TW202205494A - 基板映射設備及其方法 - Google Patents

基板映射設備及其方法 Download PDF

Info

Publication number
TW202205494A
TW202205494A TW110124052A TW110124052A TW202205494A TW 202205494 A TW202205494 A TW 202205494A TW 110124052 A TW110124052 A TW 110124052A TW 110124052 A TW110124052 A TW 110124052A TW 202205494 A TW202205494 A TW 202205494A
Authority
TW
Taiwan
Prior art keywords
wafer
substrate
camera
substrate carrier
common
Prior art date
Application number
TW110124052A
Other languages
English (en)
Chinese (zh)
Inventor
拉迪克 蘇加托夫
洛伊 王
卡爾 謝
胡斯托 格西諾
奧斯汀 懷斯
卡斯帕 韓森
艾瑞克 帕斯特
Original Assignee
美商布魯克斯自動機械公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 美商布魯克斯自動機械公司 filed Critical 美商布魯克斯自動機械公司
Publication of TW202205494A publication Critical patent/TW202205494A/zh

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0606Position monitoring, e.g. misposition detection or presence detection
    • H10P72/0608Position monitoring, e.g. misposition detection or presence detection of substrates stored in a container, a magazine, a carrier, a boat or the like
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/10Segmentation; Edge detection
    • G06T7/13Edge detection
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/70Determining position or orientation of objects or cameras
    • G06T7/73Determining position or orientation of objects or cameras using feature-based methods
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/14Vertical carrier comprising wall type elements whereby the substrates are horizontally supported, e.g. comprising sidewalls
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/34Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H10P72/3411Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/50Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
    • H10P72/53Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment using optical controlling means
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501Semiconductor wafers
    • G01N21/9503Wafer edge inspection
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00Indexing scheme for image analysis or image enhancement
    • G06T2207/30Subject of image; Context of image processing
    • G06T2207/30108Industrial image inspection
    • G06T2207/30148Semiconductor; IC; Wafer

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
TW110124052A 2020-06-30 2021-06-30 基板映射設備及其方法 TW202205494A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US202063046555P 2020-06-30 2020-06-30
US63/046,555 2020-06-30

Publications (1)

Publication Number Publication Date
TW202205494A true TW202205494A (zh) 2022-02-01

Family

ID=79031420

Family Applications (1)

Application Number Title Priority Date Filing Date
TW110124052A TW202205494A (zh) 2020-06-30 2021-06-30 基板映射設備及其方法

Country Status (7)

Country Link
US (2) US12002696B2 (cg-RX-API-DMAC7.html)
EP (2) EP4589645A3 (cg-RX-API-DMAC7.html)
JP (1) JP7681628B2 (cg-RX-API-DMAC7.html)
KR (1) KR20230029972A (cg-RX-API-DMAC7.html)
CN (3) CN116056810B (cg-RX-API-DMAC7.html)
TW (1) TW202205494A (cg-RX-API-DMAC7.html)
WO (1) WO2022006319A1 (cg-RX-API-DMAC7.html)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117125439A (zh) * 2022-05-27 2023-11-28 泰克元有限公司 处理器
TWI831162B (zh) * 2022-03-24 2024-02-01 上銀科技股份有限公司 裝載埠及其映射裝置
US20240170312A1 (en) * 2022-11-21 2024-05-23 Applied Materials, Inc. Determining a substrate location threshold based on optical properties
CN117125439B (zh) * 2022-05-27 2026-05-01 泰克元有限公司 处理器

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11469123B2 (en) * 2019-08-19 2022-10-11 Applied Materials, Inc. Mapping of a replacement parts storage container
JP7849187B2 (ja) * 2022-02-24 2026-04-21 株式会社ディスコ 搬送装置
CN119856273A (zh) * 2022-07-08 2025-04-18 朗姆研究公司 用于半导体制造装备的移动传感器设备
US12136225B2 (en) * 2022-09-09 2024-11-05 Applied Materials, Inc. Clog detection via image analytics
US12394647B2 (en) * 2022-09-23 2025-08-19 Taiwan Semiconductor Manufacturing Company, Ltd. Wafer shift detection
JP2024080228A (ja) * 2022-12-02 2024-06-13 株式会社安川電機 基板搬送装置および基板搬送方法
CN118723287A (zh) * 2023-03-28 2024-10-01 Jcet星科金朋韩国有限公司 具有改进的翘曲控制的承载半导体封装条的载体组件
CN117438356B (zh) * 2023-12-21 2024-04-19 浙江果纳半导体技术有限公司 一种自适应晶圆传输方法、可存储介质和晶圆传输设备
US20260026294A1 (en) * 2024-07-19 2026-01-22 Kla Corporation Systems and methods for wafer overview image scan and pre-alignment of film frame carrier

