TW201736125A - 藍寶石複合基材與其製造方法 - Google Patents

藍寶石複合基材與其製造方法 Download PDF

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TW201736125A
TW201736125A TW105141625A TW105141625A TW201736125A TW 201736125 A TW201736125 A TW 201736125A TW 105141625 A TW105141625 A TW 105141625A TW 105141625 A TW105141625 A TW 105141625A TW 201736125 A TW201736125 A TW 201736125A
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single crystal
substrate
sapphire
crystal sapphire
film
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永田和寿
久保田芳宏
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信越化學工業股份有限公司
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Abstract

本發明提供一種表面不易劃傷，且破損時不易飛散的藍寶石複合基材與其製造方法。具體而言，係一種藍寶石複合基材，其係具備：無機玻璃基板、與無機玻璃基板上的聚乙烯丁醛或二氧化矽之中間膜、與中間膜上的單晶藍寶石膜。又，係一種藍寶石複合基材之製造方法，其係至少包含：在單晶藍寶石基板的內部形成離子注入層之步驟；在選自由單晶藍寶石基板之進行離子注入前的前述表面、單晶藍寶石基板之經離子注入後的表面、及、無機玻璃基板的表面所成群組的至少一種表面，形成聚乙烯丁醛或二氧化矽之中間膜之步驟；隔著中間膜，貼合單晶藍寶石基板之經離子注入後的表面與無機玻璃基板的表面而得到接合體之步驟；及隔著中間膜在無機玻璃基板上轉印單晶藍寶石膜之步驟。

Description

藍寶石複合基材與其製造方法
本發明係有關於一種在玻璃材料的表面設有單晶藍寶石膜的複合基材，係有關於一種主要利用於顯示器等的複合基材。
藍寶石是一種具有僅次於鑽石之莫氏硬度的材料，因其耐久性，也就是在日常環境下不易劃傷之特性，而利用於高級鐘錶的擋風，或者行動電話等的顯示器用途等。
玻璃其硬度比起藍寶石雖較差，但一般而言，基於較硬、對可見光線呈透明，且耐藥品性、表面滑性良好等特點，而經利用於各種的產業用途。玻璃又有所謂破損時破片不易飛散之特性。因此，在例如汽車等的交通車輛之窗玻璃或建築物之窗玻璃等用途中，係採用在一對玻璃板間包夾樹脂膜而成的層合玻璃。層合玻璃，通常因玻璃與樹脂牢固地黏著，破損時不易發生飛散或脫落，可藉由包夾於此玻璃板間的樹脂賦予特性，因此，也有人嘗試進行例如進一步賦予遮音性(專利文獻1)。
[先前技術文獻] [專利文獻]
[專利文獻1]日本專利第2703471號
