TW202122556A - 螢光體板、發光裝置、以及螢光體板之製造方法 - Google Patents

螢光體板、發光裝置、以及螢光體板之製造方法 Download PDF

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TW202122556A
TW202122556A TW109135115A TW109135115A TW202122556A TW 202122556 A TW202122556 A TW 202122556A TW 109135115 A TW109135115 A TW 109135115A TW 109135115 A TW109135115 A TW 109135115A TW 202122556 A TW202122556 A TW 202122556A
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phosphor
light
phosphor plate
type silicon
aluminum oxynitride
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TW109135115A
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山浦太陽
久保田雄起
伊藤和弘
江本秀幸
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日商電化股份有限公司
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    • H01L33/32Materials of the light emitting region containing only elements of group III and group V of the periodic system containing nitrogen

Abstract

一種螢光體板,係由複合體構成,該複合體含有:α型矽鋁氮氧化物螢光體、及含有以通式M2x Al4-4x O6-4x 表示之尖晶石的燒結體,M為Mg、Mn、Zn之至少任一者,0.2<x<0.6。此外,一種發光裝置,具備有三族氮化物半導體發光元件、及設置於該三族氮化物半導體發光元件之一面上之螢光體板。此外,一種上述螢光體板的製造方法。

Description

螢光體板、發光裝置、以及螢光體板之製造方法
本發明係關於螢光體板、發光裝置及螢光體板的製造方法。更具體的說,係關於螢光體板、具備該螢光體板的發光裝置、及該螢光體板的製造方法。
目前為止針對螢光體板進行過各種開發。此種技術已知有例如專利文獻1所記載的技術。專利文獻1中,記載了無機螢光體分散於SiO2 系玻璃之板狀發光色轉換構件(專利文獻1的圖4、請求項1)。 [先前技術文獻] [專利文獻]
專利文獻1:日本特開2010-132923號公報
[發明所欲解決之課題]
由本發明者等之所見,如專利文獻1所記載之無機螢光體分散於SiO2 系玻璃之板狀發光色轉換構件,就發光效率之觀點依然有改善的餘地。
有鑑於該情事而促使本發明的完成。 本發明的目的之一,係提供發光效率優秀之螢光體板,及使用了該螢光體板之發光裝置。 [解決課題之手段]
本發明者等完成於以下提供的發明,解決了上述課題。
根據本發明,提供一種螢光體板,係由複合體構成,該複合體含有:α型矽鋁氮氧化物螢光體、及含有以通式M2x Al4-4x O6-4x 表示之尖晶石的燒結體,M為Mg、Mn、Zn之至少任一者,0.2<x<0.6。
此外,根據本發明,提供一種發光裝置,具備有三族氮化物半導體發光元件,及設置於該三族氮化物半導體發光元件之一面上之上述螢光體板。