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4253365B2 (ja) * 1997-10-17 2009-04-08 オリンパス株式会社 ウェハ搬送装置
JP3380147B2 (ja) * 1997-11-13 2003-02-24 大日本スクリーン製造株式会社 基板処理装置
WO1999028952A2 (en) * 1997-11-28 1999-06-10 Fortrend Engineering Corporation Wafer-mapping load port interface
DE19814046C1 (de) * 1998-03-30 1999-11-18 Jenoptik Jena Gmbh Anordnung zur Detektion von scheibenförmigen Objekten in einer Kassette
JPH11354609A (ja) * 1998-06-11 1999-12-24 Mecs Corp 薄型基板収容カセットの蓋開閉装置
US6188323B1 (en) 1998-10-15 2001-02-13 Asyst Technologies, Inc. Wafer mapping system
US6636626B1 (en) 1999-11-30 2003-10-21 Wafermasters, Inc. Wafer mapping apparatus and method
JP3699348B2 (ja) * 2000-11-30 2005-09-28 平田機工株式会社 駆動部隔離foupオープナ
JP2002224982A (ja) * 2000-12-01 2002-08-13 Yaskawa Electric Corp 薄型基板搬送用ロボットおよび薄型基板検出方法
US6452503B1 (en) 2001-03-15 2002-09-17 Pri Automation, Inc. Semiconductor wafer imaging system
US6825486B1 (en) 2001-07-13 2004-11-30 Cyberoptics Corporation System for mapping wafers using predictive dynamic lighting
US6900451B2 (en) * 2001-11-08 2005-05-31 Multimextrixs, Llc Mapping sensor system for detecting positions of flat objects
JP4196335B2 (ja) * 2003-06-10 2008-12-17 株式会社安川電機 薄型基板検出方法
US7015492B2 (en) 2003-08-15 2006-03-21 Asm International N.V. Method and apparatus for mapping of wafers located inside a closed wafer cassette
US9691651B2 (en) * 2005-01-28 2017-06-27 Brooks Automation, Inc. Substrate handling system for aligning and orienting substrates during a transfer operation
US20050086024A1 (en) * 2003-09-19 2005-04-21 Cyberoptics Semiconductor Inc. Semiconductor wafer location sensing via non contact methods
JP2005167208A (ja) 2003-10-24 2005-06-23 Ade Corp ノッチ化/フラット化200mmウエーハエッジグリップエンドエフェクタ
US7891936B2 (en) * 2005-03-30 2011-02-22 Brooks Automation, Inc. High speed substrate aligner apparatus
TWI475627B (zh) 2007-05-17 2015-03-01 布魯克斯自動機械公司 基板運送機、基板處理裝置和系統、於基板處理期間降低基板之微粒污染的方法,及使運送機與處理機結合之方法
JP5185756B2 (ja) * 2008-10-01 2013-04-17 川崎重工業株式会社 基板検出装置および方法
CN102576687B (zh) 2009-11-17 2015-11-25 昕芙旎雅有限公司 晶圆检测装置
KR102139617B1 (ko) 2012-12-27 2020-07-31 세메스 주식회사 기판 이송 장치 및 방법
JP6415220B2 (ja) * 2014-09-29 2018-10-31 株式会社Screenホールディングス 基板処理装置および基板処理方法
US10755960B2 (en) * 2014-11-04 2020-08-25 Brooks Automation, Inc. Wafer aligner
JP6571475B2 (ja) * 2015-09-30 2019-09-04 株式会社Screenホールディングス 基板処理装置
MY190638A (en) * 2015-10-01 2022-04-29 Intevac Inc Wafer plate and mask arrangement for substrate fabrication
US10515834B2 (en) * 2015-10-12 2019-12-24 Lam Research Corporation Multi-station tool with wafer transfer microclimate systems
US10607879B2 (en) 2016-09-08 2020-03-31 Brooks Automation, Inc. Substrate processing apparatus
US10784134B2 (en) 2017-05-03 2020-09-22 Applied Materials, Inc. Image based substrate mapper
US10714364B2 (en) 2017-08-31 2020-07-14 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus and method for inspecting wafer carriers
KR101843476B1 (ko) 2017-10-11 2018-03-29 주식회사 싸이맥스 로드포트모듈 비전 맵핑장치 및 로드포트모듈 비전 맵핑방법
JP7073697B2 (ja) 2017-12-07 2022-05-24 Tdk株式会社 ロードポート
JP6804069B2 (ja) * 2018-08-03 2020-12-23 株式会社Kokusai Electric 基板処理システム、基板処理装置及び半導体装置の製造方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI831162B (zh) * 2022-03-24 2024-02-01 上銀科技股份有限公司 裝載埠及其映射裝置
CN117125439A (zh) * 2022-05-27 2023-11-28 泰克元有限公司 处理器
TWI851239B (zh) * 2022-05-27 2024-08-01 南韓商泰克元有限公司 處理器
CN117125439B (zh) * 2022-05-27 2026-05-01 泰克元有限公司 处理器
US20240170312A1 (en) * 2022-11-21 2024-05-23 Applied Materials, Inc. Determining a substrate location threshold based on optical properties