近年來，針對LED用途，單晶藍寶石基板逐漸大量生產，藍寶石之工業上的製造一般也變得更廣泛普及。然而，藍寶石與玻璃相比，仍屬高成本之材料，而且，由其硬度而言不易進行加工，對顯示器保護用途的應用範圍有限。
本發明之目的在於提供一種低成本、表面不易劃傷，且破損時不易飛散的藍寶石複合基材與其製造方法。
本案發明人等著眼於應用於SOI(Silicon on Insulator)基板的製作之離子注入‧剝離技術而致力進行研究的結果發現出一種隔著中間膜在無機玻璃基板上具有藍寶石膜的藍寶石複合基材。
亦即，本發明根據其一形態，可提供一種藍寶石複合基材，其係具備：無機玻璃基板、與前述無機玻璃基板上的聚乙烯丁醛或二氧化矽之中間膜、與前述中間膜上的單晶藍寶石膜。
又，本發明根據其一形態，可提供一種藍寶石複合基材之製造方法，其係至少包含：自單晶藍寶石基板的表面注入氫離子，而在前述單晶藍寶石基板的內部形成離子注入層之步驟；對選自由前述單晶藍寶石基板之進行離子注入前的前述表面、前述單晶藍寶石基板之經離子注入後的表面、及、擬與前述單晶藍寶石基板貼合之無機玻璃基板的表面所成群組的至少一種表面，塗佈包含聚乙烯丁醛或二氧化矽前驅物的溶液後進行加熱，而形成聚乙烯丁醛或二氧化矽之中間膜之步驟；隔著前述中間膜，貼合前述單晶藍寶石基板之經離子注入後的表面、與擬與前述單晶藍寶石基板貼合之無機玻璃基板的表面而得到接合體之步驟；及沿著前述離子注入層剝離前述接合體，隔著前述中間膜在前述無機玻璃基板上轉印單晶藍寶石膜之步驟。
根據本發明之製造方法，由於隔著中間膜在無機玻璃基板上具備單晶藍寶石膜，而能夠獲得接合性佳，破損時不易飛散的藍寶石複合基材。又，可將在無機玻璃基板上分離單晶藍寶石膜後的單晶藍寶石基板再度利用於藍寶石複合基材的製造，而能夠達低成本化。再者，由於所得藍寶石複合基材於其表面具有藍寶石，故表面不易劃傷，而適用於顯示器保護用途。
11、21‧‧‧單晶藍寶石基板
11s‧‧‧單晶藍寶石基板的表面
11a、21a‧‧‧單晶藍寶石膜
11b、21b‧‧‧經剝離後的單晶藍寶石基板
12、22‧‧‧氫離子
13、23‧‧‧離子注入層
14、24‧‧‧無機玻璃基板
24s‧‧‧無機玻璃基板的表面
15、25‧‧‧中間膜
15s‧‧‧無機玻璃基板上的中間膜的表面
25s‧‧‧單晶藍寶石基板上的中間膜的表面
17、27‧‧‧接合體
18、28‧‧‧藍寶石複合基材
31a‧‧‧單晶藍寶石膜
34‧‧‧無機玻璃基板
35‧‧‧中間膜
第1圖為本發明之藍寶石複合基材之製造方法的示意圖。
第2圖為本發明之藍寶石複合基材之製造方法的另一示意圖。
第3圖為本發明之實施例2中之H2 +離子注入後之單晶藍寶石基板的SIMS測定的結果圖。
第4圖為本發明之實施例2中之藍寶石複合基材的TEM影像。
[實施發明之形態]
以下，詳細說明屬用以實施本發明之一例的最佳形態，惟本發明之範圍不限定於此形態。
根據本發明一實施形態，可提供一種藍寶石複合基材，其係具備：無機玻璃基板、與無機玻璃基板上的聚乙烯丁醛或二氧化矽之中間膜、與中間膜上的單晶藍寶石膜。
