KR20240038572A - Drawing apparatus and Drawing method - Google Patents

Abstract

A substrate holding portion 25 that holds the substrate 9 is formed on the stage 21 of the drawing device 1. The drawing head 41 irradiates the substrate 9 with modulated light. The scale portion 52 is formed on the stage 21 adjacent to the substrate holding portion 25 in the main scanning direction. The calibration camera 53 captures an image of a predetermined calibration pattern projected onto the scale 52 from the drawing head 41, with the scale 52 positioned at the calibration position below the drawing head 41. . In the drawing device 1, the stage 21 is positioned at the loading/unloading position where the substrate 9 is loaded/unloaded into/out of the substrate holding unit 25, and the scale unit 52 is positioned at the calibration position. Thereby, the drawing head 41 can be calibrated while suppressing an increase in the tact time.

Description

Drawing apparatus and drawing method}

The present invention relates to a technique for drawing a pattern by irradiating light to a substrate.

[Reference to related applications]

This application claims the benefit of priority from Japanese patent application JP2022-148502 filed on September 16, 2022, and all disclosures of this application are hereby incorporated by reference.

Conventionally, in drawing a pattern on a printed circuit board or semiconductor substrate (hereinafter referred to as “substrate”), modulated light is irradiated onto a photosensitive material formed on the substrate, and the pattern is directly drawn by scanning the irradiated area of the light. A drawing device for drawing is used.

In such a drawing device, the irradiation position of the light from the drawing head on the substrate changes due to an increase in the temperature of the drawing head or a temperature change around the device with the passage of time from the start of drawing, so that the light drawn on the substrate is changed. There are cases where pattern misalignment occurs. Therefore, in Japanese Patent Laid-Open No. 2014-197136 (Document 1), a calibration method is proposed in which variation data of the irradiation position due to temperature changes is acquired in advance and the irradiation position is corrected according to the measured temperature. However, in indirect calibration using temperature as an indicator, calibration accuracy may be insufficient.

Meanwhile, unlike the case where the variation in the irradiation position is indirectly obtained from temperature as in Document 1, a calibration method is also known in which the variation in the irradiation position is directly obtained by observing the light from the drawing head with a camera. In this case, calibration is performed by moving the stage on which the substrate is placed and positioning the camera vertically below the drawing head. After calibration is completed, the stage is moved vertically below the drawing head to perform drawing on the substrate. is implemented. Therefore, a relatively long time is required for one calibration. For this reason, from the viewpoint of shortening the tact time (i.e., the time required for drawing work on one board, also called cycle time), it is difficult to perform calibration every time drawing on one board is completed, and Calibration was performed every time the drawing time elapsed or whenever drawing on a predetermined number of two or more substrates was completed.

However, in the above-described drawing device, further improvement in drawing position accuracy is desired, and while it is necessary to increase the frequency of calibration, there is also a need to suppress a decrease in productivity. Therefore, it is required to calibrate the drawing head while suppressing the increase in tact time.

The present invention relates to a drawing device that draws patterns by irradiating light to a substrate, and its purpose is to calibrate a drawing head while suppressing an increase in tact time.

Embodiment 1 of the present invention is a drawing device for drawing a pattern by irradiating light to a substrate, comprising a stage on which a substrate holding portion for holding a substrate is formed, a drawing head for irradiating modulated light to the substrate, and a main scanning mechanism that moves the stage relative to the drawing head in the main scanning direction parallel to the upper surface; a graduation portion formed on the stage adjacent to the substrate holding portion and the main scanning direction; and the graduation portion comprising: A calibration camera that captures an image of a predetermined calibration pattern projected onto the scale from the drawing head while positioned at a calibration position below the drawing head, and the scale and the calibration pattern acquired by the calibration camera. a drawing information acquisition unit that obtains correction information used for correction of an irradiation position of light from the drawing head based on the inspection image, and controlling the drawing head and the main scanning mechanism based on drawing data and the correction information, and a drawing control unit that causes the drawing head to execute drawing on the substrate while moving the substrate relative to the drawing head in the main scanning direction. With the stage positioned at the loading/unloading position where the substrate is loaded/unloaded into/out of the substrate holding unit, the scale portion is positioned at the calibration position.

According to the present invention, the drawing head can be calibrated while suppressing an increase in tact time.

Aspect 2 of the present invention is the drawing device of Aspect 1, wherein the drawing device includes an alignment camera for imaging an alignment mark on the substrate, and, based on the image of the alignment mark acquired by the alignment camera, the drawing head. It is further provided with an alignment information acquisition unit that obtains alignment information used for correction of the relative position of the substrate. The alignment camera is located on the opposite side of the substrate holding portion of the stage located at the loading/unloading position across the drawing head in the main scanning direction.

Aspect 3 of the present invention is the drawing device of Aspect 2, wherein the drawing device further includes a support portion for supporting the drawing head above the stage. The alignment camera is also supported by the support portion.

Aspect 4 of the present invention is the drawing device of Aspect 1 (any one of Aspects 1 to 3 may be used), wherein the scale portion is a translucent scale member disposed on the upper surface of the stage. The calibration camera is mounted on the stage below the translucent scale member and captures an image of the calibration pattern transmitted through the translucent scale member. Low-reflection processing is performed on the upper part of the calibration camera.

Aspect 5 of the present invention is the drawing device of Aspect 1 (which may be any one of Aspects 1 to 4), wherein the position of the calibration pattern on the scale portion in the main scanning direction is determined when the stage is stopped. This state can be changed by the drawing head.

Aspect 6 of the present invention is the drawing device of Aspect 1 (any one of Aspects 1 to 5 may be used), wherein the drawing head is provided with a plurality of light sources that emit light of different wavelengths. When drawing on the substrate, two or more light sources among the plurality of light sources are used. When irradiating the calibration pattern to the scale portion, only one light source among the plurality of light sources is used.

Aspect 7 of the present invention is the drawing device of Aspect 1 (any one of Aspects 1 to 6 may be used), comprising the drawing head and a plurality of drawing heads, each of which irradiates modulated light to the substrate, They are arranged in an array direction that is parallel to the upper surface of the substrate and inclined with respect to the main scanning direction. With the scale positioned at the calibration position, the calibration camera sequentially captures a plurality of calibration patterns respectively irradiated from the plurality of drawing heads to the scale while moving in the arrangement direction.

Aspect 8 of the present invention is the drawing device according to any one of Aspects 1 to 7, wherein the time required for acquisition of the inspection image by the calibration camera is such that one substrate is unloaded from the substrate holding unit and a new substrate is installed. It is shorter than the time required to load the substrate into the holding unit.

