TW201406223A - Multilayer printed circuit board and method for manufacturing same - Google Patents

Multilayer printed circuit board and method for manufacturing same Download PDF

Info

Publication number
TW201406223A
TW201406223A TW101127410A TW101127410A TW201406223A TW 201406223 A TW201406223 A TW 201406223A TW 101127410 A TW101127410 A TW 101127410A TW 101127410 A TW101127410 A TW 101127410A TW 201406223 A TW201406223 A TW 201406223A
Authority
TW
Taiwan
Prior art keywords
film
copper foil
circuit
conductive
substrates
Prior art date
Application number
TW101127410A
Other languages
Chinese (zh)
Inventor
Chao-Meng Cheng
hai-bo Qin
Original Assignee
Zhen Ding Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zhen Ding Technology Co Ltd filed Critical Zhen Ding Technology Co Ltd
Publication of TW201406223A publication Critical patent/TW201406223A/en

Links

Landscapes

  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

The present disclosure relates to a method for manufacturing a multilayer printed circuit board. The method includes steps as follows. First, a number of copper clad laminates are provided. Second, the copper layers of the copper clad laminates are patterned to form conductive patterns, and then a number of first printed circuit boards are obtained. Third, two adhesive sheets are respectively adhered on two opposite surfaces of each of certain first printed circuit boards. At least one though hole is formed in each of the adhesive sheets and a conductive material is filled in each of the though holes to obtain a number of second printed circuit boards. Four, A copper foil and another adhesive sheet are provided. The first printed circuit board, the second printed circuit board, the copper foil and the adhesive sheet are laminated to obtain a lamination board. And then at least one blind via is formed in the lamination board and a conductive material is filled in the at least one blind via. The copper foil is patterned to form a conductive pattern. Then, a multilayer printed circuit board is formed. A multilayer printed circuit board manufactured from the above-mentioned method is also provided.

Description

多層線路板及其製作方法Multilayer circuit board and manufacturing method thereof

本發明涉及線路板製作技術,尤其涉及一種多層線路板及其製作方法。The invention relates to a circuit board manufacturing technology, in particular to a multilayer circuit board and a manufacturing method thereof.

隨著電子產品往小型化、高速化方向之發展,線路板亦從單面線路板、雙面線路板往多層線路板方向發展。多層線路板係指具有多層導電線路之線路板,其具有較多之佈線面積、較高互連密度,因而得到廣泛之應用,參見文獻Takahashi, A. Ooki, N. Nagai, A. Akahoshi, H. Mukoh, A. Wajima, M. Res. Lab., High density multilayer printed circuit board for HITAC M-880,IEEE Trans. on Components, Packaging, and Manufacturing Technology, 1992, 15(4): 418-425。With the development of electronic products in the direction of miniaturization and high speed, circuit boards have also developed from single-sided circuit boards and double-sided circuit boards to multi-layer circuit boards. Multi-layer circuit board refers to a circuit board with multiple layers of conductive lines, which has more wiring area and higher interconnection density, and thus has been widely used, see the literature Takahashi, A. Ooki, N. Nagai, A. Akahoshi, H Mukoh, A. Wajima, M. Res. Lab., High density multilayer printed circuit board for HITAC M-880, IEEE Trans. on Components, Packaging, and Manufacturing Technology, 1992, 15(4): 418-425.

目前,多層線路板通常採用增層法制作,即,層層疊加之方式進行製作。採用傳統之增層法制作多層線路板之方法包括步驟:第一步,製作一個內層板,所述內層板包括至少一層絕緣材料層以及兩個導電線路層,所述兩個導電線路層藉由至少一個導電孔相電導通。第二步,於內層板之兩個導電線路層上分別壓合一個膠黏片及一個銅箔層,其中,所述銅箔層藉由所述黏結片與所述內層板之導電線路層結合,選擇性蝕刻所述銅箔層,以將所述銅箔層形成一個最外導電線路圖形,從而形成一個多層線路基板;第三步,用鐳射鑽孔等方法於所述多層線路基板上形成至少一個盲孔,電鍍所述至少一個盲孔使所述銅箔層與所述內層板之導電線路層電導通;第四步,於所述多層線路基板上形成至少一個通孔,並電鍍所述通孔,以將所述多層線路基板之兩個最外導電線路圖形電連接,這樣便得到一個多層線路板。如果需要更多層數之多層線路板,按照第二至三步相似之方法,即,繼續於所述多層電路基板之兩個最外導電線路圖形上分別壓合一個銅箔片,選擇性蝕刻所述銅箔層,電連接所需要連接之導電線路層。如此,即可獲得更多層之多層線路板。At present, multi-layer circuit boards are usually produced by a build-up method, that is, by layer stacking. The method for fabricating a multilayer wiring board by a conventional build-up method includes the steps of: first, fabricating an inner layer board comprising at least one layer of insulating material and two conductive circuit layers, the two conductive circuit layers The phase is electrically conducted by at least one conductive hole. In the second step, an adhesive sheet and a copper foil layer are respectively pressed on the two conductive circuit layers of the inner layer board, wherein the copper foil layer is electrically conductively connected to the inner layer board by the adhesive sheet Bonding, selectively etching the copper foil layer to form the outermost conductive trace pattern to form a multilayer wiring substrate; and third step, using a laser drilling method or the like on the multilayer wiring substrate Forming at least one blind hole thereon, electroplating the at least one blind hole to electrically conduct the copper foil layer and the conductive circuit layer of the inner layer plate; and fourth, forming at least one through hole on the multilayer circuit substrate, And the through holes are plated to electrically connect the two outermost conductive trace patterns of the multilayer circuit substrate, thereby obtaining a multilayer wiring board. If more layers of the multi-layer circuit board are required, follow a similar method in the second to third steps, that is, continue to press a copper foil on the two outermost conductive circuit patterns of the multilayer circuit substrate, and selectively etch. The copper foil layer electrically connects the conductive circuit layers to be connected. In this way, more layers of the multilayer circuit board can be obtained.

惟,於上述多層線路板之製作過程中,每進行一次增層,均需要進行一次壓合過程,製作較多層數之線路板時,壓合次數亦相應較多,這樣不利於工藝過程之簡化,製作成本亦相對較高,製作效率亦相對較低。However, in the manufacturing process of the above multilayer circuit board, each time a layer is added, a pressing process is required, and when a plurality of layers of the circuit board are produced, the number of pressing times is correspondingly large, which is disadvantageous for the process. Simplification, production costs are relatively high, and production efficiency is relatively low.

有鑒於此,有必要提供一種多層線路板之製作方法以及由此方法所得到之多層線路板,以提高多層線路板之製作效率。In view of the above, it is necessary to provide a method for fabricating a multilayer wiring board and a multilayer wiring board obtained by the method to improve the fabrication efficiency of the multilayer wiring board.

一種多層線路板之製作方法,包括步驟:提供2N個覆銅基板,其中,N為大於或者等於1之自然數,每個所述覆銅基板包括絕緣層及貼合於所述絕緣層相對兩側之第一銅箔層及第二銅箔層;將每個所述覆銅基板之第一銅箔層製作形成第一導電線路圖形,將每個所述覆銅基板之第二銅箔層製作形成第二導電線路圖形,從而將2N個所述覆銅基板製成2N個第一線路基板;於2N個所述第一線路基板中取N個第一線路基板,於N個所述第一線路基板中之每個第一線路基板之第一導電線路圖形表面貼合第一膠片,於N個所述第一線路基板中之每個第一線路基板之第二導電線路圖形表面貼合第二膠片,所述第一膠片具有至少一個第一通孔,所述第二膠片具有至少一個第二通孔,並於所述至少一個第一通孔內填充第一導電材料,所述第一導電材料與相鄰之第一導電線路圖形相互電導通,於所述至少一個第二通孔內填充第二導電材料,所述第二導電材料與相鄰之第二導電線路圖形相互電導通,從而將N個所述第一線路基板製成N個第二線路基板;提供第三膠片、第一銅箔片及第二銅箔片,並一次壓合所述第二銅箔片、N個所述第二線路基板、剩餘之N個所述第一線路基板、第三膠片及所述第一銅箔片以形成4N+2層線路基板,於所述4N+2層線路基板中,相鄰之絕緣層之間通過第一膠片或者第二膠片黏結於一起,相鄰之絕緣層及第一銅箔片之間通過第三膠片黏結於一起,相鄰之絕緣層及第二銅箔片之間通過第一膠片或者第二膠片黏結於一起,且所述第一銅箔片和第二銅箔片位於所述4N+2層線路基板之最外兩側;於所述4N+2層線路基板上形成至少一個盲孔,所述至少一個盲孔穿透所述第一銅箔片及所述第三膠片,並於所述至少一個盲孔中填充第三導電材料,使所述第一銅箔片和與其相鄰之導電線路圖形通過所述第三導電材料相互電導通;以及將所述第一銅箔片及第二銅箔片經由選擇性蝕刻製成導電線路圖形,從而獲得4N+2層線路板。A method for manufacturing a multilayer circuit board, comprising the steps of: providing 2N copper-clad substrates, wherein N is a natural number greater than or equal to 1, each of the copper-clad substrates comprising an insulating layer and being bonded to the insulating layer opposite to each other a first copper foil layer and a second copper foil layer; a first copper foil layer of each of the copper-clad substrates is formed into a first conductive line pattern, and a second copper foil layer of each of the copper-clad substrates is formed Forming a second conductive line pattern to form 2N of the copper-clad substrates into 2N first circuit substrates; and taking N first circuit substrates from 2N of the first circuit substrates, The first conductive line pattern surface of each of the first circuit substrates of the first circuit substrate is bonded to the first film, and the second conductive line pattern surface of each of the N first circuit substrates is bonded to the surface a second film, the first film has at least one first through hole, the second film has at least one second through hole, and the first conductive material is filled in the at least one first through hole, the first film a conductive material and an adjacent first conductive line pattern Conducting mutual electric conduction, filling a second conductive material in the at least one second through hole, the second conductive material and the adjacent second conductive line pattern being electrically connected to each other, thereby making N the first circuit substrates Forming N second circuit substrates; providing a third film, a first copper foil and a second copper foil, and pressing the second copper foil, the N second circuit substrates, and the remaining N at a time The first circuit substrate, the third film, and the first copper foil are formed to form a 4N+2 layer circuit substrate. In the 4N+2 layer circuit substrate, adjacent insulating layers pass through the first film or The second film is bonded together, and the adjacent insulating layer and the first copper foil are bonded together by the third film, and the adjacent insulating layer and the second copper foil are bonded by the first film or the second film. Together, the first copper foil and the second copper foil are located on the outermost sides of the 4N+2 layer circuit substrate; at least one blind hole is formed on the 4N+2 layer circuit substrate, At least one blind hole penetrating the first copper foil and the third film, and the at least one blind hole Filling a third conductive material such that the first copper foil and the adjacent conductive trace pattern are electrically connected to each other through the third conductive material; and selecting the first copper foil and the second copper foil via the selection The etching is performed to form a conductive line pattern, thereby obtaining a 4N+2 layer wiring board.

一種多層線路板之製作方法,包括步驟:提供2N+1個覆銅基板,其中,N為大於或者等於1之自然數,每個所述覆銅基板包括絕緣層及貼合於所述絕緣層相對兩側之第一銅箔層及第二銅箔層;將每個所述覆銅基板之第一銅箔層製作形成第一導電線路圖形,將每個所述覆銅基板之第二銅箔層製作形成第二導電線路圖形,從而將2N+1個所述覆銅基板製成2N+1個第一線路基板;於2N+1個所述第一線路基板中取N個第一線路基板,於N個所述第一線路基板中之每個第一線路基板之第一導電線路圖形表面貼合第一膠片,於N個所述第一線路基板中之每個第一線路基板之第二導電線路圖形表面貼合第二膠片,所述第一膠片具有至少一個第一通孔,所述第二膠片具有至少一個第二通孔,並於所述至少一個第一通孔內填充第一導電材料,所述第一導電材料與相鄰之第一導電線路圖形相互電導通,於所述至少一個第二通孔內填充第二導電材料,所述第二導電材料與相鄰之第二導電線路圖形相互電導通,從而將N個所述第一線路基板製成N個第二線路基板;提供第三膠片及第一銅箔片,並一次壓合所述第一銅箔片、N個所述第二線路基板、剩餘之N+1個所述第一線路基板及第三膠片以形成4N+3層線路基板,於所述4N+3層線路基板中,相鄰之絕緣層之間通過第一膠片或者第二膠片黏結於一起,相鄰之絕緣層及第一銅箔片之間通過第三膠片黏結於一起,且所述第一銅箔片和一個所述第一線路基板位於所述4N+3層線路基板之最外兩側;於所述4N+3層線路基板上形成至少一個盲孔,所述至少一個盲孔穿透所述第一銅箔片及所述第三膠片,並於所述至少一個盲孔中填充第三導電材料,使所述第一銅箔片和與其相鄰之導電線路圖形通過所述第三導電材料相互電導通;以及將所述第一銅箔片經由選擇性蝕刻製成導電線路圖形,從而獲得4N+3層線路板。A method for manufacturing a multilayer circuit board, comprising the steps of: providing 2N+1 copper-clad substrates, wherein N is a natural number greater than or equal to 1, each of the copper-clad substrates comprising an insulating layer and being bonded to the insulating layer a first copper foil layer and a second copper foil layer on opposite sides; forming a first conductive line pattern on each of the copper-clad substrates, and forming a second copper layer on each of the copper-clad substrates Forming a second conductive trace pattern by the foil layer, thereby forming 2N+1 the copper clad substrates into 2N+1 first circuit substrates; taking N first lines in 2N+1 the first circuit substrates Substrate, the first conductive line pattern surface of each of the N first circuit substrates is bonded to the first film, and the first circuit substrate of each of the N first circuit substrates The second conductive line pattern surface is attached to the second film, the first film has at least one first through hole, the second film has at least one second through hole, and is filled in the at least one first through hole a first conductive material, the first conductive material and an adjacent first conductive line Electrically conducting, electrically filling a second conductive material in the at least one second via, the second conductive material and the adjacent second conductive trace pattern being electrically connected to each other, thereby N the first circuit substrates Forming N second circuit substrates; providing a third film and a first copper foil, and pressing the first copper foil, the N second circuit substrates, and the remaining N+1 of the first a circuit substrate and a third film to form a 4N+3 layer circuit substrate. In the 4N+3 layer circuit substrate, adjacent insulating layers are bonded together by a first film or a second film, and adjacent to each other. The layer and the first copper foil are bonded together by a third film, and the first copper foil and one of the first circuit substrates are located on the outermost sides of the 4N+3 layer circuit substrate; Forming at least one blind hole on the 4N+3 layer circuit substrate, the at least one blind hole penetrating the first copper foil piece and the third film, and filling the at least one blind hole with a third conductive material Passing the first copper foil and the conductive circuit pattern adjacent thereto through the third conductive Feed conducted with each other; and the first conductive pattern made of copper foil by selective etching, thereby obtaining 4N + 3 layer PCB.

