201243988 六、發明說明： 【發明所屬之技術領域】 本發明是有關一邊在平台上浮上搬送基板，一邊在基 板上塗佈處理液之浮上方式的塗佈裝置。 【先前技術】 在平面顯不器（FPD; Flat Panel Display)的製造製 程的光微影技術（Photolithography)工程，大多是使用相 對性掃描具有縫隙狀的吐出口之長形的阻劑噴嘴在被處理 基板上塗佈阻劑液之無旋轉的塗佈法。 如此的無旋轉塗佈法的一形式，例如有揭示於專利文 獻1那樣，使FPD用的矩形的被處理基板（例如玻璃基板 )在長的浮上平台上浮在空中來搬送於水平的一方向（平 台長度方向），在搬送途中的塗佈處理位置藉由設置於平 台上方的長形的阻劑噴嘴來使阻劑液帶狀地吐出，藉此從 基板上的一端到另一端塗佈阻劑液之浮上方式爲人所知。 使用於如此的浮上方式的阻劑塗佈裝置的浮上平台是 從該平台上面垂直上方噴出高壓的氣體（通常是空氣）， 藉由該高壓空氣的壓力來使基板以水平姿勢浮起。然後， 被配置於浮上平台的左右兩側的直進運動型的搬送部會可 裝卸地保持在浮上平台上浮起的基板，而於平台長度方向 搬送基板。 浮上平台的上面（浮上面）是沿著搬送方向來分割成 搬入區域、塗佈區域、搬出區域的3個。塗佈區域是在此 201243988 對基板上供給阻劑液的區域’長形阻劑噴嘴是被配置於塗 佈區域的中心部的上方。塗佈區域的浮上高度是規定阻劑 噴嘴的下端（吐出口）與基板上面（被處理面）之間的塗 佈間隙（例如200μιη )。此塗佈間隙是左右阻劑塗佈膜的 膜厚或阻劑消費量的重要參數，需要以高精度來維持於一 定。因此，在塗佈區域的平台上面，使混於噴出高壓空氣 的噴出口來設置多數個以負壓吸入空氣的吸引口。然後， 對於通過基板的塗佈區域的部分，從噴出口施加高壓空氣 之垂直向上的力量的同時，藉由吸引口來施加負壓吸引力 之垂直向下的力量，控制相對抗的雙向的力量的平衡，藉 此使預定的浮上高度（通常30~60μηι)能以大的浮上剛性 來安定地保持。 如此，塗佈區域是使噴出口及吸引口多數混在來使基 板以可取得大的浮上剛性之精密的小的浮上高度浮起的精 密浮上區域，每單位面積的成本相當高。搬送方向的塗佈 區域的大小是只要能夠從容在阻劑噴嘴的正下面附近安定 地形成上述那樣窄的塗佈間隙程度即可，通常是比基板的 尺寸更小即可，例如1 /3〜1 / 1 0程度。 相對於此，搬入區域是進行基板的搬入與浮上搬送的 開始的區域，搬出區域是進行浮上搬送的終了與基板的搬 出的區域。搬入區域及搬出區域的浮上高度不需要特別高 的精度，即使浮上剛性小也無妨，因此通常只要保持於 2 00〜20 0 Ομηι的粗略的範圍內即可。另一方面，搬入區域 及搬出區域是在搬送方向具有超過基板的尺寸。因此，在 -6- 201243988 搬入區域及搬出區域是在一面專門設有噴出口 ° 〔先行技術文獻〕 〔專利文獻〕 [專利文獻1]日本特開2005-244155號公報 【發明內容】 (發明所欲解決的課題） 上述那樣的浮上方式的阻劑塗佈裝置是與其他的FPD 製造裝置同樣，在裝置製造商的製作工廠被組裝’接受最 終試驗及裝置性能的確認。然後’阻劑塗佈裝置被分解成 硬體上的構成要素（單元、模組、分段裝配（subassembly )等）。而且，被分解的構成要素通常會被分成複數台的 卡車或貨櫃來運往訂貨方（FPD製造工廠），在裝置運轉 場所再度組裝阻劑塗佈裝置。 在此形成問題的是在訂貨方對於浮上平台的安裝調整 須花費莫大的勞力及時間。亦即，在阻劑塗佈裝置所使用 的浮上平台是其全長爲基板的數倍，在LCD (液晶顯示器 )用是足足超過5m。因此，近年來將浮上平台依搬入區 域、塗佈區域、搬出區域別來分割成可分離的3個平台區 塊爲常態，將該等的平台區塊分別安裝於獨立的架台，以 1組的平台區塊及架台作爲1個的構成要素（分段裝配） 來分解•輸送，在訂貨方的設置場所將3組的架台及平台 區塊排列成一列再度組裝浮上平台。此時，在各分段裝配 中手動操作架台與平台區塊之間所設的調整器，而使各平 201243988 台區塊的高度位置一致。 可是，搬入區域及搬出區域的浮上高度爲 200〜 2 000μιη，相對的，塗佈區域的浮上高度爲30〜60 μιη，小1 位數或2位數。因此，在分別搭載搬入區域及搬出區域的 兩端的平台區塊與搭載塗佈區域的中間的平台區塊之間， 必須將高度位置的差異或階差壓低在數1 〇μηα以下。否則 ，在浮上搬送基板時，恐有基板摩擦平台區塊境界的階差 部分而損傷乃至破損之虞。 基於上述那樣的理由，在以往的浮上式阻劑塗佈裝置 中，在訂貨方的裝置再組裝作業中僅平台區塊的高度位置 調整就花費一整天的情形並不稀奇，·造成現場關係者莫大 的負擔•不便。 本發明是解決上述那樣的以往技術的問題點者，提供 一種可簡便短時間進行分解可能的浮上平台的再組裝作業 的高度調整之浮上式塗佈裝置。 (用以解決課題的手段） 本發明的第1觀點的浮上式塗佈裝置係具有： 浮上平台，其係沿著搬送方向來以第1粗略浮上區域 、精密浮上區域及第2粗略浮上區域的順序設成一列，在 前述精密浮上區域係使基板以適於塗佈處理的精密的第1 浮上高度浮在空中，在前述第1及第2粗略浮上區域係使 前述基板以比前述第1浮上高度更大粗略的第2浮上高度 浮在空中； -8- 201243988 基板搬送部，其係可裝卸地保持浮在前述浮上平台上 的前述基板，從前述第1粗略浮上區域經由前述精密浮上 區域來搬送至前述第2粗略浮上區域；及 處理液供給部，其係具有在前述精密浮上區域內朝前 述基板的被處理面吐出塗佈用的處理液之長型的噴嘴， 並且，使前述浮上平台沿著搬送方向來分割成至少第 1、第2、第3、第4及第5的5個平台區塊，構成可將該 等的平台區塊物理性分離， 在前述第1平台區塊搭載前述第1粗略浮上區域的一 部分，在前述第2平台區塊搭載前述第1粗略浮上區域的 剩下的一部分或全部，在前述第3平台區塊搭載前述精密 浮上區域的全部，在前述第4平台區塊搭載前述第2粗略 浮上區域的一部分，在前述第5平台區塊搭載前述第2粗 略浮上區域的剩下的一部分或全部， 將前述第2、第3及第4平台區塊排列安裝於可獨立 搬運的第1架台， 具備在前述第1架台上個別地調整前述第2、第3及 第4平台區塊的高度位置之第1高度調整部。 在上述第1觀點的裝置構成中，使第2、第3及第4 平台區塊的高度位置一致的高度調整是必須以第1浮上高 度爲基準的精度進行，因此需要麻煩的作業。但，只要一 旦進行該等的高度調整，則即使將浮上平台分解成第1~第 5(或以上）的平台區塊，第2、第3及第4平台區塊間的 高度關係也會在共通（第1)的架台上保持於一定，因此 -9- 201243988 再度組裝浮上平台時，不需要再實施以第1浮上高度爲基 準的要求精度之麻煩的高度調整作業。浮上平台的再組裝 作業的高度調整是只要在第1平台區塊與第2平台區塊之 間、及第4平台區塊與第5平台區塊之間，以第2浮上高 度爲基準之比較緩合的要求精度進行即可* 又，本發明的第2觀點的浮上式塗佈裝置係具有： 浮上平台，其係沿著搬送方向來以第1粗略浮上區域 、精密浮上區域及第2粗略浮上區域的順序設成一列，在 前述精密浮上區域係使基板以適於塗佈處理的精密的第1 浮上高度浮在空中，在前述第1及第2粗略浮上區域係使 前述基板以比前述第1浮上高度更大粗略的第2浮上高度 浮在空中； 基板搬送部，其係可裝卸地保持浮在前述浮上平台上 的前述基板，從前述第1粗略浮上區域經由前述精密浮上 區域來搬送至前述第2粗略浮上區域；及 處理液供給部，其係具有在前述精密浮上區域內朝前 述基板的被處理面吐出塗佈用的處理液之長型的噴嘴， 並且’使前述浮上平台沿著搬送方向來分割成至少第 1'第2及第3的3個平台區塊，構成可將該等的平台區 塊物理性分離， 在前述第1平台區塊搭載前述第1粗略浮上區域的一 部分， 在前述第2平台區塊搭載前述第1粗略浮上區域的剩 下的一部分或全部及前述精密浮上區域的全部及前述第2 -10- 201243988 粗略浮上區域的一部分，在前述第3平台區塊搭載前述第 2粗略浮上區域的剩下的一部分或全部， 將前述第2平台區塊安裝於可獨立搬運的第1架台， 具備在前述第1架台上個別地調整前述第2平台區塊 的高度位置之第1高度調整部。 在上述第2觀點的裝置構成中，第1及第2粗略浮上 區域與精密浮上區域的境界部分爲不能物理性分離，被一 體化，因此不需要一開始就要以第1浮上高度爲基準的精 度之麻煩的高度調整作業，在將浮上平台分解成第1〜第3 (或以上）的平台區塊而再度組裝時也同樣，不需要以第 1浮上高度爲基準的精度之麻煩的高度調整作業。浮上平 台的再組裝作業的高度調整是只要在第1平台區塊與第2 平台區塊之間、及第2平台區塊與第5平台區塊之間，以 第2浮上高度爲基準之比較緩合的要求精度進行即可。 又，本發明的第3觀點的浮上式塗佈裝置係具有： 浮上平台，其係沿著搬送方向來以第1粗略浮上區域 、精密浮上區域及第2粗略浮上區域的順序設成一列，在 前述精密浮上區域係使基板以適於塗佈處理的精密的第1 浮上高度浮在空中，在前述第1及第2粗略浮上區域係使 前述基板以比前述第1浮上高度更大粗略的第2浮上高度 浮在空中； 基板搬送部，其係可裝卸地保持浮在前述浮上平台上 的前述基板，從前述第1粗略浮上區域經由前述精密浮上 區域來搬送至前述第2粗略浮上區域；及 -11 - 201243988 處理液供給部，其係具有在前述精密浮上區域內朝前 述基板的被處理面吐出塗佈用的處理液之長型的噴嘴， 並且’使前述浮上平台沿著搬送方向來分割成至少第 2、第3及第4的3個可物理性分離的平台區塊， 在前述第2平台區塊搭載前述第1粗略浮上區域，在 前述第3平台區塊搭載前述精密浮上區域的全部，在前述 第4平台區塊搭載前述第2粗略浮上區域， 將前述第2、第3及第4平台區塊排列安裝於第1架 台， 具有在前述第1架台上個別地調整前述第2、第3及 第4平台區塊的高度位置之第丨高度調整部， 具備= 第1平台區塊，其係被連接至前述浮上平台的前述第 2平台區塊側，可與前述浮上平台物理性分離； 第5平台區塊，其係被連接至前述浮上平台的前述第 4平台區塊側，可與前述浮上平台物理性分離；及 旋轉自如的複數個搬送滾輪，其係設於前述第1及第 5平台區塊的上部，用以水平搬送前述第1及第5平台區 塊上的基板。 〔發明的效果〕 若根據本發明的浮上式塗佈裝置，則可藉由上述那樣 的構成及作用來簡便地短時間進行分解可能的浮上平台的 再組裝作業的高度調整。 -12- 201243988 【實施方式】 以下’參照附圖來說明本發明的較佳的實施形態。 在圖1〜圖3·顯示本發明之一實施形態的阻劑塗佈裝置 的浮上平台周圍的構成。圖1是表示浮上平台的側面圖， 圖2A及圖2B是表示浮上平台的上面圖，圖3是表示被分 離的各組的分段裝配（平台區塊/架台）的側面圖。 此阻劑塗佈裝置是例如以LCD用的矩形的玻璃基板G 作爲被處理基板，具有長方體形狀的浮上平台10，其係具 有基板G的數倍長度。此浮上平台10是沿著成爲搬送方 向的平台長度方向（X方向）來分割成可物理性分離的5 個平台區塊SBa，SBb，SBe，SBd，SBe。浮上平台10是 平台區塊SBa，SBb，SB。，SBd，SBe的各境界是實質上被 組裝成無間隙的接觸狀態。 如圖2A所示，在搬送方向上游側的2個平台區塊 SBa，SBb是搭載有以一定的密度或配置圖案來專門配設多 數個噴出口 12的搬入區域（第1粗略浮上區域）M|N。在 正中的平台區塊SBe是以一定的密度或配置圖案來混合配 設多數個噴出口 12及吸引口 14的塗佈區域（精密浮上區 域）MCT。在下游側的2個平台區塊SBd，SBe是以一定的 密度或配置圖案來專門配設多數個噴出口 12的搬出區域 (第2粗略浮上區域）M0Ut。 另外，在搬入區域MIN中，圖示的例子是噴出口 12 的密度或配置圖案在平台區塊SBa，SBb之間不同，但亦 -13- 201243988 可爲相同。同樣，在搬出區域Μ〇υτ中，圖示的例子是噴 出口 12的密度或配置圖案在平台區塊SBd，SBe2間不同 ，但亦可爲相同。 在圖1中，入口側的左端的平台區塊SBa是在可獨立 移動及輸送的架台FLA上經由多數的支柱18來安裝。在 各支柱18的下端部設有手動式的調整器（高度位置調整 部）20。以手來操作該等的調整器20，而可調整平台區塊 SBa的高度位置及水平度。 中間的3個平台區塊SBb，SB。，86<1是在可獨立移動 及輸送的架台FLB上經由多數的支柱22，24，26來分別 安裝。在各支柱22, 24，26的下端部分別設有手動式的 調整器（高度位置調整部）28，30，32。以手來操作該等 的調整器28，30，32，而可分別調整平台區塊3815，38(； ，SBd的高度位置及水平度。 出口側的平台區塊SBe是在可獨立移動及輸送的架台 FLc上經由多數的支柱34來安裝，在各支柱34的下端部 設有手動式的調整器（高度位置調整部）36。以手來操作 該等的調整器36，而可調整平台區塊SBe的高度位置及水 平度。 如圖2B所示，在平台區塊SBb，SB。的境界附近與平 台區塊SBe，SBd的境界附近亦即塗佈區域MCT的內側及 其周圍是配置有多數的支柱22，24，26(及調整器28, 30，32 )。這是因爲精密浮上區域的塗佈區域MCT的浮上 高度（Ηβ)非常小（例如Ηα的標準値=30〜60μιη ) ’所以 -14- 201243988 必須將平台區塊SBb，SBe間的階差（高度調整的精度） 及平台區塊SB。，SBd間的階差（高度調整的精度）形成 數1 0μπι以下。 相對於此，粗略浮上區域的搬入區域ΜΙΝ及搬出區域 M0UT的浮上高度（ΗΡ)是大1位數或2位數（例如Ηρ的 標準値=200〜2000μιη )，搭載搬入區域ΜΙΝ的平台區塊 SBa，SBb間的階差（高度調整的精度）及搭載搬出區域 Μουτ的平台區塊SBd，SBe間的階差（高度調整的精度） 是只要數ΙΟΟμιη以下即可。因此，安排於該等的境界附近 的支柱 18，22，26，34(及調整器 20，28，32，36)的 個數少即可。 再度回到圖1，在搭載搬入區域ΜΙΝ或搬出區域Μουτ 的平台區塊SBa，SBb，SBd，SBe的背面（下面）是分別 設有高壓空氣導入口 38，40，42，44。該等的空氣導入口 38，40，42，44是經由高壓空氣供給管46來連接至高壓 空氣供給部48。在各平台區塊SBa，SBb，SBd，SBe的內 部設有用以將藉由高壓空氣供給部48所供給的高壓空氣 以均一的壓力分配至搬入區域MiN或搬出區域Μουτ內的 各噴出口 12的岐管及氣體通路（未圖示）。 在搭載塗佈區域MCT的平台區塊SBe的背面（下面） 安裝有高壓空氣導入口 50及真空導入口 52。高壓空氣導 入口 50是經由高壓空氣供給管46來連接至高壓空氣供給 部48。真空導入口 52是經由真空管54來連接至真空裝置 56。在平台區塊SBe的內部設有：用以將藉由高壓空氣供 -15- 201243988 給部48所供給的高壓空氣以均一的壓力分配至塗佈區域 MCT內的噴出口 12的岐管及氣體通路（未圖示）’及用 以將藉由真空裝置56所供給的負壓吸引力以均一的壓力 分配至塗佈區域MCT內的各吸引口 14的岐管及氣體通路 (未圖不）。 架台FLA，FLB，FLC是分別具有例如不鏽鋼製的框架 或本體58，60，62及腳部64，66，68，分別對上搭載搬 入區域MIN的平台區塊SBa，SBb彼此間及搭載搬出區域 Μ 〇 υ τ的平台區塊S B d，S B e彼此間，在地面7 0排列成一 列而配置。