JP5369128B2 - Floating coating device - Google Patents

Description

The present invention relates to a floating-type coating apparatus that coats a processing liquid on a substrate while the substrate is floated and conveyed on a stage.

  In a photolithography process in a manufacturing process of a flat panel display (FPD), a spinless coating method in which a resist liquid is coated on a substrate to be processed by relatively scanning a long resist nozzle having a slit-like discharge port. Is frequently used.

  As one form of such a spinless coating method, as disclosed in Patent Document 1, for example, a rectangular substrate to be processed (for example, a glass substrate) for FPD is floated in the air on a long levitation stage to be in one horizontal direction. The resist solution is applied from one end to the other on the substrate by discharging the resist solution in a strip form from a long resist nozzle installed above the stage at the application processing position in the middle of the transfer. A levitation method is known.

  The levitation stage used in such a levitation-type resist coating apparatus ejects a high-pressure gas (usually air) vertically upward from the upper surface of the stage, and the substrate is floated in a horizontal posture by the pressure of the high-pressure air. ing. A linearly moving type transfer unit disposed on both the left and right sides of the levitation stage holds the substrate floating on the levitation stage in a detachable manner and conveys the substrate in the longitudinal direction of the stage.

  The upper surface (floating surface) of the levitation stage is divided into three areas: a carry-in area, a coating area, and a carry-out area along the conveyance direction. Here, the application region is a region where the resist solution is supplied onto the substrate, and the long resist nozzle is disposed above the center of the application region. The flying height in the coating region defines a coating gap (for example, 200 μm) between the lower end (discharge port) of the resist nozzle and the upper surface of the substrate (surface to be processed). This coating gap is an important parameter that affects the film thickness of the resist coating film and the resist consumption, and must be kept constant with high accuracy. For this reason, a large number of suction ports are provided on the upper surface of the stage in the coating region so as to be mixed with a jet outlet from which high-pressure air is jetted out and suck in air at a negative pressure. A vertical upward force due to high-pressure air is applied from the jet outlet to the portion passing through the coating region of the substrate, and at the same time, a vertical downward force due to a negative pressure suction force is applied from the suction port to counteract both directions. By controlling the balance of the force, a predetermined flying height (usually 30 to 60 μm) is kept stable with a large flying rigidity.

  As described above, the application region is a precise levitation region in which a large number of jet outlets and suction ports are mixed to float the substrate with a precise small levitation height that can obtain a large levitation rigidity, and the cost per unit area is considerably high. Of course, the size of the coating area in the transport direction only needs to be large enough to stably form the narrow coating gap as described above in the vicinity immediately below the resist nozzle, and is usually smaller than the size of the substrate. / 3 to 1/10 may be sufficient.

  On the other hand, the carry-in area is an area where the substrate is carried in and the levitation conveyance is started, and the carry-out area is an area where the levitation conveyance is finished and the substrate is carried out. The flying height of the carry-in area and the carry-out area does not require a particularly high accuracy, and the flying height may be small. Therefore, the fly height may be kept within a rough range of 200 to 2000 μm. On the other hand, the carry-in area and the carry-out area have a size larger than the substrate in the carrying direction. For this reason, the ejection area is exclusively provided on the entire surface of the carry-in area and the carry-out area.

JP 2005-244155 A

  Like the other FPD manufacturing apparatuses, the above-described levitation type resist coating apparatus is assembled at a manufacturing factory of an apparatus manufacturer, and undergoes final tests and confirmation of apparatus performance. Thereafter, the resist coating apparatus is disassembled into hardware components (units, modules, subassemblies, etc.). The disassembled components are usually divided into a plurality of trucks or containers and carried to a delivery destination (FPD manufacturing factory), and the resist coating apparatus is assembled again at the apparatus operating place.

  The problem here is that a great deal of labor and time is spent on the installation and adjustment of the levitation stage at the delivery site. That is, the levitation stage used in the resist coating apparatus has a total length several times that of the substrate, and there are some that are well over 5 m for LCDs (liquid crystal displays). For this reason, in recent years, it has become normal to divide the levitation stage into three stage blocks that can be separated into a carry-in area, a coating area, and a carry-out area, and each stage block is attached to an independent frame. The stage block and the pedestal are disassembled and transported as one component (subassembly), and three sets of the pedestal and the stage block are arranged in a row at the installation site of the delivery destination to reassemble the floating stage. At that time, in each subassembly, an adjuster provided between the gantry and the stage block is manually operated so that the height positions of the stage blocks are aligned.