Aspect 9 of the present invention is the drawing device of any one of Aspects 1 to 7 (either Aspect 1 to 8 may be used), wherein the acquisition of the inspection image by the calibration camera includes loading of the substrate into the substrate holding unit. It is carried out every time.

The present invention also relates to a drawing method in which a pattern is drawn by irradiating light to a substrate. Aspect 10 of the present invention is a drawing method in which a pattern is drawn by irradiating light to a substrate, comprising: a) a substrate holding portion that holds a substrate; and a main scanning direction parallel to the upper surface of the substrate. In a state where a stage on which an adjacent scale part is formed is located at a loading/unloading/unloading position where a substrate is loaded/unloaded into/out of the substrate holding unit, a predetermined amount irradiated from the drawing head is applied to the scale unit located at a calibration position below the drawing head. a step of imaging a calibration pattern, and b) correction information used to correct an irradiation position of light from the drawing head based on an inspection image including the scale portion and the calibration pattern acquired in the step a). and c) irradiating light modulated from the drawing head based on drawing data and the correction information to the substrate moving relative to the drawing head in the main scanning direction to perform drawing on the substrate. Have a process in place.

The above-described object and other objects, features, aspects and advantages will become clear from the detailed description of the present invention below with reference to the attached drawings.

1 is a perspective view showing a drawing device according to one embodiment.
Figure 2 is an enlarged plan view showing the vicinity of the calibration unit.
Fig. 3 is a diagram showing the internal configuration of the calibration unit and the drawing head.
Figure 4 is a diagram showing the configuration of a computer.
Figure 5 is a block diagram showing the function of the control unit.
Figure 6 is a diagram showing the flow of pattern drawing.
Fig. 7A is a front view schematically showing the main configuration of the drawing device.
Fig. 7B is a front view schematically showing the main configuration of the drawing device.
Fig. 7C is a front view schematically showing the main configuration of the drawing device.
Fig. 7D is a front view schematically showing the main configuration of the drawing device.
Fig. 7E is a front view schematically showing the main configuration of the drawing device.

Fig. 1 is a perspective view showing a drawing device 1 according to one embodiment of the present invention. The drawing device 1 is a direct drawing device that irradiates spatially modulated approximately beam-shaped light to a photosensitive material on the substrate 9 and scans the irradiated area of the light on the substrate 9 to draw a pattern. In Fig. 1, three directions orthogonal to each other are indicated by arrows as the X direction, Y direction, and Z direction. In the example shown in FIG. 1, the X direction and Y direction are horizontal directions perpendicular to each other, and the Z direction is a vertical direction (i.e., up and down direction). The same applies to other drawings.

The substrate 9 is, for example, a printed board in the shape of a substantially rectangular flat plate. On the main surface (hereinafter also referred to as “upper surface 91”) on the (+Z) side of the substrate 9, a resist film formed of a photosensitive material is formed on the copper layer. In the drawing device 1, a circuit pattern is drawn (that is, formed) on the resist film of the substrate 9. Additionally, the type and shape of the substrate 9 may be changed in various ways.

As shown in FIG. 1, the drawing device 1 includes a stage 21, a stage moving mechanism 22, an alignment unit 3, a drawing unit 4, a calibration unit 5, and a control unit. (10) is provided. The control unit 10 controls the stage moving mechanism 22, the alignment unit 3, the drawing unit 4, the calibration unit 5, etc.

The stage 21 is a substantially rectangular flat member disposed below the alignment unit 3 and the drawing unit 4 (that is, on the (-Z) side). The stage 21 is provided with a substrate holding portion 25 that holds the substrate 9 in a horizontal state from below. The substrate holding portion 25 is, for example, a vacuum chuck that attracts and holds the lower surface of the substrate 9. The substrate holding portion 25 may have a structure other than a vacuum chuck, and may be, for example, a mechanical chuck. The upper surface 91 of the substrate 9 placed on the substrate holding portion 25 is substantially perpendicular to the Z direction and substantially parallel to the X and Y directions.

The stage moving mechanism 22 moves the stage 21 relative to the alignment unit 3 and the drawing unit 4 in a horizontal direction (i.e., a direction substantially parallel to the upper surface 91 of the substrate 9). It is a moving device that The stage moving mechanism 22 includes a first moving mechanism 23 and a second moving mechanism 24. The second moving mechanism 24 moves the stage 21 linearly in the X direction along the guide rail. The first moving mechanism 23 moves the stage 21 linearly in the Y direction along the guide rail together with the second moving mechanism 24. The drive source of the first moving mechanism 23 and the second moving mechanism 24 is, for example, a linear servo motor or a motor mounted on a ball screw. The structures of the first moving mechanism 23 and the second moving mechanism 24 may be changed in various ways.

In the drawing device 1, a stage rotation mechanism that rotates the stage 21 around a rotation axis extending in the Z direction may be provided. Additionally, a stage elevating mechanism that moves the stage 21 in the Z direction may be provided in the drawing device 1. As a stage rotation mechanism, for example, a servo motor can be used. As a stage elevating mechanism, for example, a linear servo motor can be used. The structures of the stage rotation mechanism and the stage elevating mechanism may be changed in various ways.

The alignment unit 3 is provided with a plurality of alignment cameras 31 (two in the example shown in FIG. 1) arranged in the X direction. Each alignment camera 31 is supported above the stage 21 and the stage moving mechanism 22 by a head support portion 40 formed across the stage 21 and the stage moving mechanism 22. The support portion 40 is a single member formed at one position in the Y direction. In the example shown in FIG. 1, the support portion 40 is a door-shaped member (so-called gantry) that spans the stage 21 and the stage moving mechanism 22.

In the example shown in FIG. 1, the two alignment cameras 31 are mounted on the (+Y) side side of the support portion 40. Among the two alignment cameras 31, for example, one alignment camera 31 is fixed to the support part 40, and the other alignment camera 31 is on the support part 40 and can move in the X direction. do. Thereby, the distance in the X direction between the two alignment cameras 31 can be changed. Additionally, the number of alignment cameras 31 in the alignment unit 3 may be one or three or more.

Each alignment camera 31 is provided with an imaging element and an optical system (not shown). Each alignment camera 31 is, for example, an area camera that acquires a two-dimensional image. In each alignment camera 31, reflected light of illumination light guided from an illumination light source (not shown) to the upper surface 91 of the substrate 9 is guided to the imaging element through an optical system. The imaging device receives reflected light from the upper surface 91 of the substrate 9 and acquires an image of a substantially rectangular imaging area. The alignment camera 31 images an alignment mark (not shown) previously formed on the upper surface 91 of the substrate 9. As the illumination light source, various light sources such as LED (Light Emitting Diode) can be used. Additionally, the alignment camera 31 may be another type of camera such as a line camera.

