WO2014196476A1 - Defect inspection system and film production apparatus - Google Patents

Defect inspection system and film production apparatus Download PDF

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Publication number
WO2014196476A1
WO2014196476A1 PCT/JP2014/064472 JP2014064472W WO2014196476A1 WO 2014196476 A1 WO2014196476 A1 WO 2014196476A1 JP 2014064472 W JP2014064472 W JP 2014064472W WO 2014196476 A1 WO2014196476 A1 WO 2014196476A1
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WO
WIPO (PCT)
Prior art keywords
film
defect inspection
defect
polarizing filter
roll
Prior art date
Application number
PCT/JP2014/064472
Other languages
French (fr)
Japanese (ja)
Inventor
圭太 井村
Original Assignee
住友化学株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 住友化学株式会社 filed Critical 住友化学株式会社
Priority to KR1020157034190A priority Critical patent/KR20160014630A/en
Priority to KR1020197027080A priority patent/KR20190108655A/en
Priority to CN201480030659.XA priority patent/CN105308441B/en
Publication of WO2014196476A1 publication Critical patent/WO2014196476A1/en

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G01N21/896Optical defects in or on transparent materials, e.g. distortion, surface flaws in conveyed flat sheet or rod
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B41/00Arrangements for controlling or monitoring lamination processes; Safety arrangements
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/8422Investigating thin films, e.g. matrix isolation method
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/8901Optical details; Scanning details
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/8914Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the material examined
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B41/00Arrangements for controlling or monitoring lamination processes; Safety arrangements
    • B32B2041/04Detecting wrong registration, misalignment, deviation, failure
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/8422Investigating thin films, e.g. matrix isolation method
    • G01N2021/8438Mutilayers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8806Specially adapted optical and illumination features
    • G01N2021/8848Polarisation of light

Definitions

  • the present invention relates to a defect inspection system and a film manufacturing apparatus.
  • This application claims priority based on Japanese Patent Application No. 2013-117947 filed on June 4, 2013, the contents of which are incorporated herein by reference.
  • a defect inspection system described in Patent Document 1 As a strip-shaped film defect inspection system, a defect inspection system described in Patent Document 1 is known.
  • the defect inspection system of Patent Document 1 includes a defect inspection device and a recording device that records defect information on a film on a film conveyance line.
  • a film manufacturing apparatus described in Patent Document 2 is known as a film manufacturing apparatus.
  • the film manufacturing apparatus of Patent Document 2 includes a bonding roll that bonds the first film and the second film to form a film, a transport line that transports the film on the downstream side of the bonding roll, and a transport line. And a defect inspection apparatus provided in the apparatus.
  • a first film and a second film are bonded together and wound into a roll to produce a film roll.
  • the inclusion of foreign substances such as bubbles may occur between the first film and the second film.
  • the defect inspection apparatus inspects for the presence or absence of foreign matter defects between the first film and the second film.
  • Defect inspection equipment is usually installed on the downstream side of the transport line. This is because if the defect inspection apparatus is provided on the downstream side of the conveyance line rather than the upstream side of the conveyance line, defects such as scratches generated on the film during conveyance can be collectively inspected. For example, the defect inspection apparatus inspects the film for defects after contacting the rolls of 10 to 20.
  • the scratch on the surface of the second film is not a problem.
  • the film can be used as a final product without problems.
  • the aspect of the present invention has been made in view of such circumstances, and an object thereof is to provide a defect inspection system and a film manufacturing apparatus capable of suppressing a false alarm defect due to detection of a scratch.
  • the defect inspection system which concerns on the 1st aspect of this invention is a defect inspection system of the strip
  • a defect inspection apparatus, and a recording apparatus that is provided in the transport line downstream of the defect inspection apparatus and records defect information on defects detected by the defect inspection apparatus on the film, and the defect inspection An apparatus is arrange
  • the defect inspection apparatus is disposed on the first film side of the film, and a light source that irradiates the film with light, and the second of the film.
  • An imaging device that is disposed on the film side and captures a transmitted light image of the film; a first polarizing filter that is disposed on an optical path between the light source and the film and that has a first absorption axis; and the imaging A second polarizing filter disposed on an optical path between the device and the film and having a second absorption axis perpendicular to the first absorption axis.
  • the first film is a polarizer
  • the defect inspection apparatus is disposed on the polarizer side of the film and irradiates the film with light.
  • a light source an imaging device disposed on the second film side of the film and capturing a transmitted light image of the film, and disposed on an optical path between the imaging device and the film, and absorbing the polarizer
  • a polarizing filter having an absorption axis orthogonal to the axis.
  • a film manufacturing apparatus includes the defect inspection system according to any one of (1) to (3) above.
  • the aspect of the present invention it is possible to provide a defect inspection system and a film manufacturing apparatus capable of suppressing a false alarm defect due to detection of a scratch.
  • FIG. 1 is a plan view of a defect inspection apparatus according to a first embodiment. It is a figure for demonstrating the defect inspection of the film by the defect inspection system which concerns on the comparative example 1. FIG. It is a figure for demonstrating the defect inspection of the film by the defect inspection system which concerns on 1st Embodiment. It is a side view which shows the manufacturing apparatus of the film which concerns on 2nd Embodiment.
  • FIG. 1 is a side view showing a film manufacturing apparatus 1 according to the first embodiment of the present invention.
  • reference numeral Sf ⁇ b> 1 is the upper surface of the film F, which is the surface on the first film F ⁇ b> 1 side.
  • Reference numeral Sf2 is a lower surface of the film F, which is a surface on the second film F2 side.
  • the transport direction of the belt-shaped film is the X direction
  • the direction orthogonal to the X direction is orthogonal to the Y direction, the X direction, and the Y direction in the plane of the film.
  • the direction is the Z direction.
  • the film manufacturing apparatus 1 inspects the presence or absence of defects in the film F, the first supply unit 7 that supplies the first film F1, the second supply unit 8 that supplies the second film F2.
  • the defect inspection system 2 to be performed, a plurality of rolls (for example, in the present embodiment, the first guide roll 10, the second guide roll 11, and the third guide roll 12) that form the transport path of the film F, and the film F are wound.
  • a take-up unit 9 for taking up.
  • the plurality of rolls forming the transport path of the film F three guide rolls of the first guide roll 10, the second guide roll 11, and the third guide roll 12 are provided. Not limited to.
  • four or more guide rolls may be provided as a plurality of rolls forming the transport path of the film F, and a nip roll or a dancer roll may be provided in addition to the guide rolls.
  • non-contact rolls such as air bars may be provided.
  • the film F is a band-shaped film having a first film F1 and a second film F2 laminated on the first film F1 in a peelable manner.
  • the film F used in the present embodiment has a structure in which, for example, one surface of the first film F1 that is a film used as a final product is covered with a second film F2 that is a separator film.
  • the first film F1 for example, a film such as a TAC (Triacetylcellulose) film, a retardation film, a brightness enhancement film, and a viewing angle widening film is used.
  • a film such as a TAC (Triacetylcellulose) film, a retardation film, a brightness enhancement film, and a viewing angle widening film is used.
  • the second film F2 for example, an adhesive film with a release film is used.
  • the film F may be a laminate of a plurality of optical films such as a retardation film and a brightness enhancement film on the other surface of the first film F1.
  • the entire second film F2 is not peeled from the first film F1.
  • a part (release film) of the second film F2 of the film F is peeled off, and the peeled film (first film F1 and adhesive material) is bonded to a panel or the like from the adhesive material side. . That is, after a part of the second film F2 is peeled off, the remaining part (adhesive material) of the second film F2 is disposed on one surface of the first film F1.
  • the 1st supply part 7 draws out the 1st film F1 along the longitudinal direction of the 1st film F1 while hold
  • the 1st supply part 7 is arrange
  • the second supply unit 8 holds the original roll R2 around which the belt-like second film F2 is wound, and feeds the second film F2 along the longitudinal direction of the second film F2.
  • the second supply unit 8 is disposed on the other side (the ⁇ Z direction side shown in FIG. 1) of the supply path of the film F.
  • the arrangement configuration of the first supply unit 7 and the second supply unit 8 is not limited to this.
  • the first supply unit 7 is disposed on the other side of the supply path of the film F (the ⁇ Z direction side shown in FIG. 1)
  • the second supply unit 8 is disposed on one side of the supply path of the film F (see FIG. 1). (+ Z direction side shown).
  • the film F is bonded on the downstream side of the bonding roll 3 and the bonding roll 3 in which two films of the first film F ⁇ b> 1 and the second film F ⁇ b> 2 are bonded to form one film F.
  • a conveyance line 4 to be conveyed, a defect inspection device 5 provided in the conveyance line 4, and a recording device 6 provided in the conveyance line 4 on the downstream side of the defect inspection device 5 are provided.
  • the pasting roll 3 has a pair of nip rolls 3a and 3b that are arranged with their axial directions parallel to each other.
  • a predetermined gap is formed between the pair of nip rolls 3a and 3b, and the inside of the gap is a bonding position between the first film F1 and the second film F2.
  • the first film F1 and the second film F2 are overlapped and introduced into the gap.
  • the first film F1 and the second film F2 are sent downstream while being pressed by the nip rolls 3a and 3b. Thereby, the 2nd film F2 is bonded by one side of the 1st film F1.
  • the 1st film F1 and the 2nd film F2 are bonded by the bonding roll 3, and the one film F is formed.
  • the film F is conveyed toward the defect inspection apparatus 5.
  • the defect inspection apparatus 5 includes a light source 20 disposed on the first film F1 side of the film F (+ Z direction side shown in FIG. 1), and a second film F2 side of the film F ( ⁇ Z direction side shown in FIG. 1). ), The first polarizing filter 21 arranged on the optical path between the light source 20 and the film F, and the second arranged on the optical path between the imaging apparatus 22 and the film F. And a polarizing filter 23.
  • the defect inspection apparatus 5 is arrange
  • FIG. The defect inspection apparatus 5 according to the present embodiment is disposed on the transport line 4 on the downstream side of the bonding roll 3 and on the upstream side of the first guide roll 10.
  • the 1st guide roll 10 is a roll which contact
  • the center of the light exit surface 20a of the light source 20 and the center of the light receiving surface 22a of the imaging device 22 are arranged coaxially (on the optical axis CL).
  • FIG. 2 is a diagram for explaining the positional relationship between the first absorption axis V1 of the first polarizing filter 21 and the second absorption axis V2 of the second polarizing filter 23.
  • FIG. 2 is a diagram for explaining the positional relationship between the first absorption axis V1 of the first polarizing filter 21 and the second absorption axis V2 of the second polarizing filter 23.
  • the first polarizing filter 21 has a first absorption axis V1.
  • the second polarizing filter 23 has a second absorption axis V2 that is orthogonal to the first absorption axis V1.
  • the first absorption axis V 1 of the first polarizing filter 21 and the second absorption axis V 2 of the second polarizing filter 23 are orthogonal to each other on the optical path between the light source 20 and the imaging device 22. Is arranged (crossed Nicols arrangement).
  • the film F (see FIG. 1) is a film that does not give a phase difference to the light transmitted through the first polarizing filter 21. Therefore, when the first absorption axis V1 of the first polarizing filter 21 and the second absorption axis V2 of the second polarizing filter 23 are arranged in a crossed Nicols arrangement, the overlapping portion of the first polarizing filter 21 and the second polarizing filter 23 In SV, light is not transmitted. Therefore, when the overlapping portion SV is imaged by the imaging device 22, the dark field is not displayed unless anything that disturbs the polarization state such as a defect having a phase difference is disposed between the first polarizing filter 21 and the second polarizing filter 23. appear.
  • the film F is a film that gives a phase difference to the light transmitted through the first polarizing filter 21
  • a phase compensation film that cancels the phase difference is used as the first polarizing filter 21 and the second polarizing filter 21.