作為無機玻璃基板，可舉出鈉鈣玻璃、硼矽酸玻璃、或化學強化玻璃等的基板。尤其是，為了減少與單晶藍寶石基板貼合時的翹曲，較佳為在屬與藍寶石的熱膨脹率差較小的溫度區域之20~400℃下，具有5×10-6/℃以上且1×10-5/℃以下之膨脹率的鈉鈣玻璃、硼矽酸玻璃或化學強化玻璃之基板。無機玻璃基板可為由上述的1種 所構成的單一基板，也可為上述的2種以上之組合。無機玻璃基板的形狀不特別限定，可為例如直徑2~8吋的晶圓，也可為一邊為2~8吋的方形板。無機玻璃基板的厚度不特別限定，可為50~1000μm。
中間膜為聚乙烯丁醛或二氧化矽的膜。基於藉由隔著中間膜而提升單晶藍寶石基板與無機玻璃基板的接合強度之觀點，聚乙烯丁醛或二氧化矽係適合作為中間膜。中間膜為至少1層，也可為例如2層以上的層。中間膜若為1層的膜時，其厚度較佳具有0.1~2μm的厚度；若為2層以上的膜時則彼等的合計厚度較佳具有0.1~2μm的厚度。
聚乙烯丁醛(下稱PVB)為聚[(2-丙基-1,3-二噁烷-4,6-二基)伸甲基](-[(C7O2H12)-CH2]n-)，聚乙烯丁醛膜係藉由例如塗佈法而形成。作為市售之聚乙烯丁醛，可使用例如S-LEC KS-5(積水化學工業(股)公司製)等。
二氧化矽係以SiO2表示，二氧化矽膜係透過例如藉由塗佈法形成屬二氧化矽前驅物之全氫聚矽氮烷的膜，進行加熱使全氫聚矽氮烷進行二氧化矽轉化而形成。作為市售之全氫聚矽氮烷，可使用例如TRESMILE(Sanwa Kagaku(股)公司製)等。
就中間膜之形成方法而言，不特別限定，如上述較佳為塗佈法。作為塗佈法，可舉出例如噴塗、浸塗、旋轉塗佈、棒式塗佈、刮刀塗佈、及澆鑄法等。藉由塗佈形成中間膜時，可使用包含聚乙烯丁醛或二氧化矽前 驅物的溶液。
包含用於塗佈法之聚乙烯丁醛的溶液可使用甲醇、乙醇、異丙醇、正丁醇等的醇系、甲苯、二甲苯等的芳香族系、乙酸乙酯等的酯系、甲基乙基酮等的酮系、及、二正丁基醚等的醚系溶媒。視情況而定，包含聚乙烯丁醛的溶液亦可含有水。溶液中的聚乙烯丁醛濃度較佳為3~50質量%。
包含聚乙烯丁醛的溶液，例如，亦可塗佈於基板表面後，去除溶媒等而形成聚乙烯丁醛之中間膜。溶媒的去除等，係以藉由加熱至100~300℃來進行為佳。加熱時間較佳為1~30分鐘。加熱可於大氣壓下或於減壓(1000~0.1Pa)下進行。
包含用於塗佈法之二氧化矽前驅物的溶液，例如二氧化矽前驅物使用全氫聚矽氮烷時，作為溶媒，可使用二甲苯、二丁醚等的芳香族系溶媒。溶液中的全氫聚矽氮烷濃度較佳為1~30質量%。包含全氫聚矽氮烷的溶液，又為了進行二氧化矽轉化，亦可於溶液內含有水，可藉由將溶液塗佈於基板表面後在加濕條件下靜置來添加水分。
包含全氫聚矽氮烷的溶液，例如，亦可塗佈於基板表面後，進行加熱而去除溶媒等，進行二氧化矽轉化，而形成二氧化矽之中間膜。就加熱溫度而言，為達溶媒等的去除，較佳為100~300℃；為達二氧化矽轉化，較佳為300~1000℃，更佳為500~1000℃。又，亦能以較佳為1~ 10℃/分的昇溫速度，進行溶媒等的去除與二氧化矽轉化。加熱時間較佳為5~120分鐘。加熱可於大氣壓下或於減壓(1000~0.1Pa)下進行。全氫聚矽氮烷係一種以-(SiH2NH)-為基本單元的無機聚合物，藉由在大氣中或含水蒸氣之環境中加熱，會與水分或氧反應而得到緻密的非晶質SiO2膜。又，全氫聚矽氮烷在二氧化矽轉化之際會藉由與水的反應，而產生作為副產物的氨。因此，使用例如對流型的加濕乾燥機進行二氧化矽轉化時，較佳在加濕乾燥機的內部設妥氨捕集器。