An image containing an alignment mark acquired by the alignment camera 31 (hereinafter also referred to as an “alignment image”) is sent to the control unit 10 shown in FIG. 1 . In the control unit 10, alignment of the substrate 9 (that is, correction of the relative position of the substrate 9 with respect to the drawing head 41, which will be described later) is performed based on the alignment image.

The drawing unit 4 is provided with a plurality of drawing heads 41 (six in the example shown in FIG. 1) arranged in the X direction. The plurality of drawing heads 41 have substantially the same structure. Each drawing head 41 is provided with a spatial light modulator that radiates modulated (that is, spatially modulated) light downward. Each drawing head 41 is supported above the stage 21 and the stage moving mechanism 22 by the support portion 40 described above. In the example shown in FIG. 1 , six drawing heads 41 are mounted on the side surface of the support portion 40 on the (-Y) side. In other words, the six drawing heads 41 are arranged on the opposite side from the two alignment cameras 31 described above with the support part 40 in between in the Y direction. In other words, the two alignment cameras 31 are located on the opposite side of the substrate holding portion 25 of the stage 21 located at the loading/unloading position described later, with the six drawing heads 41 sandwiched between them in the Y direction. It is located in

In the example shown in FIG. 1, the six drawing heads 41 are arranged in a substantially straight line substantially parallel to the X direction. Additionally, the distance in the Z direction between the six drawing heads 41 and the upper surface 91 of the substrate 9 on the stage 21 is approximately the same. In other words, the arrangement direction of the six drawing heads 41 is approximately parallel to the upper surface 91 of the substrate 9 and is approximately perpendicular to the Y direction. In other words, the positions of the six drawing heads 41 in the Y direction and the Z direction are approximately the same.

In addition, the arrangement direction of the above-mentioned drawing head 41 may be a direction inclined with respect to the Y direction, and does not necessarily need to be parallel to the X direction. In the drawing unit 4, the plurality of drawing heads 41 do not necessarily need to be arranged in a straight line, but may be arranged in a zigzag shape, for example. Additionally, in the drawing unit 4, the number of drawing heads 41 may be one or two or more.

In the drawing device 1, pattern drawing on the substrate 9 is performed by a so-called multi-pass method. Specifically, while irradiating light modulated from the plurality of drawing heads 41 of the drawing unit 4 onto the upper surface 91 of the substrate 9, the first moving mechanism 23 of the stage moving mechanism 22 The substrate 9 is moved in the Y direction and passed below the drawing head 41. As a result, the area irradiated with light from the plurality of drawing heads 41 is scanned in the Y direction on the substrate 9, and drawing on the substrate 9 is performed. Next, the second moving mechanism 24 moves the substrate 9 in steps by a predetermined distance in the X direction. Then, movement of the substrate 9 in the Y direction by the first movement mechanism 23 and irradiation of light from the drawing head 41 to the substrate 9 in parallel with the movement are performed again, and the substrate 9 ) Drawing is carried out. In the drawing device 1, irradiation of light to the substrate 9 moving in the Y direction and step movement of the substrate 9 in the X direction are performed alternately to draw a pattern on the substrate 9. do.

In the following description, the Y direction is also called the “main scanning direction” and the X direction is also called the “sub-scanning direction.” The main scanning direction and the sub-scanning direction are directions substantially parallel to the upper surface 91 of the substrate 9. In the stage moving mechanism 22, the first moving mechanism 23 is a main scanning mechanism that moves the stage 21 relative to the drawing head 41 in the main scanning direction. Additionally, the second moving mechanism 24 is a sub-scanning mechanism that moves the stage 21 relative to the drawing head 41 in the sub-scanning direction. In addition, in the drawing device 1, a single pass method (also called a one-pass method) is used in which drawing of a pattern on the substrate 9 is completed by moving the substrate 9 relative to the drawing head 41 in the Y direction only once. Drawing on the substrate 9 may be performed. In this case, when drawing a pattern, sub-scanning (that is, step movement in the X direction) of the substrate 9 by the second movement mechanism 24 is not performed.

The calibration unit 5 is formed on the stage 21 on the (+Y) side of the substrate holding unit 25. The calibration unit 5 is used for calibration of the drawing head 41 (that is, measurement and correction of the irradiation position of light from the drawing head 41).

FIG. 2 is an enlarged plan view showing the vicinity of the calibration unit 5 of the drawing device 1. Fig. 3 is a front view showing the configuration of the calibration unit 5 and the drawing head 41. FIG. 3 shows a state in which the drawing head 41 is positioned vertically above the calibration unit 5. FIG. 3 shows the internal configuration of the stage 21 and the internal configuration of one drawing head 41. The structure of the other drawing head 41 is substantially the same as that of the one drawing head 41.

As shown in FIG. 3, the drawing head 41 includes a light source unit 42, an illumination optical system 43, a spatial light modulator 44 (hereinafter also simply referred to as the “light modulator 44”), and a projection It is provided with an optical system (45). The light emitted from the light source unit 42 is guided to the light modulator 44 by the illumination optical system 43, modulated by the light modulator 44, and then directed below the drawing head 41 by the projection optical system 45. (i.e., (-Z) direction).

The light source unit 42 includes a plurality of light sources that emit light of different wavelengths. In the example shown in FIG. 3, the light source unit 42 is provided with three light sources 421 to 423. As the light sources 421 to 423, various light sources such as LD (Laser Diode) can be used. When drawing a pattern on the substrate 9, for example, two or more light sources among the light sources 421 to 423 are used according to the type of photosensitive material on the substrate 9. Additionally, the number of light sources formed in the light source unit 42 may be one, two, or four or more. The light source formed in the light source unit 42 is not limited to LD, and various types of light sources can be used.

The illumination optical system 43 and the projection optical system 45 each include optical elements such as a plurality of lenses (not shown). The optical modulator 44 includes various optical modulators such as DMD (Digital Micro Mirror Device) and GLV (Grating Light Valve) (registered trademark of Silicon Light Machines (Sunnyvale, California)). Available. The light modulator 44 is not limited to the above example, and various types are available.

The calibration unit 5 includes an imaging unit 51 and a scale unit 52. The scale portion 52 is a substantially flat member formed on the stage 21. The scale portion 52 is disposed on the upper surface of the stage 21 and adjacent to the (+Y) side of the substrate holding portion 25 (that is, disposed close to it). In the example shown in FIG. 2, the scale portion 52 is a substantially rectangular strip-shaped member extending substantially parallel to the X direction and is transparent. On the main surface of the scale portion 52 on the (+Z) side, a plurality of scales are formed to indicate positions in the X direction on the main surface. In other words, the scale portion 52 is a light-transmitting scale member, for example, a substantially transparent glass scale. The scale of the scale portion 52 is, for example, a cross pattern or a pattern of another shape. Additionally, the graduation portion 52 may be a translucent member.