  • the transmission axis of the first polarizing filter 21 and the transmission axis of the second polarizing filter 23 are arranged at an angle deviated from 90 ° by a predetermined angle, and there is no defect such as a foreign substance defect.
  • the received light intensity in the imaging device 22 may be minimized (dark field).
  • FIG. 3 is a plan view of the defect inspection apparatus 5.
  • the film F is shown for convenience.
  • the light emission surface 20a of the light source 20 constituting the defect inspection apparatus 5 is a rectangle and has a length along the Y direction.
  • the light exit surface 20 a of the light source 20 has a length along the width direction orthogonal to the transport direction of the film F.
  • the light emission surface 20 a of the light source 20 is formed across the width direction with respect to the film F.
  • an LED line light source can be used as the light source 20.
  • the first polarizing filter 21 is disposed so as to overlap the outer peripheral portion of the light exit surface 20a of the light source 20.
  • the first polarizing filter 21 has a length along the Y direction, similarly to the light exit surface 20 a of the light source 20.
  • the first polarizing filter 21 is longer than the light exit surface 20a of the light source 20 in each of the X direction and the Y direction.
  • the imaging device 22 also has a longitudinal direction along the Y direction, similarly to the light exit surface 20a of the light source 20.
  • a line camera can be used as the imaging device 22.
  • the second polarizing filter 23 is disposed so as to overlap with the outer periphery of the light receiving surface 22a of the imaging device 22. Similar to the light receiving surface 22a of the imaging device 22, the second polarizing filter 23 has a length along the Y direction. The second polarizing filter 23 is longer than the light receiving surface 22a of the imaging device 22 in each of the X direction and the Y direction.
  • the recording device 6 is provided in the transport line 4 on the downstream side of the third guide roll 12.
  • the recording device 6 records defect information related to the defect detected by the defect inspection device 5 on the film F (for example, the first film F1 in the present embodiment).
  • the defect information includes information on the position and type of the defect.
  • the recording device 6 records, for example, defect information in the width direction end of the first film F1 in the form of an identification code (one-dimensional barcode, two-dimensional barcode, QR code (registered trademark), etc.).
  • an identification code for example, information indicating how far the defect detected by the defect inspection apparatus 5 exists at a position along the film width direction from the position where the barcode is attached (defects). Location information).
  • the identification code may include information regarding the type of detected defect.
  • the recording device 6 directly displays the position of the defect on the first film F1 by attaching a dot-shaped, line-shaped or frame-shaped mark that includes the defect to the defective portion of the first film F1. (Marking) may be used. At this time, information on the type of defect may be recorded by attaching a symbol or pattern indicating the type of defect together with the mark to the defective part.
  • the film F on which the defect information is recorded by the recording device 6 is conveyed toward the winding unit 9. And it winds up in roll shape in the winding-up part 9, and the roll original fabric R of the film F is manufactured.
  • the defect inspection apparatus is usually provided on the downstream side of the transport line. This is because if the defect inspection apparatus is provided on the downstream side of the conveyance line rather than the upstream side of the conveyance line, defects such as scratches generated on the film during conveyance can be collectively inspected. For example, the defect inspection apparatus inspects the film for defects after contacting the rolls of 10 to 20.
  • the scratch on the surface of the second film is not a problem.
  • the film can be used as a final product without problems.
  • the defect inspection system 2 is a defect inspection system for a strip-shaped film F having a first film F1 and a second film F2 that is detachably laminated on the first film F1. And the 1st film F1 and the 2nd film F2 are bonded, the bonding roll 3 which forms the film F, the conveyance line 4 in which the film F is conveyed in the downstream of the bonding roll 3, and the conveyance line 4 A defect inspection apparatus 5 provided on the recording line, and a recording apparatus 6 provided on the transport line 4 on the downstream side of the defect inspection apparatus 5 for recording defect information relating to defects detected by the defect inspection apparatus 5 on the film F.
  • the defect inspection apparatus 5 other than the bonding roll 3 is upstream of the roll (first guide roll 10) that first contacts the surface Sf2 opposite to the first film F1 of the second film F2. Characterized in that it is arranged to feed lines 4.
  • the defect inspection system 2 according to the first embodiment of the present invention is a defect of the strip-shaped film F having the first film F1 and the second film F2 that is detachably laminated on the first film F1.
  • the laminating roll 3 which bonds the 1st film F1 and the 2nd film F2 and forms the film F
  • FIG. 4 is a diagram for explaining defect inspection of the film F by the defect inspection system according to Comparative Example 1.
  • the defect inspection apparatus 5 is a roll that is in contact with the surface Sf2 on the opposite side of the first film F1 of the second film F2 other than the bonding roll 3 (for example, a plurality of guide rolls). Of these, it is disposed on the transport line 4 on the downstream side of the guide roll that comes into contact with the surface Sf2 last.
  • FIG. 4 shows that a defect E1 is present in the film F due to entrapment of bubbles or the like when the first film F1 and the second film F2 are bonded together, and the second film F2 is being conveyed. It is a figure in case the crack E2 has arisen on the surface of the 2nd film F2 by the friction with a guide roll.
  • the light L1 emitted from the light source 20 toward the film F is converted into linearly polarized light L2 by the first polarizing filter 21.
  • the linearly polarized light L2 obtained by the first polarizing filter 21 is incident on the first film F1.
  • the polarization state of the linearly polarized light L2 is disturbed by the defect E1 existing between the first film F1 and the second film F2, and a part of the light (light L3) whose polarization state is disturbed is the second polarizing filter 23. Transparent.
  • the polarization state of the linearly polarized light L2 is also disturbed by the scratch E2 present on the surface of the second film F2, and a part of the light whose polarization state is disturbed (light L4) passes through the second polarizing filter 23.
  • the light L3 and the light L4 that have passed through the second polarizing filter 23 enter the imaging device 22, and the imaging device 22 captures bright images of the defect E1 and the scratch E2 as bright spots.
  • the light L4 transmitted through the second polarizing filter 23 Is incident on the image pickup device 22 and the image pickup device 22 picks up the flaw E2 brightly as a bright spot.
  • FIG. 5 is a view for explaining defect inspection of the film F by the defect inspection system 2 according to the present embodiment.
  • the defect inspection device 5 is a roll that first contacts the surface Sf2 opposite to the first film F1 of the second film F2 other than the bonding roll 3 (for example, the present embodiment). In the form, it is arranged in the transport line 4 upstream of the first guide roll 10).
  • FIG. 5 is a diagram in the case where a defect E1 is present in the film F due to entrapment of bubbles or the like when the first film F1 and the second film F2 are bonded.
  • the defect of the film F is inspected before the second film F2 is scratched, the surface of the second film F2 is not scratched.
  • the light L ⁇ b> 1 emitted from the light source 20 toward the film F is converted into linearly polarized light L ⁇ b> 2 by the first polarizing filter 21.
  • the linearly polarized light L2 obtained by the first polarizing filter 21 is incident on the first film F1.
  • the polarization state of the linearly polarized light L2 is disturbed by the defect E1 existing between the first film F1 and the second film F2, and a part of the light (light L3) whose polarization state is disturbed is the second polarizing filter 23. Transparent.
  • the light L3 transmitted through the second polarizing filter 23 enters the image pickup device 22, and the image pickup device 22 picks up the defect E1 brightly as a bright spot.
  • the linearly polarized light L2 cannot pass through the second polarizing filter 23.
  • the imaging device 22 captures a black image.
  • the surface of the second film F2 is not scratched, the surface of the second film F2 is not erroneously detected as a defect.
  • the defect inspection device 5 is a roll that first contacts the surface Sf2 opposite to the first film F1 of the second film F2 other than the bonding roll 3 (for example, a book)
  • the film F is inspected for defects before being scratched on the second film F2 because it is disposed on the transport line 4 upstream of the first guide roll 10). That is, since the friction between the second film F2 and the guide roll does not occur during the conveyance of the film F, the surface of the second film F2 is not scratched. Therefore, it is possible to suppress the false alarm defect (defect detection as the false alarm) due to the detection of the scratch.
  • FIG. 6 is a side view showing a film manufacturing apparatus 101 according to the second embodiment of the present invention.
  • the first film F ⁇ b> 1 a is a polarizer
  • the defect inspection apparatus 105 includes a light source 20 disposed on the polarizer F ⁇ b> 1 a side of the film Fa.
  • the image pickup device 22 disposed on the second film F2 side of the film Fa and the polarizing filter 123 disposed on the optical path between the image pickup device 22 and the film Fa are provided.
  • the same components as those in the first embodiment are denoted by the same reference numerals, and detailed description thereof is omitted.
  • the film Fa is a belt-like film having a polarizer F1a and a second film F2 laminated on the polarizer F1a so as to be peelable.
  • the film F used in this embodiment has a structure in which, for example, one surface of a polarizer F1a made of PVA (polyvinyl alcohol) or the like is covered with a second film F2 that is a separator film.
  • the film Fa may be obtained by laminating a plurality of optical films such as a retardation film and a brightness enhancement film on the other surface of the polarizer F1a.
  • the film Fa is a film that does not give a phase difference to the light transmitted through the polarizer F1a, but the film Fa gives a phase difference to the light transmitted through the polarizer F1a.
  • a phase compensation film that cancels out the phase difference may be disposed between the film Fa and the polarizing filter 123.
  • the imaging device 22 is disposed in a state where the transmission axis of the polarizer F1a and the transmission axis of the polarizing filter 123 are shifted by a predetermined angle from 90 ° and there is no defect such as a foreign object defect.
  • the received light intensity at may be minimized (dark field).
  • the defect inspection apparatus 105 is arrange
  • the defect inspection apparatus 105 according to this embodiment is disposed on the conveyance line 4 on the downstream side of the bonding roll 3 and on the upstream side of the first guide roll 10.
  • FIG. 7 is a diagram for explaining the positional relationship between the absorption axis Va of the polarizer F1a and the absorption axis V of the polarizing filter 123.
  • FIG. 7 is a diagram for explaining the positional relationship between the absorption axis Va of the polarizer F1a and the absorption axis V of the polarizing filter 123.
  • the polarizer F1a has an absorption axis Va.
  • the polarizing filter 123 has an absorption axis V orthogonal to the absorption axis Va.
  • the absorption axis Va of the polarizer F1a and the absorption axis V of the polarizing filter 123 are arranged orthogonal to each other (crossed Nicols arrangement) on the optical path between the light source 20 and the imaging device 22.
  • FIG. 8 is a diagram for explaining defect inspection of the film Fa by the defect inspection system according to the comparative example 2.
  • the defect inspection apparatus 105 is a roll that is in contact with the surface Sf2 opposite to the polarizer F1a of the second film F2 other than the bonding roll 3 (for example, among a plurality of guide rolls) It is disposed on the transport line 4 on the downstream side of the guide roll that comes into contact with the surface Sf2 last.
  • FIG. 8 shows that a defect E1 is present in the film Fa due to entrapment of bubbles or the like when the polarizer F1a and the second film F2 are bonded together, and the second film F2 is being transported while the film Fa is being conveyed. It is a figure in case the crack E2 has arisen on the surface of the 2nd film F2 by friction with a guide roll.
  • the light L1 emitted from the light source 20 toward the film Fa is converted into linearly polarized light L2 by the polarizer F1a.
  • the linearly polarized light L2 obtained by the polarizer F1a is incident on the second film F2.
  • the polarization state of the linearly polarized light L2 is disturbed by the defect E1 existing between the polarizer F1a and the second film F2, and a part of the light whose polarization state is disturbed (light L3) passes through the polarizing filter 123. .
  • the polarization state of the linearly polarized light L2 is also disturbed by the scratch E2 existing on the surface of the second film F2, and a part of the light (light L4) whose polarization state is disturbed is transmitted through the polarizing filter 123.