單晶藍寶石膜係以較佳具有0.05~2μm，更佳具有0.1~1μm的厚度為佳。若未達0.05μm，隨後無法去除殘留有由離子注入所致之結構損傷的部分，且無法充分確保藍寶石的硬度。若單晶藍寶石膜的厚度超過2μm時，則需要高功率的離子注入裝置。又，若單晶藍寶石膜的厚度增厚，則複合基材本身的成本會提高。此外，亦可藉由使用例如磷酸或者硫酸等蝕刻溶劑的蝕刻處理或研磨去除殘留有結構損傷的部分，而形成期望厚度。單晶藍寶石膜係如後述，較佳藉由在單晶藍寶石基板中形成離子注入層，並沿著離子注入層予以剝離，使其轉印於例如所要的基板上而形成。
根據本發明另一實施形態，可提供一種隔著中間膜在無機玻璃基板上具備單晶藍寶石膜的藍寶石複合基材之製造方法。
就單晶藍寶石基板而言，不特別限定，可使用直徑2 ~8吋、厚度200~800μm的單晶藍寶石基板。
首先，自單晶藍寶石基板的表面注入氫離子，而在單晶藍寶石基板的內部形成離子注入層。離子注入層係透過以可將離子注入層形成於距單晶藍寶石基板的表面之所要深度等的注入能，注入既定劑量的氫離子(H+)或氫分子離子(H2 +)而形成。就此時的條件，例如注入能可取50~200keV。氫分子離子(H2 +)注入量較佳為1.0×1016atoms/cm2以上2.5×1017atoms/cm2以下，更佳為1.0×1016atoms/cm2~2.0×1017atoms/cm2。若未達1.0×1016atoms/cm2，於後續步驟中不會引起離子注入層的脆化，而超過2.5×1017atoms/cm2時，則會在離子注入時於經離子注入的面形成微共振腔，而於基板表面形成凹凸。
其次，對單晶藍寶石基板之經離子注入後的表面、與擬與單晶藍寶石基板貼合之無機玻璃基板的表面的至少一者塗佈包含聚乙烯丁醛或二氧化矽前驅物的溶液後進行加熱，而形成聚乙烯丁醛或二氧化矽之中間膜。
視情況而定，對選自由單晶藍寶石基板之進行離子注入前的表面、單晶藍寶石基板之經離子注入後的表面、及、擬與單晶藍寶石基板貼合之無機玻璃基板的表面所成群組的至少一種表面，塗佈包含聚乙烯丁醛或二氧化矽前驅物的溶液後進行加熱，而形成聚乙烯丁醛或二氧化矽之中間膜。換言之，形成離子注入層之步驟與形成中間膜之步驟，視情況而定，順序亦可顛倒。例如，可在單 晶藍寶石基板的內部形成離子注入層前，對單晶藍寶石基板的表面塗佈包含二氧化矽前驅物的溶液後進行加熱，而形成二氧化矽之中間膜，也可在此之後，自形成有二氧化矽之中間膜的表面注入氫離子，而在單晶藍寶石基板的內部形成離子注入層。
形成中間膜後，亦可視需求對單晶藍寶石基板之經離子注入後的表面、與擬與單晶藍寶石基板貼合之無機玻璃基板的表面的至少一者實施表面活化處理。將中間膜形成於兩基板表面時，可對兩表面中至少一者實施表面活化處理。將中間膜僅形成於兩基板表面中的一者時，可對該中間膜的表面、與另一基板表面的至少一者實施表面活化處理。
