TW201510512A - Defect inspection system and film manufacturing apparatus - Google Patents

Defect inspection system and film manufacturing apparatus Download PDF

Info

Publication number
TW201510512A
TW201510512A TW103119218A TW103119218A TW201510512A TW 201510512 A TW201510512 A TW 201510512A TW 103119218 A TW103119218 A TW 103119218A TW 103119218 A TW103119218 A TW 103119218A TW 201510512 A TW201510512 A TW 201510512A
Authority
TW
Taiwan
Prior art keywords
film
defect inspection
disposed
defect
light
Prior art date
Application number
TW103119218A
Other languages
Chinese (zh)
Other versions
TWI629466B (en
Inventor
Keita Imura
Original Assignee
Sumitomo Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co filed Critical Sumitomo Chemical Co
Publication of TW201510512A publication Critical patent/TW201510512A/en
Application granted granted Critical
Publication of TWI629466B publication Critical patent/TWI629466B/en

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G01N21/896Optical defects in or on transparent materials, e.g. distortion, surface flaws in conveyed flat sheet or rod
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B41/00Arrangements for controlling or monitoring lamination processes; Safety arrangements
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/8422Investigating thin films, e.g. matrix isolation method
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/8901Optical details; Scanning details
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/8914Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the material examined
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B41/00Arrangements for controlling or monitoring lamination processes; Safety arrangements
    • B32B2041/04Detecting wrong registration, misalignment, deviation, failure
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/8422Investigating thin films, e.g. matrix isolation method
    • G01N2021/8438Mutilayers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8806Specially adapted optical and illumination features
    • G01N2021/8848Polarisation of light

Abstract

A defect inspection system includes: an affixing roll used to affix a first film and a second film and to form a film; a transport line in which the film is transported in the downstream than the affixing roll; a defect inspection device provided in the transport line; and a recording device provided in the transport line further downstream than the defect inspection device and used to record defect information regarding a defect detected by the defect inspection device on the film; wherein the defect inspection device is provided in the transport line further upstream than a roll, other than the affixing roll, that first comes into contact with a surface of the second film which is the surface opposite to the first film.

Description

缺陷檢查系統及薄膜製造裝置Defect inspection system and film manufacturing device

本發明係關於一種缺陷檢查系統及薄膜製造裝置。 本發明係根據2013年6月4日於日本提出申請之日本專利申請第2013-117947號而主張其優先權,並引用其內容。The present invention relates to a defect inspection system and a film manufacturing apparatus. The present invention claims priority based on Japanese Patent Application No. 2013-117947, filed on Jan.

關於條狀薄膜之缺陷檢查系統,已知有專利文獻1中所記載之缺陷檢查系統。專利文獻1之缺陷檢查系統係於薄膜之搬送生產線上,具備有:缺陷檢查裝置;以及將缺陷資訊記錄於薄膜上的記錄裝置。 另一方面,關於薄膜製造裝置,已知有專利文獻2中所記載之薄膜製造裝置。專利文獻2之薄膜製造裝置具備有:貼合滾筒,係將第一薄膜與第二薄膜貼合而形成薄膜;搬送生產線,係於貼合滾筒下游側搬送薄膜;以及缺陷檢查裝置,係設置於搬送生產線。A defect inspection system described in Patent Document 1 is known as a defect inspection system for a strip-shaped film. The defect inspection system of Patent Document 1 is a film transfer production line, and includes a defect inspection device and a recording device that records defect information on a film. On the other hand, a film manufacturing apparatus described in Patent Document 2 is known as a film manufacturing apparatus. The film manufacturing apparatus of the patent document 2 is equipped with the bonding roll which laminates the 1st film and the 2nd film, and the film|membrane, and the conveyance line which conveys the film on the downstream of a bonding roll, and the defect inspection apparatus is set in the Transfer the production line.

例如,在薄膜之製造生產線中,將第一薄膜與第二薄膜貼合,捲取成滾筒狀而製造出薄膜之料捲滾筒。在將第一薄膜與第二薄膜貼合時,第一薄膜與第二薄膜之間可能會發生氣泡等軋入異物之混入問題。缺陷檢查裝置係用於檢查第一薄膜與第二薄膜之間是否有異物缺陷等。 [先前技術文獻] [專利文獻]For example, in a production line for a film, a first film and a second film are bonded together, and are wound into a roll to produce a film roll. When the first film and the second film are bonded together, a problem of incorporation of air bubbles or the like into the foreign matter may occur between the first film and the second film. The defect inspection device is for checking whether there is a foreign matter defect or the like between the first film and the second film. [Prior Technical Literature] [Patent Literature]

專利文獻1:日本專利特開第2011-7779號公報。 專利文獻2:日本專利特開第2008-49604號公報。Patent Document 1: Japanese Patent Laid-Open No. 2011-7779. Patent Document 2: Japanese Patent Laid-Open No. 2008-49604.

[發明所欲解決的問題][Problems to be solved by the invention]

缺陷檢查裝置通常係設置於搬送生產線下游側。將缺陷檢查裝置設置於搬送生產線下游側比設置於搬送生產線上游側來得好,原因是能一併檢查搬送中薄膜所產生的刮痕等缺陷。例如,缺陷檢查裝置係在薄膜接觸10~20根滾筒後,檢查是否有薄膜缺陷。The defect inspection device is usually disposed on the downstream side of the transfer line. It is preferable that the defect inspection device is disposed on the downstream side of the conveyance line rather than on the upstream side of the conveyance line because the defects such as scratches generated by the film during conveyance can be collectively checked. For example, the defect inspection device checks whether there is a film defect after the film is in contact with 10 to 20 rolls.

另一方面,於最終產品中,將第二薄膜從第一薄膜處進行剝離的情況下,第二薄膜表面之刮痕並不造成問題。例如,即使第二薄膜表面產生有刮痕,第一薄膜與第二薄膜之間不存在有異物缺陷等的情況下,薄膜仍可作為最終產品且使用上沒有問題。On the other hand, in the case where the second film is peeled off from the first film in the final product, the scratch on the surface of the second film does not cause a problem. For example, even if scratches are formed on the surface of the second film, and there is no foreign matter defect or the like between the first film and the second film, the film can be used as a final product and there is no problem in use.

然而,薄膜在搬送中於第二薄膜表面產生有刮痕時,會有把原本沒有問題的第二薄膜表面之刮痕誤檢測出為缺陷的情況。該情況中,會把作為最終產品的可使用之薄膜視作缺陷品。However, when the film is scratched on the surface of the second film during conveyance, there is a case where the scratch of the surface of the second film which is not originally problematic is erroneously detected as a defect. In this case, the usable film as the final product is regarded as a defective product.

本發明之態樣係有鑑於前述問題,目的係提供一種能抑制因檢測出刮痕而導致缺陷誤報的缺陷檢查系統及薄膜製造裝置。 [用於解決問題的手段]In view of the foregoing, it is an object of the present invention to provide a defect inspection system and a film manufacturing apparatus capable of suppressing false alarms due to detection of scratches. [Means for solving problems]

為達成上述目的,本發明態樣之缺陷檢查系統及薄膜製造裝置係採用以下構成。 (1)本發明第一態樣之缺陷檢查系統,係為具有第一薄膜與可剝離地層積於該第一薄膜之第二薄膜的條狀薄膜之缺陷檢查系統,包含:貼合滾筒,係將該第一薄膜與該第二薄膜貼合而形成該薄膜;搬送生產線,係於該貼合滾筒下游側搬送該薄膜;缺陷檢查裝置,係設置於該搬送生產線;以及記錄裝置,係設置於該搬送生產線之缺陷檢查裝置下游側,將由該缺陷檢查裝置所檢測出缺陷的相關缺陷資訊記錄於該薄膜;其中,該缺陷檢查裝置係配置在該搬送生產線中,並配置在該貼合滾筒以外的第二薄膜之第一薄膜的反對側之面最先接觸到的滾筒之上游側處。In order to achieve the above object, the defect inspection system and the film manufacturing apparatus of the present invention adopt the following constitution. (1) A defect inspection system according to a first aspect of the present invention is a defect inspection system having a first film and a strip film which is releasably laminated on the second film of the first film, comprising: a bonding roller, The first film is bonded to the second film to form the film; the transfer line transports the film on the downstream side of the bonding roll; the defect inspection device is disposed on the transfer line; and the recording device is disposed on the film On the downstream side of the defect inspection device of the transfer line, the defect information related to the defect detected by the defect inspection device is recorded on the film; wherein the defect inspection device is disposed in the transfer line and disposed outside the bonding roller The opposite side of the first film of the second film is first contacted at the upstream side of the drum.

(2)於上述(1)所記載之缺陷檢查系統,其中該缺陷檢查裝置包含:光源,係配置於該薄膜之第一薄膜側,對該薄膜照射光線;拍攝裝置,係配置於該薄膜之第二薄膜側,拍攝該薄膜之透射光圖像;第一偏光濾鏡,係配置於該光源與該薄膜間的光線路徑上,具有第一吸收軸;以及第二偏光濾鏡,係配置於該拍攝裝置與該薄膜間的光線路徑上,具有與該第一吸收軸正交的第二吸收軸。(2) The defect inspection system according to (1), wherein the defect inspection device includes: a light source disposed on a first film side of the film to irradiate the film with light; and an imaging device disposed on the film a second film side, the transmitted light image of the film is taken; the first polarizing filter is disposed on the light path between the light source and the film, and has a first absorption axis; and the second polarizing filter is disposed on the second polarizing filter A light absorption path between the imaging device and the film has a second absorption axis orthogonal to the first absorption axis.

