TW201709219A - 包含潤滑油的導電糊及半導體裝置 - Google Patents
包含潤滑油的導電糊及半導體裝置 Download PDFInfo
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- TW201709219A TW201709219A TW105118911A TW105118911A TW201709219A TW 201709219 A TW201709219 A TW 201709219A TW 105118911 A TW105118911 A TW 105118911A TW 105118911 A TW105118911 A TW 105118911A TW 201709219 A TW201709219 A TW 201709219A
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- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
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- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 1
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- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
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- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
- 239000004711 α-olefin Substances 0.000 description 1
Classifications
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- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
- H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/14—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
- C08L33/08—Homopolymers or copolymers of acrylic acid esters
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
- C08L33/10—Homopolymers or copolymers of methacrylic acid esters
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- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/02168—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells the coatings being antireflective or having enhancing optical properties for the solar cells
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
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- H01L31/022433—Particular geometry of the grid contacts
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- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
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- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
- H05K1/092—Dispersed materials, e.g. conductive pastes or inks
- H05K1/095—Dispersed materials, e.g. conductive pastes or inks for polymer thick films, i.e. having a permanent organic polymeric binder
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- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
- H05K2201/10007—Types of components
- H05K2201/10143—Solar cell
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- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1216—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by screen printing or stencil printing
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- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
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Abstract
本發明係關於一種導電糊,該導電糊包含介於50wt%至97wt%之導電顆粒、3wt%至50wt%之有機介質及0wt%至20wt%之玻璃料,該有機介質包含溶劑,其中該有機介質另外包含各自以該有機介質之總量計10wt%至90wt%之烴類潤滑油及2wt%至60wt%之聚合物組份,該聚合物組份具有在該潤滑油中至少100g/kg之溶解度。
本發明進一步係關於一種包含半導體基板之半導體裝置,該半導體基板具有藉由使用該糊將導電圖案印刷於上面的至少一個表面。
Description
本發明係關於一種包含介於50wt%至97wt%之導電顆粒、3wt%至50wt%之有機介質及0wt%至20wt%之玻璃料的導電糊,該有機介質包含溶劑。
導電糊或墨可用於在半導體基板或絕緣材料基板之表面上以形成電極(諸如導電網格線,例如銀網格線)以及匯流條。尤佳之用途係在半導體基板上網版印刷電極以用於生產太陽能電池或光伏打電池,當來自日光之光子將半導體上之電子自價帶激發至傳導帶時,該等太陽能電池或光伏打電池將太陽能轉換為電能。接觸半導體之金屬電極聚集流動至傳導帶之電子。
除在半導體基板上印刷電極以用於生產太陽能電池或光伏打電池以外,導電糊或墨水亦可用於在絕緣基板上印刷網格線以用於在陶瓷基板上生產印刷電子電路板或混合式電路。
為了將細線印刷至半導體基板或絕緣基板上,通常將網版印刷製程用於具成本效益之大批量生產。然而,產生無斷線之均勻窄線對於網版印刷尤其對於高速度網版印刷而言具有挑戰性。工業印刷速度取決於
應用要求。印刷速度範圍介於80mm/s至800mm/s,較佳地不慢於150mm/s,例如在太陽能電池印刷中,印刷速度係150mm/s至300mm/s。
當導電糊用於在半導體基板上印刷時,該糊通常包含通常係金屬粉末之導電顆粒、有機介質以及視情況玻璃料。有機介質通常包含至少一種有機液體,諸如有機溶劑或有機鹽,或在室溫下具有液態形式之其他有機化合物。有機介質視情況包含聚合物組份。為了形成金屬接點,將導電糊印刷至基板上。取決於材料之類型,接著加熱基板處於範圍介於約150℃至約950℃之溫度下,在該溫度範圍內,有機介質分解,且無機物質形成至基板之導電跡線及電接點。
隨著對藉由高速度印刷產生細線之需求增加,糊組成物中之有機介質變得愈來愈複雜。如圖1中所描繪,所印刷細線通常具有一薄層,該薄層具有鄰近於線主體的不規則形狀區。
此不規則形狀區之膜厚度比線主體之膜厚度薄得多,因而此區具有高得多之電阻及增加之印刷線寬度的缺點,從而導致印刷太陽能電池之增加之遮蔽及減小之電池效率。此區被稱作「滲漏」。在高速度網版印刷中,需要產生無斷線且無滲漏之細線。