  However, the flying height of the carry-in area and the carry-out area is 200 to 2000 μm, whereas the flying height of the coating area is 30 to 60 μm, which is one digit or two orders of magnitude smaller. For this reason, a difference in height position or a step between the stage blocks at both ends on which the carry-in area and the carry-out area are respectively mounted and an intermediate stage block on which the coating area is mounted must be suppressed to several tens of μm or less. Otherwise, when the substrate is levitated and conveyed, the substrate may be damaged or broken by rubbing the stepped portion of the stage block boundary.

  For the above reasons, it is not uncommon for conventional floating resist coating equipment to take a whole day to adjust the height position of the stage block during equipment reassembly at the delivery site. Was a heavy burden and inconvenience.

  The present invention solves the above-mentioned problems of the prior art, and provides a levitating coating apparatus capable of adjusting the height in a reassembling operation of a releasable levitating stage easily and in a short time. .

The floating coating apparatus according to the first aspect of the present invention includes a first rough floating region, a precision floating region, and a second rough floating region arranged in a line in this order along the transport direction. Is floated in the air with a precise first flying height suitable for the coating process, and the substrate is placed at a second flying height that is larger than the first flying height and rough in the first and second rough flying regions. A levitation stage that floats in the air and a substrate that floats on the levitation stage are detachably held, and a horizontal first from the first rough levitation region to the second rough levitation region through the precision levitation region . A substrate transport unit that transports in one direction, and a slit-like discharge port that can cover the substrate floating on the floating stage from one end to the other end in a second horizontal direction orthogonal to the first direction. It has the precision A floating type coating apparatus and a process liquid supply unit having a nozzle elongated type which ejects treatment liquid coating toward the target surface of the substrate on the region, the floating stage first at least a first in the direction of the second, third, divided into the fourth and fifth five physically separable stage block, a portion of the first rough floating region in the first stage block And mounting the remaining part or all of the first rough levitation area on the second stage block, mounting the entire precision levitation area on the third stage block, and the fourth stage block. A part of the second rough levitation area is mounted on the stage block, and the remaining part or all of the second rough levitation area is mounted on the fifth stage block, and the second, third and second 4 stage blocks A first height adjusting unit for adjusting the height positions of the second, third, and fourth stage blocks individually on the first frame; And the second, third, and fourth stage blocks and the first frame form a first set of sub-assemblies, and the floating stage is disassembled or assembled.

In the apparatus configuration according to the first aspect, the height adjustment for aligning the height positions of the second, third, and fourth stage blocks must be performed with accuracy based on the first flying height. Troublesome work is required. However, once these height adjustments are made in the first set of subassemblies , the second, third and third stages can be separated even if the levitation stage is disassembled into first to fifth (or more) stage blocks. Since the height relationship between the fourth stage blocks is kept constant on a common (first) platform , the first flying height in the first set of subassemblies is used when reassembling the flying stage. There is no need to re-execute troublesome height adjustment with required accuracy based on the above. The height adjustment in the reassembly operation of the levitation stage is performed by adjusting the second levitation height between the first stage block and the second stage block and between the fourth stage block and the fifth stage block. What is necessary is just to carry out with the comparatively loose required precision made into the reference | standard.

Further, the floating coating apparatus according to the second aspect of the present invention includes a first rough floating region, a precision floating region, and a second rough floating region that are arranged in this order along the transport direction, and the precision floating region. Then, the substrate is floated in the air with a precise first flying height suitable for the coating process, and the second flying surface is rougher than the first flying height in the first and second rough flying regions. a floating stage float in the air at a high, horizontal said from the said substrate that floats on the floating stage removably held to the first rough floating region to the second rough floating region through the precision floating region A substrate transport unit for transporting in the first direction, and a slit-like discharge that can cover the substrate floating on the floating stage from one end to the other end in a horizontal second direction orthogonal to the first direction. an outlet, before A floating type coating apparatus and a process liquid supply unit having a nozzle elongated type which ejects treatment liquid coating toward the target surface of the substrate precision floating region, the said floating STAGE at least a first in one direction, is divided into the second and third of the three physically separable stage block, a portion of the first rough floating region mounted to said first stage blocks, wherein The remaining part or all of the first rough levitation area, the entire precision levitation area, and a part of the second rough levitation area are mounted on the second stage block, and the third stage block is mounted on the third stage block. The remaining part or all of the second rough levitation region is mounted, the second stage block is attached to a first frame that can be carried independently, and the second stage is mounted on the first frame. Block height position Comprising a first height adjustment unit for adjusting individually the said second stage block and the first frame is a first set of sub-assembly of integral, decomposition or assembling of the floating stage line Is called.