(3)於上述(1)所記載之缺陷檢查系統,其中:該第一薄膜係偏光元件;且該缺陷檢查裝置包含有:光源,係配置於該薄膜之偏光元件側,對該薄膜照射光線;拍攝裝置,係配置於該薄膜之第二薄膜側,拍攝該薄膜之透射光圖像;以及偏光濾鏡,係配置於該拍攝裝置與該薄膜間的光線路徑上,具有與該偏光元件之吸收軸正交的吸收軸。(3) The defect inspection system according to (1), wherein the first film is a polarizing element; and the defect inspection device includes a light source disposed on a side of the polarizing element of the film to illuminate the film. The imaging device is disposed on the second film side of the film to capture a transmitted light image of the film; and a polarizing filter disposed on a light path between the imaging device and the film, and having the polarizing element The absorption axis of the absorption axis is orthogonal.

(4)本發明第二態樣之薄膜製造裝置,係包含如上述(1)至(3)中任一項所記載之缺陷檢查系統。 [發明的效果](4) A film manufacturing apparatus according to a second aspect of the present invention, comprising the defect inspection system according to any one of (1) to (3) above. [Effects of the Invention]

依照本發明之態樣,可提供一種能抑制因檢測出刮痕而導致缺陷誤報的缺陷檢查系統及薄膜製造裝置。According to the aspect of the invention, it is possible to provide a defect inspection system and a film manufacturing apparatus capable of suppressing false alarms due to detection of scratches.

以下,係參考圖式說明本發明之實施形態,但本發明不限定於以下之實施形態。Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited to the following embodiments.

此外,於以下全部圖式中,為了圖式清楚起見,各結構元件之尺寸和比例等係經過適當變更。又,以下說明及圖式中,對相同或相當之元件係賦予相同之元件符號,而省略重複說明。In addition, in the following drawings, the dimensions and proportions of the respective structural elements are appropriately changed for the sake of clarity of the drawings. In the following description and the drawings, the same or corresponding components are denoted by the same reference numerals, and the description thereof will not be repeated.

(第一實施形態) 第1圖係顯示第一實施形態之薄膜製造裝置1的側視圖。於第1圖中,元件符號Sf1係薄膜F之上側面,即為第一薄膜F1側之面。元件符號Sf2係薄膜F之下側面,即為第二薄膜F2側之面。(First Embodiment) Fig. 1 is a side view showing a film manufacturing apparatus 1 of a first embodiment. In Fig. 1, the element symbol Sf1 is the upper surface of the film F, that is, the surface on the side of the first film F1. The element symbol Sf2 is the lower side of the film F, that is, the surface on the side of the second film F2.

以下說明中,係對應需求並設定XYZ正交座標系,參考該XYZ正交座標系並說明各組件之位置關係。於本實施形態中,X方向係條狀薄膜之搬送方向,Y方向係薄膜面內與X方向正交之方向(長條薄膜之寬度方向),Z方向係與X方向及Y方向正交之方向。In the following description, the XYZ orthogonal coordinate system is set corresponding to the demand, and the positional relationship of each component is described with reference to the XYZ orthogonal coordinate system. In the present embodiment, the transport direction of the strip film in the X direction is the direction in which the Y direction is perpendicular to the X direction (the width direction of the long film), and the Z direction is orthogonal to the X direction and the Y direction. direction.

如第1圖所示,薄膜製造裝置1具備:供給第一薄膜F1的第一供給部7;供給第二薄膜F2的第二供給部8;檢查薄膜F是否有缺陷的缺陷檢查系統2;形成薄膜F之搬送路線的複數個滾筒(例如,本實施形態中係第一導引滾筒10、第二導引滾筒11及第三導引滾筒12);以及捲取薄膜F的捲取部9。As shown in Fig. 1, the film manufacturing apparatus 1 includes a first supply unit 7 that supplies the first film F1, a second supply unit 8 that supplies the second film F2, and a defect inspection system 2 that checks whether the film F is defective. A plurality of rollers (for example, the first guide roller 10, the second guide roller 11, and the third guide roller 12 in the present embodiment) of the transport path of the film F; and a winding portion 9 that winds up the film F.

此外,本實施形態中,雖設置有第一導引滾筒10、第二導引滾筒11及第三導引滾筒12的三個導引滾筒,以作為形成薄膜F之搬送路線的複數個滾筒,但並不限定於此。例如,亦可設置有四個以上的導引滾筒,或亦可設置有除了導引滾筒以外的夾持滾筒或張力滾筒,來作為形成薄膜F之搬送路線的複數個滾筒。又,除了此類接觸型滾筒以外,亦可設置有空氣棒等非接觸型滾筒。Further, in the present embodiment, three guide rollers of the first guide roller 10, the second guide roller 11, and the third guide roller 12 are provided as a plurality of rollers that form a conveyance path of the film F, However, it is not limited to this. For example, four or more guide rollers may be provided, or a nip roller or a tension roller other than the guide roller may be provided as a plurality of rollers forming a conveying path of the film F. Further, in addition to such a contact type drum, a non-contact type drum such as an air rod may be provided.

薄膜F係為具有第一薄膜F1與可剝離地層積於第一薄膜F1之第二薄膜F2的條狀薄膜。本實施形態中所使用之薄膜F係為例如將作為分離薄膜之第二薄膜F2覆蓋在作為最終產品來使用之薄膜的第一薄膜F1之一側之面的結構。The film F is a strip film having a first film F1 and a second film F2 which is releasably laminated on the first film F1. The film F used in the present embodiment is, for example, a structure in which the second film F2 as a separation film is coated on one side of the first film F1 of the film used as the final product.

第一薄膜F1係例如使用三醋酸纖維素(TAC, Triacetyl cellulose)薄膜、相位差薄膜、輝度增加薄膜、廣視角薄膜等薄膜。第二薄膜F2係例如使用具有離型膜的黏著薄膜。 此外,薄膜F亦可為在第一薄膜F1的另一側之面,層積有相位差薄膜或輝度增加薄膜等複數個光學薄膜者。The first film F1 is, for example, a film of a triacetyl cellulose (TAC) film, a retardation film, a luminance increasing film, or a wide viewing angle film. The second film F2 is, for example, an adhesive film having a release film. Further, the film F may be a plurality of optical films such as a retardation film or a luminance increasing film laminated on the other surface of the first film F1.

又,於薄膜F處,將第二薄膜F2從第一薄膜F1處進行剝離的情況下,並非將第二薄膜F2整體從第一薄膜F1處進行剝離。例如,將薄膜F中第二薄膜F2之一部分(離型膜)進行剝離,自黏著材料側將剝離後之薄膜(第一薄膜F1及黏著材料)貼合至面板等。即,將第二薄膜F2之一部分剝離後,將第二薄膜F2之殘餘部分(黏著材料)配置於第一薄膜F1之一面。Further, when the second film F2 is peeled off from the first film F1 at the film F, the entire second film F2 is not peeled off from the first film F1. For example, one portion (release film) of the second film F2 in the film F is peeled off, and the peeled film (the first film F1 and the adhesive material) is bonded to the panel or the like from the adhesive material side. That is, after a part of the second film F2 is partially peeled off, the remaining portion (adhesive material) of the second film F2 is placed on one surface of the first film F1.

第一供給部7係保持著捲繞有條狀第一薄膜F1之料捲滾筒R1,並沿第一薄膜F1之長邊方向將第一薄膜F1捲出。第一供給部7係配置於薄膜F之供給路線的一側(第1圖所示之+Z方向側)。The first supply unit 7 holds the roll drum R1 around which the strip-shaped first film F1 is wound, and winds up the first film F1 in the longitudinal direction of the first film F1. The first supply unit 7 is disposed on one side of the supply path of the film F (the +Z direction side shown in Fig. 1).

第二供給部8係保持著捲繞有條狀第二薄膜F2之料捲滾筒R2,並沿第二薄膜F2之長邊方向將第二薄膜F2捲出。第二供給部8係配置於薄膜F之供給路線的另一側(第1圖所示之-Z方向側)。The second supply unit 8 holds the roll drum R2 around which the strip-shaped second film F2 is wound, and winds up the second film F2 in the longitudinal direction of the second film F2. The second supply unit 8 is disposed on the other side of the supply path of the film F (the -Z direction side shown in Fig. 1).

此外,第一供給部7及第二供給部8之配置結構並不限定於此。例如,第一供給部7亦可配置於薄膜F之供給路線的另一側(第1圖所示之-Z方向側),且第二供給部8亦可配置於薄膜F之供給路線的一側(第1圖所示之+Z方向側)。Further, the arrangement configuration of the first supply unit 7 and the second supply unit 8 is not limited thereto. For example, the first supply unit 7 may be disposed on the other side of the supply path of the film F (the -Z direction side shown in FIG. 1), and the second supply unit 8 may be disposed on one of the supply paths of the film F. Side (+Z direction side shown in Figure 1).

缺陷檢查系統2具備:貼合滾筒3,係將第一薄膜F1與第二薄膜F2二片薄膜貼合而形成一片薄膜F;搬送生產線4,係於貼合滾筒3下游側搬送薄膜F;缺陷檢查裝置5,係設置於搬送生產線4;以及記錄裝置6,係設置於搬送生產線4之缺陷檢查裝置5下游側。The defect inspection system 2 includes a bonding drum 3 that bonds two films of the first film F1 and the second film F2 to form a single film F, and a conveyance line 4 that conveys the film F on the downstream side of the bonding drum 3; The inspection device 5 is provided on the conveyance line 4; and the recording device 6 is provided on the downstream side of the defect inspection device 5 of the conveyance line 4.