一種多層線路板之製作方法,包括步驟:提供2N+1個覆銅基板,其中,N為大於或者等於1之自然數,每個所述覆銅基板包括絕緣層及貼合於所述絕緣層相對兩側之第一銅箔層及第二銅箔層;將每個所述覆銅基板之第一銅箔層製作形成第一導電線路圖形,將每個所述覆銅基板之第二銅箔層製作形成第二導電線路圖形,從而將2N+1個所述覆銅基板製成2N+1個第一線路基板;於2N+1個所述第一線路基板中取N個第一線路基板,於N個所述第一線路基板中之每個第一線路基板之第一導電線路圖形表面貼合第一膠片,於N個所述第一線路基板中之每個第一線路基板之第二導電線路圖形表面貼合第二膠片,所述第一膠片具有至少一個第一通孔,所述第二膠片具有至少一個第二通孔,並於所述至少一個第一通孔內填充第一導電材料,所述第一導電材料與相鄰之第一導電線路圖形相互電導通,於所述至少一個第二通孔內填充第二導電材料,所述第二導電材料與相鄰之第二導電線路圖形相互電導通,從而將N個所述第一線路基板製成N個第二線路基板;提供第三膠片、第四膠片、第一銅箔片及第二銅箔片,並一次壓合所述第二銅箔片、N個所述第二線路基板、剩餘之N+1個所述第一線路基板、第三膠片、第四膠片及所述第一銅箔片以形成4N+4層線路基板,於所述4N+4層線路板中,相鄰之絕緣層之間通過第一膠片或者第二膠片黏結於一起,相鄰之絕緣層及第一銅箔片之間通過第三膠片黏結於一起,相鄰之絕緣層及第二銅箔片之間通過第四膠片黏結於一起,且所述第一銅箔片和第二銅箔片位於所述4N+4層線路基板之最外兩側;於所述4N+4層線路基板之兩側分別形成至少一個第一盲孔及至少一個第二盲孔,所述至少一個第一盲孔穿透所述第一銅箔片及與所述第一銅箔片相貼之所述第三膠片,所述至少一個第二盲孔穿透所述第二銅箔片及與所述第二銅箔片相貼之所述第四膠片,並於每個盲孔中填充第三導電材料,使所述第一銅箔片和與所述第一銅箔片相鄰之導電線路圖形通過與所述第一銅箔片相鄰之第三導電材料相互電導通,所述第二銅箔片和與所述第二銅箔片相鄰之導電線路圖形通過與所述第二銅箔片相鄰之第三導電材料相互電導通;以及將第一銅箔片及第二銅箔片經由選擇性蝕刻製成導電線路圖形,從而獲得4N+4層線路板。A method for manufacturing a multilayer circuit board, comprising the steps of: providing 2N+1 copper-clad substrates, wherein N is a natural number greater than or equal to 1, each of the copper-clad substrates comprising an insulating layer and being bonded to the insulating layer a first copper foil layer and a second copper foil layer on opposite sides; forming a first conductive line pattern on each of the copper-clad substrates, and forming a second copper layer on each of the copper-clad substrates Forming a second conductive trace pattern by the foil layer, thereby forming 2N+1 the copper clad substrates into 2N+1 first circuit substrates; taking N first lines in 2N+1 the first circuit substrates Substrate, the first conductive line pattern surface of each of the N first circuit substrates is bonded to the first film, and the first circuit substrate of each of the N first circuit substrates The second conductive line pattern surface is attached to the second film, the first film has at least one first through hole, the second film has at least one second through hole, and is filled in the at least one first through hole a first conductive material, the first conductive material and an adjacent first conductive line Electrically conducting, electrically filling a second conductive material in the at least one second via, the second conductive material and the adjacent second conductive trace pattern being electrically connected to each other, thereby N the first circuit substrates Forming N second circuit substrates; providing a third film, a fourth film, a first copper foil and a second copper foil, and pressing the second copper foil and the N second circuit substrates at a time And remaining N+1 the first circuit substrate, the third film, the fourth film, and the first copper foil to form a 4N+4 layer circuit substrate, in the 4N+4 layer circuit board, phase The adjacent insulating layers are bonded together by the first film or the second film, and the adjacent insulating layer and the first copper foil are bonded together by the third film, and the adjacent insulating layer and the second copper foil are bonded together. Bonded together by the fourth film, and the first copper foil and the second copper foil are located on the outermost sides of the 4N+4 layer circuit substrate; two of the 4N+4 layer circuit substrates Forming at least one first blind hole and at least one second blind hole respectively, the at least one first blind hole penetrating the side a copper foil and the third film attached to the first copper foil, the at least one second blind hole penetrating the second copper foil and pasting the second copper foil The fourth film is filled with a third conductive material in each of the blind holes, and the first copper foil and the conductive circuit pattern adjacent to the first copper foil are passed through the first copper The third conductive material adjacent to the foil is electrically connected to each other, and the second copper foil and the conductive circuit pattern adjacent to the second copper foil pass through a third conductive adjacent to the second copper foil The materials are electrically connected to each other; and the first copper foil and the second copper foil are electrically etched by selective etching to obtain a 4N+4 layer wiring board.

一種多層線路板,採用如上所述之多層線路板之製作方法製作形成,所述多層線路板包括多層絕緣層、多層膠片層及多層導電線路圖形,每層絕緣層之相對兩側均貼合有一層所述導電線路圖形,且絕緣層兩側之導電線路圖形通過至少一個導電孔相互電導通,每層膠片層均黏結於相鄰之兩層所述導電線路圖形之間,且通過其中填充之導電材料或者開設之至少一個盲孔電導通所述相鄰之兩層導電線路圖形。A multi-layer circuit board is formed by the manufacturing method of the multi-layer circuit board as described above, wherein the multi-layer circuit board comprises a plurality of insulating layers, a multi-layer film layer and a plurality of layers of conductive circuit patterns, and opposite sides of each of the insulating layers are laminated a layer of the conductive circuit pattern, and the conductive circuit patterns on both sides of the insulating layer are electrically connected to each other through at least one conductive hole, and each layer of the film layer is bonded between the adjacent two layers of the conductive line patterns, and is filled therein The conductive material or the at least one blind via is electrically connected to the adjacent two conductive circuit patterns.

本技術方案提供之多層線路板及製作方法,同時製作多個線路基板,然後通過貼合之方式於部分線路基板之兩個表面形成膠片,並於膠片內形成通孔並形成有導電材料。這樣,根據需要,堆疊銅箔、貼合有膠片和導電材料之線路基板及膠片,從而通過一次壓合并形成盲孔便可得到多層線路板。由於多個線路基板可同時進行製作,從而可縮短線路板製作之時間。由於各線路基板分別單獨製作,相較於先前技術中逐層疊加之方式,能夠提高線路板製作之良率。The multi-layer circuit board and the manufacturing method provided by the technical solution simultaneously manufacture a plurality of circuit substrates, and then form a film on both surfaces of a part of the circuit substrate by bonding, and form a through hole in the film and form a conductive material. Thus, as needed, a copper foil, a wiring substrate to which a film and a conductive material are bonded, and a film are stacked, thereby forming a multilayer wiring board by forming a blind via a single press. Since a plurality of circuit substrates can be simultaneously fabricated, the time for circuit board fabrication can be shortened. Since each circuit substrate is separately fabricated, the yield of the circuit board can be improved compared to the layer-by-layer stacking method in the prior art.

下面將結合附圖及多個實施例對本技術方案提供之多層線路板及其製作方法作進一步之詳細說明。The multi-layer circuit board provided by the technical solution and the manufacturing method thereof will be further described in detail below with reference to the accompanying drawings and embodiments.

本技術方案第一實施例提供之十層線路板之製作方法包括以下步驟:The method for fabricating the ten-layer circuit board provided by the first embodiment of the present technical solution includes the following steps:

第一步,請參閱圖1,提供四個覆銅基板10。每個覆銅基板10均包括一個絕緣層11及黏結於絕緣層11相對兩側之第一銅箔層12及第二銅箔層13。In the first step, referring to Figure 1, four copper clad substrates 10 are provided. Each of the copper clad substrates 10 includes an insulating layer 11 and a first copper foil layer 12 and a second copper foil layer 13 bonded to opposite sides of the insulating layer 11.

所述覆銅基板10可為玻纖布基覆銅基板、紙基覆銅基板、複合基覆銅基板、芳醯胺纖維無紡布基覆銅基板或合成纖維基覆銅基板等。當然,亦可根據形成之線路板層數之需要而選用兩個、三個、五個或者更多個所述覆銅基板10。The copper-clad substrate 10 may be a fiberglass-based copper-clad substrate, a paper-based copper-clad substrate, a composite copper-clad substrate, an alimentamide-based nonwoven fabric-based copper-clad substrate, or a synthetic fiber-based copper-clad substrate. Of course, two, three, five or more of the copper clad substrates 10 may be selected according to the needs of the number of circuit boards to be formed.

第二步,請參閱圖2,於每個所述覆銅基板10上形成至少一個導電孔14,將每個所述第一銅箔層12製作形成第一導電線路圖形15,將每個第二銅箔層13製作形成第二導電線路圖形16,第一導電線路圖形15和第二導電線路圖形16通過所述至少一個導電孔14相互電導通,從而得到四個第一線路基板110。In the second step, referring to FIG. 2, at least one conductive hole 14 is formed on each of the copper-clad substrates 10, and each of the first copper foil layers 12 is formed into a first conductive line pattern 15 for each The two copper foil layers 13 are formed to form a second conductive wiring pattern 16, and the first conductive wiring pattern 15 and the second conductive wiring pattern 16 are electrically conducted to each other through the at least one conductive via 14 to obtain four first wiring substrates 110.

所述導電孔14之形成可採用如下方法:首先,採用機械鑽孔之方式於所述覆銅基板10上形成通孔,所述通孔依次貫通所述第一銅箔層12、絕緣層11及第二銅箔層13,並對所述通孔進行除膠渣處理;然後,採用電鍍之方式於所述通孔之內部電鍍如銅、銀或金等金屬,從而得到所述導電孔14。優選地,於所述通孔之內部電鍍銅。更優選地,於進行電鍍時,通過電鍍填孔工藝將所述通孔完全填充。當然,亦可先於所述通孔之孔壁電鍍金屬,以形成所述導電孔14,之後再於所述通孔內填充樹脂;或者於形成所述通孔後於所述通孔內填充導電膏,固化所述導電膏形成所述導電孔14。The conductive hole 14 can be formed by the following method: first, a through hole is formed on the copper clad substrate 10 by mechanical drilling, and the through hole sequentially penetrates the first copper foil layer 12 and the insulating layer 11 And the second copper foil layer 13 and performing desmear treatment on the through hole; then, plating a metal such as copper, silver or gold into the inside of the through hole by electroplating to obtain the conductive hole 14 . Preferably, copper is electroplated inside the through hole. More preferably, the through hole is completely filled by a plating hole filling process during electroplating. Of course, the metal may be plated before the hole wall of the through hole to form the conductive hole 14 , and then the resin may be filled in the through hole; or the through hole may be filled after the through hole is formed. A conductive paste that cures the conductive paste to form the conductive vias 14.

本領域技術人員還可理解,亦可先採用雷射燒蝕之方式於所述覆銅基板10上形成盲孔,所述盲孔貫通所述第一銅箔層12和絕緣層11,然後,採用電鍍填孔工藝於所述盲孔之內部填充電鍍金屬,從而得到所述導電孔14;亦可採用開銅窗之方式先於所述第一銅箔層12之要形成所述導電孔14之位置蝕刻開銅窗,之後再採用雷射燒蝕之方式於所述絕緣層11上燒蝕從而形成盲孔,然後,採用電鍍填孔工藝於所述盲孔之內部填充電鍍金屬,從而得到所述導電孔14。It is also understood by those skilled in the art that a blind hole may be formed on the copper clad substrate 10 by laser ablation, and the blind hole penetrates the first copper foil layer 12 and the insulating layer 11 and then The conductive hole 14 is obtained by filling the inside of the blind hole with a plating hole filling process, and the conductive hole 14 may be formed before the first copper foil layer 12 by using a copper opening window. The copper window is etched at a position, and then ablated on the insulating layer 11 by laser ablation to form a blind hole. Then, a plating hole is filled in the interior of the blind hole by a plating filling process, thereby obtaining The conductive hole 14.

第一導電線路圖形15及第二導電線路圖形16可通過影像轉移工藝及蝕刻工藝製作形成。The first conductive line pattern 15 and the second conductive line pattern 16 can be formed by an image transfer process and an etching process.

本實施方式中,四個所述第一線路基板110上之第一導電線路圖形15和第二導電線路圖形16根據實際要製得之線路板進行設定,各覆銅基板10中之第一導電線路圖形15和第二導電線路圖形16設置可相同,亦可不同。In this embodiment, the first conductive line pattern 15 and the second conductive line pattern 16 on the four first circuit substrates 110 are set according to the circuit board to be actually formed, and the first conductive in each of the copper-clad substrates 10 The line pattern 15 and the second conductive line pattern 16 may be the same or different.

第三步,請參閱圖3,將四個所述第一線路基板110中之兩個所述第一線路基板110製成兩個第二線路基板130。每個所述第二線路基板130之製作方法均可包括以下步驟:In the third step, referring to FIG. 3, two of the four first circuit substrates 110 are formed into two second circuit substrates 130. Each of the manufacturing methods of the second circuit substrate 130 may include the following steps:

首先,於所述第一線路基板110之第一導電線路圖形15上疊合第一膠片17及離型膜,於所述第一線路基板110之第二導電線路圖形16上疊合第二膠片18及離型膜。其次,預壓合所述第一線路基板110、第一膠片17及第二膠片18,使所述第一膠片17、所述第一線路基板110及所述第二膠片18黏結於一起。然後,除去所述第一線路基板110兩側之離型膜。First, a first film 17 and a release film are stacked on the first conductive line pattern 15 of the first circuit substrate 110, and a second film is stacked on the second conductive line pattern 16 of the first circuit substrate 110. 18 and release film. Next, the first circuit substrate 110, the first film 17 and the second film 18 are pre-compressed to bond the first film 17, the first circuit substrate 110 and the second film 18 together. Then, the release film on both sides of the first circuit substrate 110 is removed.