In the apparatus configuration of the second aspect, the boundary portion between the first and second rough levitation regions and the precision levitation region is integrated in the first set of subassemblies in a physically inseparable manner. No need for troublesome height adjustment with accuracy based on the first flying height from the beginning, when the floating stage is disassembled into first to third (or higher) stage blocks and reassembled The same is true for the first set of subassemblies , and there is no need for troublesome height adjustment with accuracy based on the first flying height. The height adjustment in the reassembly operation of the levitation stage is performed by adjusting the second levitation height between the first stage block and the second stage block and between the second stage block and the fifth stage block. What is necessary is just to carry out with the comparatively loose required precision made into the reference | standard.

  According to the levitation-type coating apparatus of the present invention, the height adjustment in the reassembly operation of the releasable levitation stage can be performed easily and in a short time by the configuration and operation as described above.

It is a side view which shows the structure around the floating stage of the resist coating apparatus in one Embodiment of this invention. It is a top view which shows an example of the arrangement pattern of the jet nozzle and suction port of the said levitation | floating stage. It is a top view which shows an example of the arrangement pattern of the support | pillar which supports each stage block of the said levitation | floating stage on a mount. It is a side view which shows the state which decomposed | disassembled the said levitation | floating stage by the subassembly unit with the mount frame. It is a perspective view which shows the whole structure of the said resist coating apparatus. It is a figure which shows the effect | action in the resist coating process of the said resist coating apparatus. It is a top view which shows one modification of the structure around a floating stage. It is a top view which shows the arrangement pattern of the support | pillar in the said modification. It is a side view which shows another modification of the structure around a floating stage.

  Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings.

  1 to 3 show a configuration around a floating stage of a resist coating apparatus according to an embodiment of the present invention. FIG. 1 is a side view of the levitation stage, FIGS. 2A and 2B are top views of the levitation stage, and FIG. 3 is a side view showing each set of subassemblies (stage block / mount).

This resist coating apparatus includes a rectangular glass substrate G for use as a substrate to be processed, for example, and has a rectangular parallelepiped floating stage 10 having a length several times that of the substrate G. The levitation stage 10 is divided into five stage blocks SB _a , SB _b , SB _c , SB _d , and SB _e that can be physically separated along the stage longitudinal direction (X direction), which is the transport direction. The levitation stage 10 is assembled so that the boundaries of the stage blocks SB _a , SB _b , SB _c , SB _d , and SB _e are in a contact state with substantially no gap.

As shown in FIG. 2A, the two stage blocks SB _a and SB _b on the upstream side in the transport direction have a carry-in area (first rough levitation area) in which a large number of jet nozzles 12 are arranged with a constant density or arrangement pattern. ) M _IN is installed. The stage block SB _c middle, spout 12 and the suction port 14 and the constant density or the coating regions arranged many mixed with the arrangement pattern (Precision floating region) M _CT is mounted. The two stage blocks SB _d and SB _e on the downstream side are each mounted with a carry-out area (second rough levitation area) M _{OUT in} which a large number of the ejection ports 12 are arranged with a constant density or arrangement pattern.

In the carry-in area _MIN , the density or arrangement pattern of the ejection ports 12 is different between the stage blocks SB _a and SB _b in the illustrated example, but may be the same. Similarly, in the carry-out area M _OUT , the density or the arrangement pattern of the ejection ports 12 is different between the stage blocks SB _d and SB _{e in} the illustrated example, but may be the same.

In FIG. 1, the leftmost stage block SB _a on the entrance side is attached via a number of columns 18 on a stand FL _{A that} can be moved and transported independently. A manual adjuster (height position adjusting unit) 20 is provided at the lower end of each column 18. By manipulating these adjuster 20 by hand, and to be able to adjust the height position and horizontal degree of the stage block SB _a.

