TW201135792A - High voltage shielding arrangement - Google Patents
High voltage shielding arrangement Download PDFInfo
- Publication number
- TW201135792A TW201135792A TW099134286A TW99134286A TW201135792A TW 201135792 A TW201135792 A TW 201135792A TW 099134286 A TW099134286 A TW 099134286A TW 99134286 A TW99134286 A TW 99134286A TW 201135792 A TW201135792 A TW 201135792A
- Authority
- TW
- Taiwan
- Prior art keywords
- metal
- configuration
- voltage shielding
- charged particle
- edge
- Prior art date
Links
- 239000002184 metal Substances 0.000 claims abstract description 68
- 229910052751 metal Inorganic materials 0.000 claims abstract description 68
- 239000012212 insulator Substances 0.000 claims abstract description 16
- 239000002245 particle Substances 0.000 claims description 27
- 238000001459 lithography Methods 0.000 claims description 13
- 230000005684 electric field Effects 0.000 claims description 10
- 238000005253 cladding Methods 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 2
- 230000007246 mechanism Effects 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 2
- 239000010931 gold Substances 0.000 claims 2
- 229910052737 gold Inorganic materials 0.000 claims 2
- 210000004709 eyebrow Anatomy 0.000 claims 1
- 239000011859 microparticle Substances 0.000 claims 1
- 238000010276 construction Methods 0.000 description 4
- 238000002955 isolation Methods 0.000 description 3
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010292 electrical insulation Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000006978 adaptation Effects 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000000994 depressogenic effect Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000033001 locomotion Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000003307 slaughter Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K9/00—Screening of apparatus or components against electric or magnetic fields
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/0203—Protection arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/03—Mounting, supporting, spacing or insulating electrodes
- H01J2237/038—Insulating
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electron Beam Exposure (AREA)
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US25033809P | 2009-10-09 | 2009-10-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW201135792A true TW201135792A (en) | 2011-10-16 |
Family
ID=43618185
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW099134286A TW201135792A (en) | 2009-10-09 | 2010-10-08 | High voltage shielding arrangement |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8624478B2 (enExample) |
| EP (1) | EP2486580A2 (enExample) |
| JP (1) | JP5599889B2 (enExample) |
| KR (1) | KR20120093943A (enExample) |
| CN (1) | CN102687231A (enExample) |
| TW (1) | TW201135792A (enExample) |
| WO (1) | WO2011043657A2 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL2006868C2 (en) | 2011-05-30 | 2012-12-03 | Mapper Lithography Ip Bv | Charged particle multi-beamlet apparatus. |
| US10586625B2 (en) | 2012-05-14 | 2020-03-10 | Asml Netherlands B.V. | Vacuum chamber arrangement for charged particle beam generator |
| US11348756B2 (en) | 2012-05-14 | 2022-05-31 | Asml Netherlands B.V. | Aberration correction in charged particle system |
| CN104520968B (zh) * | 2012-05-14 | 2017-07-07 | 迈普尔平版印刷Ip有限公司 | 带电粒子光刻系统和射束产生器 |