再者,於所述第一膠片17上形成至少一個第一通孔19,所述第一通孔19貫通所述第一膠片17,並使部分第一導電線路圖形15從所述第一通孔19底部露出,於所述第二膠片18上形成至少一個第二通孔20,所述第二通孔20貫通所述第二膠片18,並使部分第二導電線路圖形16從所述第二通孔20底部露出。Further, at least one first through hole 19 is formed in the first film 17, the first through hole 19 penetrating the first film 17, and a part of the first conductive line pattern 15 is from the first pass The bottom of the hole 19 is exposed, and at least one second through hole 20 is formed on the second film 18. The second through hole 20 penetrates the second film 18 and causes a portion of the second conductive line pattern 16 from the first The bottom of the two through holes 20 is exposed.

最後,於所述第一通孔19內形成第一導電材料21,及於所述第二通孔20內形成第二導電材料22,從而所述第一導電材料21與所述第一導電線路圖形15相互電導通,所述第二導電材料22與所述第二導電線路圖形16相互電導通,得到所述第二線路基板130。Finally, a first conductive material 21 is formed in the first through hole 19, and a second conductive material 22 is formed in the second through hole 20, so that the first conductive material 21 and the first conductive line The patterns 15 are electrically connected to each other, and the second conductive material 22 and the second conductive line pattern 16 are electrically connected to each other to obtain the second circuit substrate 130.

本實施例中,兩個第二線路基板130之所述第一通孔19及第二通孔20之設置位置及數量根據實際要製得之線路板進行設定,各第二線路基板130中之第一通孔19及第二通孔20設置位置及數量可相同亦可不同。In this embodiment, the positions and the positions of the first through holes 19 and the second through holes 20 of the two second circuit substrates 130 are set according to actual circuit boards to be prepared, and the second circuit substrates 130 are The positions and the number of the first through holes 19 and the second through holes 20 may be the same or different.

本實施例中,所述第一膠片17及第二膠片18為半固化膠片,其可為玻纖布半固化片、紙基半固化片、複合基半固化片、芳醯胺纖維無紡布半固化片、合成纖維半固化片或純樹脂半固化片等。In this embodiment, the first film 17 and the second film 18 are semi-cured films, which may be fiberglass cloth prepregs, paper-based prepregs, composite prepregs, linoleamide fiber nonwoven prepregs, synthetic fiber prepregs or Pure resin prepreg, etc.

其中,預壓合之作用係為了加熱所述第一膠片17及第二膠片18,使所述第一膠片17及第二膠片18產生一定之黏性,從而與所述第一線路基板110黏結於一起。所述第一膠片17及第二膠片18之預壓合之溫度、預壓合之壓力及預壓合之時間均遠小於所述第一膠片17及第二膠片18之壓合需要之溫度、壓合需要之壓力及壓合需要之時間,故,預壓合後之所述第一膠片17及第二膠片18仍保留了其半固化性質。於本實施例中,所述第一膠片17及第二膠片18之預壓合之溫度範圍為60-110℃,預壓合之時間範圍為10-60秒,預壓合之壓力範圍為5-15kg/cm2,對應所述第一膠片17及第二膠片18之壓合溫度範圍為180-250℃,壓合之時間範圍為60-120分鐘,壓合之壓力範圍為200-300 kg/cm2。優選地,所述第一膠片17及第二膠片18之預壓合之溫度為80℃,預壓合之時間為30秒,預壓合之壓力為10kg/cm2,壓合之溫度為210℃,壓合之時間為80分鐘,壓合之壓力為250kg/cm2。The pre-compression is used to heat the first film 17 and the second film 18 to make the first film 17 and the second film 18 have a certain viscosity, thereby bonding with the first circuit substrate 110. Together. The pre-compression temperature, the pre-compression pressure and the pre-compression time of the first film 17 and the second film 18 are both smaller than the temperature required for the pressing of the first film 17 and the second film 18, The pressure required for pressing and the time required for pressing are such that the first film 17 and the second film 18 after pre-compression still retain their semi-curing properties. In this embodiment, the pre-compression temperature range of the first film 17 and the second film 18 is 60-110 ° C, the pre-compression time range is 10-60 seconds, and the pre-compression pressure range is 5 -15kg/cm2, corresponding to the first film 17 and the second film 18, the pressing temperature range is 180-250 ° C, the pressing time range is 60-120 minutes, and the pressing pressure range is 200-300 kg / Cm2. Preferably, the pre-compression temperature of the first film 17 and the second film 18 is 80 ° C, the pre-compression time is 30 seconds, the pre-compression pressure is 10 kg/cm 2 , and the pressing temperature is 210 ° C. The pressing time was 80 minutes, and the pressing pressure was 250 kg/cm2.

本實施例中,所述離型膜為邁拉片(mylar),其用於保護所述第一膠片17及第二膠片18,防止預壓合時,所述第一膠片17及第二膠片18與與其相接觸之物體(例如預壓合所用之鋼板或壓合治具)相黏結而無法分離。所述離型膜亦可為其他如聚乙烯離型膜或聚丙烯離型膜等離型材料。In this embodiment, the release film is a mylar, which is used to protect the first film 17 and the second film 18 to prevent the first film 17 and the second film from being pre-compressed. 18 is bonded to the object in contact with it (for example, a steel plate used for pre-compression or a press fixture) and cannot be separated. The release film may also be other release materials such as a polyethylene release film or a polypropylene release film.

本實施例中,所述第一通孔19及所述第二通孔20均采雷射鑽孔之方式形成。另,因雷射鑽孔工藝係通過高能量之雷射燒蝕所述第一膠片17以形成孔,燒蝕時會產生一些殘渣,故,優選地,於雷射鑽孔之後對所述第一通孔19進行除膠渣處理,除殘渣可選用等離子體除膠渣處理工藝或化學除膠渣工藝等。In this embodiment, the first through hole 19 and the second through hole 20 are all formed by laser drilling. In addition, since the laser drilling process ablate the first film 17 by a high-energy laser to form a hole, some residue is generated during ablation, and therefore, preferably, after the laser drilling A through hole 19 is subjected to desmear treatment, and a plasma degumming treatment process or a chemical degumming process may be used in addition to the residue.

本實施例中,採用印刷金屬導電膏之方式於第一通孔19內填充第一導電材料21及於第二通孔20內填充第二導電材料22。所述金屬導電膏可為導電銅膏、導電銀膏、導電錫膏等,優選為導電銅膏。具體地,首先,將金屬導電膏通過絲網印刷之方式填充於第一通孔19及第二通孔20內;然後,對導電金屬膏進行烘烤,使得所述導電金屬膏固化,於第一通孔19內形成第一導電材料21及於第二通孔20內形成第二導電材料22。對導電金屬膏烘烤之溫度低於所述第一膠片17及所述第二膠片18固化之溫度,從而不影響所述第一膠片17及第二膠片18之半固化性質。In this embodiment, the first conductive material 21 is filled in the first through hole 19 and the second conductive material 22 is filled in the second through hole 20 by printing the metal conductive paste. The metal conductive paste may be a conductive copper paste, a conductive silver paste, a conductive solder paste or the like, preferably a conductive copper paste. Specifically, first, the metal conductive paste is filled in the first through hole 19 and the second through hole 20 by screen printing; then, the conductive metal paste is baked to cure the conductive metal paste. A first conductive material 21 is formed in a through hole 19 and a second conductive material 22 is formed in the second through hole 20. The baking temperature of the conductive metal paste is lower than the curing temperature of the first film 17 and the second film 18, so that the semi-curing properties of the first film 17 and the second film 18 are not affected.

另,於疊合所述第一膠片17、第二膠片18及離型膜之前,優選地,可先對所述第一導電線路圖形15及第二導電線路圖形16進行表面粗化處理,如棕化處理,以增強所述第一膠片17與所述第一導電線路圖形15及第二膠片18與第二導電線路圖形16之間之結合力。In addition, before the first film 17, the second film 18, and the release film are laminated, preferably, the first conductive line pattern 15 and the second conductive line pattern 16 may be subjected to surface roughening treatment, such as A browning process is performed to enhance the bonding force between the first film 17 and the first conductive line pattern 15 and the second film 18 and the second conductive line pattern 16.

當然,亦可根據形成之線路板層數之需要製作多個所述第二線路基板130。Of course, a plurality of the second circuit substrates 130 may be fabricated according to the number of formed circuit board layers.

第四步,請參閱圖4,提供一個第一銅箔片23、第二銅箔片24及第三膠片25,依次堆疊所述第二銅箔片24、一個所述第二線路基板130、剩餘之兩個第一線路基板110中之一個所述第一線路基板110、一個所述第二線路基板130、剩餘之兩個第一線路基板110中之另一個所述第一線路基板110、一第三膠片25及第二銅箔片24以形成一個疊合基板,一次壓合所述疊合基板從而獲得一個十層線路基板140。The fourth step, referring to FIG. 4, provides a first copper foil sheet 23, a second copper foil sheet 24, and a third film 25, and sequentially stacks the second copper foil sheet 24, one of the second circuit substrates 130, One of the remaining two first circuit substrates 110, the first circuit substrate 110, one of the second circuit substrates 130, and the other of the remaining two first circuit substrates 110, the first circuit substrate 110, A third film 25 and a second copper foil sheet 24 are formed to form a laminated substrate, and the laminated substrate is pressed at a time to obtain a ten-layer wiring substrate 140.

所述疊合基板可通過如下方法形成:首先,將一個第二線路基板130及一個第一線路基板110堆疊形成一個僅有兩個線路基板之堆疊單元,從而得到兩個堆疊單元;然後,將所述第三膠片25疊合於所述第一銅箔片23與第二銅箔片24之間;最後,將兩個堆疊單元堆疊於所述第二銅箔片24與所述第三膠片25之間,並使每個堆疊單元中之第一線路基板110均較相應之堆疊單元中之第二線路基板130靠近所述第三膠片25,從而獲得所述疊合基板。The stacked substrate can be formed by first stacking a second circuit substrate 130 and a first circuit substrate 110 to form a stacked unit having only two circuit substrates, thereby obtaining two stacked units; The third film 25 is superposed between the first copper foil piece 23 and the second copper foil piece 24; finally, two stacked units are stacked on the second copper foil piece 24 and the third film Between 25, and the first circuit substrate 110 in each stacked unit is closer to the third film 25 than the second circuit substrate 130 in the corresponding stacked unit, thereby obtaining the laminated substrate.

於所述十層線路基板140中,所述第一銅箔片23和第二銅箔片24位於所述十層線路基板140之最外兩側,且相鄰之絕緣層11之間通過第一膠片17或者第二膠片18黏結於一起,相鄰之絕緣層11及第二銅箔片24之間通過第一膠片17或者第二膠片18黏結於一起,相鄰之絕緣層11及第一銅箔片23之間通過第三膠片25黏結於一起。本實施方式中所述第二銅箔片24與所述第二線路基板130之第一膠片17直接相黏結,一個所述第一線路基板110位於相鄰之兩個所述第二線路基板130之間,一個所述第二線路基板130位於相鄰之兩個第一線路基板110之間,一個所述第一線路基板110及所述第一銅箔片23分別直接黏結於所述第三膠片25之兩側。In the ten-layer circuit substrate 140, the first copper foil piece 23 and the second copper foil piece 24 are located on the outermost sides of the ten-layer circuit substrate 140, and the adjacent insulating layers 11 pass through A film 17 or a second film 18 is bonded together, and the adjacent insulating layer 11 and the second copper foil 24 are bonded together by the first film 17 or the second film 18, and the adjacent insulating layer 11 and the first The copper foil sheets 23 are bonded together by a third film 25. In the embodiment, the second copper foil 24 is directly bonded to the first film 17 of the second circuit substrate 130, and one of the first circuit substrates 110 is located adjacent to the two second circuit substrates 130. Between the two adjacent first circuit substrates 110, one of the first circuit substrate 110 and the first copper foil 23 are directly bonded to the third Both sides of the film 25.

於對齊並堆疊所述第二銅箔片24、兩個所述第二線路基板130、兩個所述第一線路基板110、一個第三膠片25及所述第一銅箔片23時,應保證所述第二線路基板130與所述第一線路基板110之間之精準對位。於實際操作時,於進行堆疊之過程中,可將各所述第二線路基板130與所述第一線路基板110中分別設置對位孔,採用具有與對位孔相對應之定位銷之治具進行對位。When aligning and stacking the second copper foil sheet 24, the two second circuit substrates 130, the two first circuit substrates 110, the third film 25, and the first copper foil sheet 23, The precise alignment between the second circuit substrate 130 and the first circuit substrate 110 is ensured. In the actual operation, during the stacking process, the second circuit substrate 130 and the first circuit substrate 110 may be respectively provided with alignment holes, and the positioning pins corresponding to the alignment holes are used. With the alignment.

本實施例中,由於每個所述第二線路基板130之相對兩個表面分別具有第一膠片17和第二膠片18,並每個所述第一線路基板110之相對兩個表面分別與第一膠片17、第二膠片18或第三膠片25直接相貼,因半固化材料加熱具有一定之流動性,經過壓合過程後,各所述第二線路基板130及所述第一線路基板110之各所述第一導電線路圖形15及第二導電線路圖形16均相應嵌入各第一膠片17、第二膠片18及第三膠片25形成之絕緣層中,所述第二銅箔片24與一個所述第二線路基板130之第一膠片17相黏,所述第一銅箔片23與所述第三膠片25相黏,從而使各層緊密結合。In this embodiment, since the opposite surfaces of each of the second circuit substrates 130 have a first film 17 and a second film 18, respectively, and the opposite surfaces of each of the first circuit substrates 110 are respectively A film 17, a second film 18 or a third film 25 are directly attached to each other. Since the semi-cured material is heated to have a certain fluidity, after the pressing process, each of the second circuit substrate 130 and the first circuit substrate 110 Each of the first conductive line pattern 15 and the second conductive line pattern 16 are respectively embedded in an insulating layer formed by each of the first film 17, the second film 18 and the third film 25, and the second copper foil 24 is The first film 17 of one of the second circuit substrates 130 is adhered, and the first copper foil 23 is adhered to the third film 25, so that the layers are tightly bonded.

本實施例中,所述第三膠片25亦為半固化膠片,其可為玻纖布半固化片、紙基半固化片、複合基半固化片、芳醯胺纖維無紡布半固化片、合成纖維半固化片或純樹脂半固化片等。In this embodiment, the third film 25 is also a semi-cured film, which may be a glass fiber prepreg, a paper-based prepreg, a composite prepreg, an linoleamide fiber nonwoven prepreg, a synthetic fiber prepreg or a pure resin prepreg. .

所述第一銅箔片23及第二銅箔片24均可為壓延銅箔或電解銅箔。Each of the first copper foil piece 23 and the second copper foil piece 24 may be a rolled copper foil or an electrolytic copper foil.