此外,根據本發明, 可提供一種螢光體板的製造方法,其中,該螢光體板的製造方法包含將含有α型矽鋁氮氧化物螢光體、及尖晶石原料粉末之混合物加熱煅燒之步驟, 該尖晶石原料粉末係(i)含有以上述通式表示之尖晶石的粉末,及/或是(ii)以通式MO(M為Mg、Mn、Zn中至少任一者)表示之金屬氧化物的粉末與Al2 O3 的粉末之混合物, 該尖晶石原料粉末的BET比表面積為0.1m2 /g以上、10.0m2 /g以下。 [發明之效果]
根據本發明,可提供發光效率優秀之螢光體板,及使用該螢光體板之發光裝置。
以下參照圖式,針對本發明之實施形態進行詳細說明。 在所有圖式中,相同的構成要素以相同符號標示,並且適當地省略說明。 為了避免雜亂,(i)若同一個圖式中有多個相同的構成要素時,有時僅標示其中一個,並非全部皆標示符號,及(ii)特別是在圖2以後的圖式中,與圖1相同的構成要素有時將不再次標示符號。 所有圖式僅用於說明。圖式中各構件之形狀、尺寸比等,不一定對應實際物品。
[螢光體板] 本實施形態之螢光體板,係由複合體構成,該複合體含有:α型矽鋁氮氧化物螢光體、及含有以通式M2x Al4-4x O6-4x 表示之尖晶石的燒結體,M為Mg、Mn、Zn之至少任一者,0.2<x<0.6。 本實施形態之螢光體板,係作為將照射到的藍色光轉換成橙色光並且發光之波長轉換器使用。
由本發明者等之所見,本實施形態之螢光體板的發光效率優秀。其理由雖然並非完全明瞭,但經推測如下。 (i)含有上述通式所表示之尖晶石之燒結體較為透明。因此,抑制了螢光體板內光的過度散射。 (ii)尖晶石的折射率大約為1.7,接近氮氧化物螢光體的折射率(大約為2.0)。因此,由螢光體中之光取出效率高。
將波長455nm的藍色光照射在本實施形態之螢光體板時,由螢光體板發出的波長轉換光的峰值波長,例如為585nm以上605nm以下。將本實施形態之螢光體板與發出藍色光之發光元件組合,便可得到發出高亮度橙色光之發光裝置。
以下將繼續更具體說明本實施形態之螢光體板。
於構成螢光體板的複合體中混合有α型矽鋁氮氧化物螢光體與尖晶石,混合。混合,意指α型矽鋁氮氧化物螢光體分散在作為母材(基材相)之尖晶石中的狀態。即,複合體可具有α型矽鋁氮氧化物螢光體粒子分散在母材所構成的(多)結晶體之結晶粒之間及/或是結晶粒內的構造。α型矽鋁氮氧化物螢光體粒子亦可均勻地分散在母材(含有尖晶石之燒結體)中。
(α型矽鋁氮氧化物螢光體) α型矽鋁氮氧化物螢光體,以含有下述通式(1)表示之含有Eu元素之α型矽鋁氮氧化物螢光體為佳。 通式(1)  (M)m(1-x)/p (Eu)mx/2 (Si)12-(m+n) (Al)m+n (O)n (N)16-n
通式(1)中, M表示選自於由Li、Mg、Ca、Y及鑭系元素(排除La及Ce)構成之群組中之1種以上的元素, p表示M元素之價數, 0<x<0.5、1.5≦m≦4.0、0≦n≦2.0。 n例如可為2.0以下,亦可為1.0以下,亦可為0.8以下。
α型矽鋁氮氧化物之固溶組成,如上述通式所表示,係將α型氮化矽之單位晶胞(Si12 N16 )的m個Si-N鍵結取代成Al-N鍵結,將n個Si-N鍵結取代成Al-O鍵結,為了保持電中性,m/p個陽離子(M、Eu)侵入固溶於晶格内。特別是M若是使用Ca,可在廣泛的組成範圍內將α型矽鋁氮氧化物安定化,藉由將其中一部分取代成作為發光中心的Eu,可激發出從紫外光至藍色光之波長範圍廣泛的光,便可得到展現發出黃至橙色之可見光之螢光體。
一般來說,α型矽鋁氮氧化物,因為與α型矽鋁氮氧化物相異之第二結晶相、無法避免而會存在的非晶質相的關係,故無法由組成分析等嚴格地規定其固溶組成。α型矽鋁氮氧化物之結晶相,以α型矽鋁氮氧化物單相為佳,亦可含有為其它結晶相的β型矽鋁氮氧化物、氮化鋁又或是其多型體(polytypoid)、Ca2 Si5 N8 、CaAlSiN3 等。
