JP3973654B2 - Method for manufacturing printed wiring board - Google Patents

Method for manufacturing printed wiring board Download PDF

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JP3973654B2
JP3973654B2 JP2004331061A JP2004331061A JP3973654B2 JP 3973654 B2 JP3973654 B2 JP 3973654B2 JP 2004331061 A JP2004331061 A JP 2004331061A JP 2004331061 A JP2004331061 A JP 2004331061A JP 3973654 B2 JP3973654 B2 JP 3973654B2
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conductor
insulating sheet
printed wiring
insulating
conductor bump
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JP2005123637A (en
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和彦 一色
勝弘 庄子
賢司 笹岡
義孝 福岡
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Dai Nippon Printing Co Ltd
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Dai Nippon Printing Co Ltd
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本発明はプリント配線基板の製造方法に係り、更に詳細には配線層間を貫通型の導体配線部で接続する、いわゆる導体貫通型の多層のプリント配線基板の製造方法に関する。 The present invention relates to a method for manufacturing a printed wiring board, and more particularly to a method for manufacturing a so-called through-conductor type multilayer printed wiring board in which wiring layers are connected by through-type conductor wiring portions.

従来より多層板の製造方法として絶縁性基板の厚さ方向に略円錐形の導体バンプを圧入して絶縁性基板の両面に形成された二つの配線パターン間の電気的導通を図る、いわゆる導体貫通法が知られている。   Conventionally, as a method of manufacturing a multilayer board, a substantially conical conductor bump is press-fitted in the thickness direction of an insulating substrate to achieve electrical continuity between two wiring patterns formed on both surfaces of the insulating substrate. The law is known.

図18は従来の代表的な導体貫通法の製造工程を模式的に示した垂直断面図である。   FIG. 18 is a vertical sectional view schematically showing a manufacturing process of a conventional typical conductor penetration method.

この導体貫通法では、まず銅箔などの導体板100(図18(a))の上に例えば複数の貫通孔が穿孔された印刷用マスク(図示省略)を重ね、この印刷用マスクの上側から銀ペーストなどの導電性組成物をスキージしながら前記貫通孔に充填し、しかる後に前記印刷用マスクと導体板100とを剥離することにより略円錐形の導体バンプ群102,102,…を形成する(図18(b))。   In this conductor penetration method, first, a printing mask (not shown) in which a plurality of through holes are drilled is superimposed on a conductor plate 100 (FIG. 18A) such as a copper foil, and from above the printing mask. A conductive composition such as silver paste is filled in the through hole while squeezing, and then the printing mask and the conductive plate 100 are peeled to form substantially conical conductive bump groups 102, 102,. (FIG. 18 (b)).

次いで導体バンプ群102,102,…の上側にガラス繊維をエポキシ樹脂で含浸して板状にした絶縁性基板プリプレグ103を重ね(図18(c))、この状態で例えば弾性材料でできたローラ間に通すことによりプレスすると、図18(d)に示したように、導体バンプ群102,102,…が絶縁性基板プリプレグ103を貫通して反対側(図中上側)に突き抜ける。   Next, an insulating substrate prepreg 103 made of a glass fiber impregnated with epoxy resin is laminated on the upper side of the conductor bump groups 102, 102,... (FIG. 18C), and in this state, for example, a roller made of an elastic material When pressed by passing between them, the conductor bump groups 102, 102,... Penetrate through the insulating substrate prepreg 103 and penetrate to the opposite side (upper side in the figure) as shown in FIG.

更に導体バンプ群102,102,…が突き抜けた絶縁性基板プリプレグ103の上に銅箔などの導体板104を積層し、加圧下に加熱すると導体板104が絶縁性基板プリプレグ103上に接着されると同時に絶縁性基板プリプレグ103が硬化して多層板中間体110が形成される(図18(e))。このとき導体バンプ群102,102,…の先端側と導体板104とが押圧されるので、両者が接触し、導体バンプ群102,102,…を介して導体板100と導体板104との間に電気的導通が形成される。   Further, a conductor plate 104 such as copper foil is laminated on the insulating substrate prepreg 103 through which the conductor bump groups 102, 102,... Penetrate, and the conductor plate 104 is bonded onto the insulating substrate prepreg 103 when heated under pressure. At the same time, the insulating substrate prepreg 103 is cured to form the multilayer board intermediate body 110 (FIG. 18E). At this time, the leading end side of the conductor bump groups 102, 102,... And the conductor plate 104 are pressed, so that they come into contact with each other and between the conductor plate 100 and the conductor plate 104 via the conductor bump groups 102, 102,. An electrical continuity is formed.

この多層板中間体110の上下各面の導体板100,104にそれぞれエッチングなどを施してパターニングを行なうことにより、図18(f)に示したような、絶縁性基板103の上下各面に、導体バンプ群102,102,…を介して互いに電気的に導通した配線層102と105とがそれぞれ形成された多層板111が得られる。   By performing etching on the conductive plates 100 and 104 on the upper and lower surfaces of the multilayer board intermediate body 110 to perform patterning, the upper and lower surfaces of the insulating substrate 103 as shown in FIG. A multilayer board 111 is obtained in which wiring layers 102 and 105 electrically connected to each other through the conductor bump groups 102, 102,.