The imaging unit 51 is mounted inside the stage 21 below the scale unit 52. The imaging unit 51 includes a calibration camera 53 and a camera moving mechanism 54. The calibration camera 53 is arranged vertically below the scale portion 52 toward upward. The calibration camera 53 is a digital camera that has, for example, a CCD (Charged Coupled Devices) or a CMOS (Complementary Metal Oxide Semiconductor) as an imaging element. Additionally, the type and performance of the calibration camera 53 may be set appropriately.

Low-reflection processing is applied to the upper part of the calibration camera 53 (that is, the part that faces the drawing head 41 through the scale part 52). Specifically, for example, an antireflection film for reducing reflectance is attached to the frame of the objective lens of the calibration camera 53. Accordingly, when capturing images using the alignment camera 31, it is possible to suppress the reflected light from the calibration camera 53 from being captured unintentionally. Additionally, the low-reflection processing may be performed using various structures and methods other than anti-reflection films.

The camera moving mechanism 54 is a moving mechanism that moves the calibration camera 53 linearly in the X direction along the guide rail within the stage 21. The driving source of the camera moving mechanism 54 is, for example, a linear servo motor or a motor mounted on a ball screw. The structure of the camera moving mechanism 54 may be changed in various ways.

In the drawing device 1, the calibration camera 53 is moved by the camera moving mechanism 54 in a state where a plurality of drawing heads 41 are positioned vertically above the scale section 52 of the calibration section 5. and is placed vertically below one drawing head 41 that is the target of calibration. From this one drawing head 41, a predetermined calibration pattern (that is, a pattern used for calibration of the drawing head 41) is emitted toward the scale portion 52. The calibration pattern is, for example, a cross-shaped pattern. The shape of the calibration pattern may be changed in various ways as long as it is a shape that allows calculation of the center of gravity position.

The calibration camera 53 displays an irradiation area (i.e., a calibration pattern) of light from the drawing head 41 on the scale unit 52 together with the scales formed in advance on the scale unit 52, An image is captured through the graduation portion 52 from below. In other words, the calibration camera 53 images the calibration pattern transmitted through the scale portion 52 together with the scale. The image acquired by the calibration camera 53 (hereinafter also referred to as “inspection image”) is sent to the control unit 10 shown in FIG. 1. The control unit 10 performs calibration of the one drawing head 41 based on the inspection image. Additionally, when calibration of another drawing head 41 is performed, the calibration camera 53 is moved in the Calibration is performed in order.

FIG. 4 is a diagram showing the configuration of the computer 100 functioning as the control unit 10. The computer 100 is a typical computer equipped with a processor 101, a memory 102, an input/output unit 103, and a bus 104. The bus 104 is a signal circuit that connects the processor 101, the memory 102, and the input/output unit 103. The memory 102 stores programs and various information. The processor 101 executes various processes (for example, numerical calculations and image processing) while using the memory 102 and the like, according to programs stored in the memory 102 and the like. The input/output unit 103 includes a keyboard 105 and mouse 106 that accept input from the operator, and a display 107 that displays output from the processor 101, etc. Additionally, the control unit 10 may be a programmable logic controller (PLC), a circuit board, or the like, or may be a combination of these and one or more computers.

FIG. 5 is a block diagram showing the functions of the control unit 10 realized by the computer 100. In Figure 5, configurations other than the control unit 10 are also shown. The control unit 10 includes a storage unit 111, an imaging control unit 112, a position detection unit 113, a correction information acquisition unit 114, an alignment information acquisition unit 115, and a drawing control unit 116. is provided. The storage unit 111 is mainly realized by the memory 102 and stores in advance various information such as data of a pattern scheduled to be drawn on the substrate 9 (i.e., drawing data). The imaging control unit 112, position detection unit 113, correction information acquisition unit 114, alignment information acquisition unit 115, and drawing control unit 116 are mainly realized by the processor 101.

The imaging control unit 112 controls the drawing head 41 and the imaging unit 51 to transfer the calibration pattern previously stored in the storage unit 111 from the drawing head 41 to the scale unit 52 (FIGS. 2 and 2). 3), and the above-described inspection image for calibration is acquired by the imaging unit 51. The inspection image is sent from the imaging unit 51 to the control unit 10 and stored in the storage unit 111.

The position detection unit 113 determines the irradiation position of light from the drawing head 41 on the scale unit 52 based on the inspection image including the image of the scale unit 52 and the calibration pattern (hereinafter referred to as “ (also called “measurement position”) is obtained. As described above, since the scale portion 52 is fixed on the stage 21, the relative position of the scale portion 52 with respect to the substrate holding portion 25 is also fixed. Therefore, by detecting the irradiation position of the calibration pattern on the plurality of scales of the scale unit 52, the relative position of the irradiation position of the light emitted from the drawing head 41 with respect to the substrate holding unit 25 is obtained. .

The correction information acquisition unit 114 provides correction information used to correct the irradiation position of the light from the drawing head 41 on the substrate 9, based on the measurement position obtained by the position detection unit 113. Save. Specifically, the measurement position is compared with the designed irradiation position (hereinafter also referred to as “design position”) on the scale 52 of the calibration pattern irradiated from the drawing head 41, and the measurement position and The distance in the X direction and Y direction between the design positions (that is, the amount of deviation from the design position) is obtained. Based on the amount of deviation, the correction information acquisition unit 114 obtains correction information for correcting the irradiation position of the light from the drawing head 41 to match the designed position. The correction information is, for example, information for correcting the drawing data of the pattern drawn on the substrate 9 according to the amount of deviation. Alternatively, the correction information may be information for correcting the movement of the substrate 9 by the stage moving mechanism 22 when drawing a pattern on the substrate 9.

The alignment information acquisition unit 115 determines the image of the substrate 9 based on the image of the above-described alignment mark (hereinafter also referred to as “alignment image”) acquired by the alignment camera 31 of the alignment unit 3. Alignment information used for alignment (that is, correction of the relative position of the substrate 9 with respect to the drawing head 41) is acquired. Specifically, based on the position of the alignment mark in the alignment image, the position of the substrate 9 on the substrate holding portion 25 is determined, and the position of the substrate 9 on the substrate holding portion 25 is determined. The amount of deviation from the design position is obtained. In other words, the amount of deviation of the relative position of the substrate 9 with respect to the drawing head 41 from the designed position is determined. Based on the amount of misalignment, the alignment information acquisition unit 115 obtains alignment information for correcting the relative position of the substrate 9 with respect to the drawing head 41 to match the design position. The alignment information is information for correcting movement of the substrate 9 by the stage moving mechanism 22, for example, when drawing a pattern on the substrate 9. Alternatively, the alignment information may be information for correcting the drawing data of the pattern drawn on the substrate 9 according to the amount of deviation.