作為表面活化處理之方法，可舉出電漿處理、臭氧水處理、UV臭氧處理、離子束處理等。例如，以電漿實施處理時，係於真空腔室中載置經洗淨之基板，在減壓(1.0~1.0×105Pa)下導入電漿用氣體後，暴露於100W左右的高頻電漿5~120秒左右，對表面實施電漿處理。作為電漿用氣體，要將表面氧化時可使用氧氣；不欲氧化時則可使用氫氣、氮氣、氬氣、或、此等的混合氣體。透過以電漿實施處理，基板表面的有機物即被氧化而去除，進而表面的OH基增加而達活化。以臭氧實施處理時，可對純水中導入臭氧氣體，以活性臭氧使表面活化；實施UV臭氧處理時，可對大氣或者氧氣照射短波長的UV光(波長195nm左右)，使活性臭氧產生而使表面活 化。實施離子束處理時，則可藉由在高真空中(<1×10-6Torr)將Ar等的離子束照射至表面，使高活性的懸空鍵露出來進行。
其次，隔著中間膜，貼合單晶藍寶石基板之經離子注入後的表面、與擬與單晶藍寶石基板貼合之無機玻璃基板的表面而得到接合體。貼合可於室溫下進行。又，貼合後，為提高接合強度，較佳在100~300℃進一步加熱0.5~24小時。
其次，沿著形成於單晶藍寶石基板的內部的離子注入層剝離所得接合體，隔著中間膜在無機玻璃基板上轉印單晶藍寶石膜。作為進行剝離之方法，可舉出藉由對著離子注入層，施予機械衝擊、照光及/或加熱而予以剝離。進行剝離之方法可單獨使用，亦可組合多種而使用。
對離子注入層施予衝擊來進行機械剝離時，較無發生伴隨加熱而生之熱變形、龜裂、貼合面的剝離等之虞。機械剝離較佳為採自一端部向另一端部之劈裂者。作為劈裂用構件，較佳為楔形構件，可為將例如楔子插入離子注入層(注入界面)，藉由楔子的變形使劈裂加深而予以剝離的方法。使用此方法之際，需注意避免接觸楔子的部分處之傷痕或粒子的產生、或因插入楔子而生成之基板的過度變形導致基板破裂的產生。為了對離子注入層施予衝擊，例如，只要從經貼合之基板的側面連續或間歇性地噴灑氣體或液體等流體之噴射流即可，只要是可發生因衝 擊所產生之機械剝離的方法則不特別限定。
藉由照光進行剝離時，較佳為可見光。藉由使形成於單晶藍寶石基板的內部的離子注入界面附近成非晶質化，即可藉由容易受可見光的吸收，且容易選擇性地接受能量之機構使離子注入層脆化而剝離。又，此剝離方法由於比機械剝離更簡易，因而較佳。可見光之光源較佳為Rapid Thermal Annealer(RTA)、綠光雷射光、或閃光燈光等。可見光之光源較佳為Rapid Thermal Annealer(RTA)、綠光雷射光、或閃光燈光。
藉由加熱進行剝離時，較佳於150~500℃進行加熱。就加熱時間而言，較佳取0.5~24小時。用來剝離的加熱溫度，通常較佳為比上述用來提高接合強度之溫度更高的溫度。視情況而定，用來剝離的加熱溫度係設為與用來提高接合強度之溫度相同的溫度，藉由調節加熱時間亦可達到剝離。
如此，沿著接合體的離子注入層予以剝離，可得到隔著中間膜在無機玻璃基板上具備單晶藍寶石膜的藍寶石複合基材。
本發明之藍寶石複合基材之製造步驟不特別限定，將其一形態示於第1圖。自單晶藍寶石基板11的表面注入氫離子12，而在單晶藍寶石基板11的內部形成離子注入層13(步驟a)。對擬與單晶藍寶石基板貼合之無機玻璃基板14的表面塗佈包含聚乙烯丁醛或二氧化矽前驅物的溶液後進行加熱，而形成聚乙烯丁醛或二氧化矽之 中間膜15(步驟b)。貼合形成中間膜15後之擬與單晶藍寶石基板貼合之無機玻璃基板14的表面15s、與單晶藍寶石基板11之經離子注入後的表面11s而得到接合體17(步驟c)。沿著接合體17的離子注入層13剝離單晶藍寶石基板11b，由此可得隔著中間膜15，在無機玻璃基板14上轉印有單晶藍寶石膜11a的藍寶石複合基材18(步驟d)。