用於導電糊之典型組成物揭示(例如)於US-A 2012/0164777、WO-A 2011/055995、WO-A 2009/157727或US 6,156,237中。然而,所有已知糊具有無法排除之以下缺點:當用於具有窄於40μm之經設計線寬的高速網版印刷中時,印刷線具有非所要中斷或在邊緣處具有滲漏且因此比在設計上的可接受度寬。
因而,本發明之目標係提供一種導電糊,其可由高速度網版印刷處理,且其中印刷線係窄的而在邊緣處無滲漏,且無非所要中斷。
此目標係由一種導電糊實現,其包含介於50wt%至97wt%之導電顆粒、3wt%至50wt%之有機介質及0wt%至20wt%之玻璃料,該有機介質包含溶劑,其中該有機介質另外包含各自以有機介質之總量計10wt%至90wt%之烴類潤滑油及2wt%至60wt%之聚合物組份,該聚合物組份具有在潤滑油中至少100g/kg之溶解度。
出人意料地,已展示,添加烴類潤滑油及具有至少100g/kg之溶解度的聚合物組份改良了導電糊在高速度網版印刷中之效能。與已知組成物相比,本發明之導電糊具有兩個優點。首先,其可印刷較窄線且在邊緣處無滲漏。其次,糊允許在有較低斷線傾向的情況下使用具有較細指孔之網版。此情形導致電路之減小之線電阻及較少的金屬消耗。在太陽能電池應用中,較少滲漏減小半導體表面之遮蔽,因此增加電池效率。
溶解於烴類潤滑油中之聚合物組份較佳地係聚丙烯酸酯、聚甲基丙烯酸酯、聚丙烯酸酯或聚甲基丙烯酸酯之共聚物,或其混合物。
在一尤佳具體實例中,聚合物組份係具有以下通式之聚甲基丙烯酸酯:
其中n係整數,且R係直鏈或支鏈C1-至C22-烷基。
一般而言,用以構成聚合物之(甲基)丙烯酸酯係甲基、乙基、正丙基、異丙基、正丁基、異丁基、仲丁基、叔丁基、戊基、己基、庚基、辛基、2-乙基己基、2-丙基庚基、壬基、癸基、十八烷醯、十二基、十八基、十七基、十九基、二十基、二十一基、二十二基、二十三基、二十四基、二十五基、二十六基、二十七基、二十八基、二十九基、三十基、二十二烷基甲基丙烯酸脂或丙烯酸酯、較佳地十二基、十七基及十八烷基甲基丙烯酸脂或丙烯酸酯,或此等單體之混合物。較佳聚合物係聚甲基丙烯酸酯之共聚物,其中R係甲基且其他一或多個基團選自C5-至C22-烷基。
亦有可能使用羥基、環氧基及胺基官能性甲基丙烯酸酯及丙烯酸鹽。
丙烯酸鹽及甲基丙烯酸酯以及其混合物通常以組份單體之總量計範圍介於50wt%至100wt%(較佳地自80wt%至100wt%)的量來使用。
作為另外共聚單體,可使用以實例方式列出之至多50wt%較佳至多20wt%的以下單體:芳乙烯化合物,諸如苯乙烯、α-甲基苯乙烯、乙烯基甲苯或對(叔丁基)苯乙烯;丙烯酸及甲基丙烯酸;丙烯醯胺及甲基丙烯醯胺;順丁烯二酸及醯亞胺以及其C1-C10烷基酯;反丁烯二酸及醯亞胺以及其C1-C10烷基酯;伊康酸及醯亞胺以及其C1-C10烷基酯;丙烯腈及甲基丙烯腈。
自由基聚合之習知方法可用以製備用於本發明之導電糊之聚甲基丙烯酸酯的共聚物。烷基甲基丙烯酸脂單體之聚合可在多種條件下發生,包括整體聚合、溶液聚合(通常在有機溶劑中)。
在溶液聚合中,反應混合物包含稀釋劑、(甲基)丙烯酸烷基酯單體、聚合起始劑以及通常鏈轉移劑及視情況交聯劑。
用於本發明之導電糊的聚甲基丙烯酸酯之共聚物具有範圍介於約10,000克/莫耳至約1,000,000克/莫耳之相對重量平均分子量。通常,重量平均值範圍可介於約20,000克/莫耳至約600,000克/莫耳。可(例如)藉由GPC使用聚甲基丙烯酸甲酯標準判定該分子量。因而,所判定之平均分子量係相對於該標準的,並非絕對的。
聚合物具有範圍介於1至10、較佳2至8、最佳2至6的PDI數目。PDI表示多分散性指數,該指數量測分子量分佈。PDI描述於(例如)「S.S.Rane,P.Choi,Chem.Mater.2005,17,926」中。
用於導電糊之烴類潤滑油較佳地係選自環烷油、石蠟油、芳族油或其中至少兩者的混合物。
預期在本發明中使用之較佳烴類潤滑油包括礦物油、聚α-烯烴合成油、天然油(諸如植物油或動物類油)及其混合物。適合之基礎油亦包括藉由合成蠟與松蠟之異構化獲得之油,以及藉由使原油之芳族組份及極性組份加氫裂化(而非溶劑萃取)產生之基本油料。一般而言,礦物基礎油及合成基礎油兩者將各自具有100℃下範圍介於約1mm2/s至約40mm2/s的運動黏度,儘管典型應用將需要每一種油具有在100℃下範圍介於約1mm2/s至約10mm2/s的黏度。