しかし、このように絶縁性基板プリプレグ103に導体バンプ群102,102,…を貫通させるのに、絶縁性基板プリプレグ103と導体板100とをこれらの外側から機械的にプレスする方法では、ローラープレスなどの特別な設備を必要とするという問題がある。   However, in order to pass the conductor bump groups 102, 102,... Through the insulating substrate prepreg 103 in this way, the method of mechanically pressing the insulating substrate prepreg 103 and the conductor plate 100 from the outside of these methods is a roller press. There is a problem of requiring special equipment such as.

また、上記の方法で4層の配線層からなる多層板を製造する場合、図11(b)に示したような導体バンプ群102,102,…を形成した導体板100と、「コア材」と呼ばれる1枚の絶縁性基板の両側にそれぞれ配線層が一層ずつ形成された積層体(図示省略)との間に絶縁性基板プリプレグ103を挟み込み、プレスすることにより多層化する方法が一般的に用いられるが、この方法では導体バンプ群102,102,…の底面側が外側を向けた状態で積層されるため、多層板の最外層側に形成する配線層の配線密度を上げることができないという問題がある。   Further, when a multilayer board composed of four wiring layers is manufactured by the above-described method, the conductor board 100 formed with the conductor bump groups 102, 102,... As shown in FIG. In general, a method of forming a multilayer by sandwiching an insulating substrate prepreg 103 between a laminate (not shown) having a wiring layer formed on each side of a single insulating substrate, which is called, and pressing them is generally used. Although this method is used, since the bottom surfaces of the conductor bump groups 102, 102,... Are laminated with the outside facing, the wiring density of the wiring layer formed on the outermost layer side of the multilayer board cannot be increased. There is.

本発明は上記従来の問題を解決するためになされた発明である。即ち、本発明は、ローラープレスなどの大掛かりな製造設備がなくても製造できる、プロセスタイムの短いプリント配線基板の製造方法を提供することを目的とする。 The present invention has been made to solve the above conventional problems. That is, an object of the present invention is to provide a method for manufacturing a printed wiring board with a short process time, which can be manufactured without a large-scale manufacturing facility such as a roller press.

また、本発明は多層板を製造したときに、配線密度の高い多層板を製造することのできるプリント配線基板の製造方法を提供することを目的とする。 Another object of the present invention is to provide a printed wiring board manufacturing method capable of manufacturing a multilayer board having a high wiring density when the multilayer board is manufactured.

本発明のプリント配線基板の製造方法は、導体金属箔または配線層の形成された絶縁性基板上の所定位置に、略円錐形の導体バンプ群を形成する工程と、前記導体バンプ群の先端側に硬化性の絶縁性シートを重ねる工程と、前記導体バンプ群を前記絶縁性シートから突出させる工程と、前記絶縁性シートを硬化させる工程と、硬化した前記絶縁性シートの面と前記導体バンプ群の先端部を、研磨して平坦化する工程と、前記平坦化された前記絶縁性シート及び導体バンプ群の先端部上にメッキにより配線パターンを形成する工程とを有することを特徴とする。 The printed wiring board manufacturing method of the present invention includes a step of forming a substantially conical conductor bump group at a predetermined position on an insulating substrate on which a conductive metal foil or a wiring layer is formed, and a tip side of the conductor bump group. A step of superposing a curable insulating sheet on the surface, a step of projecting the conductive bump group from the insulating sheet, a step of curing the insulating sheet, a surface of the cured insulating sheet, and the conductive bump group A step of polishing and flattening the tip portion of the conductive layer; and a step of forming a wiring pattern by plating on the tip portion of the flattened insulating sheet and conductor bump group .

前記多層板中間体の両面の配線パターンは、層間接続部により接続するようにしてもよい。   The wiring patterns on both surfaces of the multilayer board intermediate may be connected by an interlayer connection.

また、本発明においては、各最外層配線パターンどうしを、全体を貫通するスルーホールを穿孔してスルホール内壁面上に金属層を形成するようにしてもよい。   In the present invention, each outermost layer wiring pattern may be formed with a metal layer on the inner wall surface of the through-hole by drilling a through-hole penetrating the whole.

本発明では、導体バンプを絶縁性シートに貫通させる手法として絶縁性基板と絶縁性シートとの間の空間に減圧を作用させる手法を用いることにより、プレス機などの大掛かりな設備を必要とせずに多層板を製造することができる。   In the present invention, by using a method of applying a pressure reduction to the space between the insulating substrate and the insulating sheet as a method of penetrating the conductor bumps through the insulating sheet, large equipment such as a press machine is not required. Multilayer boards can be manufactured.

また、パターニングした配線層の上に導体バンプを形成するので、導体バンプと配線パターンとの接続ミスが少なく、精密な配線パターンを形成することができ、集積度を向上させることができる。 In addition, since the conductor bumps are formed on the patterned wiring layer, there are few connection mistakes between the conductor bumps and the wiring pattern, a precise wiring pattern can be formed, and the degree of integration can be improved.

