TW201113950A - Ultraviolet-transmitting microwave reflector comprising a micromesh screen - Google Patents

Ultraviolet-transmitting microwave reflector comprising a micromesh screen Download PDF

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Publication number
TW201113950A
TW201113950A TW098135652A TW98135652A TW201113950A TW 201113950 A TW201113950 A TW 201113950A TW 098135652 A TW098135652 A TW 098135652A TW 98135652 A TW98135652 A TW 98135652A TW 201113950 A TW201113950 A TW 201113950A
Authority
TW
Taiwan
Prior art keywords
reflector
screen
ultraviolet
micromesh
micro
Prior art date
Application number
TW098135652A
Other languages
English (en)
Chinese (zh)
Inventor
Tuan Anh Nguyen
Yao-Hung Yang
Sanjeev Baluja
Thomas Nowak
Juan Carlos Rocha
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of TW201113950A publication Critical patent/TW201113950A/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C25D5/022—Electroplating of selected surface areas using masking means
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/08—Perforated or foraminous objects, e.g. sieves
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H10P95/90—Thermal treatments, e.g. annealing or sintering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Overhead Projectors And Projection Screens (AREA)
  • Discharge Lamps And Accessories Thereof (AREA)
  • Optical Elements Other Than Lenses (AREA)
TW098135652A 2008-10-21 2009-10-21 Ultraviolet-transmitting microwave reflector comprising a micromesh screen TW201113950A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US12/255,578 US20100096569A1 (en) 2008-10-21 2008-10-21 Ultraviolet-transmitting microwave reflector comprising a micromesh screen

Publications (1)

Publication Number Publication Date
TW201113950A true TW201113950A (en) 2011-04-16

Family

ID=42107915

Family Applications (1)

Application Number Title Priority Date Filing Date
TW098135652A TW201113950A (en) 2008-10-21 2009-10-21 Ultraviolet-transmitting microwave reflector comprising a micromesh screen

Country Status (6)

Country Link
US (1) US20100096569A1 (https=)
JP (1) JP2012506639A (https=)
KR (1) KR20110084261A (https=)
CN (1) CN102197466A (https=)
TW (1) TW201113950A (https=)
WO (1) WO2010048227A2 (https=)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4215107B2 (ja) * 2007-02-02 2009-01-28 セイコーエプソン株式会社 光源装置、プロジェクタ
US8101931B2 (en) 2010-04-05 2012-01-24 Miltec Corporation RF screen assembly for microwave powered UV lamps
CN102315720B (zh) * 2010-06-30 2014-06-25 清华大学 毫米波检查设备的摆动反射装置
WO2012009353A1 (en) * 2010-07-12 2012-01-19 Nordson Corporation Ultraviolet lamp system and method for controlling emitted ultraviolet light
US8309421B2 (en) 2010-11-24 2012-11-13 Applied Materials, Inc. Dual-bulb lamphead control methodology
US9108370B2 (en) * 2011-10-19 2015-08-18 Physical Sciences, Inc. Microgravity fabrication and metalization of large, lightweight polymeric bubbles and films for space system applications
US8916038B2 (en) 2013-03-13 2014-12-23 Gtat Corporation Free-standing metallic article for semiconductors
US8936709B2 (en) 2013-03-13 2015-01-20 Gtat Corporation Adaptable free-standing metallic article for semiconductors
US9318364B2 (en) 2014-01-13 2016-04-19 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor device metallization systems and methods
US20150292815A1 (en) * 2014-04-10 2015-10-15 Applied Materials, Inc. Susceptor with radiation source compensation
US11380557B2 (en) * 2017-06-05 2022-07-05 Applied Materials, Inc. Apparatus and method for gas delivery in semiconductor process chambers
KR101987172B1 (ko) * 2017-07-28 2019-06-10 주식회사 선익시스템 박막 증착용 마스크 제조 방법 및 이를 통해 제작된 증착 마스크
KR102000672B1 (ko) * 2017-07-28 2019-07-17 주식회사 선익시스템 박막 증착용 마스크 제조 방법 및 이를 통해 제작된 증착 마스크
US11649560B2 (en) 2019-06-20 2023-05-16 Applied Materials, Inc. Method for forming silicon-phosphorous materials
US11375584B2 (en) * 2019-08-20 2022-06-28 Applied Materials, Inc. Methods and apparatus for processing a substrate using microwave energy
US11670491B2 (en) * 2020-07-15 2023-06-06 Taiwan Semiconductor Manufacturing Co., Ltd. Radio frequency screen for an ultraviolet lamp system
US12187626B2 (en) * 2021-09-20 2025-01-07 Sudhish Madapur SWAIN Apparatus and method for purifying water
CN114256111B (zh) * 2021-12-30 2025-05-13 拓荆科技股份有限公司 一种uv微波屏蔽结构和反应腔设备