Also Published As

Publication number Publication date
EP4171843C0 (en) 2025-06-25
US12002696B2 (en) 2024-06-04
EP4589645A3 (en) 2026-01-21
US20240290642A1 (en) 2024-08-29
CN120656970A (zh) 2025-09-16
US20210407831A1 (en) 2021-12-30
JP7681628B2 (ja) 2025-05-22
JP2023532334A (ja) 2023-07-27
KR20230029972A (ko) 2023-03-03
EP4171843A1 (en) 2023-05-03
EP4589645A2 (en) 2025-07-23
EP4171843A4 (en) 2024-01-17
CN116056810A (zh) 2023-05-02
CN116056810B (zh) 2025-09-05
EP4171843B1 (en) 2025-06-25
WO2022006319A1 (en) 2022-01-06
US12564003B2 (en) 2026-02-24
CN121035002A (zh) 2025-11-28

Similar Documents

Publication Publication Date Title
JP7681628B2 (ja) 基板マッピング装置およびそのための方法
TWI782011B (zh) 基於圖像的基板翹曲偵測器、系統、及方法
JP5663207B2 (ja) モジュラ光学検査システム
JP2023532334A5 (cg-RX-API-DMAC7.html)
TWI397147B (zh) Installation device and installation method of semiconductor wafer
TWI841429B (zh) 用於基板對準之方法及裝置
US20130044316A1 (en) Device and method for inspecting moving semicondutor wafers
JP2013534312A (ja) ウェハのソーマークの三次元検査のための装置および方法
TW202032706A (zh) 裝載機台
KR100803758B1 (ko) 반도체 웨이퍼 검사장치
JP2022046117A (ja) 基板検査装置
JP6101481B2 (ja) 積層構造を有するワークの内部検査装置
JP7619805B2 (ja) ロボットシステム及び撮影方法
TWI912912B (zh) 基板搬送裝置及具備其之基板處理裝置
WO2023210429A1 (ja) 基板搬送ロボットシステムおよび基板搬送ロボット
TWI919419B (zh) 基板搬送機器人系統及基板檢測方法
KR101324973B1 (ko) 반도체 패키지 검사유닛, 반도체 패키지 검사장치 및 반도체 패키지 검사방법
TWI904699B (zh) 用於原位驗證和校正晶圓位置的方法和系統
WO2025057905A1 (ja) 基板搬送ロボットシステム、および、基板検出方法
TWI912368B (zh) 半導體晶圓成像系統、相關之黑箱、半導體晶圓處理系統、及半導體晶圓成像站
KR20260061450A (ko) 기판 반송 로봇 시스템, 및 기판 검출 방법
CN118412311A (zh) 基于机器视觉的晶圆对准装置和方法
JPH09115931A (ja) ダイボンダ