α型矽鋁氮氧化物螢光體之製造方法,有將由氮化釸、氮化鋁及侵入固溶元素的化合物所構成之混合粉末於高溫之氮氣環境中進行加熱使其反應之方法。一部分的構成成分在加熱步驟中形成液相,物質於該液相中移動,藉此生成α型矽鋁氮氧化物固溶體。
α型矽鋁氮氧化物螢光體中值粒徑D50 的下限,以2μm以上為佳,5μm以上為較佳,10μm以上為更佳。此外,α型矽鋁氮氧化物螢光體的D50 上限,以30μm以下為佳,20μm以下為較佳。將α型矽鋁氮氧化物螢光體的D50 設為5μm以上,便可更加提高複合體的透明性。另一方面,將α型矽鋁氮氧化物螢光體的D50 設為30μm以下,在以切割機等切割加工螢光體板時,可抑制碎裂(chipping)產生。
α型矽鋁氮氧化物螢光體的D50 ,由雷射繞射散射式粒度分布測定法測定而得到的體積基準粒度分布,可採用從小粒徑側算起之通過量累積(累積通過百分比)50%的粒徑。於本說明書之D50 即為體積基準的值。雷射繞射散射式粒度分布測定法可藉由已知的裝置進行,例如,BECKMAN COULTER, Inc. 製、LS13-320等。
α型矽鋁氮氧化物螢光體之含量的下限值,相對於複合體全體,經體積換算例如為5Vol%以上,以10Vol%以上為佳,15Vol%以上為較佳。由此可提高薄層的螢光體板之發光強度。此外,亦可改善螢光體板之光轉換效率。 α型矽鋁氮氧化物螢光體之含量的上限值,相對於複合體全體,經體積換算例如為50Vol%以下,以45Vol%以下為佳,以40Vol%以下為較佳。藉由α型矽鋁氮氧化物螢光體含量沒有過多,可抑制螢光體板的熱傳導性的下降。此外,因為使用足夠量的尖晶石,便可充分地獲得來自尖晶石的效果。
[含有尖晶石之燒結體] 本實施型態中,尖晶石以通式表示為M2x Al4-4x O6-4x (M為Mg、Mn、Zn之至少任一者,0.2<x<0.6)。 含有尖晶石之燒結體通常是將表示為通式MO(M為Mg、Mn、Zn之至少任一者)之金屬氧化物的粉末、與Al2 O3 的粉末混合並燒結而獲得。以化學計量來說,尖晶石為以x=0.5(也就是,通式MAl2 O4 )表示之組成。但取決於原料MO的量及Al2 O3 的量之比例,尖晶石會成為MO或Al2 O3 過量地固溶後的非化學計量組成之化合物。 由透明性的觀點來看,上述通式中M以Mg為佳。
[α型矽鋁氮氧化物螢光體及含有尖晶石之燒結體的含量合計值] 螢光體板中的α型矽鋁氮氧化物螢光體及含有尖晶石之燒結體的含量下限值,相對於複合體全體,例如為95Vol%以上,以98Vol%以上為佳,以99Vol%以上為較佳。意即構成螢光體板之複合體,係指含有α型矽鋁氮氧化物螢光體及含有尖晶石之燒結體作為主成分。藉此,不但提高了耐熱性、耐久性,更可實現安定的發光效率。 雖並未特別限定α型矽鋁氮氧化物螢光體及含有尖晶石之燒結體的含量之上限值,例如,相對於複合體全體,經體積換算可為100Vol%以下。
[螢光體板之表面粗糙度] 螢光體板主面及/或是背面之表面粗糙度Ra,例如為0.01μm以上2.0μm以下,以0.03μm以上1.5μm以下為佳。Ra,係依循JIS B 0601所測定而得。 藉由將表面粗糙度設為2.0μm以下,便可抑制光取出效率、於面內方向之光強度的偏差。藉由將表面粗糙度設為0.01μm以上,便有望提高與被接著體的密接性。 至少螢光體板的主面,或是主面及背面之表面,亦可進行表面處理。表面處理係為,例如,使用鑽石磨石等進行磨削、研磨、拋光等研磨等。藉由表面處理而可調整Ra。
[螢光體板的顏色] 螢光體板的顏色大致上為源自α型矽鋁氮氧化物螢光體之顏色的黃色、橙色等。但是,取決於製造方法、作為尖晶石原料的金屬氧化物的性質等,也會改變螢光體板的色彩。而,據認為藉由適當地設計螢光體板的色彩,便可減低非發光吸收,能夠更進一步提高發光效率。