The drawing control unit 116 is based on the drawing data stored in the storage unit 111, the correction information obtained by the correction information acquisition unit 114, and the alignment information obtained by the alignment information acquisition unit 115, etc. By controlling the drawing head 41 and the stage moving mechanism 22, the drawing head 41 is made to perform drawing on the substrate 9 while moving the substrate 9 relative to the drawing head 41.

Next, pattern drawing by the drawing device 1 will be described with reference to FIG. 6 and FIGS. 7A to 7E. FIG. 6 is a diagram showing an example of the flow of pattern drawing on the substrate 9. 7A to 7E are front views schematically showing the main configuration of the drawing device 1 in order to explain the operation of the drawing device 1. In FIGS. 7A to 7E, the internal configuration of the stage 21 is also shown by a solid line.

When writing on the substrate 9, the stage 21 is first positioned at the position shown in Fig. 7A. In the following description, the position of the stage 21 shown in FIG. 7A in the Y direction is also called the “carrying in and out position.” In the drawing device 1, with the stage 21 positioned at the loading/unloading position, the substrate 9 on which drawing in the drawing device 1 has already been completed is placed on the stage 21 as indicated by the two-dot chain line. It is carried out of the drawing device 1. Additionally, a new substrate 9 (that is, a substrate 9 on which drawing is to be performed by the drawing device 1) is carried into the drawing device 1 and placed on the stage 21 of the substrate holding unit 25. It is maintained (step S11). That is, in step S11, the board|substrate 9 is carried in and out of the board|substrate holding part 25 with the stage 21 located at the carrying-in/out position. The loading and unloading of the substrate 9 may be carried out, for example, by a loading and unloading device (not shown), or may be carried out manually by a worker. In a state in which the stage 21 is located at the loading/unloading position, the substrate holding unit 25 includes a plurality of drawing heads 41 and a plurality of drawing heads 41 of the drawing unit 4 mounted on the support unit 40 (see FIG. 1). It is located on the (-Y) side of the alignment camera (31).

In the state shown in FIG. 7A, the scale part 52 of the calibration unit 5 is located vertically below the drawing head 41. In the following description, the Y-direction position of the scale portion 52 shown in FIG. 7A is also called a “calibration position.” In the drawing device 1, in a state where the stage 21 is positioned at the loading/unloading position and the scale portion 52 is positioned at the calibration position, in parallel with the loading/unloading of the substrate 9 in step S11, a plurality of Calibration of the drawing head 41 is performed.

Specifically, the calibration camera 53 is moved by the camera moving mechanism 54 (see FIGS. 2 and 3) and placed vertically below one drawing head 41 that is a calibration target. Then, the light source unit 42 and the light modulator 44 (see FIG. 3) of the drawing head 41 are controlled by the control unit 10, thereby transmitting the above-described information from the drawing head 41 to the scale unit 52. One calibration pattern is investigated. In the light source unit 42, when irradiating a calibration pattern, only one predetermined light source is used among the light sources 421 to 423 (see FIG. 3) described above. Thereby, the calibration pattern on the scale 52 is formed by light of a single wavelength.

The calibration camera 53 captures the calibration pattern illuminated on the scale unit 52 located at the calibration position together with the scale of the scale unit 52 to obtain an inspection image. The acquired inspection image is sent to the control unit 10 and stored in the storage unit 111 (see FIG. 5).

When acquiring an inspection image, there are cases where the calibration pattern deviates relatively significantly in the Y direction and is out of the field of view of the calibration camera 53. In this case, the position in the Y direction of the calibration pattern on the scale portion 52 is corrected so that the calibration pattern falls within the field of view of the calibration camera 53, and then the inspection image is acquired. Position correction in the Y direction of the calibration pattern is performed by the drawing head 41 with the stage 21 stopped (that is, without moving the stage 21 in the Y direction).

Specifically, for example, data of a plurality of calibration patterns with different positions in the Y direction are stored in advance in the storage unit 111, and the positions of the calibration patterns on the scale unit 52 are toward the (+Y) side. If there is a deviation, data whose calibration pattern is located on the (-Y) side of the current data is exchanged with the current data. Then, by controlling the drawing head 41 based on the exchanged data, the position of the calibration pattern on the scale portion 52 is moved to the (-Y) side.

As a result, desirable imaging of the calibration pattern is possible without moving the stage 21 (i.e., without moving the scale section 52), so the time required for calibration of the drawing head 41 can be shortened. there is. In addition, as described above, since the calibration of the drawing head 41 is performed in parallel with the loading and unloading of the substrate 9, there is no adverse effect on the loading and unloading of the substrate 9 due to the movement of the stage 21 (e.g. For example, interruption of loading/unloading operations while the stage 21 is moving is prevented from occurring. In addition, changing the position of the calibration pattern by the drawing head 41 is not limited to the method described above and may be performed by other methods.

Subsequently, the calibration camera 53 is moved in the is placed in Then, similarly to the above, the calibration pattern irradiated to the scale portion 52 is imaged from the next drawing head 41, and an inspection image of the next drawing head 41 is acquired. In the drawing device 1, inspection images are sequentially acquired for all drawing heads 41 of the drawing unit 4 by the calibration camera 53 (step S12). In other words, the one calibration camera 53 applies a plurality of calibration patterns, respectively irradiated from the plurality of drawing heads 41 to the scale portion 52, in the X direction (i.e., the arrangement of the plurality of drawing heads 41). Take images sequentially while moving in each direction.

In the drawing device 1, the time required for step S12 (i.e., the time required to acquire all inspection images of the plurality of drawing heads 41) is the time required to transfer one substrate 9 to the substrate holding unit 25 in step S11. ) and is preferably shorter than the time required to load the new substrate 9 into the substrate holding section 25. Additionally, in the drawing device 1, when acquiring an inspection image of one drawing head 41, the irradiation of the calibration pattern from the other drawing head 41 may be stopped, and the calibration pattern may be displayed from the other drawing head 41. A calibration pattern may be examined in (52).

In the drawing device 1, when an inspection image of one drawing head 41 is acquired, based on the inspection image, the irradiation position of the light from the drawing head 41 on the scale 52 (i.e. The measurement position of the calibration pattern) is obtained by the position detection unit 113 (see FIG. 5). Then, based on the measurement position of the calibration pattern, correction information regarding the irradiation position of light from the one drawing head 41 is obtained by the correction information acquisition unit 114 (see FIG. 5) (step S13) . In this way, in the drawing device 1, it is preferable that acquisition of inspection images of the plurality of drawing heads 41 and acquisition of correction information based on the inspection images are performed in parallel.