長型阻劑噴嘴72是被配置在搭載塗佈區域 MCT的平台區塊SBC的中心部的正上方。 製作此阻劑塗佈裝置的裝置製造商的工廠是將浮上平 台1 〇組裝成圖1所示那樣的狀態，進行裝置的最終試驗 及性能確認。在此最終試驗之前，首先在中央的架台FLB 上藉由調整器28，30，32的手動操作來進行平台區塊 SBb’ SBe，SBd的高度調整（將階差形成數ΙΟμπι以下的 調整），其次以順序不同在架台FLA，FLC上藉由調整器 20，36的手動操作進行平台區塊SBa，SBe的高度調整（ 將階差形成數ΙΟΟμιη以下的調整）。201243988 6. TECHNOLOGICAL FIELD OF THE INVENTION [Technical Field] The present invention relates to a coating apparatus in which a processing liquid is applied to a substrate while floating on a substrate. [Prior Art] In the photolithography project of the manufacturing process of the flat panel display (FPD), most of the resistive nozzles which use the opposite scanning scanning slit having a slit shape are used. A non-rotating coating method of applying a resist liquid on the substrate. In one form of the spin-free coating method, for example, as disclosed in Patent Document 1, a rectangular substrate to be processed (for example, a glass substrate) for FPD is floated in the air on a long floating platform to be conveyed in one horizontal direction ( In the longitudinal direction of the platform, the resist processing liquid is discharged in a strip shape by an elongated resist nozzle disposed above the platform, thereby applying a resist from one end to the other end of the substrate. The way the liquid floats is known. The floating platform used in such a floating-type resist coating device ejects a high-pressure gas (usually air) vertically above the platform, and the substrate is lifted in a horizontal posture by the pressure of the high-pressure air. Then, the linear motion type transporting portions disposed on the left and right sides of the floating platform detachably hold the substrates floating on the floating platform, and transport the substrates in the longitudinal direction of the platform. The upper surface (floating upper surface) of the floating platform is divided into three moving-in areas, a coating area, and a carry-out area along the transport direction. The coating area is the area where the resist liquid is supplied to the substrate at 201243988. The elongated resist nozzle is disposed above the center portion of the coating region. The floating height of the coating region is a coating gap (e.g., 200 μm) between the lower end (discharge port) of the resist nozzle and the upper surface (treated surface) of the substrate. This coating gap is an important parameter for the film thickness or the resist consumption of the left and right resist coating films, and needs to be maintained with high precision. Therefore, on the stage of the coating area, a plurality of suction ports for taking in air at a negative pressure are provided in the discharge port which is mixed with the high-pressure air. Then, for the portion passing through the coated region of the substrate, the vertical upward force of the high-pressure air is applied from the discharge port, and the vertical downward force of the negative pressure attraction force is applied by the suction port to control the two-way force against the opposite force. The balance is such that the predetermined floating height (usually 30 to 60 μm) can be stably maintained with a large floating rigidity. In this manner, the application area is a fine floating area in which the discharge port and the suction port are mostly mixed so that the substrate floats at a precise small floating height at which a large floating rigidity can be obtained, and the cost per unit area is relatively high. The size of the application region in the transport direction is such that the above-described narrow coating gap can be stably formed in the vicinity of the right underside of the resist nozzle, and is usually smaller than the size of the substrate, for example, 1/3. 1 / 1 0 degree. On the other hand, the carry-in area is a region where the loading of the substrate and the start of the floating transport are performed, and the carry-out area is a region where the floating transport is completed and the substrate is carried out. The floating height of the loading area and the carrying-out area does not require particularly high precision, and even if the floating rigidity is small, it is usually necessary to maintain the rough range of 200 to 20 0 Ομηι. On the other hand, the carry-in area and the carry-out area have a size exceeding the substrate in the transport direction. Therefore, in the loading area and the carrying-out area of the -6-201243988, the venting port is provided on the one side. [Patent Document] [Patent Document 1] [Japanese Patent Laid-Open Publication No. 2005-244155] [Invention] Problem to be Solved The above-described floating-type resist application device is assembled in the factory of the device manufacturer in the same manner as other FPD manufacturing devices, and the final test and the performance of the device are confirmed. Then, the resist coating device is decomposed into components (units, modules, subassemblies, etc.) on the hard body. Further, the decomposed components are usually transported to a plurality of trucks or containers to be shipped to the ordering party (FPD manufacturing plant), and the resist coating device is reassembled at the operating place of the device. What is problematic here is that it takes a lot of labor and time to adjust the installation of the floating platform on the order side. That is, the floating platform used in the resist coating apparatus has a total length of several times that of the substrate, and is more than 5 m for LCD (liquid crystal display). Therefore, in recent years, it is normal to divide the floating platform into the detachable three platform blocks according to the loading area, the coating area, and the unloading area, and the platform blocks are respectively installed on the independent gantry, and the The platform block and the gantry are decomposed and transported as one component (segment assembly), and the three sets of gantry and platform blocks are arranged in a row to reassemble the floating platform at the place where the ordering party is placed. At this time, the adjusters provided between the gantry and the platform block are manually operated in each segment assembly, and the height positions of the blocks of each 201243988 block are the same. However, the floating height of the loading area and the carrying-out area is 200 to 2 000 μm, and the floating height of the coating area is 30 to 60 μm, which is 1 or 2 digits. Therefore, it is necessary to lower the difference or step of the height position between the