| CN107484322B (zh) * | 2017-07-10 | 2023-11-10 | 中国原子能科学研究院 | 一种高压屏蔽仓 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3416207A (en) * | 1965-10-22 | 1968-12-17 | Maida Dev Company | Method of manufacturing a capacitor |
| DE2238594A1 (de) * | 1972-08-05 | 1974-02-21 | Stettner & Co | Keramischer mehrfach-durchfuehrungskondensator |
| JPS54788A (en) | 1977-06-05 | 1979-01-06 | Kouenerugii Butsurigaku Kenkiy | Heatable vacuum terminal pin device |
| JPS5485389A (en) | 1977-12-21 | 1979-07-06 | Kouenerugii Butsurigaku Kenkiy | Insulated coaxial vacuum terminal |
| US4459430A (en) * | 1982-07-13 | 1984-07-10 | The United States Of America As Represented By The United States Department Of Energy | High voltage variable diameter insulator |
| CN86105432A (zh) * | 1985-09-27 | 1987-05-27 | 美国电话电报公司 | 带电粒子束曝光 |
| KR910004957B1 (ko) * | 1987-10-29 | 1991-07-18 | 가부시끼가이샤 도시바 | 고주파 회로장치 |
| JPH0636346B2 (ja) * | 1988-03-09 | 1994-05-11 | セイコー電子工業株式会社 | 荷電粒子線装置及びこれによる試料観察方法 |
| US4929839A (en) * | 1988-10-11 | 1990-05-29 | Microbeam Inc. | Focused ion beam column |
| JP2886277B2 (ja) * | 1990-06-20 | 1999-04-26 | 富士通株式会社 | 電子ビーム露光装置 |
| FR2717981B1 (fr) * | 1994-03-24 | 1996-06-28 | Egide Sa | Procédé de fixation hermétique et électriquement isolante d'un conducteur électrique traversant une paroi métallique . |
| JPH10149948A (ja) * | 1996-11-19 | 1998-06-02 | Tdk Corp | 高電圧貫通形コンデンサ |
| WO1999001874A1 (en) * | 1997-07-02 | 1999-01-14 | The Regents Of The University Of California | A method for improving performance of highly stressed electrical insulating structures |
| ATE353473T1 (de) * | 2000-04-12 | 2007-02-15 | Aixtron Ag | Reaktionskammer mit wenigstens einer hf- durchführung |
| JP2003045789A (ja) * | 2001-08-02 | 2003-02-14 | Canon Inc | 描画装置及び描画方法 |
| US7045794B1 (en) | 2004-06-18 | 2006-05-16 | Novelx, Inc. | Stacked lens structure and method of use thereof for preventing electrical breakdown |
| EP1779403A4 (en) | 2004-07-05 | 2009-05-06 | Cebt Co Ltd | METHOD FOR CONTROLLING AN ELECTRON BEAM IN A MULTIPLE-MICROSULE AND MULTIPLE MICROSULE THEREWITH |
| US8890095B2 (en) | 2005-07-25 | 2014-11-18 | Mapper Lithography Ip B.V. | Reliability in a maskless lithography system |
| JP2007242359A (ja) * | 2006-03-07 | 2007-09-20 | Sony Corp | 電極リング、電子顕微鏡、電極リングの製造方法及び電子顕微鏡の製造方法 |
| JP2007266525A (ja) | 2006-03-30 | 2007-10-11 | Canon Inc | 荷電粒子線レンズアレイ、該荷電粒子線レンズアレイを用いた荷電粒子線露光装置 |
| NL2003619C2 (en) | 2009-10-09 | 2011-04-12 | Mapper Lithography Ip Bv | Projection lens assembly. |
-
2010
- 2010-10-05 JP JP2012533101A patent/JP5599889B2/ja active Active
- 2010-10-05 KR KR1020127011941A patent/KR20120093943A/ko not_active Withdrawn
- 2010-10-05 US US12/898,665 patent/US8624478B2/en active Active
- 2010-10-05 WO PCT/NL2010/050649 patent/WO2011043657A2/en not_active Ceased
- 2010-10-05 EP EP10763472A patent/EP2486580A2/en not_active Withdrawn
- 2010-10-05 CN CN2010800551470A patent/CN102687231A/zh active Pending
- 2010-10-08 TW TW099134286A patent/TW201135792A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| CN102687231A (zh) | 2012-09-19 |
| WO2011043657A3 (en) | 2011-06-03 |
| WO2011043657A4 (en) | 2011-07-28 |
| US8624478B2 (en) | 2014-01-07 |
| EP2486580A2 (en) | 2012-08-15 |
| JP2013507733A (ja) | 2013-03-04 |
| US20110084592A1 (en) | 2011-04-14 |
| WO2011043657A2 (en) | 2011-04-14 |
| KR20120093943A (ko) | 2012-08-23 |
| JP5599889B2 (ja) | 2014-10-01 |
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