TW202116728A - 化合物、酸產生劑、組合物、硬化物及圖案、以及硬化物及圖案之製造方法 - Google Patents

化合物、酸產生劑、組合物、硬化物及圖案、以及硬化物及圖案之製造方法 Download PDF

Info

Publication number
TW202116728A
TW202116728A TW109130992A TW109130992A TW202116728A TW 202116728 A TW202116728 A TW 202116728A TW 109130992 A TW109130992 A TW 109130992A TW 109130992 A TW109130992 A TW 109130992A TW 202116728 A TW202116728 A TW 202116728A
Authority
TW
Taiwan
Prior art keywords
group
substituted
mentioned
carbon atoms
unsubstituted
Prior art date
Application number
TW109130992A
Other languages
English (en)
Chinese (zh)
Inventor
松井依純
中屋敷哲千
有吉智幸
Original Assignee
日商艾迪科股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商艾迪科股份有限公司 filed Critical 日商艾迪科股份有限公司
Publication of TW202116728A publication Critical patent/TW202116728A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/64—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and sulfur atoms, not being part of thio groups, bound to the same carbon skeleton
    • C07C323/66—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and sulfur atoms, not being part of thio groups, bound to the same carbon skeleton containing sulfur atoms of sulfo, esterified sulfo or halosulfonyl groups, bound to the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/64—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
    • C07C309/65—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C321/00—Thiols, sulfides, hydropolysulfides or polysulfides
    • C07C321/24—Thiols, sulfides, hydropolysulfides, or polysulfides having thio groups bound to carbon atoms of six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/82—Carbazoles; Hydrogenated carbazoles
    • C07D209/88—Carbazoles; Hydrogenated carbazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the ring system
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D335/00—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom
    • C07D335/04—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D335/10—Dibenzothiopyrans; Hydrogenated dibenzothiopyrans
    • C07D335/12—Thioxanthenes
    • C07D335/14—Thioxanthenes with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 9
    • C07D335/16—Oxygen atoms, e.g. thioxanthones
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials Engineering (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
TW109130992A 2019-09-10 2020-09-09 化合物、酸產生劑、組合物、硬化物及圖案、以及硬化物及圖案之製造方法 TW202116728A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019-164899 2019-09-10
JP2019164899 2019-09-10

Publications (1)

Publication Number Publication Date
TW202116728A true TW202116728A (zh) 2021-05-01

Family

ID=74865682

Family Applications (1)

Application Number Title Priority Date Filing Date
TW109130992A TW202116728A (zh) 2019-09-10 2020-09-09 化合物、酸產生劑、組合物、硬化物及圖案、以及硬化物及圖案之製造方法

Country Status (5)

Country Link
JP (1) JP7594534B2 (https=)
KR (1) KR102916286B1 (https=)
CN (1) CN113727967A (https=)
TW (1) TW202116728A (https=)
WO (1) WO2021049470A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7824280B2 (ja) * 2021-04-22 2026-03-04 株式会社Adeka 化合物、酸発生剤、組成物、硬化物、硬化物の製造方法、パターン及びパターンの製造方法
WO2023044364A1 (en) 2021-09-15 2023-03-23 Enko Chem, Inc. Protoporphyrinogen oxidase inhibitors
KR20250162509A (ko) * 2023-03-23 2025-11-18 가부시키가이샤 아데카 화합물, 조성물, 경화물 및 패턴
CN117720483A (zh) * 2023-11-08 2024-03-19 湖北三峡实验室 一类含芳香性三氟甲肟基磺酸酯结构的光产酸剂及其制备方法和应用

