TW201348166A - 具自潔親水性表面之高紅外線傳輸窗 - Google Patents

具自潔親水性表面之高紅外線傳輸窗 Download PDF

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TW201348166A
TW201348166A TW102109825A TW102109825A TW201348166A TW 201348166 A TW201348166 A TW 201348166A TW 102109825 A TW102109825 A TW 102109825A TW 102109825 A TW102109825 A TW 102109825A TW 201348166 A TW201348166 A TW 201348166A
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coating
dielectric substrate
titanium dioxide
optical
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Patrick Y Maeda
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Palo Alto Res Ct Inc
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Abstract

一種光學傳輸窗,其包括一在紅外線波長處為透明之介電基材。一種二氧化鈦塗層係配置在該介電基材的外部表面上。該二氧化鈦塗層具有m加上該紅外線波長的一半之光學厚度,其中m係大於或等於零的整數。

Description

具自潔親水性表面之高紅外線傳輸窗
本發明係關於一種具自潔(self-cleaning)親水性表面之高紅外線傳輸窗。
於本文中所描述的多個具體實例廣泛針對透過具有親水性表面的窗口來促進高紅外線傳輸之方法、系統及設備。在一個具體實例中,光學傳輸窗包括一在紅外線波長處透明的介電基材。一種二氧化鈦塗層係配置在該介電基材的外部表面上。該二氧化鈦塗層具有m加上該紅外線波長的一半之光學厚度,其中m包括大於或等於零的整數。
多個具體實例的這些及其它特徵及態樣可透過下列詳細討論及伴隨的圖形而了解。
100,120,130‧‧‧窗口
102‧‧‧玻璃/薄片
104‧‧‧塗層
106‧‧‧物理厚度
108‧‧‧機殼
110‧‧‧光學裝置
122,132‧‧‧AR塗層
200,210‧‧‧曲線圖
202,204,212,214‧‧‧曲線
302,304,306‧‧‧方塊
下列討論係參照下列圖形,其中相同參考數字可使用在多幅圖形中來鑑別類似/相同的構件。
第1A-1C圖係根據示例具體實例的窗口結構之方塊圖;第2A-2B圖係顯示根據示例具體實例之窗口結構的反射性對波長之分析結果之曲線圖;及第3圖係顯示根據一個示例具體實例的程序之流程圖。
本說明書所揭示之內容廣泛關於一種可使用於光學裝置的窗口,其中該裝置在預定的波長範圍內操作。除了提對供物理環境的隔離外,該窗口具自潔性、防霧性及防污跡性。例如,此窗口可使用來封裝光學裝置,諸如在相當小的波長範圍內操作之紅外線(IR)照相機。在此情況中,該窗口可由最佳化自潔性質的材料及尺寸形成,即使其會對較寬帶的光學用途(例如,可見光照相機)造成可能為次理想的光學性能。
有至少二種不同技術方法用於自潔塗層:親水性及疏水性。二種塗層型式皆係透過水的作用自身清潔。在疏水性表面的情況中,滾動的小滴帶走污物及灰塵。在親水性表面的情況中,成片展開的水沖走污物。在本具體實例中,描述使用氧化鈦(例如,二氧化鈦,TiO2)塗層作為親水性自潔表面。雖然可使用別種金屬氧化物,在本文闡明的實施例中係描述TiO2,因為其具有高效率的光活性、相當安定及可以低成本獲得。
TiO2塗層材料當與紫外(UV)光結合時具有光觸媒及光誘導親水性性質。該UV光可來自環境日光 或其它UV光源。TiO2塗層的親水性性質防止霧化、水斑及而促進雨水之洗滌流,而非形成珠狀。TiO2塗層的光觸媒性質防止污物、灰塵及多種有機材料積聚。當照射紫外光時,在TiO2表面上進行光化學反應。這將造成光吸收,其產生有機物質分解。當入射光子數目遠大於每單位時間到達表面之成膜分子之數目時,該分解係有效的。
TiO2層可使用於光學塗層作為耐用型薄膜介電材料,其具某些限制。TiO2塗層具有相當高的折射率(大約2.6),其在空氣界面處產生大約20%的單一表面菲涅爾(Fresnel)反射。所以,在窗口或鏡片上任意地塗布該材料會明顯減低該窗口或鏡片的光學傳輸。結果,對一般用途的玻璃窗口及鏡片來說,TiO2塗層可由於高折射率造成明顯反射而不合適。並且,厚的TiO2塗層雖然會最大化自潔性質,但其可對某些波長提供不能接受的衰減。
所提出的具體實例使用一具有外部TiO2/空氣界面之塗層,其在特定波長範圍內達成高光學傳輸,同時提供上述的自潔特徵。該波長範圍可包括IR光譜部分,諸如近紅外線(NIR)光譜帶。具有此性質的TiO2塗層可例如在諸如NIR監視攝影機之應用上有用。此型式的照相機可使用具有中心波長在780奈米至1000奈米範圍的NIR LED照明器。NIR監視系統可需要在相當小的波長範圍內為光學有效之光聚集光學系統,及其可禁得起長時間曝露至該元件而沒有維護(例如,手動清潔觀察 窗口)。
在現在參照第1A圖,其顯示出根據一個具體實例的窗口100之方塊圖。窗口100係由至少在有興趣的光波長(例如,NIR)處為透明之介電材料(例如,玻璃)薄片102所形成,及其同樣可在其它波長內為透明。使用該玻璃作為基材,以形成二氧化鈦(例如二氧化鈦(TiO2))的面外塗層104(未呈比例顯示)。玻璃102的表面在塗布TiO2塗層104前可為未經塗布或塗布抗反射(AR)。