具體來說,依循JIS Z 8781-4所測定的螢光體板之主面(發出螢光的面)之L*a*b*色座標為以下所示。 L*值:通常為72.0以上95.0以下,以82.0以上90.0以下為佳,以84.0以上90.0以下為較佳。 a*值:通常為1.5以上6.5以下,以3.0以上6.0以下為佳,以3.5以上5.5以下為較佳。 b*值:通常為10.0以上16.0以下,以11.5以上15.0以下為佳,以12.5以上15.0以下為較佳。
由本發明者等之所見,尤其是a*值與b*值的和為適當值之螢光體板,顯示出良好的發光效率。具體來說,a*值與b*值的和,以11.0以上20.0以下為佳,以17.0以上19.5以下為較佳,以17.5以上19.0以下為更佳。雖然並不確定詳細的機制,經由將a*值與b*值的和調控在適當的範圍內,可減低α型矽鋁氮氧化物螢光體及含有尖晶石之螢光體板的發光區域的非發光吸收,故能抑制發光效率的減低。
螢光體板的顏色(L*a*b*色座標),例如,可以於下述螢光體板的製造方法中,作為原料的2價金屬氧化物粉末及/或是Al2 O3 粉末,使用具有適當比表面積者來調整。
[螢光體板之厚度、形狀等] 本實施型態之螢光體板厚度及形狀並無特別限定。在可作為發光色轉換構件使用之情況下,厚度及形狀並無特別限定。 螢光體板厚度,例如為0.01mm以上1.00mm以下,以0.05mm以上0.50mm以下為佳。
[螢光體板之製造方法] 本實施型態之螢光體板,例如,可藉由包含將含有α型矽鋁氮氧化物螢光體,及尖晶石原料粉末之混合物加熱之煅燒步驟的流程來製造。 此處「尖晶石原料粉末」為,例如(i)含有以上述通式M2x Al4-4x O6-4x 所表示之尖晶石的粉末、及/或是(ii)以通式MO(M為Mg、Mn、Zn之至少任一者)表示之金屬氧化物的粉末與Al2 O3 的粉末之混合物。
原料以盡可能的高純度為佳。具體來說,所期望構成元素以外的雜質以0.1%以下為佳。 此外,在製造螢光體板時,為了經由燒結更為緻密化,以使用微粉末的尖晶石原料粉末為佳。具體來說,原料的尖晶石原料粉末之平均粒徑以1μm以下為佳。
由本發明者等之所見,使用具有相對較小之BET比表面積的尖晶石原料粉末,可更進一步地提高最後得到之螢光體板之發光效率。其理由雖然並非完全明瞭,據推測藉由使用比表面積相對較小的尖晶石原料粉,相較於使用比表面積大尖晶石原料時,燒結更加穩定,且能夠抑制發黑。
尖晶石原料粉末的BET比表面積之具體數值,例如為0.1m2 /g以上20.0m2 /g以下,以0.1m2 /g以上10.0m2 /g以下為佳。 此處,在尖晶石原料粉末,為上述(ii)通式MO所表示金屬氧化物的粉末與Al2 O3 的粉末之混合物時,採用混合物全體的比表面積,意即Σ(各粉末之比表面積×尖晶石原料粉末中各粉末之質量比率)作為尖晶石原料粉末的比表面積。
獲得煅燒用混合物的混合方法,可適用乾式、濕式等各種方法。以極力避免使作為原料使用的α型矽鋁氮氧化物螢光體粒子粉碎、或極力避免混合時雜質自裝置混入之方法為佳。
煅燒溫度,例如為1300℃以上1700℃以下。為了使複合體緻密化,以煅燒溫度高者為佳。但是,煅燒溫度越高,α型矽鋁氮氧化物螢光體之螢光特性越低。因此,以適當的溫度煅燒為佳。 煅燒方法為常壓燒結或是加壓燒結皆可。為了抑制α型矽鋁氮氧化物螢光體的特性降低,並且獲得緻密的複合體,相較於常壓燒結,以易緻密化之加壓燒結為較佳。加壓燒結方法,舉例為熱壓燒結、火花電漿燒結(SPS)、熱均壓燒結(HIP)等。熱壓燒結及SPS燒結時,壓力為10MPa以上,以30MPa以上為佳,以100MPa以下為佳。 為了防止α型矽鋁氮氧化物的氧化,煅燒環境以氮氣、氬氣等非氧化性的鈍性氣體,或在真空環境下為佳。