第五步,請參閱圖5-6,於所述十層線路基板140上形成至少一個盲孔26,使所述盲孔26穿透所述第一銅箔片23及所述第三膠片25,並於所述至少一個盲孔26中填充第三導電材料27,使所述第一銅箔片23和與其相鄰之導電線路圖形通過所述第三導電材料27相互電導通。In the fifth step, referring to FIG. 5-6, at least one blind hole 26 is formed on the ten-layer circuit substrate 140, so that the blind hole 26 penetrates the first copper foil piece 23 and the third film 25 And filling the at least one blind hole 26 with the third conductive material 27 such that the first copper foil piece 23 and the conductive circuit pattern adjacent thereto are electrically connected to each other through the third conductive material 27.

所述盲孔26可通過雷射鑽孔工藝或者定深機械鑽孔工藝形成,盲孔26貫穿所述第一銅箔片23及所述第三膠片25。本實施例以通過雷射鑽孔工藝形成盲孔26為例進行說明。The blind hole 26 may be formed by a laser drilling process or a deep mechanical drilling process, and the blind hole 26 penetrates the first copper foil piece 23 and the third film 25 . This embodiment is described by taking a blind hole 26 formed by a laser drilling process as an example.

雷射鑽孔時,因第一銅箔片23和第三膠片25之材質不同,故,優選地,先採用紫外線雷射光束將所述第一銅箔片23穿透,再使用二氧化碳(CO2)雷射光束將所述第三膠片25貫穿。正係由於二氧化碳雷射光束燒蝕銅之能力較差,僅能燒蝕5μm以下厚度之銅箔,紫外線雷射光束燒蝕銅之能力較強,而紫外線雷射光束燒蝕絕緣材料之速度非常慢,二氧化碳雷射光束燒蝕絕緣材料速度較快,故,使用兩種雷射光束相配合,可較好地形成所述盲孔26,並能使雷射光束不對與所述第三膠片25直接相貼之導電線路圖形造成損傷。另,因雷射鑽孔工藝係通過高能量之雷射燒蝕第一銅箔片23及第三膠片25以形成盲孔,故,燒蝕時會產生一些殘渣,此殘渣會影響後續加工之品質,故本技術方案於雷射鑽孔之後需要再對所述盲孔26進行除膠渣處理,本實施方式中通過等離子體處理工藝除去雷射鑽孔時所形成之殘渣。In the case of laser drilling, since the materials of the first copper foil 23 and the third film 25 are different, it is preferable to first penetrate the first copper foil 23 by using an ultraviolet laser beam, and then use carbon dioxide (CO). 2 ) A laser beam penetrates the third film 25. Due to the poor ability of the carbon dioxide laser beam to ablate copper, it can only ablate copper foil with a thickness of less than 5μm. The ultraviolet laser beam has a strong ability to ablate copper, and the ultraviolet laser beam ablate the insulating material very slowly. The carbon dioxide laser beam ablate the insulating material at a relatively fast speed. Therefore, by using two kinds of laser beams, the blind hole 26 can be formed well, and the laser beam can be directly opposite to the third film 25. The attached conductive circuit pattern causes damage. In addition, since the laser drilling process ablate the first copper foil 23 and the third film 25 by a high-energy laser to form a blind hole, some abundance is generated during ablation, and the residue may affect subsequent processing. Quality, so the technical solution needs to perform desmear treatment on the blind hole 26 after laser drilling. In the embodiment, the residue formed during the laser drilling is removed by a plasma treatment process.

當然,亦可先將所述第一銅箔片23通過減薄處理使其厚度至5μm以下,之後再直接用二氧化碳雷射光束將所述第一銅箔片23及所述第三膠片25貫穿。亦可採用開銅窗之方式形成所述盲孔26,即先於所述第一銅箔片23需要形成所述盲孔26之位置通過蝕刻形成貫通所述第一銅箔片23之銅窗,再通過二氧化碳雷射光束將與所述銅窗對應之所述第三膠片25貫穿,以形成所述盲孔26。所述盲孔26之數量視產品之需要而定。Of course, the first copper foil piece 23 may be first thinned to a thickness of 5 μm or less, and then the first copper foil piece 23 and the third film 25 may be directly penetrated by a carbon dioxide laser beam. . The blind hole 26 may be formed by opening a copper window, that is, a copper window penetrating the first copper foil 23 is formed by etching at a position where the first copper foil 23 needs to form the blind hole 26 The third film 25 corresponding to the copper window is penetrated through a carbon dioxide laser beam to form the blind hole 26. The number of blind holes 26 depends on the needs of the product.

本實施方式中採用電鍍金屬之方式於所述盲孔26中填充所述第三導電材料27,使所述第一銅箔片23和與其相貼之導電線路圖形通過所述第三導電材料27相電導通,電鍍之金屬可為銅、銀、金等,本實施方式中為銅。In the embodiment, the third conductive material 27 is filled in the blind hole 26 by using a metal plating method, so that the first copper foil piece 23 and the conductive circuit pattern attached thereto pass through the third conductive material 27 The phase is electrically conductive, and the metal to be plated may be copper, silver, gold, or the like, and is copper in the embodiment.

當然,亦可於所述盲孔26內填充導電膏體,之後固化所述導電膏體形成第三導電材料27,使所述第一銅箔片23和與其相貼之導電線路圖形通過所述第三導電材料27相電導通。另,所述第三導電材料27之材質還可為銀、金或錫等。Of course, the conductive paste may be filled in the blind via 26, and then the conductive paste is cured to form a third conductive material 27, so that the first copper foil 23 and the conductive trace pattern attached thereto pass through the conductive layer pattern. The third conductive material 27 is electrically conductive. In addition, the material of the third conductive material 27 may also be silver, gold or tin.

第六步,請參閱圖7,將第二銅箔片24製作形成第三導電線路圖形28,將第一銅箔片23製作形成第四導電線路圖形29。In the sixth step, referring to FIG. 7, the second copper foil piece 24 is formed into a third conductive line pattern 28, and the first copper foil piece 23 is formed into a fourth conductive line pattern 29.

所述第三導電線路圖形28和第四導電線路圖形29可通過影像轉移工藝及蝕刻工藝形成。The third conductive line pattern 28 and the fourth conductive line pattern 29 can be formed by an image transfer process and an etching process.

第七步,請參閱圖8,於所述第三導電線路圖形28之表面形成第一防焊層30,於所述第四導電線路圖形29之表面形成第二防焊層31,得到十層線路板100。In the seventh step, referring to FIG. 8, a first solder resist layer 30 is formed on the surface of the third conductive trace pattern 28, and a second solder resist layer 31 is formed on the surface of the fourth conductive trace pattern 29 to obtain ten layers. Circuit board 100.

第一防焊層30和第二防焊層31可通過印刷防焊油墨之方式形成。第一防焊層30用於保護第三導電線路圖形28,第二防焊層31用於保護第四導電線路圖形29。The first solder resist layer 30 and the second solder resist layer 31 can be formed by printing a solder resist ink. The first solder resist layer 30 serves to protect the third conductive trace pattern 28, and the second solder resist layer 31 serves to protect the fourth conductive trace pattern 29.

可以理解的係,對本案第一實施例中之多層線路板進行增層或減層時,只需要於所述疊合基板中增加或減少所述堆疊單元之數量即可,從而即可得到4N+2層線路板,其中,N為大於或者等於1之自然數,所述4N+2層線路板製作方法為:It can be understood that when the multilayer circuit board in the first embodiment of the present invention is layered or reduced, it is only necessary to increase or decrease the number of the stacked units in the laminated substrate, thereby obtaining 4N. +2 layer circuit board, wherein N is a natural number greater than or equal to 1, and the 4N+2 layer circuit board is manufactured by:

首先,提供2N個覆銅基板10,每個所述覆銅基板10包括絕緣層11及貼合於所述絕緣層11相對兩側之第一銅箔層12及第二銅箔層13。First, 2N copper-clad substrates 10 are provided, and each of the copper-clad substrates 10 includes an insulating layer 11 and a first copper foil layer 12 and a second copper foil layer 13 bonded to opposite sides of the insulating layer 11.

其次,將每個所述覆銅基板10之第一銅箔層12製作形成第一導電線路圖形15,將每個所述覆銅基板10之第二銅箔層13製作形成第二導電線路圖形16,且所述第一導電線路圖形15和第二導電線路圖形16通過至少一個導電孔14相互電導通,從而將2N個所述覆銅基板10製成2N個第一線路基板110。Next, the first copper foil layer 12 of each of the copper clad substrates 10 is formed into a first conductive line pattern 15, and the second copper foil layer 13 of each of the copper clad substrates 10 is formed into a second conductive line pattern. 16. The first conductive line pattern 15 and the second conductive line pattern 16 are electrically conducted to each other through at least one conductive via 14 to form 2N of the copper clad substrates 10 into 2N first circuit substrates 110.

再次,於N個所述第一線路基板110中之第一導電線路圖形15表面貼合第一膠片17,於貼合第一膠片17後之N個所述第一線路基板110中之第二導電線路圖形16表面貼合第二膠片18,所述第一膠片17具有至少一個第一通孔19,所述第二膠片18具有至少一個第二通孔20,並於所述至少一個第一通孔19內填充第一導電材料21,所述第一導電材料21與相鄰之第一導電線路圖形15相互電導通,於所述至少一個第二通孔20內填充第二導電材料22,所述第二導電材料22與相鄰之第二導電線路圖形16相互電導通,從而將N個所述第一線路基板110製成N個第二線路基板130。The first film 17 is adhered to the surface of the first conductive circuit pattern 15 of the N first circuit substrates 110, and the second of the N first circuit substrates 110 after the first film 17 is bonded. The surface of the conductive circuit pattern 16 is attached to the second film 18, the first film 17 has at least one first through hole 19, and the second film 18 has at least one second through hole 20, and at least one of the first The first conductive material 21 is electrically connected to the adjacent first conductive line pattern 15 and the second conductive material 22 is filled in the at least one second through hole 20, The second conductive material 22 and the adjacent second conductive line patterns 16 are electrically connected to each other, thereby forming the N first circuit substrates 110 into N second circuit substrates 130.

之後,提供第三膠片25、第一銅箔片23及第二銅箔片24,對齊並堆疊所述第二銅箔片24、N個所述第二線路基板130、剩餘之N個所述第一線路基板110、第三膠片25及所述第一銅箔片23以形成疊合基板,一次壓合所述堆疊基板形成4N+2層線路基板。其中,形成所述疊合基板時,一個第二線路基板130及一個第一線路基板110堆疊形成一個僅有兩個線路基板之堆疊單元,從而得到N個堆疊單元;將所述第三膠片25疊合於所述第一銅箔片23與第二銅箔片24之間;將N個堆疊單元堆疊於所述第二銅箔片24與所述第三膠片25之間,並使每個堆疊單元中之第一線路基板110均較相應之堆疊單元中之第二線路基板130靠近所述第三膠片25,從而獲得所述疊合基板。所述4N+2層線路基板中,相鄰之絕緣層11之間通過第一膠片17或者第二膠片18黏結於一起,相鄰之絕緣層11及第一銅箔片23之間通過第三膠片25黏結於一起,相鄰之絕緣層11及第二銅箔片24之間通過第一膠片17或者第二膠片18黏結於一起,且所述第一銅箔片23和第二銅箔片24位於所述4N+2層線路基板之最外兩側。Thereafter, a third film 25, a first copper foil sheet 23 and a second copper foil sheet 24 are provided, and the second copper foil sheet 24, the N second circuit substrates 130, and the remaining N are aligned and stacked. The first circuit substrate 110, the third film 25, and the first copper foil sheet 23 are formed to form a laminated substrate, and the stacked substrate is pressed at a time to form a 4N+2 layer wiring substrate. Wherein, when the stacked substrate is formed, a second circuit substrate 130 and a first circuit substrate 110 are stacked to form a stacked unit having only two circuit substrates, thereby obtaining N stacked units; and the third film 25 is Laminated between the first copper foil sheet 23 and the second copper foil sheet 24; stacking N stacked units between the second copper foil sheet 24 and the third film 25, and each The first circuit substrate 110 in the stacking unit is closer to the third film 25 than the second circuit substrate 130 in the corresponding stacked unit, thereby obtaining the laminated substrate. In the 4N+2 layer circuit substrate, the adjacent insulating layers 11 are bonded together by the first film 17 or the second film 18, and the adjacent insulating layer 11 and the first copper foil 23 pass the third. The film 25 is bonded together, and the adjacent insulating layer 11 and the second copper foil 24 are bonded together by the first film 17 or the second film 18, and the first copper foil 23 and the second copper foil are bonded together. 24 is located on the outermost sides of the 4N+2 layer circuit substrate.

之後,於所述4N+2層線路基板上形成至少一個盲孔26,使所述盲孔26穿透所述第一銅箔片23及所述第三膠片25,並於所述至少一個盲孔26中填充第三導電材料27,使所述第一銅箔片23和與其相貼之導電線路圖形通過所述第三導電材料27相電導通。Thereafter, at least one blind hole 26 is formed on the 4N+2 layer circuit substrate, so that the blind hole 26 penetrates the first copper foil piece 23 and the third film 25, and is at least one blind The hole 26 is filled with a third conductive material 27 such that the first copper foil piece 23 and the conductive line pattern attached thereto are electrically conducted through the third conductive material 27.

最後,將第一銅箔片23及第二銅箔片24經由選擇性蝕刻製成導電線路圖形,從而獲得4N+2層線路板。Finally, the first copper foil piece 23 and the second copper foil piece 24 are formed into a conductive wiring pattern by selective etching, thereby obtaining a 4N+2 layer wiring board.

另,本案第一實施例提供之所述疊合基板之組成及疊合方式亦可進行調整,例如,可將本案第一實施例之疊合基板中之第二銅箔片24替代為一個第一線路基板110,亦可將本案第一實施例之疊合基板中與所述第二銅箔片24相貼之第二線路基板130替代為一個第三膠片25,具體可參考如下第二及第三實施例之方法進行:In addition, the composition and the overlapping manner of the laminated substrate provided by the first embodiment of the present invention can also be adjusted. For example, the second copper foil 24 in the laminated substrate of the first embodiment of the present invention can be replaced by a first The second circuit substrate 130 of the laminated substrate of the first embodiment of the present invention may be replaced by a second circuit substrate 25, which may be referred to as the following second The method of the third embodiment is carried out:

第二實施例:本實施例用於形成4N+3層線路板,N為大於或者等於1之自然數。本實施例之方法具體為:Second Embodiment: This embodiment is for forming a 4N+3 layer circuit board, and N is a natural number greater than or equal to 1. The method of this embodiment is specifically:

首先,提供2N+1個覆銅基板10,每個所述覆銅基板10包括絕緣層11及貼合於所述絕緣層11相對兩側之第一銅箔層12及第二銅箔層13。First, 2N+1 copper-clad substrates 10 are provided, each of the copper-clad substrates 10 including an insulating layer 11 and a first copper foil layer 12 and a second copper foil layer 13 attached to opposite sides of the insulating layer 11. .