The intermediate three stage blocks SB _b , SB _c , and SB _d are respectively attached to the independently movable and transportable frame FL _B via a plurality of support columns 22, 24, and 26. Manual adjusters (height position adjusting units) 28, 30, and 32 are provided at the lower ends of the columns 22, 24, and 26, respectively. These adjusters 28, 30, and 32 can be operated by hand to adjust the height position and level of the stage blocks SB _b , SB _c , and SB _d , respectively.

The stage block SB _e on the outlet side is mounted on a pedestal FL _{C that} can be moved and transported independently via a large number of columns 34, and a manual type adjuster (high height) is attached to the lower end of each column 34. Position adjustment unit) 36 is provided. By manipulating these adjuster 36 by hand, and to be able to adjust the height position and horizontal degree of the stage block SB _e.

As shown in FIG. 2B, a large number of support columns 22, 24, 26 (in the vicinity of the boundary between the stage blocks SB _b , SB _{c and} the boundary between the stage blocks SB _c , SB _d , that is, inside and around the application region M _CT And adjusters 28, 30, 32) are arranged. This precision floating region at a flying height of the application region M _CT (H _alpha) is very small (e.g. standard value of H _alpha = 30 to 60 m), the stage block SB _b, step between SB _c (height This is because the accuracy of adjustment) and the step between the stage blocks SB _c and SB _d (accuracy of height adjustment) must be several tens of μm or less.

On the other hand, the flying height (H _β ) of the carry-in area M _IN and the carry-out area M _OUT which are rough floating areas is one digit or two digits larger (for example, the standard value of H _β = 200 to 2000 μm), and the carry-in area M _IN The step between the stage blocks SB _a and SB _b (height adjustment accuracy) and the step block SB _d and SB _e (the height adjustment accuracy) between the stage blocks SB _d and SB _e carrying the unloading area M _OUT are several hundred μm or less. I just need it. For this reason, the number of supports 18, 22, 26, and 34 (and adjusters 20, 28, 32, and 36) used near these boundaries can be reduced.

In FIG. 1 again, high-pressure air inlets 38, 40, 42, and 44 are provided on the back surface (lower surface) of the stage blocks SB _a , SB _b , SB _d , and SB _e on which the carry-in area M _IN or the carry-out area M _OUT is mounted. Each is attached. These air inlets 38, 40, 42, 44 are connected to a high-pressure air supply unit 48 via a high-pressure air supply pipe 46. Within each stage block SB _a , SB _b , SB _d , SB _e , high pressure air supplied from the high pressure air supply unit 48 is uniformly applied to each jet outlet 12 in the carry-in area M _IN or the carry-out area M _OUT . And a manifold and gas passages (not shown) are provided.

On the back of the stage block SB _c for mounting the coating region M _CT (lower surface) of the high pressure air inlet 50 and the vacuum inlet port 52 is attached. The high-pressure air inlet 50 is connected to a high-pressure air supply unit 48 via a high-pressure air supply pipe 46. The vacuum inlet 52 is connected to a vacuum device 56 via a vacuum pipe 54. Inside the stage block SB _c , a manifold and a gas passage (not shown) for distributing the high-pressure air supplied from the high-pressure air supply unit 48 to the jet outlet 12 in the application region _MCT with a uniform pressure, manifold and gas passages for distributing a uniform pressure to the suction port 14 in the negative pressure suction attraction the coating area M _CT (not shown) is provided to be supplied from the vacuum unit 56.

The mounts FL _A , FL _B , FL _C have, for example, stainless steel frames or main bodies 58, 60, 62 and legs 64, 66, 68, respectively, and a stage block SB on which a loading area _MIN is mounted. _a and SB _b and stage blocks SB _d and SB _{e on} which the carry-out area M _OUT is mounted are arranged in a line on the floor surface 70 so as to abut each other. Long resist nozzle 72 is located directly above the center of the stage block SB _c for mounting the coating area M _CT.

In a factory of an apparatus manufacturer that manufactures this resist coating apparatus, the levitation stage 10 is assembled in a state as shown in FIG. 1, and a final test and performance confirmation of the apparatus are performed. Prior to this final test, the height of the stage blocks SB _b , SB _c , and SB _d is adjusted (adjusted to make the step to be several tens μm or less) by manually operating the adjusters 28, 30, and 32 on the center frame FL _B. Next, the height adjustment of the stage blocks SB _a and SB _e (adjustment to make the step difference of several hundred μm or less) is performed by manual operation of the adjusters 20 and 36 on the gantry FL _A and FL _C in random order.