  • the light L3 and the light L4 that have been transmitted through the polarizing filter 123 enter the imaging device 22, and the defect E1 and the scratch E2 are brightly imaged as bright spots by the imaging device 22.
  • the light L4 transmitted through the polarizing filter 123 is captured by the imaging device. 22 and the image pick-up device 22 picks up the flaw E2 brightly as a bright spot.
  • FIG. 9 is a view for explaining defect inspection of the film Fa by the defect inspection system 102 according to the present embodiment.
  • the defect inspection apparatus 105 is a roll that first contacts the surface Sf2 opposite to the polarizer F1a of the second film F2 other than the bonding roll 3 (for example, the present embodiment). Then, it is arrange
  • FIG. 9 is a diagram in the case where a defect E1 is present in the film Fa due to the entrapment of bubbles or the like when the polarizer F1a and the second film F2 are bonded.
  • the defect of the film Fa is inspected before the second film F2 is scratched, the surface of the second film F2 is not scratched.
  • the light L1 emitted from the light source 20 toward the film Fa is converted into linearly polarized light L2 by the polarizer F1a.
  • the linearly polarized light L2 obtained by the polarizer F1a is incident on the second film F2.
  • the polarization state of the linearly polarized light L2 is disturbed by the defect E1 existing between the polarizer F1a and the second film F2, and a part of the light whose polarization state is disturbed (light L3) passes through the polarizing filter 123. .
  • the light L3 that has passed through the polarizing filter 123 enters the image pickup device 22, and the image pickup device 22 picks up the defect E1 brightly as a bright spot.
  • the surface of the second film F2 is not scratched, the surface of the second film F2 is not erroneously detected as a defect.
  • the defect inspection apparatus 105 is a roll that first contacts the surface Sf2 opposite to the polarizer F1a of the second film F2 other than the bonding roll 3 (for example, the present embodiment).
  • the film Fa is disposed on the transport line 4 upstream of the first guide roll 10), so the film Fa is inspected for defects before the second film F2 is scratched. That is, since the friction between the second film F2 and the guide roll does not occur during the conveyance of the film Fa, the surface of the second film F2 is not scratched. Accordingly, it is possible to suppress false alarm defects due to detection of scratches.
  • SYMBOLS 1 ... Film manufacturing apparatus, 2,102 ... Defect inspection system, 3 ... Bonding roll, 4 ... Conveyance line, 5,105 ... Defect inspection apparatus, 6 ... Recording apparatus, 10 ... 1st guide roll (of 2nd film) First roll in contact with the surface opposite to the first film), 20 ... light source, 21 ... first polarizing filter, 22 ... imaging device, 23 ... second polarizing filter, 123 ... polarizing filter, F ... film, F1 ...
  • F1a Polarizer
  • F2 Second film
  • Sf2 Surface of the second film opposite to the first film
  • V1 First absorption axis
  • V2 Second absorption axis
  • Va Polarized light Absorption axis of child
  • V Absorption axis of polarizing filter.

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Abstract

This defect inspection system includes: lamination rolls for laminating a first film and a second film to form a film; a transport line to the downstream side from the lamination rolls, for transporting the film; a defect inspection apparatus situated on the transport line; and a recording apparatus situated on the transport line to the downstream side from the defect inspection apparatus, for recording onto the film defect information relating to defects detected by the defect inspection apparatus. The defect inspection apparatus is located on the transport line to the upstream side from the roll that, apart from the lamination rolls, initially contacts the second film on the surface on the opposite side from the first film.

Description

欠陥検査システム及びフィルムの製造装置Defect inspection system and film manufacturing apparatus
 本発明は、欠陥検査システム及びフィルムの製造装置に関する。
 本願は、2013年6月4日に出願された日本国特許出願2013-117947号に基づき優先権を主張し、その内容をここに援用する。
The present invention relates to a defect inspection system and a film manufacturing apparatus.
This application claims priority based on Japanese Patent Application No. 2013-117947 filed on June 4, 2013, the contents of which are incorporated herein by reference.
 帯状のフィルムの欠陥検査システムとして、特許文献1に記載の欠陥検査システムが知られている。特許文献1の欠陥検査システムは、フィルムの搬送ライン上に、欠陥検査装置と、欠陥情報をフィルムに記録する記録装置と、を備えている。
 一方、フィルムの製造装置として、特許文献2に記載のフィルムの製造装置が知られている。特許文献2のフィルムの製造装置は、第1フィルムと第2フィルムとを貼合してフィルムを形成する貼合ロールと、貼合ロールの下流側においてフィルムが搬送される搬送ラインと、搬送ラインに設けられた欠陥検査装置と、を備えている。
As a strip-shaped film defect inspection system, a defect inspection system described in Patent Document 1 is known. The defect inspection system of Patent Document 1 includes a defect inspection device and a recording device that records defect information on a film on a film conveyance line.
On the other hand, a film manufacturing apparatus described in Patent Document 2 is known as a film manufacturing apparatus. The film manufacturing apparatus of Patent Document 2 includes a bonding roll that bonds the first film and the second film to form a film, a transport line that transports the film on the downstream side of the bonding roll, and a transport line. And a defect inspection apparatus provided in the apparatus.
 例えば、フィルムの製造ラインでは、第1フィルムと第2フィルムとを貼合し、ロール状に巻き取ってフィルムの原反ロールを製造する。第1フィルムと第2フィルムとを貼合する際には、第1フィルムと第2フィルムとの間に気泡等の噛み込み異物の混入が生じることがある。欠陥検査装置は、第1フィルムと第2フィルムとの間の異物欠陥等の有無を検査する。 For example, in a film production line, a first film and a second film are bonded together and wound into a roll to produce a film roll. When laminating the first film and the second film, the inclusion of foreign substances such as bubbles may occur between the first film and the second film. The defect inspection apparatus inspects for the presence or absence of foreign matter defects between the first film and the second film.
日本国特開2011-7779号公報Japanese Unexamined Patent Publication No. 2011-7779 日本国特開2008-49604号公報Japanese Unexamined Patent Publication No. 2008-49604
 欠陥検査装置は、通常、搬送ラインの下流側に設けられる。欠陥検査装置を搬送ラインの上流側に設けるよりも搬送ラインの下流側に設けたほうが、搬送中にフィルムに生じるキズ等の欠陥をまとめて検査することができるからである。例えば、欠陥検査装置は、フィルムが10~20のロールに接した後に、フィルムの欠陥の有無を検査する。 Defect inspection equipment is usually installed on the downstream side of the transport line. This is because if the defect inspection apparatus is provided on the downstream side of the conveyance line rather than the upstream side of the conveyance line, defects such as scratches generated on the film during conveyance can be collectively inspected. For example, the defect inspection apparatus inspects the film for defects after contacting the rolls of 10 to 20.
 一方、最終製品において第2フィルムが第1フィルムから剥離される場合には、第2フィルムの表面のキズは問題とはならない。例えば、第2フィルムの表面にキズが生じていても、第1フィルムと第2フィルムとの間に異物欠陥等が存在しない場合には、フィルムを最終製品として問題無く使用することができる。 On the other hand, when the second film is peeled from the first film in the final product, the scratch on the surface of the second film is not a problem. For example, even if the surface of the second film is scratched, if there is no foreign matter defect between the first film and the second film, the film can be used as a final product without problems.
 しかしながら、フィルムの搬送中に第2フィルムの表面にキズが生じていると、本来問題とはならない第2フィルムの表面のキズが欠陥として誤検出される場合がある。この場合、最終製品として使用可能なフィルムが欠陥品として認識されてしまう。 However, if there is a scratch on the surface of the second film while the film is being transported, a scratch on the surface of the second film that is not a problem may be erroneously detected as a defect. In this case, a film that can be used as a final product is recognized as a defective product.
 本発明の態様はこのような事情に鑑みてなされたものであって、キズの検出による虚報欠陥を抑制することが可能な欠陥検査システム及びフィルムの製造装置を提供することを目的とする。 The aspect of the present invention has been made in view of such circumstances, and an object thereof is to provide a defect inspection system and a film manufacturing apparatus capable of suppressing a false alarm defect due to detection of a scratch.
 上記の目的を達成するために、本発明の態様に係る欠陥検査システム及びフィルムの製造装置は以下の構成を採用した。
 (1)本発明の第一の態様に係る欠陥検査システムは、第1フィルムと、前記第1フィルムに剥離可能に積層された第2フィルムと、を有する帯状のフィルムの欠陥検査システムであって、前記第1フィルムと前記第2フィルムとを貼合して前記フィルムを形成する貼合ロールと、前記貼合ロールの下流側において前記フィルムが搬送される搬送ラインと、前記搬送ラインに設けられた欠陥検査装置と、前記欠陥検査装置よりも下流側の前記搬送ラインに設けられ、前記欠陥検査装置によって検出された欠陥に関する欠陥情報を前記フィルムに記録する記録装置と、を含み、前記欠陥検査装置は、前記貼合ロール以外で、前記第2フィルムの前記第1フィルムとは反対側の面に最初に接するロールよりも上流側の前記搬送ラインに配置されている。
In order to achieve the above object, the defect inspection system and the film manufacturing apparatus according to aspects of the present invention employ the following configurations.
(1) The defect inspection system which concerns on the 1st aspect of this invention is a defect inspection system of the strip | belt-shaped film which has a 1st film and the 2nd film laminated | stacked on the said 1st film so that peeling was possible. , A bonding roll for bonding the first film and the second film to form the film, a conveyance line for conveying the film on the downstream side of the bonding roll, and a conveyance line. A defect inspection apparatus, and a recording apparatus that is provided in the transport line downstream of the defect inspection apparatus and records defect information on defects detected by the defect inspection apparatus on the film, and the defect inspection An apparatus is arrange | positioned at the said conveyance line of an upstream rather than the roll which touches the surface on the opposite side to the said 1st film of the said 2nd film except the said bonding roll. That.
 (2)上記(1)に記載の欠陥検査システムでは、前記欠陥検査装置は、前記フィルムの前記第1フィルムの側に配置され、前記フィルムに光を照射する光源と、前記フィルムの前記第2フィルムの側に配置され、前記フィルムの透過光像を撮像する撮像装置と、前記光源と前記フィルムとの間の光路上に配置され、第1の吸収軸を有する第1偏光フィルターと、前記撮像装置と前記フィルムとの間の光路上に配置され、前記第1の吸収軸と直交する第2の吸収軸を有する第2偏光フィルターと、を含んでいてもよい。 (2) In the defect inspection system according to (1), the defect inspection apparatus is disposed on the first film side of the film, and a light source that irradiates the film with light, and the second of the film. An imaging device that is disposed on the film side and captures a transmitted light image of the film; a first polarizing filter that is disposed on an optical path between the light source and the film and that has a first absorption axis; and the imaging A second polarizing filter disposed on an optical path between the device and the film and having a second absorption axis perpendicular to the first absorption axis.
 (3)上記(1)に記載の欠陥検査システムでは、前記第1フィルムは偏光子であり、前記欠陥検査装置は、前記フィルムの前記偏光子の側に配置され、前記フィルムに光を照射する光源と、前記フィルムの前記第2フィルムの側に配置され、前記フィルムの透過光像を撮像する撮像装置と、前記撮像装置と前記フィルムとの間の光路上に配置され、前記偏光子の吸収軸と直交する吸収軸を有する偏光フィルターと、を含んでいてもよい。 (3) In the defect inspection system according to (1), the first film is a polarizer, and the defect inspection apparatus is disposed on the polarizer side of the film and irradiates the film with light. A light source, an imaging device disposed on the second film side of the film and capturing a transmitted light image of the film, and disposed on an optical path between the imaging device and the film, and absorbing the polarizer And a polarizing filter having an absorption axis orthogonal to the axis.
