TW201806976A - 組成物、膜、硬化膜、光學感測器及膜的製造方法 - Google Patents

組成物、膜、硬化膜、光學感測器及膜的製造方法 Download PDF

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Publication number
TW201806976A
TW201806976A TW106110676A TW106110676A TW201806976A TW 201806976 A TW201806976 A TW 201806976A TW 106110676 A TW106110676 A TW 106110676A TW 106110676 A TW106110676 A TW 106110676A TW 201806976 A TW201806976 A TW 201806976A
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TW
Taiwan
Prior art keywords
inorganic particles
group
composition
particles
film
Prior art date
Application number
TW106110676A
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English (en)
Chinese (zh)
Inventor
田口貴規
Original Assignee
富士軟片股份有限公司
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Publication date
Application filed by 富士軟片股份有限公司 filed Critical 富士軟片股份有限公司
Publication of TW201806976A publication Critical patent/TW201806976A/zh

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K7/00—Use of ingredients characterised by shape
    • C08K7/22—Expanded, porous or hollow particles
    • C08K7/24—Expanded, porous or hollow particles inorganic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
TW106110676A 2016-04-06 2017-03-30 組成物、膜、硬化膜、光學感測器及膜的製造方法 TW201806976A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016076617 2016-04-06
JP2016-076617 2016-04-06

Publications (1)

Publication Number Publication Date
TW201806976A true TW201806976A (zh) 2018-03-01

Family

ID=60001121

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106110676A TW201806976A (zh) 2016-04-06 2017-03-30 組成物、膜、硬化膜、光學感測器及膜的製造方法

Country Status (3)

Country Link
JP (1) JP6701324B2 (ja)
TW (1) TW201806976A (ja)
WO (1) WO2017175545A1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI778035B (zh) * 2018-03-27 2022-09-21 奇美實業股份有限公司 負型白色感光性樹脂組成物及其應用
TWI808137B (zh) * 2018-03-14 2023-07-11 日商東麗股份有限公司 負型感光性著色組成物、硬化膜及其製造方法、帶圖案的加工基板、帶隔離壁的基板、顯示裝置、觸控面板
TWI826562B (zh) * 2019-10-30 2023-12-21 台灣太陽油墨股份有限公司 感光性樹脂組成物、其之硬化物、使用其之乾膜及印刷配線板

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109375483A (zh) * 2018-09-11 2019-02-22 乐凯胶片股份有限公司 激光印刷介质及其使用方法
KR20230126562A (ko) * 2022-02-23 2023-08-30 삼성에스디아이 주식회사 경화성 조성물, 이를 이용한 막 및 디스플레이 장치

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005060522A (ja) * 2003-08-12 2005-03-10 Konica Minolta Opto Inc 中屈折率組成物、高屈折率組成物、反射防止積層体、偏光板及び画像表示装置
JP5875345B2 (ja) * 2011-11-28 2016-03-02 ニッコー・マテリアルズ株式会社 ソルダーレジスト用感光性樹脂組成物、及びこれを用いたソルダーレジスト用フォトレジストフィルム
TW201439676A (zh) * 2013-03-08 2014-10-16 Fujifilm Corp 感光性樹脂組成物、硬化物及其製造方法、樹脂圖案製造方法、硬化膜、液晶顯示裝置、有機ｅｌ顯示裝置以及觸控面板顯示裝置
JP6309834B2 (ja) * 2013-12-11 2018-04-11 株式会社Adeka 着色性組成物
JP2016027384A (ja) * 2014-06-25 2016-02-18 Jsr株式会社 ベゼル形成用感光性組成物、ベゼル及び表示装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI808137B (zh) * 2018-03-14 2023-07-11 日商東麗股份有限公司 負型感光性著色組成物、硬化膜及其製造方法、帶圖案的加工基板、帶隔離壁的基板、顯示裝置、觸控面板
TWI778035B (zh) * 2018-03-27 2022-09-21 奇美實業股份有限公司 負型白色感光性樹脂組成物及其應用
TWI826562B (zh) * 2019-10-30 2023-12-21 台灣太陽油墨股份有限公司 感光性樹脂組成物、其之硬化物、使用其之乾膜及印刷配線板

Also Published As

Publication number Publication date
WO2017175545A1 (ja) 2017-10-12
JPWO2017175545A1 (ja) 2019-02-14
JP6701324B2 (ja) 2020-05-27

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