After the device final test and performance confirmation, the resist coating device is disassembled into hardware components (units, modules, subassemblies, etc.). In that case, as shown in FIG. 3, the levitation stage 10 includes a stage block SB _a and a base FL _A as a first set of subassemblies J _A , and stage blocks SB _b , SB _c , SB _d and a base FL _B There second set of subassemblies J _B becomes, and the stage block SB _e and frame FL _C is decomposed becomes third set of subassembly J _C.

These three subassemblies J _A , J _B , J _C are usually divided into a plurality of trucks or containers and transported to a delivery destination (LCD manufacturing factory). Then, these three subassemblies J _A , J _B , J _C are arranged in a line on the floor of the apparatus operating place of the delivery destination, and the levitation stage 10 is reassembled.

Here, the stage blocks SB _b , SB _c , and SB _d are attached to a common frame FL _B , and the height adjustment is completed when the final test is performed at the apparatus manufacturing factory of the apparatus manufacturer as described above. Therefore, it is not necessary to adjust the height again during the assembly work. That is, as long as the subassembly J _B is transported safely as usual, the steps between the stage blocks SB _b , SB _c , and SB _d hardly change on the frame FL _B. The accuracy of the achieved height adjustment is maintained as it is.

On the other hand, since the stage blocks SB _a and SB _{b on} which the carry-in area _MIN is mounted are different from each other in the frames FL _A and FL _B , when the installation location is changed, a change of several hundred μm or more usually occurs between the two. To do. Similarly, the stage blocks SB _d and SB _{e on} which the unloading area M _OUT is mounted have different cradles FL _B and FL _C. Therefore, when the installation location is changed, the difference between the two is usually several hundred μm or more. Occur. For this reason, the adjusters 20 and 36 are manually operated on the bases FL _A and FL _C to adjust the height positions of the stage blocks SB _a and SB _{e to} the height positions of the stage blocks SB _b and SB _d , respectively. Work is required. However, since the height adjustment accuracy in this case may be several hundred μm or less, the operation is simple and can be completed in a short time.

As described above, in this embodiment, the stage blocks SB _b , SB _c , and SB _d that require extremely severe height position accuracy during the reassembly operation of the floating stage 10 do not require any height adjustment at all. Therefore, the labor and time required for installation adjustment of the levitation stage are greatly reduced / reduced. This makes it possible to quickly start up the resist coating apparatus.

  Next, the overall configuration and operation of the resist coating apparatus in this embodiment will be described with reference to FIGS.

  As shown in FIG. 4, linear movement type first (left side) and second (right side) transfer units 74 </ b> L and 74 </ b> R are arranged on the left and right sides of the levitation stage 10. These transfer units 74L and 74R are singly or in cooperation with each other so that the substrate G floating on the stage 10 is detachably held and the substrate G is transferred in the stage longitudinal direction (X direction). It has become. On the levitation stage 100, the substrate G is levitated and conveyed in a horizontal posture such that the pair of sides are parallel to the conveyance direction (X direction) and the other pair of sides are orthogonal to the conveyance direction.

  The first (left side) and second (right side) transport units 74L and 74R include first and second guide rails 76L and 76R arranged in parallel on the left and right sides of the levitation stage 10, and the guide rails 76L and 76L. First and second sliders 78L and 78R that are movably mounted in the transport direction (X direction) on 76R, and first and second sliders 78L and 78L are linearly moved simultaneously or individually on both guide rails 176L and 76R. The first and second transport driving units (not shown) and the first and second holding units 80L and 80R mounted on the sliders 78L and 78R for detachably holding the substrate G are provided. doing. Each conveyance drive unit is configured by a linear drive mechanism such as a linear motor.

  The first (left side) holding portion 80L has a plurality of suction pads 82L that are coupled to the back surfaces (lower surfaces) of the left two corners of the substrate G by a vacuum suction force, and each suction pad 82L in the transport direction (X direction). A plurality of pad support portions 84L that support the vertical displacement at a plurality of positions at regular intervals, and a plurality of pads that move the plurality of pad support portions 84L up and down independently or move up and down. And an actuator 86L.

  The second (right side) holding portion 80R includes a plurality of suction pads 82R that are coupled to the back surfaces (lower surfaces) of the left two corners of the substrate G by a vacuum suction force, and each suction pad 82R in the transport direction (X direction). A plurality of pad support portions 84R that support the vertical displacement at a plurality of positions at regular intervals, and a plurality of pads that move the plurality of pad support portions 84R up and down independently or move up and down independently. And an actuator 86R.