 (4)本発明の第二の態様に係るフィルムの製造装置は、上記(1)から(3)までのいずれか一項に記載の欠陥検査システムを含む。 (4) A film manufacturing apparatus according to the second aspect of the present invention includes the defect inspection system according to any one of (1) to (3) above.
 本発明の態様によれば、キズの検出による虚報欠陥を抑制することが可能な欠陥検査システム及びフィルムの製造装置を提供することができる。 According to the aspect of the present invention, it is possible to provide a defect inspection system and a film manufacturing apparatus capable of suppressing a false alarm defect due to detection of a scratch.
第1実施形態に係るフィルムの製造装置を示す側面図である。It is a side view which shows the manufacturing apparatus of the film which concerns on 1st Embodiment. 第1偏光フィルターの第1の吸収軸と第2偏光フィルターの第2の吸収軸との配置関係を説明するための図である。It is a figure for demonstrating the arrangement | positioning relationship between the 1st absorption axis of a 1st polarizing filter, and the 2nd absorption axis of a 2nd polarizing filter. 第1実施形態に係る欠陥検査装置の平面図である。1 is a plan view of a defect inspection apparatus according to a first embodiment. 比較例1に係る欠陥検査システムによるフィルムの欠陥検査を説明するための図である。It is a figure for demonstrating the defect inspection of the film by the defect inspection system which concerns on the comparative example 1. FIG. 第1実施形態に係る欠陥検査システムによるフィルムの欠陥検査を説明するための図である。It is a figure for demonstrating the defect inspection of the film by the defect inspection system which concerns on 1st Embodiment. 第2実施形態に係るフィルムの製造装置を示す側面図である。It is a side view which shows the manufacturing apparatus of the film which concerns on 2nd Embodiment. 偏光子の吸収軸と偏光フィルターの吸収軸との配置関係を説明するための図である。It is a figure for demonstrating the arrangement | positioning relationship between the absorption axis of a polarizer, and the absorption axis of a polarizing filter. 比較例2に係る欠陥検査システムによるフィルムの欠陥検査を説明するための図である。It is a figure for demonstrating the defect inspection of the film by the defect inspection system which concerns on the comparative example 2. FIG. 第2実施形態に係る欠陥検査システムによるフィルムの欠陥検査を説明するための図である。It is a figure for demonstrating the defect inspection of the film by the defect inspection system which concerns on 2nd Embodiment.
 以下、図面を参照しつつ本発明の実施形態を説明するが、本発明は以下の実施形態に限定されるものではない。 Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited to the following embodiments.
 尚、以下の全ての図面においては、図面を見やすくするため、各構成要素の寸法や比率などは適宜異ならせてある。また、以下の説明及び図面中、同一又は相当する要素には同一の符号を付し、重複する説明は省略する。 In all of the following drawings, the dimensions and ratios of the constituent elements are appropriately changed in order to make the drawings easy to see. In the following description and drawings, the same or corresponding elements are denoted by the same reference numerals, and redundant description is omitted.
(第1実施形態)
 図1は、本発明の第1実施形態に係るフィルムの製造装置1を示す側面図である。図1において、符号Sf1はフィルムFの上面であり、第1フィルムF1側の面である。符号Sf2はフィルムFの下面であり、第2フィルムF2側の面である。
(First embodiment)
FIG. 1 is a side view showing a film manufacturing apparatus 1 according to the first embodiment of the present invention. In FIG. 1, reference numeral Sf <b> 1 is the upper surface of the film F, which is the surface on the first film F <b> 1 side. Reference numeral Sf2 is a lower surface of the film F, which is a surface on the second film F2 side.
 以下の説明においては、必要に応じてXYZ直交座標系を設定し、このXYZ直交座標系を参照しつつ各部材の位置関係について説明する。本実施形態においては、帯状のフィルムの搬送方向をX方向としており、フィルムの面内においてX方向に直交する方向(長尺のフィルムの幅方向)をY方向、X方向及びY方向に直交する方向をZ方向としている。 In the following description, an XYZ orthogonal coordinate system is set as necessary, and the positional relationship of each member will be described with reference to this XYZ orthogonal coordinate system. In the present embodiment, the transport direction of the belt-shaped film is the X direction, and the direction orthogonal to the X direction (the width direction of the long film) is orthogonal to the Y direction, the X direction, and the Y direction in the plane of the film. The direction is the Z direction.
 図1に示すように、フィルムの製造装置1は、第1フィルムF1を供給する第1供給部7と、第2フィルムF2を供給する第2供給部8と、フィルムFの欠陥の有無を検査する欠陥検査システム2と、フィルムFの搬送経路を形成する複数のロール(例えば、本実施形態では、第1ガイドロール10、第2ガイドロール11及び第3ガイドロール12)と、フィルムFを巻き取る巻き取り部9と、を備えている。 As shown in FIG. 1, the film manufacturing apparatus 1 inspects the presence or absence of defects in the film F, the first supply unit 7 that supplies the first film F1, the second supply unit 8 that supplies the second film F2. The defect inspection system 2 to be performed, a plurality of rolls (for example, in the present embodiment, the first guide roll 10, the second guide roll 11, and the third guide roll 12) that form the transport path of the film F, and the film F are wound. A take-up unit 9 for taking up.
 尚、本実施形態では、フィルムFの搬送経路を形成する複数のロールとして、第1ガイドロール10、第2ガイドロール11及び第3ガイドロール12の3つのガイドロールが設けられているが、これに限らない。例えば、フィルムFの搬送経路を形成する複数のロールとして、4つ以上のガイドロールが設けられていてもよいし、ガイドロールの他にもニップロールやダンサロールが設けられていてもよい。また、このような接触ロール以外に、エアーバー等の非接触ロールが設けられていてもよい。 In the present embodiment, as the plurality of rolls forming the transport path of the film F, three guide rolls of the first guide roll 10, the second guide roll 11, and the third guide roll 12 are provided. Not limited to. For example, four or more guide rolls may be provided as a plurality of rolls forming the transport path of the film F, and a nip roll or a dancer roll may be provided in addition to the guide rolls. In addition to such contact rolls, non-contact rolls such as air bars may be provided.
 フィルムFは、第1フィルムF1と、第1フィルムF1に剥離可能に積層された第2フィルムF2と、を有する帯状のフィルムである。本実施形態で使用されるフィルムFは、例えば、最終製品として使用されるフィルムである第1フィルムF1の一方の面が、セパレータフィルムである第2フィルムF2によって覆われた構造である。 The film F is a band-shaped film having a first film F1 and a second film F2 laminated on the first film F1 in a peelable manner. The film F used in the present embodiment has a structure in which, for example, one surface of the first film F1 that is a film used as a final product is covered with a second film F2 that is a separator film.
 第1フィルムF1としては、例えば、TAC(Triacetylcellulose)フィルム、位相差フィルム、輝度向上フィルム、視野角拡大フィルムなどのフィルムが用いられる。第2フィルムF2としては、例えば、離型フィルム付き粘着材フィルムが用いられる。
 尚、フィルムFは、第1フィルムF1の他方の面に、位相差フィルムや輝度向上フィルム等の複数の光学フィルムを積層したものでもよい。
As the first film F1, for example, a film such as a TAC (Triacetylcellulose) film, a retardation film, a brightness enhancement film, and a viewing angle widening film is used. As the second film F2, for example, an adhesive film with a release film is used.
The film F may be a laminate of a plurality of optical films such as a retardation film and a brightness enhancement film on the other surface of the first film F1.
 また、フィルムFにおいて第2フィルムF2を第1フィルムF1から剥離する場合には、第2フィルムF2全体を第1フィルムF1から剥離するのではない。例えば、フィルムFのうちの第2フィルムF2の一部(離型フィルム)を剥離して、剥離後のフィルム(第1フィルムF1及び粘着材)が粘着材の側からパネル等に貼合される。すなわち、第2フィルムF2の一部を剥離した後、第1フィルムF1の一面には第2フィルムF2の残りの部分(粘着材)が配置されている。 Further, when the second film F2 is peeled from the first film F1 in the film F, the entire second film F2 is not peeled from the first film F1. For example, a part (release film) of the second film F2 of the film F is peeled off, and the peeled film (first film F1 and adhesive material) is bonded to a panel or the like from the adhesive material side. . That is, after a part of the second film F2 is peeled off, the remaining part (adhesive material) of the second film F2 is disposed on one surface of the first film F1.
 第1供給部7は、帯状の第1フィルムF1を巻回した原反ロールR1を保持すると共に第1フィルムF1を第1フィルムF1の長手方向に沿って繰り出す。第1供給部7は、フィルムFの供給経路の一方側(図1に示す+Z方向側)に配置されている。 The 1st supply part 7 draws out the 1st film F1 along the longitudinal direction of the 1st film F1 while hold | maintaining the original fabric roll R1 which wound the strip | belt-shaped 1st film F1. The 1st supply part 7 is arrange | positioned at the one side (+ Z direction side shown in FIG. 1) of the supply path | route of the film F. As shown in FIG.
 第2供給部8は、帯状の第2フィルムF2を巻回した原反ロールR2を保持すると共に第2フィルムF2を第2フィルムF2の長手方向に沿って繰り出す。第2供給部8は、フィルムFの供給経路の他方側(図1に示す-Z方向側)に配置されている。 The second supply unit 8 holds the original roll R2 around which the belt-like second film F2 is wound, and feeds the second film F2 along the longitudinal direction of the second film F2. The second supply unit 8 is disposed on the other side (the −Z direction side shown in FIG. 1) of the supply path of the film F.
 尚、第1供給部7及び第2供給部8の配置構成は、これに限らない。例えば、第1供給部7がフィルムFの供給経路の他方側(図1に示す-Z方向側)に配置され、且つ、第2供給部8がフィルムFの供給経路の一方側(図1に示す+Z方向側)に配置されていてもよい。 The arrangement configuration of the first supply unit 7 and the second supply unit 8 is not limited to this. For example, the first supply unit 7 is disposed on the other side of the supply path of the film F (the −Z direction side shown in FIG. 1), and the second supply unit 8 is disposed on one side of the supply path of the film F (see FIG. 1). (+ Z direction side shown).
 欠陥検査システム2は、第1フィルムF1及び第2フィルムF2の2枚のフィルムを貼合して1枚のフィルムFを形成する貼合ロール3と、貼合ロール3の下流側においてフィルムFが搬送される搬送ライン4と、搬送ライン4に設けられた欠陥検査装置5と、欠陥検査装置5よりも下流側の搬送ライン4に設けられた記録装置6と、を備えている。 In the defect inspection system 2, the film F is bonded on the downstream side of the bonding roll 3 and the bonding roll 3 in which two films of the first film F <b> 1 and the second film F <b> 2 are bonded to form one film F. A conveyance line 4 to be conveyed, a defect inspection device 5 provided in the conveyance line 4, and a recording device 6 provided in the conveyance line 4 on the downstream side of the defect inspection device 5 are provided.
 貼合ロール3は、互いに軸方向を平行にして配置された一対のニップロール3a,3bを有する。一対のニップロール3a,3bの間には所定の間隙が形成され、この間隙内が第1フィルムF1と第2フィルムF2との貼合位置となる。間隙内には、第1フィルムF1と第2フィルムF2とが重なり合って導入される。第1フィルムF1と第2フィルムF2とが、ニップロール3a,3bによって挟圧されつつ下流側に送り出される。これにより、第1フィルムF1の一方の面に第2フィルムF2が貼合される。 The pasting roll 3 has a pair of nip rolls 3a and 3b that are arranged with their axial directions parallel to each other. A predetermined gap is formed between the pair of nip rolls 3a and 3b, and the inside of the gap is a bonding position between the first film F1 and the second film F2. The first film F1 and the second film F2 are overlapped and introduced into the gap. The first film F1 and the second film F2 are sent downstream while being pressed by the nip rolls 3a and 3b. Thereby, the 2nd film F2 is bonded by one side of the 1st film F1.