在本發明中有用之烴類潤滑油包括所有常見礦物油基本油料。此基本油料將包括化學結構係環烷、石蠟或芳族之油。環烷油係由以成環作用配置之亞甲基基團構成,其中石蠟側鏈附接至環。傾注點通常低
於石蠟油之傾注點。石蠟油包含飽和、直鏈或分支鏈烴。
高分子量之直鏈石蠟提昇油之傾注點且通常藉由脫蠟被移除。芳族油係具有半不飽和特性之閉合碳環的烴且可具有經附接側鏈。此油比石蠟油及萘油更容易降解,從而導致腐蝕性副產物。
實際上,基本油料通常將含有一化學組成物,該化學組成物含有某一比例之全部三種類型材料(石蠟、環烷及芳族)。對於基礎原料之類型的論述,參見(例如)「A.Schilling之Motor Oils and Engine Lubricating,Scientific Publications,1968年,第2.2至2.5部分」。
聚合物組份可用於石蠟、環烷及芳族類型油中。舉例而言,聚合物組份可用於根據API基本油料分類之第I-V族基礎油中。此等基團已為熟習此項技術者所熟知。另外,聚合物組份可用於氣體至液體油中。
氣體至液體油(GTL)為此項技術中所熟知。氣態源包括廣泛之多種材料,諸如天然氣、甲烷、C1-C3烷烴、垃圾掩埋場氣體及類似者。可藉由氣體至液體(GTL)製程(諸如,在揭示內容以引用之方式併入本文中之US 6,497,812中描述之製程)將此類氣體轉化成適於用作潤滑劑基礎油之液體烴產品。
可藉由習知方法使用酸、鹼及黏土或諸如氯化鋁之其他劑料對油進行精製,或該等油可為(例如)藉由用諸如酚、二氧化硫、糠醛、二氯乙醚等溶劑之溶劑萃取產生的所萃取油。該等油可經加氫處理或加氫精製,藉由冷凍或觸媒脫蠟製程被脫蠟,或經加氫裂化。礦物油可產生自天然原油來源或由經異構化蠟材料或其他精製製程之殘留物構成。較佳合成油係亦被稱作聚α-烯烴或PAO的α烯烴之寡聚物,尤其係1-癸烯之寡
聚物。
礦物油可源自精製油、再精製油或其混合物。未精製油係直接自天然來源或合成源(例如,煤、葉岩或焦油砂瀝青)獲得,而無進一步純化或處理。未精製油的實例包括直接自乾餾操作獲得之頁岩油、直接自蒸餾獲得之石油,或直接自酯化製程獲得之酯油,未精製油之每一者接著被使用而不需進一步處理。精製油類似於未精製油,除精製油已在一或多個純化步驟中經處理以改良一或多個性質以外。適合純化技術包括蒸餾、加氫處理、脫蠟、溶劑萃取、酸或鹼萃取、過濾及滲濾,前述各者皆為熟習此項技術者已知。再精製油係藉由在類似於用以獲得精製油之製程的製程中處理用過之油而獲得。此等再精製油亦被稱作回收油或再處理油,且通常藉由移除用過之添加劑及油分解產物之技術進行另外處理。
導電糊中所存在之導電顆粒可為由任何導電材料構成之具有任何幾何形狀的顆粒。較佳地,導電顆粒包含碳、銀、金、鋁、鉑、鈀、錫、鎳、鎘、鎵、銦、銅、鋅、鐵、鉍、鈷、錳、鉬、鉻、釩、鈦、鎢、或其混合物或合金,或呈核-殼結構形式。用於導電顆粒之較佳材料係銀或鋁,歸因於良好導電性及良好抗氧化性尤其係銀。
導電顆粒之平均粒徑較佳地在介於10nm至100μm之範圍內。更佳地,平均粒徑係在介於100nm至50μm之範圍內,且尤佳地,平均粒徑係在500nm至10μm之範圍內。導電顆粒可具有對於熟習此項技術者已知之任何所要形式。舉例而言,顆粒可呈薄片、棒、線、結節、球或其任何混合之形式。在本發明之情形下的球形顆粒亦包含具有偏離理想球體形式之真實形式的顆粒。舉例而言,球形顆粒由於生產原因亦可具有液
滴形狀或被截短。可用以生產導電糊之適合顆粒為熟習此項技術者所知曉且市場有售。尤佳地,使用球形銀顆粒。與形狀不規則顆粒相比,球形顆粒之優點係其改善之流變學行為。
導電顆粒在組成物中之比例係在介於50wt%至97wt%之範圍內。該比例較佳地在介於70wt%至95wt%之範圍內且尤其在介於85wt%至92wt%之範圍內。固體顆粒之此重量百分比通常被稱作固體含量。
顆粒形狀及大小不改變本發明之性質。顆粒可用作不同形狀及大小之混合物。熟習此項技術者已知的是,具有不同形狀或大小之混合物的顆粒在其分散於相同有機介質中時可產生較高或較低黏度。在此狀況下,熟習此項技術者已知的是需要相應地調整有機介質。該調整可為(但不限於)固體含量、溶劑含量、聚合物含量、搖變減黏劑含量及/或界面活性劑含量之變化。作為實例,通常在使用奈米大小之顆粒替換微米大小之顆粒時,必須減小固體含量以避免糊之黏度的增加,此情形導致較高的有機組份含量。