また、配線層上に導体バンプを形成する手法とスルホールメッキによる層間接続の手法を組み合わせることにより、集積度の高い多層板を形成することができる。   Moreover, a highly integrated multi-layer board can be formed by combining the method of forming conductor bumps on the wiring layer and the method of interlayer connection by through-hole plating.

更に、層間接続の手法として導体バンプを中央の絶縁性基板内に介挿したコア材を用いることにより、更に集積度の高い多層板を形成することができる。   Furthermore, a multilayer board having a higher degree of integration can be formed by using a core material in which conductor bumps are inserted in a central insulating substrate as a method of interlayer connection.

本発明のプリント配線基板は、多層板中間体の配線パターンと最外層配線パターン間を接続する導体パンプが、導電金属粉末を含む導電性組成物又は導電性ペーストにより形成され、かつ前記導体バンプの先端側が、研磨により平坦化されて最外層配線パターン側と接続されているので、導体バンプと配線パターンとの接続ミスが少なく、精密な配線パターンを形成することができ、集積度を向上させることができる。   In the printed wiring board of the present invention, a conductor bump connecting the wiring pattern of the multilayer board intermediate body and the outermost layer wiring pattern is formed of a conductive composition or conductive paste containing conductive metal powder, and Since the tip side is flattened by polishing and connected to the outermost wiring pattern side, there are few connection mistakes between the conductor bumps and the wiring pattern, a precise wiring pattern can be formed, and the degree of integration is improved. Can do.

また、配線層上に導体バンプを形成する手法とスルホールメッキによる層間接続の手法を組み合わせることにより、集積度の高い多層板を形成することができる。   Moreover, a highly integrated multi-layer board can be formed by combining the method of forming conductor bumps on the wiring layer and the method of interlayer connection by through-hole plating.

更に、層間接続の手法として導体バンプを中央の絶縁性基板内に介挿したコア材を用いることにより、更に集積度の高い多層板を形成することができる。   Furthermore, a multilayer board having a higher degree of integration can be formed by using a core material in which conductor bumps are inserted in a central insulating substrate as a method of interlayer connection.

(第1の実施形態)
以下、本発明の実施形態に係るプリント配線基板の製造方法について説明する。
(First embodiment)
Hereinafter, a method for manufacturing a printed wiring board according to an embodiment of the present invention will be described.

図1は本実施形態に係るプリント配線基板の製造方法の各工程の流れを示したフローチャートであり、図2〜図10は同方法の各工程を模式的に示した垂直断面図である。   FIG. 1 is a flowchart showing the flow of each process of the method for manufacturing a printed wiring board according to the present embodiment, and FIGS. 2 to 10 are vertical sectional views schematically showing each process of the method.

本実施形態に係るプリント配線基板を製造するには、絶縁性基板1に銅箔などの導体板2を積層するか、或いは図2に示すような予め絶縁性基板1上に導体板2が積層された、いわゆる銅張積層板を用意する。そして導体板2を例えばエッチング処理を施すことによりパターニングして(ステップ1)、図3に示したような配線層3,3,…即ち配線回路を形成する。次にこの配線層3,3,…に対応させて、例えば銀ペーストなどの導電性組成物からなる略円錐形の導体バンプ群4,4,…を例えば印刷技術を用いて形成する(図4/ステップ2)。   In order to manufacture the printed wiring board according to the present embodiment, a conductive plate 2 such as a copper foil is laminated on the insulating substrate 1, or the conductive plate 2 is previously laminated on the insulating substrate 1 as shown in FIG. A so-called copper-clad laminate is prepared. Then, the conductor plate 2 is patterned by, for example, etching (step 1) to form wiring layers 3, 3,..., That is, a wiring circuit as shown in FIG. Next, in correspondence with the wiring layers 3, 3,..., Substantially conical conductor bump groups 4, 4,... Made of a conductive composition such as silver paste are formed using, for example, a printing technique (FIG. 4). / Step 2).

次に、絶縁性シートとしてエポキシ樹脂などの硬化性樹脂製のシートを準備する。具体的には感光性エポキシ樹脂を主成分とする3層構造ドライフィルム(キャリアフィルム+絶縁層+カバーフィルム)たとえば、デュポン(株)のVIALUX81シリーズ(登録商標)を準備し、カバーフィルムを剥がした状態で、図5に示したように、導体板1上に形成された導体バンプ群4,4,…の先端側に絶縁層が対するよう絶縁性シート5を重ねてセットする。   Next, a sheet made of a curable resin such as an epoxy resin is prepared as an insulating sheet. Specifically, a three-layer dry film (carrier film + insulating layer + cover film) mainly composed of a photosensitive epoxy resin, for example, a Dupont VIALUX81 series (registered trademark) was prepared, and the cover film was peeled off. In this state, as shown in FIG. 5, the insulating sheet 5 is set so as to overlap the insulating layer on the tip side of the conductor bump groups 4, 4,... Formed on the conductor plate 1.

絶縁性シートとして、このような3層構造のドライフィルムタイプの絶縁材料を用いることにより、取り扱いが簡単となり、かつバンプ貫通のための離形シートといった副資材を別途準備する必要もなくなる。   By using a dry film type insulating material having such a three-layer structure as the insulating sheet, handling becomes easy, and there is no need to separately prepare auxiliary materials such as a release sheet for bump penetration.

