of the alignment mark acquired by the alignment camera;
Furthermore,
The drawing apparatus is characterized in that the alignment camera is located on the opposite side of the substrate holder of the stage located at the loading/unloading position, with the drawing head in between, with respect to the main scanning direction. The drawing device according to claim 2,
a support portion for supporting the imaging head above the stage,
The imaging device is characterized in that the alignment camera is also supported by the support portion. The drawing device according to claim 1,
The scale part is a translucent scale member disposed on the upper surface of the stage,
The calibration camera is attached to the stage below the transparent scale member, and images the calibration pattern transmitted through the transparent scale member,
A drawing device characterized in that an upper end portion of the calibration camera is subjected to low reflection processing. The drawing device according to claim 1,
A drawing apparatus, wherein the position of the calibration pattern on the scale in the main scanning direction can be changed by the drawing head while the stage is stationary. The drawing device according to claim 1,
The drawing head includes a plurality of light sources that emit light of different wavelengths,
Two or more light sources among the plurality of light sources are used when drawing on the substrate,
A drawing device, wherein only one light source among the plurality of light sources is used when irradiating the calibration pattern onto the scale portion. The drawing device according to claim 1,
A plurality of drawing heads including the drawing head and each of which irradiates the substrate with modulated light are arranged in an arrangement direction parallel to the upper surface of the substrate and inclined with respect to the main scanning direction,
The calibration camera sequentially images a plurality of calibration patterns irradiated from the plurality of drawing heads onto the scale part while moving in the arrangement direction, with the scale part located at the calibration position. A drawing device characterized by: The drawing device according to any one of claims 1 to 7,
The time required for acquisition of the inspection image by the calibration camera is shorter than the time required to carry out one substrate from the substrate holder and carry a new substrate into the substrate holder. drawing device. The drawing device according to any one of claims 1 to 7,
The drawing apparatus, wherein the inspection image is acquired by the calibration camera each time a substrate is carried into the substrate holding section. A method for drawing a pattern by irradiating a substrate with light, comprising the steps of:
a) imaging a predetermined calibration pattern irradiated from a drawing head onto the scale portion located at a calibration position below a drawing head, while a stage having a substrate holding portion for holding a substrate and a scale portion adjacent to the substrate holding portion in a main scanning direction parallel to an upper surface of the substrate is located at a transfer position where the substrate is transferred into and out of the substrate holding portion;
b) determining correction information used to correct an irradiation position of light from the drawing head based on an inspection image including the scale portion and the calibration pattern acquired in the a) step;
c) performing drawing on the substrate by irradiating the substrate with light modulated from the drawing head based on drawing data and the correction information, the substrate being moved relative to the drawing head in the main scanning direction;
A drawing method comprising:

Images