  Although not shown, the suction pads 82L and 82R on both the left and right sides are provided with a plurality of suction ports on the upper surface of a rectangular parallelepiped pad body made of stainless steel (SUS), for example. These suction ports respectively communicate with a vacuum source (not shown) of the pad suction control unit via a vacuum passage in the pad main body and an external vacuum tube.

In the levitation stage 10, a new substrate G to be subjected to the resist coating process by this resist coating apparatus is, for example, flattened from a sorter unit (not shown) installed on the upstream side in the transport direction to the carry-in area _MIN . It is brought in.

Carrying region M _IN is also a region levitation transportation of the substrate G is started, a relatively large rough flying height H _beta (standard value: 200 to 2000) the substrate G as described above in this region in In order to make it float, many jet nozzles 12 which spout high pressure air are provided by fixed density or arrangement pattern. In the carry-in area _MIN , an alignment mechanism (not shown) for aligning the substrate G on the stage 10 may be provided.

The coating region M _CT set at the longitudinal center of the levitation stage 80 is a resist solution supply region, and the substrate G is supplied with the resist solution R from the upper resist nozzle 72 when passing through the coating region M _CT. . As described above, in the coating area M _CT, large precision flying height H _alpha (standard value: 30 to 60 m) of the floating rigid substrates G to float stably in, spout 12 and the negative pressure spewing the high-pressure air The suction ports 14 for sucking air are mixedly provided at a constant density or arrangement pattern.

The carry-out area M _{OUT at} the other end of the levitation stage 10 located on the downstream side of the application area M _CT is an area where the levitation transfer of the substrate G ends. The substrate G which has been subjected to the coating process by the resist coating apparatus is transferred from the carry-out area M _OUT to the reduced pressure drying unit (not shown) via a sorter unit (not shown) adjacent to the downstream side, for example. The In the carry-out area M _OUT , a large number of jet nozzles 12 with a constant density or arrangement pattern are provided for floating the substrate G with a relatively large and rough flying height H _β (standard value: 200 to 2000 μm).

  The resist nozzle 72 has a slit-like discharge port 72a that can cover the substrate G on the floating stage 1 from one end to the other end in the longitudinal direction (Y direction), and has a gate-shaped or inverted U-shaped frame (not shown). ), And can be moved up and down by driving a nozzle elevating unit (not shown) having a ball screw mechanism, for example, and is connected to a resist solution supply pipe 88 from a resist solution supply unit (not shown).

The resist coating treatment in the resist coating apparatus, as shown in FIG. 5, when the substrate G into the coating area M _CT from the loading area M _IN by levitation transportation, flying height of the substrate G is lowered gradually, in rough changes from large flying height H _beta to a small flying height H _alpha precision. Here, carrying out the regions M _IN, the flying height of the substrate G in the area of the stage block SB _a (rough flying height) H _beta is kept standard value (200 to 2000), the substrate in the area of the stage block SB _b G flying height (rough flying height) H _beta is reduced to a significant close to the precision flying height H _alpha from the standard value (for example, about 50 [mu] m). In the application region M _CT (region of the stage block SB _c ), especially in the vicinity immediately below the resist nozzle 72, the flying height (precise flying height) H _α of the substrate G is maintained at the standard value (30 to 60 μm). . When the substrate G passes the coating region M _CT , that is, enters the region of the stage block SB _d , the flying height of the substrate G shifts to the rough flying height H _β and gradually becomes the standard value of the rough flying height H _β (200 To 2000 μm).

Thus, by the substrate G in the coating area M _CT moving while maintaining a precise flying height H _alpha without or shake up and down, the resist liquid R supplied to the strip from the resist nozzle 72 is uniformly on the substrate G The coating film RM of the resist solution R is formed with a certain thickness from the front end to the rear end of the substrate G.

[Other Embodiments or Modifications]

  The preferred embodiment of the present invention has been described above, but the present invention is not limited to the above-described embodiment, and various modifications can be made within the scope of the technical idea.