platform block at both ends of the loading area and the carry-out area and the platform block in the middle of the mounting application area by several 〇μηα or less. Otherwise, when the substrate is transported on the floating surface, there is a fear that the substrate rubs against the step of the boundary of the platform block and is damaged or even damaged. For the above-mentioned reasons, in the conventional floating type resist coating apparatus, it is not unusual to spend only one full day in the height adjustment of the platform block in the reassembly operation of the ordering device. The burden is enormous. Inconvenience. The present invention has been made in view of the above-described problems of the prior art, and provides a floating type coating apparatus which can easily adjust the height of a reassembly operation of a floating platform in a short time. (Means for Solving the Problem) The floating type coating apparatus according to the first aspect of the present invention includes: a floating upper platform that is in a first coarse floating area, a fine floating area, and a second rough floating area along the conveying direction. The order is set in a row, in which the substrate is floated in the air at a precise first floating height suitable for the coating process, and in the first and second rough floating regions, the substrate is floated above the first a second higher floating height is floated in the air; -8- 201243988 a substrate transporting portion that detachably holds the substrate floating on the floating platform, and the first rough floating region passes through the precise floating region And a processing liquid supply unit having a long nozzle that discharges a processing liquid for coating onto the surface to be processed of the substrate in the precise floating region, and the floating platform is provided Dividing into at least the first, second, third, fourth, and fifth five platform blocks along the transport direction, so that the platform blocks can be physically separated. The first platform block is mounted with a part of the first rough floating area, and the remaining part or all of the first rough floating area is mounted on the second platform block, and the precise floating area is mounted on the third platform block. In the fourth platform block, a part of the second rough floating area is mounted, and the remaining part or all of the second rough floating area is mounted on the fifth platform block, and the second and third The fourth platform block is arranged and mounted on the first gantry that can be independently transported, and has a first height adjusting unit that individually adjusts the height positions of the second, third, and fourth platform blocks on the first gantry. In the device configuration of the first aspect, the height adjustment for matching the height positions of the second, third, and fourth platform blocks is performed with accuracy based on the first floating height, and therefore troublesome work is required. However, once these height adjustments are made, even if the floating platform is decomposed into the first to fifth (or more) platform blocks, the height relationship between the second, third, and fourth platform blocks will be Since the common (1st) gantry is kept constant, when -9-201243988 reassembles the floating platform, it is not necessary to perform the troublesome height adjustment operation based on the required accuracy based on the first floating height. The height adjustment of the reassembly operation of the floating platform is as long as the comparison between the first platform block and the second platform block, and between the fourth platform block and the fifth platform block, based on the second floating height. In addition, the floating top coating apparatus of the second aspect of the present invention has a floating upper platform which is a first rough floating area, a fine floating area, and a second rough along the conveying direction. The order of the floating regions is set in a row, and the substrate is suspended in the air in a precise floating upper region in a precise floating upper region, and the substrate is made in the first and second rough floating regions. a second floating height having a larger vertical height and floating in the air; the substrate transporting portion detachably holding the substrate floating on the floating platform, and transporting the first rough floating region from the precision floating region And a processing liquid supply unit having a long nozzle that discharges a processing liquid for coating onto the surface to be processed of the substrate in the precise floating region And dividing the floating platform into at least the first 'second and third three platform blocks along the transport direction, so that the platform blocks can be physically separated, and the first platform block is a part of the first rough floating area is mounted, and a part or all of the first rough floating area and all of the precise floating area and the rough floating area of the second -10-201243988 are mounted on the second land block. In some cases, the remaining portion of the second rough floating area is mounted on the third platform block, and the second platform block is attached to the first gantry that can be independently transported, and is provided on the first gantry. The first height adjustment unit that adjusts the height position of the second platform block. In the device configuration of the second aspect, the boundary portions of the first and second rough floating regions and the precise floating region are not physically separated from each other, and are integrated. Therefore, it is not necessary to initially use the first floating height as a reference. In the case of the troublesome height adjustment operation, the height of the floating platform is decomposed into the first to third (or more) platform blocks, and the height adjustment of the accuracy based on the first floating height is not required. operation. The height adjustment of the reassembly operation of the floating platform is as long as the comparison between the first platform block and the second platform block, and between the second platform block and the fifth platform block, based on the second floating height. The accuracy of the slowing can be performed. Moreover, the floating type coating apparatus according to a third aspect of the present invention includes: a floating upper platform