貼合滾筒3具有於軸線方向相互平行地配置的一對夾持滾筒3a, 3b。一對夾持滾筒3a, 3b之間形成有指定間隙,該間隙內即為第一薄膜F1與第二薄膜F2的貼合位置。將第一薄膜F1和第二薄膜F2重合導入該間隙內。第一薄膜F1和第二薄膜F2係於夾持滾筒3a, 3b處受夾壓,並送往下游側。藉此,將第二薄膜F2貼合至第一薄膜F1的一側之面。The bonding drum 3 has a pair of holding drums 3a, 3b which are arranged in parallel with each other in the axial direction. A predetermined gap is formed between the pair of holding rollers 3a, 3b, and the gap is the bonding position of the first film F1 and the second film F2. The first film F1 and the second film F2 are superposed into the gap. The first film F1 and the second film F2 are pinched at the pinch rolls 3a, 3b and sent to the downstream side. Thereby, the second film F2 is bonded to the surface of one side of the first film F1.

藉由貼合滾筒3,將第一薄膜F1與第二薄膜F2貼合,而形成一片薄膜F。薄膜F係往缺陷檢查裝置5進行搬送。The first film F1 and the second film F2 are bonded together by the bonding roll 3 to form a single film F. The film F is conveyed to the defect inspection device 5.

缺陷檢查裝置5具備:光源20,係配置於薄膜F之第一薄膜F1側(第1圖所示之+Z方向側);拍攝裝置22,係配置於薄膜F之第二薄膜F2側(第1圖所示之-Z方向側);第一偏光濾鏡21,係配置於光源20與薄膜F之間的光線路徑上;以及第二偏光濾鏡23,係配置於拍攝裝置22與薄膜F之間的光線路徑上。The defect inspection device 5 includes a light source 20 disposed on the first film F1 side of the film F (the +Z direction side shown in Fig. 1), and the imaging device 22 disposed on the second film F2 side of the film F (first The -Z direction side is shown in the figure; the first polarizing filter 21 is disposed on the light path between the light source 20 and the film F; and the second polarizing filter 23 is disposed on the imaging device 22 and the film F. Between the light paths.

缺陷檢查裝置5係配置在搬送生產線4中,並配置在貼合滾筒3以外的第二薄膜F2之第一薄膜F1的反對側之面Sf2最先接觸到的滾筒之上游側處。本實施形態之缺陷檢查裝置5係配置在搬送生產線4中,貼合滾筒3下游側的第一導引滾筒10之上游側處。本實施形態中,除了貼合滾筒3以外,第一導引滾筒10係第二薄膜F2之第一薄膜F1的反對側之面Sf2最先接觸到的滾筒。The defect inspection device 5 is disposed in the conveyance line 4 and is disposed on the upstream side of the drum on which the opposing surface Sf2 of the first film F1 of the second film F2 other than the bonding drum 3 is first contacted. The defect inspection device 5 of the present embodiment is disposed in the conveyance line 4 and is disposed on the upstream side of the first guide roller 10 on the downstream side of the bonding drum 3. In the present embodiment, in addition to the bonding drum 3, the first guiding roller 10 is the roller on which the opposing surface Sf2 of the first film F1 of the second film F2 is first contacted.

光源20之光線射出面20a中心與拍攝裝置22之受光面22a中心係同軸(光軸CL上)地配置。The center of the light-emitting surface 20a of the light source 20 is disposed coaxially with the center of the light-receiving surface 22a of the imaging device 22 (on the optical axis CL).

第2圖係第一偏光濾鏡21之第一吸收軸V1與第二偏光濾鏡23之第二吸收軸V2的配置關係說明用圖。Fig. 2 is a view for explaining the arrangement relationship between the first absorption axis V1 of the first polarizing filter 21 and the second absorption axis V2 of the second polarizing filter 23.

如第2圖所示,第一偏光濾鏡21具有第一吸收軸V1。第二偏光濾鏡23具有與第一吸收軸V1正交的第二吸收軸V2。第一偏光濾鏡21係於光源20與拍攝裝置22間的光線路徑上,使第一偏光濾鏡21之第一吸收軸V1與第二偏光濾鏡23之第二吸收軸V2相互正交地配置(正交偏光鏡配置)。As shown in Fig. 2, the first polarizing filter 21 has a first absorption axis V1. The second polarizing filter 23 has a second absorption axis V2 orthogonal to the first absorption axis V1. The first polarizing filter 21 is disposed on the light path between the light source 20 and the imaging device 22 such that the first absorption axis V1 of the first polarizing filter 21 and the second absorption axis V2 of the second polarizing filter 23 are orthogonal to each other. Configuration (orthogonal polarizer configuration).

本實施形態之情況中,薄膜F(參考第1圖)係對於穿透第一偏光濾鏡21之光線而不提供相位差的薄膜。因此,當第一偏光濾鏡21之第一吸收軸V1與第二偏光濾鏡23之第二吸收軸V2呈正交偏光鏡配置時,於第一偏光濾鏡21與第二偏光濾鏡23的重疊部分SV處,光線不會穿透。因此,以拍攝裝置22拍攝重疊部分SV時,只要不具備會擾亂第一偏光濾鏡21與第二偏光濾鏡23間所具有相位差之偏光狀態的缺陷等因素,則可視為暗場。In the case of this embodiment, the film F (refer to Fig. 1) is a film which does not provide a phase difference with respect to the light which penetrates the first polarizing filter 21. Therefore, when the first absorption axis V1 of the first polarizing filter 21 and the second absorption axis V2 of the second polarizing filter 23 are arranged in a crossed polarizer, the first polarizing filter 21 and the second polarizing filter 23 are At the overlapping portion SV, the light does not penetrate. Therefore, when the overlapping portion SV is imaged by the imaging device 22, it is considered to be a dark field as long as it does not have a factor that disturbs the polarization state of the phase difference between the first polarizing filter 21 and the second polarizing filter 23.

另外,薄膜F係對於穿透第一偏光濾鏡21之光線而提供相位差的薄膜之情況中,亦可在第一偏光濾鏡21與第二偏光濾鏡23間配置能抵銷該相位差的相位補償薄膜。在沒有配置相位補償薄膜的情況中,亦可將第一偏光濾鏡21之透射軸與第二偏光濾鏡23之透射軸配置呈自90°角偏移特定角度後的角度,在沒有異物缺陷等缺陷之狀態下,拍攝裝置22處之受光強度係最小(暗場)。In addition, in the case where the film F is a film that provides a phase difference to the light that penetrates the first polarizing filter 21, the first polarizing filter 21 and the second polarizing filter 23 may be disposed to offset the phase difference. Phase compensation film. In the case where the phase compensation film is not disposed, the transmission axis of the first polarizing filter 21 and the transmission axis of the second polarizing filter 23 may be disposed at an angle shifted from a 90° angle by a specific angle, without foreign matter defects. In the state of the defect, the received light intensity at the photographing device 22 is the smallest (dark field).

第3圖係缺陷檢查裝置5的平面圖。第3圖中,為了方便起見,係繪示有薄膜F。Fig. 3 is a plan view of the defect inspection device 5. In Fig. 3, for the sake of convenience, a film F is shown.

如第3圖所示,構成缺陷檢查裝置5的光源20之光線射出面20a係長方形,沿Y方向上具有長邊。於本實施形態中,光源20之光線射出面20a係沿與薄膜F搬送方向正交之寬度方向上具有長邊。光源20之光線射出面20a係相對薄膜F而橫跨其寬度方向來形成。例如,可使用LED線光源作為光源20。As shown in Fig. 3, the light-emitting surface 20a of the light source 20 constituting the defect inspection device 5 has a rectangular shape and has a long side in the Y direction. In the present embodiment, the light-emitting surface 20a of the light source 20 has a long side in the width direction orthogonal to the direction in which the film F is conveyed. The light exit surface 20a of the light source 20 is formed across the width direction with respect to the film F. For example, an LED line source can be used as the light source 20.

第一偏光濾鏡21係配置成與光源20之光線射出面20a的外周部重疊。第一偏光濾鏡21係與光源20之光線射出面20a相同地,沿Y方向上具有長邊。第一偏光濾鏡21的長度係於X方向及Y方向上皆較光源20之光線射出面20a更長。The first polarizing filter 21 is disposed to overlap the outer peripheral portion of the light emitting surface 20a of the light source 20. The first polarizing filter 21 has a long side in the Y direction, similarly to the light emitting surface 20a of the light source 20. The length of the first polarizing filter 21 is longer in the X direction and the Y direction than the light emitting surface 20a of the light source 20.

藉此,將第一偏光濾鏡21配置於光源20與薄膜F間之光線路徑上的情況中,從光源20所射出之光線會全部射入至第一偏光濾鏡21。Thereby, in the case where the first polarizing filter 21 is disposed on the light path between the light source 20 and the film F, all of the light emitted from the light source 20 is incident on the first polarizing filter 21.

拍攝裝置22亦與光源20之光線射出面20a相同地,沿Y方向上具有長邊。例如,可使用線型攝影機作為拍攝裝置22。Similarly to the light emitting surface 20a of the light source 20, the imaging device 22 has a long side in the Y direction. For example, a line type camera can be used as the photographing device 22.

第二偏光濾鏡23係配置成與拍攝裝置22之受光面22a的外周部重疊。第二偏光濾鏡23係與拍攝裝置22之受光面22a相同地,沿Y方向上具有長邊。第二偏光濾鏡23的長度係於X方向及Y方向上皆較拍攝裝置22之受光面22a更長。The second polarizing filter 23 is disposed to overlap the outer peripheral portion of the light receiving surface 22a of the imaging device 22. The second polarizing filter 23 has a long side in the Y direction, similarly to the light receiving surface 22a of the imaging device 22. The length of the second polarizing filter 23 is longer in the X direction and the Y direction than the light receiving surface 22a of the imaging device 22.