When the loading and unloading of the substrate 9 (step S11) and the acquisition of inspection images for all drawing heads 41 (step S12) are completed, the stage ( 21) moves in the (+Y) direction. Movement of the stage 21 in the (+Y) direction is started, for example, before the correction information is acquired for all drawing heads 41 (that is, before step S13 ends). In this case, step S13 is continuously performed even while the substrate 9 is moving. Additionally, the movement of the stage 21 may be started after the end of step S13.

By moving in the (+Y) direction, the stage 21 passes below the alignment camera 31, as shown in FIG. 7B, and moves to the standby position shown in FIG. 7C and stops. As shown in FIG. 7B, when the stage 21 passes below the alignment camera 31, an alignment mark (not shown) previously formed on the substrate 9 on the substrate holding portion 25 marks the alignment camera. (31) is imaged. When imaging an alignment mark, pulsed illumination light (i.e., a flash of light) is emitted from the illumination light source of the alignment unit 3 to the imaging area of the alignment camera 31. Thereby, the alignment mark on the moving substrate 9 is imaged with good precision. As described above, in the calibration unit 5 passing below the alignment camera 31, low-reflection processing is applied to the upper part of the calibration camera 53, so that the illumination light by the calibration camera 53 Reflected light is suppressed or prevented from entering the alignment camera 31.

An image containing an alignment mark acquired by the alignment camera 31 (i.e., an alignment image) is sent to the control unit 10 and stored in the storage unit 111 (see FIG. 5). In the alignment information acquisition unit 115, alignment information is obtained based on the alignment image. Then, based on the alignment information, alignment processing of the substrate 9 by the drawing control unit 116 is performed (step S14). In the alignment process, in order to match the position of the substrate 9 to a predetermined design position, for example, the stage 21 is shifted (i.e., moved a small distance) or rotated in the (9) Correction of the drawing data of the pattern drawn on the image is performed.

When the above-described alignment process is completed, movement of the stage 21 located at the standby position in the (-Y) direction begins. In the calibration unit 5, before the start of movement of the stage 21 in the (-Y) direction, the calibration camera 53 is moved in the Evacuate to the evacuation position on the (-X) side. That is, the retraction position is located on the (+X) side or (-X) side of the stage 21 from the position where the scale portion 52 is formed. As a result, it is possible to suppress or prevent relatively high-intensity light used for pattern drawing from entering the calibration camera 53.

In the drawing device 1, as shown in FIG. 7D, the substrate 9 held by the substrate holding portion 25 passes below the drawing head 41. Then, the drawing head 41 and the stage moving mechanism 22 are controlled by the drawing control unit 116 (see FIG. 5) based on the above-described drawing data and correction information, so that the drawing head 41 is moved below the drawing head 41. In this case, light modulated from the drawing head 41 is irradiated to the substrate 9 on the stage 21 moving in the Y direction, and a pattern is drawn (step S15).

In the present embodiment, as described above, pattern drawing on the substrate 9 is performed by a multi-pass method, so drawing is performed on the substrate 9 reciprocating in the Y direction below the drawing head 41. Light modulated from the head 41 is irradiated to draw a pattern. In addition, when drawing a pattern on the substrate 9, in each drawing head 41, two or more light sources are used among the three light sources 421 to 423 (see FIG. 3) of the light source unit 42. It is desirable. In this way, a desirable pattern can be drawn according to the type of photosensitive material on the substrate 9, etc.

When drawing of the pattern on the substrate 9 is completed, the stage 21 is moved to the loading and unloading position shown in Fig. 7E (step S16). At this time, the calibration camera 53 moves in the X direction from the retracted position and is returned vertically below the scale portion 52. This completes the drawing of the pattern on one substrate 9.

In the actual drawing device 1, it returns from step S16 to step S11, steps S11 to S16 are repeated, and patterns for the plurality of substrates 9 are drawn sequentially. In the drawing device 1, the acquisition of the inspection image by the calibration camera 53 (step S12) is performed each time the substrate 9 is loaded into the substrate holding unit 25 (step S11), so that a plurality of Even when pattern drawing on the substrate 9 is performed continuously, the precision of pattern drawing on the substrate 9 can be maintained at a high state.

In the drawing device 1, the acquisition of correction information for all drawing heads 41 (step S13) and the alignment process for the substrate 9 (step S14) are completed until the start of drawing of the pattern on the substrate 9. It just needs to be done. Additionally, the end of step S13 may be before, after, or approximately at the same time as the end of step S14.

As described above, the drawing device 1 that irradiates light to the substrate 9 to draw a pattern includes a stage 21, a drawing head 41, and a main scanning mechanism (i.e., a first moving mechanism). (23)) It is provided with a scale unit 52, a calibration camera 53, a correction information acquisition unit 114, and a drawing control unit 116. A substrate holding portion 25 that holds the substrate 9 is formed on the stage 21 . The drawing head 41 irradiates the substrate 9 with modulated light. The first moving mechanism 23 moves the stage 21 relative to the drawing head 41 in the main scanning direction (Y direction in the above example) parallel to the upper surface 91 of the substrate 9. The scale portion 52 is formed on the stage 21 adjacent to the substrate holding portion 25 in the main scanning direction. The calibration camera 53 captures an image of a predetermined calibration pattern projected onto the scale 52 from the drawing head 41, with the scale 52 positioned at the calibration position below the drawing head 41. . The correction information acquisition unit 114 is used to correct the irradiation position of light from the drawing head 41 based on the inspection image including the scale unit 52 and the calibration pattern acquired by the calibration camera 53. Obtain correction information. The drawing control unit 116 controls the drawing head 41 and the first moving mechanism 23 based on the drawing data and correction information, thereby moving the substrate 9 relative to the drawing head 41 in the main scanning direction. The drawing head 41 executes drawing on the substrate 9. In the drawing device 1, the stage 21 is positioned at the loading/unloading position where the substrate 9 is loaded/unloaded into/out of the substrate holding unit 25, and the scale unit 52 is positioned at the calibration position. This makes it possible to calibrate the drawing head 41 in parallel with the loading and unloading of the substrate 9 into and out of the drawing device 1. Therefore, the drawing head 41 can be calibrated while suppressing an increase in the tact time.

As described above, the drawing device 1 is preferably further provided with an alignment camera 31 and an alignment information acquisition unit 115. The alignment camera 31 images the alignment mark on the substrate 9. The alignment information acquisition unit 115 is used to correct the relative position of the substrate 9 with respect to the drawing head 41 based on the image of the alignment mark (i.e., alignment image) acquired by the alignment camera 31. Obtains alignment information. The alignment camera 31 is preferably located on the opposite side of the substrate holding portion 25 of the stage 21 located at the loading/unloading position with the drawing head 41 interposed therebetween in the main scanning direction. As a result, compared to the case where the alignment camera 31 is located between the drawing head 41 and the substrate holding portion 25 of the stage 21 located at the loading/unloading position, the stage 21 is miniaturized with respect to the main scanning direction. can do. As a result, the drawing device 1 can be miniaturized with respect to the main scanning direction.