[發光裝置] 本實施型態之發光裝置,係為具備有三族氮化物半導體發光元件(發光元件20)、及設置於三族氮化物半導體發光元件之一面上之上述螢光體板10。 三族氮化物半導體發光元件,係以例如AlGaN、GaN、InAlGaN系材料等三族氮化物半導體所構成,具備有n層、發光層、及p層。三族氮化物半導體發光元件,可使用發出藍色光之藍色LED。 螢光體板10可直接配置於發光元件20之一面上,亦可間隔透光性構件或是間隔件配置。
配置於發光元件20上之螢光體板10,可使用圖1所表示之圓板形狀的螢光體板100(螢光體晶圓),亦可使用將螢光體板100經個片化而得者。 圖1為表示螢光體板構成一例之示意圖。圖1所示之螢光體板100的厚度,例如為100μm以上1mm以下。螢光體板100的厚度亦可在上述的製造步驟(煅燒等)之後,藉由磨削等調整。 另外,圓板形狀的螢光體板100,相較於方形形狀,由於可抑制邊角部位的缺損及裂痕,故耐久性、運送性優秀。
發光裝置的一例以圖2(a)、(b)表示。圖2(a)為將覆晶型發光裝置110之構成以示意性表示的剖面圖,圖2(b)為將打線接合型發光裝置120之構成以示意性表示的剖面圖。
圖2(a)之發光裝置110具備有基板30、及介隔銲料40(固晶材)與基板30電性連接之發光元件20、及設置於發光元件20發光面上之螢光體板10。覆晶型發光裝置110,為面朝上型及面朝下型中任一構造皆可。 此外,圖2(b)之發光裝置120具備有基板30、及介隔接合線60及電極50與基板30電性連接之發光元件20、及設置於發光元件20發光面上之螢光體板10。圖2中,發光元件20與螢光體板10係以公知的方法貼附,例如,亦能以聚矽氧系黏接劑、熱熔接等方法貼合。 可將發光裝置110、發光裝置120全體以透明密封材密封。
可將經個片化的螢光體板10,貼附在裝設於基板30之發光元件20。由於大面積的螢光體板100貼付多個發光元件20,經由切割,可將每個附帶有螢光體板10之發光元件20個片化。此外,亦可將大面積的螢光體板100貼付在表面形成了多個發光元件20之半導體晶圓上,之後將半導體晶圓及螢光體板100一同個片化。
以上所述為本發明之實施型態,但此等僅為本發明之例示,可採用上述以外的各種構成。此外,本發明並不限定於上述實施型態,在可達成本發明之目的範圍內之變形、改良等亦包含於本發明中。 [實施例]
基於實施例及比較例來詳細地說明本發明之實施態樣。為保險起見於此說明,本發明並不僅限定於實施例。
[螢光體板之製造] 螢光體板係經由以下步驟製造。 (1)將後述表1所記載的α型矽鋁氮氧化物螢光體,及尖晶石原料粉(MgO及Al2 O3 ),使用聚乙烯製鍋和氧化鋁製球,於乙醇溶劑中進行30分鐘的濕式混合,將得到的漿料以抽氣過濾去除溶劑後乾燥。之後,將混合後原料,通過篩孔為75μm的尼龍製網篩消除結塊,得到原料混合粉末。 將α型矽鋁氮氧化物螢光體的量,調整成為原料混合粉末的30體積%(剩餘部分的70體積%為MgO及Al2 O3 )。使尖晶石原料粉中的MgO與Al2 O3 的比率成為質量比MgO:Al2 O3 =28:72(莫耳數為Mg:Al=1:2)。
(2)將原料混合粉末填充於熱壓模具內。具體來說,係將約10g的原料混合粉末填充於裝設有碳製下衝頭的內徑30mm之碳製模具。之後,裝設碳製上衝頭將原料粉末夾在其中。 為了防止固著,原料混合粉末與碳模具之間設有厚度0.127mm的碳板(GraTech公司製、GRAFOIL)。
(3)將填充了原料混合粉末的熱壓模具設置於具備碳加熱器的多功能高溫爐(富士電波工業股份有限公司製、High-Multi-5000)。將爐內真空排氣至0.1Pa以下,保持減壓狀態,將上下衝頭以55MPa的壓力加壓。維持加壓狀態,以每分鐘5℃的速度升溫至1600℃。到達1600℃後停止加熱,慢慢冷卻至室溫並減壓。之後,回收外徑30mm的煅燒物,使用平面磨削盤及圓筒磨削盤,磨削外圍。由此可得直徑25mm的圓板狀的螢光體板(厚度記載於表中)。