回到第1圖,記錄裝置6係設置於搬送生產線4之第三導引滾筒12下游側。記錄裝置6將由缺陷檢查裝置5所檢測出缺陷的相關缺陷資訊記錄於薄膜F(例如本實施形態中之第一薄膜F1)上。缺陷資訊包含缺陷位置和種類的相關資訊等。Returning to Fig. 1, the recording device 6 is disposed on the downstream side of the third guide roller 12 of the conveyance line 4. The recording device 6 records the related defect information detected by the defect inspection device 5 on the film F (for example, the first film F1 in the present embodiment). Defect information includes information about the location and type of defects.

記錄裝置6係例如將缺陷資訊以識別碼(一維條碼、二維條碼、QR碼(登錄商標)等)形式記錄於第一薄膜F1之寬度方向端部。識別碼係包含例如:顯示缺陷檢查裝置5所測檢出之缺陷位於沿薄膜寬度方向上距條碼附加位置相隔有多少距離之位置的資訊(缺陷位置之相關資訊)。識別碼亦可包含所檢測出之缺陷種類的相關資訊。The recording device 6 records, for example, the defect information in the width direction end portion of the first film F1 in the form of an identification code (a one-dimensional bar code, a two-dimensional bar code, a QR code (registered trademark), or the like). The identification code includes, for example, information indicating the position where the defect detected by the defect inspection device 5 is located at a distance from the additional position of the barcode in the film width direction (related information of the defect position). The identification code may also contain information about the type of defect detected.

記錄裝置6亦可將能包圍缺陷之尺寸的點狀、線狀或框狀標記直接標示於第一薄膜F1之缺陷位置處。此時,將該標記與顯示缺陷種類之記號或外觀標示於缺陷位置處,以記錄缺陷種類的相關資訊。The recording device 6 can also directly mark the dot-like, linear or frame-shaped marks that can surround the size of the defect at the defect position of the first film F1. At this time, the mark and the mark indicating the type of the defect are displayed at the defect position to record the related information of the defect type.

經記錄裝置6記錄有缺陷資訊之薄膜F係朝捲取部9進行搬送。且,於捲取部9捲取成滾筒狀,以製造出薄膜F之料捲滾筒R。The film F on which the defect information is recorded by the recording device 6 is conveyed toward the winding unit 9. Further, the take-up portion 9 is wound into a roll shape to manufacture a roll drum R of the film F.

順帶一提,缺陷檢查裝置通常係設置於搬送生產線下游側。將缺陷檢查裝置設置於搬送生產線下游側比設置於搬送生產線上游側來得好,原因是能一併檢查搬送中薄膜上產生的刮痕等缺陷。例如,缺陷檢查裝置在薄膜接觸10~20根滾筒後,檢查是否有薄膜缺陷。Incidentally, the defect inspection device is usually disposed on the downstream side of the conveyance line. It is preferable that the defect inspection device is disposed on the downstream side of the conveyance line rather than on the upstream side of the conveyance line because the defects such as scratches on the film during conveyance can be collectively checked. For example, the defect inspection device checks whether there is a film defect after the film is in contact with 10 to 20 rolls.

另一方面,於最終產品中,將第二薄膜從第一薄膜處進行剝離的情況下,第二薄膜表面之刮痕並不造成問題。例如,即使第二薄膜表面產生刮痕,第一薄膜與第二薄膜之間不存在有異物缺陷等的情況下,薄膜仍可作為最終產品且使用上沒有問題。On the other hand, in the case where the second film is peeled off from the first film in the final product, the scratch on the surface of the second film does not cause a problem. For example, even if a scratch is formed on the surface of the second film, and there is no foreign matter defect or the like between the first film and the second film, the film can be used as a final product and there is no problem in use.

然而,薄膜在搬送中於第二薄膜表面產生有刮痕時,會有把原本沒有問題的第二薄膜表面之刮痕誤檢測為缺陷的情況。該情況中,會把作為最終產品的可使用之薄膜視作缺陷品。However, when the film is scratched on the surface of the second film during conveyance, there is a case where the scratch of the surface of the second film which is not originally problematic is erroneously detected as a defect. In this case, the usable film as the final product is regarded as a defective product.

故,為解決前述問題,本發明之一實施形態係採用以下構成。 本發明第一實施形態之缺陷檢查系統2係為具有第一薄膜F1與可剝離地層積於第一薄膜F1之第二薄膜F2的條狀薄膜F之缺陷檢查系統,包含:貼合滾筒3,係將第一薄膜F1與第二薄膜F2貼合而形成薄膜F;搬送生產線4,係於貼合滾筒3下游側搬送薄膜F;缺陷檢查裝置5,係設置於搬送生產線4;以及記錄裝置6,係設置於搬送生產線4之缺陷檢查裝置5的下游側,將由缺陷檢查裝置5所檢測出缺陷的相關缺陷資訊記錄於薄膜F上;其中,缺陷檢查裝置5係配置在搬送生產線4中,並配置在貼合滾筒3以外的第二薄膜F2之第一薄膜F1的反對側之面Sf2最先接觸到的滾筒(第一導引滾筒10)之上游側處。 換言之,本發明第一實施形態之缺陷檢查系統2係為具有第一薄膜F1與可剝離地層積於第一薄膜F1之第二薄膜F2的條狀薄膜F之缺陷檢查系統,包含:貼合滾筒3,係將第一薄膜F1與第二薄膜F2貼合而形成薄膜F;搬送生產線4,係於貼合滾筒3下游側搬送薄膜F;缺陷檢查裝置5,係設置於搬送生產線4;記錄裝置6,係設置於搬送生產線4之缺陷檢查裝置5的下游側,將由缺陷檢查裝置5所檢測出缺陷的相關缺陷資訊記錄於薄膜F上;以及複數個滾筒(第一導引滾筒10、第二導引滾筒11、第三導引滾筒12),係設置於搬送生產線4;其中,缺陷檢查裝置5係配置在搬送生產線4中,並配置在複數個滾筒中的第二薄膜F2之第一薄膜F1的反對側之面Sf2最先接觸到的滾筒(第一導引滾筒10)之上游側處。Therefore, in order to solve the above problems, an embodiment of the present invention adopts the following configuration. The defect inspection system 2 according to the first embodiment of the present invention is a defect inspection system including a first film F1 and a strip film F which is releasably laminated on the second film F2 of the first film F1, and includes a bonding roller 3, The first film F1 and the second film F2 are bonded together to form a film F; the transport line 4 is transported on the downstream side of the bonding drum 3; the defect inspection device 5 is disposed on the transport line 4; and the recording device 6 The defect inspection information is detected on the downstream side of the defect inspection device 5 of the transfer line 4, and the defect information detected by the defect inspection device 5 is recorded on the film F. The defect inspection device 5 is disposed in the transfer line 4, and The upstream side of the roller (first guide roller 10) to which the opposing side surface Sf2 of the first film F1 of the second film F2 other than the bonding drum 3 is first contacted is disposed. In other words, the defect inspection system 2 according to the first embodiment of the present invention is a defect inspection system having a first film F1 and a strip film F which is releasably laminated on the second film F2 of the first film F1, and includes: a bonding roller 3, the first film F1 and the second film F2 are bonded together to form a film F; the transport line 4 is transported on the downstream side of the bonding drum 3; the defect inspection device 5 is disposed on the transport line 4; 6, on the downstream side of the defect inspection device 5 of the transfer line 4, recording related defect information detected by the defect inspection device 5 on the film F; and a plurality of rollers (first guide roller 10, second The guide roller 11 and the third guide roller 12) are disposed on the conveyance line 4; wherein the defect inspection device 5 is disposed in the conveyance line 4, and is disposed in the first film of the second film F2 among the plurality of rollers The opposite side of the F1's opposite side Sf2 is first contacted by the drum (the first guide roller 10).

以下,使用第4圖及第5圖來說明本實施形態之缺陷檢查系統2的作用效果。Hereinafter, the operation and effect of the defect inspection system 2 of the present embodiment will be described using Figs. 4 and 5 .

第4圖係比較例1之缺陷檢查系統的薄膜F缺陷檢查說明用圖。 於比較例1之缺陷檢查系統中,缺陷檢查裝置5係配置在搬送生產線4中,並配置在貼合滾筒3以外的第二薄膜F2之第一薄膜F1的反對側之面Sf2處接觸到的滾筒(例如最後接觸到複數個導引滾筒中之面Sf2的導引滾筒)之下游側。第4圖係因為在將第一薄膜F1與第二薄膜F2貼合時軋入氣泡等而於薄膜F處存在有缺陷E1,且薄膜F於搬送中因為第二薄膜F2與導引滾筒的摩擦而於第二薄膜F2表面產生有刮痕E2的情況示意圖。Fig. 4 is a view for explaining the film F defect inspection of the defect inspection system of Comparative Example 1. In the defect inspection system of the first comparative example, the defect inspection device 5 is disposed in the conveyance line 4 and is placed in contact with the opposing side surface Sf2 of the first film F1 of the second film F2 other than the bonding drum 3. The downstream side of the drum (for example, the guide roller that finally contacts the face Sf2 of the plurality of guide rollers). Fig. 4 is because the defect E1 is present at the film F when the first film F1 and the second film F2 are bonded together, and the film F is in the conveyance because the second film F2 is rubbed against the guide roller. A schematic view of the case where the scratch E2 is generated on the surface of the second film F2.

