JPWO2020203002A1 - - Google Patents

Info

Publication number
JPWO2020203002A1
JPWO2020203002A1 JP2021511275A JP2021511275A JPWO2020203002A1 JP WO2020203002 A1 JPWO2020203002 A1 JP WO2020203002A1 JP 2021511275 A JP2021511275 A JP 2021511275A JP 2021511275 A JP2021511275 A JP 2021511275A JP WO2020203002 A1 JPWO2020203002 A1 JP WO2020203002A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2021511275A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2020203002A1 publication Critical patent/JPWO2020203002A1/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2021511275A 2019-03-29 2020-03-04 Pending JPWO2020203002A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019069147 2019-03-29
PCT/JP2020/009124 WO2020203002A1 (ja) 2019-03-29 2020-03-04 露光装置、照明光学系、およびデバイス製造方法

Publications (1)

Publication Number Publication Date
JPWO2020203002A1 true JPWO2020203002A1 (ja) 2020-10-08

Family

ID=72668815

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021511275A Pending JPWO2020203002A1 (ja) 2019-03-29 2020-03-04

Country Status (5)

Country Link
JP (1) JPWO2020203002A1 (ja)
KR (1) KR20210142602A (ja)
CN (1) CN113439236B (ja)
TW (1) TW202040284A (ja)
WO (1) WO2020203002A1 (ja)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10199800A (ja) * 1997-01-09 1998-07-31 Nikon Corp オプティカルインテグレータを備える照明光学装置
JP2001297975A (ja) * 2000-04-17 2001-10-26 Nikon Corp 露光装置及び露光方法
JP2002258489A (ja) * 2000-04-20 2002-09-11 Nikon Corp 露光装置および露光方法
JP2001305745A (ja) * 2000-04-24 2001-11-02 Nikon Corp 走査露光方法および走査型露光装置
JP2004335864A (ja) * 2003-05-09 2004-11-25 Nikon Corp 露光装置及び露光方法
JP2016054230A (ja) 2014-09-04 2016-04-14 キヤノン株式会社 投影露光装置及び露光方法
KR102567319B1 (ko) * 2016-04-28 2023-08-16 엘지디스플레이 주식회사 분할노광 장치 및 이를 이용한 액정표시장치의 제조방법

Also Published As

Publication number Publication date
WO2020203002A1 (ja) 2020-10-08
CN113439236A (zh) 2021-09-24
CN113439236B (zh) 2024-06-04
TW202040284A (zh) 2020-11-01
KR20210142602A (ko) 2021-11-25

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