導電顆粒在生產過程中通常塗佈有機添加劑,尤其在由金屬製成時。在準備用於印刷導體跡線之組成物的過程中,通常不移除表面上之有機添加劑,使得該等有機添加劑接著亦存在於導電糊中。用於穩定化之添加劑的比例以顆粒質量計通常不超過10wt%。用以塗佈導電顆粒之添加劑可(例如)為脂肪胺或脂肪醯胺,例如十二烷胺。適用於穩定化顆粒之另外的添加劑係(例如)辛胺、癸胺及聚伸乙基亞胺。另一具體實例可為脂肪酸、脂肪酸酯(經或未經環氧基化),例如月桂酸、棕櫚酸、油酸、硬脂酸、或其鹽。顆粒上之塗層不改變本發明之性質。
在一具體實例中,導電糊另外包含玻璃料。若糊中存在玻璃料,則可使用熟習此項技術者已知的基於含鉛組成物或基於無鉛組成物之任何玻璃料。玻璃料不束縛於任何特定形狀或形式。所使用之玻璃料顆粒之平均粒徑係在介於10nm至100μm之範圍內。玻璃料顆粒之平均粒徑更佳地在介於100nm至50μm之範圍內且尤佳在介於500nm至10μm之範圍內。所使用之顆粒可具有熟習此項技術者已知之任何所要形式。舉例而言,顆粒可呈薄片、棒、線、結節、球或其任何混合之形式。球形顆粒在此情形下意謂顆粒之真實形式偏離理想球形形式,例如,球形顆粒由於生產原因亦可具有液滴形狀或被截短。可用作玻璃料之適合顆粒對於熟習此項技術者所知曉且市場有售。尤佳地,使用球形銀顆粒。與形狀不規則顆粒相比,球形顆粒之優點係其改善之流變學行為。根據本發明,玻璃料含量以導電糊之總質量計在介於0wt%至20wt%、較佳地自0wt%至10wt%且最佳地自1wt%至5wt%之範圍內。
導電糊中之有機介質包含至少一種溶劑。在本發明之一個具體實例中,溶劑包含選自具有至少一個氧原子之液體有機組份的一或多種溶劑。具有至少一個氧原子之液體有機組份係選自醇、醇酯、二醇、二醇醚、酮、脂肪酸酯或萜衍生物(不包含二元酯)。液體有機組份(例如)可為苄醇、Texanol酯醇、乳酸乙酯、二乙二醇單乙基乙酸酯、二乙二醇單丁醚、二乙二醇二丁醚、二乙二醇單丁醚乙酸酯、丁基2-乙氧基乙醇、丁基乙二醇乙酸乙醚、丙二醇單甲基醚、丙二醇單甲基醚乙酸酯、二丙二醇單甲基醚、丙二醇單甲基丙酸酯、乙醚丙酸酯、二甲胺基甲醛、甲基乙基酮、7-丁內酯、乙基亞麻油酸酯、乙基次亞麻油酸酯、乙基豆蔻酸酯、油酸乙
酯、甲基豆蔻酸酯、甲基亞麻油酸酯、甲基次亞麻油酸酯、甲基油酸酯、二丁基鄰苯二甲酸酯、二辛基鄰苯二甲酸酯及萜品醇。
係具有至少一個氧原子之液體有機組份的溶劑可在導電糊中用作單一溶劑或用作溶劑混合物。在使用溶劑混合物的狀況下,溶劑另外包含以溶劑混合物之總質量計5wt%至50wt%之至少一種二元酯。二元酯較佳地係選自己二酸、戊二酸、丁二酸之二甲基酯或其混合物。
當使用單一溶劑或溶劑混合物時,有必要的是有機黏合劑可以大於2wt%之量溶解於選定的單一溶劑或混合溶劑中,使得有機介質包含以有機介質之總質量計至少2%之經溶解黏合劑。
在本發明之一具體實例中,糊另外包含介於0.1wt%至20wt%之選自界面活性劑、搖變減黏劑、塑化劑、增溶劑、去泡劑、除濕劑、交聯劑、錯合劑及/或導電聚合物顆粒之至少一種添加劑。該等添加劑可個別地使用或作為其中之兩者或兩者以上之混合物使用。
當使用界面活性劑作為添加時,有可能僅使用一種界面活性劑或一種以上界面活性劑。原則上,熟習此項技術者已知之或先前技術中描述之所有界面活性劑可為適合的。較佳界面活性劑係單一化合物或複數種化合物,例如陰離子、陽離子、兩性或非離子型界面活性劑。然而,亦有可能使用具有顏料親和性錨定基團之聚合物,其對於熟習此項技術者已知為界面活性劑。
在導電顆粒預塗佈有界面活性劑之狀況下,導電糊可不包含額外界面活性劑作為添加。
除溶劑及其他有機添加劑以外,導電糊亦可包含介於0.1
wt%至20wt%之範圍內之有機黏合劑。有機黏合劑可選自天然或合成樹脂及聚合物。如對熟習此項技術者所知曉,選擇係基於(但不限於)溶劑相容性及化學穩定性。舉例而言,如先前技術中所揭示之常見黏合劑包含纖維素衍生物、丙烯酸系樹脂、酚系樹脂、脲甲醛樹脂、醇酸樹脂、脂族石油樹脂、三聚氰胺甲醛樹脂、松香、聚乙烯、聚丙烯、聚苯乙烯、聚醚、聚胺脂、聚乙酸乙烯酯及其共聚物。
本發明之糊尤其可用於高速度網版印刷製程中,例如,在至少150mm/s下,此係因為糊甚至在此等製程中亦產生細印刷線而無斷線及滲漏。