如第4圖所示,從光源20朝薄膜F射出之光線L1係通過第一偏光濾鏡21而變成直線偏光L2。通過第一偏光濾鏡21所獲得之直線偏光L2係射入至第一薄膜F1。然後,因存在於第一薄膜F1與第二薄膜F2間之缺陷E1而擾亂直線偏光L2之偏光狀態,偏光狀態被擾亂的光線之一部分(光線L3)會穿透第二偏光濾鏡23。As shown in Fig. 4, the light ray L1 emitted from the light source 20 toward the film F passes through the first polarizing filter 21 to become linearly polarized light L2. The linearly polarized light L2 obtained by the first polarizing filter 21 is incident on the first film F1. Then, due to the defect E1 existing between the first film F1 and the second film F2, the polarization state of the linearly polarized light L2 is disturbed, and a part of the light (L3) which is disturbed by the polarization state penetrates the second polarizing filter 23.

另一方面,亦因存在於第二薄膜F2表面之刮痕E2而擾亂直線偏光L2之偏光狀態,偏光狀態被擾亂的光線之一部分(光線L4)會穿透第二偏光濾鏡23。On the other hand, the polarized state of the linearly polarized light L2 is disturbed by the scratches E2 existing on the surface of the second film F2, and a part of the light (Light L4) disturbed by the polarized state penetrates the second polarizing filter 23.

其結果,穿透第二偏光濾鏡23之光線L3與光線L4係射入至拍攝裝置22,以拍攝裝置22明亮地拍攝到被視作亮點的缺陷E1與刮痕E2。As a result, the light L3 and the light L4 penetrating the second polarizing filter 23 are incident on the imaging device 22, and the imaging device 22 brightly captures the defect E1 and the scratch E2 which are regarded as bright spots.

又,即使第一薄膜F1與第二薄膜F2間不存在有缺陷E1,而第二薄膜F2表面仍存在有刮痕E2的情況下,穿透第二偏光濾鏡23之光線L4係射入至拍攝裝置22,使拍攝裝置22明亮地拍攝到被視作亮點的刮痕E2。Further, even if the defect E1 does not exist between the first film F1 and the second film F2, and the scratch E2 is present on the surface of the second film F2, the light L4 penetrating the second polarizing filter 23 is incident to The imaging device 22 causes the imaging device 22 to brightly capture the scratch E2 that is regarded as a bright spot.

如此一來,於比較例1中,薄膜F在搬送中因為與導引滾筒之摩擦而於第二薄膜F2表面產生有刮痕E2時,於最終產品中,將第二薄膜F2從第一薄膜F1處進行剝離的情況下,原本可視為沒有問題的第二薄膜F2表面之刮痕將被誤檢測為缺陷。As a result, in Comparative Example 1, when the film F is scratched on the surface of the second film F2 due to friction with the guide roller during the conveyance, the second film F2 is removed from the first film in the final product. In the case where peeling is performed at F1, scratches on the surface of the second film F2 which may be regarded as no problem will be erroneously detected as defects.

第5圖係本實施形態之缺陷檢查系統2的薄膜F缺陷檢查說明用圖。 於本實施形態之缺陷檢查系統2中,缺陷檢查裝置5係配置在搬送生產線4中,並配置在貼合滾筒3以外的第二薄膜F2之第一薄膜F1的反對側之面Sf2最先接觸到的滾筒(例如本實施形態中之第一導引滾筒10)之上游側處。第5圖係因為將第一薄膜F1與第二薄膜F2貼合時軋入氣泡等而於薄膜F處存在有缺陷E1的情況示意圖。此外,由於是在第二薄膜F2造成刮痕前來進行薄膜F缺陷之檢查,故第二薄膜F2表面未產生有刮痕。Fig. 5 is a view for explaining the defect inspection of the film F of the defect inspection system 2 of the present embodiment. In the defect inspection system 2 of the present embodiment, the defect inspection device 5 is disposed in the conveyance line 4, and the surface Sf2 of the first film F1 disposed on the second film F2 other than the bonding drum 3 is first contacted. At the upstream side of the roller (for example, the first guide roller 10 in the present embodiment). Fig. 5 is a view showing a state in which a defect E1 is present at the film F when the first film F1 and the second film F2 are bonded together. Further, since the film F defect is inspected before the second film F2 is scratched, no scratches are formed on the surface of the second film F2.

如第5圖所示,從光源20朝薄膜F射出之光線L1係通過第一偏光濾鏡21而變成直線偏光L2。通過第一偏光濾鏡21所獲得之直線偏光L2係射入至第一薄膜F1。然後,因存在於第一薄膜F1與第二薄膜F2間之缺陷E1而擾亂直線偏光L2之偏光狀態,偏光狀態被擾亂的光線之一部分(光線L3)會穿透第二偏光濾鏡23。其結果,穿透第二偏光濾鏡23之光線L3係射入至拍攝裝置22,以拍攝裝置22明亮地拍攝到被視作亮點的缺陷E1。As shown in Fig. 5, the light ray L1 emitted from the light source 20 toward the film F passes through the first polarizing filter 21 to become linearly polarized light L2. The linearly polarized light L2 obtained by the first polarizing filter 21 is incident on the first film F1. Then, due to the defect E1 existing between the first film F1 and the second film F2, the polarization state of the linearly polarized light L2 is disturbed, and a part of the light (L3) which is disturbed by the polarization state penetrates the second polarizing filter 23. As a result, the light L3 penetrating the second polarizing filter 23 is incident on the imaging device 22, and the imaging device 22 brightly captures the defect E1 regarded as a bright spot.

另一方面,在第一薄膜F1與第二薄膜F2間不存在有缺陷E1的情況中,直線偏光L2無法穿透第二偏光濾鏡23。其結果,由於沒有光線射入至拍攝裝置22,故拍攝裝置22會拍攝到黑色影像。On the other hand, in the case where the defect E1 does not exist between the first film F1 and the second film F2, the linearly polarized light L2 cannot penetrate the second polarizing filter 23. As a result, since no light is incident on the imaging device 22, the imaging device 22 captures a black image.

如此一來,於本實施形態中,因為第二薄膜F2表面未產生有刮痕,故不會將第二薄膜F2表面之刮痕誤檢測成缺陷。As described above, in the present embodiment, since no scratches are formed on the surface of the second film F2, the scratches on the surface of the second film F2 are not erroneously detected as defects.

如以上說明,依照本實施形態,缺陷檢查裝置5係配置在搬送生產線4中,並配置在貼合滾筒3以外的第二薄膜F2之第一薄膜F1的反對側之面Sf2最先接觸到的滾筒(例如本實施形態中之第一導引滾筒10)之上游側處,故是在第二薄膜F2造成刮痕前來進行薄膜F缺陷之檢查。即,薄膜F於搬送中,由於第二薄膜F2與導引滾筒並無產生摩擦,所以第二薄膜F2表面未產生有刮痕。因此,可抑制刮痕檢出之缺陷誤報(檢測出錯誤缺陷之資訊)。As described above, according to the present embodiment, the defect inspection device 5 is disposed in the transport line 4, and is disposed first on the opposite side Sf2 of the first film F1 of the second film F2 other than the bonding roll 3 The upstream side of the drum (for example, the first guide roller 10 in the present embodiment) is used to inspect the defect of the film F before the second film F2 is scratched. That is, in the conveyance of the film F, since the second film F2 does not rub against the guide roller, no scratches are formed on the surface of the second film F2. Therefore, it is possible to suppress the false alarm of the flaw detection (the information of the error defect is detected).

(第二實施形態) 其次,使用第6圖至第9圖來說明本發明第二實施形態。 第6圖係顯示本發明第二實施形態之薄膜製造裝置101的側視圖。 如第6圖所示,本實施形態之薄膜製造裝置101與第一實施形態之薄膜製造裝置1的相異之處為:第一薄膜F1a係偏光元件;且缺陷檢查裝置105包含有:光源20,係配置於薄膜Fa之偏光元件F1a側;拍攝裝置22,係配置於薄膜Fa之第二薄膜F2側;以及偏光濾鏡123,係配置於拍攝裝置22與薄膜Fa間的光線路徑上。其它與第一實施形態相同之結構係賦予相同之元件符號,並省略詳細說明。(Second embodiment) Next, a second embodiment of the present invention will be described using Figs. 6 to 9 . Fig. 6 is a side view showing a film manufacturing apparatus 101 according to a second embodiment of the present invention. As shown in FIG. 6, the film manufacturing apparatus 101 of the present embodiment is different from the thin film manufacturing apparatus 1 of the first embodiment in that the first film F1a is a polarizing element, and the defect inspection device 105 includes a light source 20. The image pickup device 22 is disposed on the side of the second film F2 of the film Fa, and the polarizing filter 123 is disposed on the light path between the image forming device 22 and the film Fa. The same components as those in the first embodiment are denoted by the same reference numerals, and the detailed description thereof will be omitted.

薄膜Fa係具有偏光元件F1a與可剝離層積於偏光元件F1a之第二薄膜F2的條狀薄膜。本實施形態中所使用之薄膜F係為例如以第二薄膜F2(作為分離膜)覆蓋住由PVA(聚乙烯醇)等所構成的偏光元件F1a之一面的結構。The film Fa has a strip-shaped film in which the polarizing element F1a and the second film F2 which can be peeled off from the polarizing element F1a are peeled off. The film F used in the present embodiment has a structure in which, for example, the second film F2 (as a separation film) covers one surface of a polarizing element F1a made of PVA (polyvinyl alcohol) or the like.

此外,薄膜Fa亦可在偏光元件F1a之另一面層積有相位差薄膜或輝度增加薄膜等複數個光學薄膜。Further, a plurality of optical films such as a retardation film or a luminance increasing film may be laminated on the other surface of the polarizing element F1a.