又，將本發明之藍寶石複合基材之製造步驟的另一形態示於第2圖。對單晶藍寶石基板21的表面，塗佈包含二氧化矽前驅物的溶液後進行加熱，而形成二氧化矽之中間膜25。自單晶藍寶石基板21上之形成有中間膜25的表面注入氫離子22，而在單晶藍寶石基板21的內部形成離子注入層23(步驟a)。貼合無機玻璃基板24的表面24s、與經離子注入之單晶藍寶石基板21上的中間膜的表面25s而得到接合體27(步驟c)。沿著接合體27的離子注入層23剝離單晶藍寶石基板21b，由此得隔著中間膜25，在無機玻璃基板24上轉印有單晶藍寶石膜21a的藍寶石複合基材28(步驟d)。
[實施例] <實施例1>
作為單晶藍寶石基板，係使用6吋徑、厚度600μm的基板。自單晶藍寶石基板的表面以150KeV、2.0×1017atoms/cm2的注入量注入H2 +離子，而在單晶藍寶 石基板的內部(深度約500nm)形成離子注入層。
作為無機玻璃基板，係使用6吋徑、厚度600μm的硼矽酸玻璃基板。對擬與單晶藍寶石基板之經離子注入後的表面貼合之硼矽酸玻璃基板的表面，在大氣環境、室溫下，使用聚乙烯丁醛(PVB，積水化學工業(股)公司製，S-LEC KS-5，10質量%)的乙醇溶液，以旋轉塗佈機進行塗佈。其後，在大氣壓‧大氣環境下，於100℃加熱10分鐘而形成中間膜(厚度150nm)。
對單晶藍寶石基板之形成有中間膜的表面、與無機玻璃基板之形成有中間膜的表面，使用高頻電漿裝置，在減壓(1.0~1.0×105Pa)且氮氣環境下，於室溫實施電漿活化處理。其後，使實施過電漿活化處理的單晶藍寶石基板與無機玻璃基板的表面，在大氣壓‧大氣環境下，於室溫相接觸、貼合而得到接合體。向接合體的離子注入層插入刀片，以機械式剝離單晶藍寶石膜，而得到隔著PVB膜在硼矽酸玻璃基板上轉印有單晶藍寶石膜，由藍寶石膜/PVB/硼矽酸玻璃基板所構成的藍寶石複合基材。
以穿透型電子顯微鏡(TEM)觀察所得藍寶石複合基材的剖面(未圖示)。結果，可確認在中間膜上轉印有單晶藍寶石膜，中間膜係以單晶藍寶石膜與玻璃基板的黏結劑之形式存在。
<實施例2>
作為單晶藍寶石基板，係使用6吋徑、厚度600μm 的基板。自單晶藍寶石基板的表面以150KeV、2.0×1017atoms/cm2的注入量注入H2 +離子，而在單晶藍寶石基板的內部形成離子注入層。將藉由二次離子質譜法(Secondary Ion Mass Spectrometry：SIMS)量測形成之離子注入層距基板表面的位置的結果示於第3圖。就該離子注入量，可看出離子注入層係形成於距表面約500nm的深度處。
作為無機玻璃基板，係使用6吋徑、厚度600μm的硼矽酸玻璃基板。對擬與單晶藍寶石基板之經離子注入後的表面貼合之硼矽酸玻璃基板的表面，在大氣環境、室溫下使用聚矽氮烷(Sanwa Kagaku(股)公司製，TRESMILE，20質量%)的二正丁基醚溶液，以旋轉塗佈機進行塗佈。其後，在大氣壓‧大氣環境下，於200℃加熱3分鐘使其進行二氧化矽轉化，並進一步於450℃加熱30分鐘使其硬化而形成中間膜(厚度150nm)。