 貼合ロール3により、第1フィルムF1と第2フィルムF2とが貼合され、1枚のフィルムFが形成される。フィルムFは、欠陥検査装置5に向けて搬送される。 The 1st film F1 and the 2nd film F2 are bonded by the bonding roll 3, and the one film F is formed. The film F is conveyed toward the defect inspection apparatus 5.
 欠陥検査装置5は、フィルムFの第1フィルムF1の側(図1に示す+Z方向側)に配置された光源20と、フィルムFの第2フィルムF2の側(図1に示す-Z方向側)に配置された撮像装置22と、光源20とフィルムFとの間の光路上に配置された第1偏光フィルター21と、撮像装置22とフィルムFとの間の光路上に配置された第2偏光フィルター23と、を備えている。 The defect inspection apparatus 5 includes a light source 20 disposed on the first film F1 side of the film F (+ Z direction side shown in FIG. 1), and a second film F2 side of the film F (−Z direction side shown in FIG. 1). ), The first polarizing filter 21 arranged on the optical path between the light source 20 and the film F, and the second arranged on the optical path between the imaging apparatus 22 and the film F. And a polarizing filter 23.
 欠陥検査装置5は、貼合ロール3以外で、第2フィルムF2の第1フィルムF1とは反対側の面Sf2に最初に接するロールよりも上流側の搬送ライン4に配置されている。本実施形態に係る欠陥検査装置5は、貼合ロール3の下流側であって第1ガイドロール10よりも上流側の搬送ライン4に配置されている。本実施形態では、第1ガイドロール10が、貼合ロール3以外で、第2フィルムF2の第1フィルムF1とは反対側の面Sf2に最初に接するロールである。 The defect inspection apparatus 5 is arrange | positioned in the conveyance line 4 upstream from the roll which contact | connects the surface Sf2 on the opposite side to the 1st film F1 of the 2nd film F2 except the bonding roll 3. FIG. The defect inspection apparatus 5 according to the present embodiment is disposed on the transport line 4 on the downstream side of the bonding roll 3 and on the upstream side of the first guide roll 10. In this embodiment, the 1st guide roll 10 is a roll which contact | connects the surface Sf2 on the opposite side to the 1st film F1 of the 2nd film F2 other than the bonding roll 3 initially.
 光源20の光射出面20aの中心と撮像装置22の受光面22aの中心とは、同軸(光軸CL上)に配置されている。 The center of the light exit surface 20a of the light source 20 and the center of the light receiving surface 22a of the imaging device 22 are arranged coaxially (on the optical axis CL).
 図2は、第1偏光フィルター21の第1の吸収軸V1と第2偏光フィルター23の第2の吸収軸V2との配置関係を説明するための図である。 FIG. 2 is a diagram for explaining the positional relationship between the first absorption axis V1 of the first polarizing filter 21 and the second absorption axis V2 of the second polarizing filter 23. FIG.
 図2に示すように、第1偏光フィルター21は、第1の吸収軸V1を有する。第2偏光フィルター23は、第1の吸収軸V1と直交する第2の吸収軸V2を有する。第1偏光フィルター21は、光源20と撮像装置22との間の光路上において、第1偏光フィルター21の第1の吸収軸V1と第2偏光フィルター23の第2の吸収軸V2とが互いに直交して配置(クロスニコル配置)される。 As shown in FIG. 2, the first polarizing filter 21 has a first absorption axis V1. The second polarizing filter 23 has a second absorption axis V2 that is orthogonal to the first absorption axis V1. In the first polarizing filter 21, the first absorption axis V 1 of the first polarizing filter 21 and the second absorption axis V 2 of the second polarizing filter 23 are orthogonal to each other on the optical path between the light source 20 and the imaging device 22. Is arranged (crossed Nicols arrangement).
 本実施形態の場合、フィルムF(図1参照)は、第1偏光フィルター21を透過した光に対して位相差を付与しないフィルムとなっている。そのため、第1偏光フィルター21の第1の吸収軸V1と第2偏光フィルター23の第2の吸収軸V2とをクロスニコル配置させると、第1偏光フィルター21と第2偏光フィルター23との重なり部分SVにおいては光を透過しない。そのため、撮像装置22によって重なり部分SVを撮像すると、第1偏光フィルター21と第2偏光フィルター23との間に位相差を有する欠陥等の偏光状態を乱すものが配置されていない限り、暗視野に見える。 In the case of the present embodiment, the film F (see FIG. 1) is a film that does not give a phase difference to the light transmitted through the first polarizing filter 21. Therefore, when the first absorption axis V1 of the first polarizing filter 21 and the second absorption axis V2 of the second polarizing filter 23 are arranged in a crossed Nicols arrangement, the overlapping portion of the first polarizing filter 21 and the second polarizing filter 23 In SV, light is not transmitted. Therefore, when the overlapping portion SV is imaged by the imaging device 22, the dark field is not displayed unless anything that disturbs the polarization state such as a defect having a phase difference is disposed between the first polarizing filter 21 and the second polarizing filter 23. appear.
 なお、フィルムFが、第1偏光フィルター21を透過した光に対して位相差を付与するフィルムである場合には、その位相差を相殺するような位相補償フィルムを第1偏光フィルター21と第2偏光フィルター23との間に配置してもよい。位相補償フィルムを配置しない場合には、第1偏光フィルター21の透過軸と第2偏光フィルター23の透過軸とを90°から所定角度ずれた角度に配置し、異物欠陥等の欠陥がない状態で、撮像装置22における受光強度が最小(暗視野)となるようにしてもよい。 When the film F is a film that gives a phase difference to the light transmitted through the first polarizing filter 21, a phase compensation film that cancels the phase difference is used as the first polarizing filter 21 and the second polarizing filter 21. You may arrange | position between the polarizing filters 23. When the phase compensation film is not arranged, the transmission axis of the first polarizing filter 21 and the transmission axis of the second polarizing filter 23 are arranged at an angle deviated from 90 ° by a predetermined angle, and there is no defect such as a foreign substance defect. The received light intensity in the imaging device 22 may be minimized (dark field).
 図3は、欠陥検査装置5の平面図である。図3では、便宜上、フィルムFを図示している。 FIG. 3 is a plan view of the defect inspection apparatus 5. In FIG. 3, the film F is shown for convenience.
 図3に示すように、欠陥検査装置5を構成する光源20の光射出面20aは、長方形であり、Y方向に沿って長手を有している。本実施形態において、光源20の光射出面20aは、フィルムFの搬送方向と直交する幅方向に沿って長手を有している。光源20の光射出面20aは、フィルムFに対して幅方向に跨って形成されている。例えば、光源20としては、LEDライン光源を用いることができる。 As shown in FIG. 3, the light emission surface 20a of the light source 20 constituting the defect inspection apparatus 5 is a rectangle and has a length along the Y direction. In the present embodiment, the light exit surface 20 a of the light source 20 has a length along the width direction orthogonal to the transport direction of the film F. The light emission surface 20 a of the light source 20 is formed across the width direction with respect to the film F. For example, an LED line light source can be used as the light source 20.
 第1偏光フィルター21は、光源20の光射出面20aの外周部と重なるように配置されている。第1偏光フィルター21は、光源20の光射出面20aと同様に、Y方向に沿って長手を有している。第1偏光フィルター21は、X方向及びY方向の各々において光源20の光射出面20aよりも長くなっている。 The first polarizing filter 21 is disposed so as to overlap the outer peripheral portion of the light exit surface 20a of the light source 20. The first polarizing filter 21 has a length along the Y direction, similarly to the light exit surface 20 a of the light source 20. The first polarizing filter 21 is longer than the light exit surface 20a of the light source 20 in each of the X direction and the Y direction.
 これにより、第1偏光フィルター21が光源20とフィルムFとの間の光路上に配置された場合において、光源20から射出された光はすべて第1偏光フィルター21に入射する。 Thereby, when the first polarizing filter 21 is disposed on the optical path between the light source 20 and the film F, all the light emitted from the light source 20 enters the first polarizing filter 21.
 撮像装置22も、光源20の光射出面20aと同様に、Y方向に沿って長手を有している。例えば、撮像装置22としては、ラインカメラを用いることができる。 The imaging device 22 also has a longitudinal direction along the Y direction, similarly to the light exit surface 20a of the light source 20. For example, a line camera can be used as the imaging device 22.
 第2偏光フィルター23は、撮像装置22の受光面22aの外周部と重なるように配置されている。第2偏光フィルター23は、撮像装置22の受光面22aと同様に、Y方向に沿って長手を有している。第2偏光フィルター23は、X方向及びY方向の各々において撮像装置22の受光面22aよりも長くなっている。 The second polarizing filter 23 is disposed so as to overlap with the outer periphery of the light receiving surface 22a of the imaging device 22. Similar to the light receiving surface 22a of the imaging device 22, the second polarizing filter 23 has a length along the Y direction. The second polarizing filter 23 is longer than the light receiving surface 22a of the imaging device 22 in each of the X direction and the Y direction.
 図1に戻り、記録装置6は、第3ガイドロール12よりも下流側の搬送ライン4に設けられている。記録装置6は、欠陥検査装置5によって検出された欠陥に関する欠陥情報をフィルムF(例えば本実施形態では第1フィルムF1)に記録する。欠陥情報には、欠陥の位置や種類に関する情報等が含まれる。 Returning to FIG. 1, the recording device 6 is provided in the transport line 4 on the downstream side of the third guide roll 12. The recording device 6 records defect information related to the defect detected by the defect inspection device 5 on the film F (for example, the first film F1 in the present embodiment). The defect information includes information on the position and type of the defect.
 記録装置6は、例えば、欠陥情報を識別コード(一次元バーコード、二次元バーコード、QRコード(登録商標)など)の形式で第1フィルムF1の幅方向端部に記録する。識別コードには、例えば、欠陥検査装置5によって検出された欠陥が、バーコードが付された位置からフィルム幅方向に沿ってどれだけの距離だけ離れた位置に存在するかを示す情報(欠陥の位置に関する情報)が含まれる。識別コードには、検出された欠陥の種類に関する情報が含まれていてもよい。 The recording device 6 records, for example, defect information in the width direction end of the first film F1 in the form of an identification code (one-dimensional barcode, two-dimensional barcode, QR code (registered trademark), etc.). In the identification code, for example, information indicating how far the defect detected by the defect inspection apparatus 5 exists at a position along the film width direction from the position where the barcode is attached (defects). Location information). The identification code may include information regarding the type of detected defect.
 記録装置6は、第1フィルムF1の欠陥箇所に、欠陥を包含するような大きさのドット状、ライン状もしくは枠状のマークを付すことによって、欠陥の位置を第1フィルムF1上に直接表示(マーキング)してもよい。この際、前記マークとともに欠陥の種類を示す記号や模様を欠陥箇所に付すことによって、欠陥の種類に関する情報を記録してもよい。 The recording device 6 directly displays the position of the defect on the first film F1 by attaching a dot-shaped, line-shaped or frame-shaped mark that includes the defect to the defective portion of the first film F1. (Marking) may be used. At this time, information on the type of defect may be recorded by attaching a symbol or pattern indicating the type of defect together with the mark to the defective part.
 記録装置6によって欠陥情報が記録されたフィルムFは、巻き取り部9に向けて搬送される。そして、巻き取り部9においてロール状に巻き取られ、フィルムFのロール原反Rが製造される。 The film F on which the defect information is recorded by the recording device 6 is conveyed toward the winding unit 9. And it winds up in roll shape in the winding-up part 9, and the roll original fabric R of the film F is manufactured.