Family Cites Families (61)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3389951A (en) * 1963-07-01 1968-06-25 Gen Electric Diffuse reflector incorporating wire mesh structure
US3872349A (en) * 1973-03-29 1975-03-18 Fusion Systems Corp Apparatus and method for generating radiation
US4501993A (en) * 1982-10-06 1985-02-26 Fusion Systems Corporation Deep UV lamp bulb
AU574435B2 (en) * 1984-03-02 1988-07-07 Mitsubishi Denki Kabushiki Kaisha Microwave discharge light source apparatus
JPS61160926A (ja) * 1985-01-09 1986-07-21 Toshiba Corp 光励起薄膜形成装置
JPS63149484A (ja) * 1986-12-11 1988-06-22 Jeco Co Ltd 流路切換バルブ
US4794503A (en) * 1987-09-23 1988-12-27 Fusion Systems Corporation Lamp having improved image resolution
US4835932A (en) * 1988-05-13 1989-06-06 Trw Inc. D-section structural tubes
US5032689A (en) * 1989-08-15 1991-07-16 Halligan Brian S EMI/RFI shielding vent and method of use
US5039918A (en) * 1990-04-06 1991-08-13 New Japan Radio Co., Ltd. Electrodeless microwave-generated radiation apparatus
US5467220A (en) * 1994-02-18 1995-11-14 Applied Materials, Inc. Method and apparatus for improving semiconductor wafer surface temperature uniformity
US5841233A (en) * 1996-01-26 1998-11-24 Fusion Lighting, Inc. Method and apparatus for mounting a dichroic mirror in a microwave powered lamp assembly using deformable tabs
JP2002503387A (ja) * 1997-06-04 2002-01-29 フュージョン ライティング，インコーポレイテッド 改良型無電極ランプスクリーン用の方法及び装置
JPH11121974A (ja) * 1997-10-16 1999-04-30 Dainippon Printing Co Ltd 電磁波遮蔽板とそれを作成するためのメッシュパターン版
US6098637A (en) * 1998-03-03 2000-08-08 Applied Materials, Inc. In situ cleaning of the surface inside a vacuum processing chamber
US6187133B1 (en) * 1998-05-29 2001-02-13 Applied Materials, Inc. Gas manifold for uniform gas distribution and photochemistry
US6635583B2 (en) * 1998-10-01 2003-10-21 Applied Materials, Inc. Silicon carbide deposition for use as a low-dielectric constant anti-reflective coating
US6376387B2 (en) * 1999-07-09 2002-04-23 Applied Materials, Inc. Method of sealing an epitaxial silicon layer on a substrate
ATE556726T1 (de) * 1999-07-29 2012-05-15 Sev Trent Water Purification Inc Uv lichtquelle
US6555835B1 (en) * 1999-08-09 2003-04-29 Samco International, Inc. Ultraviolet-ozone oxidation system and method
US7265062B2 (en) * 2000-04-04 2007-09-04 Applied Materials, Inc. Ionic additives for extreme low dielectric constant chemical formulations
US6559460B1 (en) * 2000-10-31 2003-05-06 Nordson Corporation Ultraviolet lamp system and methods
US7922923B2 (en) * 2001-02-01 2011-04-12 Creatv Microtech, Inc. Anti-scatter grid and collimator designs, and their motion, fabrication and assembly
US6436194B1 (en) * 2001-02-16 2002-08-20 Applied Materials, Inc. Method and a system for sealing an epitaxial silicon layer on a substrate
JP4799748B2 (ja) * 2001-03-28 2011-10-26 忠弘 大見 マイクロ波プラズマプロセス装置、プラズマ着火方法、プラズマ形成方法及びプラズマプロセス方法
US20030020027A1 (en) * 2001-07-25 2003-01-30 Nordson Corporation Apparatus for infrared reduction in ultraviolet radiation generators
GB0120993D0 (en) * 2001-08-30 2001-10-24 Quay Technologies Pulsed UV light source
US6753129B2 (en) * 2001-12-07 2004-06-22 Applied Materials Inc. Method and apparatus for modification of chemically amplified photoresist by electron beam exposure
US7091137B2 (en) * 2001-12-14 2006-08-15 Applied Materials Bi-layer approach for a hermetic low dielectric constant layer for barrier applications
ITTO20020215A1 (it) * 2002-03-12 2003-09-12 Tetra Laval Holdings E Finance Dispositivo per il trattamento di un materiale di confezionamento mediante una radiazione uv.
US20040026255A1 (en) * 2002-08-06 2004-02-12 Applied Materials, Inc Insoluble anode loop in copper electrodeposition cell for interconnect formation
US6928839B2 (en) * 2002-08-15 2005-08-16 Ceramoptec Industries, Inc. Method for production of silica optical fiber preforms