次に、絶縁性シート5に導体バンプ群4,4,…を貫通させるのであるが、その手法としては絶縁性基板1と絶縁性シート5との間に形成される空間に減圧を作用させることにより、絶縁性シート5と絶縁性基板1とを密着させ、導体バンプ群4,4,…を前記絶縁性シートに貫通させる(ステップ4)。   Next, the conductive bump groups 4, 4,... Are penetrated through the insulating sheet 5, and as a method for that, a reduced pressure is applied to the space formed between the insulating substrate 1 and the insulating sheet 5. Thus, the insulating sheet 5 and the insulating substrate 1 are brought into close contact with each other, and the conductor bump groups 4, 4,... Are penetrated through the insulating sheet (step 4).

その具体的な方法としては、例えば、絶縁性基板1及びシート5の外周縁を密閉して絶縁性基板1とシート5との間に密閉空間を形成し、この密閉空間に真空ポンプへと繋がる真空配管を接続し、真空ポンプを作動させる方法などが挙げられる。   As a specific method, for example, the outer peripheral edges of the insulating substrate 1 and the sheet 5 are sealed to form a sealed space between the insulating substrate 1 and the sheet 5, and the sealed space is connected to a vacuum pump. Examples include a method of connecting a vacuum pipe and operating a vacuum pump.

次に、絶縁性シートを硬化させるが、別途真空プレス装置やオーブンなどで硬化させる方法もあるが、下記の様に導体バンプ群を絶縁性シートに貫通させると同時に硬化することが好ましい。   Next, although the insulating sheet is cured, there is a method in which the insulating sheet is separately cured by a vacuum press apparatus, an oven, or the like. However, it is preferable to cure the conductive bump group through the insulating sheet as described below.

配線上の導体バンプ群4,4,…を絶縁性シート5に貫通させる際に、加熱したり、紫外線を照射するなどにより絶縁性シート5の硬化を同時に行なう。   When the conductor bump groups 4, 4,... On the wiring are passed through the insulating sheet 5, the insulating sheet 5 is simultaneously cured by heating or irradiating ultraviolet rays.

同時に貫通と硬化とを行なうことにより、製造に要する時間(プロセスタイム)を短縮することができる。特に、紫外線照射と加熱による硬化を併用することにより、プロセスタイムをさらに短縮できる。また、加熱や紫外線を照射することにより絶縁性シート5が可塑化され、導体バンプ群4,4,…が貫通しやすくなる。その観点から、絶縁性シート5はガラス転移温度の低いタイプのものを用いるのが好ましい。好ましいガラス転移温度としては、60〜70℃のものが挙げられる。 By performing penetration and curing at the same time, the time (process time) required for manufacturing can be shortened. In particular, the process time can be further shortened by using both ultraviolet irradiation and curing by heating. Further, the insulating sheet 5 is plasticized by irradiation with heat or ultraviolet rays, and the conductive bump groups 4, 4,. From that viewpoint, it is preferable to use the insulating sheet 5 having a low glass transition temperature. A preferable glass transition temperature is 60 to 70 ° C.

ここで、絶縁性シートのガラス転移温度の好ましい範囲を上記範囲としたのは、絶縁性シートのガラス転移温度が上記範囲を下回ると、フィルムとしての安定性が確保しにくくなる。また、ラミネート時に樹脂が流れすぎて絶縁層厚みにばらつきが発生するなどの弊害が生じるからであり、一方、絶縁性シートのガラス転移温度が上記範囲を上回ると、バンプ自体が軟化し絶縁シートを貫通できなくなり、昇温のための設備対応が必要になったり、プロセスタイムのロスに繋がるという弊害が生じるからである。   Here, the preferable range of the glass transition temperature of the insulating sheet is set as the above range. If the glass transition temperature of the insulating sheet is lower than the above range, it is difficult to ensure stability as a film. In addition, the resin flows too much at the time of laminating, which causes adverse effects such as variations in the thickness of the insulating layer.On the other hand, if the glass transition temperature of the insulating sheet exceeds the above range, the bump itself softens and the insulating sheet becomes This is because it is impossible to penetrate, and it is necessary to cope with the equipment for raising the temperature, or the process time is lost.

また、この絶縁性シート5は厚さが50〜75μmのものが好ましい。   The insulating sheet 5 preferably has a thickness of 50 to 75 μm.

ここで、絶縁性シートの厚さの好ましい範囲を上記範囲としたのは、絶縁性シートの厚さが上記範囲を下回ると、絶縁層の厚さが不足し、層間の絶縁信頼性が確保できにくくなるためである。一方、絶縁性シートの厚さが上記範囲を上回るとバンプ貫通が困難になるからである。   Here, the preferable range of the thickness of the insulating sheet is defined as the above range. If the thickness of the insulating sheet is less than the above range, the insulating layer is insufficient in thickness, and insulation reliability between layers can be secured. This is because it becomes difficult. On the other hand, if the thickness of the insulating sheet exceeds the above range, bump penetration becomes difficult.

