TW201442971A - 雙面附低反射膜之玻璃基板、及其製造方法 - Google Patents
雙面附低反射膜之玻璃基板、及其製造方法 Download PDFInfo
- Publication number
- TW201442971A TW201442971A TW103107491A TW103107491A TW201442971A TW 201442971 A TW201442971 A TW 201442971A TW 103107491 A TW103107491 A TW 103107491A TW 103107491 A TW103107491 A TW 103107491A TW 201442971 A TW201442971 A TW 201442971A
- Authority
- TW
- Taiwan
- Prior art keywords
- film
- glass substrate
- low
- refractive index
- reflection film
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 150
- 239000011521 glass Substances 0.000 title claims abstract description 136
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 33
- 238000000034 method Methods 0.000 claims abstract description 84
- 238000007639 printing Methods 0.000 claims abstract description 8
- 239000000463 material Substances 0.000 claims description 69
- 230000015572 biosynthetic process Effects 0.000 claims description 47
- 229910052731 fluorine Inorganic materials 0.000 claims description 39
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 38
- 239000011737 fluorine Substances 0.000 claims description 38
- 230000003373 anti-fouling effect Effects 0.000 claims description 28
- 230000002093 peripheral effect Effects 0.000 claims description 21
- 238000004544 sputter deposition Methods 0.000 claims description 17
- 150000001785 cerium compounds Chemical class 0.000 claims description 14
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 14
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 14
- 238000003426 chemical strengthening reaction Methods 0.000 claims description 10
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 10
- 238000001771 vacuum deposition Methods 0.000 claims description 7
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- 229910001887 tin oxide Inorganic materials 0.000 claims description 5
- 238000010030 laminating Methods 0.000 claims description 4
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 claims description 4
- 229910052726 zirconium Inorganic materials 0.000 claims description 4
- 150000004022 organic phosphonium compounds Chemical class 0.000 claims 1
- 239000006059 cover glass Substances 0.000 abstract description 18
- 239000010408 film Substances 0.000 description 287
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 28
- 239000002904 solvent Substances 0.000 description 20
- 238000010438 heat treatment Methods 0.000 description 17
- 239000002245 particle Substances 0.000 description 17
- 150000003304 ruthenium compounds Chemical class 0.000 description 16
- 229910052758 niobium Inorganic materials 0.000 description 15
- 239000010955 niobium Substances 0.000 description 15
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 15
- 239000000377 silicon dioxide Substances 0.000 description 14
- 239000007789 gas Substances 0.000 description 9
- 230000000007 visual effect Effects 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 238000007740 vapor deposition Methods 0.000 description 8
- 238000002834 transmittance Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 125000004432 carbon atom Chemical group C* 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 238000003860 storage Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 125000003545 alkoxy group Chemical group 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000002105 nanoparticle Substances 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 238000007650 screen-printing Methods 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 150000002291 germanium compounds Chemical class 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 238000007733 ion plating Methods 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 239000005354 aluminosilicate glass Substances 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 230000000638 stimulation Effects 0.000 description 2