For example, as shown in FIGS. 6A and 6B, the application region _{MCT includes} stage blocks SB _b and SB _{d on} which parts adjacent to the application region _MCT of the carry-in region _MIN and the carry-out region _MOUT are mounted. stage block SB _c and configured to integrally formed to be (i.e. stage block SB _c in stage block SB _b, configured to absorb SB _d) are also possible. According to such a configuration, height adjustment at the boundary between the carry-in area M _IN and the carry-out area M _OUT and the application area M _CT becomes unnecessary, and it is not necessary to provide support columns and adjusters close to those boundaries. Benefits are gained.

In the embodiment described above, the legs 64, 66, and 68 are attached to the bases FL _A , FL _B , and FL _C , respectively, and the bases FL _A , FL _B , and FL _C are individually disposed on the floor 70. However, as shown in FIG. 7, for example, a configuration in which the gantry FL _A and FL _C at both ends are detachably fixed to the central gantry FL _B via a metal fitting 90 and a bolt 92 is also possible. In this case, it is preferable to provide a seismic isolation table 94 between the gantry FL _B and the floor 70.

In the embodiment described above, the spout 12 is exclusively disposed on the portions of the carry-in area M _IN and the carry-out area M _OUT mounted on the stage blocks SB _b and SB _d . However, it is also possible to mix stage block SB _b, inlet 14 at a moderate density in the region of SB _d in order to perform smoothly a change in rough flying height H _beta.

In the above-described embodiment, the carry-in area M _IN and the carry-out area M _OUT are divided into two different stage blocks, but the carry-in area M _IN and / or the carry-out area M _OUT are divided into three or more different stage blocks. It is also possible to configure.

The values of the first flying height (precise flying height) H _α and the second flying height (rough flying height) H _β in the embodiment described above are examples, and various values are selected according to the coating processing specifications and the like. can do.

  In addition, various modifications can be made to the arrangement pattern of the jet nozzles 12 / suction ports 14 on the levitation stage 10 and portions other than the periphery of the levitation stage 10 (substrate transport unit and the like).

  Although the above-described embodiment relates to a resist coating apparatus for manufacturing an LCD, the present invention can be applied to any coating apparatus that coats a processing liquid on a substrate to be processed. Therefore, as the processing liquid in the present invention, in addition to the resist liquid, for example, a coating liquid such as an interlayer insulating material, a dielectric material, and a wiring material can be used, and a developing liquid or a rinsing liquid can also be used. The substrate to be processed in the present invention is not limited to an LCD substrate, and other flat panel display substrates, semiconductor wafers, CD substrates, glass substrates, photomasks, printed substrates, and the like are also possible.

10 floating stage 12 spout 14 suction openings 18,22,24,26,34 struts 20,28,30,32,36 adjuster 72 resist nozzle 74L, 74R transport unit _{SB a, SB b, SB c} , SB d, SB _e stage block FL _A , FL _B , FL _C frame J _A , J _B , J _C sub-assembly

Claims (12)