which is arranged in a row in the order of the first rough floating upper region, the fine floating upper region, and the second rough floating region along the conveying direction. The precision floating region is such that the substrate floats in the air at a precise first floating height suitable for the coating process, and the first and second rough floating regions are such that the substrate is larger than the first floating height. (2) a substrate transporting portion that detachably holds the substrate floating on the floating platform, and transports the first rough floating region to the second rough floating region via the precise floating region; -11 - 201243988 The processing liquid supply unit has a long nozzle that discharges the processing liquid for coating onto the processed surface of the substrate in the precise floating region, and divides the floating platform in the transport direction. Forming at least the second, third, and fourth three physically separable platform blocks, and mounting the first coarse floating area on the second platform block, 3 platform blocks are mounted on all of the above-mentioned precision floating regions, and the second coarse floating region is mounted on the fourth platform block, and the second, third, and fourth platform blocks are arranged on the first gantry, and the The second height adjustment unit that individually adjusts the height positions of the second, third, and fourth platform blocks on the first stage includes a first platform block that is connected to the second platform of the floating platform The block side may be physically separated from the floating platform; the fifth platform block is connected to the fourth platform block side of the floating platform, and may be physically separated from the floating platform; and the rotating plural The transport rollers are disposed on the upper portions of the first and fifth platform blocks for horizontally transporting the substrates on the first and fifth platform blocks. [Effects of the Invention] According to the floating type coating apparatus of the present invention, it is possible to easily adjust the height of the reassembly operation of the floating platform in a short time by the above-described configuration and action. -12-201243988 [Embodiment] Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings. Fig. 1 to Fig. 3 show the configuration around the floating platform of the resist application device according to the embodiment of the present invention. Fig. 1 is a side view showing a floating platform, Figs. 2A and 2B are top views showing a floating platform, and Fig. 3 is a side view showing a divided assembly (platform block/stand) of each group to be separated. This resist application device is, for example, a rectangular glass substrate G for LCD, as a substrate to be processed, and has a rectangular parallelepiped floating platform 10 having a length several times that of the substrate G. The floating platform 10 is divided into five platform blocks SBa, SBb, SBe, SBd, and SBe which are physically separated in the longitudinal direction (X direction) of the platform to be transported. The floating platform 10 is a platform block SBa, SBb, SB. The boundaries of SBd and SBe are substantially assembled into a contactless state without gaps. As shown in FIG. 2A, in the two platform blocks SBa and SBb on the upstream side in the transport direction, a loading area (first rough floating area) in which a plurality of discharge ports 12 are exclusively disposed at a constant density or arrangement pattern is mounted. |N. The center platform block SBe is a mixture of a plurality of discharge ports 12 and a suction port 14 (precision floating area) MCT in a certain density or arrangement pattern. On the downstream side of the two platform blocks SBd, SBe is provided with a plurality of carry-out areas (second coarse floating areas) M0Ut of a plurality of discharge ports 12 in a certain density or arrangement pattern. Further, in the carry-in area MIN, the illustrated example is that the density or arrangement pattern of the discharge port 12 is different between the land blocks SBa, SBb, but -13-201243988 may be the same. Similarly, in the carry-out area Μ〇υτ, the illustrated example is that the density or arrangement pattern of the discharge port 12 is different between the land blocks SBd and SBe2, but may be the same. In Fig. 1, the platform block SBa at the left end of the inlet side is mounted via a plurality of struts 18 on a gantry FLA that can be independently moved and transported. A manual adjuster (height position adjusting portion) 20 is provided at the lower end portion of each of the stays 18. The adjusters 20 are operated by hand, and the height position and level of the platform block SBa can be adjusted. The middle of the three platform blocks SBb, SB. 86 <1 is mounted on the gantry FLB which can be independently moved and transported via a plurality of struts 22, 24, 26, respectively. Manual adjusters (height position adjusting portions) 28, 30, 32 are provided at the lower end portions of the respective pillars 22, 24, 26, respectively. The adjusters 28, 30, 32 can be operated by hand, and the height positions and degrees of the platform blocks 3815, 38 (;, SBd can be adjusted separately. The platform block SBe on the exit side can be independently moved and transported. The gantry FLc is attached via a plurality of struts 34, and a manual adjuster (height position adjusting unit) 36 is provided at a lower end portion of each of the struts 34. The adjusters 36 are operated by hand to adjust the platform area. The height position and level of the block SBe are as shown in Fig. 2B, and the vicinity of the boundary between the platform blocks SBb, SB and the boundary of the platform blocks SBe, SBd, that is, the inside and around the coated area MCT are arranged. Most of the pillars 22, 24, 26 (and adjusters 28, 30, 32). This is because the floating height (Ηβ) of the coated area MCT of the precision floating area is very small (for example, the standard 値=30~60μιη of Ηα) Therefore, -14-201243988 must be between the platform block SBb, the difference between the SBe (the height adjustment accuracy) and the platform block SB. The step difference between the SBd (the accuracy of the height adjustment) is formed to be less than 10 μm. , the area where the rough floating area is moved The floating height (ΗΡ) of the carry-out area M0UT is a large one-digit or two-digit