其次,將每個所述覆銅基板10之第一銅箔層12製作形成第一導電線路圖形15,將每個所述覆銅基板10之第二銅箔層13製作形成第二導電線路圖形16,且所述第一導電線路圖形15和第二導電線路圖形16通過至少一個導電孔14相互電導通,從而將2N+1個所述覆銅基板10製成2N+1個第一線路基板110。Next, the first copper foil layer 12 of each of the copper clad substrates 10 is formed into a first conductive line pattern 15, and the second copper foil layer 13 of each of the copper clad substrates 10 is formed into a second conductive line pattern. 16. The first conductive line pattern 15 and the second conductive line pattern 16 are electrically connected to each other through at least one conductive via 14 to form 2N+1 the copper clad substrates 10 into 2N+1 first circuit substrates. 110.

再次,於N個所述第一線路基板110中之第一導電線路圖形15表面貼合第一膠片17,於N個所述第一線路基板110中之第二導電線路圖形16表面貼合第二膠片18,所述第一膠片17具有至少一個第一通孔19,所述第二膠片18具有至少一個第二通孔20,並於所述至少一個第一通孔19內填充第一導電材料21,所述第一導電材料21與相鄰之第一導電線路圖形15相互電導通,於所述至少一個第二通孔20內填充第二導電材料22,所述第二導電材料22與相鄰之第二導電線路圖形16相互電導通,從而將N個所述第一線路基板110製成N個第二線路基板130。The first film 17 is adhered to the surface of the first conductive circuit pattern 15 of the N first circuit substrates 110, and the surface of the second conductive circuit pattern 16 of the N first circuit substrates 110 is attached to the surface. a second film 18 having at least one first through hole 19, the second film 18 having at least one second through hole 20, and filling the at least one first through hole 19 with a first conductive The first conductive material 21 is electrically connected to the adjacent first conductive line pattern 15 , and the second conductive material 22 is filled in the at least one second through hole 20 , and the second conductive material 22 is The adjacent second conductive line patterns 16 are electrically conducted to each other, thereby forming the N first circuit substrates 110 into N second circuit substrates 130.

之後,提供第一銅箔片23及第三膠片25,對齊並堆疊N個所述第二線路基板130、剩餘之N+1個所述第一線路基板110、第三膠片25及所述第一銅箔片23以形成疊合基板,一次壓合所述堆疊基板形成4N+3層線路基板。所述4N+3層線路基板中,相鄰之絕緣層11之間通過第一膠片17或者第二膠片18黏結於一起,相鄰之絕緣層11及第一銅箔片23之間通過第三膠片25黏結於一起,且所述第一銅箔片23和一個所述第一線路基板110位於所述4N+3層線路基板之最外兩側。所述疊合基板可通過如下步驟形成:首先,一個第二線路基板130及一個第一線路基板110堆疊形成一個僅有兩個線路基板之堆疊單元,從而得到N個堆疊單元;其次,將所述第三膠片25疊合於所述第一銅箔片23與所述剩餘之一個第一線路基板110之間;最後,將N個堆疊單元堆疊於所述剩餘之一個第一線路基板110與所述第三膠片25之間,使每個堆疊單元中之第二線路基板130均較相應之堆疊單元中之第一線路基板110靠近所述剩餘之一個第一線路基板110,從而獲得所述疊合基板。Thereafter, a first copper foil piece 23 and a third film 25 are provided, and the N second circuit substrates 130, the remaining N+1 first circuit substrates 110, the third film 25, and the A copper foil piece 23 is formed to form a laminated substrate, and the stacked substrate is pressed at a time to form a 4N+3 layer wiring substrate. In the 4N+3 layer circuit substrate, the adjacent insulating layers 11 are bonded together by the first film 17 or the second film 18, and the adjacent insulating layer 11 and the first copper foil 23 pass the third. The film 25 is bonded together, and the first copper foil piece 23 and one of the first circuit substrates 110 are located on the outermost sides of the 4N+3 layer circuit substrate. The stacked substrate can be formed by: firstly, a second circuit substrate 130 and a first circuit substrate 110 are stacked to form a stacked unit having only two circuit substrates, thereby obtaining N stacked units; secondly, The third film 25 is superposed between the first copper foil piece 23 and the remaining one of the first circuit substrates 110; finally, N stacked units are stacked on the remaining one of the first circuit substrates 110 and Between the third film 25, the second circuit substrate 130 in each stacked unit is closer to the remaining one of the first circuit substrates 110 than the first circuit substrate 110 in the corresponding stacked unit, thereby obtaining the Stack the substrate.

之後,於所述4N+3層線路基板上形成至少一個盲孔,所述至少一個盲孔穿透所述第一銅箔片23及所述第三膠片25,並於所述至少一個盲孔中填充第三導電材料,使所述第一銅箔片23和與其相鄰之導電線路圖形通過與所述第一銅箔片23相鄰之所述第三導電材料相互電導通。Thereafter, at least one blind hole is formed on the 4N+3 layer circuit substrate, and the at least one blind hole penetrates the first copper foil piece 23 and the third film 25, and is in the at least one blind hole The third conductive material is filled in such a manner that the first copper foil piece 23 and the conductive circuit pattern adjacent thereto are electrically conducted to each other through the third conductive material adjacent to the first copper foil piece 23.

最後,將第一銅箔片23經由選擇性蝕刻製成導電線路圖形,從而獲得4N+3層線路板。Finally, the first copper foil piece 23 is formed into a conductive wiring pattern via selective etching, thereby obtaining a 4N+3-layer wiring board.

對本實施例中之多層線路板進行增層或減層時,只需要於所述疊合基板中增加或減少所述堆疊單元之數量即可。When layering or subtracting the multilayer circuit board in this embodiment, it is only necessary to increase or decrease the number of the stacked units in the laminated substrate.

請參閱圖9,以下以N=2時通過第二實施例得到之十一層線路基板200之結構為例對本實施例中之線路基板進行說明。所述十一層線路基板200通過將三個第一線路基板110、兩個第二線路基板130、一個第三膠片25以及一個第一銅箔片23對齊並疊合成一疊合基板,以及一次壓合所述疊合基板後形成之。所述十一層線路基板200中,一個第一線路基板110及第一銅箔片23位於所述十一層線路基板200之最外兩側,且相鄰之絕緣層11之間通過第一膠片17或者第二膠片18黏結於一起,相鄰之絕緣層11及第一銅箔片23之間通過第三膠片25黏結於一起。具體之,所述十一層線路基板200之疊合基板可通過如下方法形成:首先,將一個第二線路基板130及一個第一線路基板110堆疊形成一個僅有兩個線路基板之堆疊單元,從而得到兩個堆疊單元;使所述第一銅箔片23及剩餘之一個第一線路基板110位於所述疊合基板之最外兩側,將所述第三膠片25疊合於所述第一銅箔片23與所述剩餘之一個第一線路基板110之間;將兩個堆疊單元依次堆疊於所述剩餘之一個第一線路基板110與所述第三膠片25之間,並使每個堆疊單元中之第二線路基板130均較相應之堆疊單元中之第一線路基板110靠近所述剩餘之一個第一線路基板110,從而獲得所述疊合基板。Referring to FIG. 9, the circuit board in the present embodiment will be described below by taking the structure of the eleven-layer circuit substrate 200 obtained by the second embodiment as an example of N=2. The eleven-layer circuit substrate 200 is formed by aligning and stacking three first circuit substrates 110, two second circuit substrates 130, a third film 25, and a first copper foil sheet 23 into a stacked substrate, and once. Formed after pressing the laminated substrate. In the eleven-layer circuit substrate 200, a first circuit substrate 110 and a first copper foil 23 are located on the outermost sides of the eleven-layer circuit substrate 200, and the adjacent insulating layers 11 pass the first The film 17 or the second film 18 is bonded together, and the adjacent insulating layer 11 and the first copper foil 23 are bonded together by the third film 25. Specifically, the stacked substrate of the eleven-layer circuit substrate 200 can be formed by first stacking a second circuit substrate 130 and a first circuit substrate 110 to form a stacked unit having only two circuit substrates. Thereby obtaining two stacking units; the first copper foil piece 23 and the remaining one of the first circuit substrates 110 are located on the outermost sides of the laminated substrate, and the third film 25 is superposed on the first a copper foil 23 is interposed between the remaining one of the first circuit substrates 110; two stacked units are sequentially stacked between the remaining one of the first circuit substrate 110 and the third film 25, and each The second circuit substrate 130 of each of the stacked units is closer to the remaining one of the first circuit substrates 110 than the first one of the corresponding ones of the stacked units, thereby obtaining the laminated substrate.

第三實施例:本實施例用於形成4N+4層線路板,N為大於或者等於1之自然數。本實施例之方法具體為:Third Embodiment: This embodiment is for forming a 4N+4 layer circuit board, and N is a natural number greater than or equal to 1. The method of this embodiment is specifically:

首先,提供2N+1個覆銅基板10,每個所述覆銅基板10包括絕緣層11及貼合於所述絕緣層11相對兩側之第一銅箔層12及第二銅箔層13。First, 2N+1 copper-clad substrates 10 are provided, each of the copper-clad substrates 10 including an insulating layer 11 and a first copper foil layer 12 and a second copper foil layer 13 attached to opposite sides of the insulating layer 11. .

其次,將每個所述覆銅基板10之第一銅箔層12製作形成第一導電線路圖形15,將每個所述覆銅基板10之第二銅箔層13製作形成第二導電線路圖形16,且所述第一導電線路圖形15和第二導電線路圖形16通過至少一個導電孔14相互電導通,從而將2N+1個所述覆銅基板10製成2N+1個第一線路基板110。Next, the first copper foil layer 12 of each of the copper clad substrates 10 is formed into a first conductive line pattern 15, and the second copper foil layer 13 of each of the copper clad substrates 10 is formed into a second conductive line pattern. 16. The first conductive line pattern 15 and the second conductive line pattern 16 are electrically connected to each other through at least one conductive via 14 to form 2N+1 the copper clad substrates 10 into 2N+1 first circuit substrates. 110.

再次,於N個所述第一線路基板110中之第一導電線路圖形15表面貼合第一膠片17,於N個所述第一線路基板110中之第二導電線路圖形16表面貼合第二膠片18,所述第一膠片17具有至少一個第一通孔19,所述第二膠片18具有至少一個第二通孔20,並於所述至少一個第一通孔19內填充第一導電材料21,所述第一導電材料21與相鄰之第一導電線路圖形15相互電導通,於所述至少一個第二通孔20內填充第二導電材料22,所述第二導電材料22與相鄰之第二導電線路圖形16相互電導通,從而將N個所述第一線路基板110製成N個第二線路基板130。The first film 17 is adhered to the surface of the first conductive circuit pattern 15 of the N first circuit substrates 110, and the surface of the second conductive circuit pattern 16 of the N first circuit substrates 110 is attached to the surface. a second film 18 having at least one first through hole 19, the second film 18 having at least one second through hole 20, and filling the at least one first through hole 19 with a first conductive The first conductive material 21 is electrically connected to the adjacent first conductive line pattern 15 , and the second conductive material 22 is filled in the at least one second through hole 20 , and the second conductive material 22 is The adjacent second conductive line patterns 16 are electrically conducted to each other, thereby forming the N first circuit substrates 110 into N second circuit substrates 130.

之後,提供第一銅箔片23、第二銅箔片24、第三膠片25及第四膠片32,對齊並堆疊N個所述第二線路基板130、剩餘之N+1個所述第一線路基板110、所述第三膠片25、所述第四膠片32、所述第一銅箔片23及所述第二銅箔片24以形成疊合基板,一次壓合所述堆疊基板形成4N+4層線路基板。所述4N+4層線路基板中,相鄰之絕緣層11之間通過第一膠片17或者第二膠片18黏結於一起,相鄰之絕緣層11與第一銅箔片23之間通過所述第三膠片25黏結於一起,相鄰之絕緣層11與第二銅箔片24之間通過所述第四膠片32黏結於一起,且所述第一銅箔片23和第二銅箔片24位於所述4N+4層線路基板之最外兩側。所述疊合基板可通過以下方法形成:首先,一個第二線路基板130及一個第一線路基板110堆疊形成一個僅有兩個線路基板之堆疊單元,從而得到N個堆疊單元;其次,將所述第三膠片25及第四膠片32依次疊合於所述第一銅箔片23與所述第二銅箔片24之間,使第三膠片25與第一銅箔片23相貼;接著,將剩餘之一個第一線路基板110疊合於所述第三膠片25及第四膠片32之間;最後,將N個堆疊單元堆疊於所述剩餘之一個第一線路基板110與所述第四膠片32之間,並使每個堆疊單元中之第二線路基板130均較相應之堆疊單元中之第一線路基板110靠近所述剩餘之一個第一線路基板110,從而獲得所述疊合基板。Thereafter, a first copper foil piece 23, a second copper foil piece 24, a third film 25, and a fourth film 32 are provided, and N of the second circuit substrates 130 are aligned and stacked, and the remaining N+1 of the first a circuit substrate 110, the third film 25, the fourth film 32, the first copper foil piece 23 and the second copper foil piece 24 to form a laminated substrate, and the stacked substrate is pressed at a time to form a 4N +4 layer circuit board. In the 4N+4 layer circuit substrate, the adjacent insulating layers 11 are bonded together by the first film 17 or the second film 18, and the adjacent insulating layer 11 and the first copper foil 23 pass the The third film 25 is bonded together, and the adjacent insulating layer 11 and the second copper foil 24 are bonded together by the fourth film 32, and the first copper foil 23 and the second copper foil 24 are bonded together. Located on the outermost sides of the 4N+4 layer circuit substrate. The stacked substrate can be formed by: firstly, a second circuit substrate 130 and a first circuit substrate 110 are stacked to form a stacked unit having only two circuit substrates, thereby obtaining N stacked units; secondly, The third film 25 and the fourth film 32 are sequentially laminated between the first copper foil piece 23 and the second copper foil piece 24, so that the third film 25 is attached to the first copper foil piece 23; And stacking the remaining one of the first circuit substrates 110 between the third film 25 and the fourth film 32; finally, stacking the N stacked cells on the remaining one of the first circuit substrates 110 and the first Between the four films 32, and the second circuit substrate 130 in each stacked unit is closer to the remaining one of the first circuit substrates 110 than the first one of the corresponding stacked units 110, thereby obtaining the superposition Substrate.

