TW201109727A - Integrator and optical irradiation apparatus using the same - Google Patents

Integrator and optical irradiation apparatus using the same Download PDF

Info

Publication number
TW201109727A
TW201109727A TW099114517A TW99114517A TW201109727A TW 201109727 A TW201109727 A TW 201109727A TW 099114517 A TW099114517 A TW 099114517A TW 99114517 A TW99114517 A TW 99114517A TW 201109727 A TW201109727 A TW 201109727A
Authority
TW
Taiwan
Prior art keywords
lens
integrator
light
segment
rectangular
Prior art date
Application number
TW099114517A
Other languages
English (en)
Chinese (zh)
Inventor
Kazuyoshi Suzuki
Original Assignee
Ushio Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Electric Inc filed Critical Ushio Electric Inc
Publication of TW201109727A publication Critical patent/TW201109727A/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • H01L21/0275—Photolithographic processes using lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Lens Barrels (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW099114517A 2009-06-29 2010-05-06 Integrator and optical irradiation apparatus using the same TW201109727A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009153471A JP2011009611A (ja) 2009-06-29 2009-06-29 インテグレータおよびそのインテグレータを用いた光照射装置

Publications (1)

Publication Number Publication Date
TW201109727A true TW201109727A (en) 2011-03-16

Family

ID=43389970

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099114517A TW201109727A (en) 2009-06-29 2010-05-06 Integrator and optical irradiation apparatus using the same

Country Status (4)

Country Link
JP (1) JP2011009611A (ko)
KR (1) KR20110001876A (ko)
CN (1) CN101936503A (ko)
TW (1) TW201109727A (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9890926B2 (en) * 2012-08-02 2018-02-13 Fraen Corporation Low profile multi-lens TIR
CN103616801B (zh) * 2013-10-28 2016-01-13 东莞科视自动化科技有限公司 一种pcb表面油墨曝光专用高均匀度光源的制备方法及设备
CN109061828A (zh) * 2018-10-10 2018-12-21 北京环境特性研究所 高效率光学积分器

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62199714U (ko) * 1986-06-06 1987-12-19
JP4003327B2 (ja) * 1998-12-25 2007-11-07 松下電器産業株式会社 プロジェクタの光源アライニング装置
CN2461025Y (zh) * 2000-09-06 2001-11-21 中国科学院光电技术研究所 高质量光学积分器件
JP2002228907A (ja) * 2001-02-02 2002-08-14 Ricoh Co Ltd 複合光学部材
JP3918440B2 (ja) * 2001-02-09 2007-05-23 ウシオ電機株式会社 照度分布均一化フィルタを備えた光照射装置
JP2005166922A (ja) * 2003-12-02 2005-06-23 Nikon Corp 支持装置、光学装置、露光装置、及びデバイスの製造方法
EP1837895B1 (en) * 2004-12-27 2016-02-24 Nikon Corporation Optical integrator, illumination optical apparatus, exposure apparatus, exposure method, and device manufacturing method
JP2007034071A (ja) * 2005-07-28 2007-02-08 Harison Toshiba Lighting Corp 照明装置
JP2010251232A (ja) * 2009-04-20 2010-11-04 Ushio Inc インテグレータおよび光照射装置

Also Published As

Publication number Publication date
CN101936503A (zh) 2011-01-05
KR20110001876A (ko) 2011-01-06
JP2011009611A (ja) 2011-01-13

Similar Documents

Publication Publication Date Title
TWI459149B (zh) A lighting optical device, an exposure apparatus, and an element manufacturing method
TWI765954B (zh) 用於液態聚合物之光固化以形成三維物體的光線引擎及其方法
JP6648759B2 (ja) 結像光学素子の製造方法および結像光学素子の製造装置
WO2011096365A1 (ja) 露光装置用光照射装置及びその点灯制御方法、並びに露光装置、露光方法及び基板
TWI440990B (zh) Exposure method and apparatus, and component manufacturing method
WO2011105461A1 (ja) 露光装置用光照射装置、露光装置、露光方法、基板の製造方法、マスク、及び被露光基板
TW201109727A (en) Integrator and optical irradiation apparatus using the same
JP5799306B2 (ja) 露光装置用光照射装置の制御方法、及び露光方法
TWI276926B (en) Light irradiating apparatus
JP2015087525A (ja) 光源装置及びプロジェクター
JP2000206525A (ja) 液晶表示素子の光配向用偏光光照射装置
JP5935294B2 (ja) 近接露光装置及び近接露光方法
JP2011175025A (ja) 近接走査露光装置及び基板の製造方法
TW201030473A (en) Light irradiation apparatus
WO2012046541A1 (ja) 露光装置
JP2009075515A (ja) 光学装置、およびプロジェクタ
WO2016188358A1 (zh) 曝光装置
JP4135557B2 (ja) 光配向用偏光光照射装置
JP2009063692A (ja) 電気光学装置の製造方法及び製造装置
JP6613949B2 (ja) 偏光素子ユニットおよび偏光光照射装置
JP7100398B1 (ja) 露光装置
JP2013205613A (ja) 近接露光装置
TW201428431A (zh) 照明光學系統、照明方法、曝光方法以及裝置
KR101578385B1 (ko) 근접 노광 장치, 근접 노광 방법 및 조명 광학계
JP2011186123A (ja) プリズムユニットの組付方法及び組付装置