JP5599889B2 - 高電圧遮蔽配置 - Google Patents

高電圧遮蔽配置 Download PDF

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Publication number
JP5599889B2
JP5599889B2 JP2012533101A JP2012533101A JP5599889B2 JP 5599889 B2 JP5599889 B2 JP 5599889B2 JP 2012533101 A JP2012533101 A JP 2012533101A JP 2012533101 A JP2012533101 A JP 2012533101A JP 5599889 B2 JP5599889 B2 JP 5599889B2
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Japan
Prior art keywords
projection lens
metal part
charged particle
metal
lithography system
Prior art date
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JP2012533101A
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English (en)
Japanese (ja)
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JP2013507733A (ja
JP2013507733A5 (enExample
Inventor
コニング、ヨハン・ヨースト
ステーンブリンク、スティーン・ウィレム・ヘルマン
バールス、ノルマン・ヘンドリクス・ルドルフ
シッパー、バルト
Original Assignee
マッパー・リソグラフィー・アイピー・ビー．ブイ．
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Publication of JP2013507733A publication Critical patent/JP2013507733A/ja
Publication of JP2013507733A5 publication Critical patent/JP2013507733A5/ja
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K9/00—Screening of apparatus or components against electric or magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/0203—Protection arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/03—Mounting, supporting, spacing or insulating electrodes
    • H01J2237/038—Insulating

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electron Beam Exposure (AREA)
  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
JP2012533101A 2009-10-09 2010-10-05 高電圧遮蔽配置 Active JP5599889B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US25033809P 2009-10-09 2009-10-09
US61/250,338 2009-10-09
PCT/NL2010/050649 WO2011043657A2 (en) 2009-10-09 2010-10-05 High voltage shielding arrangement

Publications (3)

Publication Number Publication Date
JP2013507733A JP2013507733A (ja) 2013-03-04
JP2013507733A5 JP2013507733A5 (enExample) 2013-11-28
JP5599889B2 true JP5599889B2 (ja) 2014-10-01

Family

ID=43618185

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012533101A Active JP5599889B2 (ja) 2009-10-09 2010-10-05 高電圧遮蔽配置

Country Status (7)

Country Link
US (1) US8624478B2 (enExample)
EP (1) EP2486580A2 (enExample)
JP (1) JP5599889B2 (enExample)
KR (1) KR20120093943A (enExample)
CN (1) CN102687231A (enExample)
TW (1) TW201135792A (enExample)
WO (1) WO2011043657A2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2006868C2 (en) 2011-05-30 2012-12-03 Mapper Lithography Ip Bv Charged particle multi-beamlet apparatus.
US10586625B2 (en) 2012-05-14 2020-03-10 Asml Netherlands B.V. Vacuum chamber arrangement for charged particle beam generator
US11348756B2 (en) 2012-05-14 2022-05-31 Asml Netherlands B.V. Aberration correction in charged particle system
CN104520968B (zh) * 2012-05-14 2017-07-07 迈普尔平版印刷Ip有限公司 带电粒子光刻系统和射束产生器
CN107484322B (zh) * 2017-07-10 2023-11-10 中国原子能科学研究院 一种高压屏蔽仓

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3416207A (en) * 1965-10-22 1968-12-17 Maida Dev Company Method of manufacturing a capacitor
DE2238594A1 (de) * 1972-08-05 1974-02-21 Stettner & Co Keramischer mehrfach-durchfuehrungskondensator
JPS54788A (en) 1977-06-05 1979-01-06 Kouenerugii Butsurigaku Kenkiy Heatable vacuum terminal pin device
JPS5485389A (en) 1977-12-21 1979-07-06 Kouenerugii Butsurigaku Kenkiy Insulated coaxial vacuum terminal
US4459430A (en) * 1982-07-13 1984-07-10 The United States Of America As Represented By The United States Department Of Energy High voltage variable diameter insulator
CN86105432A (zh) * 1985-09-27 1987-05-27 美国电话电报公司 带电粒子束曝光
KR910004957B1 (ko) * 1987-10-29 1991-07-18 가부시끼가이샤 도시바 고주파 회로장치
JPH0636346B2 (ja) * 1988-03-09 1994-05-11 セイコー電子工業株式会社 荷電粒子線装置及びこれによる試料観察方法
US4929839A (en) * 1988-10-11 1990-05-29 Microbeam Inc. Focused ion beam column
JP2886277B2 (ja) * 1990-06-20 1999-04-26 富士通株式会社 電子ビーム露光装置
FR2717981B1 (fr) * 1994-03-24 1996-06-28 Egide Sa Procédé de fixation hermétique et électriquement isolante d'un conducteur électrique traversant une paroi métallique .
JPH10149948A (ja) * 1996-11-19 1998-06-02 Tdk Corp 高電圧貫通形コンデンサ
WO1999001874A1 (en) * 1997-07-02 1999-01-14 The Regents Of The University Of California A method for improving performance of highly stressed electrical insulating structures
ATE353473T1 (de) * 2000-04-12 2007-02-15 Aixtron Ag Reaktionskammer mit wenigstens einer hf- durchführung
JP2003045789A (ja) * 2001-08-02 2003-02-14 Canon Inc 描画装置及び描画方法
US7045794B1 (en) 2004-06-18 2006-05-16 Novelx, Inc. Stacked lens structure and method of use thereof for preventing electrical breakdown
EP1779403A4 (en) 2004-07-05 2009-05-06 Cebt Co Ltd METHOD FOR CONTROLLING AN ELECTRON BEAM IN A MULTIPLE-MICROSULE AND MULTIPLE MICROSULE THEREWITH
US8890095B2 (en) 2005-07-25 2014-11-18 Mapper Lithography Ip B.V. Reliability in a maskless lithography system
JP2007242359A (ja) * 2006-03-07 2007-09-20 Sony Corp 電極リング、電子顕微鏡、電極リングの製造方法及び電子顕微鏡の製造方法
JP2007266525A (ja) 2006-03-30 2007-10-11 Canon Inc 荷電粒子線レンズアレイ、該荷電粒子線レンズアレイを用いた荷電粒子線露光装置
NL2003619C2 (en) 2009-10-09 2011-04-12 Mapper Lithography Ip Bv Projection lens assembly.

Also Published As

Publication number Publication date
CN102687231A (zh) 2012-09-19
WO2011043657A3 (en) 2011-06-03
WO2011043657A4 (en) 2011-07-28
US8624478B2 (en) 2014-01-07
EP2486580A2 (en) 2012-08-15
JP2013507733A (ja) 2013-03-04
US20110084592A1 (en) 2011-04-14
WO2011043657A2 (en) 2011-04-14
TW201135792A (en) 2011-10-16
KR20120093943A (ko) 2012-08-23

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