 ところで、欠陥検査装置は、通常、搬送ラインの下流側に設けられる。欠陥検査装置を搬送ラインの上流側に設けるよりも搬送ラインの下流側に設けたほうが、搬送中にフィルムに生じるキズ等の欠陥をまとめて検査することができるからである。例えば、欠陥検査装置は、フィルムが10~20のロールに接した後に、フィルムの欠陥の有無を検査する。 Incidentally, the defect inspection apparatus is usually provided on the downstream side of the transport line. This is because if the defect inspection apparatus is provided on the downstream side of the conveyance line rather than the upstream side of the conveyance line, defects such as scratches generated on the film during conveyance can be collectively inspected. For example, the defect inspection apparatus inspects the film for defects after contacting the rolls of 10 to 20.
 一方、最終製品において第2フィルムが第1フィルムから剥離される場合には、第2フィルムの表面のキズは問題とはならない。例えば、第2フィルムの表面にキズが生じていても、第1フィルムと第2フィルムとの間に異物欠陥等が存在しない場合には、フィルムを最終製品として問題無く使用することができる。 On the other hand, when the second film is peeled from the first film in the final product, the scratch on the surface of the second film is not a problem. For example, even if the surface of the second film is scratched, if there is no foreign matter defect between the first film and the second film, the film can be used as a final product without problems.
 しかしながら、フィルムの搬送中に第2フィルムの表面にキズが生じていると、本来問題とはならない第2フィルムの表面のキズが欠陥として誤検出される場合がある。この場合、最終製品として使用可能なフィルムが欠陥品として認識されてしまう。 However, if there is a scratch on the surface of the second film while the film is being transported, a scratch on the surface of the second film that is not a problem may be erroneously detected as a defect. In this case, a film that can be used as a final product is recognized as a defective product.
 そこで本発明の一実施形態は、このような問題を解消するために、以下の構成を採用している。
 本発明の第1実施形態に係る欠陥検査システム2は、第1フィルムF1と、第1フィルムF1に剥離可能に積層された第2フィルムF2と、を有する帯状のフィルムFの欠陥検査システムであって、第1フィルムF1と第2フィルムF2とを貼合してフィルムFを形成する貼合ロール3と、貼合ロール3の下流側においてフィルムFが搬送される搬送ライン4と、搬送ライン4に設けられた欠陥検査装置5と、欠陥検査装置5よりも下流側の搬送ライン4に設けられ、欠陥検査装置5によって検出された欠陥に関する欠陥情報をフィルムFに記録する記録装置6と、を含み、欠陥検査装置5は、貼合ロール3以外で、第2フィルムF2の第1フィルムF1とは反対側の面Sf2に最初に接するロール(第1ガイドロール10)よりも上流側の搬送ライン4に配置されていることを特徴とする。
 換言すれば、本発明の第1実施形態に係る欠陥検査システム2は、第1フィルムF1と、第1フィルムF1に剥離可能に積層された第2フィルムF2と、を有する帯状のフィルムFの欠陥検査システムであって、第1フィルムF1と第2フィルムF2とを貼合してフィルムFを形成する貼合ロール3と、貼合ロール3の下流側においてフィルムFが搬送される搬送ライン4と、搬送ライン4に設けられた欠陥検査装置5と、欠陥検査装置5よりも下流側の搬送ライン4に設けられ、欠陥検査装置5によって検出された欠陥に関する欠陥情報をフィルムFに記録する記録装置6と、搬送ライン4に設けられた複数のロール(第1ガイドロール10、第2ガイドロール11、第3ガイドロール12)と、を含み、欠陥検査装置5は、複数のロールのうち、第2フィルムF2の第1フィルムF1とは反対側の面Sf2に最初に接するロール(第1ガイドロール10)よりも上流側の搬送ライン4に配置されている。
Therefore, one embodiment of the present invention employs the following configuration in order to solve such a problem.
The defect inspection system 2 according to the first embodiment of the present invention is a defect inspection system for a strip-shaped film F having a first film F1 and a second film F2 that is detachably laminated on the first film F1. And the 1st film F1 and the 2nd film F2 are bonded, the bonding roll 3 which forms the film F, the conveyance line 4 in which the film F is conveyed in the downstream of the bonding roll 3, and the conveyance line 4 A defect inspection apparatus 5 provided on the recording line, and a recording apparatus 6 provided on the transport line 4 on the downstream side of the defect inspection apparatus 5 for recording defect information relating to defects detected by the defect inspection apparatus 5 on the film F. In addition, the defect inspection apparatus 5 other than the bonding roll 3 is upstream of the roll (first guide roll 10) that first contacts the surface Sf2 opposite to the first film F1 of the second film F2. Characterized in that it is arranged to feed lines 4.
In other words, the defect inspection system 2 according to the first embodiment of the present invention is a defect of the strip-shaped film F having the first film F1 and the second film F2 that is detachably laminated on the first film F1. It is a test | inspection system, Comprising: The laminating roll 3 which bonds the 1st film F1 and the 2nd film F2 and forms the film F, The conveyance line 4 with which the film F is conveyed in the downstream of the laminating roll 3, and , A defect inspection apparatus 5 provided on the conveyance line 4, and a recording apparatus which is provided in the conveyance line 4 downstream of the defect inspection apparatus 5 and records defect information relating to defects detected by the defect inspection apparatus 5 on the film F. 6 and a plurality of rolls (first guide roll 10, second guide roll 11, third guide roll 12) provided in the transport line 4, and the defect inspection apparatus 5 includes a plurality of rolls. Among them, they are arranged in the conveying line 4 upstream of the roll (the first guide roll 10) in contact with the first opposite surface Sf2 the first film F1 of the second film F2.
 以下、図4及び図5を用いて本実施形態に係る欠陥検査システム2の作用効果について説明する。 Hereinafter, the operational effects of the defect inspection system 2 according to the present embodiment will be described with reference to FIGS. 4 and 5.
 図4は、比較例1に係る欠陥検査システムによるフィルムFの欠陥検査を説明するための図である。
 比較例1に係る欠陥検査システムにおいては、欠陥検査装置5が、貼合ロール3以外で、第2フィルムF2の第1フィルムF1とは反対側の面Sf2に接するロール(例えば複数のガイドロールのうち面Sf2に最後に接するガイドロール)よりも下流側の搬送ライン4に配置されている。図4は、第1フィルムF1と第2フィルムF2とを貼合する際の気泡等の噛み込み等によりフィルムFに欠陥E1が存在しており、且つ、フィルムFの搬送中における第2フィルムF2とガイドロールとの摩擦により第2フィルムF2の表面にキズE2が生じている場合の図である。
FIG. 4 is a diagram for explaining defect inspection of the film F by the defect inspection system according to Comparative Example 1.
In the defect inspection system according to Comparative Example 1, the defect inspection apparatus 5 is a roll that is in contact with the surface Sf2 on the opposite side of the first film F1 of the second film F2 other than the bonding roll 3 (for example, a plurality of guide rolls). Of these, it is disposed on the transport line 4 on the downstream side of the guide roll that comes into contact with the surface Sf2 last. FIG. 4 shows that a defect E1 is present in the film F due to entrapment of bubbles or the like when the first film F1 and the second film F2 are bonded together, and the second film F2 is being conveyed. It is a figure in case the crack E2 has arisen on the surface of the 2nd film F2 by the friction with a guide roll.
 図4に示すように、光源20からフィルムFに向けて射出された光L1は、第1偏光フィルター21によって直線偏光L2とされる。第1偏光フィルター21により得られた直線偏光L2は、第1フィルムF1に入射する。すると、第1フィルムF1と第2フィルムF2との間に存在する欠陥E1により直線偏光L2の偏光状態が乱され、偏光状態が乱された光の一部(光L3)が第2偏光フィルター23を透過する。 4, the light L1 emitted from the light source 20 toward the film F is converted into linearly polarized light L2 by the first polarizing filter 21. The linearly polarized light L2 obtained by the first polarizing filter 21 is incident on the first film F1. Then, the polarization state of the linearly polarized light L2 is disturbed by the defect E1 existing between the first film F1 and the second film F2, and a part of the light (light L3) whose polarization state is disturbed is the second polarizing filter 23. Transparent.
 一方、第2フィルムF2の表面に存在するキズE2によっても直線偏光L2の偏光状態が乱され、偏光状態が乱された光の一部(光L4)が第2偏光フィルター23を透過する。 On the other hand, the polarization state of the linearly polarized light L2 is also disturbed by the scratch E2 present on the surface of the second film F2, and a part of the light whose polarization state is disturbed (light L4) passes through the second polarizing filter 23.
 その結果、第2偏光フィルター23を透過した光L3と光L4とが撮像装置22に入射し、撮像装置22によって欠陥E1とキズE2とが輝点として明るく撮像される。 As a result, the light L3 and the light L4 that have passed through the second polarizing filter 23 enter the imaging device 22, and the imaging device 22 captures bright images of the defect E1 and the scratch E2 as bright spots.
 また、第1フィルムF1と第2フィルムF2との間に欠陥E1が存在しなくても、第2フィルムF2の表面にキズE2が存在する場合には、第2偏光フィルター23を透過した光L4が撮像装置22に入射し、撮像装置22によってキズE2が輝点として明るく撮像される。 In addition, even if there is no defect E1 between the first film F1 and the second film F2, if there is a scratch E2 on the surface of the second film F2, the light L4 transmitted through the second polarizing filter 23 Is incident on the image pickup device 22 and the image pickup device 22 picks up the flaw E2 brightly as a bright spot.
 このように、比較例1においては、フィルムFの搬送中におけるガイドロールとの摩擦により第2フィルムF2の表面にキズE2が生じていると、最終製品において第2フィルムF2が第1フィルムF1から剥離される場合に本来問題とはならない第2フィルムF2の表面のキズが欠陥として誤検出されてしまう。 Thus, in Comparative Example 1, when scratch E2 is generated on the surface of the second film F2 due to friction with the guide roll during the conveyance of the film F, the second film F2 is removed from the first film F1 in the final product. When the film is peeled off, a scratch on the surface of the second film F2 that does not originally become a problem is erroneously detected as a defect.
 図5は、本実施形態に係る欠陥検査システム2によるフィルムFの欠陥検査を説明するための図である。
 本実施形態に係る欠陥検査システム2においては、欠陥検査装置5が、貼合ロール3以外で、第2フィルムF2の第1フィルムF1とは反対側の面Sf2に最初に接するロール(例えば本実施形態では第1ガイドロール10)よりも上流側の搬送ライン4に配置されている。図5は、第1フィルムF1と第2フィルムF2とを貼合する際の気泡等の噛み込み等によりフィルムFに欠陥E1が存在している場合の図である。尚、第2フィルムF2にキズが付く前にフィルムFの欠陥が検査されるため、第2フィルムF2の表面にキズは生じていない。
FIG. 5 is a view for explaining defect inspection of the film F by the defect inspection system 2 according to the present embodiment.
In the defect inspection system 2 according to the present embodiment, the defect inspection device 5 is a roll that first contacts the surface Sf2 opposite to the first film F1 of the second film F2 other than the bonding roll 3 (for example, the present embodiment). In the form, it is arranged in the transport line 4 upstream of the first guide roll 10). FIG. 5 is a diagram in the case where a defect E1 is present in the film F due to entrapment of bubbles or the like when the first film F1 and the second film F2 are bonded. In addition, since the defect of the film F is inspected before the second film F2 is scratched, the surface of the second film F2 is not scratched.