上記のようにして、例えば減圧を作用させると絶縁性シート5は大気圧により押圧されて絶縁性基板1側に吸引され、このときに導体バンプ群4,4,…が絶縁性シート5を貫通し、図6に示したように、絶縁性シート5が絶縁性基板1上に密着すると同時に導体バンプ群4,4,…が絶縁性シート5を貫通し、キャリアフィルムにまで先端部分が到達する様にする。また、減圧を作用させるときに同時に加熱や紫外線照射などによる硬化も起こっているので、絶縁性基板1上に密着した状態で絶縁性シート5は硬化する。   As described above, for example, when a reduced pressure is applied, the insulating sheet 5 is pressed by the atmospheric pressure and sucked to the insulating substrate 1 side. At this time, the conductor bump groups 4, 4,. As shown in FIG. 6, the insulating sheet 5 comes into close contact with the insulating substrate 1 and at the same time, the conductor bump groups 4, 4,... Penetrate the insulating sheet 5, and the leading end reaches the carrier film. Like. In addition, since the curing by heating or ultraviolet irradiation occurs at the same time when the reduced pressure is applied, the insulating sheet 5 is cured in a state of being in close contact with the insulating substrate 1.

以上の工程により、絶縁性基板1の片面のみに導体バンプ群4,4,…が形成され絶縁性シート5が積層されるが、更に絶縁性基板1の反対側にも同様に積層する場合には、図1のステップ5からステップ1に戻り、ステップ1〜ステップ4までの工程を絶縁性基板1の反対側にも行ない、キャリアフィルムを剥離することにより、図7に示したような、絶縁性基板1の上下両面に導体バンプ群4,4,…及び8,8,…と絶縁性シート5及び6が積層された多層板中間体20が得られる。   Through the above steps, the conductor bump groups 4, 4,... Are formed only on one surface of the insulating substrate 1 and the insulating sheet 5 is laminated. When the same is laminated on the opposite side of the insulating substrate 1 as well. 1 returns to Step 1 from Step 5 in FIG. 1, and performs the steps from Step 1 to Step 4 also on the opposite side of the insulating substrate 1 to peel off the carrier film, so that the insulation as shown in FIG. A multilayer board intermediate 20 in which conductive bump groups 4, 4,..., 8, 8, .. and insulating sheets 5 and 6 are laminated on the upper and lower surfaces of the conductive substrate 1 is obtained.

次いでこの多層板中間体20について層間接続を行なうために、表面研磨を行ない(ステップ6)、絶縁性シート5,6から突き出した導体バンプ群4,4,…及び8,8,…の先端部分を取り除くことにより、図8に示したような、表面が平坦な多層板中間体21が得られる。   Next, in order to perform interlayer connection for the multilayer board intermediate body 20, surface polishing is performed (step 6), and the end portions of the conductor bump groups 4, 4,... And 8, 8,. As a result, the multilayer plate intermediate 21 having a flat surface as shown in FIG. 8 is obtained.

このとき、導体バンプが導電性組成物(銀ペースト)により形成されているため研磨が容易であるとともに、絶縁性シートと導電性組成物(銀ペースト)の研磨条件はほとんど同じ条件で可能であり、平坦化が容易である。   At this time, since the conductive bump is formed of a conductive composition (silver paste), polishing is easy, and the polishing conditions for the insulating sheet and the conductive composition (silver paste) can be almost the same. Easy to flatten.

また、上述の説明は導体バンプが絶縁性シートを貫通する例で説明したが、導体バンプの先端が絶縁性シートを貫通しない場合でも、上記と同様の工程で作成可能である。すなわち絶縁性シートを研磨することにより導体バンプの先端を露出すると同時に平坦化を行うことも可能である。   Moreover, although the above-mentioned description demonstrated the example which a conductor bump penetrates an insulating sheet, even when the front-end | tip of a conductor bump does not penetrate an insulating sheet, it can produce by the process similar to the above. That is, by polishing the insulating sheet, it is possible to expose the tip of the conductor bump and at the same time planarize.

次に、この多層板中間体21に層間接続のためのスルホールを形成するためにドリリングやレーザー光線を照射するなどの方法により穴あけを行なうと(ステップ7)、図9に示したようなスルホール13が穿孔された多層板中間体22が得られる。この多層板中間体22について、例えば無電解メッキなどを施すことにより金属層10,12,14を形成すると(ステップ8)、図10に示したような多層板23が得られる。   Next, when drilling is performed in this multilayer board intermediate body 21 by a method such as drilling or laser beam irradiation to form a through hole for interlayer connection (step 7), the through hole 13 as shown in FIG. A perforated multilayer board intermediate 22 is obtained. When the metal layers 10, 12, and 14 are formed on the multilayer board intermediate 22 by, for example, electroless plating (step 8), the multilayer board 23 as shown in FIG. 10 is obtained.