As described above, it is preferable that the drawing device 1 is further provided with a support portion 40 that supports the drawing head 41 above the stage 21. Additionally, it is preferable that the alignment camera 31 is also supported by the support portion 40. In this way, compared to the case where the support portion for the drawing head 41 and the support portion for the alignment camera 31 are formed separately, the structure of the drawing device 1 can be simplified and the drawing device 1 can be positioned in the main scanning direction. It can be miniaturized. Additionally, when the support portion for the drawing head 41 and the support portion for the alignment camera 31 are formed separately, the relative positions of the drawing head 41 and the alignment camera 31 may vary due to differences in thermal deformation, etc. of the two supports. Although there is a possibility that the misalignment may increase, as described above, by sharing the support portion 40, which is a single member, for supporting the drawing head 41 and the alignment camera 31, the drawing head 41 and the alignment camera 31 ) can suppress the deviation of the relative positions.

As described above, the scale portion 52 is preferably a light-transmitting scale member disposed on the upper surface of the stage 21. The calibration camera 53 is mounted on the stage 21 below the translucent scale member and captures an image of the calibration pattern transmitted through the translucent scale member. Preferably, low-reflection processing is applied to the upper end of the calibration camera 53. As a result, it is possible to suppress reflected light from the calibration camera 53 (for example, reflected light from the frame of the objective lens) from entering the alignment camera 31, such as when capturing images with the alignment camera 31. Therefore, when capturing images by the alignment camera 31, there is no need to retract the calibration camera 53 from below the scale portion 52, so the tact time can be shortened.

As described above, preferably, the position of the calibration pattern on the scale 52 in the main scanning direction can be changed by the drawing head 41 while the stage 21 is stopped. This makes it possible to image the calibration pattern without moving the stage 21 even when the calibration pattern is relatively greatly shifted from a predetermined position on the scale 52 in the main scanning direction. Therefore, it is possible to prevent the tact time from increasing due to movement of the stage 21 during calibration.

As described above, the drawing head 41 is preferably provided with a plurality of light sources (light sources 421 to 423 in the above example) that emit light of different wavelengths. In addition, when drawing on the substrate 9, it is preferable that two or more light sources among the plurality of light sources are used, and when irradiating the calibration pattern to the scale portion 52, only one light source among the plurality of light sources is used. do. As a result, when drawing a pattern on the substrate 9, the light source and light amount ratio to be used can be selected in accordance with the type of photosensitive material on the substrate 9, etc., and a desirable pattern can be drawn. Additionally, by setting the calibration camera 53 to match the wavelength of light from the single light source, the calibration pattern can be imaged with good precision.

As described above, in the drawing device 1, the plurality of drawing heads 41 are preferably arranged in an arrangement direction that is parallel to the upper surface 91 of the substrate 9 and inclined with respect to the main scanning direction. . The plurality of drawing heads 41 include the drawing heads 41 described above, and each irradiates the substrate 9 with modulated light. In addition, the calibration camera 53, with the scale unit 52 positioned at the calibration position, displays a plurality of calibration patterns respectively irradiated from the plurality of drawing heads 41 to the scale unit 52 in the above-described arrangement. It is desirable to take images sequentially while moving in each direction. Thereby, compared to the case where a plurality of calibration cameras are formed in the calibration unit 5, the structure of the drawing device 1 can be simplified, and the manufacturing cost of the drawing device 1 can be reduced.

As described above, the time required for acquisition of the inspection image by the calibration camera 53 (step S12) is the time required for unloading one substrate 9 from the substrate holding unit 25 and installing a new substrate 9. It is preferable that the time required for loading the substrate into the holding section 25 is shorter. Accordingly, movement of the stage 21 can be started immediately after completion of loading and unloading of the substrate 9. Therefore, an increase in tact time due to calibration can be prevented.

As described above, the acquisition of the inspection image by the calibration camera 53 is preferably performed each time the substrate 9 is loaded into the substrate holding portion 25. Thereby, high-precision drawing can be realized while suppressing an increase in tact time.

The drawing method described above includes a substrate holding portion 25 that holds the substrate 9, and a scale portion adjacent to the substrate holding portion 25 in the main scanning direction parallel to the upper surface 91 of the substrate 9 ( 52) A scale portion located at a calibration position below the drawing head 41 in a state where the stage 21 on which it is formed is located at a loading/unloading/unloading position where the substrate 9 is loaded/unloaded into/out of the substrate holding unit 25. (52), based on the step of imaging a predetermined calibration pattern emitted from the drawing head 41 (step S12) and the inspection image including the scale portion 52 and the calibration pattern acquired in step S12, A process of obtaining correction information used for correction of the irradiation position of light from the drawing head 41 (step S13), and drawing data and correction information to the substrate 9 that moves relative to the drawing head 41 in the main scanning direction. Based on this, a step (step S15) of performing drawing on the substrate 9 by irradiating light modulated from the drawing head 41 is provided. Thereby, in the same manner as above, the drawing head 41 can be calibrated while suppressing an increase in the tact time.

Various changes are possible in the drawing device 1 and drawing method described above.

For example, in the light source unit 42 of the drawing head 41, light may be emitted from two or more light sources even when imaging an inspection image. In addition, the light source unit 42 does not necessarily need to be provided with a plurality of light sources, and may be provided with only one light source.

In the drawing device 1, the position of the calibration pattern in the Y direction on the scale 52 does not necessarily need to be changed by the drawing head 41, but is changed by moving the stage 21 in the Y direction. It's okay.

In the drawing device 1, the time required to acquire the inspection image by the calibration camera 53 (step S12) is the time required to unload one substrate 9 from the substrate holding unit 25 and replace the new substrate 9. The time may be longer than the time required to load the substrate into the substrate holding portion 25, or may be approximately the same. In either case, the tact time can be shortened by carrying out the loading and unloading of the substrate 9 and the calibration of the drawing head 41 in parallel.

In the drawing device 1, in the imaging unit 51 of the calibration unit 5, a plurality of calibration cameras 53 (i.e., the same number as the drawing heads 41) are provided, each corresponding to a plurality of drawing heads 41. ) are arranged in the

In the drawing device 1, low-reflection processing at the upper end of the calibration camera 53 does not necessarily need to be performed. In this case, when acquiring an alignment image by the alignment camera 31, the calibration camera 53 moves to a retracted position on the (+ You can retreat to .