本發明進一步係關於一種半導體裝置,其包含具有至少一個表面之半導體基板,藉由使用如上文所描述之糊將導電圖案印刷至該至少一個表面上。藉此藉由網版印刷將圖案印刷至半導體基板上。在印刷之後,將具有經印刷圖案之半導體基板加熱至介於150℃至950℃之範圍內之溫度,以形成半導體裝置。該加熱製程對應於如已經用於在半導體上產生導電圖案之針對糊的製程。半導體基板通常係基於矽材料。
此類半導體裝置包括(例如)包含n型區、p型區、p-n接面及導電網格線之光伏打電池。光伏打電池視情況包含基板之表面上之抗反射層。基板可為經單晶矽、多晶矽、無晶型矽塗佈之固體基板,或表面塗佈有多晶或無晶型透明導電氧化物(TCO)(諸如氧化銦錫(ITO)、ZnO類透明導電氧化物,諸如氧化銦鎵鋅(IGZO)、氧化銦鋅錫(IZTO)、氧化銦鋅(IZO)、氧化銦鎢(IWO)、氧化鎵鋅(GZO))之基板。導電網格線係藉由網版印刷自導電糊形成。本文中所揭示之導電糊之具體實例中之一或
多者可用以形成導電網格線。
實施例
在實施例中,已使用根據下表之糊組成物:
所使用之銀粉末具有0.5μm至2.5μm之平均粒徑。作為玻璃料,已經使用含鉛玻璃料。溶劑類型A為二元酯,且溶劑類型B係乙二醇、二醇醚及脂肪酸酯之混合物。
聚合物組份係具有以下通式之聚甲基丙烯酸酯:
在實施例中,已使用具有不同烷基作為基團R之不同聚甲基丙烯酸酯的共聚物。在下文中,以形式CxMA描述聚甲基丙烯酸酯,其中Cx係基團R
中碳原子的數目。舉例而言,C1MA係具有甲基作為R之聚甲基丙烯酸酯,且C12MA係具有C12H25作為R之聚甲基丙烯酸酯。聚合物組份中之不同聚甲基丙烯酸酯的量係以聚合物組份之總質量的wt%計。所有其他百分比資料係以糊之總質量計。
比較實施例:
首先混合1%至3%之溶劑類型A與3.5%至6%之溶劑類型B。將0.05wt%至0.4wt%乙基纖維素溶解於此溶劑混合物中,以形成乙基纖維素介質,其進一步與0.2%至2%聚異丁基甲基丙烯酸脂(有機黏合劑)混合,已添加0%至2%界面活性劑、0%至1%增稠劑、0%至1%搖變減黏劑以形成均勻介質。所有百分比值係以糊之總量的wt%計。藉由機械攪拌及高溫使該混合物均質化。以遞增步驟將玻璃料及金屬粉末添加至介質以確保其在介質中良好分散。用三輥磨研磨粉末-介質混合物以獲得均勻分散之糊。
為了比較實施例1至6與比較實施例,使用相同銀粉末、玻璃料、界面活性劑、增稠劑、搖變減黏劑及乙基纖維素。
實施例1:
按照與在比較實施例中相同之程序製備糊,唯不添加有機黏合劑,而是替代地添加具有潤滑油之聚合物組份以外。溶劑類型A與溶劑類型B之混合物的濃度相應地減小以保持糊中之相同量的有機液體。在此實施例中,聚合物組份係25% C1MA+40% C12MA+35% C17MA之共聚物,其中分子量Mw為127,000克/莫耳,且PDI=4.6。
實施例2:
按照與在比較實施例中相同之程序製備糊,唯不添加有機黏合劑,而是替代地添加具有石油之聚合物組份以外。溶劑類型A與溶劑類型B之混合物的濃度相應地減小以保持糊中之相同量的有機液體。在此實施例中,聚合物組份係25% C1MA+75% C18MA之共聚物,其中Mw為57,100克/莫耳,PDI=3.9。
實施例3:
按照與在比較實施例中相同之程序製備糊,唯不添加有機黏合劑,而是替代地添加具有石油之聚合物組份以外。溶劑類型A與溶劑類型B之混合物的濃度相應地減小以保持糊中之相同量的有機液體。在此實施例中,聚合物組份係25% C1MA+75% C18MA之共聚物,其中Mw為28,000克/莫耳,PDI=2.9。
實施例4:
按照與在比較實施例中相同之程序製備糊。在此實施例中,聚合物組份係25% C1MA+75% C18MA之共聚物,其中Mw為21,000克/莫耳,PDI=2.7。當與實施例3相比時,聚合物組份之略微差異不產生任何可量測之可印刷性差異。
實施例5:
按照與在比較實施例中相同之程序製備糊。在此實施例中,聚合物組份係25% C1MA+20% C17MA+55% C18MA之共聚物,其中Mw為529,000克/莫耳,PDI=3.4。在此狀況下,與比較實施例中之有機黏合劑溶液相比,聚合物組份產生較高黏度,因而對於熟習此項技術者之知識而言,略微調整聚合物組份濃度,但該濃度仍然在由比較實施例界定之範圍
內。該印刷結果與比較實施例相比具有較少滲漏。
實施例6:
按照與在比較實施例中相同之程序製備糊。在此實施例中,聚合物組份係100% C18MA,其中Mw為936,000克/莫耳,PDI=7.1。在此狀況下,與比較實施例中之有機黏合劑溶液相比,聚合物組份產生較高黏度,因而對於熟習此項技術者之知識而言,略微調整聚合物組份濃度,但其仍然在由比較實施例界定之範圍內。