この多層板23では、導体バンプ群4,4,…及び導体バンプ群8,8,…が共に先端側を外向きに配置した構造になっているので、多層板23の最外層に形成する配線パターン10,10,…及び、配線パターン12,12,…間の間隔を狭くすることができる。そのため、配線パターンの配線密度を向上させることができ、ひいては集積度を向上させることができる。   In this multilayer board 23, the conductor bump groups 4, 4,... And the conductor bump groups 8, 8,... Have a structure in which the tip side is arranged outward, so that the wiring formed on the outermost layer of the multilayer board 23 The intervals between the patterns 10, 10,... And the wiring patterns 12, 12,. Therefore, the wiring density of the wiring pattern can be improved, and as a result, the degree of integration can be improved.

更に、導体バンプ群4,4,…を配線層3上に直接形成するので、両者間の電気的な接続が確実に形成される。   Further, since the conductor bump groups 4, 4,... Are directly formed on the wiring layer 3, the electrical connection between them is reliably formed.

また、多層板中間体22上にメッキにより配線層10を形成するので、両者間の電気的な接続が確実に形成される。   Moreover, since the wiring layer 10 is formed on the multilayer board intermediate body 22 by plating, the electrical connection between them is reliably formed.

更に、上述したように、本実施形態では、パターニングした配線層の上に導体バンプを形成するので、導体バンプと配線パターンとの接続ミスが少なく、精密な配線パターンを形成することができ、集積度を向上させることができる。   Furthermore, as described above, in this embodiment, since the conductor bumps are formed on the patterned wiring layer, there are few connection mistakes between the conductor bumps and the wiring patterns, and a precise wiring pattern can be formed. The degree can be improved.

また、配線層上に導体バンプを形成する手法とスルホールメッキによる層間接続の手法を組み合わせることにより、集積度の高い多層板を形成することができる。   Moreover, a highly integrated multi-layer board can be formed by combining the method of forming conductor bumps on the wiring layer and the method of interlayer connection by through-hole plating.

更に、層間接続の手法として導体バンプを中央の絶縁性基板内に介挿したコア材を用いることにより、更に集積度の高い多層板を形成することができる。   Furthermore, a multilayer board having a higher degree of integration can be formed by using a core material in which conductor bumps are inserted in a central insulating substrate as a method of interlayer connection.

また、導体バンプを絶縁性シートに貫通させる手法として絶縁性基板と絶縁性シートとの間の空間に減圧を作用させる手法を用いることにより、プレス機などの大掛かりな設備を必要とせずに多層板を製造することができる。   In addition, by using a technique that applies pressure reduction to the space between the insulating substrate and the insulating sheet as a technique for penetrating the conductor bumps through the insulating sheet, a multilayer board can be used without requiring large facilities such as a press machine. Can be manufactured.

なお、本発明は上記実施形態の内容に限定されるものではない。   In addition, this invention is not limited to the content of the said embodiment.

例えば、本実施形態において、導体バンプを貫通させるのに使用する絶縁性基板としては、ガラスクロスやマット、有機合成繊維布やマット、或いは紙などの補強材で強化された合成樹脂系シートが挙げられる。ここで、合成樹脂としては、例えばポリカーボネート樹脂、ポリスルホン樹脂、熱可塑性ポリイミド樹脂、ポリ4フッ化エチレン6フッ化プロピレン樹脂、ポリエーテルエーテルケトン樹脂などの熱可塑性樹脂、エポキシ樹脂、ビスマレイミドトリアジン樹脂、ポリイミド樹脂、フェノール樹脂、ポリエステル樹脂、メラミン樹脂などの熱硬化性樹脂、あるいはブタジエンゴム、ブチルゴム、天然ゴム、ネオプ
レンゴム、シリコーンゴムなどのゴム類が挙げられる。
For example, in this embodiment, the insulating substrate used for penetrating the conductor bumps includes a glass cloth, a mat, an organic synthetic fiber cloth, a mat, or a synthetic resin sheet reinforced with a reinforcing material such as paper. It is done. Here, as synthetic resins, for example, polycarbonate resins, polysulfone resins, thermoplastic polyimide resins, polytetrafluoroethylene hexafluoropropylene resins, polyether ether ketone resin and other thermoplastic resins, epoxy resins, bismaleimide triazine resins, Examples thereof include thermosetting resins such as polyimide resins, phenol resins, polyester resins, and melamine resins, and rubbers such as butadiene rubber, butyl rubber, natural rubber, neoprene rubber, and silicone rubber.

そして、前記略円錐形の導体バンプの形成は、導電性組成物で形成する場合、例えば比較的厚いメタルマスクを用いた印刷法で、アスペクト比の高い略円錐形の導体バンプ群を形成できる。   When forming the substantially conical conductor bumps with a conductive composition, for example, a substantially conical conductor bump group having a high aspect ratio can be formed by a printing method using a relatively thick metal mask.