number (for example, the standard 値=200 to 2000μιη of Ηρ), and the step difference between the platform blocks SBa and SBb in which the loading area is mounted (the accuracy of the height adjustment) And the step (the accuracy of the height adjustment) between the platform blocks SBd and SBe in which the carry-out area Μουτ is carried out is only a few ΙΟΟμηη or less. Therefore, the pillars 18, 22, 26, 34 arranged near these realms ( The number of the adjusters 20, 28, 32, and 36) is small. Returning to Fig. 1, the back surface (below) of the platform blocks SBa, SBb, SBd, and SBe in which the loading area ΜΙΝ or the carrying-out area Μουτ is mounted is High-pressure air introduction ports 38, 40, 42, 44 are provided, respectively. The air introduction ports 38, 40, 42, 44 are connected to the high-pressure air supply portion 48 via the high-pressure air supply pipe 46. SBa in each platform block SBb, SBd, and SBe are provided with manifolds and gas passages for distributing the high-pressure air supplied by the high-pressure air supply unit 48 to the discharge ports MiN or the discharge ports 12 in the carry-out area Μουτ at a uniform pressure ( Not shown). The high pressure air introduction port 50 and the vacuum introduction port 52 are attached to the back surface (lower surface) of the platform block SBe on which the coating region MCT is mounted. The high pressure air introduction port 50 is connected to the high pressure air supply portion 48 via the high pressure air supply pipe 46. The vacuum introduction port 52 is connected to the vacuum device 56 via a vacuum tube 54. The inside of the platform block SBe is provided for distributing the high-pressure air supplied by the high-pressure air supply unit -15-201243988 to the unit 48 at a uniform pressure. The manifold and the gas passage (not shown) to the discharge port 12 in the coating region MCT and the negative pressure attraction force supplied from the vacuum device 56 are distributed to the coating region MCT at a uniform pressure. The manifold and gas passage of each suction port 14 (not shown). The gantry FLA, FLB, and FLC are respectively provided with a frame or main body 58, 60, 62 and leg portions 64, 66, 68 of stainless steel, respectively, and platform portions SBa, SBb, and loading and unloading regions on which the loading area MIN is mounted, respectively. The platform blocks SB d and SB e of Μ τ are arranged in a row in the ground 70. The long resist nozzle 72 is disposed directly above the center portion of the land block SBC on which the coating region MCT is mounted. In the factory of the device manufacturer which produced the resist coating device, the floating platform 1 was assembled in the state shown in Fig. 1, and the final test and performance of the device were confirmed. Prior to this final test, the height adjustment of the platform blocks SBb'SBe, SBd is first performed by manual operation of the adjusters 28, 30, 32 on the central gantry FLB (adjusting the steps to a number ΙΟμπι or less), Next, the height adjustment of the platform blocks SBa and SBe is performed by the manual operation of the adjusters 20, 36 on the gantry FLA, FLC in different order (the adjustment of the step is formed below the number ΙΟΟμηη).
一旦完成裝置最終試驗及性能確認，則此阻劑塗佈裝 置會被分解成硬體上的構成要素（單元、模組、分段裝配 等）。此情況，浮上平台10是如圖3所示般分解，平台 區塊SBa及架台FLA會成爲第1組的分段裝配，平台區 塊SBb ’ SBe ’ SBd及架台FLb會成爲第2組的分段裝配JB -16- 201243988 ，平台區塊SBe及架台FLC會成爲第3組的分段裝配 該等3個的分段裝配jA，Jb，Jc通常被分成複數 卡車或貨櫃來輸送至訂貨方（LCD製造工廠）。然後 訂貨方的裝置運轉場所的地板上，該等3個的分段裝 ，JB，會被排列成一列，再組裝浮上平台1 0。 在此，平台區塊SBb，SBC，SBd是被安裝於共通 台FLB，如上述般在裝置製造商的裝置製作工廠中接 終試驗時完成高度調整，所以在此組裝的作業中不必 再度高度調整。亦即，只要分段裝配JB的輸送按通 方法安全地進行，在架台FLB上平台區塊SBb，SBC 間的階差幾乎不會有變化，因此接受最終試驗時所達 高度調整的精度會原封不動被維持。 另一方面，搭載搬入區域MIN的平台區塊SBa 彼此間因爲各個的架台FLA，F LB不同，所以一旦設 所改變’兩者間的階差通常會發生數ΙΟΟμιη以上的變 同樣’搭載搬出區域Μουτ的平台區塊SBd，SBe彼此 爲各個的架台FLb’ FLc不同，所以一旦設置場所改 則兩者間的階差通常會發生數1〇〇μιη以上的變化。因 需要在架台FLA，FLc上手動操作調整器20，36，使 區塊SBa，SBe的高度位置分別~致於平台區塊SBb 的尚度位置之局度調整的作業。但，由於此情況的高 整精度是數1 0 0 μιη以下即可，所以作業簡單，短時間 成。 如此，此實施形態有關在浮上平台1〇的再組裝 :台的 ，在 配Ja 的架 受最 進行 常的 ，SBd 成的 ，SBb 置場 化》 間因 變， 此， 平台 > SBd 度調 可完 作業 -17- 201243988 中被要求非常嚴格的高度位置精度的平台區塊SBb，SBC ，SBd是全部不要再度的高度調整，因此浮上平台的安裝 調整所要的勞力及時間會被大幅度減輕•縮短。藉此，可 使本阻劑塗佈裝置迅速地啓動。 其次，針對圖4及圖5說明此實施形態的阻劑塗佈裝 置的全體構成及作用。 如圖4所示般，在浮上平台10的左右兩側配置有直 進運動型的第1(左側）及第2 (右側）的搬送部74L， 74R。該等的搬送部74L，74R是各單獨或兩者協力，可 裝卸地保持在平台10上浮起的基板G，在平台長度方向 (X方向）搬送基板G。在浮上平台100上，基板G是取 其一對的邊會與搬送方向（X方向）平行，其他一對的邊 會與搬送方向正交那樣的水平姿勢被浮上搬送。 第1 (左側）及第2 (右側）的搬送部74L，74R是分 別具有：在浮上平台1 0的左右兩側平行配置的第1及第2 導軌76L，76R、及在該等的導軌76L，76R上可移動地安 裝於搬送方向（X方向）的第1及第2滑塊78L，78R、 及在兩導軌176L，76R上使兩滑塊78L，78L同時或個別 地直進移動的第1及第2搬送驅動部（未圖示）、及爲了 可裝卸地保持基板G而被搭載於兩滑塊78L，78R的第1 及第2保持部80L，80R。各搬送驅動部是藉由直進型的 驅動機構例如線性馬達所構成。 第1 (左側）的保持部80L是具有： 複數個的吸附墊82L，其係分別以真空吸附力來結合 -18- 201243988 於基板G的左側二角落的背面（下面）： 複數個的墊支撐部84L，其係於搬送方向（X方向） 取一定的間隔的複數處限制鉛直方向的變位而來支撐各吸 附墊82L ;及 複數個的墊促動器（actuator ) 86L，其係使該等複數 個的墊支撐部84L分別獨立昇降移動或昇降變位。 第2 (右側）的保持部80R是具有： 複數個的吸附墊82R，其係分別以真空吸附力來結合 於基板G的左側二角落的背面（下面）； 複數個的墊支撐部84R，其係於搬送方向（X方向） 取一定的間隔的複數處限制鉛直方向的變位而來支撐各.吸 附墊82R ;及 複數個的墊促動器86R，其係使該等複數個的墊支撐 部8 4R分別獨立昇降移動或昇降變位。 左右兩側的各吸附墊82L，8 2R雖圖示省略，但實際 在例如由不鏽鋼（SUS )所構成的長方體形狀的墊本體的 上面設有複數個的吸引口。該等的吸引口是經由墊本體內 的真空通路及外部的真空管來分別通至墊吸附控制部的真 空源（未圖不）。 在浮上平台1 0，應於此阻劑塗佈裝置接受阻劑塗佈處 理的新的被處理基板G是例如從設置在搬送方向上游側的 分類機單元（未圖示）使被處理基板G在水平的狀態下於 X方向水平搬入至搬入區域MIN。 搬入區域MIN是基板G的浮上搬送開始的區域，此區 -19- 201243988 域內，如上述般爲了使基板G以比較大粗略的浮上高度 Hp (標準値：200〜2〇ΟΟμιη )浮起，而以一定的密度或配置 圖案來多數設置噴出高壓空氣的噴出口 12。另外，在搬入 區域ΜιΝ亦設有用以使基板G在平台10上對位的對準機 構（未圖示）。 被設定於浮上平台1〇的長度方向中心部的塗佈區域 MCT是阻劑液供給區域，基板G是在通過此塗佈區域MCT 時從上方的阻劑噴嘴72接受阻劑液R的供給。如上述般 ，在塗佈區域MCT內，爲了使基板G以浮上剛性大的精密 浮上高度Ηα (標準値：30〜60μιη)安定地浮起，而以一定 的密度或配置圖案來混合設置噴出高壓空氣的噴出口 12 及以負壓吸入空氣的吸引口 14。 位於塗佈區域MCT的下游側的浮上平台1 0的另一端 的搬出區域M〇 υτ是基板G的浮上搬送終了的區域。在此 阻劑塗佈裝置接受塗佈處理的基板G是從此搬出區域 Μουτ例如使被處理基板G在水平的狀態下於X方向水平 經由下游側旁的分類機單元（未圖示）來移送至減壓乾燥 單元（未圖示）。在此搬出區域Μουτ中，以一定的密度 或配置圖案設置多數個用以使基板G以比較大粗略的浮上 高度Ηρ (標準値：200〜2000μηι)浮起的噴出口 12 » 阻劑噴嘴72是在其長度方向（Υ方向）具有可從一 端到另一端涵蓋浮上平台1上的基板G之縫隙狀的吐出口 72a，被安裝於門形或顛倒3字形的框架（未圖示），可例 如以具有滾珠螺桿機構的噴嘴昇降部（未圖示）的驅動來 -20- 201243988 昇降移動，連接至來自阻劑液供給部（未圖示）的阻劑液 供給管8 8。 此阻劑塗佈裝置的阻劑塗佈處理是如圖5所示般，當 基板G藉由浮上搬送來從搬入區域MIN進入塗佈區域MCT 時，基板G的浮上高度會逐漸地下降，從粗略之大的浮上 高度Hp往精密之小的浮上高度Ηα變化。在此，搬入區域 Μ1Ν之中，在平台區塊SBa的區域內是基板G的浮上高度 (粗略浮上高度）Hp會保持標準値（200〜2 000μηι )，在 平台區塊SBb的區域內是基板G的浮上高度（粗略浮上高 度）HP會從標準値減少至相當接近精密浮上高度Ηα的値 (例如50μιη程度）。然後，在塗佈區域MCT (平台區塊 SBC的區域）內，特別是在阻劑噴嘴72的正下面附近，基 板G的浮上高度（精密浮上高度）Ηα會被保持於標準値 (30~60μιη)。一旦基板G超過塗佈區域Mct，亦即一旦 進入區塊SBd的區域，則基板G的浮上高度會移至粗略浮 上高度HP，逐漸地增大至粗略浮上高度HP的標準値（ 200~2000μηι) 〇 如此，基板G在塗佈區域MCT內不會跳動於上下來保 持精密浮上高度Ηα移動，藉此藉由阻劑噴嘴72來帶狀供 給的阻劑液R會在基板G上被均一地塗佈，從基板G的 前端往後端以一定的膜厚形成阻劑液R的塗佈膜RM。 〔其他的實施形態或變形例〕 以上，說明本發明的較佳的一實施形態，但本發明並 -21 - 201243988 非限於上述實施形態，亦可在其技術思想的範圍內實施各 種的變形。 