 図5に示すように、光源20からフィルムFに向けて射出された光L1は、第1偏光フィルター21によって直線偏光L2とされる。第1偏光フィルター21により得られた直線偏光L2は、第1フィルムF1に入射する。すると、第1フィルムF1と第2フィルムF2との間に存在する欠陥E1により直線偏光L2の偏光状態が乱され、偏光状態が乱された光の一部(光L3)が第2偏光フィルター23を透過する。その結果、第2偏光フィルター23を透過した光L3が撮像装置22に入射し、撮像装置22によって欠陥E1が輝点として明るく撮像される。 As shown in FIG. 5, the light L <b> 1 emitted from the light source 20 toward the film F is converted into linearly polarized light L <b> 2 by the first polarizing filter 21. The linearly polarized light L2 obtained by the first polarizing filter 21 is incident on the first film F1. Then, the polarization state of the linearly polarized light L2 is disturbed by the defect E1 existing between the first film F1 and the second film F2, and a part of the light (light L3) whose polarization state is disturbed is the second polarizing filter 23. Transparent. As a result, the light L3 transmitted through the second polarizing filter 23 enters the image pickup device 22, and the image pickup device 22 picks up the defect E1 brightly as a bright spot.
 一方、第1フィルムF1と第2フィルムF2との間に欠陥E1が存在しない場合には、直線偏光L2は第2偏光フィルター23を透過することができない。その結果、撮像装置22には光が入射しないため、撮像装置22では黒い画像が撮像される。 On the other hand, when there is no defect E1 between the first film F1 and the second film F2, the linearly polarized light L2 cannot pass through the second polarizing filter 23. As a result, since no light is incident on the imaging device 22, the imaging device 22 captures a black image.
 このように、本実施形態においては、第2フィルムF2の表面にキズが生じていないため、第2フィルムF2の表面のキズが欠陥として誤検出されることがない。 Thus, in this embodiment, since the surface of the second film F2 is not scratched, the surface of the second film F2 is not erroneously detected as a defect.
 以上説明したように、本実施形態によれば、欠陥検査装置5が、貼合ロール3以外で、第2フィルムF2の第1フィルムF1とは反対側の面Sf2に最初に接するロール(例えば本実施形態では第1ガイドロール10)よりも上流側の搬送ライン4に配置されているため、第2フィルムF2にキズが付く前にフィルムFの欠陥が検査される。すなわち、フィルムFの搬送中に、第2フィルムF2とガイドロールとの摩擦が生じないため、第2フィルムF2の表面にキズが生じない。従って、キズの検出による虚報欠陥(虚報としての欠陥検出)を抑制することができる。 As described above, according to the present embodiment, the defect inspection device 5 is a roll that first contacts the surface Sf2 opposite to the first film F1 of the second film F2 other than the bonding roll 3 (for example, a book) In the embodiment, the film F is inspected for defects before being scratched on the second film F2 because it is disposed on the transport line 4 upstream of the first guide roll 10). That is, since the friction between the second film F2 and the guide roll does not occur during the conveyance of the film F, the surface of the second film F2 is not scratched. Therefore, it is possible to suppress the false alarm defect (defect detection as the false alarm) due to the detection of the scratch.
(第2実施形態)
 次に、本発明の第2実施形態について図6~図9を用いて説明する。
 図6は、本発明の第2実施形態に係るフィルムの製造装置101を示す側面図である。
 図6に示すように、本実施形態に係るフィルムの製造装置101は、第1フィルムF1aが偏光子であり、欠陥検査装置105が、フィルムFaの偏光子F1aの側に配置された光源20と、フィルムFaの第2フィルムF2の側に配置された撮像装置22と、撮像装置22とフィルムFaとの間の光路上に配置された偏光フィルター123と、を備えている点で、第1実施形態に係るフィルムの製造装置1と異なる。その他の第1実施形態と同一構成には同一符号を付し、詳細説明は省略する。
(Second Embodiment)
Next, a second embodiment of the present invention will be described with reference to FIGS.
FIG. 6 is a side view showing a film manufacturing apparatus 101 according to the second embodiment of the present invention.
As shown in FIG. 6, in the film manufacturing apparatus 101 according to this embodiment, the first film F <b> 1 a is a polarizer, and the defect inspection apparatus 105 includes a light source 20 disposed on the polarizer F <b> 1 a side of the film Fa. First, in that the image pickup device 22 disposed on the second film F2 side of the film Fa and the polarizing filter 123 disposed on the optical path between the image pickup device 22 and the film Fa are provided. Different from the film manufacturing apparatus 1 according to the embodiment. The same components as those in the first embodiment are denoted by the same reference numerals, and detailed description thereof is omitted.
 フィルムFaは、偏光子F1aと、偏光子F1aに剥離可能に積層された第2フィルムF2と、を有する帯状のフィルムである。本実施形態で使用されるフィルムFは、例えば、PVA(ポリビニルアルコール)等からなる偏光子F1aの一面が、セパレータフィルムである第2フィルムF2によって覆われた構造である。 The film Fa is a belt-like film having a polarizer F1a and a second film F2 laminated on the polarizer F1a so as to be peelable. The film F used in this embodiment has a structure in which, for example, one surface of a polarizer F1a made of PVA (polyvinyl alcohol) or the like is covered with a second film F2 that is a separator film.
 尚、フィルムFaは、偏光子F1aの他面に、位相差フィルムや輝度向上フィルム等の複数の光学フィルムを積層したものでもよい。 In addition, the film Fa may be obtained by laminating a plurality of optical films such as a retardation film and a brightness enhancement film on the other surface of the polarizer F1a.
 本実施形態の場合、フィルムFaは、偏光子F1aを透過した光に対して位相差を付与しないフィルムとなっているが、フィルムFaが、偏光子F1aを透過した光に対して位相差を付与するフィルムである場合には、その位相差を相殺するような位相補償フィルムをフィルムFaと偏光フィルター123との間に配置してもよい。位相補償フィルムを配置しない場合には、偏光子F1aの透過軸と偏光フィルター123の透過軸とを90°から所定角度ずれた角度に配置し、異物欠陥等の欠陥がない状態で、撮像装置22における受光強度が最小(暗視野)となるようにしてもよい。 In the case of the present embodiment, the film Fa is a film that does not give a phase difference to the light transmitted through the polarizer F1a, but the film Fa gives a phase difference to the light transmitted through the polarizer F1a. In the case of a film to be used, a phase compensation film that cancels out the phase difference may be disposed between the film Fa and the polarizing filter 123. When the phase compensation film is not disposed, the imaging device 22 is disposed in a state where the transmission axis of the polarizer F1a and the transmission axis of the polarizing filter 123 are shifted by a predetermined angle from 90 ° and there is no defect such as a foreign object defect. The received light intensity at may be minimized (dark field).
 欠陥検査装置105は、貼合ロール3以外で、第2フィルムF2の偏光子F1aとは反対側の面Sf2に最初に接するロールよりも上流側の搬送ライン4に配置されている。本実施形態に係る欠陥検査装置105は、貼合ロール3の下流側であって第1ガイドロール10よりも上流側の搬送ライン4に配置されている。 The defect inspection apparatus 105 is arrange | positioned in the conveyance line 4 upstream from the roll which contact | connects the surface Sf2 on the opposite side to the polarizer F1a of the 2nd film F2 except the bonding roll 3. FIG. The defect inspection apparatus 105 according to this embodiment is disposed on the conveyance line 4 on the downstream side of the bonding roll 3 and on the upstream side of the first guide roll 10.
 図7は、偏光子F1aの吸収軸Vaと偏光フィルター123の吸収軸Vとの配置関係を説明するための図である。 FIG. 7 is a diagram for explaining the positional relationship between the absorption axis Va of the polarizer F1a and the absorption axis V of the polarizing filter 123. FIG.
 図7に示すように、偏光子F1aは、吸収軸Vaを有する。偏光フィルター123は、吸収軸Vaと直交する吸収軸Vを有する。偏光フィルター123は、光源20と撮像装置22との間の光路上において、偏光子F1aの吸収軸Vaと偏光フィルター123の吸収軸Vとが互いに直交して配置(クロスニコル配置)される。 As shown in FIG. 7, the polarizer F1a has an absorption axis Va. The polarizing filter 123 has an absorption axis V orthogonal to the absorption axis Va. In the polarizing filter 123, the absorption axis Va of the polarizer F1a and the absorption axis V of the polarizing filter 123 are arranged orthogonal to each other (crossed Nicols arrangement) on the optical path between the light source 20 and the imaging device 22.
 偏光子F1aの吸収軸Vaと偏光フィルター123の吸収軸Vとをクロスニコル配置させると、偏光子F1aと偏光フィルター123との重なり部分SVにおいては光を透過しない。そのため、撮像装置22によって重なり部分SVを撮像すると、偏光子F1aと偏光フィルター123との間に位相差を有する欠陥等の偏光状態を乱すものが配置されていない限り、暗視野に見える。 When the absorption axis Va of the polarizer F1a and the absorption axis V of the polarizing filter 123 are arranged in a crossed Nicol arrangement, light does not pass through the overlapping portion SV between the polarizer F1a and the polarizing filter 123. Therefore, when the overlapping portion SV is imaged by the imaging device 22, it appears as a dark field unless an object that disturbs the polarization state such as a defect having a phase difference is disposed between the polarizer F1a and the polarizing filter 123.
 以下、図8及び図9を用いて本実施形態に係る欠陥検査システム102の作用効果について説明する。 Hereinafter, the operational effects of the defect inspection system 102 according to the present embodiment will be described with reference to FIGS. 8 and 9.
 図8は、比較例2に係る欠陥検査システムによるフィルムFaの欠陥検査を説明するための図である。
 比較例2に係る欠陥検査システムにおいては、欠陥検査装置105が、貼合ロール3以外で、第2フィルムF2の偏光子F1aとは反対側の面Sf2に接するロール(例えば複数のガイドロールのうち面Sf2に最後に接するガイドロール)よりも下流側の搬送ライン4に配置されている。図8は、偏光子F1aと第2フィルムF2とを貼合する際の気泡等の噛み込み等によりフィルムFaに欠陥E1が存在しており、且つ、フィルムFaの搬送中における第2フィルムF2とガイドロールとの摩擦により第2フィルムF2の表面にキズE2が生じている場合の図である。
FIG. 8 is a diagram for explaining defect inspection of the film Fa by the defect inspection system according to the comparative example 2.
In the defect inspection system according to Comparative Example 2, the defect inspection apparatus 105 is a roll that is in contact with the surface Sf2 opposite to the polarizer F1a of the second film F2 other than the bonding roll 3 (for example, among a plurality of guide rolls) It is disposed on the transport line 4 on the downstream side of the guide roll that comes into contact with the surface Sf2 last. FIG. 8 shows that a defect E1 is present in the film Fa due to entrapment of bubbles or the like when the polarizer F1a and the second film F2 are bonded together, and the second film F2 is being transported while the film Fa is being conveyed. It is a figure in case the crack E2 has arisen on the surface of the 2nd film F2 by friction with a guide roll.
 図8に示すように、光源20からフィルムFaに向けて射出された光L1は、偏光子F1aによって直線偏光L2とされる。偏光子F1aにより得られた直線偏光L2は、第2フィルムF2に入射する。すると、偏光子F1aと第2フィルムF2との間に存在する欠陥E1により直線偏光L2の偏光状態が乱され、偏光状態が乱された光の一部(光L3)が偏光フィルター123を透過する。 As shown in FIG. 8, the light L1 emitted from the light source 20 toward the film Fa is converted into linearly polarized light L2 by the polarizer F1a. The linearly polarized light L2 obtained by the polarizer F1a is incident on the second film F2. Then, the polarization state of the linearly polarized light L2 is disturbed by the defect E1 existing between the polarizer F1a and the second film F2, and a part of the light whose polarization state is disturbed (light L3) passes through the polarizing filter 123. .
 一方、第2フィルムF2の表面に存在するキズE2によっても直線偏光L2の偏光状態が乱され、偏光状態が乱された光の一部(光L4)が偏光フィルター123を透過する。 On the other hand, the polarization state of the linearly polarized light L2 is also disturbed by the scratch E2 existing on the surface of the second film F2, and a part of the light (light L4) whose polarization state is disturbed is transmitted through the polarizing filter 123.