本発明において、略円錐形の導体バンプ群を導電性金属で形成する手段としては、例えば、銅箔などの支持基体面の所定位置に、金もしくは銅のボールを押し付け、しかる後に引き離すことにより先端が尖った略円錐形の導体(素子)群を形成できる。また予め、略円錐形の導体の形に対応する凹部を形成したプレートに溶融金属を注入し、略円錐形の導体バンプ群を形成することも可能である。更に他の手段として、支持フィルム面上に感光性レジストを厚めに塗布し、支持フィルム側から露光することにより先端が尖った台形の凹部を持った窪み群を形成した後、前記支持フィルムを除去し、この支持フィルム除去面
に金属膜を張り、銅、金、銀、半田などをメッキして所定位置に微小な略円錐形の導体バンプ群を形成してもよい。
In the present invention, as a means for forming a substantially conical conductor bump group with a conductive metal, for example, a tip of a gold or copper ball is pressed against a predetermined position of a supporting base surface such as a copper foil and then pulled away. A substantially conical conductor (element) group with sharp points can be formed. It is also possible to form a substantially conical conductor bump group by previously injecting molten metal into a plate in which a recess corresponding to the shape of a substantially conical conductor is formed. As another means, a thick photosensitive resist is applied on the surface of the support film and exposed from the support film side to form a depression group having a trapezoidal recess with a sharp tip, and then the support film is removed. Then, a metal film may be applied to the support film removal surface, and copper, gold, silver, solder, or the like may be plated to form a small, substantially conical conductor bump group at a predetermined position.

また、本発明において、略円錐形の導体バンプ群を支持する基体としては、離形性のあるフィルムあるいは金属箔などが挙げられ、この支持基体は1枚のシートであってもよく、パターン化されたものでもよく、その形状は特に限定されない。   In the present invention, examples of the substrate that supports the substantially conical conductor bump group include a releasable film or a metal foil, and the support substrate may be a single sheet. The shape thereof is not particularly limited.

(第2の実施形態)
以下、本実施形態に係る第2の実施形態について説明する。なお、本実施形態のうち、上記第1の実施形態と重複する内容に付いては説明を省略する。
(Second Embodiment)
Hereinafter, a second embodiment according to the present embodiment will be described. Note that, in the present embodiment, the description overlapping with the first embodiment is omitted.

図11〜図17は本実施形態に係るプリント配線基板製造方法の各工程を模式的に示した垂直断面図である。   11 to 17 are vertical sectional views schematically showing each step of the printed wiring board manufacturing method according to this embodiment.

本実施形態では、図2に示した絶縁性基板1の代わりに、図11に示したような、導体バンプ群39,39,…で層間接続されたコア材50を使用した。   In this embodiment, instead of the insulating substrate 1 shown in FIG. 2, a core material 50 connected between layers by conductor bump groups 39, 39,... As shown in FIG.

このコア材50の上下各面の導体板32a,32bをパターニングして配線層33,37を両面に形成したのち(図12)、これらの配線層33,37上に導体バンプ群34,34,…及び導体バンプ群38,38,…をそれぞれ形成し(図13)、その上に絶縁性シート35,36をそれぞれセットし(図14)、コア材50と絶縁性シート35,36との間の空間を密閉したのち、この空間に減圧を作用させて導体バンプ群34,34,…及び導体バンプ群38,38,…を絶縁性シート35,36にそれぞれ貫通させると共に絶縁性シート35,36を硬化させた(図15)。しかる後に表面研磨して絶縁性シート35,36上に突き出た導体バンプ群34,34,…及び導体バンプ群38,38,…の先端をそれぞれ除去し(図16)、しかる後に導体バンプ群34,34,…及び導体バンプ群38,38,…の表面露出部に対応して配線層40,41をそれぞれ形成した(図17)。   After the conductor plates 32a and 32b on the upper and lower surfaces of the core material 50 are patterned to form the wiring layers 33 and 37 on both sides (FIG. 12), the conductor bump groups 34 and 34 and the wiring layers 33 and 37 are formed on the wiring layers 33 and 37, respectively. ... and conductive bump groups 38, 38, ... are respectively formed (Fig. 13), and insulating sheets 35, 36 are respectively set thereon (Fig. 14), and between the core material 50 and the insulating sheets 35, 36. After the space is sealed, a reduced pressure is applied to the space so that the conductor bump groups 34, 34,... And the conductor bump groups 38, 38,. Was cured (FIG. 15). .. And then the tips of the conductor bump groups 34, 34,... And the conductor bump groups 38, 38,... Protruding on the insulating sheets 35, 36 are removed (FIG. 16). , 34,... And conductor bump groups 38, 38,.

本実施形態によれば、導体バンプ群39,39,…で層間接続されたコア材50を用いているので、スルホールを形成する必要がない。そのため、スルホールを穿孔するスペースを確保する必要がなく、より配線密度を上げることができるので、集積度を更に向上させることができる、という特有の効果が得られる。   According to this embodiment, since the core material 50 connected between the layers by the conductor bump groups 39, 39,... Is used, it is not necessary to form a through hole. Therefore, it is not necessary to secure a space for drilling through holes, and the wiring density can be further increased, so that a specific effect that the degree of integration can be further improved is obtained.