- 238000005728 strengthening Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- SKMDOVFOJMUXJW-UHFFFAOYSA-N 1,1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8-heptadecafluoro-11-(trimethoxymethyl)nonadecane Chemical compound FC(C(C(C(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(CCC(C(OC)(OC)OC)CCCCCCCC)F SKMDOVFOJMUXJW-UHFFFAOYSA-N 0.000 description 1
- SJBBXFLOLUTGCW-UHFFFAOYSA-N 1,3-bis(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC(C(F)(F)F)=C1 SJBBXFLOLUTGCW-UHFFFAOYSA-N 0.000 description 1
- UBXDOZCGGFBQQQ-UHFFFAOYSA-N 2-pentyl-1h-indole Chemical compound C1=CC=C2NC(CCCCC)=CC2=C1 UBXDOZCGGFBQQQ-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 239000006018 Li-aluminosilicate Substances 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910001413 alkali metal ion Inorganic materials 0.000 description 1
- 125000003302 alkenyloxy group Chemical group 0.000 description 1
- 239000005407 aluminoborosilicate glass Substances 0.000 description 1
- 150000001463 antimony compounds Chemical class 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000005345 chemically strengthened glass Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 125000006612 decyloxy group Chemical group 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 125000001183 hydrocarbyl group Chemical group 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 239000005341 toughened glass Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
- B32B17/061—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/225—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/38—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal at least one coating being a coating of an organic material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
- C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013090615 | 2013-04-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW201442971A true TW201442971A (zh) | 2014-11-16 |
Family
ID=51764664
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW103107491A TW201442971A (zh) | 2013-04-23 | 2014-03-05 | 雙面附低反射膜之玻璃基板、及其製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6361162B2 (enrdf_load_stackoverflow) |
| KR (1) | KR20140126663A (enrdf_load_stackoverflow) |
| CN (2) | CN104118994A (enrdf_load_stackoverflow) |
| TW (1) | TW201442971A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20180136367A1 (en) * | 2016-11-11 | 2018-05-17 | Asahi Glass Company, Limited | Substrate with low-reflection property and manufacturing method thereof |
| US11249223B2 (en) | 2015-05-12 | 2022-02-15 | AGC Inc. | Base with low-reflection film |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6652137B2 (ja) * | 2015-08-10 | 2020-02-19 | Ａｇｃ株式会社 | 防汚層付きガラス板 |
| JP6582974B2 (ja) * | 2015-12-28 | 2019-10-02 | Ａｇｃ株式会社 | カバーガラスおよびその製造方法 |
| CN105565841B (zh) * | 2015-12-30 | 2018-08-17 | 潮州三环（集团）股份有限公司 | 一种遮光陶瓷及其制备方法 |
| JP6606451B2 (ja) * | 2016-03-28 | 2019-11-13 | フクビ化学工業株式会社 | 高反射防止強化ガラスの製造方法 |
| JP6780619B2 (ja) * | 2016-11-11 | 2020-11-04 | Ａｇｃ株式会社 | 低反射膜付き基体およびその製造方法 |
| DE112017006201T5 (de) * | 2016-12-08 | 2019-08-29 | AGC Inc. | Transparentes Substrat mit lichtblockierendem Bereich und Anzeigevorrichtung |