例如圖6A及圖6B所示，亦可將分別搭載有與搬入區 域MIN及搬出區域Μουτ的塗佈區域MCT鄰接的一部分之 平台區塊SBb，SBd和搭載有塗佈區域MCT的平台區塊 SBe —體形成的構成（亦即使平台區塊SBb，SBd吸收於平 台區塊SBe的構成）。若根據該構成，則搬入區域M1N及 搬出區域Μουτ與塗佈區域MCT的境界全不需要高度調整 ’且可取得不需要在該等的境界附近緊密地設置支柱及調 整器之優點。 上述實施形態是在架台FLA，FLB，FLC分別安裝腳部 64，66，68，將該等的架台FLA，FLB，FLC個別地配置於 地板7 〇上。但，亦可爲如圖7所示般，例如使兩端的架 台FLA，FLC經由金屬零件90及螺栓92來可裝卸地固定 於中央的架台FLB的形態。此情況，在架台FLB與地板 70之間最好設置除震台94 ^ 上述的實施形態是在搬入區域MIN及搬出區域Μ〇υτ 的平台區塊SBb，SBd所搭載的部分專門配設噴出口 12。 但，爲了使粗略浮上高度Hp的變化順暢地進行，亦可在 平台區塊SBb，SBd的區域內以適度的密度混在吸入口 14 〇 上述的實施形態是將搬入區域MIN及搬出區域Μουτ 分成2個不同的平台區塊來搭載，但亦可爲將搬入區域 ΜΙΝ及/或搬出區域Μουτ分成3個以上不同的平台區塊來 -22- 201243988 搭載的構成。 上述實施形態的第1浮上高度（精密浮上高度）Ηα& 第2浮上高度（粗略浮上高度）Ηρ的値爲一例，可按照塗 佈處理的規格等來選擇各種的値。 其他，有關浮上平台10上的噴出口 12/吸引口 14的 配置圖案或浮上平台10周圍以外的部分（基板搬送部等 )也可實施種種的變形。 例如，亦可使用圖8所示的平台區塊SBf、SBg來取 代平台區塊SBa、SBe。平台區塊SBf、SBg是具有用以搬 送被處理基板G的圓柱狀或圓板狀的搬送滾輪100。搬送 滾輪1〇〇是在Y方向設成比被處理基板G的寬度更長。 並且，具有用以分別使搬送滾輪100旋轉之未圖示的滾輪 旋轉手段。被處理基板G是被載置於搬送滾輪100，可使 搬送滾輪100旋轉來將被處理基板G搬送於X方向。另 外，搬送滾輪100的上端（基板的載置位置）的高度是被 設定成離平台區塊SBb、SBc、SBd的上面，h(=浮上高 度Ηβ)以上的高度。這是考慮搬送滾輪100上的被處理 基板G的彎曲。在此例，平台區塊SBf、SBg是不需要噴 射高壓空氣來使被處理基板G浮上’因此要比使用平台區 塊SBa、SBe更能降低高壓空氣的使用量。 另外，搬送滾輪100亦可在Y方向設成比被處理基板 G的寬度更短。 另外，在訂貨方再度組裝3個的分段裝配JA、JB、 JC時，可手動操作調整器20、36，使平台區塊SBa、SBe -23- 201243988 的咼度位置分別一致於平台區塊SBb、SBd的位置，但亦 可調整腳部64、66、68的長度來使平台區塊SB a〜SBe的 高度一致。例如，腳部64、66、68分別成爲調整器（高 度位置調整部），只要調節腳部64、66、68的長度來使 平台區塊SB a〜S Be的高度一致即可。如此一來，由於腳部 64、66、68數量要比調整器20、36少，因此能以更短時 間完成平台區塊SBa〜S Be的高度調整作業。 上述實施形態是有關LCD製造用的阻劑塗佈裝置， 但本發明亦可適用於在被處理基板上塗佈處理液之任意的 塗佈裝置。因此，本發明的處理液，除了阻劑液以外，亦 可例如爲層間絕緣材料、介電質材料、配線材料等的塗佈 液，或顯像液或洗滌液等。本發明的被處理基板並非限於 LCD基板，亦可爲其他的平面顯示器用基板、半導體晶圓 、CD基板、玻璃基板、光罩、印刷基板等。 1J 明 說 單 簡 式 圖 圖1是表示本發明之一實施形態的阻劑塗佈裝置的浮 上平台周圍的構成的側面圖》 圖2A是表示上述浮上平台的噴出口及吸引口的配置 圖案之一例的上面圖。 圖2B是表示在架台上支撐上述浮上平台的各平台區 塊的支柱的配置圖案之一例的上面圖。 圖3是表示將上述浮上平台與架台—起以分段裝配單 位來分解的狀態的側面圖。 -24- 201243988 圖4是表示上述阻劑塗佈裝置的全體構成的立體圖。 圖5是表示上述阻劑塗佈裝置的阻劑塗佈處理的作用 圖。 圖6 A是表示浮上平台周.圍—的構成的—變形例的上面 圖。 匱I 6B是表示上述變形例的支柱的配置圖案的上面圖 〇 圖7是表示浮上平台周圍的構成的別的變形例的側面 圖。 圖8是表示浮上平台周圍的構成的別的變形例的側面 圖。 【主要元件符號說明】 10 ： 浮上 平 台 12 ： 噴出 P 14 ： 吸引 P 18， 22， 24 -26 ，34 : 支柱 20， 28 * 30 ，32 ，36 : 調整器 72 ： 阻劑 噴 嘴 74L ，74R ： 搬送 部 SBa ，SBt )， SBC > SBd， SBe :平台區塊 FLa ，FLi B， FLC :架台 Ja > Jb， J C :分段裝配Once the final test and performance confirmation of the device is completed, the resist coating device is broken down into hardware components (units, modules, segmented assemblies, etc.). In this case, the floating platform 10 is decomposed as shown in FIG. 3, and the platform block SBa and the gantry FLA become the segment assembly of the first group, and the platform blocks SBb 'SBe ' SBd and the gantry FLb become the points of the second group. Segment assembly JB -16- 201243988, platform block SBe and gantry FLC will become the third group of segment assembly. The three segment assemblies jA, Jb, Jc are usually divided into multiple trucks or containers for delivery to the ordering party ( LCD manufacturing factory). Then, on the floor of the equipment operation place of the ordering party, the three sub-assemblies, JB, are arranged in a row, and the floating platform 10 is assembled. Here, the platform blocks SBb, SBC, and SBd are mounted on the common station FLB, and the height adjustment is completed at the final test of the device manufacturer's device manufacturing factory as described above, so that it is not necessary to adjust the height in the assembly work. . That is, as long as the transport of the segmented assembly JB is safely performed, the step difference between the platform blocks SBb and SBC on the gantry FLB hardly changes, so the accuracy of the height adjustment received in the final test will be intact. It is maintained without being moved. On the other hand, the platform blocks SBa in which the loading area MIN is mounted differ from each other because of the gantry FLA and F LB. Therefore, if the difference between the two is changed, the difference between the two is usually the same as the number ΙΟΟμηη or more. The platform blocks SBd and SBe of Μουτ are different for each of the gantry FLb' FLc. Therefore, once the location is changed, the difference between the two is usually changed by several 〇〇μιη or more. It is necessary to manually operate the adjusters 20, 36 on the gantry FLA, FLc, so that the height positions of the blocks SBa, SBe are respectively adjusted to the degree of the position adjustment of the platform block SBb. However, since the high precision of this case is less than 1 0 0 μηη, the operation is simple and short-term. Thus, this embodiment relates to the reassembly of the floating platform 1〇: the table is replaced by the most common, the SBd is formed by the SBb, and the SBd is adjusted. In the operation -17- 201243988, the platform blocks SBb, SBC and SBd which are required to have very strict height position accuracy are all not to be re-adjusted. Therefore, the labor and time required for the installation and adjustment of the floating platform will be greatly reduced and shortened. . Thereby, the present resist application device can be started up quickly. Next, the overall configuration and operation of the resist coating apparatus of this embodiment will be described with reference to Figs. 4 and 5 . As shown in Fig. 4, the first (left) and second (right) transporting portions 74L, 74R of the straight motion type are disposed on the left and right sides of the floating platform 10. The transport units 74L and 74R are detachably held by the substrate G floating on the stage 10, and the substrates G are transported in the longitudinal direction of the platform (X direction). In the floating platform 100, the substrate G has a pair of sides which are parallel to the transport direction (X direction), and the other pair of sides are floated and transported in a horizontal posture orthogonal to the transport direction. The first (left) and second (right) transporting portions 74L, 74R are respectively provided with first and second guide rails 76L, 76R that are arranged in parallel on the left and right sides of the floating platform 10, and the guide rails 76L. The first and second sliders 78L and 78R that are movably attached to the transport direction (X direction) on the 76R, and the first and second slides 78L and 78L that move the two sliders 78L and 78L simultaneously or individually on the two guide rails 176L and 76R. The second transport drive unit (not shown) and the first and second holding portions 80L and 80R that are mounted on the sliders 78L and 78R in order to detachably hold the substrate G. Each of the transport drive units is constituted by a linear drive mechanism such as a linear motor. The first (left) holding