使用X射線繞射裝置(Rigaku股份有限公司製UltimaIV),以CuKα線XRD測定獲得的樣本。從得到的X射線繞射圖像確認了作為主相之α型矽鋁氮氧化物及尖晶石的存在。 此外,研磨所獲得的螢光體板作為SEM觀察用,並以SEM觀察該研磨面。結果,於實施例1~10的螢光體板,觀察到含有尖晶石的基質相之間α型矽鋁氮氧化物螢光體粒子為分散狀態。 接著依循JIS B 0601,使用表面粗糙度測定器(Mitutoyo製、SJ-400),測定各螢光體板主面的表面粗糙度Ra。
接著,使用附有積分球裝置(ISV-469)的日本分光公司製紫外可見光分光光度計(V-550),測定獲得的螢光體板之L*a*b*色座標。 具體來說,首先於標準白板(Labsphere公司製、Spectralon)進行基礎校正。之後以夾在積分球裝置與標準白板之間的方式設置螢光體板,以300~850nm波長範圍測定。依循JIS Z 8781-4:2013,計算出L*值、a*值及b*值。
表1記載的原料詳細內容如以下所示。
[α型矽鋁氮氧化物螢光體] 螢光體1:Ca-α矽鋁氮氧化物螢光體(ALONBRIGHT YL-600B、Denka股份有限公司製、中值粒徑15μm)
[MgO] MgO-1:富士膠片和光純藥公司製的氧化鎂、平均粒徑0.2μm、純度99.9%、BET比表面積2.3m2 /g MgO-2:岩谷化學公司製的氧化鎂、品項「MJ-30」、BET比表面積20.6m2 /g
[Al2 O3 ] Al2 O3 -1:TM-DAR(大明化學公司製)、BET比表面積14.5m2 /g Al2 O3 -2:AKP-53(住友化學公司)、BET比表面積11.7m2 /g Al2 O3 -3:AKP-20(住友化學公司製)、BET比表面積4.3m2 /g Al2 O3 -4:AKP-3000(住友化學公司製)、BET比表面積4.5m2 /g Al2 O3 -5:AA-03(住友化學公司製)、BET比表面積5.2m2 /g
[SiO2 :比較例用] SiO2 -1:SFP-30M(Denka公司製)、BET比表面積6.2m2 /g SiO2 -2:FB-9SDC(Denka公司製)、BET比表面積1.4m2 /g
上述各材料的BET比表面積為,使用比表面積/細孔分布測定裝置BELSORP-mini(MICROTRAC MRB公司製),依循JIS Z8830:2013所測定的值。
表1中「BET比表面積」為,「MgO的BET比表面積×尖晶石原料粉中的MgO的質量比率(28/100)+Al2 O3 的BET比表面積×尖晶石原料粉中的Al2 O3 的質量比率(72/100)」的值。表1的BET比表面積即表示為,含有28質量%MgO、72質量%Al2 O3 之尖晶石原料粉「全體」的比表面積。
[表1]
Figure 02_image001
[發光效率之評價] 使用晶片板型(COB型)的LED封裝130評價了螢光體板的發光效率。圖3為用以測定螢光體板100的發光光譜之裝置(LED封裝130)的概略圖。 首先,準備了形成有凹部70的鋁基板(基板30)。凹部70底面之直徑φ為13.5mm,凹部70的開口部之直徑φ為16mm。於該基板30之凹部70的內部,設置有作為藍色發光光源之藍色LED(發光元件20)。 之後,於藍色LED上部設置圓形螢光體板100,將基板30之凹部70的開口部塞住,製造了圖3所示的裝置(晶片板型(COB型)的LED封裝130)。
使用了全光通量測定系統(HalfMoon/φ1000mm積分球系統、大塚電子股份有限公司製),測定在製得的LED包裝130之藍色LED點亮時,於螢光體板100之表面的發光光譜。 在獲得的發光光譜中,求得波長585nm以上605nm以下橙色光(Orange)發光強度(螢光強度)的最大值(W/nm)。表2中,關於螢光強度最大值,表示為當實施例1標準化為100%時,其他實施例、比較例的相對值(%)。
