TW201243500A - Negative photosensitive resin composition and coating film - Google Patents

Negative photosensitive resin composition and coating film Download PDF

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Publication number
TW201243500A
TW201243500A TW101108292A TW101108292A TW201243500A TW 201243500 A TW201243500 A TW 201243500A TW 101108292 A TW101108292 A TW 101108292A TW 101108292 A TW101108292 A TW 101108292A TW 201243500 A TW201243500 A TW 201243500A
Authority
TW
Taiwan
Prior art keywords
resin composition
photosensitive resin
compound
negative photosensitive
group
Prior art date
Application number
TW101108292A
Other languages
English (en)
Chinese (zh)
Inventor
Hideyuki Takahashi
Kenji Ishizeki
Masayuki Kawashima
Yutaka Furukawa
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of TW201243500A publication Critical patent/TW201243500A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
    • H10K71/231—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers
    • H10K71/233—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers by photolithographic etching

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electroluminescent Light Sources (AREA)
TW101108292A 2011-03-31 2012-03-12 Negative photosensitive resin composition and coating film TW201243500A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011079394A JP2014122926A (ja) 2011-03-31 2011-03-31 ネガ型用感光性組成物および塗膜

Publications (1)

Publication Number Publication Date
TW201243500A true TW201243500A (en) 2012-11-01

Family

ID=46930502

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101108292A TW201243500A (en) 2011-03-31 2012-03-12 Negative photosensitive resin composition and coating film

Country Status (3)

Country Link
JP (1) JP2014122926A (ja)
TW (1) TW201243500A (ja)
WO (1) WO2012132755A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI632423B (zh) * 2012-11-26 2018-08-11 Sumitomo Chemical Company, Limited 感光性樹脂組成物
TWI701509B (zh) * 2015-09-30 2020-08-11 日商東麗股份有限公司 負型感光性樹脂組成物、硬化膜、具備硬化膜之元件及顯示裝置、以及其製造方法

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103890128B (zh) * 2011-10-21 2016-06-29 旭硝子株式会社 拒墨剂的制造方法、负型感光性树脂组合物、分隔壁以及光学元件
CN104781074B (zh) 2012-10-31 2017-02-15 旭硝子株式会社 负型感光性树脂组合物、树脂固化膜、分隔壁以及光学元件
CN106462069B (zh) * 2014-04-25 2019-10-18 Ａｇｃ株式会社 负型感光性树脂组合物、分隔壁及光学元件
US11086219B2 (en) 2016-03-30 2021-08-10 Toray Industries, Inc. Negative-type photosensitive resin composition, cured film, display device that includes the cured film, and production method therefor

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4466183B2 (ja) * 2004-04-27 2010-05-26 旭硝子株式会社 感光性樹脂組成物及びその塗膜硬化物
WO2009141924A1 (ja) * 2008-05-23 2009-11-26 三菱化学株式会社 着色硬化性樹脂組成物、カラーフィルタ、液晶表示装置及び有機ｅｌディスプレイ
JP5073556B2 (ja) * 2008-03-31 2012-11-14 富士フイルム株式会社 感光性樹脂組成物、遮光性カラーフィルター及びその製造方法、並びに固体撮像素子
KR101269299B1 (ko) * 2008-08-01 2013-05-29 아사히 가라스 가부시키가이샤 네거티브형 감광성 조성물, 그것을 사용한 광학 소자용 격벽 및 그 격벽을 갖는 광학 소자

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI632423B (zh) * 2012-11-26 2018-08-11 Sumitomo Chemical Company, Limited 感光性樹脂組成物
TWI701509B (zh) * 2015-09-30 2020-08-11 日商東麗股份有限公司 負型感光性樹脂組成物、硬化膜、具備硬化膜之元件及顯示裝置、以及其製造方法

Also Published As

Publication number Publication date
JP2014122926A (ja) 2014-07-03
WO2012132755A1 (ja) 2012-10-04

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