對單晶藍寶石基板之形成有中間膜的表面、與無機玻璃基板之形成有中間膜的表面，使用高頻電漿裝置，在減壓(1.0~1.0×105Pa)且氮氣環境下，於室溫實施電漿活化處理。其後，使實施過電漿活化處理的單晶藍寶石基板與無機玻璃基板的表面，在大氣壓‧大氣環境下，於室溫相接觸、貼合而得到接合體。向接合體的離子注入層插入刀片，以機械式剝離單晶藍寶石膜，而得到隔著二氧化矽膜在硼矽酸玻璃基板上轉印有單晶藍寶石膜，由藍寶石膜/二氧化矽膜/硼矽酸玻璃基板所構成的藍寶石複合基材。
將以穿透型電子顯微鏡觀察所得藍寶石複合基材的剖面的結果示於第4圖。結果，可看出隔著中間膜(35)在無機玻璃基板(34)上轉印有約500nm的單晶藍寶石膜(31a)，可觀察到中間膜係以黏結劑形式存在。單晶藍寶石膜(31a)的表層，由於殘留有離子注入所引起的結構損傷，因此，視用途而定，亦可進一步進行使用溶劑的蝕刻處理或研磨。

Claims (10)

  1. 一種藍寶石複合基材，其係具備：無機玻璃基板、與前述無機玻璃基板上的聚乙烯丁醛或二氧化矽之中間膜、與前述中間膜上的單晶藍寶石膜。
  2. 如請求項1之藍寶石複合基材，其中前述二氧化矽之中間膜為使全氫聚矽氮烷進行二氧化矽轉化的膜。
  3. 如請求項1或2之藍寶石複合基材，其中前述單晶藍寶石膜係具有0.05~2μm的厚度。
  4. 如請求項1~3中任一項之藍寶石複合基材，其中前述無機玻璃基板係選自由在20~400℃下具有5×10-6/℃以上且1×10-5/℃以下之膨脹率的鈉鈣玻璃、硼矽酸玻璃、及化學強化玻璃所成之群組。
  5. 一種藍寶石複合基材之製造方法，其係至少包含：自單晶藍寶石基板的表面注入氫離子，而在前述單晶藍寶石基板的內部形成離子注入層之步驟；對選自由前述單晶藍寶石基板之進行離子注入前的前述表面、前述單晶藍寶石基板之經離子注入後的表面、及、擬與前述單晶藍寶石基板貼合之無機玻璃基板的表面所成群組的至少一種表面，塗佈包含聚乙烯丁醛或二氧化矽前驅物的溶液後進行加熱，而形成聚乙烯丁醯或二氧化矽之中間膜之步驟；隔著前述中間膜，貼合前述單晶藍寶石基板之經離子 注入後的表面、與擬與前述單晶藍寶石基板貼合之無機玻璃基板的表面而得到接合體之步驟；及沿著前述離子注入層剝離前述接合體，隔著前述中間膜在前述無機玻璃基板上轉印單晶藍寶石膜之步驟。
  6. 如請求項5之藍寶石複合基材之製造方法，其中前述二氧化矽前驅物為全氫聚矽氮烷。
  7. 如請求項5或6之藍寶石複合基材之製造方法，其中前述氫離子為氫分子離子，前述氫分子離子的注入量為1.0×1016atoms/cm2以上且2.5×1017atoms/cm2以下。
  8. 如請求項5~7中任一項之藍寶石複合基材之製造方法，其中在前述進行轉印之步驟中，前述剝離係對著前述離子注入層，藉由機械衝擊、照光及/或加熱來進行。
  9. 如請求項5~8中任一項之藍寶石複合基材之製造方法，其中前述單晶藍寶石膜係具有0.05~2μm的厚度。
  10. 如請求項5~9中任一項之藍寶石複合基材之製造方法，其中前述無機玻璃基板係選自由在20~400℃下具有5×10-6/℃以上且1×10-5/℃以下之膨脹率的鈉鈣玻璃、硼矽酸玻璃、及化學強化玻璃所成之群組。
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