之後,於所述4N+4層線路基板之兩側分別形成至少一個第一盲孔及至少一個第二盲孔,至少一個第一盲孔穿透所述第一銅箔片23及與所述第一銅箔片23相貼之所述第三膠片25,至少一個第二盲孔穿透所述第二銅箔片24及與所述第二銅箔片24相貼之所述第四膠片32,並於每個盲孔中填充第三導電材料,使所述第一銅箔片23和與其相鄰之導電線路圖形通過與所述第一銅箔片23相鄰之第三導電材料相互電導通,所述第二銅箔片24和與其相鄰之導電線路圖形通過與所述第二銅箔片24相鄰之所述第三導電材料相互電導通;最後,將第一銅箔片23及第二銅箔片24經由選擇性蝕刻製成導電線路圖形,從而獲得4N+4層線路板。Thereafter, at least one first blind hole and at least one second blind hole are respectively formed on two sides of the 4N+4 layer circuit substrate, and at least one first blind hole penetrates the first copper foil piece 23 and The third film 25 to which the first copper foil 23 is attached, at least one second blind hole penetrating the second copper foil 24 and the fourth film attached to the second copper foil 24 32, and filling a third conductive material in each of the blind holes, so that the first copper foil 23 and the conductive circuit pattern adjacent thereto pass through the third conductive material adjacent to the first copper foil 23 Electrically conducting, the second copper foil sheet 24 and the conductive circuit pattern adjacent thereto are electrically connected to each other through the third conductive material adjacent to the second copper foil sheet 24; finally, the first copper foil sheet is 23 and the second copper foil sheet 24 are formed into a conductive wiring pattern by selective etching, thereby obtaining a 4N+4 layer wiring board.

對本實施例中之多層線路板進行增層或減層時,只需要於所述疊合基板中增加或減少所述堆疊單元之數量即可。When layering or subtracting the multilayer circuit board in this embodiment, it is only necessary to increase or decrease the number of the stacked units in the laminated substrate.

請參閱圖10,以下以N=2時通過第三實施例得到之十二層線路基板220之結構為例對本實施例中之線路基板進行說明。所述十二層線路基板220通過將三個第一線路基板110、兩個第二線路基板130、第三膠片25、第四膠片32、一個第一銅箔片23以及一個第二銅箔片24對齊並疊合成一疊合基板,以及一次壓合所述疊合基板後形成之。所述十二層線路基板220中,第一銅箔片23及第二銅箔片24位於所述十二層線路基板220之最外兩側,相鄰之絕緣層11與第一銅箔片23之間通過所述第三膠片25黏結於一起,相鄰之絕緣層11與第二銅箔片24之間通過所述第四膠片32黏結於一起。具體之,所述十二層線路基板220之疊合基板可通過如下方法形成:首先,一個第二線路基板130及一個第一線路基板110堆疊形成一個僅有兩個線路基板之堆疊單元,從而得到N個堆疊單元;其次,將所述第三膠片25及第四膠片32依次疊合於所述第一銅箔片23與所述第二銅箔片24之間,使第三膠片25與第一銅箔片23相貼;接著,將剩餘之一個第一線路基板110疊合於所述第三膠片25及第四膠片32之間;最後,將N個堆疊單元堆疊於剩餘之一個所述第一線路基板110與所述第四膠片32之間,並使每個堆疊單元中之第二線路基板130均較相應之堆疊單元中之第一線路基板110靠近剩餘之一個所述第一線路基板110,從而獲得所述疊合基板。Referring to FIG. 10, the circuit board in this embodiment will be described below by taking the structure of the twelve-layer circuit substrate 220 obtained by the third embodiment as an example of N=2. The twelve-layer circuit substrate 220 passes three first circuit substrates 110, two second circuit substrates 130, a third film 25, a fourth film 32, a first copper foil 23, and a second copper foil. 24 is aligned and stacked to form a laminated substrate, and formed by pressing the laminated substrate once. In the twelve-layer circuit substrate 220, the first copper foil piece 23 and the second copper foil piece 24 are located on the outermost sides of the twelve-layer circuit substrate 220, and the adjacent insulating layer 11 and the first copper foil piece The third film 25 is bonded together by the third film 25, and the adjacent insulating layer 11 and the second copper foil piece 24 are bonded together by the fourth film 32. Specifically, the stacked substrate of the twelve-layer circuit substrate 220 can be formed by: firstly, a second circuit substrate 130 and a first circuit substrate 110 are stacked to form a stacked unit having only two circuit substrates, thereby N stacking units are obtained; secondly, the third film 25 and the fourth film 32 are sequentially laminated between the first copper foil sheet 23 and the second copper foil sheet 24, so that the third film 25 is The first copper foil sheet 23 is attached; then, the remaining one of the first circuit substrates 110 is superposed between the third film 25 and the fourth film 32; finally, the N stacked units are stacked on the remaining one. Between the first circuit substrate 110 and the fourth film 32, and the second circuit substrate 130 in each of the stacked units is closer to the remaining one of the first circuit substrates 110 in the corresponding stacked unit. The wiring substrate 110 is obtained to obtain the laminated substrate.

可以理解的係,上述第二至第三實施例形成之疊合基板於進行一次壓合以及將銅箔形成導電線路圖形(如果有此步驟)之後,還可包括於壓合後從兩側露出之導電線路圖形表面形成防焊層之步驟。It can be understood that the laminated substrates formed by the second to third embodiments described above may be exposed to both sides after being pressed and formed into a conductive pattern (if any). The step of forming a solder resist layer on the surface of the conductive line pattern.

當然,亦可不限於上述第一至第三實施例之排布。Of course, it is not limited to the arrangement of the first to third embodiments described above.

本技術方案提供之多層線路板製作方法,同時製作多個線路基板,然後通過貼合之方式於部分線路基板之兩個表面形成膠片,並於膠片內形成通孔並形成有導電材料。這樣,根據需要,堆疊銅箔、貼合有膠片和導電材料之線路基板和膠片,從而通過一次壓合便可得到多層線路板。由於多個線路基板可同時進行製作,從而可縮短線路板製作之時間。由於各線路基板分別單獨製作,相較於先前技術中逐層疊加之方式,能夠提高線路板製作之良率。The multi-layer circuit board manufacturing method provided by the technical solution simultaneously manufactures a plurality of circuit substrates, and then forms a film on two surfaces of a part of the circuit substrate by bonding, and forms a through hole in the film and forms a conductive material. Thus, as needed, the copper foil, the wiring substrate to which the film and the conductive material are bonded, and the film are stacked, so that the multilayer wiring board can be obtained by one press-fitting. Since a plurality of circuit substrates can be simultaneously fabricated, the time for circuit board fabrication can be shortened. Since each circuit substrate is separately fabricated, the yield of the circuit board can be improved compared to the layer-by-layer stacking method in the prior art.

惟,以上所述者僅為本發明之較佳實施方式,自不能以此限制本案之申請專利範圍。舉凡熟悉本案技藝之人士援依本發明之精神所作之等效修飾或變化,皆應涵蓋於以下申請專利範圍內。However, the above description is only a preferred embodiment of the present invention, and it is not possible to limit the scope of the patent application of the present invention. Equivalent modifications or variations made by persons skilled in the art in light of the spirit of the invention are intended to be included within the scope of the following claims.

10...覆銅基板10. . . Copper clad substrate

11...絕緣層11. . . Insulation

12...第一銅箔層12. . . First copper foil layer

13...第二銅箔層13. . . Second copper foil layer

14...導電孔14. . . Conductive hole

15...第一導電線路圖形15. . . First conductive line pattern

16...第二導電線路圖形16. . . Second conductive line pattern

110...第一線路基板110. . . First circuit substrate

17...第一膠片17. . . First film

18...第二膠片18. . . Second film

19...第一通孔19. . . First through hole

20...第二通孔20. . . Second through hole

21...第一導電材料twenty one. . . First conductive material

22...第二導電材料twenty two. . . Second conductive material

130...第二線路基板130. . . Second circuit substrate

23...第一銅箔片twenty three. . . First copper foil

24...第二銅箔片twenty four. . . Second copper foil

25...第三膠片25. . . Third film

32...第四膠片32. . . Fourth film

140...十層線路基板140. . . Ten-layer circuit substrate

26...盲孔26. . . Blind hole

27...第三導電材料27. . . Third conductive material

28...第三導電線路圖形28. . . Third conductive line pattern

29...第四導電線路圖形29. . . Fourth conductive line pattern

30...第一防焊層30. . . First solder mask

31...第二防焊層31. . . Second solder mask

100...十層線路板100. . . Ten-layer circuit board

200...十一層線路基板200. . . Eleven-layer circuit substrate

220...十二層線路基板220. . . Twelve-layer circuit substrate

圖1係本技術方案第一實施例提供之覆銅基板之剖面示意圖。1 is a schematic cross-sectional view of a copper clad substrate provided by a first embodiment of the present technical solution.

圖2係本技術方案第一實施例提供之於圖1中之覆銅基板上形成導電孔、第一導電線路圖形及第二導電線路圖形後所形成之第一線路基板之剖面示意圖。2 is a schematic cross-sectional view showing a first circuit substrate formed by forming a conductive hole, a first conductive line pattern, and a second conductive line pattern on the copper-clad substrate of FIG. 1 according to the first embodiment of the present invention.

圖3係本技術方案第一實施例提供之第二線路基板之剖面示意圖。FIG. 3 is a schematic cross-sectional view showing a second circuit substrate according to the first embodiment of the present technical solution.

圖4係本技術方案第一實施例提供之於壓合一個第一銅箔片、一個第二線路基板、一個第一線路基板、另一個第二線路基板、另一個第一線路基板、一個第三膠片及一個第二銅箔片後所形成之十層線路基板之剖面示意圖。4 is a first embodiment of the present invention for pressing a first copper foil, a second circuit substrate, a first circuit substrate, another second circuit substrate, another first circuit substrate, and a first A schematic cross-sectional view of a ten-layer circuit substrate formed after three films and a second copper foil.

圖5係本技術方案第一實施例提供之於十層線路基板上形成穿透第一銅箔片及第三膠片之盲孔後之剖面示意圖。FIG. 5 is a cross-sectional view showing the first embodiment of the present invention after forming a blind via hole penetrating the first copper foil and the third film on the ten-layer circuit substrate.

圖6係本技術方案第一實施例提供之於十層線路基板上形成之盲孔中填充導電材料後之剖面示意圖。FIG. 6 is a schematic cross-sectional view showing the filling of a conductive material in a blind via formed on a ten-layer circuit substrate according to the first embodiment of the present invention.

圖7係本技術方案第一實施例提供之將圖6中之第一銅箔片製作形成第三導電線路圖形,將第二銅箔片製作形成第四導電線路圖形後之剖面示意圖。FIG. 7 is a cross-sectional view showing the first copper foil sheet of FIG. 6 formed into a third conductive line pattern and the second copper foil sheet being formed into a fourth conductive line pattern according to the first embodiment of the present technical solution.

圖8係本技術方案第一實施例提供之於圖7中之第三導電線路圖形上形成第一防焊層,於第四導電線路圖形上形成第二防焊層後所形成之十層線路板之剖面示意圖。8 is a ten-layer line formed by forming a first solder resist layer on the third conductive trace pattern in FIG. 7 and forming a second solder resist layer on the fourth conductive trace pattern in the first embodiment of the present technical solution. Schematic diagram of the board.

圖9係本技術方案提供之N=2時通過第二實施例得到之十一層線路基板之結構示意圖。FIG. 9 is a schematic structural view of an eleven-layer circuit substrate obtained by the second embodiment when N=2 provided by the technical solution.

圖10係本技術方案提供之N=2時通過第三實施例得到之十二層線路基板之結構示意圖。FIG. 10 is a schematic structural view of a twelve-layer circuit substrate obtained by the third embodiment when N=2 provided by the technical solution.

110...第一線路基板110. . . First circuit substrate

130...第二線路基板130. . . Second circuit substrate

25...第三膠片25. . . Third film

26...盲孔26. . . Blind hole

27...第三導電材料27. . . Third conductive material

28...第三導電線路圖形28. . . Third conductive line pattern

29...第四導電線路圖形29. . . Fourth conductive line pattern

Claims (13)