本實施形態之情況中,雖然薄膜Fa係為對於穿透偏光元件F1a之光線而不提供相位差的薄膜,但在薄膜Fa係為會對於穿透偏光元件F1a之光線而提供相位差的薄膜之情況中,亦可在薄膜Fa與偏光濾鏡123間配置有能抵銷該相位差的相位補償薄膜。在沒有配置相位補償薄膜的情況中,亦可將偏光元件F1a之透射軸與偏光濾鏡123之透射軸配置呈自90°角偏移特定角度後的角度,在沒有異物缺陷等缺陷之狀態下,拍攝裝置22處之受光強度係最小(暗場)。In the case of the present embodiment, the film Fa is a film which does not provide a phase difference with respect to the light penetrating the polarizing element F1a, but the film Fa is a film which provides a phase difference with respect to the light penetrating the polarizing element F1a. In this case, a phase compensation film capable of canceling the phase difference may be disposed between the film Fa and the polarizing filter 123. In the case where the phase compensation film is not disposed, the transmission axis of the polarizing element F1a and the transmission axis of the polarizing filter 123 may be disposed at an angle shifted by a certain angle from the 90° angle, in the absence of defects such as foreign matter defects. The received light intensity at the photographing device 22 is the smallest (dark field).

缺陷檢查裝置105係配置在搬送生產線4中,並配置在貼合滾筒3以外的第二薄膜F2之偏光元件F1a的反對側之面Sf2最先接觸到的滾筒之上游側處。本實施形態之缺陷檢查裝置105係配置於搬送生產線4中,在貼合滾筒3之下游側的第一導引滾筒10之上游側。The defect inspection device 105 is disposed in the transport line 4 and is disposed on the upstream side of the drum on which the opposing surface Sf2 of the polarizing element F1a of the second film F2 other than the bonding drum 3 is first contacted. The defect inspection device 105 of the present embodiment is disposed on the upstream side of the first guide roller 10 on the downstream side of the bonding drum 3 in the conveyance line 4.

第7圖係偏光元件F1a之吸收軸Va與偏光濾鏡123之吸收軸V的配置關係說明用圖。Fig. 7 is a view for explaining the arrangement relationship between the absorption axis Va of the polarizing element F1a and the absorption axis V of the polarizing filter 123.

如第7圖所示,偏光元件F1a具有吸收軸Va。偏光濾鏡123具有與吸收軸Va正交之吸收軸V。偏光濾鏡123係於光源20與拍攝裝置22間的光線路徑上,使偏光元件F1a之吸收軸Va與偏光濾鏡123之吸收軸V相互正交地配置(正交偏光鏡配置)。As shown in Fig. 7, the polarizing element F1a has an absorption axis Va. The polarizing filter 123 has an absorption axis V orthogonal to the absorption axis Va. The polarizing filter 123 is disposed on the light path between the light source 20 and the imaging device 22, and the absorption axis Va of the polarizing element F1a and the absorption axis V of the polarizing filter 123 are arranged orthogonal to each other (orthogonal polarizer arrangement).

當偏光元件F1a之吸收軸Va與偏光濾鏡123之吸收軸V呈正交偏光鏡配置時,於偏光元件F1a與偏光濾鏡123的重疊部分SV處,光線不會穿透。因此,以拍攝裝置22拍攝重疊部分SV時,不具備會擾亂偏光元件F1a與偏光濾鏡123間所具有相位差之偏光狀態的缺陷等因素,則可視為暗場。When the absorption axis Va of the polarizing element F1a and the absorption axis V of the polarizing filter 123 are arranged in a crossed polarizer, the light does not penetrate at the overlapping portion SV of the polarizing element F1a and the polarizing filter 123. Therefore, when the overlapping portion SV is imaged by the imaging device 22, it is considered to be a dark field without causing a factor that disturbs the polarization state of the phase difference between the polarizing element F1a and the polarizing filter 123.

以下,使用第8圖及第9圖來說明本實施形態之缺陷檢查系統102的作用效果。Hereinafter, the operation and effect of the defect inspection system 102 of the present embodiment will be described using Figs. 8 and 9.

第8圖係比較例2之缺陷檢查系統的薄膜Fa缺陷檢查說明用圖。 於比較例2之缺陷檢查系統中,缺陷檢查裝置105係配置在搬送生產線4中,並配置在貼合滾筒3以外的第二薄膜F2之偏光元件F1a的反對側之面Sf2處接觸到的滾筒(例如複數個導引滾筒中最晚接觸到面Sf2的導引滾筒)之下游側處。第8圖係因為在將偏光元件F1a與第二薄膜F2貼合時軋入氣泡等而於薄膜Fa存在有缺陷E1,且薄膜Fa於搬送中因為第二薄膜F2與導引滾筒的摩擦而於第二薄膜F2表面產生有刮痕E2的情況示意圖。Fig. 8 is a view for explaining the film Fa defect inspection of the defect inspection system of Comparative Example 2. In the defect inspection system of the second comparative example, the defect inspection device 105 is disposed in the conveyance line 4 and is disposed on the opposite side of the surface Sf2 of the polarizing element F1a of the second film F2 other than the bonding drum 3 (for example, at the downstream side of the guide rollers of the plurality of guide rollers that are closest to the face Sf2). In the eighth embodiment, since the defect E1 is present in the film Fa when the polarizing element F1a and the second film F2 are bonded together, the film Fa is present in the film Fa due to the friction of the second film F2 and the guide roller. A schematic view of the case where the scratch E2 is generated on the surface of the second film F2.

如第8圖所示,從光源20朝薄膜Fa射出之光線L1係通過偏光元件F1a而變成直線偏光L2。通過偏光元件F1a所獲得之直線偏光L2係射入至第二薄膜F2。然後,因存在於偏光元件F1a與第二薄膜F2間之缺陷E1而擾亂直線偏光L2之偏光狀態,偏光狀態被擾亂的光線之一部分(光線L3)會穿透偏光濾鏡123。As shown in Fig. 8, the light ray L1 emitted from the light source 20 toward the film Fa passes through the polarizing element F1a to become linearly polarized light L2. The linearly polarized light L2 obtained by the polarizing element F1a is incident on the second thin film F2. Then, due to the defect E1 existing between the polarizing element F1a and the second film F2, the polarized state of the linearly polarized light L2 is disturbed, and a part of the light (L3) which is disturbed by the polarized state passes through the polarizing filter 123.

另一方面,亦因存在於第二薄膜F2表面之刮痕E2而擾亂直線偏光L2之偏光狀態,偏光狀態被擾亂的光線之一部分(光線L4)會穿透偏光濾鏡123。On the other hand, the polarized state of the linearly polarized light L2 is disturbed by the scratches E2 existing on the surface of the second film F2, and a part of the light (light L4) disturbed by the polarized state passes through the polarizing filter 123.

其結果,穿透偏光濾鏡123之光線L3與光線L4係射入至拍攝裝置22,以拍攝裝置22明亮地拍攝到被視作亮點的缺陷E1與刮痕E2。As a result, the light L3 and the light ray L4 penetrating the polarizing filter 123 are incident on the imaging device 22, and the imaging device 22 brightly captures the defect E1 and the scratch E2 which are regarded as bright spots.

又,即使偏光元件F1a與第二薄膜F2間不存在有缺陷E1,而第二薄膜F2表面仍存在有刮痕E2的情況下,穿透偏光濾鏡123之光線L4係射入至拍攝裝置22,以拍攝裝置22明亮地拍攝到被視作亮點的刮痕E2。Further, even if the defect E1 does not exist between the polarizing element F1a and the second film F2, and the scratch E2 is present on the surface of the second film F2, the light L4 penetrating the polarizing filter 123 is incident on the imaging device 22. The image pickup device 22 brightly captures the scratch E2 which is regarded as a bright spot.

如此一來,於比較例2中,薄膜Fa在搬送中因為與導引滾筒之摩擦而於第二薄膜F2表面產生有刮痕E2時,於最終產品中,將第二薄膜F2從偏光元件F1a處進行剝離的情況下,原本可視為沒有問題的第二薄膜F2表面之刮痕將被誤檢測為缺陷。As a result, in Comparative Example 2, when the film Fa is scratched on the surface of the second film F2 by the friction with the guide roller during the conveyance, the second film F2 is removed from the polarizing element F1a in the final product. In the case where the peeling is performed, the scratch on the surface of the second film F2 which can be regarded as no problem will be erroneously detected as a defect.

第9圖係第二實施形態之缺陷檢查系統102的薄膜Fa缺陷檢查說明用圖。 於本實施形態之缺陷檢查系統102中,缺陷檢查裝置105係配置在搬送生產線4中,並配置在貼合滾筒3以外的第二薄膜F2之偏光元件F1a的反對側之面Sf2最先接觸到的滾筒(例如本實施形態中之第一導引滾筒10)之上游側處。第9圖係因為將偏光元件F1a與第二薄膜F2貼合時軋入氣泡等而於薄膜Fa處存在有缺陷E1的情況示意圖。此外,由於是在第二薄膜F2造成刮痕前來進行薄膜Fa缺陷之檢查,故第二薄膜F2表面未產生有刮痕。Fig. 9 is a view for explaining the defect inspection of the film Fa of the defect inspection system 102 of the second embodiment. In the defect inspection system 102 of the present embodiment, the defect inspection device 105 is disposed in the conveyance line 4, and the surface Sf2 of the polarizing element F1a disposed on the second film F2 other than the bonding drum 3 is first contacted. The upstream side of the roller (for example, the first guide roller 10 in the present embodiment). Fig. 9 is a view showing a state in which a defect E1 exists in the film Fa by rolling in a bubble or the like when the polarizing element F1a and the second film F2 are bonded together. Further, since the film Fa defect is inspected before the second film F2 is scratched, no scratches are formed on the surface of the second film F2.

