TW201820434A - 切割裝置 - Google Patents

切割裝置 Download PDF

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TW201820434A
TW201820434A TW106127553A TW106127553A TW201820434A TW 201820434 A TW201820434 A TW 201820434A TW 106127553 A TW106127553 A TW 106127553A TW 106127553 A TW106127553 A TW 106127553A TW 201820434 A TW201820434 A TW 201820434A
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cutting
end surface
air
light emitting
cleaning water
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TW106127553A
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TWI755419B (zh
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笠井剛史
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日商迪思科股份有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D7/00Accessories specially adapted for use with machines or devices of the preceding groups
    • B28D7/04Accessories specially adapted for use with machines or devices of the preceding groups for supporting or holding work or conveying or discharging work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02Cleaning by the force of jets or sprays
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00Cleaning by methods involving the use of air flow or gas flow
    • B08B5/02Cleaning by the force of jets, e.g. blowing-out cavities
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0005Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
    • B28D5/0017Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing using moving tools
    • B28D5/0023Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing using moving tools rectilinearly
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0005Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
    • B28D5/0041Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing the workpiece being brought into contact with a suitably shaped rigid body which remains stationary during breaking
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0076Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for removing dust, e.g. by spraying liquids; for lubricating, cooling or cleaning tool or work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0082Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D7/00Accessories specially adapted for use with machines or devices of the preceding groups
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D7/00Accessories specially adapted for use with machines or devices of the preceding groups
    • B28D7/02Accessories specially adapted for use with machines or devices of the preceding groups for removing or laying dust, e.g. by spraying liquids; for cooling work
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67259Position monitoring, e.g. misposition detection or presence detection
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/10Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Dicing (AREA)
  • Machine Tool Sensing Apparatuses (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
  • Auxiliary Devices For Machine Tools (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

[課題] 在於提供一種具備了可抑制洗淨水的使用量,並同時防止污垢附著於光學感測器之非接觸設置機構的切割裝置。   [解決手段] 一種切割裝置,係具備有:夾頭座,保持被加工物;切割單元,以切割刀來切割被保持於該夾頭座的被加工物;檢測手段,檢測該切割刀的前端位置;及控制手段,至少控制該夾頭座、該切割單元及該檢測手段,該切割裝置,其特徵係,該檢測手段,係包含有:U形狀刀侵入部;發光部,被配設於該刀侵入部之一方的側;受光部,被配設於接收來自該發光部的光之該刀侵入部之另一方的側;洗淨水噴嘴,將洗淨水供給至該發光部及該受光部的端面,防止切割屑附著於該端面;及空氣供給噴嘴,將空氣供給至該端面,該控制手段,係在檢測該切割刀之前端位置的檢測動作時,停止來自該洗淨水供給噴嘴及該空氣供給噴嘴之洗淨水及空氣的供給,在除了該檢測動作時以外之待機時,將洗淨水及空氣間歇地供給至該端面,去除附著於該端面的切割屑。