比較實施例及實施例1至3之糊在以下印刷條件下網版印刷至固體基板上。
印刷條件:
網版參數:
用網版A印刷比較實施例及實施例1。
用網版B印刷實施例1至3。
在光學3D顯微鏡下檢查印刷線以進行線尺寸評估。結果顯示在圖1至圖5中。
在諸圖中,圖1顯示比較實施例之藉由網版A進行之印刷線,
圖2顯示實施例1之藉由網版A進行之印刷線,圖3顯示實施例1之藉由網版B進行之印刷線,圖4顯示實施例2之藉由網版B進行之印刷線,且圖5顯示實施例3之藉由網版B進行之印刷線。
在諸圖中可看出,藉由根據比較實施例之糊印刷之線比藉由根據本發明之糊印刷之線寬。另外,藉由根據本發明之糊印刷之線之滲漏被顯著地減小,因此具有較窄線寬。線高度變化亦被減少。所有印刷皆並未顯示斷線。因而,清楚地表明,與比較實施例相比,該等實施例產生更佳之印刷結果。
Claims (15)
- 一種導電糊,其包含介於50wt%至97wt%之導電顆粒、3wt%至50wt%之有機介質及0wt%至20wt%之玻璃料,該有機介質包含溶劑,其中該有機介質另外包含各自以該有機介質之總量計10wt%至90wt%之烴類潤滑油及2wt%至60wt%之聚合物組份,該聚合物組份具有在該潤滑油中至少100g/kg之溶解度。
- 如申請專利範圍第1項之導電糊,其中該聚合物組份係聚丙烯酸酯、聚甲基丙烯酸酯、聚丙烯酸酯或聚甲基丙烯酸酯之共聚物,或其混合物。
- 如申請專利範圍第1項之導電糊,其中該聚合物組份係具有以下通式之聚甲基丙烯酸酯:
- 如申請專利範圍第1項之導電糊,其中該聚合物組份具有範圍介於約10,000克/莫耳至約1,000,000克/莫耳的相對重量平均分子量。
- 如申請專利範圍第1項之導電糊,其中該烴類潤滑油係選自環烷油、石蠟油、芳族油、天然油或其中之至少兩者之混合物。
- 如申請專利範圍第1項之導電糊,其中該烴類潤滑油在100℃之溫度下具有介於1mm2/s至40mm2/s之範圍內的黏度。
- 如申請專利範圍第1項之導電糊,其中該等導電顆粒包含碳或銀、金、 鋁、鉑、鈀、錫、鎳、鎘、鎵、銦、銅、鋅、鐵、鉍、鈷、錳、鉬、鉻、釩、鈦、鎢、或其混合物或合金,或呈其核-殼結構形式。
- 如申請專利範圍第1項之導電糊,其中該等導電顆粒塗佈有有機添加劑。
- 如申請專利範圍第1項之導電糊,其中該溶劑包含選自具有至少一個氧原子之液體有機組份之一或多種溶劑,具有至少一個氧原子之該液體有機組份較佳地係選自醇、酯醇、二醇、二醇醚、酮、脂肪酸酯或萜衍生物,不包含二元酯。
- 如申請專利範圍第9項之導電糊,其中該溶劑另外包含5wt%至50wt%之至少一種二元酯,該二元酯較佳地選自己二酸、戊二酸、丁二酸之二甲基酯或其混合物。
- 如申請專利範圍第1項之導電糊,其中該糊另外包含介於0.1wt%至20wt%的選自界面活性劑、搖變減黏劑、塑化劑、去泡劑、除濕劑、交聯劑、錯合劑及/或導電聚合物顆粒之至少一種添加劑。
- 一種半導體裝置,其包含具有至少一個表面之半導體基板,藉由使用如申請專利範圍第1項至第11項中任一項之糊將導電圖案印刷至該至少一個表面上。
- 如申請專利範圍第12項之半導體裝置,其中該半導體基板係基於矽。
- 如申請專利範圍第12項之半導體裝置,其中抗反射層形成至該半導體基板上,且該導電圖案印刷至該抗反射層上。
- 如申請專利範圍第12項之半導體裝置,其中該半導體裝置係光伏打電池,且該等導電圖案具有導電網格線。
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US11078418B2 (en) | 2016-07-05 | 2021-08-03 | Basf Se | Corrosion inhibitors for fuels and lubricants |
JP7119454B2 (ja) * | 2018-03-16 | 2022-08-17 | 住友金属鉱山株式会社 | 有機ビヒクルの製造方法、及び、導電性ペーストの製造方法 |
CA3117828C (en) * | 2018-07-23 | 2023-10-03 | China Tobacco Hubei Industrial Corporation Limited | Electronic paste composition, and preparation method and use of the same |