如第9圖所示,從光源20朝薄膜Fa射出之光線L1係通過偏光元件F1a而變成直線偏光L2。通過偏光元件F1a所獲得之直線偏光L2係射入至第二薄膜F2。然後,因存在於偏光元件F1a與第二薄膜F2間之缺陷E1而擾亂直線偏光L2之偏光狀態,偏光狀態被擾亂的光線之一部分(光線L3)會穿透偏光濾鏡123。As shown in Fig. 9, the light ray L1 emitted from the light source 20 toward the film Fa passes through the polarizing element F1a to become linearly polarized light L2. The linearly polarized light L2 obtained by the polarizing element F1a is incident on the second thin film F2. Then, due to the defect E1 existing between the polarizing element F1a and the second film F2, the polarized state of the linearly polarized light L2 is disturbed, and a part of the light (L3) which is disturbed by the polarized state passes through the polarizing filter 123.

其結果,穿透偏光濾鏡123之光線L3係射入至拍攝裝置22,以拍攝裝置22明亮地拍攝到被視作亮點的缺陷E1。As a result, the light L3 that has passed through the polarizing filter 123 is incident on the imaging device 22, and the imaging device 22 brightly captures the defect E1 that is regarded as a bright spot.

另一方面,在偏光元件F1a與第二薄膜F2間不存在有缺陷E1的情況中,直線偏光L2無法穿透偏光濾鏡123。其結果,由於沒有光線射入至拍攝裝置22,故拍攝裝置22會拍攝到黑色影像。On the other hand, in the case where the defect E1 does not exist between the polarizing element F1a and the second film F2, the linearly polarized light L2 cannot penetrate the polarizing filter 123. As a result, since no light is incident on the imaging device 22, the imaging device 22 captures a black image.

如此一來,於本實施形態中,因為第二薄膜F2表面未產生有刮痕,故不會將第二薄膜F2表面之刮痕誤檢測成缺陷。As described above, in the present embodiment, since no scratches are formed on the surface of the second film F2, the scratches on the surface of the second film F2 are not erroneously detected as defects.

如以上說明,依照本實施形態,缺陷檢查裝置105係配置在搬送生產線4中,並配置在貼合滾筒3以外的第二薄膜F2之偏光元件F1a的反對側之面Sf2最先接觸到的滾筒(例如本實施形態中之第一導引滾筒10)之上游側處,故是在第二薄膜F2造成刮痕前來進行薄膜Fa缺陷之檢查。即,薄膜Fa於搬送中,由於第二薄膜F2與導引滾筒並無產生摩擦,所以第二薄膜F2表面未產生有刮痕。因此,可抑制刮痕檢出之缺陷誤報。As described above, according to the present embodiment, the defect inspection device 105 is disposed in the transport line 4, and is disposed on the opposite side of the surface Sf2 of the polarizing element F1a of the second film F2 other than the bonding drum 3. (for example, at the upstream side of the first guide roller 10 in the present embodiment), the film Fa defect is inspected before the second film F2 is scratched. That is, during the conveyance of the film Fa, since the second film F2 does not rub against the guide roller, no scratches are formed on the surface of the second film F2. Therefore, it is possible to suppress false alarms of scratch detection.

以上雖一邊參考所添附之圖式一邊說明本實施形態之合適實施形態例,不言而喻,本發明並不限定於該等範例。上述範例中所示之各構成元件的外形和組合等係一範例,只要不脫離本發明之主旨的範圍內,可根據設計要求等進行各種變更。In the above, a preferred embodiment of the embodiment will be described with reference to the attached drawings, and it is needless to say that the invention is not limited to the examples. The outer shape and the combination of the constituent elements shown in the above examples are merely examples, and various modifications can be made according to design requirements and the like without departing from the scope of the invention.

1, 101‧‧‧薄膜製造裝置
2, 102‧‧‧缺陷檢查系統
3‧‧‧貼合滾筒
3a, 3b‧‧‧夾持滾筒
4‧‧‧搬送生產線
5, 105‧‧‧缺陷檢查裝置
6‧‧‧記錄裝置
7‧‧‧第一供給部
8‧‧‧第二供給部
9‧‧‧捲取部
10‧‧‧第一導引滾筒
11‧‧‧第二導引滾筒
12‧‧‧第三導引滾筒
20‧‧‧光源
20a‧‧‧光線射出面
21‧‧‧第一偏光濾鏡
22‧‧‧拍攝裝置
22a‧‧‧受光面
23‧‧‧第二偏光濾鏡
123‧‧‧偏光濾鏡
CL‧‧‧光軸
E1‧‧‧缺陷
E2‧‧‧刮痕
F‧‧‧薄膜
F1‧‧‧第一薄膜
F1a‧‧‧偏光元件
F2‧‧‧第二薄膜
L1, L3, L4‧‧‧光線
L2‧‧‧直線偏光
R, R1, R2‧‧‧料捲滾筒
Sf1‧‧‧面
Sf2‧‧‧面
SV‧‧‧重疊部分
V‧‧‧吸收軸
V1‧‧‧第一吸收軸
V2‧‧‧第二吸收軸
Va‧‧‧吸收軸
1, 101‧‧‧ film manufacturing equipment
2, 102‧‧‧ defect inspection system
3‧‧‧Finishing roller
3a, 3b‧‧‧Clamping roller
4‧‧‧Transfer production line
5, 105‧‧‧ Defect inspection device
6‧‧‧recording device
7‧‧‧First Supply Department
8‧‧‧Second Supply Department
9‧‧‧Winding Department
10‧‧‧First guide roller
11‧‧‧Second guiding roller
12‧‧‧ Third guide roller
20‧‧‧Light source
20a‧‧‧Light exit surface
21‧‧‧First polarizing filter
22‧‧‧Photographing device
22a‧‧‧Glossy surface
23‧‧‧Second polarizing filter
123‧‧‧ polarizing filter
CL‧‧‧ optical axis
E1‧‧‧ Defects
E2‧‧‧Scratch
F‧‧‧film
F1‧‧‧ first film
F1a‧‧‧ polarizing element
F2‧‧‧second film
L1, L3, L4‧‧‧Light
L2‧‧‧linear polarized light
R, R1, R2‧‧‧ Roller
Sf1‧‧‧ face
Sf2‧‧‧ face
SV‧‧‧ overlap
V‧‧‧ absorption axis
V1‧‧‧first absorption axis
V2‧‧‧second absorption axis
Va‧‧‧ absorption axis

第1圖係顯示第一實施形態之薄膜製造裝置的側視圖。 第2圖係第一偏光濾鏡之第一吸收軸與第二偏光濾鏡之第二吸收軸的配置關係說明用圖。 第3圖係第一實施形態之缺陷檢查裝置的平面圖。 第4圖係比較例1之缺陷檢查系統的薄膜缺陷檢查說明用圖。 第5圖係第一實施形態之缺陷檢查系統的薄膜缺陷檢查說明用圖。 第6圖係顯示第二實施形態之薄膜製造裝置的側視圖。 第7圖係偏光元件之吸收軸與偏光濾鏡之吸收軸的配置關係說明用圖。 第8圖係比較例2之缺陷檢查系統的薄膜缺陷檢查說明用圖。 第9圖係第二實施形態之缺陷檢查系統的薄膜缺陷檢查說明用圖。Fig. 1 is a side view showing the film manufacturing apparatus of the first embodiment. Fig. 2 is a view showing the arrangement relationship between the first absorption axis of the first polarizing filter and the second absorption axis of the second polarizing filter. Fig. 3 is a plan view showing the defect inspection device of the first embodiment. Fig. 4 is a view for explaining the film defect inspection of the defect inspection system of Comparative Example 1. Fig. 5 is a view for explaining a film defect inspection of the defect inspection system of the first embodiment. Fig. 6 is a side view showing the film manufacturing apparatus of the second embodiment. Fig. 7 is a view showing the arrangement relationship between the absorption axis of the polarizing element and the absorption axis of the polarizing filter. Fig. 8 is a view for explaining the film defect inspection of the defect inspection system of Comparative Example 2. Fig. 9 is a view for explaining a film defect inspection of the defect inspection system of the second embodiment.

1‧‧‧薄膜製造裝置 1‧‧‧Film manufacturing equipment

2‧‧‧缺陷檢查系統 2‧‧‧Defect inspection system

3‧‧‧貼合滾筒 3‧‧‧Finishing roller

3a,3b‧‧‧夾持滾筒 3a, 3b‧‧‧ clamping drum

4‧‧‧搬送生產線 4‧‧‧Transfer production line

5‧‧‧缺陷檢查裝置 5‧‧‧ Defect inspection device

6‧‧‧記錄裝置 6‧‧‧recording device

7‧‧‧第一供給部 7‧‧‧First Supply Department

8‧‧‧第二供給部 8‧‧‧Second Supply Department

9‧‧‧捲取部 9‧‧‧Winding Department

10‧‧‧第一導引滾筒 10‧‧‧First guide roller

11‧‧‧第二導引滾筒 11‧‧‧Second guiding roller

12‧‧‧第三導引滾筒 12‧‧‧ Third guide roller

20‧‧‧光源 20‧‧‧Light source

20a‧‧‧光線射出面 20a‧‧‧Light exit surface

21‧‧‧第一偏光濾鏡 21‧‧‧First polarizing filter

22‧‧‧拍攝裝置 22‧‧‧Photographing device

22a‧‧‧受光面 22a‧‧‧Glossy surface

23‧‧‧第二偏光濾鏡 23‧‧‧Second polarizing filter

CL‧‧‧光軸 CL‧‧‧ optical axis

F‧‧‧薄膜 F‧‧‧film

F1‧‧‧第一薄膜 F1‧‧‧ first film

F2‧‧‧第二薄膜 F2‧‧‧second film

R,R1,R2‧‧‧料捲滾筒 R, R1, R2‧‧‧ roll drum

Sf1‧‧‧面 Sf1‧‧‧ face

Sf2‧‧‧面 Sf2‧‧‧ face

Claims (4)