Description

切割裝置
[0001] 本發明,係關於切割裝置,特別是關於一種可抑制對非接觸設置機構之光學感測器供給洗淨水,並同時防止光學感測器之污垢的切割裝置。
[0002] 半導體晶圓或陶瓷、玻璃等之必需精密切割的各種電子組件,係藉由被稱為切割機之切割裝置而分割成一個個晶片。在該些電子組件的加工中,必需進行微米單位之精密的切割,在這樣的加工中,不僅晶片的尺寸重要,而且切割深度亦重要。   [0003] 例如,半導體晶圓,係被固定於切割帶,並使切割刀切入切割帶10~30μm左右而完全切斷半導體晶圓,但只要該切割帶的切入量不足,則晶圓不會完全被切斷,導致下側之切斷片呈現如缺損般的鋸齒形狀。   [0004] 又,用於切割的切割刀,係具有隨著持續切割加工而磨損的性質,且必需隨時修正切割刀的磨損所致之切割深度的變動。   [0005] 這種切割刀之刃尖位置的變動,係藉由使用了光學感測器的非接觸設置機構而隨時檢測,並基於檢測結果,進行切割刀之高度位置的修正(原點位置修正)(例如,參閱日本特開平11-214334號公報)。藉由該技術,無需切斷保持被加工物之夾頭座或被加工物,可不損傷切割刀且容易地檢測切割刀的高度位置。   [0006] 由於在藉由光學感測器檢測切割刀的刃尖位置(前端位置)中,重要的是避免光學感測器之錯誤識別,因此,使由發光部及受光部所構成的光學感測器保持潔淨。但是,由於光學感測器位於加工室的氛圍中,因此,存在有氛圍中之切割屑附著於光學感測器而容易導致錯誤識別的問題。   [0007] 因此,除了切割刀之前端位置的檢測動作時以外,雖係提供了將洗淨水供給至光學感測器的方法,但存在有大量消耗洗淨水的問題。為了避免該問題,在日本特開2003-211354號公報,提出了如下述之方法:以開關蓋收容光學感測器,防止光學感測器暴露於加工室的氛圍。 [先前技術文獻] [專利文獻]   [0008]   [專利文獻1] 日本特開平11-214334號公報   [專利文獻2] 日本特開2003-211354號公報
[本發明所欲解決之課題]   [0009] 然而,對於專利文獻2所揭示的機構而言,係在加工室之氛圍大量地含有切割屑的情況下,開關蓋之微小間隙成為光學感測器之污垢的原因,進而留下了恐有發生錯誤檢測之虞。   [0010] 本發明,係有鑑於像這樣的觀點所進行研究者,其目的,係在於提供一種具備了可抑制洗淨水的使用量,並同時防止污垢附著於光學感測器之非接觸設置機構的切割裝置。 [用以解決課題之手段]   [0011] 根據本發明,提供一種切割裝置,其係具備有:夾頭座,保持被加工物;切割單元,以切割刀來切割被保持於該夾頭座的被加工物;檢測手段,檢測該切割刀的前端位置;及控制手段,至少控制該夾頭座、該切割單元及該檢測手段,該切割裝置,其特徵係,該檢測手段,係包含有:U形狀刀侵入部;發光部,被配設於該刀侵入部之一方之側;受光部,接收來自該發光部的光且被配設於該刀侵入部之另一方之側;及洗淨水噴嘴,將洗淨水供給至該發光部及該受光部的端面,防止切割屑附著於該端面,該控制手段,係在檢測該切割刀之前端位置的檢測動作時,停止來自該洗淨水供給噴嘴之洗淨水的供給,在除了該檢測動作時以外之待機時,將洗淨水間歇地供給至該端面,去除附著於該端面的切割屑。   [0012] 較佳為,該檢測手段,係更包含有:空氣供給噴嘴,將空氣供給至該發光部及該受光部的該端面,該控制手段,係在該待機時,從該空氣供給噴嘴,將空氣間歇地供給至該端面,藉由由水與空氣所構成的2流體,去除附著於該端面的切割屑。 [發明之效果]   [0013] 根據本發明之切割裝置,以間歇地將洗淨水供給至非接觸設置機構之光學感測器的方式,可抑制洗淨水的使用量,並同時防止污垢附著於光學感測器。
[0015] 以下,參照圖面,詳細地說明關於本發明之實施形態。參閱圖1,表示具備了本發明實施形態之非接觸設置機構(刀端部檢測機構)之切割裝置2的立體圖。   [0016] 4,係切割裝置2之基座,在基座4,係以可旋轉且可藉由未圖示的加工進給手段在X軸方向上往復移動的方式,配設有夾頭座6。在夾頭座6的周圍,係配設有防水罩8,且連結有遍及該防水罩8與基座4而用以保護加工進給機構之軸部的伸縮囊10。   [0017] 在基座4的後方,係豎立設置有門型形狀的支柱12。在支柱12,係固定有朝Y軸方向伸長的一對導引軌14。在支柱12,係以可藉由由滾珠螺桿18與未圖示之步進馬達所構成的Y軸移動機構(分度進給機構)20,沿著導引軌14在Y軸方向上移動的方式,搭載有Y軸移動塊16。   [0018] 在Y軸移動塊16,係固定有朝Z軸方向伸長的一對導引軌22。