CN102687231A - 高压屏蔽装置 - Google Patents

高压屏蔽装置 Download PDF

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Publication number
CN102687231A
CN102687231A CN2010800551470A CN201080055147A CN102687231A CN 102687231 A CN102687231 A CN 102687231A CN 2010800551470 A CN2010800551470 A CN 2010800551470A CN 201080055147 A CN201080055147 A CN 201080055147A CN 102687231 A CN102687231 A CN 102687231A
Authority
CN
China
Prior art keywords
metal
metal part
shielding
shielding arrangement
high voltage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2010800551470A
Other languages
English (en)
Chinese (zh)
Inventor
J·J·科宁
S·W·H·K·施藤布里克
N·H·R·巴斯
B·席佩尔
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mapper Lithopraphy IP BV
Original Assignee
Mapper Lithopraphy IP BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mapper Lithopraphy IP BV filed Critical Mapper Lithopraphy IP BV
Publication of CN102687231A publication Critical patent/CN102687231A/zh
Pending legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K9/00—Screening of apparatus or components against electric or magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/0203—Protection arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/03—Mounting, supporting, spacing or insulating electrodes
    • H01J2237/038—Insulating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electron Beam Exposure (AREA)
  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
CN2010800551470A 2009-10-09 2010-10-05 高压屏蔽装置 Pending CN102687231A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US25033809P 2009-10-09 2009-10-09
US61/250,338 2009-10-09
PCT/NL2010/050649 WO2011043657A2 (en) 2009-10-09 2010-10-05 High voltage shielding arrangement

Publications (1)

Publication Number Publication Date
CN102687231A true CN102687231A (zh) 2012-09-19

Family

ID=43618185

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2010800551470A Pending CN102687231A (zh) 2009-10-09 2010-10-05 高压屏蔽装置

Country Status (7)

Country Link
US (1) US8624478B2 (enExample)
EP (1) EP2486580A2 (enExample)
JP (1) JP5599889B2 (enExample)
KR (1) KR20120093943A (enExample)
CN (1) CN102687231A (enExample)
TW (1) TW201135792A (enExample)
WO (1) WO2011043657A2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107484322A (zh) * 2017-07-10 2017-12-15 中国原子能科学研究院 一种高压屏蔽仓

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2006868C2 (en) 2011-05-30 2012-12-03 Mapper Lithography Ip Bv Charged particle multi-beamlet apparatus.
US10586625B2 (en) 2012-05-14 2020-03-10 Asml Netherlands B.V. Vacuum chamber arrangement for charged particle beam generator
US11348756B2 (en) 2012-05-14 2022-05-31 Asml Netherlands B.V. Aberration correction in charged particle system
CN104520968B (zh) * 2012-05-14 2017-07-07 迈普尔平版印刷Ip有限公司 带电粒子光刻系统和射束产生器

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4858064A (en) * 1987-10-29 1989-08-15 Kabushiki Kaisha Toshiba Thick-film high frequency signal circuit apparatus with feedthrough capacitor
US5117117A (en) * 1990-06-20 1992-05-26 Fujitsu Limited Electron beam exposure system having an improved seal element for interfacing electric connections
FR2717981A1 (fr) * 1994-03-24 1995-09-29 Egide Sa Procédé de fixation hermétique et électriquement isolante d'un conducteur électrique traversant une paroi métallique .

Family Cites Families (18)

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Publication number Priority date Publication date Assignee Title
US3416207A (en) * 1965-10-22 1968-12-17 Maida Dev Company Method of manufacturing a capacitor
DE2238594A1 (de) * 1972-08-05 1974-02-21 Stettner & Co Keramischer mehrfach-durchfuehrungskondensator
JPS54788A (en) 1977-06-05 1979-01-06 Kouenerugii Butsurigaku Kenkiy Heatable vacuum terminal pin device
JPS5485389A (en) 1977-12-21 1979-07-06 Kouenerugii Butsurigaku Kenkiy Insulated coaxial vacuum terminal
US4459430A (en) * 1982-07-13 1984-07-10 The United States Of America As Represented By The United States Department Of Energy High voltage variable diameter insulator
CN86105432A (zh) * 1985-09-27 1987-05-27 美国电话电报公司 带电粒子束曝光
JPH0636346B2 (ja) * 1988-03-09 1994-05-11 セイコー電子工業株式会社 荷電粒子線装置及びこれによる試料観察方法
US4929839A (en) * 1988-10-11 1990-05-29 Microbeam Inc. Focused ion beam column
JPH10149948A (ja) * 1996-11-19 1998-06-02 Tdk Corp 高電圧貫通形コンデンサ
WO1999001874A1 (en) * 1997-07-02 1999-01-14 The Regents Of The University Of California A method for improving performance of highly stressed electrical insulating structures
ATE353473T1 (de) * 2000-04-12 2007-02-15 Aixtron Ag Reaktionskammer mit wenigstens einer hf- durchführung
JP2003045789A (ja) * 2001-08-02 2003-02-14 Canon Inc 描画装置及び描画方法
US7045794B1 (en) 2004-06-18 2006-05-16 Novelx, Inc. Stacked lens structure and method of use thereof for preventing electrical breakdown
EP1779403A4 (en) 2004-07-05 2009-05-06 Cebt Co Ltd METHOD FOR CONTROLLING AN ELECTRON BEAM IN A MULTIPLE-MICROSULE AND MULTIPLE MICROSULE THEREWITH
US8890095B2 (en) 2005-07-25 2014-11-18 Mapper Lithography Ip B.V. Reliability in a maskless lithography system
JP2007242359A (ja) * 2006-03-07 2007-09-20 Sony Corp 電極リング、電子顕微鏡、電極リングの製造方法及び電子顕微鏡の製造方法
JP2007266525A (ja) 2006-03-30 2007-10-11 Canon Inc 荷電粒子線レンズアレイ、該荷電粒子線レンズアレイを用いた荷電粒子線露光装置
NL2003619C2 (en) 2009-10-09 2011-04-12 Mapper Lithography Ip Bv Projection lens assembly.

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4858064A (en) * 1987-10-29 1989-08-15 Kabushiki Kaisha Toshiba Thick-film high frequency signal circuit apparatus with feedthrough capacitor
US5117117A (en) * 1990-06-20 1992-05-26 Fujitsu Limited Electron beam exposure system having an improved seal element for interfacing electric connections
FR2717981A1 (fr) * 1994-03-24 1995-09-29 Egide Sa Procédé de fixation hermétique et électriquement isolante d'un conducteur électrique traversant une paroi métallique .

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107484322A (zh) * 2017-07-10 2017-12-15 中国原子能科学研究院 一种高压屏蔽仓
CN107484322B (zh) * 2017-07-10 2023-11-10 中国原子能科学研究院 一种高压屏蔽仓

Also Published As

Publication number Publication date
WO2011043657A3 (en) 2011-06-03
WO2011043657A4 (en) 2011-07-28
US8624478B2 (en) 2014-01-07
EP2486580A2 (en) 2012-08-15
JP2013507733A (ja) 2013-03-04
US20110084592A1 (en) 2011-04-14
WO2011043657A2 (en) 2011-04-14
TW201135792A (en) 2011-10-16
KR20120093943A (ko) 2012-08-23
JP5599889B2 (ja) 2014-10-01

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Effective date of abandoning: 20151209

C20 Patent right or utility model deemed to be abandoned or is abandoned