portion 80L has a plurality of adsorption pads 82L which are respectively bonded to the back surface (lower surface) of the left side of the substrate G by -18-201243988 by vacuum suction force: a plurality of pad supports The portion 84L supports the respective adsorption pads 82L by restricting the displacement in the vertical direction at a plurality of predetermined intervals in the transport direction (X direction), and a plurality of pad actuators 86L. The plurality of pad support portions 84L are independently moved up and down or moved up and down. The second (right) holding portion 80R has a plurality of adsorption pads 82R which are respectively coupled to the back surface (lower surface) of the left side corners of the substrate G by vacuum suction force; a plurality of pad supporting portions 84R, In the transport direction (X direction), a plurality of fixed intervals are used to limit the displacement in the vertical direction to support each of the adsorption pads 82R; and a plurality of pad actuators 86R for supporting the plurality of pads The portions 8 4R are independently moved up and down or moved up and down. Although the respective adsorption pads 82L and 8 2R on the left and right sides are not shown, a plurality of suction ports are actually provided on the upper surface of the rectangular parallelepiped pad body made of, for example, stainless steel (SUS). These suction ports are respectively passed to a vacuum source (not shown) of the pad adsorption control unit via a vacuum passage in the pad body and an external vacuum tube. In the floating substrate 10, the new substrate G to be processed which is subjected to the resist coating treatment in the resist coating device is, for example, the substrate G to be processed from a sorter unit (not shown) provided on the upstream side in the transport direction. In the horizontal state, it is horizontally moved into the carry-in area MIN in the X direction. The loading area MIN is an area where the floating conveyance of the substrate G is started. In the area of the area -19-201243988, as described above, in order to float the substrate G with a relatively large floating height Hp (standard 値: 200 〜 2 〇ΟΟ μιη), On the other hand, a plurality of discharge ports 12 for discharging high-pressure air are provided in a certain density or arrangement pattern. Further, an alignment mechanism (not shown) for aligning the substrate G on the stage 10 is also provided in the loading area ΜιΝ. The application region MCT set in the longitudinal center portion of the floating platform 1A is a resist liquid supply region, and the substrate G receives the supply of the resist liquid R from the upper resist nozzle 72 when passing through the application region MCT. As described above, in the coating region MCT, in order to make the substrate G float stably with a high floating height Ηα (standard 値: 30 to 60 μm) with a large floating rigidity, a high pressure of discharge is set at a certain density or arrangement pattern. The air outlet port 12 and the suction port 14 for sucking air at a negative pressure. The carry-out area M〇 τ of the other end of the floating upper stage 10 located on the downstream side of the coating area MCT is the area where the floating transfer of the substrate G is completed. The substrate G subjected to the coating treatment by the resist coating apparatus is transferred from the loading area to the processing unit G in a horizontal state via a sorter unit (not shown) on the downstream side in the X direction horizontally, for example. Drying unit under reduced pressure (not shown). In the carry-out area Μουτ, a plurality of discharge ports 12 for floating the substrate G at a relatively large floating height Ηρ (standard 値: 200 to 2000 μηι) are disposed in a certain density or arrangement pattern. A slit-shaped discharge port 72a having a slit shape covering the substrate G on the floating platform 1 from one end to the other end in the longitudinal direction (Υ direction) is attached to a gate-shaped or inverted-shaped frame (not shown), for example, The nozzle lifting portion (not shown) having the ball screw mechanism is moved up and down by -20-201243988, and is connected to the resist liquid supply pipe 8 8 from the resist liquid supply unit (not shown). In the resist coating process of the resist coating device, as shown in FIG. 5, when the substrate G enters the coating region MCT from the loading region MIN by floating transport, the floating height of the substrate G gradually decreases. The coarse and large floating height Hp changes to a precise small floating height Ηα. Here, in the loading area Μ1Ν, in the area of the platform block SBa, the floating height (roughly floating height) Hp of the substrate G is maintained at the standard 値 (200 to 2 000 μηι), and in the region of the land block SBb is the substrate. The floating height of G (roughly floating height) HP will decrease from the standard enthalpy to a level that is quite close to the precision floating height Ηα (for example, 50 μm). Then, in the coating area MCT (area of the land block SBC), particularly near the right side of the resist nozzle 72, the floating height (precision floating height) Ηα of the substrate G is maintained at the standard 値 (30 to 60 μm) ). Once the substrate G exceeds the coating area Mct, that is, once entering the area of the block SBd, the floating height of the substrate G is moved to the coarse floating height HP, gradually increasing to the standard height 粗 (200~2000μηι) of the coarse floating height HP. In this way, the substrate G does not jump up and down in the coating region MCT to maintain a precise floating height Ηα movement, whereby the resist liquid R supplied in a strip shape by the resist nozzle 72 is uniformly coated on the substrate G. The cloth forms a coating film RM of the resist liquid R from the front end to the rear end of the substrate G with a constant film thickness. [Other Embodiments and Modifications] Although a preferred embodiment of the present invention has been described above, the present invention is not limited to the above-described embodiments, and various modifications can be made without departing from the spirit and scope of the invention. For example, as shown in FIG. 6A and FIG. 6B, a part of the platform blocks SBb and SBd adjacent to the application area MCT of the carry-in area MIN and the carry-out area Μουτ, and the platform block SBe on which the coated area MCT is mounted may be