在Y軸移動塊16上,係以可藉由由滾珠螺桿26與步進馬達28所構成的Z軸移動機構30,被導引軌22引導而在Z軸方向上移動的方式,搭載有Z軸移動塊24。   [0019] 在Z軸移動塊24,係安裝有切割單元32,在切割單元32的主軸殼體34中,係可旋轉地收容有圖4所示的主軸36,在主軸36的前端部,係可裝卸地安裝有切割刀38。在Z軸移動塊24,係更安裝具有顯微鏡及攝像機的攝像單元40。   [0020] 42,係區劃出加工室44的加工室殼體,且由聚碳酸酯等的透明樹脂所形成。加工室殼體42,係收容有夾頭座6及切割刀38。在加工室殼體42,係形成有排氣口50。   [0021] 46,表示本發明實施形態之非接觸設置機構(刀端部檢測機構),其細節,係被表示於圖4及圖5。藉由拉引把手48的方式,可開啟加工室殼體42的門扉49,並可將被加工物搬入至夾頭座6上或從夾頭座6搬出被加工物。   [0022] 參閱圖2,表示夾頭座6移動至切割加工位置後之狀態之加工室殼體42的橫剖面圖。圖3,係加工室殼體42的縱剖面圖,在被保持於夾頭座6之被加工物的切割中,係一面從切割水噴嘴54朝向刀前端供給切割水,並從冷卻水噴嘴52朝向切割刀38的加工點供給冷卻水,一面進行被加工物的切割。   [0023] 因此,在加工室44的氛圍中,係飛散有加工屑或切割水及冷卻水的霧氣56,非接觸設置機構46被暴露於像這樣的氛圍。   [0024] 其次,參閱圖4~圖6,詳細地說明關於本發明實施形態之非接觸設置機構(刀端部檢測機構)46。如圖6所示,圓柱狀之支架60從基座4突出,非接觸設置機構46的安裝構件62被固定於該支架60。安裝構件62,係具有:水平部62a;垂直部62b,區劃出U形狀刀侵入部63;及傾斜部62c。   [0025] 隔著刀侵入部63,配設有由發光部64與接收來自發光部64的光之受光部66所構成的光學感測器65(參閱圖7)。如圖4所示,發光部64,係經由光纖83而連接於光源84,受光部66,係經由光纖85而連接於光電轉換部86。   [0026] 在安裝構件62的傾斜部62c,係配設有:洗淨水供給噴嘴68,將被恆溫調整後的洗淨水供給至發光部64及受光部66之端面;及空氣供給噴嘴70,將空氣供給至發光部64及受光部66之端面。   [0027] 如圖4所示,洗淨水供給噴嘴68,係經由電磁切換閥76而選擇性地連接於洗淨水供給源78,空氣供給噴嘴70,係經由電磁切換閥80而選擇性地連接於空氣壓供給源82。   [0028] 在使用了非接觸設置機構46之切割刀38的設置時,係驅動Z軸進給機構30的脈衝馬達28,且使切割刀38之前端部(刃尖)從上方侵入非接觸設置機構46的刀侵入部63。   [0029] 此時,在切割刀38完全不遮蔽光學感測器65的發光部64與受光部66之間的情況下,受光部66所接受的光量為最大,與該光量對應之來自光電轉換部86的輸出,係例如如圖5所示,被設定為5V。   [0030] 隨著切割刀38進入刀侵入部63,由於切割刀38遮蔽從發光部64所射出之光束的量漸漸地增加,因此,受光部66所接收的光量漸漸地減少,來自光電轉換部86之輸出電壓,係如圖5中符號87所示般漸漸地減少。   [0031] 而且,當切割刀38到達了發光部64與受光部66的預定位置時,來自光電轉換部86之輸出電壓被設定成基準電壓即例如3V。因此,當光電轉換部86之輸出電壓成為3V時,電壓比較部90,係將光電轉換部86之輸出電壓達到了基準電壓之要旨的信號輸出至端部位置檢測部92。   [0032] 端部位置檢測部92,係將檢測到基準位置之要旨的信號發送至脈衝馬達28,停止脈衝馬達28的驅動。此時,端部位置檢測部92,係藉由計數Z軸進給機構30之脈衝馬達28之脈波數的方式,檢測切割刀38之切入方向(Z軸方向)的位置。切割刀38的最下點端部位置即基準位置,係被記憶於切割裝置2的記憶體。   [0033] 根據本實施形態之非接觸設置方法,在以切割刀38適當切割了被加工物後,執行最下點端部檢測步驟,且與前次所測定而記憶之切割刀38之最下點端部的位置作比較,並執行以計算部94算出切割刀38之磨耗量(消耗量)的磨耗量算出步驟。   [0034] 而且,基於從磨耗量算出步驟所算出之切割刀38的磨耗量,以位置修正部96來修正切割刀38之Z軸方向的原點位置。藉由該原點位置的修正,可將切割刀38的刀尖設成為與夾頭座6之框體之上面接觸的原點位置。   [0035] 如上述般,非接觸設定機構46,係持續暴露於加工室44的氛圍。因此,光感測器65之發光部64及受光部66的端面會被氛圍中所含的霧氣、切割臂等污染。   [0036] 為了防止該污染,在本發明實施形態中,除了檢測切割刀38之前端位置的檢測動作時以外,係從洗淨水供給噴嘴68,將洗淨水間歇地供給至發光部64之端面及受光部66之端面,更佳為,從洗淨水供給噴嘴68及空氣供給噴嘴70,將洗淨水及空氣間歇地供給至發光部64之端面及受光部66之端面,去除附著於發光部64及受光部66之端面的污垢。   [0037] 以下,參照圖8,詳細地說明關於該端面洗淨方法。圖8的符號A,係切割刀38的刀尖檢測中,此時,係停止來自洗淨水供給噴嘴68之洗淨水的供給及來自空氣供給噴嘴70之空氣的供給。   [0038] 另外,無須贅言,在刀端部位置檢測時,係開啟經由鉸鏈74而安裝於安裝構件62的開關蓋72來進行檢測。當檢測動作結束時,則關閉開關蓋72,防止發光部64及受光部66暴露於加工室44的氛圍。   [0039] 在圖8中,在切割刀38之刀尖的檢測結束後之符號B所示之被加工物的切割中,係朝向發光部64及受光部66之端面間歇地供給洗淨水及空氣。   [0040] 如圖8的第2段所示,以虛線所示的C為供給停止期間,D為供給期間。因此,在B所示之被加工物的切割中,係交互地重複供給停止期間C與供給期間D。例如,在實施每1~5秒的供給停止期間C後,實施0.1~2秒左右的供給期間D。   [0041] 而且,如圖8的第3段所示,於供給期間D中,係在同時實施來自洗淨水供給噴嘴68之洗淨水的供給與來自空氣供給噴嘴70之空氣的供給之同時供給期間E後,設置僅供給F所示的洗淨水,於C所示的供給停止期間,端面會成為乾燥的狀態,從而防止切割屑容易附著於端面的情形。   [0042] 在此,來自空氣供給噴嘴70之空氣的供給,係用於與洗淨水一起去除附著於發光部64及受光部66之端面的污垢。空氣的流量,係調整成不使端面乾燥之程度的流量。   [0043] 亦可使洗淨水供給噴嘴68與空氣供給噴嘴70的噴出口靠近而在噴出後混合,使得空氣與洗淨水混合成為2流體以提高端面的洗淨效果,或亦可使噴嘴一體化而在內部混合洗淨水與空氣後進行噴出。   [0044] 根據上述的實施形態,以間歇地將洗淨水及空氣供給至非接觸設置機構46之發光部64及受光部66之端面的方式,可抑制洗淨水的使用量,並同時防止污垢附著於光學感測器65。   [0045] 除了該實施例以外,亦可於供給期間D中,防止污垢的附著,並同時防止乾燥。而且,亦可在緊接著檢測刀端部位置之前,從空氣供給噴嘴70進行空氣的供給,去除附著於端面的洗淨水。
[0046]
2‧‧‧切割裝置
6‧‧‧夾頭座
32‧‧‧切割單元
38‧‧‧切割刀
42‧‧‧加工室殼體
44‧‧‧加工室
46‧‧‧非接觸設置機構(刀端部檢測機構)
62‧‧‧安裝構件
63‧‧‧刀侵入部
64‧‧‧發光部
65‧‧‧光學感測器
66‧‧‧受光部
68‧‧‧洗淨水供給噴嘴
70‧‧‧空氣供給噴嘴
84‧‧‧光源
86‧‧‧光電轉換部
88‧‧‧基準電壓設定部
90‧‧‧電壓比較部
92‧‧‧端部位置檢測部
[0014]   [圖1] 具備了本發明之非接觸設置機構之切割裝置的立體圖。   [圖2] 夾頭座移動至切割加工位置後之狀態之加工室殼體的橫剖面圖。   [圖3] 加工室殼體的縱剖面圖。   [圖4] 非接觸設置機構的方塊圖。   [圖5] 表示因應了切割刀之切入方向的位置之非接觸設置機構之輸出電壓之變化的曲線圖。   [圖6] 非接觸設置機構的立體圖。   [圖7] 非接觸設置機構的側視圖。   [圖8] 說明洗淨水之供給方法之轉變的說明圖。

Claims (2)

  1. 一種切割裝置,係具備有:夾頭座,保持被加工物;切割單元,以切割刀來切割被保持於該夾頭座的被加工物;檢測手段,檢測該切割刀的前端位置;及控制手段,至少控制該夾頭座、該切割單元及該檢測手段,該切割裝置,其特徵係,   該檢測手段,係包含有:   U形狀刀侵入部;發光部,被配設於該刀侵入部之一方之側;受光部,接收來自該發光部的光且被配設於該刀侵入部之另一方之側;及洗淨水噴嘴,將洗淨水供給至該發光部及該受光部的端面,防止切割屑附著於該端面,   該控制手段,係在檢測該切割刀之前端位置的檢測動作時,停止來自該洗淨水供給噴嘴之洗淨水的供給,在該檢測動作時以外之待機時,將洗淨水間歇地供給至該端面,去除附著於該端面的切割屑。
  2. 如申請專利範圍第1項之切割裝置,其中,   該檢測手段,係更包含有:空氣供給噴嘴,將空氣供給至該發光部及該受光部的該端面,   該控制手段,係在該待機時,從該空氣供給噴嘴,將空氣間歇地供給至該端面,以水與空氣去除附著於該端面的切割屑。
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