已發現若僅欲傳輸小的預定的波長帶而經由窗口100不會明顯減弱,可塗布已調整至該些波長之較厚的TiO2塗層104,因此顯示出想要的物理特徵(例如自潔性),同時允許對該光學組件的剩餘部分進行任何想要的處理。在TiO2塗層的某些應用中,其可允許或甚至想要在傳輸的光上具有可看見的效應(例如,較低的反射,較大的可傳輸性)。但是,此會需要較薄、較低硬度及較難塗布的塗層。
當與UV光結合時,塗層104具有上述光觸媒及光誘導親水性性質。該TiO2塗層104可具有大約有興趣的光波長之一半波長的光學厚度,其可擴大至包括m加上該波長的一半,其中m=0,1,2,3,...。如此即最大化塗層104在該波長附近之可透性,及使得窗口100在有興趣的波長處係實質上透明。對NIR應用來說,該光學厚度的範圍可為自390奈米至500奈米。
該塗層104的光學厚度與該塗層104之物理 厚度106呈比例,基於該塗層104在有興趣的波長處之折射率為。該光學厚度係等於物理厚度106乘以該層材料的折射率。如此,對850奈米光來說,該TiO2層104之光學厚度係850奈米/2=425奈米,其與425奈米/2.6=163奈米的物理厚度106相對應,其中2.6係TiO2在波長850奈米處之折射率。上述提到的390-500奈米之NIR光學厚度範圍與150-192奈米的物理厚度106相對應。
如第1A圖中所顯示,窗口100可與機殼108一起使用,以保護光學裝置110。該光學裝置經裝配以發射及/或接收一集中在標的波長諸如850奈米處(在光譜的NIR部分中)之窄帶紅外光光譜。該光學裝置110可包括但不限於紅外線偵測器、照相機、照明器等等。窗口100經最佳化以對由該光學裝置110送出及/或接收的光產生最低的減弱。窗口100與機殼108一起提供密封環境,以允許該裝置110在嚴酷的條件下使用。由於塗層104的自潔性質,裝置110能透過窗口100提供好的能見度,且此能見度甚至在嚴酷的環境條件下亦能以最小干預維持。
如上述提及,根據示例具體實例的窗口可包括AR塗層。一種型式的AR塗層係由具有折射率與玻璃102的折射率一致之物質所形成,以減低來自窗口100的反射,因此改良光傳輸效率。例如,可選擇單層AR塗層,使得該塗層之折射率係玻璃102的折射率之平方根。氟化鎂(MgF2)具有折射率約1.38,因此經常使用作 為具有率折射約1.52之光學玻璃的AR塗層。其它AR塗層可為吸收性或包括減低反射的奈米結構。亦可使用更複雜、較高性能的多層AR塗層。
具有AR塗層的窗口120,130之示例組態係顯示在第1B及1C圖中。為了方便,使用相同參考數字來指出類似於描述在第1A圖中的元件,然而將察知這些構件之厚度、組成物等等可在不同具體實例間依想要的特徵及與AR層及塗層之交互作用而變化。在第1B圖中,窗口120包括AR塗層122,其係在玻璃102的相對TiO2塗層104之表面上。在第1C圖中,窗口130包括AR層132,其係在TiO2塗層104與玻璃102之間。此窗口130亦包括內部AR塗層122,然而此塗層122可為選擇性。
在第2A及2B圖中,曲線圖200,210顯示出在根據示例具體實例的窗口上所進行的分析結果。在第2A圖中,曲線202表示出如第1圖中所示TiO2塗層104直接位於玻璃102基材上方之窗口安排的強度反射對波長之關係。在此示例中,該TiO2塗層的光學厚度係425奈米(其等於TiO2在850奈米處的折射率乘以該塗層的物理厚度106),與850奈米NIR光的一半波長相對應。對等於m+½乘以紅外線波長的光學厚度(其中m=0,1,2,3,...)來說,應該保有類似的性質。曲線204表示未經塗布的玻璃之相同分析。如曲線圖200顯示出,在緊鄰850奈米的波長,塗布TiO2的表面之反射(由曲線202表示)幾乎與未經塗布的玻璃(由曲線204表示)一樣 低。該光學厚度為半波長的TiO2層並不是AR塗層,反而在位於及靠近NIR的中心波長處表現如無效塗層(null coating)。
在第2B圖中,曲線圖210顯示出類似的分析,但是於此情況中,曲線212表示出如第1C圖所示光學厚度為425奈米的TiO2塗層104形成於AR層132上之結果(不與AR層122相對面)。對此分析來說,該AR層132係由具有光學厚度212.5奈米的MgF2形成(其等於該層的物理厚度乘以MgF2在850奈米處之折射率1.38)。曲線214表示出沒有TiO2層之塗布AR的玻璃之相同分析。再次,在緊鄰850奈米波長,塗布TiO2的表面之反射(由曲線212表示)幾乎與僅有AR的表面(由曲線214表示)一樣低。亦要注意的是,曲線212的最小反射比係低於在第2A圖中的曲線202之反射比。此顯示出該AR塗層在有興趣的波長處係有效,即使在附加該TiO2外塗層時。
如這些結果顯示出,在空氣界面處具有高折射率(相對於玻璃)的塗層可在介電(例如,玻璃、塑膠等等)窗口或鏡片光譜帶或窄光譜帶中達成高傳輸性能。光學塗層設計成使用具半波光學厚度的TiO2層可在LED發射光譜帶或窄光譜帶內於介電(例如,玻璃,塑膠等等)窗口或鏡片中達成高傳輸。此技術可在LED發射光譜帶或窄光譜帶內可達成自潔高傳輸窗或鏡片。
在現在參照第3圖,其顯示根據一個示例具體實例之程序之流程圖。方塊302係提供一介電基材(例 如,玻璃、塑膠),該基材在紅外線波長處係透明的。方塊304係在該介電基材的外部表面上形成二氧化鈦塗層。該二氧化鈦塗層具有m加上該紅外線波長的一半之光學厚度,其中m係大於或等於零的整數。方塊306係選擇性在該介電基材上形成一抗反射塗層。
為了闡明及描述之目的,已經提出前述示例具體實例之說明。本發明並非詳盡無疑或限制至所揭示的精確形式。可按照上述教導有許多改質及變化。所揭示的具體實例之任何或全部特徵可各別或以任何組合應用而不受限制,但是其純粹係用以闡明。本發明所欲之範圍不由此詳細說明所限制,而是由在此所附加的申請專利範圍決定。