US7297247B2 (en) * 2003-05-06 2007-11-20 Applied Materials, Inc. Electroformed sputtering target
US7153615B2 (en) * 2003-08-20 2006-12-26 Intel Corporation Extreme ultraviolet pellicle using a thin film and supportive mesh
JP4386413B2 (ja) * 2003-08-25 2009-12-16 株式会社エンプラス ワイヤーグリッド偏光子の製造方法
US6841790B1 (en) * 2003-10-07 2005-01-11 Miltec Corporation Snap-in radio frequency screen for ultraviolet lamp system
US20050095859A1 (en) * 2003-11-03 2005-05-05 Applied Materials, Inc. Precursor delivery system with rate control
US20050250346A1 (en) * 2004-05-06 2005-11-10 Applied Materials, Inc. Process and apparatus for post deposition treatment of low k dielectric materials
US7709814B2 (en) * 2004-06-18 2010-05-04 Axcelis Technologies, Inc. Apparatus and process for treating dielectric materials
US7077547B2 (en) * 2004-07-29 2006-07-18 Nordson Corporation Shuttered lamp assembly and method of cooling the lamp assembly
US20060105106A1 (en) * 2004-11-16 2006-05-18 Applied Materials, Inc. Tensile and compressive stressed materials for semiconductors
JP2006147782A (ja) * 2004-11-18 2006-06-08 Toshiba Ceramics Co Ltd 半導体基板用マイクロ波加熱セラミックスヒータ
US20060251827A1 (en) * 2005-05-09 2006-11-09 Applied Materials, Inc. Tandem uv chamber for curing dielectric materials
US7777198B2 (en) * 2005-05-09 2010-08-17 Applied Materials, Inc. Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation
US7648927B2 (en) * 2005-06-21 2010-01-19 Applied Materials, Inc. Method for forming silicon-containing materials during a photoexcitation deposition process
US20060286774A1 (en) * 2005-06-21 2006-12-21 Applied Materials. Inc. Method for forming silicon-containing materials during a photoexcitation deposition process
KR101233059B1 (ko) * 2005-06-22 2013-02-13 액셀리스 테크놀로지스, 인크. 유전 물질을 처리하는 장치 및 프로세스
US20070116934A1 (en) * 2005-11-22 2007-05-24 Miller Scott M Antireflective surfaces, methods of manufacture thereof and articles comprising the same
US7692171B2 (en) * 2006-03-17 2010-04-06 Andrzei Kaszuba Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectors
US7566891B2 (en) * 2006-03-17 2009-07-28 Applied Materials, Inc. Apparatus and method for treating a substrate with UV radiation using primary and secondary reflectors
US7909595B2 (en) * 2006-03-17 2011-03-22 Applied Materials, Inc. Apparatus and method for exposing a substrate to UV radiation using a reflector having both elliptical and parabolic reflective sections
JP4896555B2 (ja) * 2006-03-29 2012-03-14 株式会社東芝 半導体製造装置及び半導体装置の製造方法
KR101074186B1 (ko) * 2006-04-07 2011-10-14 어플라이드 머티어리얼스, 인코포레이티드 에피택셜 필름 형성을 위한 클러스터 툴
US7978964B2 (en) * 2006-04-27 2011-07-12 Applied Materials, Inc. Substrate processing chamber with dielectric barrier discharge lamp assembly
US7547633B2 (en) * 2006-05-01 2009-06-16 Applied Materials, Inc. UV assisted thermal processing
US20070256635A1 (en) * 2006-05-02 2007-11-08 Applied Materials, Inc. A Delaware Corporation UV activation of NH3 for III-N deposition
US8003156B2 (en) * 2006-05-04 2011-08-23 Advanced Cardiovascular Systems, Inc. Rotatable support elements for stents
US20090095221A1 (en) * 2007-10-16 2009-04-16 Alexander Tam Multi-gas concentric injection showerhead
US7976631B2 (en) * 2007-10-16 2011-07-12 Applied Materials, Inc. Multi-gas straight channel showerhead
US20090095222A1 (en) * 2007-10-16 2009-04-16 Alexander Tam Multi-gas spiral channel showerhead
US7977659B2 (en) * 2008-05-01 2011-07-12 Fusion Uv Systems, Inc. Radio frequency screen assembly for microwave cavities

Also Published As

Publication number Publication date
CN102197466A (zh) 2011-09-21
KR20110084261A (ko) 2011-07-21
JP2012506639A (ja) 2012-03-15
WO2010048227A2 (en) 2010-04-29
US20100096569A1 (en) 2010-04-22
WO2010048227A3 (en) 2010-07-15

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