TW202040284A - 曝光裝置、照明光學系統以及元件製造方法 - Google Patents

曝光裝置、照明光學系統以及元件製造方法 Download PDF

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Publication number
TW202040284A
TW202040284A TW109109702A TW109109702A TW202040284A TW 202040284 A TW202040284 A TW 202040284A TW 109109702 A TW109109702 A TW 109109702A TW 109109702 A TW109109702 A TW 109109702A TW 202040284 A TW202040284 A TW 202040284A
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TW
Taiwan
Prior art keywords
exposure
optical system
area
illumination
light
Prior art date
Application number
TW109109702A
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English (en)
Chinese (zh)
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TWI849088B (zh
Inventor
吉田亮平
井田真高
吉田大輔
野嶋琢己
松橋佑介
渡辺暢章
Original Assignee
日商尼康股份有限公司
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Publication of TW202040284A publication Critical patent/TW202040284A/zh
Application granted granted Critical
Publication of TWI849088B publication Critical patent/TWI849088B/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW109109702A 2019-03-29 2020-03-24 曝光裝置、照明光學系統以及元件製造方法 TWI849088B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019069147 2019-03-29
JP2019-069147 2019-03-29

Publications (2)

Publication Number Publication Date
TW202040284A true TW202040284A (zh) 2020-11-01
TWI849088B TWI849088B (zh) 2024-07-21

Family

ID=72668815

Family Applications (1)

Application Number Title Priority Date Filing Date
TW109109702A TWI849088B (zh) 2019-03-29 2020-03-24 曝光裝置、照明光學系統以及元件製造方法

Country Status (5)

Country Link
JP (1) JPWO2020203002A1 (ko)
KR (1) KR20210142602A (ko)
CN (2) CN118311837A (ko)
TW (1) TWI849088B (ko)
WO (1) WO2020203002A1 (ko)

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10199800A (ja) * 1997-01-09 1998-07-31 Nikon Corp オプティカルインテグレータを備える照明光学装置
JP2001297975A (ja) * 2000-04-17 2001-10-26 Nikon Corp 露光装置及び露光方法
TW486741B (en) * 2000-04-17 2002-05-11 Nikon Corp Aligner and method of exposure
JP2002258489A (ja) * 2000-04-20 2002-09-11 Nikon Corp 露光装置および露光方法
JP2001305745A (ja) * 2000-04-24 2001-11-02 Nikon Corp 走査露光方法および走査型露光装置
JP2004335864A (ja) * 2003-05-09 2004-11-25 Nikon Corp 露光装置及び露光方法
JP2016054230A (ja) 2014-09-04 2016-04-14 キヤノン株式会社 投影露光装置及び露光方法
KR102567319B1 (ko) * 2016-04-28 2023-08-16 엘지디스플레이 주식회사 분할노광 장치 및 이를 이용한 액정표시장치의 제조방법
WO2019021858A1 (ja) * 2017-07-25 2019-01-31 凸版印刷株式会社 露光装置および露光方法

Also Published As

Publication number Publication date
WO2020203002A1 (ja) 2020-10-08
CN113439236A (zh) 2021-09-24
KR20210142602A (ko) 2021-11-25
TWI849088B (zh) 2024-07-21
JPWO2020203002A1 (ko) 2020-10-08
CN118311837A (zh) 2024-07-09
CN113439236B (zh) 2024-06-04

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