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US6017587A (en) * | 1998-07-09 | 2000-01-25 | Dow Corning Corporation | Electrically conductive silicone compositions |
JP2000276945A (ja) | 1999-03-25 | 2000-10-06 | Murata Mfg Co Ltd | 導体ペースト及びそれを用いた回路基板 |
US6497812B1 (en) | 1999-12-22 | 2002-12-24 | Chevron U.S.A. Inc. | Conversion of C1-C3 alkanes and fischer-tropsch products to normal alpha olefins and other liquid hydrocarbons |
JP3904433B2 (ja) * | 2001-11-16 | 2007-04-11 | 住友ゴム工業株式会社 | 導電性ペーストとそれを用いた導電パターンの形成方法 |
KR20100000685A (ko) | 2008-06-25 | 2010-01-06 | 에스에스씨피 주식회사 | 전도성 페이스트 조성물 및 이를 이용한 전극 제조방법 |
KR101204812B1 (ko) * | 2009-03-31 | 2012-11-27 | 도레이 카부시키가이샤 | 감광성 도전 페이스트 및 그것을 사용한 디스플레이의 제조 방법, 및 디스플레이 |
KR101775172B1 (ko) * | 2009-06-04 | 2017-09-05 | 더루우브리졸코오포레이션 | 고 vi 점도 조정제로서의 폴리메타크릴레이트 |
KR101789838B1 (ko) | 2009-09-04 | 2017-10-25 | 바스프 에스이 | 전도체 트랙을 인쇄하기 위한 조성물 및 태양 전지를 제조하기 위한 방법 |
KR20110049222A (ko) | 2009-11-04 | 2011-05-12 | 엘지이노텍 주식회사 | 실리콘 오일을 포함하는 전극 형성용 페이스트 조성물 |
KR101181190B1 (ko) * | 2010-07-30 | 2012-09-18 | 엘지이노텍 주식회사 | 태양 전지 및 이의 후면 전극용 페이스트 조성물 |
CN102376379B (zh) * | 2010-08-13 | 2016-04-20 | 三星电子株式会社 | 导电糊料及包含用其形成的电极的电子器件和太阳能电池 |
WO2012129554A2 (en) * | 2011-03-24 | 2012-09-27 | E. I. Du Pont De Nemours And Company | Conductive paste composition and semiconductor devices made therewith |
JP5934336B2 (ja) * | 2011-03-29 | 2016-06-15 | サン ケミカル コーポレイション | ワックスチクソトロープ剤を含有する高いアスペクト比のスクリーン印刷可能な厚膜ペースト組成物 |
TWI577742B (zh) * | 2014-06-20 | 2017-04-11 | 賀利氏貴金屬北美康舍霍肯有限責任公司 | 用於導電性漿料之有機載體 |
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PH12017502242A1 (en) | 2018-06-11 |
US20180182506A1 (en) | 2018-06-28 |
EP3311388A1 (en) | 2018-04-25 |
CN107810539A (zh) | 2018-03-16 |
EP3311388B1 (en) | 2019-04-17 |
WO2016202841A1 (en) | 2016-12-22 |
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