一種缺陷檢查系統,係為具有第一薄膜與可剝離層積於該第一薄膜之第二薄膜的條狀薄膜之缺陷檢查系統,包含: 貼合滾筒,係將該第一薄膜與該第二薄膜貼合而形成該薄膜; 搬送生產線,係於該貼合滾筒下游側搬送該薄膜; 缺陷檢查裝置,係設置於該搬送生產線;以及 記錄裝置,係設置於該搬送生產線之缺陷檢查裝置下游側,將由該缺陷檢查裝置所檢測出缺陷的相關缺陷資訊記錄於該薄膜; 其中,該缺陷檢查裝置係配置在該搬送生產線中,並配置在該貼合滾筒以外的第二薄膜之第一薄膜的反對側之面最先接觸到的滾筒之上游側。A defect inspection system is a defect inspection system having a first film and a strip film releasably laminated on the second film of the first film, comprising: a bonding roller, the first film and the second film The film is bonded to form the film; the transfer line transports the film on the downstream side of the bonding roll; the defect inspection device is disposed on the transfer line; and the recording device is disposed on the downstream side of the defect inspection device of the transfer line Recording, in the film, the defect information related to the defect detected by the defect inspection device; wherein the defect inspection device is disposed in the transfer line and disposed on the first film of the second film other than the bonding roller The upstream side of the roller that is first contacted by the opposite side. 如申請專利範圍第1項所述之缺陷檢查系統,其中該缺陷檢查裝置包含: 光源,係配置於該薄膜之第一薄膜側,對該薄膜照射光線; 拍攝裝置,係配置於該薄膜之第二薄膜側,拍攝該薄膜之透射光圖像; 第一偏光濾鏡,係配置於該光源與該薄膜間的光線路徑上,具有第一吸收軸;以及 第二偏光濾鏡,係配置於該拍攝裝置與該薄膜間的光線路徑上,具有與該第一吸收軸正交的第二吸收軸。The defect inspection system of claim 1, wherein the defect inspection device comprises: a light source disposed on a first film side of the film to illuminate the film; and an imaging device disposed on the film a film on the second film side, the transmitted light image of the film is taken; the first polarizing filter is disposed on the light path between the light source and the film, and has a first absorption axis; and the second polarizing filter is disposed on the film A light path between the imaging device and the film has a second absorption axis orthogonal to the first absorption axis. 如申請專利範圍第1項所述之缺陷檢查系統,其中: 該第一薄膜係偏光元件;且 該缺陷檢查裝置包含有: 光源,係配置於該薄膜之偏光元件側,對該薄膜照射光線; 拍攝裝置,係配置於該薄膜之第二薄膜側,拍攝該薄膜之透射光圖像;以及 偏光濾鏡,係配置於該拍攝裝置與該薄膜間的光線路徑上,具有與該偏光元件之吸收軸正交的吸收軸。The defect inspection system of claim 1, wherein: the first film is a polarizing element; and the defect inspection device comprises: a light source disposed on a side of the polarizing element of the film to irradiate the film with light; The imaging device is disposed on the second film side of the film to capture the transmitted light image of the film; and the polarizing filter is disposed on the light path between the imaging device and the film, and has absorption with the polarizing element Axis orthogonal to the axis of absorption. 一種薄膜製造裝置,係包含如申請專利範圍第1至3項中任一項所述之缺陷檢查系統。A film manufacturing apparatus comprising the defect inspection system according to any one of claims 1 to 3.
TW103119218A 2013-06-04 2014-06-03 Defect inspection system and film manufacturing apparatus TWI629466B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013117947A JP6182806B2 (en) 2013-06-04 2013-06-04 Defect inspection system and film manufacturing apparatus
JP2013-117947 2013-06-04

Publications (2)

Publication Number Publication Date
TW201510512A true TW201510512A (en) 2015-03-16
TWI629466B TWI629466B (en) 2018-07-11

Family

ID=52008120

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103119218A TWI629466B (en) 2013-06-04 2014-06-03 Defect inspection system and film manufacturing apparatus

Country Status (5)

Country Link
JP (1) JP6182806B2 (en)
KR (2) KR20160014630A (en)
CN (1) CN105308441B (en)
TW (1) TWI629466B (en)
WO (1) WO2014196476A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI790763B (en) * 2021-09-30 2023-01-21 千釜事業有限公司 Wrapping material and method of making the same

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6749894B2 (en) * 2015-04-09 2020-09-02 住友化学株式会社 Defect inspection method for laminated optical film, optical film defect inspection method, and laminated optical film manufacturing method
CN105291562B (en) * 2015-11-02 2018-05-11 江苏顺泰包装印刷科技有限公司 A kind of printing defects identity device and its method of work for high-speed gravure press
JP6628669B2 (en) * 2016-03-31 2020-01-15 倉敷紡績株式会社 Structure surface inspection apparatus, structure surface inspection system including the same, and structure surface inspection method
JP6924002B2 (en) * 2016-07-22 2021-08-25 日東電工株式会社 Inspection equipment and inspection method
KR102438892B1 (en) * 2017-03-03 2022-08-31 스미또모 가가꾸 가부시키가이샤 Defect inspection system, film manufacturing apparatus, film manufacturing method, printing apparatus and printing method
KR102475056B1 (en) * 2017-03-03 2022-12-06 스미또모 가가꾸 가부시키가이샤 Defect marking method and defect marking apparatus, web manufacturing method and the web, and sheet manufacturing method and the sheet
JP6934733B2 (en) * 2017-03-03 2021-09-15 住友化学株式会社 Marking equipment, defect inspection system and film manufacturing method
CN107449785B (en) * 2017-08-02 2020-03-17 苏州市朗电机器人有限公司 Visual intelligent detection mechanism for optical film

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004286526A (en) * 2003-03-20 2004-10-14 Lintec Corp Visual inspection machine correction film, visual inspection machine correction method, product film inspection method, and film having been visually inspected
JP2005062165A (en) * 2003-07-28 2005-03-10 Nitto Denko Corp Inspection method for sheet-shaped product, inspection system, sheet-shaped product and image display apparatus
KR20050013491A (en) * 2003-07-28 2005-02-04 닛토덴코 가부시키가이샤 Inspection method and inspection system of sheet type product
JP2008049604A (en) 2006-08-25 2008-03-06 Toray Ind Inc Method for manufacturing transparent laminate and its manufacturing apparatus
JP4960161B2 (en) * 2006-10-11 2012-06-27 日東電工株式会社 Inspection data processing apparatus and inspection data processing method
JP2009243911A (en) * 2008-03-28 2009-10-22 Toray Ind Inc Defect inspection system
US20100162865A1 (en) * 2008-12-31 2010-07-01 E.I. Du Pont De Nemours And Company Defect-containing strip and method for detecting such defects
JP5588223B2 (en) 2009-05-26 2014-09-10 旭化成イーマテリアルズ株式会社 Defect marking apparatus and defect marking method for wire grid polarizing film
JP4503690B1 (en) * 2009-10-13 2010-07-14 日東電工株式会社 Information storage / reading system used in an apparatus for continuously manufacturing liquid crystal display elements, and method and apparatus for manufacturing the information storage / reading system
JP5944165B2 (en) * 2010-05-25 2016-07-05 東レ株式会社 Film defect inspection apparatus and defect inspection method
JP5274622B2 (en) * 2011-06-27 2013-08-28 富士フイルム株式会社 Defect inspection apparatus and method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI790763B (en) * 2021-09-30 2023-01-21 千釜事業有限公司 Wrapping material and method of making the same

Also Published As

Publication number Publication date
JP2014235123A (en) 2014-12-15
CN105308441A (en) 2016-02-03
JP6182806B2 (en) 2017-08-23
KR20160014630A (en) 2016-02-11
TWI629466B (en) 2018-07-11
WO2014196476A1 (en) 2014-12-11
CN105308441B (en) 2019-02-26
KR20190108655A (en) 2019-09-24

Similar Documents

Publication Publication Date Title
TWI629466B (en) Defect inspection system and film manufacturing apparatus
CN105247351B (en) Defect inspection system
TW201113598A (en) Method and system for continuously manufacturing liquid-crystal display element
TW200946994A (en) Method for inspecting a polarization film
KR102222973B1 (en) Defect inspection device, optical member manufacturing system, and optical display device production system
JP2009244064A5 (en)
JP2011226957A (en) Defect inspection method and defect inspection device of polarizing plate
JP7086642B2 (en) Defect inspection system, film manufacturing equipment, film manufacturing method, printing equipment and printing method
KR102241700B1 (en) Defect inspection system, and film manufacturing device
JP6204697B2 (en) Defect inspection system
KR20120129020A (en) Apparatus and method for monitoring defect in film
JP6784540B2 (en) Polarizing plate inspection method and inspection equipment
TW201522932A (en) Optical member affixed body production method
TW201514581A (en) Optical member affixed body production method
JP2014234999A (en) Defect inspection device and production system of optical display device
TWI762592B (en) Defect inspection system, film manufacturing apparatus, film manufacturing method, printing apparatus and printing method
JP7195042B2 (en) Defect information reading method, defect information reading system and film manufacturing apparatus
JP6116003B2 (en) Transport device
TWI599823B (en) Manufacturing system, manufacturing method and recording medium for optical member laminated body