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG78412A1 (en) * 1999-03-31 2001-02-20 Ciba Sc Holding Ag Oxime derivatives and the use thereof as latent acids
WO2004074242A2 (en) * 2003-02-19 2004-09-02 Ciba Specialty Chemicals Holding Inc. Halogenated oxime derivatives and the use thereof as latent acids
JP2005319758A (ja) * 2004-05-11 2005-11-17 Fuji Photo Film Co Ltd 平版印刷方法及びそれに用いる平版印刷版原版
WO2006008250A2 (en) 2004-07-20 2006-01-26 Ciba Specialty Chemicals Holding Inc. Oxime derivatives and the use therof as latent acids
JP2010164964A (ja) * 2008-12-19 2010-07-29 Fujifilm Corp 感光性組成物、カラーフィルタ、および液晶表示装置
CN103389621B (zh) * 2013-07-26 2016-03-16 常州强力先端电子材料有限公司 一种磺酸肟酯类光产酸剂
KR101491973B1 (ko) * 2014-03-12 2015-02-11 (주)휴넷플러스 화학 증폭형 포지티브형 포토레지스트 조성물 및 이를 이용한 tft 레지스트 패턴 형성방법
KR101491975B1 (ko) * 2014-03-14 2015-02-11 (주)휴넷플러스 화학 증폭형 포지티브 감광성 경화 수지 조성물, 이를 이용한 경화막의 제조 방법 및 경화막을 포함하는 전자소자
JP6605820B2 (ja) 2015-03-11 2019-11-13 株式会社Ａｄｅｋａ オキシムスルホネート化合物、光酸発生剤、レジスト組成物、カチオン重合開始剤、およびカチオン重合性組成物
KR20180101564A (ko) 2016-01-26 2018-09-12 가부시키가이샤 아데카 열산 발생제 및 이것을 사용한 레지스트 조성물
CN107163169B (zh) * 2017-05-25 2018-08-24 同济大学 一类香豆素并咔唑型肟酯类化合物及其制备方法和应用
CN110806677A (zh) * 2018-08-06 2020-02-18 常州强力先端电子材料有限公司 光致抗蚀剂组合物、其图案形成方法及应用

Also Published As

Publication number Publication date
CN113727967A (zh) 2021-11-30
JPWO2021049470A1 (https=) 2021-03-18
KR20220061909A (ko) 2022-05-13
JP7594534B2 (ja) 2024-12-04
KR102916286B1 (ko) 2026-01-22
WO2021049470A1 (ja) 2021-03-18

Similar Documents

Publication Publication Date Title
JP7594534B2 (ja) 化合物、酸発生剤、組成物、硬化物及びパターン、並びに硬化物及びパターンの製造方法
TWI746496B (zh) 黑柱間隔件用感光性樹脂組成物、黑柱間隔件、顯示裝置、及黑柱間隔件之形成方法
US11754920B2 (en) Thermal acid generator and resist composition using same
JP7631208B2 (ja) 化合物、酸発生剤、組成物、硬化物及びパターン、並びに硬化物及びパターンの製造方法
TWI881096B (zh) 自由基聚合起始劑、組合物、硬化物及硬化物之製造方法
JP7701910B2 (ja) 改質金属酸化物微粒子の製造方法、改質金属酸化物微粒子分散液の製造方法、及び固体物品の製造方法
JP7824280B2 (ja) 化合物、酸発生剤、組成物、硬化物、硬化物の製造方法、パターン及びパターンの製造方法
JP7805805B2 (ja) 化合物、酸発生剤、組成物、硬化物、硬化物の製造方法、パターン及びパターンの製造方法
JP7376347B2 (ja) 樹脂組成物、硬化物、及びシロキサン変性（メタ）アクリル樹脂
WO2021220920A1 (ja) 表面改質金属酸化物微粒子の製造方法、表面改質金属酸化物微粒子、表面改質金属酸化物微粒子分散液、固体物品、表面改質金属酸化物微粒子分散液の製造方法、及び固体物品の製造方法
JPWO2022224835A5 (https=)
TW202035360A (zh) 化合物、酸產生劑、組合物、硬化物、硬化物之製造方法及圖案塗膜之製造方法
TW202442644A (zh) 化合物、組合物、硬化物及圖案
TW202307027A (zh) 硬化性組合物、硬化膜及其應用、硬化膜的製造方法、以及聚合物
KR20220157365A (ko) 화합물, 조성물, 경화물 및 경화물의 제조 방법
JP7376346B2 (ja) 硬化性組成物、硬化物、（メタ）アクリル樹脂、及び化合物
TW202603012A (zh) 組合物及其硬化物、成形物、顯示裝置、以及固體攝像元件
KR20210082377A (ko) 경화성 조성물, 경화물, (메타)아크릴 수지, 및 화합물
TW202545910A (zh) 化合物、組合物及其硬化物、成形物、顯示裝置、以及固體攝像元件
CN119065201A (zh) 感放射线性组合物、硬化膜及其制造方法、半导体元件以及显示元件