本発明の第1の実施形態に係るプリント配線基板製造方法のフローチャートである。It is a flowchart of the printed wiring board manufacturing method which concerns on the 1st Embodiment of this invention. 本発明の第1の実施形態に係るプリント配線基板製造方法の各工程を示した垂直断面図である。It is the vertical sectional view showing each process of the printed wiring board manufacturing method concerning a 1st embodiment of the present invention. 本発明の第1の実施形態に係るプリント配線基板製造方法の各工程を示した垂直断面図である。It is the vertical sectional view showing each process of the printed wiring board manufacturing method concerning a 1st embodiment of the present invention. 本発明の第1の実施形態に係るプリント配線基板製造方法の各工程を示した垂直断面図である。It is the vertical sectional view showing each process of the printed wiring board manufacturing method concerning a 1st embodiment of the present invention. 本発明の第1の実施形態に係るプリント配線基板製造方法の各工程を示した垂直断面図である。It is the vertical sectional view showing each process of the printed wiring board manufacturing method concerning a 1st embodiment of the present invention. 本発明の第1の実施形態に係るプリント配線基板製造方法の各工程を示した垂直断面図である。It is the vertical sectional view showing each process of the printed wiring board manufacturing method concerning a 1st embodiment of the present invention. 本発明の第1の実施形態に係るプリント配線基板製造方法の各工程を示した垂直断面図である。It is the vertical sectional view showing each process of the printed wiring board manufacturing method concerning a 1st embodiment of the present invention. 本発明の第1の実施形態に係るプリント配線基板製造方法の各工程を示した垂直断面図である。It is the vertical sectional view showing each process of the printed wiring board manufacturing method concerning a 1st embodiment of the present invention. 本発明の第1の実施形態に係るプリント配線基板製造方法の各工程を示した垂直断面図である。It is the vertical sectional view showing each process of the printed wiring board manufacturing method concerning a 1st embodiment of the present invention. 本発明の第1の実施形態に係るプリント配線基板製造方法の各工程を示した垂直断面図である。It is the vertical sectional view showing each process of the printed wiring board manufacturing method concerning a 1st embodiment of the present invention. 本発明の第2の実施形態に係るプリント配線基板製造方法の各工程を示した垂直断面図である。It is the vertical sectional view showing each process of a printed wiring board manufacturing method concerning a 2nd embodiment of the present invention. 本発明の第2の実施形態に係るプリント配線基板製造方法の各工程を示した垂直断面図である。It is the vertical sectional view showing each process of a printed wiring board manufacturing method concerning a 2nd embodiment of the present invention. 本発明の第2の実施形態に係るプリント配線基板製造方法の各工程を示した垂直断面図である。It is the vertical sectional view showing each process of a printed wiring board manufacturing method concerning a 2nd embodiment of the present invention. 本発明の第2の実施形態に係るプリント配線基板製造方法の各工程を示した垂直断面図である。It is the vertical sectional view showing each process of a printed wiring board manufacturing method concerning a 2nd embodiment of the present invention. 本発明の第2の実施形態に係るプリント配線基板製造方法の各工程を示した垂直断面図である。It is the vertical sectional view showing each process of a printed wiring board manufacturing method concerning a 2nd embodiment of the present invention. 本発明の第2の実施形態に係るプリント配線基板製造方法の各工程を示した垂直断面図である。It is the vertical sectional view showing each process of a printed wiring board manufacturing method concerning a 2nd embodiment of the present invention. 本発明の第2の実施形態に係るプリント配線基板製造方法の各工程を示した垂直断面図である。It is the vertical sectional view showing each process of a printed wiring board manufacturing method concerning a 2nd embodiment of the present invention. 従来の導体貫通法によるプリント配線基板製造方法の製造工程を示した垂直断面図である。It is the vertical sectional view which showed the manufacturing process of the printed wiring board manufacturing method by the conventional conductor penetration method.

符号の説明Explanation of symbols

1…絶縁性基板、2…導体板、3…第1の配線層、4…導体バンプ、5…絶縁性シート、10…第2の配線層。   DESCRIPTION OF SYMBOLS 1 ... Insulating substrate, 2 ... Conductor board, 3 ... 1st wiring layer, 4 ... Conductor bump, 5 ... Insulating sheet, 10 ... 2nd wiring layer.

Claims (1)

導体金属箔または配線層の形成された絶縁性基板上の所定位置に、略円錐形の導体バン
プ群を形成する工程と、
前記導体バンプ群の先端側に硬化性の絶縁性シートを重ねる工程と、
前記導体バンプ群を前記絶縁性シートから突出させる工程と、
前記絶縁性シートを硬化させる工程と、
硬化した前記絶縁性シートの面と前記導体バンプ群の先端部を、研磨して平坦化する工
程と、
前記平坦化された前記絶縁性シート及び導体バンプ群の先端部上にメッキにより配線パ
ターンを形成する工程と
を有するプリント配線基板の製造方法。
Forming a substantially conical conductor bump group at a predetermined position on the insulating substrate on which the conductive metal foil or the wiring layer is formed;
A step of stacking a curable insulating sheet on the tip side of the conductor bump group;
Projecting the conductor bump group from the insulating sheet;
Curing the insulating sheet;
Polishing and flattening the surface of the cured insulating sheet and the tip of the conductor bump group;
And a step of forming a wiring pattern by plating on the flattened insulating sheet and the tip of the conductor bump group.
JP2004331061A 2004-11-15 2004-11-15 Method for manufacturing printed wiring board Expired - Fee Related JP3973654B2 (en)

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