A first rough levitation region, a precision levitation region, and a second rough levitation region are provided in a row in this order along the transport direction, and the substrate is placed at a precise first levitation height suitable for coating processing in the precise levitation region. A levitation stage that floats in the air and floats the substrate in the air at a second levitation height that is larger and rougher than the first levitation height in the first and second rough levitation regions; a substrate conveying portion for conveying the substrate from removably held by the first rough floating region in the first direction horizontal through said precision floating region to the second rough floating regions are, the first A slit-like discharge port capable of covering the substrate floating on the floating stage from one end to the other end in a second horizontal direction perpendicular to the direction of the substrate, and processing the substrate in the precise floating region For application toward the surface Ejecting the processing liquid A floating type coating apparatus and a process liquid supply unit having a nozzle elongated type,
Wherein at least a first floating stage in the first direction, is divided into the second, third, fourth and fifth five physically separable stage block,
A part of the first rough levitation region is mounted on the first stage block, a remaining part or all of the first rough levitation region is mounted on the second stage block, and the third stage block is mounted. The entire precision floating area is mounted on the stage block, a part of the second rough floating area is mounted on the fourth stage block, and the remaining of the second rough floating area is mounted on the fifth stage block. Part or all of
The second, third and fourth stage blocks are mounted side by side on a first frame that can be carried independently,
A first height adjusting unit for individually adjusting the height positions of the second, third and fourth stage blocks on the first frame ;
The second, third and fourth stage blocks and the first frame form a first set of sub-assemblies in which the levitation stage is disassembled or assembled;
Floating coating device. Attach the first stage block to a second frame that can be transported independently;
A second height adjustment unit for adjusting a height position of the first stage block on the second frame ;
The first stage block and the second frame form a second set of sub-assemblies in which the levitation stage is disassembled or assembled;
The floating coating apparatus according to claim 1. Attach the fifth stage block to a third frame that can be carried independently;
A third height adjusting unit for adjusting a height position of the fifth stage block on the third frame ;
The fifth stage block and the third mount form a third set of sub-assemblies, and the floating stage is disassembled or assembled.
The floating coating apparatus according to claim 1 or 2. In the first and second rough levitation regions, a large number of jet ports for jetting a gas exclusively for applying a vertically upward pressure to the substrate are arranged,
In the precise levitation region, a large number of jetting ports for ejecting a gas for applying a vertical upward pressure to the substrate and a suction port for sucking a gas for applying a vertical downward pressure to the substrate are mixed. To
The floating coating apparatus according to any one of claims 1 to 3. The first flying height is 30 to 60 μm at least near the nozzle in the precision flying region,
The second flying height is 200 at least in a portion mounted on the first stage block in the first rough flying region and in a portion mounted on the fifth stage block in the second rough flying region. ~ 2000 μm,
The floating coating apparatus according to any one of claims 1 to 4. The second flying height is gradually reduced in the transport direction at the portion mounted on the second stage block in the first rough flying area, and the second flying height is increased in the fourth stage block in the second rough flying area. In the mounted part, it becomes gradually larger in the transport direction.
The floating coating apparatus according to any one of claims 1 to 5. A first rough levitation region, a precision levitation region, and a second rough levitation region are provided in a row in this order along the transport direction, and the substrate is placed at a precise first levitation height suitable for coating processing in the precise levitation region. A levitation stage that floats in the air and floats the substrate in the air at a second levitation height that is larger and rougher than the first levitation height in the first and second rough levitation regions; a substrate conveying portion for conveying the substrate from removably held by the first rough floating region in the first direction horizontal through said precision floating region to the second rough floating regions are, the first A slit-like discharge port capable of covering the substrate floating on the floating stage from one end to the other end in a second horizontal direction perpendicular to the direction of the substrate, and processing the substrate in the precise floating region For application toward the surface Ejecting the processing liquid A floating type coating apparatus and a process liquid supply unit having a nozzle elongated type,
Dividing the levitation stage into at least first, second and third physically separable stage blocks in the first direction ;
A part of the first rough levitation area is mounted on the first stage block, and the remaining part or all of the first rough levitation area and the entire precision levitation area are mounted on the second stage block. A part of the second rough levitation area is mounted, and the remaining part or all of the second rough levitation area is mounted on the third stage block,
Attaching the second stage block to a first frame that can be independently transported,
A first height adjustment unit for individually adjusting the height position of the second stage block on the first frame ;
The second stage block and the first frame form a first set of sub-assemblies, and the floating stage is disassembled or assembled;
Floating coating device. Attach the first stage block to a second frame that can be transported independently;
A second height adjusting unit for individually adjusting the height position of the first stage block on the second frame ;
The first stage block and the second frame form a second set of sub-assemblies in which the levitation stage is disassembled or assembled;
The levitation type coating apparatus according to claim 7. The third stage block is attached to a third frame that can be transported independently,
A third height adjusting unit for individually adjusting the height position of the third stage block on the third frame ;
The third stage block and the third mount form a third set of sub-assemblies, and the floating stage is disassembled or assembled.
The floating coating apparatus according to claim 7 or 8. In the first and second rough levitation regions, a large number of jet ports for jetting a gas exclusively for applying a vertically upward pressure to the substrate are arranged,
In the precise levitation region, a large number of jetting ports for ejecting a gas for applying a vertical upward pressure to the substrate and a suction port for sucking a gas for applying a vertical downward pressure to the substrate are mixed. To
The levitation type coating apparatus according to any one of claims 7 to 9. The first flying height is 30 to 60 μm at least near the nozzle in the precision flying region,
The second flying height is 200 to 200 in a portion mounted on the first stage block in the first rough flying region and a portion mounted on the third stage block in the second rough flying region. 2000 μm,
The floating type coating apparatus according to any one of claims 7 to 10.   The second flying height gradually decreases in the transport direction in the portion mounted on the second stage block in the first rough flying area, and the second stage block in the second rough flying area. The levitation coating apparatus according to any one of claims 7 to 11, wherein the portion mounted on the surface gradually increases in the transport direction.

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