[表2]
Figure 02_image003
由表2,實施例1~10螢光體板之發光強度(螢光強度),大於比較例1及2螢光體板之發光強度。意即由含有α型矽鋁氮氧化物螢光體,及含有尖晶石之燒結體的複合體所構成的螢光體板,擁有優秀的發光效率。 若更詳細地分析實施例1~10,尖晶石原料粉之BET比表面積為0.1m2 /g以上10.0m2 /g以下,且/或是a*值與b*值的和為17.0以上19.5以下之實施例5~10的螢光體板,顯示出更優秀的發光效率。
本申請案係為,以2019年10月23日申請之日本申請案特願2019-192949號為基礎主張優先權,其所有公開內容皆納入於此。
10:螢光體板 20:發光元件 30:基板 40:銲料 50:電極 60:接合線 70:凹部 100:螢光體板 110:發光裝置 120:發光裝置 130:LED包裝
[圖1]表示螢光體板構成一例之示意圖。 [圖2](a)係將覆晶型發光裝置之構成以示意性表示的剖面圖,(b)係將打線接合(Wire bonding)型發光元件之構成以示意性表示的剖面圖。 [圖3]用以測定螢光體板發光效率之裝置的概略圖。
100:螢光體板

Claims (10)

  1. 一種螢光體板,係由複合體構成,該複合體含有:α型矽鋁氮氧化物螢光體、及含有以通式M2x Al4-4x O6-4x 表示之尖晶石的燒結體,M為Mg、Mn、Zn之至少任一者,0.2<x<0.6。
  2. 如請求項1之螢光體板,其中,該α型矽鋁氮氧化物螢光體的含量,相對於該複合體全體,為5Vol%以上、50Vol%以下。
  3. 如請求項1或2之螢光體板,其中,該α型矽鋁氮氧化物螢光體及該含有尖晶石之燒結體的含量合計值,相對於該複合體全體,為95Vol%以上、100Vol%以下。
  4. 如請求項1或2之螢光體板,其中,該α型矽鋁氮氧化物螢光體,為含有下述通式(1)表示之含有Eu元素之α型矽鋁氮氧化物螢光體: 通式(1)  (M)m(1-x)/p (Eu)mx/2 (Si)12-(m+n) (Al)m+n (O)n (N)16-n 通式(1)中, M表示選自於由Li、Mg、Ca、Y及鑭系元素構成之群組中之1種以上的元素,惟,排除La及Ce, p表示M元素之價數, 0<x<0.5、1.5≦m≦4.0、0≦n≦2.0。
  5. 如請求項1或2之螢光體板,其中,該複合體中α型矽鋁氮氧化物螢光體之體積基準的中值粒徑D50 ,為2μm以上30μm以下。
  6. 如請求項1或2之螢光體板,其中,在該螢光體板的主面之表面粗糙度Ra,係為0.01μm以上、2.0μm以下。
  7. 如請求項1或2之螢光體板,其中,依循JIS Z 8781-4所測定之該螢光體板的主面於L* a* b* 色座標之a* 值及b* 值的和為17.0以上、19.5以下。
  8. 如請求項1或2之螢光體板,係作為將照射的藍色光轉換成橙色光並且發光之波長轉換器使用。
  9. 一種發光裝置,具備有三族氮化物半導體發光元件、 及設置於該三族氮化物半導體發光元件之一面上,如請求項第1至8項中任一項之螢光體板。
  10. 一種螢光體板的製造方法,係如請求項1至8中任一項之螢光體板的製造方法,包含將含有α型矽鋁氮氧化物螢光體、及尖晶石原料粉末之混合物進行加熱的煅燒步驟, 該尖晶石原料粉末,係(i)含有以該通式表示之尖晶石的粉末,及/或是(ii)以通式MO表示之金屬氧化物的粉末與Al2 O3 的粉末之混合物,M為Mg、Mn、Zn之至少任一者, 該尖晶石原料粉末的BET比表面積為0.1m2 /g以上、10.0m2 /g以下。
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