In the drawing device 1, the retracted position of the calibration camera 53 does not necessarily have to be on the (+X) side or (-X) side of the scale portion 52. For example, the retraction position may be set to be between two adjacent drawing heads 41 in the X direction. In this case, compared to the case where the retraction position is formed on the (+X) side or (-X) side of the scale portion 52, the amount of movement in the can be further shortened.

In the drawing device 1, the drawing head 41 and the alignment camera 31 are not necessarily supported by one support part 40, but are supported by two support parts that are separate members arranged apart from each other with respect to the Y direction. Each may be supported by .

In the drawing device 1, the alignment camera 31 may be formed between the drawing head 41 and the substrate holding portion 25 of the stage 21 located at the loading/unloading position.

In the drawing device 1, the scale portion 52 does not necessarily have to be transparent, and the calibration camera 53 does not necessarily have to be mounted on the stage 21. For example, the scale portion 52 may be a reflector that reflects the light emitted from the drawing head 41 in a predetermined direction. The calibration camera 53 is, for example, fixed to the frame of the drawing device 1 at a position spaced apart from the stage 21, and receives reflected light from the scale unit 52 to illuminate the scale unit 52. An inspection image including the calibration pattern and the scale on the graduation portion 52 may be captured.

The stage 21 may be moved relative to the drawing head 41 in the main scanning direction by the first moving mechanism 23. Therefore, for example, the stage 21 may be fixed, and the drawing head 41 may be moved in the main scanning direction by the first moving mechanism 23 above the stage 21. Likewise, the drawing head 41 may be moved in the sub-scanning direction by the second moving mechanism 24.

In the drawing device 1, calibration does not necessarily need to be performed every time the substrate 9 is brought in, for example, each time pattern drawing for a predetermined number of substrates 9 of two or more is completed. Calibration of the drawing head 41 may be performed.

The above-described board 9 is not necessarily limited to a printed board. In the drawing device 1, for example, a pattern for a semiconductor substrate, a substrate for a semiconductor package, a glass substrate for a flat panel display device such as a liquid crystal display device or a plasma display device, a glass substrate for a photomask, a substrate for a solar cell panel, etc. Drawing may be performed.

The configurations in the above embodiment and each modification may be appropriately combined as long as they do not conflict with each other.

Although the invention has been described and explained in detail, the description is illustrative and not limiting. Accordingly, it can be said that many modifications and aspects are possible as long as they do not deviate from the scope of the present invention.

1: Drawing device
9: substrate
21: Stage
23: first moving mechanism
25: substrate holding part
31: Alignment camera
40: support part
41: drawing head
51: imaging unit
52: graduation part
53: Calibration camera
91: top surface (of substrate)
114: Correction information acquisition unit
115: Alignment information acquisition unit
116: Drawing control unit
421 ~ 423: Light source
S11 ~ S16: Step

Claims (10)

A drawing device that draws patterns by irradiating light to a substrate, comprising:
A stage on which a substrate holding portion is formed to hold the substrate,
a drawing head that irradiates modulated light to the substrate;
a main scanning mechanism that moves the stage relative to the drawing head in a main scanning direction parallel to the upper surface of the substrate;
a graduation portion formed adjacent to the substrate holding portion and the main scanning direction on the stage;
a calibration camera that captures a predetermined calibration pattern projected onto the scale from the drawing head, with the scale positioned at a calibration position below the drawing head;
a correction information acquisition unit that obtains correction information used for correction of an irradiation position of light from the drawing head based on an inspection image including the scale unit and the calibration pattern acquired by the calibration camera;
A drawing control unit that controls the drawing head and the main scanning mechanism based on the drawing data and the correction information, thereby causing the drawing head to perform drawing on the substrate while moving the substrate relative to the drawing head in the main scanning direction. Equipped with
A drawing device in which the scale portion is positioned at the calibration position while the stage is positioned at a loading/unloading position where a substrate is loaded/unloaded into/out of the substrate holding unit. According to claim 1,
an alignment camera that captures images of alignment marks on the substrate;
Based on the image of the alignment mark acquired by the alignment camera, it is further provided with an alignment information acquisition unit that obtains alignment information used for correction of the relative position of the substrate with respect to the drawing head,
The alignment camera is located on the opposite side of the substrate holding part of the stage located at the loading/unloading position across the drawing head in the main scanning direction. According to claim 2,
A support portion for supporting the drawing head is further provided above the stage,
A drawing device in which the alignment camera is also supported by the support portion. According to claim 1,
The scale portion is a light-transmitting scale member disposed on the upper surface of the stage,
The calibration camera is mounted on the stage below the translucent scale member and captures an image of the calibration pattern transmitted through the translucent scale member,
A drawing device in which low-reflection processing is applied to the upper part of the calibration camera. According to claim 1,
A drawing device wherein the position of the calibration pattern on the scale in the main scanning direction can be changed by the drawing head while the stage is stopped. According to claim 1,
The drawing head has a plurality of light sources that emit light of different wavelengths,
When drawing on the substrate, two or more light sources among the plurality of light sources are used,
A drawing device in which only one light source among the plurality of light sources is used when irradiating the calibration pattern to the scale portion. According to claim 1,
A plurality of drawing heads, including the drawing head and each irradiating modulated light to the substrate, are arranged in an arrangement direction parallel to the upper surface of the substrate and inclined with respect to the main scanning direction,
The calibration camera sequentially captures images of a plurality of calibration patterns respectively irradiated from the plurality of drawing heads to the scale portion while moving in the arrangement direction, with the scale portion positioned at the calibration position. The method according to any one of claims 1 to 7,
The time required to acquire the inspection image by the calibration camera is shorter than the time required to unload one substrate from the substrate holding section and load a new substrate into the substrate holding section. The method according to any one of claims 1 to 7,
A drawing device, wherein the acquisition of the inspection image by the calibration camera is performed each time a substrate is loaded into the substrate holding unit. A drawing method in which a pattern is drawn by irradiating light to a substrate,
a) A stage having a substrate holding portion for holding a substrate and a graduated portion adjacent to the substrate holding portion in the main scanning direction parallel to the upper surface of the substrate is positioned at a loading/unloading/unloading position where the substrate is loaded/unloaded into/out of the substrate holding portion. A step of imaging a predetermined calibration pattern emitted from the drawing head to the scale portion located at a calibration position below the drawing head in a positioned state;
b) a step of obtaining correction information used for correction of an irradiation position of light from the drawing head based on the inspection image including the scale portion and the calibration pattern acquired in the step a);
c) providing a step of performing drawing on the substrate by irradiating light modulated from the drawing head based on the drawing data and the correction information to the substrate moving relative to the drawing head in the main scanning direction, Drawing method.

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