Claims (10)

  1. 一種裝置,其包含:一光學傳輸窗,其包含:一在紅外線波長處係透明的介電基材;及一配置在該介電基材的外部表面上之二氧化鈦塗層,該二氧化鈦塗層具有m加上該紅外線波長的一半之光學厚度,其中m包括大於或等於零的整數。
  2. 如申請專利範圍第1項之裝置,更包括一配置在該介電基材上的抗反射塗層。
  3. 如申請專利範圍第2項之裝置,其中該抗反射塗層配置在該介電基材與二氧化鈦塗層間之外部表面上。
  4. 如申請專利範圍第3項之裝置,更包含一第二抗反射塗層,其係配置在與該外部表面相對的內部表面。
  5. 如申請專利範圍第1項之裝置,其中該抗反射塗層係配置在與該外部表面相對的內部表面上。
  6. 如申請專利範圍第1項之裝置,其中該介電基材包含玻璃。
  7. 如申請專利範圍第1項之裝置,其中該二氧化鈦塗層包含一自潔親水性塗層。
  8. 如申請專利範圍第1項之裝置,其包含:一光學裝置,其經裝配以發射或接收一集中在標的波長處之窄帶紅外光光譜;及一封裝該光學裝置的機殼,該機殼包括該光學傳輸窗。
  9. 一種方法,其包括: 提供一在紅外線波長處係透明的介電基材;及在該介電基材的外部表面上形成二氧化鈦塗層,該二氧化鈦塗層具有m加上該紅外線波長的一半之光學厚度,其中m包含大於或等於零之整數。
  10. 如申請專利範圍第9項之方法,更包括在該介電基材上形成一抗反射塗層,其中該二氧化鈦塗層包含一自潔親水性塗層。
TW102109825A 2012-03-22 2013-03-20 具自潔親水性表面之高紅外線傳輸窗 TW201348166A (zh)

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