mounted. - Composition of body formation (Also, even if the platform block SBb, SBd is absorbed by the configuration of the platform block SBe). According to this configuration, the heights of the carry-in area M1N and the carry-out area Μουτ and the application area MCT are not required to be adjusted at all, and the advantage that the support and the adjuster are not required to be closely arranged in the vicinity of the boundary can be obtained. In the above embodiment, the leg portions 64, 66, and 68 are attached to the gantry FLA, FLB, and FLC, respectively, and the gantry FLA, FLB, and FLC are individually disposed on the floor panel 7. However, as shown in Fig. 7, for example, the gantry FLA, FLC at both ends may be detachably fixed to the center gantry FLB via the metal fitting 90 and the bolt 92. In this case, it is preferable to provide the deismometer 94 between the gantry FLB and the floor 70. The above embodiment is the platform block SBb in the carry-in area MIN and the carry-out area Μ〇υ, and the portion mounted on the SBd is provided with a discharge port. 12. However, in order to smoothly change the rough floating height Hp, the suction port 14 may be mixed at an appropriate density in the region of the land blocks SBb and SBd. In the above embodiment, the carry-in area MIN and the carry-out area Μουτ are divided into two. It is equipped with a different platform block, but it can also be used to divide the moving area and/or the moving out area Μουτ into three or more different platform blocks to be mounted on -22-201243988. In the first embodiment, the first floating height (precision floating height) Η α & second floating height (roughly floating height) Η ρ is an example, and various flaws can be selected in accordance with the specifications of the coating process. In addition, various types of deformations may be performed on the arrangement pattern of the discharge port 12/suction port 14 on the floating platform 10 or the portion other than the periphery of the floating platform 10 (substrate conveying portion, etc.). For example, the platform blocks SBa, SBg shown in Fig. 8 can also be used to replace the platform blocks SBa, SBe. The platform blocks SBf and SBg are cylindrical or disk-shaped transfer rollers 100 for transporting the substrate G to be processed. The transport roller 1 is set to be longer in the Y direction than the width of the substrate G to be processed. Further, there is provided a roller rotating means (not shown) for rotating the conveying roller 100, respectively. The substrate G to be processed is placed on the transport roller 100, and the transport roller 100 can be rotated to transport the substrate G to be processed in the X direction. Further, the height of the upper end of the transport roller 100 (the mounting position of the substrate) is set to be higher than the upper surface of the land blocks SBb, SBc, and SBd, h (= floating height Η β). This is a consideration of the bending of the substrate G to be processed on the transport roller 100. In this case, the platform blocks SBf, SBg do not need to eject high-pressure air to float the substrate G to be processed. Therefore, it is possible to reduce the amount of high-pressure air used more than the use of the platform blocks SBa and SBe. Further, the transport roller 100 may be disposed in the Y direction to be shorter than the width of the substrate G to be processed. In addition, when the ordering party assembles the three subassemblies JA, JB, and JC again, the adjusters 20 and 36 can be manually operated, so that the twist positions of the platform blocks SBa and SBe -23-201243988 are consistent with the platform blocks. The positions of SBb and SBd, but the length of the legs 64, 66, 68 can also be adjusted to make the heights of the platform blocks SB a to SBe uniform. For example, the leg portions 64, 66, and 68 are respectively adjusters (high-position adjusting portions), and the lengths of the leg portions 64, 66, and 68 may be adjusted to match the heights of the land blocks SBa to SBe. As a result, since the number of the legs 64, 66, 68 is smaller than that of the adjusters 20, 36, the height adjustment operation of the platform blocks SBa to S Be can be completed in a shorter time. The above embodiment relates to a resist coating device for LCD manufacturing, but the present invention is also applicable to any coating device that applies a processing liquid to a substrate to be processed. Therefore, the treatment liquid of the present invention may be, for example, a coating liquid such as an interlayer insulating material, a dielectric material or a wiring material, or a developing liquid or a washing liquid, in addition to the resist liquid. The substrate to be processed of the present invention is not limited to the LCD substrate, and may be another substrate for a flat panel display, a semiconductor wafer, a CD substrate, a glass substrate, a photomask, a printed substrate, or the like. 1 is a side view showing a configuration around a floating platform of a resist application device according to an embodiment of the present invention. FIG. 2A is a view showing an example of an arrangement pattern of a discharge port and a suction port of the floating platform. The picture above. Fig. 2B is a top view showing an example of an arrangement pattern of the pillars of the respective platform blocks supporting the floating platform on the gantry. Fig. 3 is a side view showing a state in which the floating platform and the gantry are separated by a unit assembly. -24- 201243988 FIG. 4 is a perspective view showing the overall configuration of the above-described resist application device. Fig. 5 is a view showing the action of the resist coating treatment of the above-described resist application device. Fig. 6A is a top view showing a modification of the configuration of the floating platform circumference.匮I 6B is a top view showing an arrangement pattern of pillars in the above-described modification. Fig. 7 is a side view showing another modification of the configuration around the floating platform. Fig. 8 is a side view showing another modification of the configuration around the floating platform. [Main component symbol description] 10 : Floating platform 12 : Discharge P 14 : Attract P 18, 22, 24 -26 , 34 : Pillar 20, 28 * 30 , 32 , 36 : Adjuster 72 : Resistor nozzle 74L , 74R : Transport Department SBa, SBt), SBC > SBd, SBe: Platform Block FLa, FLi B, FLC: Stand Ja > Jb, JC: Segment Assembly