一種多層線路板之製作方法,包括步驟:
提供2N個覆銅基板,其中,N為大於或者等於1之自然數,每個所述覆銅基板包括絕緣層及貼合於所述絕緣層相對兩側之第一銅箔層及第二銅箔層;
將每個所述覆銅基板之第一銅箔層製作形成第一導電線路圖形,將每個所述覆銅基板之第二銅箔層製作形成第二導電線路圖形,從而將2N個所述覆銅基板製成2N個第一線路基板;
於2N個所述第一線路基板中取N個第一線路基板,於N個所述第一線路基板中之每個第一線路基板之第一導電線路圖形表面貼合第一膠片,於N個所述第一線路基板中之每個第一線路基板之第二導電線路圖形表面貼合第二膠片,所述第一膠片具有至少一個第一通孔,所述第二膠片具有至少一個第二通孔,並於所述至少一個第一通孔內填充第一導電材料,所述第一導電材料與相鄰之第一導電線路圖形相互電導通,於所述至少一個第二通孔內填充第二導電材料,所述第二導電材料與相鄰之第二導電線路圖形相互電導通,從而將N個所述第一線路基板製成N個第二線路基板;
提供第三膠片、第一銅箔片及第二銅箔片,並一次壓合所述第二銅箔片、N個所述第二線路基板、剩餘之N個所述第一線路基板、第三膠片及所述第一銅箔片以形成4N+2層線路基板,於所述4N+2層線路基板中,相鄰之絕緣層之間通過第一膠片或者第二膠片黏結於一起,相鄰之絕緣層及第一銅箔片之間通過第三膠片黏結於一起,相鄰之絕緣層及第二銅箔片之間通過第一膠片或者第二膠片黏結於一起,且所述第一銅箔片和第二銅箔片位於所述4N+2層線路基板之最外兩側;
於所述4N+2層線路基板上形成至少一個盲孔,所述至少一個盲孔穿透所述第一銅箔片及所述第三膠片,並於所述至少一個盲孔中填充第三導電材料,使所述第一銅箔片和與其相鄰之導電線路圖形通過所述第三導電材料相互電導通;以及
將所述第一銅箔片及第二銅箔片經由選擇性蝕刻製成導電線路圖形,從而獲得4N+2層線路板。
A method for manufacturing a multilayer circuit board, comprising the steps of:
Providing 2N copper-clad substrates, wherein N is a natural number greater than or equal to 1, each of the copper-clad substrates includes an insulating layer and a first copper foil layer and a second copper attached to opposite sides of the insulating layer Foil layer
Forming a first conductive line pattern on the first copper foil layer of each of the copper-clad substrates, and forming a second conductive line pattern on each of the copper-clad substrates, thereby forming 2N Making a 2N first circuit substrate by using a copper clad substrate;
N first first circuit substrates are taken from the 2N first circuit substrates, and the first conductive film pattern surface of each of the N first circuit substrates is bonded to the first film. a second conductive line pattern surface of each of the first circuit substrates is attached to the second film, the first film has at least one first through hole, and the second film has at least one a second via hole, and filling the at least one first via hole with a first conductive material, wherein the first conductive material and the adjacent first conductive line pattern are electrically connected to each other, and the at least one second through hole is Filling a second conductive material, the second conductive material and the adjacent second conductive line pattern are electrically connected to each other, thereby forming N first circuit substrates into N second circuit substrates;
Providing a third film, a first copper foil and a second copper foil, and pressing the second copper foil, the N second circuit substrates, and the remaining N first circuit substrates, a third film and the first copper foil to form a 4N+2 layer circuit substrate. In the 4N+2 layer circuit substrate, adjacent insulating layers are bonded together by a first film or a second film. The adjacent insulating layer and the first copper foil are bonded together through the third film, and the adjacent insulating layer and the second copper foil are bonded together by the first film or the second film, and the first a copper foil piece and a second copper foil piece are located on outermost sides of the 4N+2 layer circuit substrate;
Forming at least one blind hole on the 4N+2 layer circuit substrate, the at least one blind hole penetrating the first copper foil piece and the third film, and filling the third at least one blind hole a conductive material, the first copper foil and a conductive circuit pattern adjacent thereto are electrically connected to each other through the third conductive material; and the first copper foil and the second copper foil are selectively etched A conductive line pattern is obtained to obtain a 4N+2 layer circuit board.
如請求項1所述之多層線路板之製作方法,其中,於將每個所述覆銅基板之第一銅箔層製作形成第一導電線路圖形,將每個所述覆銅基板之第二銅箔層製作形成第二導電線路圖形時,還於覆銅基板內製作形成至少一個導電孔,使得所述第一導電線路圖形和第二導電線路圖形通過所述至少一個導電孔相互電導通。The method for fabricating a multilayer circuit board according to claim 1, wherein the first copper foil layer of each of the copper-clad substrates is formed into a first conductive line pattern, and the second copper-clad substrate is second. When the copper foil layer is formed to form the second conductive line pattern, at least one conductive hole is formed in the copper clad substrate, so that the first conductive line pattern and the second conductive line pattern are electrically connected to each other through the at least one conductive hole. 如請求項1所述之多層線路板之製作方法,其中,於壓合所述第二銅箔片、N個所述第二線路基板、剩餘之N個所述第一線路基板、第三膠片及所述第一銅箔片以形成4N+2層線路基板之前,對齊並堆疊所述第二銅箔片、N個所述第二線路基板、剩餘之N個所述第一線路基板、第三膠片及所述第一銅箔片以形成疊合基板,所述疊合基板之形成方法包括步驟:
將一個第二線路基板及一個第一線路基板堆疊形成一個僅有兩個線路基板之堆疊單元,從而得到N個堆疊單元;
將所述第三膠片疊合於所述第一銅箔片與第二銅箔片之間;以及
將N個堆疊單元堆疊於所述第二銅箔片與所述第三膠片之間,並使每個堆疊單元中之第一線路基板均較相應之堆疊單元中之第二線路基板靠近所述第三膠片,從而獲得所述疊合基板。
The method for fabricating a multilayer circuit board according to claim 1, wherein the second copper foil, the N second circuit substrates, and the remaining N first circuit substrates and third films are pressed together And aligning and stacking the second copper foil, the N of the second circuit substrates, and the remaining N of the first circuit substrates, and the first copper foil to form a 4N+2 layer circuit substrate a three-film and the first copper foil to form a laminated substrate, and the method for forming the laminated substrate comprises the steps of:
Stacking a second circuit substrate and a first circuit substrate to form a stacking unit having only two circuit substrates, thereby obtaining N stacked units;
Laminating the third film between the first copper foil sheet and the second copper foil sheet; and stacking N stacked units between the second copper foil sheet and the third film, and The first circuit substrate in each of the stacked units is brought closer to the third film than the second one of the corresponding stacked units, thereby obtaining the laminated substrate.
如請求項1所述之多層線路板之製作方法,其中,將N個第一線路基板製成N個第二線路基板包括步驟:
於N個所述第一線路基板中之每個第一導電線路圖形上依次疊合所述第一膠片和一個離型膜,於N個所述第一線路基板中之每個第二導電線路圖形表面貼合所述第二膠片和另一個離型膜;
預壓合所述第一線路基板、第一膠片、第二膠片及兩個離型膜,使所述第一膠片和第二膠片黏結於所述第一線路基板之兩側;
去除所述兩個離型膜;
通過雷射鑽孔工藝於所述第一膠片中形成所述至少一個第一通孔,部分第一導電線路圖形從所述至少一個第一通孔中露出,通過雷射鑽孔工藝於所述第二膠片中形成所述至少一個第二通孔,部分第二導電線路圖形從所述至少一個第二通孔中露出;以及
通過印刷導電膏之方式於所述至少一個第一通孔內形成第一導電材料,通過印刷導電膏之方式於所述至少一個第二通孔內形成第二導電材料。
The method for fabricating a multilayer circuit board according to claim 1, wherein the forming the N first circuit substrates into the N second circuit substrates comprises the steps of:
And sequentially bonding the first film and a release film on each of the N first circuit substrates, and each of the N first circuit substrates The graphic surface is attached to the second film and the other release film;
Pre-compressing the first circuit substrate, the first film, the second film and the two release films to bond the first film and the second film to both sides of the first circuit substrate;
Removing the two release films;
Forming the at least one first via hole in the first film by a laser drilling process, a portion of the first conductive trace pattern being exposed from the at least one first via hole, by the laser drilling process Forming the at least one second via hole in the second film, a portion of the second conductive trace pattern is exposed from the at least one second via hole; and forming the conductive paste into the at least one first via hole The first conductive material forms a second conductive material in the at least one second via hole by printing a conductive paste.
一種多層線路板之製作方法,包括步驟:
提供2N+1個覆銅基板,其中,N為大於或者等於1之自然數,每個所述覆銅基板包括絕緣層及貼合於所述絕緣層相對兩側之第一銅箔層及第二銅箔層;
將每個所述覆銅基板之第一銅箔層製作形成第一導電線路圖形,將每個所述覆銅基板之第二銅箔層製作形成第二導電線路圖形,從而將2N+1個所述覆銅基板製成2N+1個第一線路基板;
於2N+1個所述第一線路基板中取N個第一線路基板,於N個所述第一線路基板中之每個第一線路基板之第一導電線路圖形表面貼合第一膠片,於N個所述第一線路基板中之每個第一線路基板之第二導電線路圖形表面貼合第二膠片,所述第一膠片具有至少一個第一通孔,所述第二膠片具有至少一個第二通孔,並於所述至少一個第一通孔內填充第一導電材料,所述第一導電材料與相鄰之第一導電線路圖形相互電導通,於所述至少一個第二通孔內填充第二導電材料,所述第二導電材料與相鄰之第二導電線路圖形相互電導通,從而將N個所述第一線路基板製成N個第二線路基板;
提供第三膠片及第一銅箔片,並一次壓合所述第一銅箔片、N個所述第二線路基板、剩餘之N+1個所述第一線路基板及第三膠片以形成4N+3層線路基板,於所述4N+3層線路基板中,相鄰之絕緣層之間通過第一膠片或者第二膠片黏結於一起,相鄰之絕緣層及第一銅箔片之間通過第三膠片黏結於一起,且所述第一銅箔片和一個所述第一線路基板位於所述4N+3層線路基板之最外兩側;
於所述4N+3層線路基板上形成至少一個盲孔,所述至少一個盲孔穿透所述第一銅箔片及所述第三膠片,並於所述至少一個盲孔中填充第三導電材料,使所述第一銅箔片和與其相鄰之導電線路圖形通過所述第三導電材料相互電導通;以及
將所述第一銅箔片經由選擇性蝕刻製成導電線路圖形,從而獲得4N+3層線路板。
A method for manufacturing a multilayer circuit board, comprising the steps of:
Providing 2N+1 copper-clad substrates, wherein N is a natural number greater than or equal to 1, each of the copper-clad substrates includes an insulating layer and a first copper foil layer attached to opposite sides of the insulating layer and Two copper foil layers;
Forming a first conductive line pattern on the first copper foil layer of each of the copper-clad substrates, and forming a second conductive line pattern on the second copper foil layer of each of the copper-clad substrates, thereby 2N+1 The copper-clad substrate is made into 2N+1 first circuit substrates;
N first first circuit substrates are taken from the 2N+1 first circuit substrates, and the first conductive film pattern surface of each of the N first circuit substrates is attached to the first film. Forming a second film on a surface of the second conductive line pattern of each of the N first circuit substrates, the first film having at least one first through hole, the second film having at least a second via hole, and filling the at least one first via hole with a first conductive material, wherein the first conductive material and the adjacent first conductive line pattern are electrically connected to each other, and the at least one second pass The hole is filled with a second conductive material, and the second conductive material and the adjacent second conductive line pattern are electrically connected to each other, thereby forming N first circuit substrates into N second circuit substrates;
Providing a third film and a first copper foil, and pressing the first copper foil, the N second circuit substrates, and the remaining N+1 of the first circuit substrate and the third film at a time to form 4N+3 layer circuit substrate, in the 4N+3 layer circuit substrate, adjacent insulating layers are bonded together by the first film or the second film, and between the adjacent insulating layer and the first copper foil Bonding together through the third film, and the first copper foil and one of the first circuit substrates are located on the outermost sides of the 4N+3 layer circuit substrate;
Forming at least one blind hole on the 4N+3 layer circuit substrate, the at least one blind hole penetrating the first copper foil piece and the third film, and filling the third at least one blind hole a conductive material, the first copper foil and a conductive circuit pattern adjacent thereto are electrically connected to each other through the third conductive material; and the first copper foil is electrically etched by selective etching, thereby Get a 4N+3 layer board.
如請求項5所述之多層線路板之製作方法,其中,於將每個所述覆銅基板之第一銅箔層製作形成第一導電線路圖形,將每個所述覆銅基板之第二銅箔層製作形成第二導電線路圖形時,還於覆銅基板內製作形成至少一個導電孔,使得所述第一導電線路圖形和第二導電線路圖形通過所述至少一個導電孔相互電導通。The method of fabricating a multilayer circuit board according to claim 5, wherein the first copper foil layer of each of the copper-clad substrates is formed into a first conductive line pattern, and the second copper-clad board is second. When the copper foil layer is formed to form the second conductive line pattern, at least one conductive hole is formed in the copper clad substrate, so that the first conductive line pattern and the second conductive line pattern are electrically connected to each other through the at least one conductive hole. 如請求項5所述之多層線路板之製作方法,其中,於壓合所述第一銅箔片、N個所述第二線路基板、剩餘之N+1個所述第一線路基板及第三膠片以形成4N+3層線路基板之前,對齊並堆疊所述第一銅箔片、N個所述第二線路基板、剩餘之N+1個所述第一線路基板及第三膠片以形成疊合基板,所述疊合基板之形成方法包括步驟:
將一個第二線路基板及一個第一線路基板堆疊形成一個僅有兩個線路基板之堆疊單元,從而得到N個堆疊單元;
將所述第三膠片疊合於所述第一銅箔片與所述剩餘之一個第一線路基板之間;以及
將N個堆疊單元堆疊於所述第三膠片與所述剩餘之一個第一線路基板之間,並使每個堆疊單元中之第二線路基板均較相應之堆疊單元中之第一線路基板靠近所述剩餘之一個第一線路基板,從而獲得所述疊合基板。
The method of fabricating a multilayer circuit board according to claim 5, wherein the first copper foil, the N second circuit substrates, and the remaining N+1 of the first circuit substrates and the first Before forming the 4N+3 layer circuit substrate, aligning and stacking the first copper foil, the N second circuit substrates, and the remaining N+1 of the first circuit substrate and the third film to form The laminated substrate, the method for forming the laminated substrate comprises the steps of:
Stacking a second circuit substrate and a first circuit substrate to form a stacking unit having only two circuit substrates, thereby obtaining N stacked units;
Laminating the third film between the first copper foil and the remaining one of the first circuit substrates; and stacking N stacked units on the third film and the remaining one Between the circuit substrates, and the second circuit substrate in each of the stacked units is closer to the remaining one of the first circuit substrates than the first one of the corresponding stacked units, thereby obtaining the stacked substrate.
如請求項5所述之多層線路板之製作方法,其中,將N個第一線路基板製成N個第二線路基板包括步驟:
於N個所述第一線路基板中之每個第一導電線路圖形上依次疊合所述第一膠片和一個離型膜,於N個所述第一線路基板中之每個第二導電線路圖形表面貼合所述第二膠片和另一個離型膜;
預壓合所述第一線路基板、第一膠片、第二膠片及兩個離型膜,使所述第一膠片和第二膠片黏結於所述第一線路基板之兩側;
去除所述兩個離型膜;
通過雷射鑽孔工藝於所述第一膠片中形成所述至少一個第一通孔,部分第一導電線路圖形從所述至少一個第一通孔中露出,通過雷射鑽孔工藝於所述第二膠片中形成所述至少一個第二通孔,部分第二導電線路圖形從所述至少一個第二通孔中露出;以及
通過印刷導電膏之方式於所述至少一個第一通孔內形成第一導電材料,通過印刷導電膏之方式於所述至少一個第二通孔內形成第二導電材料。
The method for fabricating a multilayer circuit board according to claim 5, wherein the forming the N first circuit substrates into the N second circuit substrates comprises the steps of:
And sequentially bonding the first film and a release film on each of the N first circuit substrates, and each of the N first circuit substrates The graphic surface is attached to the second film and the other release film;
Pre-compressing the first circuit substrate, the first film, the second film and the two release films to bond the first film and the second film to both sides of the first circuit substrate;
Removing the two release films;
Forming the at least one first via hole in the first film by a laser drilling process, a portion of the first conductive trace pattern being exposed from the at least one first via hole, by the laser drilling process Forming the at least one second via hole in the second film, a portion of the second conductive trace pattern is exposed from the at least one second via hole; and forming the conductive paste into the at least one first via hole The first conductive material forms a second conductive material in the at least one second via hole by printing a conductive paste.
一種多層線路板之製作方法,包括步驟:
提供2N+1個覆銅基板,其中,N為大於或者等於1之自然數,每個所述覆銅基板包括絕緣層及貼合於所述絕緣層相對兩側之第一銅箔層及第二銅箔層;
將每個所述覆銅基板之第一銅箔層製作形成第一導電線路圖形,將每個所述覆銅基板之第二銅箔層製作形成第二導電線路圖形,從而將2N+1個所述覆銅基板製成2N+1個第一線路基板;
於2N+1個所述第一線路基板中取N個第一線路基板,於N個所述第一線路基板中之每個第一線路基板之第一導電線路圖形表面貼合第一膠片,於N個所述第一線路基板中之每個第一線路基板之第二導電線路圖形表面貼合第二膠片,所述第一膠片具有至少一個第一通孔,所述第二膠片具有至少一個第二通孔,並於所述至少一個第一通孔內填充第一導電材料,所述第一導電材料與相鄰之第一導電線路圖形相互電導通,於所述至少一個第二通孔內填充第二導電材料,所述第二導電材料與相鄰之第二導電線路圖形相互電導通,從而將N個所述第一線路基板製成N個第二線路基板;
提供第三膠片、第四膠片、第一銅箔片及第二銅箔片,並一次壓合所述第二銅箔片、N個所述第二線路基板、剩餘之N+1個所述第一線路基板、第三膠片、第四膠片及所述第一銅箔片以形成4N+4層線路基板,於所述4N+4層線路板中,相鄰之絕緣層之間通過第一膠片或者第二膠片黏結於一起,相鄰之絕緣層及第一銅箔片之間通過第三膠片黏結於一起,相鄰之絕緣層及第二銅箔片之間通過第四膠片黏結於一起,且所述第一銅箔片和第二銅箔片位於所述4N+4層線路基板之最外兩側;
於所述4N+4層線路基板之兩側分別形成至少一個第一盲孔及至少一個第二盲孔,所述至少一個第一盲孔穿透所述第一銅箔片及與所述第一銅箔片相貼之所述第三膠片,所述至少一個第二盲孔穿透所述第二銅箔片及與所述第二銅箔片相貼之所述第四膠片,並於每個盲孔中填充第三導電材料,使所述第一銅箔片和與所述第一銅箔片相鄰之導電線路圖形通過與所述第一銅箔片相鄰之第三導電材料相互電導通,所述第二銅箔片和與所述第二銅箔片相鄰之導電線路圖形通過與所述第二銅箔片相鄰之第三導電材料相互電導通;以及
將第一銅箔片及第二銅箔片經由選擇性蝕刻製成導電線路圖形,從而獲得4N+4層線路板。
A method for manufacturing a multilayer circuit board, comprising the steps of:
Providing 2N+1 copper-clad substrates, wherein N is a natural number greater than or equal to 1, each of the copper-clad substrates includes an insulating layer and a first copper foil layer attached to opposite sides of the insulating layer and Two copper foil layers;
Forming a first conductive line pattern on the first copper foil layer of each of the copper-clad substrates, and forming a second conductive line pattern on the second copper foil layer of each of the copper-clad substrates, thereby 2N+1 The copper-clad substrate is made into 2N+1 first circuit substrates;
N first first circuit substrates are taken from the 2N+1 first circuit substrates, and the first conductive film pattern surface of each of the N first circuit substrates is attached to the first film. Forming a second film on a surface of the second conductive line pattern of each of the N first circuit substrates, the first film having at least one first through hole, the second film having at least a second via hole, and filling the at least one first via hole with a first conductive material, wherein the first conductive material and the adjacent first conductive line pattern are electrically connected to each other, and the at least one second pass The hole is filled with a second conductive material, and the second conductive material and the adjacent second conductive line pattern are electrically connected to each other, thereby forming N first circuit substrates into N second circuit substrates;
Providing a third film, a fourth film, a first copper foil and a second copper foil, and pressing the second copper foil, the N second circuit substrates, and the remaining N+1 a first circuit substrate, a third film, a fourth film, and the first copper foil to form a 4N+4 layer circuit substrate. In the 4N+4 layer circuit board, the first insulating layer passes through the first The film or the second film is bonded together, and the adjacent insulating layer and the first copper foil are bonded together by the third film, and the adjacent insulating layer and the second copper foil are bonded together by the fourth film. And the first copper foil piece and the second copper foil piece are located on the outermost sides of the 4N+4 layer circuit substrate;
Forming at least one first blind hole and at least one second blind hole on the two sides of the 4N+4 layer circuit substrate, the at least one first blind hole penetrating the first copper foil and the first a third foil that is attached to the third film, the at least one second blind hole penetrating the second copper foil and the fourth film attached to the second copper foil, and Filling a third conductive material in each blind hole such that the first copper foil and the conductive circuit pattern adjacent to the first copper foil pass through the third conductive material adjacent to the first copper foil Electrically conducting, the second copper foil and the conductive circuit pattern adjacent to the second copper foil are electrically connected to each other through a third conductive material adjacent to the second copper foil; and The copper foil piece and the second copper foil piece are electrically conductively patterned by selective etching to obtain a 4N+4 layer wiring board.
如請求項9所述之多層線路板之製作方法,其中,於將每個所述覆銅基板之第一銅箔層製作形成第一導電線路圖形,將每個所述覆銅基板之第二銅箔層製作形成第二導電線路圖形時,還於覆銅基板內製作形成至少一個導電孔,使得所述第一導電線路圖形和第二導電線路圖形通過所述至少一個導電孔相互電導通。The method for fabricating a multilayer circuit board according to claim 9, wherein the first copper foil layer of each of the copper-clad substrates is formed into a first conductive line pattern, and the second copper-clad substrate is second. When the copper foil layer is formed to form the second conductive line pattern, at least one conductive hole is formed in the copper clad substrate, so that the first conductive line pattern and the second conductive line pattern are electrically connected to each other through the at least one conductive hole. 如請求項9所述之多層線路板之製作方法,其中,於壓合所述第二銅箔片、N個所述第二線路基板、剩餘之N+1個所述第一線路基板、所述第三膠片、所述第四膠片及所述第一銅箔片以形成4N+4層線路基板之前,對齊並堆疊所述第二銅箔片、N個所述第二線路基板、剩餘之N+1個所述第一線路基板、所述第三膠片、所述第四膠片及所述第一銅箔片以形成疊合基板,所述疊合基板之形成方法包括步驟:
將一個第二線路基板及一個第一線路基板堆疊形成一個僅有兩個線路基板之堆疊單元,從而得到N個堆疊單元;
將所述第三膠片及所述第四膠片依次疊合於所述第一銅箔片與所述第二銅箔片之間,使所述第三膠片與所述第一銅箔片相貼;
將剩餘之一個第一線路基板疊合於所述第三膠片與所述第四膠片之間;以及
將N個堆疊單元堆疊於所述剩餘之一個第一線路基板與所述第四膠片之間,並使每個堆疊單元中之第二線路基板均較相應之堆疊單元中之第一線路基板靠近所述剩餘之一個第一線路基板,從而獲得所述疊合基板。
The method of manufacturing a multilayer circuit board according to claim 9, wherein the second copper foil, the N second circuit substrates, and the remaining N+1 of the first circuit substrates are laminated Before the third film, the fourth film and the first copper foil are formed to form a 4N+4 layer circuit substrate, the second copper foil, the N second circuit substrates, and the remaining N+1 the first circuit substrate, the third film, the fourth film and the first copper foil to form a laminated substrate, and the method for forming the laminated substrate comprises the steps of:
Stacking a second circuit substrate and a first circuit substrate to form a stacking unit having only two circuit substrates, thereby obtaining N stacked units;
And the third film and the fourth film are sequentially laminated between the first copper foil and the second copper foil, so that the third film is attached to the first copper foil ;
Laminating a remaining one of the first circuit substrates between the third film and the fourth film; and stacking N stacked units between the remaining one of the first circuit substrate and the fourth film And causing the second circuit substrate in each of the stacked units to be closer to the remaining one of the first circuit substrates than the first one of the corresponding stacked units, thereby obtaining the stacked substrate.
如請求項9所述之多層線路板之製作方法,其中,將N個第一線路基板製成N個第二線路基板包括步驟:
於N個所述第一線路基板中之每個第一導電線路圖形上依次疊合所述第一膠片和一個離型膜,於N個所述第一線路基板中之每個第二導電線路圖形表面貼合所述第二膠片和另一個離型膜;
預壓合所述第一線路基板、第一膠片、第二膠片及兩個離型膜,使所述第一膠片和第二膠片黏結於所述第一線路基板之兩側;
去除所述兩個離型膜;
通過雷射鑽孔工藝於所述第一膠片中形成所述至少一個第一通孔,部分第一導電線路圖形從所述至少一個第一通孔中露出,通過雷射鑽孔工藝於所述第二膠片中形成所述至少一個第二通孔,部分第二導電線路圖形從所述至少一個第二通孔中露出;以及
通過印刷導電膏之方式於所述至少一個第一通孔內形成第一導電材料,通過印刷導電膏之方式於所述至少一個第二通孔內形成第二導電材料。
The method for fabricating a multilayer circuit board according to claim 9, wherein the forming the N first circuit substrates into the N second circuit substrates comprises the steps of:
And sequentially bonding the first film and a release film on each of the N first circuit substrates, and each of the N first circuit substrates The graphic surface is attached to the second film and the other release film;
Pre-compressing the first circuit substrate, the first film, the second film and the two release films to bond the first film and the second film to both sides of the first circuit substrate;
Removing the two release films;
Forming the at least one first via hole in the first film by a laser drilling process, a portion of the first conductive trace pattern being exposed from the at least one first via hole, by the laser drilling process Forming the at least one second via hole in the second film, a portion of the second conductive trace pattern is exposed from the at least one second via hole; and forming the conductive paste into the at least one first via hole The first conductive material forms a second conductive material in the at least one second via hole by printing a conductive paste.
一種多層線路板,其中,所述多層線路板採用如請求項1至12中任一項所述之多層線路板之製作方法製成,所述多層線路板包括多層絕緣層、多層膠片層及多層導電線路圖形,每層絕緣層之相對兩側均貼合有一層所述導電線路圖形,且絕緣層兩側之導電線路圖形通過至少一個導電孔相互電導通,每層膠片層均黏結於相鄰之兩層所述導電線路圖形之間,且通過其中填充之導電材料或者開設之至少一個盲孔電導通所述相鄰之兩層導電線路圖形。
A multi-layer wiring board comprising the method of fabricating the multilayer wiring board according to any one of claims 1 to 12, wherein the multilayer wiring board comprises a plurality of layers of insulating layers, a plurality of layers of film layers, and a plurality of layers The conductive circuit pattern has a conductive circuit pattern adhered on opposite sides of each insulating layer, and the conductive circuit patterns on both sides of the insulating layer are electrically connected to each other through at least one conductive hole, and each layer of the film is bonded to the adjacent layer. The two adjacent conductive layer patterns are electrically connected between the two conductive circuit patterns and through the conductive material filled therein or the at least one blind via.
TW101127410A 2012-07-19 2012-07-30 Multilayer printed circuit board and method for manufacturing same TW201406223A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201210250812.2A CN103582321B (en) 2012-07-19 2012-07-19 Multilayer circuit board and preparation method thereof