| JP2018197183A (ja) * | 2017-05-23 | 2018-12-13 | Ａｇｃ株式会社 | ガラス物品、および表示装置 |
| JP7100225B2 (ja) * | 2017-08-02 | 2022-07-13 | 日東電工株式会社 | 反射防止フィルム |
| JP7025892B2 (ja) * | 2017-11-07 | 2022-02-25 | デクセリアルズ株式会社 | 積層体、反射防止構造体及びカメラモジュール搭載装置 |
| JP6863343B2 (ja) * | 2018-07-12 | 2021-04-21 | Ａｇｃ株式会社 | ガラス積層体、ディスプレイ用前面板、表示装置およびガラス積層体の製造方法 |
| CN110863185B (zh) * | 2019-12-06 | 2023-09-22 | 天津美泰真空技术有限公司 | 一种低反射高透射膜及其制备方法 |
| JP7409205B2 (ja) * | 2020-04-08 | 2024-01-09 | Ａｇｃ株式会社 | 熱線反射膜付きガラス |
| CN114551607B (zh) * | 2022-02-25 | 2023-12-12 | 陕西迪泰克新材料有限公司 | 一种遮光层、复合膜层及其制备方法 |
| CN117800617B (zh) * | 2022-09-26 | 2024-12-10 | 比亚迪股份有限公司 | 一种仿陶瓷结构及其制备方法、电子设备壳体 |
| JP7723726B2 (ja) * | 2023-12-25 | 2025-08-14 | 日東電工株式会社 | 防汚フィルムの製造方法 |
| JP7731024B1 (ja) | 2024-03-29 | 2025-08-28 | 日東電工株式会社 | 積層体及びスイッチ装置 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ATE391303T1 (de) * | 1999-09-28 | 2008-04-15 | Fujifilm Corp | Antireflexbeschichtung, damit versehene polarisationsplatte, und bildanzeigegerät mit der antireflexbeschichtung oder mit der polarisationsplatte |
| JP2001242480A (ja) * | 1999-12-21 | 2001-09-07 | Seiko Epson Corp | 液晶表示装置及びその製造方法並びに電子機器 |
| JP2002243903A (ja) * | 2001-02-13 | 2002-08-28 | Jpc Kk | 曲面への反射防止膜形成方法及びその方法を用いて反射防止膜を形成した曲面部材 |
| FR2841894B1 (fr) * | 2002-07-03 | 2006-03-10 | Saint Gobain | Substrat transparent comportant un revetement antireflet |
| JP2006124417A (ja) * | 2004-10-26 | 2006-05-18 | Asahi Glass Co Ltd | 防汚層形成用組成物および反射防止積層体 |
| JP4716245B2 (ja) * | 2004-11-11 | 2011-07-06 | 日本電気硝子株式会社 | ガラス基板及びその製造方法 |
| US8088435B2 (en) * | 2005-03-30 | 2012-01-03 | Brother Kogyo Kabushiki Kaisha | Mask, method for producing mask, and method for producing wired board |
| CN100456079C (zh) * | 2006-10-25 | 2009-01-28 | 浙江大学 | 一种消除双层膜结构镀膜玻璃反射色的膜层设计方法 |
| KR20080110148A (ko) * | 2007-06-14 | 2008-12-18 | 주식회사 엘지화학 | 액정표시소자용 포토마스크 및 이를 이용한 컬러필터의제조방법 |
| JP2009053343A (ja) * | 2007-08-24 | 2009-03-12 | Citizen Finetech Miyota Co Ltd | 液晶表示装置 |
| US7889284B1 (en) * | 2008-02-05 | 2011-02-15 | Rockwell Collins, Inc. | Rigid antiglare low reflection glass for touch screen application |
| JP5326407B2 (ja) * | 2008-07-31 | 2013-10-30 | セイコーエプソン株式会社 | 時計用カバーガラス、および時計 |
| JPWO2010055564A1 (ja) * | 2008-11-13 | 2012-04-05 | パナソニック株式会社 | 光学フィルタおよび表示装置 |
| JP5728298B2 (ja) * | 2010-06-10 | 2015-06-03 | 富士フイルム株式会社 | 光学フィルム、偏光板、及び画像表示装置 |
-
2014
- 2014-02-21 JP JP2014032103A patent/JP6361162B2/ja active Active
- 2014-03-05 TW TW103107491A patent/TW201442971A/zh unknown
- 2014-04-04 KR KR20140040581A patent/KR20140126663A/ko not_active Withdrawn
- 2014-04-14 CN CN201410147780.2A patent/CN104118994A/zh active Pending
- 2014-04-14 CN CN201910104255.5A patent/CN109851232B/zh active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11249223B2 (en) | 2015-05-12 | 2022-02-15 | AGC Inc. | Base with low-reflection film |
| US20180136367A1 (en) * | 2016-11-11 | 2018-05-17 | Asahi Glass Company, Limited | Substrate with low-reflection property and manufacturing method thereof |
| CN108072926A (zh) * | 2016-11-11 | 2018-05-25 | 旭硝子株式会社 | 带低反射膜的基体及其制造方法 |
| US10877181B2 (en) * | 2016-11-11 | 2020-12-29 | AGC Inc. | Substrate with low-reflection property and manufacturing method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2014224979A (ja) | 2014-12-04 |
| CN104118994A (zh) | 2014-10-29 |
| CN109851232B (zh) | 2022-11-04 |
| CN109851232A (zh) | 2019-06-07 |
| KR20140126663A (ko) | 2014-10-31 |
| JP6361162B2 (ja) | 2018-07-25 |
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