 その結果、偏光フィルター123を透過した光L3と光L4とが撮像装置22に入射し、撮像装置22によって欠陥E1とキズE2とが輝点として明るく撮像される。 As a result, the light L3 and the light L4 that have been transmitted through the polarizing filter 123 enter the imaging device 22, and the defect E1 and the scratch E2 are brightly imaged as bright spots by the imaging device 22.
 また、偏光子F1aと第2フィルムF2との間に欠陥E1が存在しなくても、第2フィルムF2の表面にキズE2が存在する場合には、偏光フィルター123を透過した光L4が撮像装置22に入射し、撮像装置22によってキズE2が輝点として明るく撮像される。 In addition, even if there is no defect E1 between the polarizer F1a and the second film F2, if there is a scratch E2 on the surface of the second film F2, the light L4 transmitted through the polarizing filter 123 is captured by the imaging device. 22 and the image pick-up device 22 picks up the flaw E2 brightly as a bright spot.
 このように、比較例2においては、フィルムFaの搬送中におけるガイドロールとの摩擦により第2フィルムF2の表面にキズE2が生じていると、最終製品において第2フィルムF2が偏光子F1aから剥離される場合に本来問題とはならない第2フィルムF2の表面のキズが欠陥として誤検出されてしまう。 As described above, in Comparative Example 2, when scratches E2 are generated on the surface of the second film F2 due to friction with the guide roll during conveyance of the film Fa, the second film F2 is peeled from the polarizer F1a in the final product. In such a case, a scratch on the surface of the second film F2 that does not originally become a problem is erroneously detected as a defect.
 図9は、本実施形態に係る欠陥検査システム102によるフィルムFaの欠陥検査を説明するための図である。
 本実施形態に係る欠陥検査システム102においては、欠陥検査装置105が、貼合ロール3以外で、第2フィルムF2の偏光子F1aとは反対側の面Sf2に最初に接するロール(例えば本実施形態では第1ガイドロール10)よりも上流側の搬送ライン4に配置されている。図9は、偏光子F1aと第2フィルムF2とを貼合する際の気泡等の噛み込み等によりフィルムFaに欠陥E1が存在している場合の図である。尚、第2フィルムF2にキズが付く前にフィルムFaの欠陥が検査されるため、第2フィルムF2の表面にキズは生じていない。
FIG. 9 is a view for explaining defect inspection of the film Fa by the defect inspection system 102 according to the present embodiment.
In the defect inspection system 102 according to the present embodiment, the defect inspection apparatus 105 is a roll that first contacts the surface Sf2 opposite to the polarizer F1a of the second film F2 other than the bonding roll 3 (for example, the present embodiment). Then, it is arrange | positioned in the conveyance line 4 upstream from the 1st guide roll 10). FIG. 9 is a diagram in the case where a defect E1 is present in the film Fa due to the entrapment of bubbles or the like when the polarizer F1a and the second film F2 are bonded. In addition, since the defect of the film Fa is inspected before the second film F2 is scratched, the surface of the second film F2 is not scratched.
 図9に示すように、光源20からフィルムFaに向けて射出された光L1は、偏光子F1aによって直線偏光L2とされる。偏光子F1aにより得られた直線偏光L2は、第2フィルムF2に入射する。すると、偏光子F1aと第2フィルムF2との間に存在する欠陥E1により直線偏光L2の偏光状態が乱され、偏光状態が乱された光の一部(光L3)が偏光フィルター123を透過する。 As shown in FIG. 9, the light L1 emitted from the light source 20 toward the film Fa is converted into linearly polarized light L2 by the polarizer F1a. The linearly polarized light L2 obtained by the polarizer F1a is incident on the second film F2. Then, the polarization state of the linearly polarized light L2 is disturbed by the defect E1 existing between the polarizer F1a and the second film F2, and a part of the light whose polarization state is disturbed (light L3) passes through the polarizing filter 123. .
 その結果、偏光フィルター123を透過した光L3が撮像装置22に入射し、撮像装置22によって欠陥E1が輝点として明るく撮像される。 As a result, the light L3 that has passed through the polarizing filter 123 enters the image pickup device 22, and the image pickup device 22 picks up the defect E1 brightly as a bright spot.
 一方、偏光子F1aと第2フィルムF2との間に欠陥E1が存在しない場合には、直線偏光L2は偏光フィルター123を透過することができない。その結果、撮像装置22には光が入射しないため、撮像装置22では黒い画像が撮像される。 On the other hand, when there is no defect E1 between the polarizer F1a and the second film F2, the linearly polarized light L2 cannot pass through the polarizing filter 123. As a result, since no light is incident on the imaging device 22, the imaging device 22 captures a black image.
 このように、本実施形態においては、第2フィルムF2の表面にキズが生じていないため、第2フィルムF2の表面のキズが欠陥として誤検出されることがない。 Thus, in this embodiment, since the surface of the second film F2 is not scratched, the surface of the second film F2 is not erroneously detected as a defect.
 以上説明したように、本実施形態によれば、欠陥検査装置105が、貼合ロール3以外で、第2フィルムF2の偏光子F1aとは反対側の面Sf2に最初に接するロール(例えば本実施形態では第1ガイドロール10)よりも上流側の搬送ライン4に配置されているため、第2フィルムF2にキズが付く前にフィルムFaの欠陥が検査される。すなわち、フィルムFaの搬送中に、第2フィルムF2とガイドロールとの摩擦が生じないため、第2フィルムF2の表面にキズが生じない。従って、キズの検出による虚報欠陥を抑制することができる。 As described above, according to the present embodiment, the defect inspection apparatus 105 is a roll that first contacts the surface Sf2 opposite to the polarizer F1a of the second film F2 other than the bonding roll 3 (for example, the present embodiment). In the embodiment, the film Fa is disposed on the transport line 4 upstream of the first guide roll 10), so the film Fa is inspected for defects before the second film F2 is scratched. That is, since the friction between the second film F2 and the guide roll does not occur during the conveyance of the film Fa, the surface of the second film F2 is not scratched. Accordingly, it is possible to suppress false alarm defects due to detection of scratches.
 以上、添付図面を参照しながら本実施形態に係る好適な実施の形態例について説明したが、本発明は係る例に限定されないことは言うまでもない。上述した例において示した各構成部材の諸形状や組み合わせ等は一例であって、本発明の主旨から逸脱しない範囲において設計要求等に基づき種々変更可能である。 As described above, the preferred embodiment according to the present embodiment has been described with reference to the accompanying drawings, but the present invention is not limited to the example. Various shapes, combinations, and the like of the constituent members shown in the above-described examples are examples, and various modifications can be made based on design requirements and the like without departing from the gist of the present invention.
 1…フィルムの製造装置、2,102…欠陥検査システム、3…貼合ロール、4…搬送ライン、5,105…欠陥検査装置、6…記録装置、10…第1ガイドロール(第2フィルムの第1フィルムとは反対側の面に最初に接するロール)、20…光源、21…第1偏光フィルター、22…撮像装置、23…第2偏光フィルター、123…偏光フィルター、F…フィルム、F1…第1フィルム、F1a…偏光子、F2…第2フィルム、Sf2…第2フィルムの第1フィルムとは反対側の面、V1…第1の吸収軸、V2…第2の吸収軸、Va…偏光子の吸収軸、V…偏光フィルターの吸収軸。 DESCRIPTION OF SYMBOLS 1 ... Film manufacturing apparatus, 2,102 ... Defect inspection system, 3 ... Bonding roll, 4 ... Conveyance line, 5,105 ... Defect inspection apparatus, 6 ... Recording apparatus, 10 ... 1st guide roll (of 2nd film) First roll in contact with the surface opposite to the first film), 20 ... light source, 21 ... first polarizing filter, 22 ... imaging device, 23 ... second polarizing filter, 123 ... polarizing filter, F ... film, F1 ... First film, F1a: Polarizer, F2: Second film, Sf2: Surface of the second film opposite to the first film, V1: First absorption axis, V2: Second absorption axis, Va: Polarized light Absorption axis of child, V: Absorption axis of polarizing filter.

Claims (4)

  1.  第1フィルムと、前記第1フィルムに剥離可能に積層された第2フィルムと、を有する帯状のフィルムの欠陥検査システムであって、
     前記第1フィルムと前記第2フィルムとを貼合して前記フィルムを形成する貼合ロールと、
     前記貼合ロールの下流側において前記フィルムが搬送される搬送ラインと、
     前記搬送ラインに設けられた欠陥検査装置と、
     前記欠陥検査装置よりも下流側の前記搬送ラインに設けられ、前記欠陥検査装置によって検出された欠陥に関する欠陥情報を前記フィルムに記録する記録装置と、を含み、
     前記欠陥検査装置は、前記貼合ロール以外で、前記第2フィルムの前記第1フィルムとは反対側の面に最初に接するロールよりも上流側の前記搬送ラインに配置されている欠陥検査システム。
    A strip-shaped film defect inspection system having a first film and a second film peelably laminated on the first film,
    A laminating roll for laminating the first film and the second film to form the film;
    A transport line on which the film is transported on the downstream side of the bonding roll;
    A defect inspection apparatus provided in the transfer line;
    A recording device that is provided in the transport line downstream of the defect inspection device and records defect information on the defect detected by the defect inspection device on the film;
    The said defect inspection apparatus is a defect inspection system arrange | positioned in the said conveyance line upstream from the roll which touches the surface on the opposite side to the said 1st film of the said 2nd film except the said bonding roll.
  2.  前記欠陥検査装置は、
     前記フィルムの前記第1フィルムの側に配置され、前記フィルムに光を照射する光源と、
     前記フィルムの前記第2フィルムの側に配置され、前記フィルムの透過光像を撮像する撮像装置と、
     前記光源と前記フィルムとの間の光路上に配置され、第1の吸収軸を有する第1偏光フィルターと、
     前記撮像装置と前記フィルムとの間の光路上に配置され、前記第1の吸収軸と直交する第2の吸収軸を有する第2偏光フィルターと、
     を含む請求項1に記載の欠陥検査システム。
    The defect inspection apparatus includes:
    A light source disposed on the first film side of the film and irradiating the film with light;
    An imaging device that is disposed on the second film side of the film and captures a transmitted light image of the film;
    A first polarizing filter disposed on an optical path between the light source and the film and having a first absorption axis;
    A second polarizing filter disposed on an optical path between the imaging device and the film and having a second absorption axis perpendicular to the first absorption axis;
    The defect inspection system according to claim 1, comprising:
  3.  前記第1フィルムは偏光子であり、
     前記欠陥検査装置は、
     前記フィルムの前記偏光子の側に配置され、前記フィルムに光を照射する光源と、
     前記フィルムの前記第2フィルムの側に配置され、前記フィルムの透過光像を撮像する撮像装置と、
     前記撮像装置と前記フィルムとの間の光路上に配置され、前記偏光子の吸収軸と直交する吸収軸を有する偏光フィルターと、
     を含む請求項1に記載の欠陥検査システム。
    The first film is a polarizer;
    The defect inspection apparatus includes:
    A light source disposed on the polarizer side of the film and irradiating the film with light;
    An imaging device that is disposed on the second film side of the film and captures a transmitted light image of the film;
    A polarizing filter disposed on an optical path between the imaging device and the film and having an absorption axis perpendicular to the absorption axis of the polarizer;
    The defect inspection system according to claim 1, comprising:
  4.  請求項1から3までのいずれか一項に記載の欠陥検査システムを含むフィルムの製造装置。 A film manufacturing apparatus including the defect inspection system according to any one of claims 1 to 3.
PCT/JP2014/064472 2013-06-04 2014-05-30 Defect inspection system and film production apparatus WO2014196476A1 (en)

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