Publications (1)

Publication Number Publication Date
TW201406223A true TW201406223A (en) 2014-02-01

Family

ID=50052912

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101127410A TW201406223A (en) 2012-07-19 2012-07-30 Multilayer printed circuit board and method for manufacturing same

Country Status (2)

Country Link
CN (1) CN103582321B (en)
TW (1) TW201406223A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019090497A1 (en) * 2017-11-08 2019-05-16 惠州市兴顺和电子有限公司 High characteristic impedance multilayer circuit board and manufacturing method therefor
CN109922612A (en) * 2019-03-22 2019-06-21 深圳明阳电路科技股份有限公司 A kind of HDI board manufacturing method and HDI plate
CN111836469A (en) * 2020-06-08 2020-10-27 瑞声精密制造科技(常州)有限公司 Circuit substrate preparation method and circuit substrate
CN114501800A (en) * 2020-10-27 2022-05-13 鹏鼎控股(深圳)股份有限公司 Circuit board manufacturing method and circuit board

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101374386B (en) * 2007-08-24 2011-03-23 富葵精密组件(深圳)有限公司 Method for preparing printed circuit board
CN101453838A (en) * 2007-11-29 2009-06-10 富葵精密组件(深圳)有限公司 Manufacturing method for circuit board
CN101662881B (en) * 2008-08-27 2011-12-07 富葵精密组件(深圳)有限公司 Circuit board and manufacturing method thereof
CN102196672B (en) * 2010-03-12 2013-08-28 富葵精密组件(深圳)有限公司 Circuit board manufacturing method
CN102316681B (en) * 2010-06-30 2014-04-09 富葵精密组件(深圳)有限公司 Circuit board and manufacturing method thereof

Also Published As

Publication number Publication date
CN103582321A (en) 2014-02-12
CN103582321B (en) 2016-11-23

Similar Documents

Publication Publication Date Title
TW201406224A (en) Multilayer printed circuit board and method for manufacturing same
JP2015061058A (en) Multilayer printed wiring board manufacturing method and multilayer printed wiring board
CN103379750B (en) Multilayer circuit board and preparation method thereof
JP5333623B2 (en) Recognition mark
US20160135295A1 (en) Multi-layer circuit board
JP2004327510A (en) Copper-plated laminated board for multilayered printed wiring board, multilayered printed wiring board and method of manufacturing the same
TW201406222A (en) Multilayer printed circuit board and method for manufacturing same
TW201406223A (en) Multilayer printed circuit board and method for manufacturing same
JP2008258357A (en) Rigid flexible board and manufacturing method thereof
TWI519225B (en) Manufacturing method of multilayer flexible circuit structure
JP2006253328A (en) Manufacturing method of multilayer wiring board
KR20190124616A (en) Method of manufacturing the printed circuit board
TWI422304B (en) Multilayer printed circuit board and method for manufacturing same
JP2014068047A (en) Method for manufacturing multilayer printed wiring board
KR101167422B1 (en) Carrier member and method of manufacturing PCB using the same
JP2007335631A (en) Manufacturing method of laminated wiring board
TWI407875B (en) Multilayer printed circuit board and method for manufacturing same
KR101097504B1 (en) The method for preparing multi layered circuit board
JP2008258358A (en) Rigid flexible board and manufacturing method thereof
JP2010205809A (en) Multilayer printed wiring board and method of manufacturing the same
JP3973654B2 (en) Method for manufacturing printed wiring board
JP3540809B2 (en) Single-sided circuit board for high density multilayer printed wiring board and high density multilayer printed wiring board
JP6320788B2 (en) Method for manufacturing flexible printed circuit board and intermediate product used for manufacturing flexible printed circuit board
JP2009038191A (en) Multilayer wiring board and its manufacturing method
CN115460805A (en) Manufacturing method of ultrathin multilayer flexible plate